JPH0410468B2 - - Google Patents
Info
- Publication number
- JPH0410468B2 JPH0410468B2 JP2201284A JP2201284A JPH0410468B2 JP H0410468 B2 JPH0410468 B2 JP H0410468B2 JP 2201284 A JP2201284 A JP 2201284A JP 2201284 A JP2201284 A JP 2201284A JP H0410468 B2 JPH0410468 B2 JP H0410468B2
- Authority
- JP
- Japan
- Prior art keywords
- trifluoromethyl
- reaction
- mmole
- nitrosotrifluoromethanesulfonamide
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GLXNCCKMEDEHOO-UHFFFAOYSA-N 1,1,1-trifluoro-n-nitroso-n-(trifluoromethyl)methanesulfonamide Chemical compound FC(F)(F)N(N=O)S(=O)(=O)C(F)(F)F GLXNCCKMEDEHOO-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 13
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- RUFVVIIEPMOSJL-UHFFFAOYSA-N 4,4,4-trifluorobutanethioic s-acid Chemical compound OC(=S)CCC(F)(F)F RUFVVIIEPMOSJL-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- JSNFUDRKXKMIDD-UHFFFAOYSA-N N(=O)NS(=O)(=O)C(F)(F)F Chemical compound N(=O)NS(=O)(=O)C(F)(F)F JSNFUDRKXKMIDD-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- PGOMVYSURVZIIW-UHFFFAOYSA-N trifluoro(nitroso)methane Chemical compound FC(F)(F)N=O PGOMVYSURVZIIW-UHFFFAOYSA-N 0.000 description 3
- VPAYJEUHKVESSD-UHFFFAOYSA-N trifluoroiodomethane Chemical compound FC(F)(F)I VPAYJEUHKVESSD-UHFFFAOYSA-N 0.000 description 3
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- 229910021630 Antimony pentafluoride Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- VBVBHWZYQGJZLR-UHFFFAOYSA-I antimony pentafluoride Chemical compound F[Sb](F)(F)(F)F VBVBHWZYQGJZLR-UHFFFAOYSA-I 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 2
- 229910000104 sodium hydride Inorganic materials 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QHMQWEPBXSHHLH-UHFFFAOYSA-N sulfur tetrafluoride Chemical compound FS(F)(F)F QHMQWEPBXSHHLH-UHFFFAOYSA-N 0.000 description 2
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 2
- 229940029284 trichlorofluoromethane Drugs 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NYURGIPZRULSSW-UHFFFAOYSA-N 3,3,3-trifluoro-2-methylpropanethioic s-acid Chemical compound SC(=O)C(C)C(F)(F)F NYURGIPZRULSSW-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- -1 alkali metal alkoxides Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 150000002497 iodine compounds Chemical class 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002730 mercury Chemical class 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- PSLQROQMSLTRPX-UHFFFAOYSA-N n-nitroso-n-(trifluoromethyl)benzenesulfonamide Chemical compound FC(F)(F)N(N=O)S(=O)(=O)C1=CC=CC=C1 PSLQROQMSLTRPX-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- SLVAEVYIJHDKRO-UHFFFAOYSA-N trifluoromethanesulfonyl fluoride Chemical compound FC(F)(F)S(F)(=O)=O SLVAEVYIJHDKRO-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は構造式
で表わされる新規物質N−トリフルオロメチル−
N−ニトロソトリフルオロメタンスルホンアミド
に関するものである。
本発明のN−トリフルオロメチル−N−ニトロ
ソトリフルオロメタンスルホンアミドはトリフル
オロメチル基導入試剤として有用である。トリフ
ルオロメチル基が医薬、農薬の合成において重要
な官能基であることはよく知られていることであ
る〔参考書 石川延男、小林義郎著“フツ素の化
合物”p202〜p232、講談社サイエンテイフイ
ク〕。例えば、本発明のN−トリフルオロメチル
−N−ニトロソトリフルオロメタンスルホンアミ
ドを入手容易なβ−メルカプトプロピオン酸と反
応させることにより容易に農薬として有用なβ−
トリフルオロメチルチオプロピオン酸〔米国特許
第3522293号参照〕へ導くことができる。
従来、トリフルオロメチル基を導入する基本方
法として、(1)官能基をトリフルオロメチル基へ変
換する方法及び(2)トリフルオロメチル基導入試剤
を用いる方法が知られている。(1)の代表例として
は所望のメチル基を塩素ガスでトリクロロメチル
基とした後五フツ化アンチモン等又は金属触媒存
在下フツ化水素を反応させトリフルオロメチル基
に変換する方法、及び所望のカルボキシル基を四
フツ化イオウで処理してトリフルオロメチル基に
変換する方法〔例えばHelv.Chim.Acta、30、107
(1947)、J.Am.Chem.Soc.、82、543(1960)参
照〕が知られている。しかしながらこれらの方法
はいずれも目的とする官能基が必要であり、しか
も腐食性及び毒性の強い塩素ガス、フツ化水素、
四フツ化イオウ、五フツ化アンチモンを用いなけ
ればならずおのずと適用範囲は限定されてしま
う。(2)の方法としては、(a)加熱又は光照射条件下
ヨードトリフルオロメタンを芳香族化合物等と反
応させる方法〔例えばChem.Pharm.Bull.、26、
1247(1978)参照〕、(b)金属又は金属塩存在下、ヨ
ードトリフルオロメタン又はトルフルオロ酢酸塩
とハロゲン化物とを反応させる方法〔例えば
Tetrahedron Lett.、42、4071(1979)、Chem.
Lett.、1981、1679、Chem.Lett.、1981、1719参
照〕、(c)電解条件下、トリフルオロ酢酸中で反応
させる方法〔例えばElectrochim.Acta、21、987
(1976)参照〕、(d)光照射条件下N−トリフルオロ
メチル−N−ニトロソアレーンスルホンアミドと
芳香族化合物又はジスルフイドとを反応させる方
法〔Tetrahedron Lett.、23、3929(1982)、特開
昭56−122344号参照〕が知られている。しかしな
がら(a)の方法では収率が低い上にトリフルオロメ
チル化剤であるヨードトリフルオロメタンが気体
状物質であるため反応を効率よく行なおうとする
ためには加圧条件が必要であること、また沃素原
子及び沃素分子が生成するのでそれによる副反応
及び反応容器の腐食等が問題となる。(b)の方法で
は目的物を収率よく得るためにはハロゲン化合物
として高価なヨード化合物を用いなければならな
いし、又金属を用いるため排水規制によつて回収
しなければならないなど反応後の後処理に問題が
ある。(c)の方法では電解反応という特別の条件を
用いなければならず、又トリフルオロ酢酸溶媒中
で行なうためトリフルオロメチル基導入試剤とし
ての効率は非常に悪い。(d)の方法では収率が芳し
くなく、N−トリフルオロメチル−N−ニトロソ
アレーンスルホンアミドがトリフルオロメチル化
剤として働いた後固体のアレーンスルホン酸又は
アレーンスルフイン酸となるため分離等に問題が
あつた。
以上、トリフルオロメチル基を導入する基本方
法及びその欠点について説明したが、本発明の具
体的用途として前記したβ−トリフルオロメチル
チオプロピオン酸を製造する場合もトリフルオロ
メチル基の導入に関しては基本的には前記した従
来法をもつて行つているものであり
〔Tetrahedron Lett.、22、1997(1981)、23、
3929(1982)及び特開昭56−122344号参照〕、又、
他の文献〔J.Org.Chem.、22、1275(1957)、米国
特許第3522293号参照〕に見られる方法はトリフ
ルオロメチルチオ基導入剤であるトリフルオロメ
チルメルカプタンを合成するのに毒性の強い水銀
塩を用いなければならないため排水に問題が生じ
ること、又収率の低い工程を含むことから工業的
製法とはいたしがたい。
本発明は従来法の欠点を克服すべく鋭意研究を
重ねた結果本発明を完成したものである。
本発明は2つのトリフルオロメチル基を有する
ことによりトリフルオロメチル化剤としての有用
性が飛躍的に増大し(比較例参照)、又分解生成
物がすべて気体であるため所望の生成物であるト
リフルオロメチル化合物の分離が非常に容易とな
る特徴を有している。
本発明のN−トリフルオロメチル−N−ニトロ
ソトリフルオロメタンスルホンアミドはトリフル
オロニトロソメタンとヒドロキシルアミンとを反
応させた後、塩基の存在下トリフルオロメタンス
ルホニルフロリドと反応させることにより製造す
ることができる。
本反応に用いる塩基としては例えば水素化ナト
リウム、水素化カリウム、水素化リチウム等の金
属水素化物、ナトリウムメトキシド、ナトリウム
エトキシド、カリウムt−ブトキシド等のアルカ
リ金属アルコキシド、水酸化ナトリウム、水酸化
カリウム等の金属水酸化物を用いることができ
る。
本発明の化合物を製造するにあたつては溶媒中
で反応を行うことが望ましく、例えばジメチルホ
ルムアミド、ホルムアミド、ジメチルアセトアミ
ド、N−メチルピロリドン、ジメチルスルホキシ
ド、ヘキサメチルホスホリツクトリアミド等の極
性溶媒、ジエチルエーテル、テトラヒドロフラン
等のエーテル溶媒を使用することができる。ま
た、これらの混合溶媒を用いることもできる。
反応は−100℃〜−10℃で進行するが反応が収
率よく円滑に進行するためには−80℃〜−30℃が
好ましい。
以下、実施例、参考例及び比較例により本発明
を更に詳細に説明する。
実施例
300ml三口フラスコにアルゴン雰囲気下、ヒド
ロキシアミン塩酸塩(5.6g、80.6mmole)のジ
メチルホルムアミド−ジエチルエーテル(80ml−
21ml)溶液をとり、これに氷冷下t−ブトキシカ
リウム(9.05g、80.6mmole)を加えた後室温で
15分撹拌、ドライアイス−クロロホルム浴により
−62℃〜−65℃まで冷却し、トリフルオロニトロ
ソメタンをブルーの色が消えなくなるまで加えた
(8.3g、83.8mmole)。次にアルゴンガスで過剰
のトリフルオロニトロソメタンを追い出しフリス
ルオロメタンスルホニルフロリド(12.8g、84.2
mmole)を反応系内に導入した後、50%水素化
ナトリウム(4.26g、88.8mmole)を2時間で加
えた。全量加えた後−63℃で18時間撹拌後、ペン
タン(10ml)を加え−35℃まで昇温後水を加えペ
ンタンで抽出、水洗、硫酸マグネシウムで乾燥後
真空ラインを用い分離精製し、N−トリフルオロ
メチル−N−ニトロソトリフルオロメタンスルホ
ンアミド10.0g(50%)を得た。物性値は次に示
