JPH0410199B2 - - Google Patents
Info
- Publication number
- JPH0410199B2 JPH0410199B2 JP61012566A JP1256686A JPH0410199B2 JP H0410199 B2 JPH0410199 B2 JP H0410199B2 JP 61012566 A JP61012566 A JP 61012566A JP 1256686 A JP1256686 A JP 1256686A JP H0410199 B2 JPH0410199 B2 JP H0410199B2
- Authority
- JP
- Japan
- Prior art keywords
- support piece
- heat
- wire
- heating element
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Resistance Heating (AREA)
- Furnace Details (AREA)
Description
この発明は、半導体ウエハ等の被熱処理物に熱
処理を行う熱処理装置に関する。
The present invention relates to a heat treatment apparatus that performs heat treatment on objects to be heat treated, such as semiconductor wafers.
半導体処理用の熱処理装置では、半導体ウエハ
を収容した反応管を周面から加熱するため、炉の
内面に大口径の発熱素線が反応管の周面を覆う形
態で配設されている。
In a heat treatment apparatus for semiconductor processing, a large-diameter exothermic wire is disposed on the inner surface of a furnace so as to cover the circumferential surface of the reaction tube in order to heat the reaction tube containing a semiconductor wafer from the circumferential surface.
このような熱処理装置において、発熱素線の支
持には、次のような欠点がある。
(a) 炉本体の断熱材に透孔を形成して発熱素線を
支持していることから、放熱が高く、水冷ジヤ
ケツトを配置することができない。
(b) カンタルロツトと称する金属物および支持用
セラミツク部材の脱落のおそれがある。
(c) 大口径の発熱素線は、発熱時に垂れ下がりが
生じ、反応管との距離が区々になるため、加熱
温度が不均一になるおそれがある。
そこで、この発明は、発熱素線の支持の信頼性
を高めるとともに、半導体ウエハ等の被熱処理物
に対して均熱処理ができる熱処理装置の提供を目
的とする。
In such a heat treatment apparatus, supporting the heat generating wire has the following drawbacks. (a) Because the heat generating wires are supported by forming through holes in the heat insulating material of the furnace body, heat radiation is high and a water cooling jacket cannot be installed. (b) There is a risk that the metal object called Cantalrot and the supporting ceramic member may fall off. (c) Large-diameter heating wires may sag when generating heat, and the distance from the reaction tube may vary, which may result in uneven heating temperature. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a heat treatment apparatus that can improve the reliability of supporting heat generating wires and perform soaking treatment on objects to be heat treated such as semiconductor wafers.
この発明の熱処理装置は、装置本体(炉本体2
0)に設置されて被熱処理物の周面の全部又は一
部を包囲する発熱素線6と、この発熱素線を係止
部12,24に係止させて挟み込む胴体部8とと
もにこの胴体部に一体に形成された腕部10を以
て前記発熱素線を支持する支持片2,4と、この
支持片の前記腕部を支持部144に支持せて前記
発熱素線を前記装置本体に取り付け、前記支持片
と前記装置本体との間に空気層を形成するととも
に前記支持片の移動を許容する空間部23を形成
した取付枠14A,14B又は保持枠15とを備
えたことを特徴とする。
The heat treatment apparatus of this invention has an apparatus main body (furnace main body 2
0), which surrounds all or part of the circumferential surface of the object to be heat-treated, and the body part 8 which locks and sandwiches this heat-generating element wire with the locking parts 12 and 24, and this body part. support pieces 2 and 4 that support the heat generating wire with arm portions 10 integrally formed with the support pieces 2 and 4; the arm portions of the support pieces are supported by support portions 144 to attach the heat generating wire to the device main body; The present invention is characterized in that it includes mounting frames 14A, 14B or a holding frame 15 in which an air layer is formed between the support piece and the main body of the apparatus, and a space 23 is formed to allow movement of the support piece.
【作用】
この発明の熱処理装置では、発熱素線が支持片
を介して取付枠に移動可能に取り付けられて装置
本体に対する発熱素線の取付けの信頼性が高めら
れ、しかも、発熱素線の移動を許容するとともに
発熱素線の背面部側、即ち、支持片と装置本体と
の間に空気層が形成されている。したがつて、空
気層によつて断熱機能及び蓄熱機能が得られるの
で均熱効果に寄与するとともに、熱膨張や収縮に
よる発熱素線の変形に応じて支持片が取付枠内で
移動できるため、その移動によつて発熱素線の形
状変化が吸収され、熱的な変形による発熱素線の
損傷防止が図られている。[Function] In the heat treatment apparatus of the present invention, the heat generating wire is movably attached to the mounting frame via the support piece, increasing the reliability of attaching the heat generating wire to the main body of the apparatus, and furthermore, the heat generating wire can be moved. An air layer is formed between the back side of the heating element wire, that is, between the support piece and the main body of the device. Therefore, the air layer provides a heat insulating function and a heat storage function, contributing to a uniform heat effect, and the supporting piece can move within the mounting frame in response to the deformation of the heat generating wire due to thermal expansion or contraction. This movement absorbs changes in the shape of the heat generating wire, thereby preventing damage to the heat generating wire due to thermal deformation.
