JPH0410403A - High heat-resistant multilayered magnetic film and magnetic head using the same - Google Patents
High heat-resistant multilayered magnetic film and magnetic head using the sameInfo
- Publication number
- JPH0410403A JPH0410403A JP11000190A JP11000190A JPH0410403A JP H0410403 A JPH0410403 A JP H0410403A JP 11000190 A JP11000190 A JP 11000190A JP 11000190 A JP11000190 A JP 11000190A JP H0410403 A JPH0410403 A JP H0410403A
- Authority
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- Japan
- Prior art keywords
- film
- intermediate layer
- flux density
- magnetic
- multilayer
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
[産業上の利用分野]
本発明は高飽和磁束密度、高透磁率を有する磁性膜に関
し、特に熱安定性の高い多層磁性膜およびそれをコア材
に用いた、磁気ディスク装置やVTRなどに用いて好適
な磁気八ツ1くに関する。
[従来の技術]
磁気記録の高密度化に伴い、高保磁力媒体にも十分な書
き込みが可能なMIG (メタル インギャップ: M
etal in Gap)ヘッドが最近性[]されてい
る。しかし、MIGヘッドはガラスボンディングという
高温プロセスを必要とするため、熱安定性の高い磁性膜
が要求される。MIGヘッドに用いられる比較的熱安定
性の高い磁性膜としてはCo系の非晶質合金、センダス
ト合金さらには特開昭62−210607に示された(
Fe、Co、Ni)MNで表されるような窒素を含む磁
性合金などが知られている。ここで、MはZr、Nb、
Ti、Mo、Ta、Hf、WCrより成る群から選択さ
れた金属である。[Industrial Application Field] The present invention relates to a magnetic film having high saturation magnetic flux density and high magnetic permeability, and in particular to a multilayer magnetic film with high thermal stability and use in magnetic disk devices, VTRs, etc. using the same as a core material. The present invention relates to a preferred magnetic field. [Prior art] With the increasing density of magnetic recording, MIG (Metal In Gap: M
etal in Gap) head is recent [ ]. However, since the MIG head requires a high-temperature process called glass bonding, a magnetic film with high thermal stability is required. Magnetic films with relatively high thermal stability used in MIG heads include Co-based amorphous alloys, Sendust alloys, and the one disclosed in JP-A-62-210607 (
Magnetic alloys containing nitrogen such as Fe, Co, Ni)MN are known. Here, M is Zr, Nb,
The metal is selected from the group consisting of Ti, Mo, Ta, Hf, and WCr.
上記従来技術に述べられているようなCo系の非晶質合
金、センダスト合金さらには(Fe、Co、Ni)MN
合金などを用いると、磁気ヘッドに供されるような特性
を示す磁性膜の飽和磁束密度は最大で1.4〜1.5T
、耐熱温度は600〜700 ’Cと報告されている。
しかし、飽和磁束密度が最大となる組成領域では耐熱温
度が低く、飽和磁束密度と耐熱温度をともに満足するよ
うな磁性膜に関する報告はない。
本発明の目的は、上記従来技術よりも高い飽和磁束密度
を有し、しかも熱安定性の高い多層磁性膜およびこれを
用いた高密度磁気記録用の磁気ヘッドを堤供することに
ある。
【課題を解決するための手段]
本発明者等は膜の飽和磁束密度への影響が小さく、しか
もγ相を析出しにくい材料を中間層に用いることによっ
て、熱安定性が高く、高飽和磁束密度を有する多層磁性
膜が得られることを明らかにした。
また、本発明の多層磁性膜を磁気ヘットの磁気回路の少
なくとも一部に用いることにより、優れた記録再生特性
を有する磁気ヘッドを得ることができる。
[作用]
本発明者等はF e CHf / N i F e合金
多層膜の磁気特性に及ぼす熱処理の影響について検討し
、高温熱処理時に飽和磁束密度が低下する原因が、膜中
へのγ相の析出によるものであることを見出した。また
、このγ相の析出はFe系主磁性暎と中間層との相互拡
散が原因であることを明らかにした。
本発明は膜の飽和磁束密度への影響が小さく、γ相を析
出しにくい材料を中間層に用いた、高飽和磁束密度、高
耐熱性を有する多層磁性膜に関する。
[実施例]