す。
無色揮発性液体
19F−NMR(重クロロホルム中、トリクロロフ
ロロメタン内部標準);69.71ppm(m、3F、
The present invention is based on the structural formula A new substance N-trifluoromethyl-
It relates to N-nitrosotrifluoromethanesulfonamide. The N-trifluoromethyl-N-nitrosotrifluoromethanesulfonamide of the present invention is useful as a trifluoromethyl group-introducing reagent. It is well known that the trifluoromethyl group is an important functional group in the synthesis of medicines and agricultural chemicals. ]. For example, by reacting the N-trifluoromethyl-N-nitrosotrifluoromethanesulfonamide of the present invention with readily available β-mercaptopropionic acid, β-
This can lead to trifluoromethylthiopropionic acid [see US Pat. No. 3,522,293]. Conventionally, as basic methods for introducing a trifluoromethyl group, (1) a method of converting a functional group into a trifluoromethyl group, and (2) a method of using a trifluoromethyl group-introducing reagent are known. A typical example of (1) is a method in which a desired methyl group is converted into a trichloromethyl group using chlorine gas, and then reacted with hydrogen fluoride such as antimony pentafluoride or in the presence of a metal catalyst to convert it into a trifluoromethyl group. A method of converting a carboxyl group to a trifluoromethyl group by treating it with sulfur tetrafluoride [e.g., Helv.Chim.Acta, 30 , 107
(1947), J.Am.Chem.Soc., 82 , 543 (1960)] are known. However, all of these methods require the desired functional group, and they also require highly corrosive and toxic chlorine gas, hydrogen fluoride,
Sulfur tetrafluoride and antimony pentafluoride must be used, which naturally limits the range of application. Method (2) includes (a) a method of reacting iodotrifluoromethane with an aromatic compound under heating or light irradiation [for example, Chem.Pharm.Bull., 26 ;
1247 (1978)], (b) a method of reacting iodotrifluoromethane or trifluoroacetate with a halide in the presence of a metal or metal salt [e.g.
Tetrahedron Lett., 42 , 4071 (1979), Chem.
Lett., 1981 , 1679, Chem. Lett., 1981 , 1719], (c) reaction in trifluoroacetic acid under electrolytic conditions [e.g. Electrochim. Acta, 21 , 987].
(1976)], (d) Method of reacting N-trifluoromethyl-N-nitrosoarenesulfonamide with an aromatic compound or disulfide under light irradiation conditions [Tetrahedron Lett., 23 , 3929 (1982), JP-A [See No. 122344, 1982] is known. However, in method (a), the yield is low, and the trifluoromethylating agent, iodotrifluoromethane, is a gaseous substance, so pressurized conditions are required to carry out the reaction efficiently. In addition, since iodine atoms and molecules are produced, side reactions and corrosion of the reaction vessel are problematic. In method (b), in order to obtain the target product in a good yield, an expensive iodine compound must be used as a halogen compound, and since metal is used, it must be recovered according to wastewater regulations, etc. There is a problem with processing. In the method (c), special conditions of electrolytic reaction must be used, and since it is carried out in a trifluoroacetic acid solvent, the efficiency as a reagent for introducing a trifluoromethyl group is very low. In method (d), the yield is poor, and after N-trifluoromethyl-N-nitrosoarenesulfonamide acts as a trifluoromethylating agent, it becomes solid arenesulfonic acid or arenesulfinic acid, making it difficult to separate. There was a problem. The basic method for introducing a trifluoromethyl group and its drawbacks have been explained above. However, when producing β-trifluoromethylthiopropionic acid described above as a specific application of the present invention, the basic method for introducing a trifluoromethyl group is also explained. This is carried out using the conventional method described above [Tetrahedron Lett., 22 , 1997 (1981), 23 ,
3929 (1982) and Japanese Patent Application Laid-Open No. 122344/1983], and
The method found in other literature [see J.Org.Chem., 22 , 1275 (1957), U.S. Pat. It cannot be considered as an industrial production method because it requires the use of mercury salts, which causes problems with drainage, and because it involves steps with low yields. The present invention was completed as a result of extensive research to overcome the drawbacks of conventional methods. The present invention has two trifluoromethyl groups, which dramatically increases its usefulness as a trifluoromethylating agent (see Comparative Example), and since all of the decomposition products are gases, they are desirable products. It has the characteristic that trifluoromethyl compounds can be separated very easily. The N-trifluoromethyl-N-nitrosotrifluoromethanesulfonamide of the present invention can be produced by reacting trifluoronitrosomethane with hydroxylamine and then reacting it with trifluoromethanesulfonyl fluoride in the presence of a base. . Examples of bases used in this reaction include metal hydrides such as sodium hydride, potassium hydride, and lithium hydride, alkali metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide, sodium hydroxide, and potassium hydroxide. Metal hydroxides such as the following can be used. When producing the compound of the present invention, it is desirable to carry out the reaction in a solvent, such as polar solvents such as dimethylformamide, formamide, dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, hexamethylphosphoric triamide, etc. Ether solvents such as diethyl ether, tetrahydrofuran, etc. can be used. Moreover, a mixed solvent of these can also be used. The reaction proceeds at -100°C to -10°C, but preferably -80°C to -30°C in order for the reaction to proceed smoothly with good yield. Hereinafter, the present invention will be explained in more detail with reference to Examples, Reference Examples, and Comparative Examples. Example In a 300 ml three-neck flask under argon atmosphere, add hydroxyamine hydrochloride (5.6 g, 80.6 mmole) to dimethylformamide-diethyl ether (80 ml).
To this solution was added t-butoxypotassium (9.05 g, 80.6 mmole) under ice-cooling, and then the mixture was stirred at room temperature.
Stir for 15 minutes, cool to −62° C. to −65° C. with a dry ice-chloroform bath, and add trifluoronitrosomethane (8.3 g, 83.8 mmole) until the blue color disappears. Next, excess trifluoronitrosomethane was expelled with argon gas, and furisulfuromethanesulfonyl fluoride (12.8 g, 84.2
mmole) into the reaction system, 50% sodium hydride (4.26 g, 88.8 mmole) was added over 2 hours. After adding the entire amount and stirring at -63℃ for 18 hours, add pentane (10ml) and raise the temperature to -35℃, add water, extract with pentane, wash with water, dry with magnesium sulfate, separate and purify using a vacuum line, N- 10.0 g (50%) of trifluoromethyl-N-nitrosotrifluoromethanesulfonamide was obtained. The physical property values are shown below. Colorless volatile liquid 19F -NMR (trichlorofluoromethane internal standard in deuterated chloroform); 69.71ppm (m, 3F,
【式】)、76.51(s、3F、CF3SO2−).
IR(neat);1545cm-1(N=O)、1415(SO2).
参考例
パイレツクス製反応管に3−メルカプトプロピ
オン酸(107.2mg、1.0mmole)及びジアセチル
(88μ、1.0mmole)のアセトニトリル(5ml)
溶液をとり、これにN−トリフルオロメチル−N
−ニトロソトリフルオロメタンスルホンアミド
(156μ、1.0mmole)を加えた後脱気封管し、
高圧水銀灯を用いて5時間照射した。シリカゲル
カラムクロマトグラフイー(ペンタン:エーテル
=4:1)により生成物を分離、減圧蒸留により
(125℃/12mmHg)精製し、3−トリフルオロメ
チルチオプロピオン酸157mg(89.2%)を得た。
物性値は次に示す。
無色液体
19F−NMR(重クロロホルム中、トリクロロフ
ロロメタン内部標準);41.5ppm(s).
1H−HMR(重クロロホルム中);2.83ppm(t、
2H、−CH2−)、3.14(t、2H、−CH2−)、9.13
(b、1H、−COOH).
IR(neat);3050cm-1、1720、1420、1300、
1250、1210、1115.
比較例
参考例で用いたN−トリフルオロメチル−N−
ニトロソトリフルオロメタンスルホンアミドの代
わりにN−トリフルオロメチル−N−ニトロソベ
ンゼンスルホンアミド(0.263g、1.04mmole)
を用いた他はすべて参考例と同様のモル比及び操
作で反応を行つた。反応後反応液をガスクロマト
グラフイーで分析したところβ−トリフルオロメ
チルチオプロピオン酸の生成は5%以下であつ
た。[Formula]), 76.51 (s, 3F, CF 3 SO 2 −). IR (neat); 1545 cm -1 (N=O), 1415 (SO 2 ). Reference example In a Pyrex reaction tube, add 3-mercaptopropionic acid (107.2 mg, 1.0 mmole) and diacetyl (88 μ, 1.0 mmole) in acetonitrile (5 ml).
Take the solution and add N-trifluoromethyl-N
- After adding nitrosotrifluoromethanesulfonamide (156 μ, 1.0 mmole), degas and seal the tube.
It was irradiated for 5 hours using a high pressure mercury lamp. The product was separated by silica gel column chromatography (pentane:ether = 4:1) and purified by vacuum distillation (125° C./12 mmHg) to obtain 157 mg (89.2%) of 3-trifluoromethylthiopropionic acid.
The physical property values are shown below. Colorless liquid 19 F-NMR (trichlorofluoromethane internal standard in deuterated chloroform); 41.5 ppm (s). 1 H-HMR (in deuterated chloroform); 2.83 ppm (t,
2H, -CH 2 -), 3.14 (t, 2H, -CH 2 -), 9.13
(b, 1H, -COOH). IR (neat); 3050cm -1 , 1720, 1420, 1300,
1250, 1210, 1115. Comparative example N-trifluoromethyl-N- used in reference example
N-trifluoromethyl-N-nitrosobenzenesulfonamide (0.263 g, 1.04 mmole) in place of nitrosotrifluoromethanesulfonamide
The reaction was carried out using the same molar ratios and operations as in Reference Example except that . After the reaction, the reaction solution was analyzed by gas chromatography, and it was found that the production of β-trifluoromethylthiopropionic acid was 5% or less.
Claims (1)
ロソトリフルオロメタンスルホンアミド[Claims] 1. Structural formula N-trifluoromethyl-N-nitrosotrifluoromethanesulfonamide represented by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2201284A JPS60166658A (en) | 1984-02-10 | 1984-02-10 | N-trifluoromethyl-n- nitrosotrifluoromethanesulfonamide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2201284A JPS60166658A (en) | 1984-02-10 | 1984-02-10 | N-trifluoromethyl-n- nitrosotrifluoromethanesulfonamide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60166658A JPS60166658A (en) | 1985-08-29 |
| JPH0410468B2 true JPH0410468B2 (en) | 1992-02-25 |
Family
ID=12071083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2201284A Granted JPS60166658A (en) | 1984-02-10 | 1984-02-10 | N-trifluoromethyl-n- nitrosotrifluoromethanesulfonamide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60166658A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008285419A (en) * | 2007-05-15 | 2008-11-27 | Central Glass Co Ltd | Method for producing trifluoromethane sulfonyl fluoride |
-
1984
- 1984-02-10 JP JP2201284A patent/JPS60166658A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60166658A (en) | 1985-08-29 |
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