以下、この発明を図面に示した実施例を参照し
て説明する。
第1図ないし第4図は、この発明の熱処理装置
の一実施例を示す。
この熱処理装置には、第1図に示すように、第
1の支持片2と補助的な第2の支持片4とが設け
られており、各支持片2,4は、被支持部材であ
る発熱素線6を支持するためにセラミツク等、十
分な機械的強度を持つ断熱材料で形成する。
支持片2は、偏平な胴体部8の頂部の左右に腕
部10を一体に形成するとともに、胴体部8の両
側部に発熱素線6の形状に合わせて凹部を成す係
止部12を形成したものである。この実施例の場
合、発熱素線6は断面円形の棒状体を成してお
り、係止部12は、この発熱素線6を挟み込むた
めに発熱素線6の外形に対応した湾曲凹部に形成
されている。そして、この支持片2には、胴体部
8とT字形を成す腕部10が一体に形成されてい
る。
また、支持片4は、2つの支持片2の間に設置
されて両者間に挟み込まれるものであり、支持片
2の係止部12に対応する側面部には、支持片2
の係止部12と同様の凹部を成す係止部24が形
成されている。したがつて、発熱素線6は、第3
図に示すように、支持片2と支持片4とを接合し
て各係止部12,24間を合致させることで各係
止部12,24の内部に一定幅で挟み込まれて支
持される。
そして、支持片2を介して発熱素線6を装置本
体に取り付ける取付手段として取付枠14A,1
4Bが設置されている。各取付枠14A,14B
には装置本体側に固定すべき固定部140が形成
され、この固定部140には、腕部10の厚みよ
り大きい幅を持つ立壁部142がL字形に形成さ
れ、この立壁部142に支持片2を支持させる支
持部144が固定部140とは反対側に立壁部1
42とL字形を成して形成されている。各取付枠
14A,14Bはインコネル板で一体に形成さ
れ、固定部140にはねじ孔16が形成されてい
る。したがつて、各取付枠14A,14Bは、第
2図に示すように、支持部144を相対向させて
装置本体側の内壁部分に配置され、各ねじ孔16
に固定手段としてのボルト18を似て取付部材と
して装置本体、即ち、炉本体20に固定される。
そして、取付片14A,14Bには、立壁部14
2の幅によつて支持片2の移動を許容する空間部
23が形成されている。
このように熱処理装置を構成すれば、炉本体2
0に対して取付枠14A,14Bをボルト18に
よつて取り付け、各取付枠14A,14Bに対し
て各支持片2を支持させるとともに、隣接する支
持片2,2の間に支持片4を挟み込み、両者の係
止部12,24間に発熱素線6を挿入すれば、第
3図に示すように、多数の発熱素線6は一定の間
隔で強固かつ簡単な構造で炉本体20に取り付け
ることができる。
そして、支持片2の背面部側には、取付枠14
A,14Bの立壁部142の幅が支持片2の腕部
10の厚みより大きいため、炉本体20の内壁部
と支持片2との間に空間部23が形成されるとと
もに、支持片2は取付枠14A,14Bに移動可
能に取り付けられている。即ち、空間部23によ
つて発熱素線6の移動が許容されるとともに支持
片2と炉本体20の内壁部との間に空気層が形成
され、この空気層によつて断熱機能及び蓄熱機能
が得られる。したがつて、発熱素線6の背面側に
形成された空気層が均熱効果に寄与し、熱膨張や
収縮による発熱素線6の変形に応じて支持片2が
取付枠内で移動するため、発熱素線6の形状変化
が空間部23で吸収され、熱的な変形による損傷
から発熱素線6が保護されている。
また、各支持片2,4によつて発熱素線6が支
持されるので、発熱素線6が湾曲しているような
場合にも、発熱素線6の炉本体20への組込みが
容易であり、熱処理装置の製造時間の短縮が図ら
れる。
さらに、支持片4の幅を加減すれば、任意の間
隔で発熱素線6の設置間隔を調整することがで
き、発熱分布を支持片4の幅によつても制御する
ことができる。
次に、第4図は、この発明の熱処理装置の具体
的な実施例を示す。この実施例では、発熱素線6
を設置すべき装置本体として円筒形の炉本体20
が用いられ、この炉本体20の内壁面部には取付
枠14A,14Bが長手方向に連続的に取り付け
られている。この場合、取付枠14A,14B
は、その炉本体20の内壁部にボルト18によつ
て固定される。各取付枠14A,14Bの間に支
持片2,4を以て例えば、コイル状を成す発熱素
線6が取り付けられている。
このような熱処理装置によれば、被熱処理物と
して半導体ウエハ等をボートとともに発熱素線6
の内側に搬入し、所望の熱処理を行うことができ
る。
次に、第5図及び第6図は、この発明の熱処理
装置の他の実施例を示す。
この実施例は、支持片2の係止部を突部13に
よつて構成したものであり、各突部13の上面部
を発熱素線6の外形に合わせて湾曲形状とし、同
様に、支持片4の係止部として支持片2に対応し
た突部25を形成し、その下側を発熱素線6に合
わせて湾曲形状としたものである。
そして、前記実施例の取付枠14A,14Bに
代えて、支持片2の腕部10を保持するコ字形状
を成す保持枠15を用いてもよい。この場合、保
持枠15には、装置本体側に固定すべき固定部1
50が形成され、この固定部150には立壁部1
52が腕部10の厚みより大きい高さでL字形に
形成されているとともに、支持片2を係止させる
係止部154が相対向して立壁部152に対して
L字形に形成されている。
したがつて、このような熱処理装置によつて
も、前記実施例と同様の作用効果が得られるとと
もに、前記実施例の取付14A,14Bが一つの
取付枠15として構成されているので、発熱素線
6を簡単な構造で強固に支持できる等の利点もあ
る。
また、第6図に示すように、支持片2のみで発
熱素線6を支持するようにしてもよく、このよう
にすれば、発熱素線6を支持片2の係止部12の
間隔で支持することができる。