以下に本発明の一実施例について、図を参照しながら説
明する。実験の結果、本発明による中間層の効果はFe
C系、Fe3系さらにFeN系合金などの主磁性膜の違
いよる差がほとんど見られないことから、以下の実施例
では主にFeC系合金多層膜を例に説明する。
〔実施例1〕
磁性簿膜の作製にはイオンビームスパッタリング装置を
用いた。スパッタリングは以下の条件で行なった。
イオンガス ・・・・・・・・・・・・ ArArガス
圧力 ・・・・・・・・・・・・ 2.5X10””P
aイオンガン加速電圧 ・・・・・・・・・・・・ 1
00OVイオンガンイオン電流 ・・・・・・・・・・
・ 120mAターゲット・基板間距離 ・・・・・・
・・・・・127mrn本実施例ではFeターゲット上
にCと耐熱性向上用にI−1fチップを貼付けたF e
CHf複合ターゲットを主磁性膜用に用い、FeTa
合金ターゲットを中間層用に用いて多層膜を形成した。
また比較のためにNiFe合金ターゲットを中間層用に
用いた多層膜も形成した。基板にはコーニング社製70
59ガラスを用いた。作製した膜の組成は主磁性膜がF
e5sC2I−If3、中間層膜がFe、。
T al。およびN 180 F ezo (いずれも
at%)であった。
第1図は1周期の膜厚を50nm一定とし、主磁性膜と
中間層の膜厚の割合を変えた多層磁性膜の保磁力の変化
である。試料は各々10周期積層し、全膜厚はおよそ5
00nmである。膜の保磁力は中間層膜厚がOnm、す
なわちFeCHf単層膜では約700A/mと高い保磁
力を示すが、中間層膜厚が2nm以上になると保磁力は
急激に低下し、約5nmで極小値を示したのち、増加の
傾向を示した。断面の透過電子顕微鏡像をi察した結果
、中間層膜厚の薄い2nm以下の多層膜では中間層の効
果が不十分なためにF e CHf膜がエピタキシャル
成長をし、結晶粒の粗大化によって軟磁気特性が劣化し
たことが明らかとなった。
このため1周期の膜厚が50nmのFeC系多層膜では
中間層膜厚を約2〜10nmの範囲にするのが望ましい
。
また、1周期の膜厚が30nmと1100nのFeC系
多層膜についても中間層膜厚の効果を検討した結果、同
様に中間層膜厚が約2〜10nmの範囲で優れた軟磁気
特性を示し、優れた軟磁気特性を示す中間層の範囲は1
周期の膜厚にはあまり影響しないことが明らかとなった
。
第1図には飽和磁束密度の値も示した。飽和磁束密度は
中間層膜厚がOnmのF e CHf単層膜の約2.0
5Tから中間層膜厚が厚くなるほど低下し、中間層膜厚
が10nmでは約1,95T(FeTa中間層膜)と1
.85T (Ni Fe中間層膜)であった。また、同
図には非磁性の8102膜を中間層に用いた多層膜の結
果も示したが、中間層膜厚が10nmでは約1.4Tと
上記多層膜に比へて極めて低く、Fe系の中間層が高飽
和磁束密度材料を得るためには有利であることが分かる
。
第2図に、膜の熱安定性を調べるために中間層膜厚が1
0nmの上記多層膜について300〜700℃の範囲内
で熱処理を行ない、磁化容易軸方向の保磁力と飽和磁束
密度の変化を調べた結果を示す。上記熱処理の条件はア
ルゴンガス雰囲気中で、上記の各温度に1時間保持であ
る。また熱処理は80kA/m (1kOe)の直流磁
界中で行なった。
膜の保磁力はいずれの中間層を用いた多層膜においても
600°Cまでは160A/m以下の優れた特性を示し
たが、NiFe中間層を用いた多層膜では650℃で、
またFeTa中間層を用いた多層膜では700℃で保磁
力は急激に増加した。
飽和磁束密度の熱処理による影響も中間層材料によって
異なっていた。FeTa中間層からなる多層膜では、7
00℃の熱処理によっても飽和磁束密度はほとんど変化
しないのに対し、NiFe中間層を用いた多層膜では、
600°Cで飽和磁束密度は1.6Tに低下し、700
℃では0.5Tまで低下した。
このように熱処理によって飽和磁束密度が変化した原因
を調べるため、X線回折法により膜の結晶配向性を調べ
た。その結果、F e T a中間層からなる多層膜で
はα−Feに起因する(110)回折ピークのみ観察さ
れたのに対し、NiFe中間層を用いた多層膜で、飽和
磁束密度が低下した膜ではα−Feに起因する(110
)回折ピーク以外に、γ−Feに起因する(111)回
折ピークも観察され、このγ−Feの析出が飽和磁束密
度の低下の原因とも考えられた。
第3図に、600℃で熱処理した各種多層膜について膜
中のγ相の割合と飽和磁束密度の低下量との関係を調べ
た結果を示す。ここで、γ相の割合は、図に示したよう
にX線回折パターンにおけるa−Feの(110)回折
強度をI (α) 、 y−Feの(111)回折強度
をI (y)とし、次式
%式%()
から求めた。
本実施例の範囲内では、回折ピークはα相とγ相に対応
するものだけで、それ以外はill 13されなかった
。膜中のγ相の割合と飽和磁束密度の低下量との間には
相関が見られ、γ相の割合が高いほど飽和磁束密度の低
下量が大きい。このことから、熱処理によって飽和磁束
密度が低下することの原因は、膜中へのγ相の析出が原
因であることが明らかとなった。また、このようなγ相
の析出はFeC系主磁性膜と中間層間での相互拡散が原
因であることもAES (オージェ電子分光法)による
膜深さ方向の分析から分かった。
次に、各種多層膜を作製し、γ相の析出による膜の軟磁
気特性への影響について調べた。
第4図は主磁性膜材料、中間層材料の異なる各種多層膜
を600℃で熱処理し、膜中に析出するγ相の割合と磁
化容易軸方向の保磁力との関係を調べた結果である。こ
こで、γ相の割合はα相とγ相以外の析出相による主回
折ピーク強度の総和(例えば、生成された各種炭化物に
対応する回折ピーク強度の和)を■(0)とし、上述し
た式の分母にこのI(0)を加え、次式
%式%(0))
から求めた。図中、O印はFeC系多層膜、0印はFe
B系多系膜層膜印はFeN系多層膜についての結果であ
る。
同図から、FeC,FeB、FeN系いずれの多層膜に
おいても、膜中に析出するγ相の割合が約20%以下で
あれば160A/m以下の優れた軟磁気特性を示し、γ
相の割合が約20%を超えると保磁力は急激に増加する
傾向を示した。このことから、優れた軟磁気特性の膜を