The present invention will be described below with reference to embodiments shown in the drawings. 1 to 4 show an embodiment of the heat treatment apparatus of the present invention. As shown in FIG. 1, this heat treatment apparatus is provided with a first support piece 2 and an auxiliary second support piece 4, and each support piece 2, 4 is a member to be supported. In order to support the heating element wire 6, it is made of a heat insulating material with sufficient mechanical strength, such as ceramic. The support piece 2 has arm parts 10 integrally formed on the left and right sides of the top of the flat body part 8, and locking parts 12 forming recesses corresponding to the shape of the heating element wire 6 on both sides of the body part 8. This is what I did. In the case of this embodiment, the heating element wire 6 is a rod-shaped body with a circular cross section, and the locking part 12 is formed into a curved recess corresponding to the outer shape of the heating element wire 6 in order to sandwich the heating element wire 6. has been done. The support piece 2 is integrally formed with a body portion 8 and an arm portion 10 having a T-shape. Further, the support piece 4 is installed between the two support pieces 2 and is sandwiched between them, and the support piece 4 is disposed on the side surface corresponding to the locking part 12 of the support piece 2.
A locking portion 24 is formed in the form of a recess similar to the locking portion 12 of. Therefore, the heating element wire 6 is the third
As shown in the figure, by joining the support piece 2 and the support piece 4 so that the locking parts 12 and 24 match, the support piece 2 and the support piece 4 are sandwiched and supported at a constant width inside the locking parts 12 and 24. . Mounting frames 14A and 1 serve as mounting means for mounting the heat generating wire 6 to the main body of the device via the support piece 2.
4B is installed. Each mounting frame 14A, 14B
A fixing part 140 to be fixed to the main body of the device is formed on the fixing part 140, and an L-shaped standing wall part 142 having a width larger than the thickness of the arm part 10 is formed on this fixing part 140. The supporting part 144 that supports the standing wall part 1 is located on the opposite side of the fixing part 140.
42 and is formed in an L-shape. Each mounting frame 14A, 14B is integrally formed of an Inconel plate, and a screw hole 16 is formed in the fixing part 140. Therefore, as shown in FIG. 2, each mounting frame 14A, 14B is arranged on the inner wall portion of the device main body side with the supporting parts 144 facing each other, and each screw hole 16
Similar to the bolt 18 as a fixing means, it is fixed to the apparatus main body, ie, the furnace main body 20, as a mounting member.
The mounting pieces 14A, 14B have vertical wall portions 14.
A space 23 is formed by the width of 2 to allow movement of the support piece 2. If the heat treatment apparatus is configured in this way, the furnace body 2
Attach the mounting frames 14A, 14B to the mounting frame 14A, 14B with bolts 18, support each support piece 2 to each mounting frame 14A, 14B, and sandwich the support piece 4 between the adjacent support pieces 2, 2. By inserting the heat generating wires 6 between the locking portions 12 and 24 of the two, as shown in FIG. be able to. A mounting frame 14 is provided on the back side of the support piece 2.
Since the width of the vertical wall portions 142 of A and 14B is larger than the thickness of the arm portion 10 of the support piece 2, a space 23 is formed between the inner wall portion of the furnace body 20 and the support piece 2, and the support piece 2 It is movably attached to the mounting frames 14A and 14B. That is, the space 23 allows the movement of the heat generating wire 6, and an air layer is formed between the support piece 2 and the inner wall of the furnace body 20, and this air layer provides a heat insulation function and a heat storage function. is obtained. Therefore, the air layer formed on the back side of the heat generating wire 6 contributes to the heat uniformity effect, and the support piece 2 moves within the mounting frame in accordance with the deformation of the heat generating wire 6 due to thermal expansion or contraction. The change in shape of the heat generating wire 6 is absorbed by the space 23, and the heat generating wire 6 is protected from damage due to thermal deformation. Furthermore, since the heating element wire 6 is supported by each of the support pieces 2 and 4, it is easy to assemble the heating element wire 6 into the furnace body 20 even when the heating element wire 6 is curved. Therefore, the manufacturing time of the heat treatment equipment can be shortened. Furthermore, by adjusting the width of the support piece 4, the installation interval of the heating element wires 6 can be adjusted to any desired interval, and the heat generation distribution can also be controlled by the width of the support piece 4. Next, FIG. 4 shows a specific embodiment of the heat treatment apparatus of the present invention. In this embodiment, the heating element wire 6
A cylindrical furnace body 20 is used as the equipment body in which the
Attachment frames 14A and 14B are continuously attached to the inner wall surface of the furnace body 20 in the longitudinal direction. In this case, mounting frames 14A, 14B
is fixed to the inner wall of the furnace body 20 with bolts 18. For example, a heating element wire 6 having a coil shape is attached between the mounting frames 14A and 14B using support pieces 2 and 4. According to such a heat treatment apparatus, semiconductor wafers and the like as the objects to be heat treated are transported together with the boat and the heat generating wire 6.
can be carried inside and subjected to desired heat treatment. Next, FIGS. 5 and 6 show another embodiment of the heat treatment apparatus of the present invention. In this embodiment, the locking portion of the support piece 2 is formed by protrusions 13, and the upper surface of each protrusion 13 is curved to match the outer shape of the heating element wire 6. A protrusion 25 corresponding to the support piece 2 is formed as a locking part of the piece 4, and its lower side is curved to match the heating element wire 6. In place of the mounting frames 14A and 14B of the embodiment described above, a U-shaped holding frame 15 for holding the arm portion 10 of the support piece 2 may be used. In this case, the holding frame 15 includes a fixing portion 1 to be fixed to the device main body.
50 is formed, and this fixed part 150 has a standing wall part 1
52 is formed in an L shape with a height greater than the thickness of the arm portion 10, and a locking portion 154 for locking the support piece 2 is formed in an L shape with respect to the vertical wall portion 152 facing oppositely. . Therefore, even with such a heat treatment apparatus, the same effects as those of the above embodiment can be obtained, and since the mountings 14A and 14B of the above embodiment are configured as one mounting frame 15, the heating element Another advantage is that the wire 6 can be firmly supported with a simple structure. Further, as shown in FIG. 6, the heat generating wire 6 may be supported only by the support piece 2. In this way, the heat generating wire 6 can be supported at the interval between the locking portions 12 of the support piece 2. can be supported.
以上説明したように、この発明によれば、装置
本体に発熱素線を強固に取り付けることができる
とともに、発熱素線を支持する支持片と装置本体
との間に空間部が形成されているので、この空間
部における空気相が断熱機能及び蓄熱機能を持つ
ことから、発熱素線の発熱が支持片を介して熱処
理装置外部へ放熱されることがなく、支持片部分
からの部分的な放熱が減少し、被熱処理物に対す
る均熱加熱を得ることができ、しかも、発熱素線
の熱膨張、収縮による機械的な変形を許容し、発
熱素線の膨張、収縮等の内部応力による損傷を効
果的に防止でき、均熱効果の向上とともに発熱素
線の耐久性を維持助長させることができる。
As explained above, according to the present invention, the heat generating wire can be firmly attached to the device main body, and a space is formed between the support piece that supports the heat generating wire and the device main body. Since the air phase in this space has a heat insulating function and a heat storage function, the heat generated by the heating element wire is not radiated to the outside of the heat treatment apparatus via the support piece, and partial heat radiation from the support piece is prevented. It is possible to obtain uniform heating of the object to be heat-treated, and also allows mechanical deformation due to thermal expansion and contraction of the heating element wire, effectively preventing damage caused by internal stress such as expansion and contraction of the heating element wire. It is possible to improve the heat uniformity effect and maintain and promote the durability of the heating element wire.