得るためには膜中に析出するγ相の割合が20%以下で
ある必要があることが明らかとなった。
第1図で多層膜の軟磁気特性は中間層膜厚の影響を受け
ることが明らかとなったが、中間層の組成によっても変
化することが考えられる。そこで、軟磁気特性におよぼ
す中間層材料組成の影響について調べた。
第1表は主磁性膜にFe9SC2Hf−1中間層にFe
−)1f、Fe−Ta、Fe−Ni、Fe−Ru合金薄
膜を用いた多層膜を600 ’Cで熱処理した後の軟磁
気特性、飽和磁束密度と中間層組成との関係を調べた結
果である。膜厚はそれぞれ40nm、10nmとし、全
膜厚はおよそ500nmである。
上記第1表の保磁力HeでOは100A/m以下、○は
160A/m以下、Xは160A/m以上を示し、また
飽和磁束密度Bsで◎は1.8T以上、Oは1.6T以
上、Xは1.6T以下を示す。
第1表から、Feへの添加量が2at%以下の中間層で
は、保磁力Hcはいずれも160A/m以上と高い値を
示すのに対し、添加量が5at%を超えると優れた軟磁
気特性を示した。断面の透過電子顕微鏡像を観察した結
果、添加量が2at%以下の中間層を用いた多層膜では
、中間層が不明瞭で、しかもエピタキシャル成長による
結晶粒成長が起こっているのに対し、添加量が5at%
を超えた中間層を用いた多層膜では、中間層による多層
化の効果が確認出来た。
さらに他の元素についても実験した結果、Fe−I(f
、Fe−Taのように体心立方構造(beC)の元素を
Feに添加した中間層からなる多層膜はいずれも添加量
が5at%を超えると優れた軟磁気特性と高い飽和磁束
密度を示した。これに対し、Fe Ni、Fe−Ru
のようにγ相を生成しやすい面心立方構造(feC)や
六方晶構造(hcp)の元素をFeに添加した中間層か
らなる多層膜では、上述した体心立方構造(b c c
)の元素をFeに添加した中間層からなる多層膜とは異
なり、添加量が多くなると軟磁気特性や飽和磁束密度が
劣化するため、主磁性膜膜厚をtよ、中間層(Fe1−
xMx)膜厚をt2とし、添加量iMの量をXとすると
、最大添加量としては次式%式%
のような関係を満たす必要がある。
また、本発明によるFCC,FeB、FeN系の多層膜
はFeを主成分とするため、NiFe合金やFeAlS
i合金に比べて若干耐食性が劣る傾向がみられるが、耐
食性向上元素としてRu。
Rh、Ptなどの元素を約0.5〜3at%添加するこ
とにより、高飽和磁束密度で、熱安定性が高く、シかも
FeAlSi合金以上の耐食性を示す多層磁性膜が得ら
れた。
以上の結果、中間層材料としてはγ相を生成しにくい体
心立方構造やFe−richの面心立方構造の材料が望
ましく、これ等の中間層を用いることにより、高飽和磁
束密度で、熱安定性の高い多層磁性膜が得られる。
〔実施例2〕
次に、F e CHf / F e T a多層磁性膜
を用いたVTR用磁気ヘット(第5図)を作製し、磁気
ヘッドの記録再生特性を調べた。VTR用磁気ヘッドは
特開昭62−60113の工程を用い゛C作製した。
本実施例に用いたF e CHf / F e T a
多層磁性膜は主磁性膜10として膜厚45nmのF C
9゜C2Hf、膜、中間層11として膜厚5nmのFe
、。Ta工。膜を用い、100周期積層し、膜厚は約5
μmとした。基板にはM n −Z nフェライトを用
い、充填用のガラスには軟化温度が450〜500℃の
pb系ガラスを用い、480 °Cと630℃の温度で
ヘッドブロック接合を行った。
本発明の磁気ヘッドの記録再生特性を保磁力120kA
’/m (15000e)のメタルテープを用いて測定
した。この結果を第2表に示す。また、参考のために飽
和磁束密度が約1.9TのF e、5C2T a 3
/ N 1 so F e 20多層磁性膜を用いた磁
気ヘッドについての結果も示す。
第2表に示すように、本発明による多層磁性膜を用いた
磁気ヘッドの再生出力は、ガラス接着温度が480℃と
低温の場合には、従来の代表的な高飽和磁束密度材料で
あるFeCTa/NiFe多層磁性膜を用いた磁気ヘッ
トとほぼ同等であるが、ガラス接着温度が630 ’C
でも低温接着時と同様の特性を有し、高温で接着した従
来型ヘットの約4〜5倍の再生出力であった。
第2表
*ニガラス接着温度での膜の飽和磁束密度このように従
来のNi Feを中間層とする多層膜で再生出力が低下
する原因は、高融点のpb系ガラスを用いたガラスボン
ディングの工程で、膜中にγ相が析出し、膜の飽和磁束
密度が低下するため、このような磁気ヘッドではメタル
テープのような高保磁力媒体に充分な書き込みが出来な
いことと、熱処理によって多層磁性膜の軟磁気特性が劣
化したためである。これに対し、本発明による多層磁性
膜では第2図に示されるように、熱処理による膜の軟磁
気特性、飽和磁束密度の劣化がなく、良好な記録再生特
性が得られた。
[発明の効果]
以上説明したごとく、膜の飽和磁束密度への影響が小さ
く、γ相を析出しにくい材料を中間層に用いることによ
り、高飽和磁束密度で、しかも耐熱性の高い多層磁性膜
が得られた。また、本発明の多層磁性膜を磁気回路の少
なくとも一部に用いることにより、優れた記録再生特性
を有する磁気ヘッドを得ることが出来る。Co-based amorphous alloys, sendust alloys, and (Fe, Co, Ni) MN as described in the above-mentioned prior art
When alloys are used, the saturation magnetic flux density of a magnetic film exhibiting characteristics suitable for magnetic heads is at most 1.4 to 1.5 T.
, the heat resistance temperature is reported to be 600-700'C. However, in the composition range where the saturation magnetic flux density is maximum, the heat resistance temperature is low, and there are no reports regarding a magnetic film that satisfies both the saturation magnetic flux density and the heat resistance temperature. An object of the present invention is to provide a multilayer magnetic film that has a higher saturation magnetic flux density than the above-mentioned prior art and has high thermal stability, and a magnetic head for high-density magnetic recording using the multilayer magnetic film. [Means for Solving the Problems] The present inventors have achieved high thermal stability and high saturation magnetic flux by using a material for the intermediate layer that has a small effect on the saturation magnetic flux density of the film and is difficult to precipitate the γ phase. It was revealed that a multilayer magnetic film with high density can be obtained. Further, by using the multilayer magnetic film of the present invention in at least a part of the magnetic circuit of a magnetic head, a magnetic head having excellent recording and reproducing characteristics can be obtained. [Function] The present inventors investigated the influence of heat treatment on the magnetic properties of Fe CHf/Ni Fe alloy multilayer films, and found that the cause of the decrease in saturation magnetic flux density during high temperature heat treatment is due to the γ phase entering the film. It was found that this was due to precipitation. It was also revealed that the precipitation of the γ phase was caused by mutual diffusion between the Fe-based main magnetic layer and the intermediate layer. The present invention relates to a multilayer magnetic film having a high saturation magnetic flux density and high heat resistance, using a material in the intermediate layer that has a small influence on the saturation magnetic flux density of the film and does not easily precipitate the γ phase. [Example] An example of the present invention will be described below with reference to the drawings. As a result of experiments, the effect of the intermediate layer according to the present invention is
Since there is almost no difference between main magnetic films such as C-based, Fe3-based, and FeN-based alloys, the following examples will mainly be explained using FeC-based alloy multilayer films. [Example 1] An ion beam sputtering device was used to prepare a magnetic film. Sputtering was performed under the following conditions. Ion gas ・・・・・・・・・・・・ ArAr gas pressure ・・・・・・・・・・・・ 2.5X10””P
a Ion gun accelerating voltage ・・・・・・・・・・・・ 1
00OV ion gun ion current ・・・・・・・・・・・・
・120mA target-to-board distance ・・・・・・
・・・・・・127mrnIn this example, an Fe target with carbon and an I-1f chip attached to improve heat resistance was used.
A CHf composite target is used for the main magnetic film, and FeTa
A multilayer film was formed using an alloy target for the intermediate layer. For comparison, a multilayer film using a NiFe alloy target for the intermediate layer was also formed. The board is Corning 70
59 glass was used. The composition of the fabricated film is such that the main magnetic film is F.
e5sC2I-If3, the intermediate layer film is Fe. T al. and N 180 F ezo (both at%). FIG. 1 shows the change in coercive force of a multilayer magnetic film in which the thickness of one period was constant at 50 nm and the ratio of the film thicknesses of the main magnetic film and the intermediate layer was changed. Each sample was stacked for 10 cycles, and the total film thickness was approximately 5
00 nm. The coercive force of the film is as high as about 700 A/m when the intermediate layer thickness is Onm, that is, a FeCHf single layer film, but when the intermediate layer thickness becomes 2 nm or more, the coercive force decreases rapidly, and at about 5 nm. After showing a minimum value, it showed an increasing trend. As a result of observing cross-sectional transmission electron micrographs, we found that in multilayer films with a thin intermediate layer thickness of 2 nm or less, the effect of the intermediate layer is insufficient, so the F e CHf film grows epitaxially, and becomes soft due to coarsening of crystal grains. It became clear that the magnetic properties had deteriorated. For this reason, in a FeC multilayer film in which the thickness of one period is 50 nm, it is desirable that the intermediate layer thickness be in the range of about 2 to 10 nm. In addition, as a result of examining the effect of the intermediate layer thickness on FeC-based multilayer films with one period thickness of 30 nm and 1100 nm, it was found that similarly excellent soft magnetic properties were obtained when the intermediate layer thickness was in the range of approximately 2 to 10 nm. , the range of the intermediate layer exhibiting excellent soft magnetic properties is 1
It became clear that the period did not have much effect on the film thickness. Figure 1 also shows the value of the saturation magnetic flux density. The saturation magnetic flux density is approximately 2.0 for a Fe CHf single layer film with an intermediate layer thickness of Onm.
It decreases as the intermediate layer thickness increases from 5T, and when the intermediate layer thickness is 10 nm, it becomes approximately 1.95T (FeTa intermediate layer film) and 1
.. 85T (Ni Fe intermediate layer film). The same figure also shows the results of a multilayer film using a non-magnetic 8102 film as the intermediate layer, but when the intermediate layer thickness is 10 nm, it is approximately 1.4T, which is extremely low compared to the above multilayer film. It turns out that an intermediate layer of is advantageous for obtaining a high saturation magnetic flux density material. Figure 2 shows that the intermediate layer thickness is 1 to investigate the thermal stability of the film.
The above multilayer film with a thickness of 0 nm was subjected to heat treatment within the range of 300 to 700°C, and the results of examining changes in coercive force and saturation magnetic flux density in the direction of the easy axis of magnetization are shown. The conditions for the heat treatment are to maintain each of the above temperatures for 1 hour in an argon gas atmosphere. The heat treatment was performed in a DC magnetic field of 80 kA/m (1 kOe). The coercive force of the film showed an excellent property of 160 A/m or less up to 600°C in the multilayer film using any of the intermediate layers, but at 650°C, the coercive force of the multilayer film using the NiFe intermediate layer showed excellent properties.
Furthermore, in the multilayer film using the FeTa intermediate layer, the coercive force increased rapidly at 700°C. The effect of heat treatment on saturation magnetic flux density also differed depending on the intermediate layer material. In a multilayer film consisting of an FeTa intermediate layer, 7
Although the saturation magnetic flux density hardly changes even after heat treatment at 00°C, in a multilayer film using a NiFe intermediate layer,
At 600°C, the saturation magnetic flux density decreases to 1.6T and 700°C.
The temperature decreased to 0.5T at ℃. In order to investigate the cause of this change in saturation magnetic flux density due to heat treatment, the crystal orientation of the film was investigated using X-ray diffraction. As a result, only the (110) diffraction peak due to α-Fe was observed in the multilayer film consisting of the FeTa intermediate layer, whereas the multilayer film with the NiFe intermediate layer had a decreased saturation magnetic flux density. Then, it is caused by α-Fe (110
) In addition to the diffraction peak, a (111) diffraction peak due to γ-Fe was also observed, and the precipitation of γ-Fe was considered to be the cause of the decrease in the saturation magnetic flux density. FIG. 3 shows the results of investigating the relationship between the proportion of γ phase in the film and the amount of decrease in saturation magnetic flux density for various multilayer films heat-treated at 600°C. Here, the ratio of the γ phase is determined by assuming that the (110) diffraction intensity of a-Fe in the X-ray diffraction pattern is I (α) and the (111) diffraction intensity of y-Fe is I (y), as shown in the figure. , calculated from the following formula % formula % (). Within the scope of this example, the diffraction peaks were only those corresponding to the α and γ phases, and the others were not illuminated. There is a correlation between the ratio of γ phase in the film and the amount of decrease in saturation magnetic flux density, and the higher the ratio of γ phase, the greater the amount of decrease in saturation magnetic flux density. From this, it became clear that the cause of the decrease in saturation magnetic flux density due to heat treatment was the precipitation of γ phase into the film. Further, it was found from analysis in the film depth direction by AES (Auger electron spectroscopy) that such precipitation of the γ phase is caused by mutual diffusion between the FeC-based main magnetic film and the intermediate layer. Next, various multilayer films were fabricated and the influence of γ phase precipitation on the soft magnetic properties of the films was investigated. Figure 4 shows the results of heat-treating various multilayer films with different main magnetic film materials and intermediate layer materials at 600°C, and investigating the relationship between the proportion of γ phase precipitated in the film and the coercive force in the direction of the axis of easy magnetization. . Here, the ratio of the γ phase is determined by assuming that the sum of the main diffraction peak intensities due to the α phase and the precipitated phases other than the γ phase (for example, the sum of the diffraction peak intensities corresponding to the various carbides produced) is (0), and This I(0) was added to the denominator of the formula, and it was calculated from the following formula. In the figure, O mark is FeC-based multilayer film, 0 mark is FeC-based multilayer film, and 0 mark is FeC-based multilayer film.
The B-based multi-layer film mark is the result for the FeN-based multi-layer film. From the same figure, any multilayer film of FeC, FeB, or FeN system exhibits excellent soft magnetic properties of 160 A/m or less if the ratio of γ phase precipitated in the film is about 20% or less, and γ
When the phase ratio exceeded about 20%, the coercive force showed a tendency to increase rapidly. From this, it has become clear that in order to obtain a film with excellent soft magnetic properties, the ratio of the γ phase precipitated in the film needs to be 20% or less. Although it is clear from FIG. 1 that the soft magnetic properties of the multilayer film are affected by the thickness of the intermediate layer, it is also thought to vary depending on the composition of the intermediate layer. Therefore, we investigated the influence of the intermediate layer material composition on the soft magnetic properties. Table 1 shows Fe9SC2Hf-1 in the main magnetic film and Fe in the intermediate layer.
-) 1f, the results of investigating the relationship between soft magnetic properties, saturation magnetic flux density, and intermediate layer composition after heat-treating multilayer films using Fe-Ta, Fe-Ni, and Fe-Ru alloy thin films at 600'C. be. The film thicknesses are 40 nm and 10 nm, respectively, and the total film thickness is approximately 500 nm. In the above Table 1, in the coercive force He, O indicates 100 A/m or less, ○ indicates 160 A/m or less, and X indicates 160 A/m or more, and in the saturation magnetic flux density Bs, ◎ indicates 1.8 T or more, and O indicates 1.6 T. In the above, X indicates 1.6T or less. From Table 1, in the intermediate layer where the amount of Fe added is 2 at% or less, the coercive force Hc shows a high value of 160 A/m or more, whereas when the amount of Fe added exceeds 5 at%, excellent soft magnetic The characteristics were shown. As a result of observing cross-sectional transmission electron micrographs, it was found that in multilayer films using an intermediate layer with an additive amount of 2 at% or less, the intermediate layer was unclear and crystal grain growth occurred due to epitaxial growth, whereas the additive amount is 5at%
In a multilayer film using an intermediate layer exceeding 100%, the effect of multilayering due to the intermediate layer was confirmed. Furthermore, as a result of experiments with other elements, Fe-I (f
, a multilayer film consisting of an intermediate layer in which Fe is doped with a body-centered cubic structure (BEC) element such as Fe-Ta exhibits excellent soft magnetic properties and high saturation magnetic flux density when the addition amount exceeds 5 at%. Ta. On the other hand, FeNi, Fe-Ru
In a multilayer film consisting of an intermediate layer in which Fe is doped with elements having a face-centered cubic structure (FEC) or a hexagonal structure (HCP) that easily generates the γ phase, the above-mentioned body-centered cubic structure (b c c
) is different from a multilayer film consisting of an intermediate layer in which Fe is doped with the element Fe1-.
xMx) When the film thickness is t2 and the amount of addition iM is X, the maximum addition amount needs to satisfy the following relationship. In addition, since the FCC, FeB, and FeN-based multilayer film according to the present invention has Fe as its main component, NiFe alloy and FeAlS
Although the corrosion resistance tends to be slightly inferior compared to the i alloy, Ru is an element that improves corrosion resistance. By adding approximately 0.5 to 3 at % of elements such as Rh and Pt, a multilayer magnetic film was obtained that had a high saturation magnetic flux density, high thermal stability, and exhibited corrosion resistance superior to that of FeAlSi alloys. As a result of the above, it is desirable that the intermediate layer material has a body-centered cubic structure or Fe-rich face-centered cubic structure, which is difficult to generate the γ phase. A highly stable multilayer magnetic film can be obtained. [Example 2] Next, a VTR magnetic head (FIG. 5) using the F e CHf / F e Ta multilayer magnetic film was manufactured, and the recording and reproducing characteristics of the magnetic head were investigated. A magnetic head for a VTR was manufactured using the process disclosed in Japanese Patent Application Laid-Open No. 62-60113. F e CHf / F e Ta used in this example
The multilayer magnetic film has a film thickness of 45 nm as the main magnetic film 10.
9° C2Hf, film, 5 nm thick Fe as intermediate layer 11
,. Ta engineering. The film was laminated 100 times, and the film thickness was approximately 5
It was set as μm. Mn-Zn ferrite was used for the substrate, PB glass having a softening temperature of 450 to 500°C was used for the filling glass, and head block bonding was performed at temperatures of 480°C and 630°C. The recording and reproducing characteristics of the magnetic head of the present invention have a coercive force of 120 kA.
Measurements were made using a metal tape of '/m (15000e). The results are shown in Table 2. Also, for reference, Fe with a saturation magnetic flux density of about 1.9T, 5C2T a3
/N 1 so Fe 20 Results for a magnetic head using a multilayer magnetic film are also shown. As shown in Table 2, when the glass bonding temperature is as low as 480°C, the reproduction output of the magnetic head using the multilayer magnetic film according to the present invention is /Almost equivalent to a magnetic head using a NiFe multilayer magnetic film, but the glass bonding temperature is 630'C.
However, it had the same characteristics as when bonded at a low temperature, and the playback output was about 4 to 5 times that of a conventional head bonded at a high temperature. Table 2 *Saturation magnetic flux density of the film at Ni-glass bonding temperature The reason why the reproduction output decreases in conventional multilayer films with NiFe as an intermediate layer is due to the glass bonding process using high melting point PB glass. However, because the γ phase precipitates in the film and the saturation magnetic flux density of the film decreases, this kind of magnetic head cannot write sufficiently on high coercive force media such as metal tape, and the multilayer magnetic film is This is because the soft magnetic properties of the magnet have deteriorated. In contrast, in the multilayer magnetic film according to the present invention, as shown in FIG. 2, there was no deterioration in the soft magnetic properties and saturation magnetic flux density of the film due to heat treatment, and good recording and reproducing characteristics were obtained. [Effects of the Invention] As explained above, by using a material in the intermediate layer that has a small effect on the saturation magnetic flux density of the film and does not easily precipitate the γ phase, a multilayer magnetic film with high saturation magnetic flux density and high heat resistance can be obtained. was gotten. Further, by using the multilayer magnetic film of the present invention in at least a portion of a magnetic circuit, a magnetic head having excellent recording and reproducing characteristics can be obtained.
第1図は本発明による多層磁性膜の中間層膜厚による保
磁力および飽和磁束密度の変化を示す測定図、第2図は
本発明による多層磁性膜の熱処理による保磁力および飽
和磁束密度の変化を示す測定図、第3図は膜中に析出す
るγ相の割合と飽和磁束密度の低下量の関係を示す測定
図、第4図は膜中に析出するγ相の割合と保磁力の関係
を示す測定図、第5図は本発明の多層磁性膜を用いたV
TR用磁気ヘッドの構造を示す斜視図と要部部分拡大断
面図である。
符号の説明
10・・・主磁性膜
11・・・中間層
81・ フェライト
82・・・多層磁性膜
83・・pb系ガラス
84・・・巻線窓
90・・・VTR用磁気ヘット
茎 ) 図
主2k +1 u?、wln (r+ %)輩
図
処友押還度(0)
拓
図
系
図Figure 1 is a measurement diagram showing changes in coercive force and saturation magnetic flux density depending on the intermediate layer thickness of the multilayer magnetic film according to the present invention, and Figure 2 is a measurement diagram showing changes in coercive force and saturation magnetic flux density due to heat treatment of the multilayer magnetic film according to the present invention. Figure 3 is a measurement diagram showing the relationship between the proportion of γ phase precipitated in the film and the amount of decrease in saturation magnetic flux density, and Figure 4 is the relationship between the proportion of γ phase precipitated in the film and coercive force. FIG. 5 is a measurement diagram showing the V using the multilayer magnetic film of the present invention.
FIG. 2 is a perspective view and an enlarged cross-sectional view of a main part showing the structure of a TR magnetic head. Explanation of symbols 10 Main magnetic film 11 Intermediate layer 81 Ferrite 82 Multilayer magnetic film 83 PB glass 84 Winding window 90 VTR magnetic head stem) Main 2k +1 u? , wln (r+ %) Hizuzusho friend pushback degree (0) Takuzu genealogy
Claims (3)
なる主磁性膜と、膜厚が2〜10nmの中間層からなる
多層膜において、中間層がFe−Cr,Fe−Hf,F
e−Mo,Fe−Nb,Fe−Re,Fe−Si,Fe
−Ta,Fe−Ti,Fe−V,Fe−W,Fe−Zr
の群より選ばれる少なくとも1種以上の合金からなり、
Feへ添加する元素の濃度が5at%以上であることを
特徴とする高耐熱性多層磁性膜。1. In a multilayer film consisting of a main magnetic film made of an FeC-based, FeB-based, or FeN-based alloy thin film, and an intermediate layer with a film thickness of 2 to 10 nm, the intermediate layer may be Fe-Cr, Fe-Hf, or F.
e-Mo, Fe-Nb, Fe-Re, Fe-Si, Fe
-Ta, Fe-Ti, Fe-V, Fe-W, Fe-Zr
Consisting of at least one alloy selected from the group of
A highly heat-resistant multilayer magnetic film characterized in that the concentration of elements added to Fe is 5 at% or more.
なる主磁性膜と、膜厚が2〜10nmの中間層からなる
多層膜において、中間層がFe−Co,Fe−Ir,F
e−Mn,Fe−Ni,Fe−Os,Fe−Pt,Fe
−Rh,Fe−Ruの群より選ばれる少なくとも1種以
上の合金からなり、主磁性膜膜厚をt_1、中間層膜厚
をt_2、中間層の組成をFe_1_−xMxとした時
、添加元素Mの濃度は5at%以上で、最大添加量は、
t_2×x/(t_1+t_2)<0.1 の関係を満たすことを特徴とする高耐熱性多層磁性膜。2. In a multilayer film consisting of a main magnetic film made of an FeC-based, FeB-based, or FeN-based alloy thin film, and an intermediate layer with a film thickness of 2 to 10 nm, the intermediate layer may be Fe-Co, Fe-Ir, or F.
e-Mn, Fe-Ni, Fe-Os, Fe-Pt, Fe
It is made of at least one alloy selected from the group of -Rh, Fe-Ru, and when the main magnetic film thickness is t_1, the intermediate layer thickness is t_2, and the composition of the intermediate layer is Fe_1_-xMx, the additive element M The concentration of is 5 at% or more, and the maximum amount added is
A highly heat-resistant multilayer magnetic film characterized by satisfying the following relationship: t_2×x/(t_1+t_2)<0.1.
性膜を磁気回路の少なくとも一部に用いたことを特徴と
する磁気ヘッド。3. A magnetic head characterized in that the multilayer magnetic film according to claim 1 or 2 is used in at least a part of a magnetic circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11000190A JPH0410403A (en) | 1990-04-27 | 1990-04-27 | High heat-resistant multilayered magnetic film and magnetic head using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11000190A JPH0410403A (en) | 1990-04-27 | 1990-04-27 | High heat-resistant multilayered magnetic film and magnetic head using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0410403A true JPH0410403A (en) | 1992-01-14 |
Family
ID=14524585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11000190A Pending JPH0410403A (en) | 1990-04-27 | 1990-04-27 | High heat-resistant multilayered magnetic film and magnetic head using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0410403A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997011458A1 (en) * | 1995-09-20 | 1997-03-27 | Hitachi, Ltd. | Magnetoresistive head |
-
1990
- 1990-04-27 JP JP11000190A patent/JPH0410403A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997011458A1 (en) * | 1995-09-20 | 1997-03-27 | Hitachi, Ltd. | Magnetoresistive head |
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