第1図はこの発明の熱処理装置の実施例を示す
分解斜視図、第2図は第1図に示した熱処理装置
の組立状態を示す断面図、第3図は第2図に示し
た熱処理装置の−線断面図、第4図はこの発
明の熱処理装置の一実施例である全体的構成を示
す断面図、第5図はこの発明の熱処理装置の他の
実施例を示す分解斜視図、第6図はこの発明の熱
処理装置の他の実施例を示す断面図である。
2……第1の支持片、4……第2の支持片、6
……発熱素線、8……胴体部、10……腕部、1
2,24……係止部、13,25……係止部とし
ての突部、14A,14B,15……取付枠、2
0……炉本体(装置本体)、23……空間部、1
44……支持部。
FIG. 1 is an exploded perspective view showing an embodiment of the heat treatment apparatus of the present invention, FIG. 2 is a sectional view showing the assembled state of the heat treatment apparatus shown in FIG. 1, and FIG. 3 is the heat treatment apparatus shown in FIG. 2. FIG. 4 is a cross-sectional view showing the overall configuration of one embodiment of the heat treatment apparatus of the present invention, and FIG. 5 is an exploded perspective view showing another embodiment of the heat treatment apparatus of the present invention. FIG. 6 is a sectional view showing another embodiment of the heat treatment apparatus of the present invention. 2...First support piece, 4...Second support piece, 6
...Heating element wire, 8...Body part, 10...Arm part, 1
2, 24...Locking part, 13, 25...Protrusion as a locking part, 14A, 14B, 15...Mounting frame, 2
0...Furnace body (apparatus main body), 23...Space part, 1
44...Support part.
Claims (1)
部又は一部を包囲する発熱素線と、 この発熱素線を係止部に係止させて挟み込む胴
体部とともにこの胴体部に一体に形成された腕部
を以て前記発熱素線を支持する支持片と、 この支持片の前記腕部を支持部に支持させて前
記発熱素線を前記装置本体に取り付け、前記支持
片と前記装置本体との間に空気層を形成するとと
もに前記支持片の移動を許容する空間部を形成し
た取付枠と、 を備えたことを特徴とする熱処理装置。[Scope of Claims] 1. A heating element wire installed in the apparatus main body and surrounding all or part of the circumferential surface of the object to be heat treated, together with a body part that locks and holds the heating element wire in a locking part. a support piece that supports the heat generating wire with an arm integrally formed on a body portion; the arm portion of the support piece is supported by the support portion to attach the heat generating wire to the device main body; and a mounting frame that forms an air layer between the support piece and the apparatus main body, and a space that allows movement of the support piece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1256686A JPS62170186A (en) | 1986-01-23 | 1986-01-23 | Supporter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1256686A JPS62170186A (en) | 1986-01-23 | 1986-01-23 | Supporter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62170186A JPS62170186A (en) | 1987-07-27 |
| JPH0410199B2 true JPH0410199B2 (en) | 1992-02-24 |
Family
ID=11808902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1256686A Granted JPS62170186A (en) | 1986-01-23 | 1986-01-23 | Supporter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62170186A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH079036Y2 (en) * | 1990-11-13 | 1995-03-06 | 東京エレクトロン東北株式会社 | Vertical heat treatment furnace |
| JPH10233277A (en) * | 1997-02-18 | 1998-09-02 | Tokyo Electron Ltd | Heat treatment equipment |
| US6807220B1 (en) * | 2003-05-23 | 2004-10-19 | Mrl Industries | Retention mechanism for heating coil of high temperature diffusion furnace |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367941U (en) * | 1976-11-10 | 1978-06-07 | ||
| JPS561116U (en) * | 1979-06-19 | 1981-01-08 | ||
| JPS5623675U (en) * | 1979-07-30 | 1981-03-03 |
-
1986
- 1986-01-23 JP JP1256686A patent/JPS62170186A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62170186A (en) | 1987-07-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |