JPH04106552A - Electrophotographic system lithographic printing original plate - Google Patents
Electrophotographic system lithographic printing original plateInfo
- Publication number
- JPH04106552A JPH04106552A JP22419090A JP22419090A JPH04106552A JP H04106552 A JPH04106552 A JP H04106552A JP 22419090 A JP22419090 A JP 22419090A JP 22419090 A JP22419090 A JP 22419090A JP H04106552 A JPH04106552 A JP H04106552A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- resin particles
- monomer
- dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims description 41
- 229920005989 resin Polymers 0.000 claims abstract description 144
- 239000011347 resin Substances 0.000 claims abstract description 144
- 239000002245 particle Substances 0.000 claims abstract description 113
- 239000000178 monomer Substances 0.000 claims abstract description 72
- 239000006185 dispersion Substances 0.000 claims abstract description 48
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 42
- 230000000087 stabilizing effect Effects 0.000 claims abstract description 31
- 239000011787 zinc oxide Substances 0.000 claims abstract description 21
- 239000002904 solvent Substances 0.000 claims abstract description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000006243 chemical reaction Methods 0.000 claims abstract description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 5
- 229920006026 co-polymeric resin Polymers 0.000 claims abstract description 5
- -1 cyclic acid anhydride Chemical class 0.000 claims description 134
- 229920000642 polymer Polymers 0.000 claims description 61
- 125000004432 carbon atom Chemical group C* 0.000 claims description 36
- 150000001875 compounds Chemical class 0.000 claims description 26
- 150000002430 hydrocarbons Chemical group 0.000 claims description 25
- 239000003125 aqueous solvent Substances 0.000 claims description 22
- 229910052757 nitrogen Inorganic materials 0.000 claims description 21
- 239000011230 binding agent Substances 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 238000006116 polymerization reaction Methods 0.000 claims description 18
- 125000001424 substituent group Chemical group 0.000 claims description 16
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- 125000000623 heterocyclic group Chemical group 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 8
- 238000012674 dispersion polymerization Methods 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 7
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 claims description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 3
- 125000003368 amide group Chemical group 0.000 claims description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 2
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 238000010186 staining Methods 0.000 abstract description 2
- 239000002952 polymeric resin Substances 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 abstract 1
- 238000000034 method Methods 0.000 description 49
- 239000010410 layer Substances 0.000 description 45
- 239000000463 material Substances 0.000 description 32
- 239000000975 dye Substances 0.000 description 31
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 30
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 28
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 18
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 16
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 13
- 238000000586 desensitisation Methods 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 12
- 108091008695 photoreceptors Proteins 0.000 description 12
- 238000003384 imaging method Methods 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 10
- 125000001309 chloro group Chemical group Cl* 0.000 description 10
- 125000000524 functional group Chemical group 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- 239000000123 paper Substances 0.000 description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 230000014759 maintenance of location Effects 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 8
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 8
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 7
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 125000005999 2-bromoethyl group Chemical group 0.000 description 5
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 239000004816 latex Substances 0.000 description 5
- 229920000126 latex Polymers 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 238000012552 review Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229910052720 vanadium Inorganic materials 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 125000000068 chlorophenyl group Chemical group 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 210000003127 knee Anatomy 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000006278 bromobenzyl group Chemical group 0.000 description 3
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- 238000004132 cross linking Methods 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
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- 238000001914 filtration Methods 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
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- 125000006178 methyl benzyl group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
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- 239000003960 organic solvent Substances 0.000 description 3
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- 125000006039 1-hexenyl group Chemical group 0.000 description 2
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- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 2
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- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
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- QCDMKVKJOHXJQS-UHFFFAOYSA-N chloroethene;ethenoxyethene Chemical compound ClC=C.C=COC=C QCDMKVKJOHXJQS-UHFFFAOYSA-N 0.000 description 1
- WBLIXGSTEMXDSM-UHFFFAOYSA-N chloromethane Chemical compound Cl[CH2] WBLIXGSTEMXDSM-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003975 dentin desensitizing agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- JXCHMDATRWUOAP-UHFFFAOYSA-N diisocyanatomethylbenzene Chemical compound O=C=NC(N=C=O)C1=CC=CC=C1 JXCHMDATRWUOAP-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical class NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- MCQOWYALZVKMAR-UHFFFAOYSA-N furo[3,4-b]pyridine-5,7-dione Chemical group C1=CC=C2C(=O)OC(=O)C2=N1 MCQOWYALZVKMAR-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229920001600 hydrophobic polymer Polymers 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- CNPHCSFIDKZQAK-UHFFFAOYSA-N n-prop-2-enylprop-2-enamide Chemical compound C=CCNC(=O)C=C CNPHCSFIDKZQAK-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000005064 octadecenyl group Chemical group C(=CCCCCCCCCCCCCCCCC)* 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-N pent-4-enoic acid Chemical compound OC(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 150000008442 polyphenolic compounds Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical group O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- BRHQMPOFCRGJCM-UHFFFAOYSA-N sbb007645 Chemical group C1CC2C3C(=O)OC(=O)C3C1CC2 BRHQMPOFCRGJCM-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- FIDKFEIEZJGDBE-UHFFFAOYSA-N thieno[2,3-c]furan-4,6-dione Chemical group S1C=CC2=C1C(=O)OC2=O FIDKFEIEZJGDBE-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- 125000005040 tridecenyl group Chemical group C(=CCCCCCCCCCCC)* 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電子写真方式で製版される電子写真式平版印
刷用原版に関するものであり、特に、該平版印刷用原版
の光導電層形成用組成物の改良に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electrophotographic lithographic printing original plate made by an electrophotographic method, and in particular to a photoconductive layer forming original plate of the lithographic printing original plate. This invention relates to improving compositions.
〔従来の技術・発明が解決しようとする課題〕現在ダイ
レクト製版用のオフセット原版には多種のものが提案さ
れ且つ実用化されているが、中でも、導電性支持体上に
酸化亜鉛のごとき光導電性粒子及び結着樹脂を主成分と
した光導電層を設けた感光体を通常の電子写真工程を経
て、感光体表面に親油性の高いトナー画像を形成させ、
続いて該表面をエッチ液と言われる不感脂化液で処理し
非画像部分を選択的に親水化することによってオフセッ
ト原版を得る技術が広く用いられている。[Prior art/problems to be solved by the invention] Currently, many types of offset original plates for direct plate making have been proposed and put into practical use. A photoreceptor provided with a photoconductive layer mainly composed of adhesive particles and a binder resin is subjected to a normal electrophotographic process to form a highly lipophilic toner image on the surface of the photoreceptor.
A widely used technique is to subsequently process the surface with a desensitizing liquid called an etchant to selectively make non-image areas hydrophilic, thereby obtaining an offset master.
良好な印刷物を得るには、先ずオフセット原版に、原画
が忠実に複写されると共に、感光体表面が不感脂化処理
液となじみ易く、非画像部が充分に親水化されると同時
に耐水性を有し、更に印刷においては画像を有する表面
導電層が離脱しないこと、及び湿し水とのなじみがよく
、印刷枚数が多くなっても汚れが発生しないように充分
に非画像部の親水性が保持されること、等の性能を有す
る必要がある。In order to obtain good printed matter, first, the original image is faithfully copied onto the offset master plate, the surface of the photoreceptor is easily compatible with the desensitizing treatment liquid, and the non-image area is made sufficiently hydrophilic, while at the same time it is water resistant. In addition, the surface conductive layer with the image does not separate during printing, has good compatibility with dampening water, and has sufficient hydrophilicity in the non-image area to prevent staining even if a large number of sheets are printed. It is necessary to have performance such as being retained.
これらの性能には、光導電層中の酸化亜鉛と結着樹脂の
比率が影響することは、既に知られており、例えば、光
導電層の酸化亜鉛粒子に対する結着樹脂の比率を小さく
すれば、光導電層表面の不感脂化性が向上し、地汚れは
少なくなるが、他方で光導電層自体の内部凝集力が低下
し、機械的強度不足による耐刷力の低下が生じる。逆に
、結着樹脂の比率を大きくすると、耐剛力は向上するが
、地汚れが増大する。特に地汚れは、光導電層表面の不
感脂化性の良否に関係する現象であることは言うまでも
ないが、光導電層表面の不感脂化性は、光導電層中の酸
化亜鉛と結着樹脂の比率のみによって左右されるもので
はなく、結着樹脂の種類によっても、大きく左右される
ことが明らかになってきている。It is already known that these performances are affected by the ratio of zinc oxide to binder resin in the photoconductive layer. For example, if the ratio of binder resin to zinc oxide particles in the photoconductive layer is reduced, Although the desensitization property of the surface of the photoconductive layer is improved and scumming is reduced, on the other hand, the internal cohesive force of the photoconductive layer itself is decreased, resulting in a decrease in printing durability due to insufficient mechanical strength. Conversely, increasing the ratio of binder resin improves stiffness resistance, but increases scumming. In particular, it goes without saying that scumming is a phenomenon related to the desensitization property of the surface of the photoconductive layer. It has become clear that it is not only influenced by the ratio of , but also largely influenced by the type of binder resin.
特に、オフセット原版としては、前記のように不感脂化
性不充分による地汚れ発生が大きな問題であり、これを
改良するために、不感脂化性を向上させる酸化亜鉛結着
用樹脂の開発が種々検討されてきている。例えば、特公
昭50−31011号公報では、フマル酸存在下で(メ
タ)アクリレート系千ツマ−と他の千ツマ−とを共重合
させた、重量平均分子量(〜)1.8〜10x104で
、ガラス転移点(Tg)が10〜80℃の樹脂と、(メ
タ)アクリレート系千ツマ−と7マル酸以外の他の千ツ
マ−とから成る共重合体とを併用したもの、又特開昭5
3−54027号公報では、カルボン酸基をエステル結
合から少なくとも原子数7個離れて有する置換基をもつ
(メタ)アクリル酸エステルを含む3元共重合体を用い
るもの、又特開昭54−20735、同57−2025
44各号公報では、アクリル酸及びヒドロキシエチル(
メタ)アクリレートを含む4元又は5元共重合体を用い
るもの、又特開昭58−68046号公報では、炭素数
6〜12のアルキル基を置換基とする(メタ)アクリル
酸エステル及びカルボン酸含有のビニルモノマーを含む
3元共重合体を用いるもの等が光導電層の不感脂化性の
向上に効果があると記載されている。In particular, for offset master plates, scumming due to insufficient desensitization is a major problem as mentioned above, and in order to improve this problem, various zinc oxide binding resins that improve desensitization have been developed. It is being considered. For example, in Japanese Patent Publication No. 50-31011, a (meth)acrylate-based compound and another compound are copolymerized in the presence of fumaric acid, with a weight average molecular weight (~) of 1.8 to 10 x 104, A combination of a resin with a glass transition point (Tg) of 10 to 80°C and a copolymer consisting of a (meth)acrylate-based mercury and a mercury other than 7-malic acid; 5
3-54027 discloses a method using a terpolymer containing a (meth)acrylic acid ester having a substituent having a carboxylic acid group separated by at least 7 atoms from the ester bond, and JP-A No. 54-20735. , 57-2025
44 publications, acrylic acid and hydroxyethyl (
Those using quaternary or penta-component copolymers containing meth)acrylates, and in JP-A-58-68046, (meth)acrylic esters and carboxylic acids with alkyl groups having 6 to 12 carbon atoms as substituents. It is described that a method using a terpolymer containing a vinyl monomer is effective in improving the desensitization property of a photoconductive layer.
しかし、上記した不感脂化性向上に効果があるとされる
樹脂であっても、現実に評価してみると、地汚れ、耐刷
力において未だ満足できるものではなかった。However, even when the above-mentioned resin is said to be effective in improving desensitization properties, when actually evaluated, it was still unsatisfactory in terms of scumming and printing durability.
更に特開平1−232356、同1−261657各号
公報では、光導電層に親水性基を含有する樹脂粒子を添
加することで保水性の向上に効果があると記載されてい
る。Further, JP-A-1-232356 and JP-A-1-261657 state that adding resin particles containing hydrophilic groups to the photoconductive layer is effective in improving water retention.
これら、光導電性組成物を改良することで明らかに保水
性は、著しく向上することが確認された。しかし、平版
印刷用原版として更に詳細に評価してみると、環境変動
(高温・高湿あるいは低温・低湿)時に、電子写真特性
(特に暗中電荷保持性、光感度等)が変動し、安定した
良好な複写画像が得られなくなる場合が生じた。It has been confirmed that the water retention properties can be significantly improved by improving these photoconductive compositions. However, when evaluated in more detail as a lithographic printing original plate, it was found that the electrophotographic properties (particularly charge retention in the dark, photosensitivity, etc.) fluctuate when the environment changes (high temperature/high humidity or low temperature/low humidity), and stable In some cases, it was not possible to obtain a good copy image.
これにより、結果として、これを印刷用原版として用い
た印刷物の印刷画像の劣化あるいは、地汚れ防止効果の
減少となってしまった。This resulted in deterioration of the printed image of printed matter using this as a printing original plate, or a decrease in the scumming prevention effect.
また、デジタルダイレクト平版印刷用原版としての電子
写真式平版印刷用原版において、半導体レーザー光を用
いたスキャニング露光方式を採用した場合、可視光によ
る全面同時露光方式に比べ時間が長くなり、また露光強
度にも制約があることから、静電特性、特に暗電荷保持
特性、光感度に対して、より高い性能が要求される。In addition, when a scanning exposure method using semiconductor laser light is adopted for an electrophotographic lithographic printing original plate used as a digital direct lithography printing original plate, the time is longer than when the entire surface is simultaneously exposed using visible light, and the exposure intensity is Since there are also restrictions on electrostatic properties, higher performance is required in terms of electrostatic properties, especially dark charge retention properties, and photosensitivity.
これに対し、上記公知の原版では電子写真特性が劣化し
、実際の複写画像も地力ブリが発生し易くなり、且つ細
線の飛びや文字のツブシが生じてしまい、結果として、
平版印刷用原版として印刷すると、印刷物の画質は低下
してしまい、結着樹脂の非画像部分の親水性向上による
地汚れ防止の効果がなくなってしまった。On the other hand, with the above-mentioned known original plates, the electrophotographic characteristics deteriorate, and the actual copied images tend to have blurring, as well as skipping of fine lines and blurring of letters, and as a result,
When printed as a lithographic printing original plate, the image quality of the printed matter deteriorated, and the effect of preventing scumming by improving the hydrophilicity of the non-image portion of the binder resin was lost.
本発明は、以上のような従来の電子写真式平版印刷用原
版の有する問題点を改良するものである。The present invention is intended to improve the problems of the conventional electrophotographic lithographic printing original plates as described above.
すなわち、本発明の目的の1は、静電特性(特に暗電荷
保持性及び光感度)に優れ、原画に対して忠実な複写画
像を再現し、且つオフセット原版として全面−様な地汚
れは勿論、点状の地汚れをも発生させない、不感脂化性
の優れた平版印刷用原版を提供することである。In other words, the first object of the present invention is to reproduce a copy image that is excellent in electrostatic properties (particularly dark charge retention and photosensitivity), faithful to the original image, and to be able to reproduce a copy image that is faithful to the original image, and to be able to prevent not only the entire surface-like background smear as an offset original plate. An object of the present invention is to provide a lithographic printing original plate which does not cause even dotted background stains and has excellent desensitization properties.
本発明の目的の2は、複写画像形成時の環境が低温低湿
あるいは高温高湿のように変動する場合でも、鮮明で良
質な画像を有する平版印刷用原版を提供することである
。A second object of the present invention is to provide a lithographic printing original plate that has a clear and high-quality image even when the environment during copy image formation fluctuates, such as low temperature and low humidity or high temperature and high humidity.
本発明の目的の3は、併用し得る増感色素の種類による
影響を受は難く、半導体レーザー光によるスキャニング
露光方式でも静電特性の優れた平版印刷用原版を提供す
ることである。A third object of the present invention is to provide a lithographic printing original plate that is not easily affected by the types of sensitizing dyes that can be used in combination and has excellent electrostatic properties even in a scanning exposure method using semiconductor laser light.
本発明は上記目的を、導電性支持体上に、光導電性酸化
亜鉛と結着樹脂とを含有してなる光導電層を少なくとも
1層設けてなる電子写真式平版印刷用原版において、該
光導電層中に前記光導電性酸化亜鉛粒子の最大粒子径と
同じかそれより小さい粒子径を有する下記の非水溶媒系
分散樹脂粒子を少なくとも1種含有することを特徴とす
る電子写真式平版印刷用原版によって達成する。The present invention has achieved the above-mentioned object in an original plate for electrophotographic lithography comprising at least one photoconductive layer containing photoconductive zinc oxide and a binder resin on a conductive support. Electrophotographic lithographic printing characterized in that the conductive layer contains at least one type of non-aqueous solvent-based dispersed resin particles below having a particle size equal to or smaller than the maximum particle size of the photoconductive zinc oxide particles. Achieved by original version.
非水溶媒系分散樹脂粒子:
非水溶媒中において、該非水溶媒には可溶であるが重合
することにより不溶化する、カルボキシル基、スルホ基
、スルフィノ基、ホスホノ基、−P−R,[Roは炭化
水素基又は −OR,0H
(R,、は炭化水素基を表す)を表す〕、ヒドロキシル
基、ホルミル基、アミド基、シアノ基、アミノ基、環状
酸無水物含有基及び窒素原子含有の複素環基から選ばれ
る少なくとも1種の極性基を含有してなる一官能性単量
体(A)と、ケイ素原子及び/又はフッ素原子を含有す
る置換基を含み該−官能性単量体(A)と共重合可能な
一官能性単量体(B)とを、該非水溶媒に可溶性の分散
安定用樹脂の存在下に分散重合反応させることにより得
られる共重合体樹脂粒子。Non-aqueous solvent-based dispersed resin particles: In a non-aqueous solvent, carboxyl groups, sulfo groups, sulfino groups, phosphono groups, -P-R, [Ro represents a hydrocarbon group or -OR,0H (R, represents a hydrocarbon group)], a hydroxyl group, a formyl group, an amide group, a cyano group, an amino group, a cyclic acid anhydride-containing group, and a nitrogen atom-containing group. A monofunctional monomer (A) containing at least one polar group selected from heterocyclic groups, and the -functional monomer (A) containing a substituent containing a silicon atom and/or a fluorine atom. Copolymer resin particles obtained by carrying out a dispersion polymerization reaction of A) and a copolymerizable monofunctional monomer (B) in the presence of a dispersion stabilizing resin soluble in the non-aqueous solvent.
本発明においては、上記非水溶媒系分散樹脂粒子が高次
の網目構造を形成しているものであってもよい。In the present invention, the non-aqueous solvent-based dispersed resin particles may form a high-order network structure.
また、本発明における上記分散安定用樹脂としては、高
分子鎮中に、下記一般式(I)で示される重合性二重結
合基部分を少なくとも1種含有しているものが特に好ま
しいものとして挙げられる。Furthermore, as the above-mentioned dispersion stabilizing resin in the present invention, those containing at least one kind of polymerizable double bond group moiety represented by the following general formula (I) in the polymer base are particularly preferred. It will be done.
一般式(I)
Vo−
〔一般式(I)において、Voは−D−’ −COD
−−OCO−+ C)I2tiOCD−、−←モH2テ
「100−CONHCOD−、又は−CONHCONH
−を表わしく但し、pは1〜4の整数を表わし、R3は
水素原子又は炭素、数1〜18の炭化水素基を表わす)
a、。General formula (I) Vo- [In general formula (I), Vo is -D-' -COD
--OCO-+ C) I2tiOCD-, -←MoH2te "100-CONHCOD-, or -CONHCONH
-, where p represents an integer of 1 to 4, and R3 represents a hydrogen atom, carbon, or a hydrocarbon group of numbers 1 to 18)
a.
a、は、互いに同じでも異なってもよく、水素原子、ハ
ロゲン原子、シアノ基、炭化水素基、C00−R2又は
炭化水素基を介した一COO−R,(R2は水素原子又
は置換されてもよい炭化水素基を表わす)を表わす〕
〔作用〕
本発明において、非水溶媒系分散樹脂粒子(以下、樹脂
粒子と略記する場合もある)は前記特定の極性基を少な
くとも1種含有した単量体とフッ素原子及び/又はケイ
素原子を少なくとも置換基として含有した単量体とから
重合後には該非水溶媒には不溶となる重合体成分と1、
該非水溶媒に可溶性の分散安定用樹脂の重合体成分とが
物理化学的に吸着して成る、又は上記式(I)で示され
る重合性二重結合基部分含有の分散安定用樹脂の場合に
は、両型合体成分が化学結合して成ることを特徴とする
ものである。a, may be the same or different, and may be a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, C00-R2 or one COO-R via a hydrocarbon group, (R2 is a hydrogen atom or substituted [Represents a good hydrocarbon group] [Operation] In the present invention, non-aqueous solvent-based dispersed resin particles (hereinafter sometimes abbreviated as resin particles) are monomers containing at least one of the above-mentioned specific polar groups. and a monomer containing at least a fluorine atom and/or a silicon atom as a substituent; a polymer component that becomes insoluble in the non-aqueous solvent after polymerization;
In the case of a dispersion stabilizing resin which is formed by physicochemically adsorbing the polymer component of the dispersion stabilizing resin soluble in the non-aqueous solvent, or which contains a polymerizable double bond group moiety represented by the above formula (I), is characterized in that both types of combined components are chemically bonded.
公知の親水性樹脂粒子が光導電層中に分散して存在する
のとは異なり、本発明の非水溶媒系分散樹脂粒子は光導
電層中に分散されているが、著しく親油性の大きなフッ
素原子及び/又はケイ素原子を含有する重合体成分の働
きにより、空気界面(親油性が高い)である光導電層の
表面部分に濃縮して存在する様になること、及びその平
均粒子径が光導電性酸化亜鉛粒子の最大粒子径と同じか
、それよりも小さく且つ粒子径の分布が狭く粒子径がそ
ろっていることをも特徴とするものである。Unlike known hydrophilic resin particles that are dispersed in the photoconductive layer, the non-aqueous solvent-based dispersed resin particles of the present invention are dispersed in the photoconductive layer, but they contain extremely lipophilic fluorine. Due to the action of polymer components containing atoms and/or silicon atoms, they become concentrated on the surface of the photoconductive layer, which is the air interface (highly lipophilic), and their average particle diameter increases It is also characterized in that it is the same as or smaller than the maximum particle diameter of the conductive zinc oxide particles, and that the particle diameter distribution is narrow and the particle diameters are uniform.
そして本発明の樹脂粒子は、上記した平均粒子径を有し
、且つ該樹脂粒子を任意の可溶性溶媒に溶解したものを
塗布して形成した該樹脂のフィルムが、蒸留水に対する
接触角(ゴニオメータ−にて測定)50度以下の値、好
ましくは30度以下の値を示す親水性のものである。The resin particles of the present invention have the above average particle diameter, and a film of the resin formed by coating the resin particles dissolved in an arbitrary soluble solvent has a contact angle (goniometer) with respect to distilled water. It is hydrophilic and exhibits a value of 50 degrees or less, preferably 30 degrees or less.
光導電性酸化亜鉛と結着樹脂とを少なくとも含有する光
導電層の非画像部を不感脂化液で処理することにより表
面を親水化して平版印刷原版とする方式の印刷用原版に
おいて、本発明の樹脂粒子は上記のように表面部分に濃
縮して存在することがら、少量(公知の親水性樹脂粒子
の技術に比べ50%〜10%の使用量)を分散させるだ
けで非画像部の保水性が飛躍的に向上するものである。The present invention provides a printing original plate in which a non-image area of a photoconductive layer containing at least photoconductive zinc oxide and a binder resin is treated with a desensitizing liquid to make the surface hydrophilic and a lithographic printing original plate is obtained. As mentioned above, the resin particles are concentrated on the surface area, so just dispersing a small amount (50% to 10% usage amount compared to known hydrophilic resin particle technology) can reduce water retention in non-image areas. This will dramatically improve your performance.
更に、光導電層中での存在量が微量で済むことから、電
子写真特性を全く阻害することもなく、且つ高温・高湿
あるいは低温・低湿という過酷条件下でも良好な性能を
安定に維持できる様になった。Furthermore, since only a small amount is present in the photoconductive layer, it does not impede electrophotographic properties at all, and can stably maintain good performance even under harsh conditions of high temperature and high humidity, or low temperature and low humidity. It became like that.
一方本発明の樹脂粒子において、酸化亜鉛粒子径よりも
大きな粒径の該樹脂粒子が存在すると、電子写真特性が
劣化してくる(特に均一な帯電性が得られなくなる)結
果として、複写画像において画像部の濃度ムラ、文字・
細線の切れ、飛び、あるいは非画像部の地力ブリ等が発
生してしまう。On the other hand, in the resin particles of the present invention, if the resin particles have a particle size larger than the zinc oxide particle size, the electrophotographic properties will deteriorate (particularly, uniform charging properties will not be obtained), and as a result, in the copied image. Uneven density in the image area, text/
Breakage or skipping of thin lines, or blurring of the non-image area may occur.
具体的には、本発明の樹脂粒子は最大粒子の粒子径が5
μω以下であり、好ましくは1μm以下である。そして
、粒子の平均粒子径は1.0μm以下であり、好ましく
は0.5μm以下である。Specifically, the resin particles of the present invention have a maximum particle diameter of 5.
It is not more than μω, preferably not more than 1 μm. The average particle diameter of the particles is 1.0 μm or less, preferably 0.5 μm or less.
なお、樹脂粒子は、粒子径が小さい程比表面積が大きく
なり、上記の電子写真特性上良好な作用をもたらし、コ
ロイド粒子(0,01μm以下)程度でも充分であるが
、余り小さくなり過ぎると分子分散の場合と類似してし
まい、保水力向上への粒子であることの効果が薄れてく
るた約、0.001μm以上で用いるのが好ましい。Note that the smaller the particle size of the resin particles, the larger the specific surface area, which brings about good effects on the electrophotographic properties mentioned above, and colloidal particles (0.01 μm or less) are sufficient, but if they are too small, molecules It is preferable to use particles with a diameter of 0.001 .mu.m or more, since the particle size is similar to that of dispersion, and the effect of particles on improving water retention capacity is diminished.
また、本発明において樹脂粒子は疎水性の重合体成分、
即ち、分散安定用樹脂が相当する重合体成分を結合した
ものであり、この疎水性部分が光導電層の結着樹脂と相
互作用していることから、この部分のアンカー効果によ
って印刷時の湿し水で溶出することはなく、かなり多数
枚の印刷を行っても良好な印刷特性を維持することがで
きる。In addition, in the present invention, the resin particles include a hydrophobic polymer component,
In other words, the dispersion stabilizing resin is made by bonding the corresponding polymer component, and since this hydrophobic part interacts with the binder resin of the photoconductive layer, the anchoring effect of this part prevents moisture during printing. It does not dissolve with water and can maintain good printing characteristics even when printing a large number of sheets.
更に、本発明において1.高次の網目構造を形成してい
る樹脂粒子であれば更に水での溶出性が抑えられ、他方
水膨潤性が発現し、更に保水性が良好となる。Furthermore, in the present invention, 1. If the resin particles form a high-order network structure, the dissolution in water is further suppressed, and on the other hand, water swelling properties are exhibited, and water retention properties are further improved.
本発明において、上記のような高次の網目構造を形成し
ていない樹脂粒子又は高次の網目構造を形成している樹
脂粒子(以下、単に網目樹脂粒子)は、光導電性酸化亜
鉛100重量部に対して0.01〜10重量%の使用量
で用いることが好ましい。樹脂粒子又は網目樹脂粒子が
0.01重量%より少ないと非画像部の親水性が充分と
ならず、逆に10重量%より多いと非画像部の親水性の
向上は更に図られるが、厳しい条件下での電子写真特性
が劣化し、複写画像が悪化してしまう。In the present invention, the resin particles that do not form a higher-order network structure as described above or the resin particles that do form a higher-order network structure (hereinafter simply referred to as network resin particles) contain 100% by weight of photoconductive zinc oxide. It is preferable to use the amount of 0.01 to 10% by weight based on the weight of each part. If the amount of resin particles or network resin particles is less than 0.01% by weight, the hydrophilicity of the non-image area will not be sufficient, and if it is more than 10% by weight, the hydrophilicity of the non-image area can be further improved, but it is difficult. The electrophotographic characteristics under these conditions deteriorate, resulting in a deteriorated copy image.
以下に本発明で用いられる非水溶媒系分散樹脂粒子につ
いて更に詳細に説明する。本発明の樹脂粒子は、いわゆ
る非水系分散重合によって製造されたものである。The non-aqueous solvent-based dispersed resin particles used in the present invention will be explained in more detail below. The resin particles of the present invention are produced by so-called non-aqueous dispersion polymerization.
まず、非水溶媒には可溶であるが重合することによって
不溶化する一官能性単量体(A)について説明すると、
該単量体(A)は、その分子構造中に、−CO2)1
、−SO,)I 、 −PD、H,,5O2)1.−0
1(、−CN、−CHD −CONI(。First, we will explain the monofunctional monomer (A) which is soluble in non-aqueous solvents but becomes insolubilized by polymerization.
The monomer (A) has -CO2)1 in its molecular structure.
, -SO,)I, -PD,H,,5O2)1. -0
1(, -CN, -CHD -CONI(.
H
水物含有基、窒素原子含有の複素環基から選ばれた極性
基を少なくとも1個含有するものである。H Contains at least one polar group selected from a hydrate-containing group and a nitrogen atom-containing heterocyclic group.
上記極性基において、−R,は、炭素数1〜6の置換さ
れてもよい炭化水素基(例えば、メチル基、エチル基、
プロピル基、ブチル基、2クロロエチル基、゛2−ブロ
ムエチル基、2−フロロエチル基、3−クロロプロピル
基、3−メトキシプロピル基、2−メトキシブチル基、
ベンジル基、フェニル基、プロペニル基、メトキシメチ
ル基、エトキシメチル基、2−メトキシエチル基等)又
は−R3゜基(R,。はRoの炭化水素基と同一の内容
を表わt)。In the above polar group, -R, is an optionally substituted hydrocarbon group having 1 to 6 carbon atoms (e.g., methyl group, ethyl group,
Propyl group, butyl group, 2-chloroethyl group, 2-bromoethyl group, 2-fluoroethyl group, 3-chloropropyl group, 3-methoxypropyl group, 2-methoxybutyl group,
benzyl group, phenyl group, propenyl group, methoxymethyl group, ethoxymethyl group, 2-methoxyethyl group, etc.) or -R3° group (R, . represents the same content as the hydrocarbon group of Ro).
Ro及びR12は各々同じでも異なってもよく、水素原
子又は炭素数1〜6の置換されてもよい炭化水素基(具
体的には、R,と同一の内容の炭化水素基を表わす)を
表わす。但し、R11及びR12の炭素数の総和は8以
内のものを表わす。Ro and R12 may each be the same or different, and represent a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 6 carbon atoms (specifically, a hydrocarbon group having the same content as R). . However, the total number of carbon atoms in R11 and R12 is 8 or less.
より好ましくはR11及びR1+の炭素数の総和は4以
内のものを表わす。More preferably, the total number of carbon atoms in R11 and R1+ is 4 or less.
また、環状酸無水物含有基とは、少なくとも1つの環状
酸無水物を含有する基であり、含有される環状酸無水物
としては、脂肪族ジカルボン酸無水物、芳香族ジカルボ
ン酸無水物が挙げられる。In addition, the cyclic acid anhydride-containing group is a group containing at least one cyclic acid anhydride, and examples of the cyclic acid anhydride include aliphatic dicarboxylic acid anhydride and aromatic dicarboxylic acid anhydride. It will be done.
脂肪族ジカルボン酸無水物の例としては、コハク酸無水
物環、グルタコン酸無水物環、マレイン酸無水物環、シ
クロペンタン−1,2−ジカルボン酸無水物理、シクロ
ヘキサン−1,2−ジカルボン酸無水物溝、シクロヘキ
セン−1゜2−ジカルボン酸無水物環、2.3−ビシク
ロ[2,2,2]オクタンジカルボン酸無水物環等が挙
げられ、これらの環は、例えば塩素原子、臭素原子等の
ハロゲン原子、メチル基、エチル基、ブチル基、ヘキシ
ル基等のアルキル基等が置換されていてもよい。Examples of aliphatic dicarboxylic anhydrides include succinic anhydride ring, glutaconic anhydride ring, maleic anhydride ring, cyclopentane-1,2-dicarboxylic anhydride, and cyclohexane-1,2-dicarboxylic anhydride. Monozoo, cyclohexene-1゜2-dicarboxylic acid anhydride ring, 2,3-bicyclo[2,2,2]octane dicarboxylic acid anhydride ring, etc. These rings include, for example, chlorine atom, bromine atom, etc. may be substituted with a halogen atom, an alkyl group such as a methyl group, an ethyl group, a butyl group, or a hexyl group.
また、芳香族ジカルボン酸無水物の例とじては、フタル
酸無水物環、ナフタレン−ジカルボン酸無水物環、ピリ
ジン−ジカルボン酸無水物環、チオフェン−ジカルボン
酸無水物理等が挙げられ、これらの環は、例えば、塩素
原子、臭素原子等のハロゲン原子、メチル基、エチル基
、プロピル基、ブチル基等のアルキル基、ヒドロキシル
基、シアノ基、ニトロ基、アルコキシカルボニル基(ア
ルコキシ基としては、例えば、メトキシ基、ニドキシ基
等)等が置換されていてもよい。Further, examples of aromatic dicarboxylic anhydrides include phthalic anhydride ring, naphthalene-dicarboxylic anhydride ring, pyridine-dicarboxylic anhydride ring, thiophene-dicarboxylic anhydride ring, etc. is, for example, a halogen atom such as a chlorine atom or a bromine atom, an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hydroxyl group, a cyano group, a nitro group, an alkoxycarbonyl group (the alkoxy group includes, for example, (methoxy group, nidoxy group, etc.) may be substituted.
又、上記の窒素原子を少なくとも1個含有する複素環と
しては、好ましくは4員〜6員環形成の複素環が挙げら
れ、例えば、ピリジン環、ピペリジン環、ビロール環、
イミダゾール環、ピラジン環、ピロリジン環、ビロリン
環、イミダシリン環、ピラゾリジン環、ピペラジン環、
モルホリン環、ピロリドン環等が挙げられる。Further, the above-mentioned heterocycle containing at least one nitrogen atom preferably includes a 4- to 6-membered heterocycle, such as a pyridine ring, a piperidine ring, a virol ring,
imidazole ring, pyrazine ring, pyrrolidine ring, viroline ring, imidacilline ring, pyrazolidine ring, piperazine ring,
Examples include morpholine ring and pyrrolidone ring.
これらの複素環は置換基を含有してもよく、置換基とし
ては、例えば、ハロゲン原子(フッ素原子、塩素原子、
臭素原子等)、炭素数1〜8の置換されてもよい炭化水
素基(例えば、メチル基、エチル基、プロピル基、ブチ
ル基、2−クロロエチル基、2−ブロモエチル基、24
ドロキシエチル基、2−シアノエチル基、2−メトキシ
エチル基、2−エトキシエチル基、2−ブトキシエチル
基、2−カルボキシエチル基、カルボキシメチル基、3
−スルホプロピル基、4−スルホブチル基、2−メトキ
シカルボニルエチル基、2−エトキシカルボニルエチル
基、2−メタンスルホニルエチル基、ベンジル基、カル
ボキシベンジル基、カルボキシメチルベンジル基、フェ
ニル基、カルボキシフェニル基、スルホフェニル基、メ
タンスルホニルフェニル基、エタンスルホニルフェニル
基、カルボキシメチルフェニル基、メトキシフェニル基
、クロロフェニル基等) −OR+s (Rls
は、上記炭素数1〜8の置換されてもよい炭化水素基と
同一の内容を表わす)又は −COOR,、基(R14
はRtsと同一の内容を表わす)等が挙げられる。These heterocycles may contain substituents, such as halogen atoms (fluorine atoms, chlorine atoms,
bromine atom, etc.), an optionally substituted hydrocarbon group having 1 to 8 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, 2-chloroethyl group, 2-bromoethyl group, 24
Droxyethyl group, 2-cyanoethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-butoxyethyl group, 2-carboxyethyl group, carboxymethyl group, 3
-Sulfopropyl group, 4-sulfobutyl group, 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-methanesulfonylethyl group, benzyl group, carboxybenzyl group, carboxymethylbenzyl group, phenyl group, carboxyphenyl group, sulfophenyl group, methanesulfonylphenyl group, ethanesulfonylphenyl group, carboxymethylphenyl group, methoxyphenyl group, chlorophenyl group, etc.) -OR+s (Rls
represents the same content as the optionally substituted hydrocarbon group having 1 to 8 carbon atoms) or -COOR,, group (R14
represents the same content as Rts).
又、上記−COOR基、−3O,H基、503H基、1
5RIS
H
(例えば、リチウム、ナトリウム、カリウム等)アルカ
リ土類金属(例えば、カルシウム、マグネシウム等)、
亜鉛、アルミニウム等の金属塩又は有機塩基(例えば、
トリエチルアミン、・ピリジン、モルホリン、ピペラジ
ン等)との塩を形成していてもよい。In addition, the above -COOR group, -3O,H group, 503H group, 1
5RISH (e.g. lithium, sodium, potassium etc.) alkaline earth metals (e.g. calcium, magnesium etc.),
Metal salts such as zinc, aluminum or organic bases (e.g.
triethylamine, pyridine, morpholine, piperazine, etc.).
本発明の樹脂粒子の主要成分を構成する単量体(A)は
以上の如き極性基の少なくとも1種を含有するもので且
つ、重合性二重結合基を1個分子中に有するものであれ
ばいずれでもよい。The monomer (A) constituting the main component of the resin particles of the present invention may contain at least one of the above polar groups and have one polymerizable double bond group in one molecule. Either is fine.
更に具体的に該単量体(A)の例を一般式(II)で示
す。More specifically, an example of the monomer (A) is shown by general formula (II).
一般式(n)
X、−LIJI
式中、Lは、直接結合もL < バーC0D−、−DC
O−I6
R+sは各々水素原子又は炭素数1〜7の置換されても
よい炭化水素基(好ましくは、例えば、メチル基、エチ
ル基、プロピル基、ブチル基、2−クロロエチル基、2
−ヒドロキシエチル基、3−ブロム−2−ヒドロキシプ
ロピル基、2−カルボキシエチル基、3−カルボキシプ
ロピル基、4−カルボキシブチル基、3−スルホプロピ
ル基、ベンジル基、スルホベンジル基、メトキシベンジ
ル基、カルボキシベンジル基、フェニル基、スルホフェ
ニル基、カルボキシフェニル基、ヒドロキシフェニル基
、2−メトキシエチル基、3−メトキシプロピル基、2
−メタンスルホニルエチル基、2−シアノエチル基、N
IN (ジクロロエチル)アミノベンジル基、N、N(
ジヒドロキシエチル)アミノベンジル基、クロロベンジ
ル基、メチルベンジル基、N、N(ジヒドロキシエチル
)了ミノフェニル基、メタンスルホニルフェニル基、シ
アノフェニル基、ジシアノフェニル基、了セチルフェニ
ル基等)を表わし、
RIl、Ltは同一でも異なってもよく、水素原子、ハ
ロゲン原子(好ましくは、例えばフッ素原子、塩素原子
、臭素原子等)又は炭素数1〜4の脂肪族基(好ましく
は、例えばメチル基、エチル基、プロピル基、ブチル基
等)を表わし、iは1〜6の整数を表わす。〕
Wは前記した単量体(A)の極性基を表わす。General formula (n)
O-I6 R+s is each a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 7 carbon atoms (preferably, for example, methyl group, ethyl group, propyl group, butyl group, 2-chloroethyl group, 2
-Hydroxyethyl group, 3-bromo-2-hydroxypropyl group, 2-carboxyethyl group, 3-carboxypropyl group, 4-carboxybutyl group, 3-sulfopropyl group, benzyl group, sulfobenzyl group, methoxybenzyl group, Carboxybenzyl group, phenyl group, sulfophenyl group, carboxyphenyl group, hydroxyphenyl group, 2-methoxyethyl group, 3-methoxypropyl group, 2
-methanesulfonylethyl group, 2-cyanoethyl group, N
IN (dichloroethyl)aminobenzyl group, N, N(
RIl, Lt may be the same or different, and is a hydrogen atom, a halogen atom (preferably, for example, a fluorine atom, a chlorine atom, a bromine atom, etc.) or an aliphatic group having 1 to 4 carbon atoms (preferably, for example, a methyl group, an ethyl group, (propyl group, butyl group, etc.), and i represents an integer of 1 to 6. ] W represents the polar group of the monomer (A) described above.
−c−c=c+ 、 −coo−、−oco−、−o−
、−5S02=
CON
SO,N
1゜
から選択される連結基又はこれらの連結基の組合せによ
って形成される結合基を表わす。-c-c=c+, -coo-, -oco-, -o-
, -5S02=CON SO, N 1° represents a linking group formed by a combination of these linking groups.
〔ここで、1、〜14は各々同じでも異なってもよく、
水素原子、ハロゲン原子(好ましくは、例えば、フッ素
原子、塩素原子、臭素原子等)又は炭素数1〜7の炭化
水素基(好ましくは、例えば、メチル基、エチル基、プ
ロピル基、ブチル基、2−クロロエチル基、2−メトキ
シエチル基、2−メトキシカルボニルエチル基、ベンジ
ル基、メトキシベンジル基、フェニル基、メトキシフェ
ニル基、メトキシカルボニルフェニル基等)又は式(n
)の−[L、−111:]基を表わし、1、〜1.は上
記のRISの内容と同一のものを表わす。〕
b+ 、 b2は同じでも異なっていてもよく、水素原
子、ハロゲン原子(好ましくは、例えば、フッ素原子、
塩素原子、臭素原子等) −CDOR基、−CDOR
,a基、−CI(、C0OR,、基 (R18は炭素数
1〜7の炭化水素基を表わし、具体的には、前記RIS
の炭化水素基と同様の内容が挙げられる)又は炭素数1
〜4のアルキル基(好ましくは、例えば、メチル基、エ
チル基、プロピル基、ブチル基等)を表わす。[Here, 1 and 14 may be the same or different,
Hydrogen atom, halogen atom (preferably, for example, fluorine atom, chlorine atom, bromine atom, etc.) or a hydrocarbon group having 1 to 7 carbon atoms (preferably, for example, methyl group, ethyl group, propyl group, butyl group, 2 -chloroethyl group, 2-methoxyethyl group, 2-methoxycarbonylethyl group, benzyl group, methoxybenzyl group, phenyl group, methoxyphenyl group, methoxycarbonylphenyl group, etc.) or formula (n
) represents a -[L, -111:] group, 1, to 1. represents the same content as the above RIS. ] b+ and b2 may be the same or different, and each represents a hydrogen atom, a halogen atom (preferably, for example, a fluorine atom,
chlorine atom, bromine atom, etc.) -CDOR group, -CDOR
, a group, -CI(, COOR,, group (R18 represents a hydrocarbon group having 1 to 7 carbon atoms, specifically, the above RIS
) or carbon number 1
-4 alkyl group (preferably, for example, methyl group, ethyl group, propyl group, butyl group, etc.).
以下に、更に具体的に上記の単量体(A)を例示するが
、本発明はこれらに限定されるものではない。The above monomer (A) will be more specifically exemplified below, but the present invention is not limited thereto.
(以下余白) (a−1) C)I2=CH 0OH CONH2,−[1’0NHC2H6゜DOCH3 (a−3) C11,=C 0OHH(CHfYlOH CI n:1〜12の整数 C00(CHf?iC口OH 竪致 (a a : ■ CH3 H 0NH2 一3O2NH2 DH (a−8) (a−9> C0D(CH2t、5O3H 整数 (a−15) C112=C a: −H、−C)13 N (a−22) H−N(C2H,>3 aニ ーH。(Margin below) (a-1) C) I2=CH 0OH CONH2, -[1’0NHC2H6゜DOCH3 (a-3) C11,=C 0OHH(CHfYlOH C.I. n: integer from 1 to 12 C00 (CHf?iC mouth OH vertical line (a a: ■ CH3 H 0NH2 -3O2NH2 D.H. (a-8) (a-9> C0D(CH2t, 5O3H integer (a-15) C112=C a: -H, -C) 13 N (a-22) H-N(C2H,>3 a ni -H.
”CH3
(a−23)
CH,=C
暑
COO(CH2) 20CO(CH,) 、CD01l
(a−18)
a:
Hl
−CH。”CH3 (a-23) CH,=C Hot COO(CH2) 20CO(CH,), CD01l
(a-18) a: Hl-CH.
CL=C aニ ー■ −CH。CL=C a ni -■ -CH.
C0NH。C0NH.
CI(、=C
COD ([:Hl) 、DCDCII=CH−CDD
Haニ
ーH。CI(,=C COD ([:Hl), DCDCII=CH-CDD
Ha knee h.
CH,。CH.
−CH,CD0CR。-CH, CD0CR.
(a
(a
CH2=C
CD(CH2)2NHCO(C)12)、、CDONC
H2
■
CH3
a: −H,−CH5
COD(CH2)2N(CH3)2
n:1〜10の整数
(a
(a−29)
CH。(a (a CH2=C CD(CH2)2NHCO(C)12),, CDONC
H2 ■ CH3 a: -H, -CH5 COD(CH2)2N(CH3)2 n: An integer from 1 to 10 (a (a-29) CH.
COD (CH2) 、、OCO(CL)−CDONC
H,=C
a:
■
C1l。COD(CH2) ,,OCO(CL)-CDONC
H,=C a: ■ C1l.
a: ■。a: ■.
CH3゜ CH2CD0CH3 COD(CH,) 2N(CH,CH2DH)。CH3゜ CH2CD0CH3 COD(CH,)2N(CH,CH2DH).
n:
2〜10の整数
(a
m:1〜10の整数
(但しくn+m)
が10以下)
(a
CH2=C
(a
COO(CH2Cl(2[1−hOcO(CH,)、C
OO1laニ
ーH。n: an integer of 2 to 10 (a m: an integer of 1 to 10 (however, n+m) is 10 or less) (a CH2=C (a COO(CH2Cl(2[1-hOcO(CH,), C
OO1la knee H.
−CHs。-CHs.
CI
n:1〜4の整数
しUUUthL:HUthUH
m=
1〜4の整数
(a−32)
(a−37)
[’1(2=C
COD(CH2)2NHCO(C)+2)zcOONa
aニ
ーH。CI n: an integer from 1 to 4 UUUthL: HUthUH m= an integer from 1 to 4 (a-32) (a-37) ['1(2=C COD(CH2)2NHCO(C)+2)zcOONa
a knee h.
CH,。CH.
CH,、C00CH。CH,,C00CH.
(a−33) (a−38) (a (a−34) (a CL=CH a: H Cl1゜ (a−41) a: CH。(a-33) (a-38) (a (a-34) (a CL=CH a: H Cl1゜ (a-41) a: CH.
CH。CH.
(a−42) (a−46) (a−43) (a−44) CI(。(a-42) (a-46) (a-43) (a-44) CI(.
CI(2=C
CDDC)1.−CI(CH2DC[1(CH2)2C
OOHH
(a−45)
(a−47)
CH2=C1l−Ct120CD(CHiCOOHn:
1〜3の整数
(a−48)
以上の様な極性基含有の単量体(A)と共に共重合し得
る、フッ素原子及び/又はケイ素原子を少なくとも1個
以上含有する置換基を含む一官能性単量体(B)につい
て説明すると、本発明の一官能性単量体(B)は、上記
要件を満たす化合物であればいずれでもよい。また、以
下に具体的な置換基の内容を説明するが、これらの化学
構造に限定されるものではない。CI (2=C CDDC)1. -CI(CH2DC[1(CH2)2C
OOHH (a-45) (a-47) CH2=C1l-Ct120CD (CHiCOOHn:
An integer of 1 to 3 (a-48) A monofunctional compound containing a substituent containing at least one fluorine atom and/or silicon atom, which can be copolymerized with the polar group-containing monomer (A) as described above. Regarding the monofunctional monomer (B), the monofunctional monomer (B) of the present invention may be any compound as long as it satisfies the above requirements. Further, although the specific contents of the substituents will be explained below, they are not limited to these chemical structures.
フッ素原子を含有する置換基としては、例えば−ChF
zh++ (hは1〜12の整数を表わす)iCh)
1cFaH(Jは1〜11の整数を表わす)、が挙げら
れる。Examples of substituents containing a fluorine atom include -ChF
zh++ (h represents an integer from 1 to 12) iCh)
1cFaH (J represents an integer of 1 to 11).
ケイ素原子含有の置換基としては例えば、数を表わす) れる。Examples of silicon atom-containing substituents include numbers) It will be done.
ポリシロキサン構造等が挙げら
但し、R3,R,、R5は、同じでも異なってもよく、
置換されていてもよい炭化水素基又は−OR,基(R,
は、R3の炭化水素基と同一の内容を表わす)を表わす
。Examples include polysiloxane structures, etc. However, R3, R, and R5 may be the same or different,
An optionally substituted hydrocarbon group or -OR, group (R,
represents the same content as the hydrocarbon group of R3).
R3は、炭素数1〜18の置換されてもよいアルキル基
(例えばメチル基、エチル基、プロピル基、ブチル基、
ヘキシル基、オクチル基、デシル基、ドデシル基、ヘキ
サデシル基、2−クロロエチル基、2−ブロモエチル基
、2.2゜2−トリフロロエチル基、2−シアノエチル
基、3.3.3−)リフロロプロビル基、2−メトキシ
エチル基、3−ブロモプロピル基、2−メトキシカルボ
ニルエチル基、2.2.2.2’2’、2’−へキサフ
ロロイソプロピル基、等)炭素数4〜18の置換されて
もよいアルケニル基(例えば、2−メチル−1−プロペ
ニル基、2−ブテニル基、2−ペンテニル基、3−メチ
ル−2−ペンテニル基、1−ペンテニル基、1−へキセ
ニル基、2−へキセニル基、4−メチル−2−ヘキセニ
ル基等)、炭素数7〜12の置換されていてもよいアラ
ルキル基(例えば、ベンジル基、フェネチル基、3−フ
ェニルプロピル基、ナフチルメチル基、2−ナフチルエ
チル基、クロロベンジル基、ブロモベンジル基、メチル
ベンジル基、エチルベンジル基、メトキシベンジル基、
ジメチルベンジル基、ジメトキシベンジル基等)、炭素
数5〜8の置換されていてもよい脂環式基(例えば、シ
クロヘキシル基、2−シクロヘキシル基、2−シクロペ
ンチルエチル基等)又は炭素数6〜12の置換されてい
てもよい芳香族基(例えば、フェニル基、ナフチル基、
トリル基、キシリル基、プロピルフェニル基、ブチルフ
ェニル基、オクチルフェニル基、ドデシルフェニル基、
メトキシフェニル基、エトキシフェニル基、ブトキシフ
ェニル基、テシルオキシフェニル基、クロロフェニル基
、ジクロロフェニル基、ブロモフェニル基、シアノフェ
ニル基、アセチルフェニル基、メトキシカルボニルフェ
ニル基、エトキシカルボニルフェニル基、ブトキシカル
ボニルフェニル基、アセトアミドフェニル基、プロピオ
アミドフェニル基、ドブシロイルアミドフェニル基等)
カ挙げられる。R3 is an optionally substituted alkyl group having 1 to 18 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group,
Hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2.2゜2-trifluoroethyl group, 2-cyanoethyl group, 3.3.3-)lifluoropropylene Biru group, 2-methoxyethyl group, 3-bromopropyl group, 2-methoxycarbonylethyl group, 2.2.2.2'2', 2'-hexafluoroisopropyl group, etc.) having 4 to 18 carbon atoms. Alkenyl groups that may be substituted (e.g., 2-methyl-1-propenyl group, 2-butenyl group, 2-pentenyl group, 3-methyl-2-pentenyl group, 1-pentenyl group, 1-hexenyl group, 2 -hexenyl group, 4-methyl-2-hexenyl group, etc.), optionally substituted aralkyl groups having 7 to 12 carbon atoms (e.g., benzyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, - naphthylethyl group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group,
(dimethylbenzyl group, dimethoxybenzyl group, etc.), an optionally substituted alicyclic group having 5 to 8 carbon atoms (e.g., cyclohexyl group, 2-cyclohexyl group, 2-cyclopentylethyl group, etc.) or 6 to 12 carbon atoms optionally substituted aromatic groups (e.g. phenyl group, naphthyl group,
tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group,
Methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, tesyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group, acetamidophenyl group, propioamidophenyl group, dobcyroylamidophenyl group, etc.)
It can be mentioned.
OR9基において、Rsは、上記R3の炭化水素基と同
一の内容を表わす。In the OR9 group, Rs represents the same content as the hydrocarbon group of R3 above.
Rs 、 R,、Ra は同じでも異なってもよく
、R3,R,、R6と同一の記号の内容を表わす。Rs, R,, Ra may be the same or different and represent the same symbol content as R3, R,, R6.
次に、以上の様なフッ素原子及び/又はケイ素原子を含
有した置換基を有する一官能性単量体(B)の具体例を
以下に示す。しかし、本発明の範囲がこれらに限定され
るものではない。Next, specific examples of the monofunctional monomer (B) having a substituent containing a fluorine atom and/or a silicon atom as described above are shown below. However, the scope of the present invention is not limited thereto.
(b−1) CH2=C C00CH,CH2ChP2h、。(b-1) CH2=C C00CH, CH2ChP2h,.
(b−3)
CH2=C
C00CH,CH,(CF、)ユCF、Hj:1〜11
の整数
(b−4)
i:1〜3の整数
(b−5)
(b−7)
Cl(、=C
C0D(CH2)2NH3O,Rf
Rf : −CLChF2h++
(b−6)
1:1〜6の整数
SO,Rf
(b−10)
CH2=C
C[]NHCOORf
(b
(b
CH,=C
CD0CR2CF2CF211
(b
COO3i−C−Hs
6H5
CH2=C
(b
Coo(CH2)O−Rf
(b
CH2=C
R、/
CD口(CH2) 20si−L’
CH,=C
CH3
R3/
C00(CL)Si
OCH3
R、/
、R2′
R3′:
[][’)13
炭素数1〜12のアルキル基
(b−14)
(b
わ
CH,=C
CH5
Coo (CH2)20Si
CH3
CH3
CH。(b-3) CH2=C C00CH, CH, (CF,)YCF, Hj: 1 to 11
(b-4) i: An integer of 1 to 3 (b-5) (b-7) Cl(,=C C0D(CH2)2NH3O,Rf Rf: -CLChF2h++ (b-6) 1:1 to 6 Integer SO,Rf (b-10) CH2=C C[]NHCOORf (b (b CH,=C CD0CR2CF2CF211 (b COO3i-C-Hs 6H5 CH2=C (b Coo(CH2)O-Rf (b CH2= C R,/CD port (CH2) 20si-L' CH,=C CH3 R3/ C00(CL)Si OCH3 R,/, R2'R3':[][')13 Alkyl group having 1 to 12 carbon atoms ( b-14) (b CH,=C CH5 Coo (CH2)20Si CH3 CH3 CH.
(b
(b
CH,=C
CH3
Hs
C’)1.=c
R,/
CD[](CH2) 20si−tO3i(ロ)−、[
1:H3CH。(b (b CH,=C CH3 Hs C')1.=c R,/CD[](CH2) 20si-tO3i(b)-,[
1:H3CH.
CH3 q : 1〜20の整数 R3/ (b (b [:H,=[: CH。CH3 q: integer from 1 to 20 R3/ (b (b [:H,=[: CH.
CH,=C
R,/
C0D(CH2)−0Si−tCH,→−、CDOR,
’CD0CH,5i−R2’
CH。CH,=CR,/C0D(CH2)-0Si-tCH,→-,CDOR,
'CD0CH,5i-R2' CH.
R,/
(b
(b−23)
XCD0CHiCH2じド3
(b−24)
(b−27)
CH2=C
OR,’ OR’
CH2=C
CH20COChF2h+1
(b−25)
0R1′
(b−26)
CH3
R’ ニー5t−CH3
CH3
(b−28)
CH,=C
CDDC)12cF、cF2HcF3
(b−29)
へC1,82n+1
CH3CH3CH3
r:0又は1〜20の整数
以上の様な極性基含有の単量体(A)及びフッ!素原子
及び/又はケイ素原子含有の単量体(B)とともに、こ
れら以外の共重合し得る他の単量体を重合体成分として
含有してもよい。R, / (b (b-23) ' 5t-CH3 CH3 (b-28) CH,=C CDDC) 12cF, cF2HcF3 (b-29) to C1,82n+1 CH3CH3CH3 r: Monomer containing a polar group such as 0 or an integer from 1 to 20 or more (A) and phew! Along with the elementary atom and/or silicon atom-containing monomer (B), other copolymerizable monomers other than these may be contained as a polymer component.
他の単量体としては後記する一般式(I)の繰り返し単
位に相当する単量体あるいは該式(II[)で示される
成分に相当する単量体と共重合するものが挙げられる。Examples of other monomers include monomers that are copolymerized with monomers corresponding to repeating units of the general formula (I) described later or monomers corresponding to the components represented by the formula (II[).
該樹脂中の重合成分として、単量体(A)の存在割合は
、30重量%以上好ましくは50重量%以上であり、単
量体(B)の存在割合は0.5重量%〜30重量%、好
ましくは1重量%〜20重量%である。他の共重合し得
る単量体を含有する場合は、多くても20重量%以下で
ある。As a polymerization component in the resin, the proportion of monomer (A) present is 30% by weight or more, preferably 50% by weight or more, and the proportion of monomer (B) is 0.5% to 30% by weight. %, preferably 1% to 20% by weight. When other copolymerizable monomers are contained, the amount is at most 20% by weight or less.
この非水溶媒に不溶性となる重合成分として重要なこと
は、前記した蒸留水に対する接触角で表される親水性が
50度以下を満足できるものであればよい。It is important that the polymerization component is insoluble in the non-aqueous solvent as long as it can satisfy the above-mentioned hydrophilicity expressed by the contact angle with respect to distilled water of 50 degrees or less.
次に本発明の分散安定用樹脂について説明する。該分散
安定用樹脂は非水溶媒と溶媒和し可溶性であることが重
要であり、いわゆる非水系分散重合における分散安定化
作用を担うものであり、具体的には該溶媒100重量部
に対し、温度25℃において少なくとも5重量%溶解す
るものであればよい。Next, the dispersion stabilizing resin of the present invention will be explained. It is important that the dispersion stabilizing resin is solvated and soluble in the nonaqueous solvent, and plays a dispersion stabilizing effect in so-called nonaqueous dispersion polymerization. Specifically, for 100 parts by weight of the solvent, Any material may be used as long as it dissolves at least 5% by weight at a temperature of 25°C.
該分散安定用樹脂の重量平均分子量は1×103〜5X
105であり、好ましくは2×103〜1×105、特
に好ましくは3X10’〜5X10’である。該樹脂の
重量平均分子量がlXl0’未満になると、生成した分
散樹脂粒子の凝集が発生し、平均粒径が揃った微粒子が
得られなくなってしまう。一方5X105を超えると、
光導電層中に添加した時に電子写真特性を満足しつつ保
水性向上するという本発明の効果が薄れてしまう。The weight average molecular weight of the dispersion stabilizing resin is 1×103 to 5×
105, preferably 2x103 to 1x105, particularly preferably 3x10' to 5x10'. When the weight average molecular weight of the resin is less than 1X10', agglomeration of the produced dispersed resin particles occurs, making it impossible to obtain fine particles with a uniform average particle size. On the other hand, if it exceeds 5X105,
When added to the photoconductive layer, the effect of the present invention of improving water retention while satisfying electrophotographic properties is diminished.
本発明の分散安定用樹脂は、該非水溶媒に可溶性の重合
体であればいずれでもよいが、具体的には、に、B、J
、Barrett r Dispersion Po
lym−erization in Organic
MediaJJohn Wiley and5ons
(1975年刊) R,Dowpenco、[]、P
。The dispersion stabilizing resin of the present invention may be any polymer as long as it is soluble in the non-aqueous solvent.
, Barrett r Dispersion Po
Lym-erization in Organic
MediaJJohn Wiley and5ons
(Published in 1975) R, Dowpenco, [], P
.
Hart 、 Ind、Eng、Chem、Pro
d、Res、Develop、 1 2゜(Nα1)
14(1973)、丹下豊吉、日本接着協会跡 2
3 (1)、26 (1987)D、J、 Wa
lbridge S NAT口、Adv、5tudy
In5t、 Ser。Hart, Ind, Eng, Chem, Pro
d, Res, Develop, 1 2° (Nα1)
14 (1973), Toyokichi Tange, Japan Adhesive Association Ruins 2
3 (1), 26 (1987) D, J, Wa
lbridge S NAT port, Adv, 5tudy
In5t, Ser.
B、N(167,40(1983) Y、5asa
ki andM、 Yabuta 、 Proc
、 10th、 Int、Conf、Org。B, N (167, 40 (1983) Y, 5asa
ki and M, Yabuta, Proc.
, 10th, Int, Conf, Org.
Coat、Sci、Technol、1 0. 2 6
3 (1984)等の総説に引例の各重合体が挙げ
られる。Coat, Sci, Technol, 10. 2 6
3 (1984) etc., the cited polymers are listed.
例えばオレフィン重合体、変性オレフィン重合体、スチ
レン−オレフィン共重合体、脂肪族カルボン酸ビニルエ
ステル共重合体、変性無水マレイン酸共重合体、ポリエ
ステル重合体、ポリエーテル重合体、メタクリレートホ
モ重合体、アクリレートホモ重合体、メタクリレート共
重合体、アクリレート共重合体、アルキッド樹脂等であ
る。For example, olefin polymers, modified olefin polymers, styrene-olefin copolymers, aliphatic carboxylic acid vinyl ester copolymers, modified maleic anhydride copolymers, polyester polymers, polyether polymers, methacrylate homopolymers, acrylates These include homopolymers, methacrylate copolymers, acrylate copolymers, alkyd resins, and the like.
より具体的には、本発明の分散安定用樹脂の繰り返し単
位として供される重合体成分としては、下記一般式(I
[I)で表される成分が挙げられる。More specifically, the polymer component serving as a repeating unit of the dispersion stabilizing resin of the present invention has the following general formula (I
Examples include the component represented by [I].
一般式(II[)
c、 c2
−fCH−C+−
X、−R2、
式(I)中、x2は式(I)のV。と同一の内容を表わ
し、詳細は式(I)のV。の説明に記載されている。General formula (II[) c, c2 -fCH-C+- X, -R2, In formula (I), x2 is V of formula (I). represents the same content as V in formula (I) for details. described in the description.
R21は、炭素数1〜22の置換されてもよいアルキル
基(例えばメチル基、エチル基、プロピル基、ブチル基
、ペンチル基、ヘキシル基、オクチル基、ノニル基、デ
シル基、ドデシル基、トリデシル基、テトラデシル基、
ヘキサデシル基、オクタデシル基、ドデセニル基、2−
(N。R21 is an optionally substituted alkyl group having 1 to 22 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, octyl group, nonyl group, decyl group, dodecyl group, tridecyl group) , tetradecyl group,
hexadecyl group, octadecyl group, dodecenyl group, 2-
(N.
N−ジメチルアミノ)エチル基、2−(N−モルホリノ
)エチル基、2−クロロエチル基、2−ブロモエチル基
、2−ヒドロキシエチル基、2−シアノエチル基、2−
(α−チエニル)エチル基、2−カルボキシエチル基、
2−メトキシカルボニルエチル基、2.3−エポキシプ
ロビル基、2.3−ジアセトキシプロピル基、3−クロ
ロプロピル基、4−エトキシカルボニルブチル基等)、
炭素数3〜22の置換されてもよいアルケニル基(例え
ばアリル基、ヘキセニル基、オクテニル基、ドセニル基
、ドデセニル基、トリデセニル基、オクタデセニル基、
オレイル基、リルイル基等)、炭素数7〜22の置換さ
れてもよいアラルキル基(例えばベンジル基、フェネチ
ル基、3−フェニルプロピル基、2−ナフチルメチル基
、2− (2’ −ナフチル)エチル基、クロロベンジ
ル基、ブロモベンジル基、メチルベンジル基、ジメチル
ベンジル基、トリメチルベンジル基、メトキシベンジル
基、ジメトキシベンジル基、ブチルベンジル基、メトキ
シカルボニルベンジル基等)、炭素数4〜12の置換さ
れてもよい脂環式基(例えばシクロペンチル基、シクロ
ヘキシル基、シクロオクチル基、アダマンチル基、クロ
ロシクロヘキシル基、メチルシクロヘキシル基、メトキ
シシクロヘキシル基等)、炭素数6〜22の置換されて
もよい芳香族基(例えばフェニル基、トリル基、キシリ
ル基、メシチル基、ナフチル基、アントラニル基、クロ
ロフェニル基、ブロモフェニル基、ブチルフェニル基、
ヘキシルフェニル基、オクチルフェニル基、デシルフェ
ニル基、ドデシルフェニル基、メトキシフェニル基、エ
トキシフェニル基、オクチルオキシフェニル基、エトキ
シカルボニルフェニル基、アセチルフェニル基、フトキ
シ力ルポニルフェニル基、ブチルメチルフェニル基、N
、N−ジブチルアミノフェニル基、N−メチル−N−ド
デシルフェニル基、チエニル基、ヒラニル基等)等が挙
げられる。N-dimethylamino)ethyl group, 2-(N-morpholino)ethyl group, 2-chloroethyl group, 2-bromoethyl group, 2-hydroxyethyl group, 2-cyanoethyl group, 2-
(α-thienyl)ethyl group, 2-carboxyethyl group,
2-methoxycarbonylethyl group, 2.3-epoxypropyl group, 2.3-diacetoxypropyl group, 3-chloropropyl group, 4-ethoxycarbonylbutyl group),
An optionally substituted alkenyl group having 3 to 22 carbon atoms (e.g. allyl group, hexenyl group, octenyl group, docenyl group, dodecenyl group, tridecenyl group, octadecenyl group,
oleyl group, lylyl group, etc.), optionally substituted aralkyl groups having 7 to 22 carbon atoms (e.g. benzyl group, phenethyl group, 3-phenylpropyl group, 2-naphthylmethyl group, 2-(2'-naphthyl)ethyl) group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, dimethylbenzyl group, trimethylbenzyl group, methoxybenzyl group, dimethoxybenzyl group, butylbenzyl group, methoxycarbonylbenzyl group, etc.), substituted with 4 to 12 carbon atoms alicyclic groups (e.g. cyclopentyl group, cyclohexyl group, cyclooctyl group, adamantyl group, chlorocyclohexyl group, methylcyclohexyl group, methoxycyclohexyl group, etc.), optionally substituted aromatic groups having 6 to 22 carbon atoms ( For example, phenyl group, tolyl group, xylyl group, mesityl group, naphthyl group, anthranyl group, chlorophenyl group, bromophenyl group, butylphenyl group,
hexylphenyl group, octylphenyl group, decylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group, octyloxyphenyl group, ethoxycarbonylphenyl group, acetylphenyl group, phthoxylponylphenyl group, butylmethylphenyl group, N
, N-dibutylaminophenyl group, N-methyl-N-dodecylphenyl group, thienyl group, hyranyl group, etc.).
CI+ C2は式(I)中のal+ 12と同一の内容
を表わし、詳細は式(I)のal+ alilの説明に
記載される。CI+ C2 represents the same content as al+ 12 in formula (I), and details are described in the explanation of al+ alil in formula (I).
本発明の分散安定用樹脂中の重合体成分として、以上述
べた成分とともに、他の重合体成分を含有してもよい。As the polymer component in the dispersion stabilizing resin of the present invention, other polymer components may be contained in addition to the components described above.
他の重合体成分としては、一般式(I[r)で示される
成分に相当する単量体と共重合するものであればいずれ
でもよく、相当する単量体としては、例えば、α−オレ
フィン類、アクリロニトリル、メタクロロニトリル、ビ
ニル含有複素環類(複素環としては例えばピラン環、ピ
ロドリン環、イミダゾール環、ピリジン環等) ビニル
基含有のカルボン酸類(例えばアクリル酸、メタクリル
酸、クロトン酸、イタコン酸、マレイン酸等) ビニル
基含有のカルボキシアミド類(例えばアクリルアミド、
メタクリルアミド、クロトン酸アミド、イタコン酸アミ
ド、イタコン酸半アミド、イタコン酸ジアミド等)等が
挙げられる。Any other polymer component may be used as long as it copolymerizes with the monomer corresponding to the component represented by the general formula (I[r), and examples of the corresponding monomer include, for example, α-olefin , acrylonitrile, methachloronitrile, vinyl-containing heterocycles (heterocycles include, for example, pyran ring, pyrodrine ring, imidazole ring, pyridine ring, etc.) vinyl group-containing carboxylic acids (for example, acrylic acid, methacrylic acid, crotonic acid, itacon) acids, maleic acid, etc.) Vinyl group-containing carboxamides (e.g. acrylamide,
(methacrylamide, crotonic acid amide, itaconic acid amide, itaconic acid half amide, itaconic acid diamide, etc.).
本発明の分散安定用樹脂において、一般式(III)で
示される重合体成分は、該樹脂の全重合体100重量部
中30重量部以上、好ましくは50重量部以上である。In the dispersion stabilizing resin of the present invention, the polymer component represented by general formula (III) is at least 30 parts by weight, preferably at least 50 parts by weight, based on 100 parts by weight of the total polymer of the resin.
更には、本発明の分散安定用樹脂が、高分子鎮中に前記
した一般式(I)で示される重合性二重結合基部分を少
なくとも1種含有して成ることが好ましい。Furthermore, it is preferable that the dispersion stabilizing resin of the present invention contains at least one kind of polymerizable double bond group moiety represented by the above-mentioned general formula (I) in the polymer base.
以下に、該重合性二重結合基部分について説明する。The polymerizable double bond group portion will be explained below.
一般式(1)
%式%
一般式(1)において、voは−0−−COO−−OC
O−fC)1.i0C’0− (−f”H,)
p−e−fin−CONHCOO−、又は−CONHC
ONH−を表わす(pは1〜4の整数を表す)。General formula (1) %Formula% In general formula (1), vo is -0--COO--OC
O-fC)1. i0C'0- (-f"H,)
p-e-fin-CONHCOO- or -CONHC
represents ONH- (p represents an integer from 1 to 4).
ここでR1は水素原子のほか、好ましい炭化水素基とし
ては、炭素数1〜18の置換されてもよいアルキル基(
例えば、メチル基、エチル基、プロピル基、ブチル基、
ヘプチル基、ヘキシル基、オクチル基、デシル基、ドデ
シル基、ヘキサデシル基、オクタデシル基、2−クロロ
エチル基、2−ブロモエチル基、2−シアノエチル基、
2−メトキシカルボニルエチル基、2−メトキシエチル
基、3−ブロモプロピル基等)炭素数4〜18の置換さ
れてもよいアルケニル基(例えば2−メチル−1−プロ
ペニル基、2−ブテニル基、2−ペンテニル基、3−メ
チル−2−ペンテニル基、1−ペンテニル基、1−ヘキ
セニル基、2−へキセニル基、4−メチル−2−ヘキセ
ニル基、等)、炭素数7〜12の置換されていてもよい
アラルキル基(例えば、ベンジル基、フェネチル基、3
−7エニルフロピル基、ナフチルメチル基、2−ナフチ
ルエチル基、クロロベンジル基、ブロモベンジル基、メ
チルベンジル基、エチルベンジル基、メトキシベンジル
基、ジメチルベンジル基、ジメトキシベンジル基等)、
炭素数5〜8の置換されていてもよい脂環式基(例えば
、シクロヘキシル基、2−シクロヘキシルエチル基、2
−シクロペンチルエチル基、等)、又は、炭素数6〜1
2の置換されていてもよい芳香族基(例えば)工ニル基
、ナフチル基、トリル基、キシリル基、プロピルフェニ
ル基、ブチルフェニル基、オクチルフェニル基、ドデシ
ルフェニル基、メトキシフェニル基、エトキシフェニル
基、ブトキシフェニル基、デシルオキシフェニル基、ク
ロロフェニル基、ジクロロフェニル基、ブロモフェニル
基、シアノフェニル基、アセチルフェニル基、メトキシ
カルボニルフェニル基、工)−1−ジカルボニルフェニ
ル
・エニル基、アセトアミドフェニル基、プロピオアミド
フェニル基、ドブシロイルアミドフェニル基等)が挙げ
られる。In addition to a hydrogen atom, R1 is preferably a hydrocarbon group such as an optionally substituted alkyl group having 1 to 18 carbon atoms (
For example, methyl group, ethyl group, propyl group, butyl group,
heptyl group, hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2-cyanoethyl group,
2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-bromopropyl group, etc.) optionally substituted alkenyl groups having 4 to 18 carbon atoms (e.g. 2-methyl-1-propenyl group, 2-butenyl group, 2-methoxyethyl group, 2-bromopropyl group, etc.) -pentenyl group, 3-methyl-2-pentenyl group, 1-pentenyl group, 1-hexenyl group, 2-hexenyl group, 4-methyl-2-hexenyl group, etc.), substituted groups having 7 to 12 carbon atoms. optional aralkyl group (e.g., benzyl group, phenethyl group,
-7enylfuropyl group, naphthylmethyl group, 2-naphthylethyl group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group),
An optionally substituted alicyclic group having 5 to 8 carbon atoms (e.g., cyclohexyl group, 2-cyclohexylethyl group, 2-cyclohexyl group,
-cyclopentylethyl group, etc.), or carbon number 6-1
2 optionally substituted aromatic groups (for example) engineerinyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group , butoxyphenyl group, decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, en)-1-dicarbonylphenyl group, acetamidophenyl group, pioamidophenyl group, dobcyroylamidophenyl group, etc.).
置換基を有してもよい。置換基としては、ハロゲン原子
(例えば塩素原子、臭素原子等)、アルキル基(例えば
、メチル基、エチル基、プロピル基、ブチル基、クロロ
メチル基、メトキシメチル基、等)、アルコキシ基(例
えばメトキシ基、エトキシ基、プロピオキシ基、ブトキ
シ基等)等が挙げられる。It may have a substituent. Examples of substituents include halogen atoms (e.g., chlorine atom, bromine atom, etc.), alkyl groups (e.g., methyl group, ethyl group, propyl group, butyl group, chloromethyl group, methoxymethyl group, etc.), alkoxy groups (e.g., methoxymethyl group, etc.). group, ethoxy group, propioxy group, butoxy group, etc.).
al及びC2は、互いに同じでも異なっていてもよく、
好ましくは水素原子、ハロゲン原子(例えば塩素原子、
臭素原子等)、シアノ基、炭素数1〜4のアルキル基(
例えば、メチル基、エチル基、プロピル基、ブチル基等
) −COO−R2又は炭化水素を介したC00R2(
R,は、水素原子又は炭素数1〜18のアルキル基、ア
ルケニル基、アラルキル基、脂環式基又はアリール基を
表わし、これらは置換されていてもよく、具体的には、
上記R1について説明したものと同様の内容を表わす)
を表わす。al and C2 may be the same or different from each other,
Preferably hydrogen atoms, halogen atoms (e.g. chlorine atoms,
bromine atom, etc.), cyano group, alkyl group having 1 to 4 carbon atoms (
For example, methyl group, ethyl group, propyl group, butyl group) -COO-R2 or C00R2 via hydrocarbon (
R represents a hydrogen atom or an alkyl group having 1 to 18 carbon atoms, an alkenyl group, an aralkyl group, an alicyclic group, or an aryl group, which may be substituted, specifically,
(Represents the same content as explained for R1 above)
represents.
よ記炭化水素を介した=C[l[l−R,基における炭
化水素としては、メチレン基、エチレン基、プロピレン
基等が挙げられる。Examples of the hydrocarbon in the =C[l[l-R, group] via a hydrocarbon include a methylene group, an ethylene group, a propylene group, and the like.
更に好ましくは、一般式(I)において、V。More preferably, in general formula (I), V.
は、−COO−−0CO−−CH20CD−1−CH2
C[]00− −C[1NH−−3O7Nl(−−C
ONHCOD−又はも異なってもよく、水素原子、メチ
ル基、[:0OR2又は−CH2COOR2を表し、(
R,は、水素原子又は炭素数1〜6のアルキル基(例え
ばメチル基、エチル基、プロピル基、ブチル基、ヘキシ
ル基等を表わす)を表わす。更により好ましくはal
+ C2においていずれか一方が必ず水素原子を表わす
。is -COO--0CO--CH20CD-1-CH2
C[]00- -C[1NH--3O7Nl(--C
ONHCOD- or may be different and represents a hydrogen atom, a methyl group, [:0OR2 or -CH2COOR2, (
R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms (eg, methyl group, ethyl group, propyl group, butyl group, hexyl group, etc.). Even more preferably al
+ Either one of C2 always represents a hydrogen atom.
即ち、一般式(I)で表わされる重合性二重結合基含有
部分として、具体的には
CH2C00CH3
CH2COOH
CH2=C
O=C−0−’[’11.=CH−C0NHCH−CH
s
CH,=C−C0NH−、CH=CH−C0NH−C)
+3 0CH2=C
−[:0NHCOD−CI(2=CH−0−CCH,=
CH−CH,−0−C−CH,=C1l−0等が挙げら
れる。That is, the polymerizable double bond group-containing moiety represented by the general formula (I) is specifically CH2C00CH3 CH2COOH CH2=C O=C-0-'['11. =CH-C0NHCH-CH
s CH,=C-C0NH-, CH=CH-C0NH-C)
+3 0CH2=C
-[:0NHCOD-CI(2=CH-0-CCH,=
Examples include CH-CH, -0-C-CH, =C11-0, and the like.
これらの重合性二重結合基含有部分は高分子鎖の主鎖に
直接結合されるか又は任意の連結基で結合されたもので
ある。連結する基として具体的には二価の有機残基であ
って、−D−−3−d+
−N−−3O−−3O2−−COD−−’0COd2
da
=C[INHCO−1−NH[’0NH−1−[’[)
N−−3[]、N−及びSi−から選ばれた結合基を介
在させてもよい、s
二価の脂肪族基もしくは二価の芳香族基、又はこれらの
二価の残基の組合せにより構成された有機残基を表わす
。ここで、d1〜d、は式(I)におけるR1と同一の
内容を表わす。These polymerizable double bond group-containing moieties are bonded directly to the main chain of the polymer chain or via an arbitrary linking group. Specifically, the connecting group is a divalent organic residue, -D--3-d+ -N--3O--3O2--COD--'0COd2
da = C[INHCO-1-NH['0NH-1-['[)
s divalent aliphatic group or divalent aromatic group, or a combination of these divalent residues, optionally with intervening bonding groups selected from N--3[], N- and Si- represents an organic residue composed of Here, d1 to d represent the same content as R1 in formula (I).
二価の脂肪族基として、例えば
e、 e、 e2fc士 +C=
C+、−+C目C士
が挙げられる(e+及びC2は、互いに同じでも異なっ
てもよく、各々水素原子、ハロゲン原子(例えばフッ素
原子、塩素原子、臭素原子等)又は炭素数1〜12のア
ルキル基(例えばメチル基、エチル基、プロピル基、ク
ロロメチル基、ブロモメチル基、ブチル基、ヘシキル基
、オクチル基、ノニル基、デシル基等)を表わす。Qは
−口−−8−又は−NR20−を表わし、R20は炭素
数1〜4のアルキル基、−CH2Cl又は−CH2Br
を表わす)
二価の芳香族基としては、例えばベンゼン環基、ナフタ
レン環基及び5又は6員の複素環基(複素環を構成する
ヘテロ原子として、酸素原子、イオウ原子、窒素原子か
ら選ばれたヘテロ原子を少なくとも1種含有する)が挙
げられる。Examples of divalent aliphatic groups include e, e, e2fc+C=
(e+ and C2 may be the same or different, and each represents a hydrogen atom, a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 12 carbon atoms. Represents a group (for example, a methyl group, an ethyl group, a propyl group, a chloromethyl group, a bromomethyl group, a butyl group, a hesyl group, an octyl group, a nonyl group, a decyl group, etc.).Q is -8- or -NR20- represents an alkyl group having 1 to 4 carbon atoms, -CH2Cl or -CH2Br
Examples of divalent aromatic groups include benzene ring groups, naphthalene ring groups, and 5- or 6-membered heterocyclic groups (the hetero atoms constituting the heterocycle are selected from oxygen atoms, sulfur atoms, and nitrogen atoms). containing at least one type of heteroatom).
これらの芳香族基は置換基を有していてもよく、例えば
ハロゲン原子(例えばフッ素原子、塩素原子、臭素原子
等)、炭素数1〜8のアルキル基(例えばメチル基、エ
チル基、プロピル基、ブチル基、ヘキシル基、オクチル
基等)、炭素数1〜6のアルコキシ基(例えばメトキシ
基、エトキシ基、プロピオキシ基、ブトキシ基等)が置
換基の例として挙げられる。These aromatic groups may have a substituent, such as a halogen atom (e.g. fluorine atom, chlorine atom, bromine atom, etc.), an alkyl group having 1 to 8 carbon atoms (e.g. methyl group, ethyl group, propyl group). , butyl group, hexyl group, octyl group, etc.), and an alkoxy group having 1 to 6 carbon atoms (eg, methoxy group, ethoxy group, propoxy group, butoxy group, etc.) as examples of the substituent.
複素環基としては、例えばフラン環、チオフェン環、ピ
リジン環、ピラジン環、ピペラジン環、テトラヒドロフ
ラン環、ピロール環、テトラヒドロピランEi、1.3
−オキサゾリン環等が挙げられる。Examples of the heterocyclic group include furan ring, thiophene ring, pyridine ring, pyrazine ring, piperazine ring, tetrahydrofuran ring, pyrrole ring, tetrahydropyran Ei, 1.3
-oxazoline ring and the like.
以上のような重合性二重結合基含有部分は、具体的には
高分子鎖中にランダム結合されている、又は高分子鎖の
主鎖の片末端にのみ結合されている。好ましくは、高分
子鎮主釦の片末端にのみ重合性二重結合基含有部分が結
合された重合体(以下、−官能性重合体〔M〕と略記す
る)が挙げられる。Specifically, the polymerizable double bond group-containing moiety described above is randomly bonded into the polymer chain, or is bonded only to one end of the main chain of the polymer chain. Preferably, a polymer (hereinafter abbreviated as -functional polymer [M]) in which a polymerizable double bond group-containing portion is bonded only to one end of a polymeric main button is used.
上記−官能性重合体CM)の一般式(I)で示される重
合性二重結合基含有部分と、これに連結する有機残基で
構成される部分の具体例として各々次のものが挙げられ
るが、これらに限定されるものではない。但し、以下の
各側において、Plは−H,−CH3、−C11,C0
0C113、−CI、−Br又は−CNを示し、R2は
一■又は−CH3を示し、Xは−01又は=Brを示し
、nは2〜12の整数を示し、mは1〜4の整数を示す
。The following are specific examples of the polymerizable double bond group-containing moiety represented by the general formula (I) of the functional polymer CM) above and the moiety composed of an organic residue linked to the moiety: However, it is not limited to these. However, on each side below, Pl is -H, -CH3, -C11, C0
0C113, -CI, -Br or -CN, R2 represents 1 or -CH3, X represents -01 or =Br, n represents an integer of 2 to 12, m is an integer of 1 to 4 shows.
(C−1) C’H,= C−C0D(CH2h 0(C−2) CH。(C-1) C'H, = C-C0D (CH2h 0 (C-2) CH.
CI(= CH−0(CH,h 0 (C−3) CH,=CH− (C−8) CH2”C)I CHCH20− 1l (C−9) CH2= C−[”0OC11,C)lcl120H (C−4) CH,= CH−CM。CI(=CH-0(CH,h 0 (C-3) CH, =CH- (C-8) CH2”C)I CHCH20- 1l (C-9) CH2= C-[”0OC11,C)lcl120H (C-4) CH, = CH-CM.
(C−5)
C)l 2= C−Con (CH=)τNH−(C−
6)
CH,= C−CD0CH,CHCH20−叶
(C−7)
P。(C-5) C)l 2= C-Con (CH=)τNH-(C-
6) CH,=C-CD0CH,CHCH20-Kano (C-7) P.
CH2=C−C0NII(CH2+− (C−13) CH,= C−C0D(CH,+;1−(C−14) CH2=C−CON■(CH2−)? (C−22) P2 CH2=C COO(CH2CH2叶?CD(CH旨H3 CH=CH CH。CH2=C-C0NII(CH2+- (C-13) CH, = C-C0D (CH, +; 1-(C-14) CH2=C-CON■(CH2-)? (C-22) P2 CH2=C COO (CH2CH2 Kano? CD (CH effect H3 CH=CH CH.
COD口H2CHCH200口(C)12す10叶 N (C−17) CH2=CH CH2 coo−qcH=士丁 ([ニー23) CH2CH2X (C−25) CH,=CH−CH20CO(CH,)。COD Exit H2CHCH200 Exit (C) 12s 10 Kano N (C-17) CH2=CH CH2 coo-qcH=shicho ([knee 23) CH2CH2X (C-25) CH,=CH-CH20CO(CH,).
(C−26> (C−30) CH3 C)1.=[’)I CH2C[][l(ロ)I2)。(C-26> (C-30) CH3 C)1. = [')I CH2C[][l(b)I2).
N C[][1CH2CH2 (C−27) CH。N C[][1CH2CH2 (C-27) CH.
(C−28)
(C−29>
[:D[l[Hschz
好ましくは本発明の分散安定用樹脂は重合性二重結合基
部分を高分子中の側鎖に含有するが、この重合体の合成
は従来公知の方法によって製造することができる。(C-28) (C-29> [:D[l[Hschz) Preferably, the dispersion stabilizing resin of the present invention contains a polymerizable double bond group moiety in the side chain of the polymer. Synthesis can be carried out by conventionally known methods.
例えば、■重合反応性の異なる重合性二重結合基を分子
中に2個含有した単量体を共重合させる方法、■分子中
に、カルボキシル基、ヒドロキz1、アミノ基、エポキ
シ基等の反応性基を含有したー官能性単量体を共重合さ
せて高分子を得た後、この高分子側鎖中の反応基と化学
結合しつる他の反応性基を含有した重合性二重結合基を
含む有機低分子化合物との反応を行う、いわゆる高分子
反応によって導入する方法、等が通常よく知られた方法
として挙げられる。For example, ■ a method of copolymerizing monomers containing two polymerizable double bond groups with different polymerization reactivity in the molecule; ■ a method of copolymerizing monomers containing two polymerizable double bond groups with different polymerization reactivity; ■ a method of copolymerizing a monomer containing two polymerizable double bond groups with different polymerization reactivity; After copolymerizing a functional monomer containing a functional group to obtain a polymer, a polymerizable double bond containing another reactive group is chemically bonded to a reactive group in the side chain of the polymer. Commonly known methods include a method of introducing a polymer through a reaction with an organic low-molecular compound containing a group, ie, a so-called polymer reaction.
上記■の方法として、例えば特開昭60−185962
号公報に記載の方法等が挙げられる。As the method (①) above, for example, Japanese Patent Application Laid-Open No. 60-185962
Examples include the method described in Japanese Patent Publication No.
上記■の方法として、具体的には岩倉義勇。Specifically, Giyu Iwakura uses the method described in ■ above.
栗田恵輔「反応性高分子」講談社(1977年刊)、小
田良平「高分子ファインケミカル」講談社(1976年
刊)、特開昭61−43757号公報、特願平1−14
9305号として出願した明細書等に詳細に記載されて
いる。Keisuke Kurita "Reactive Polymers" Kodansha (published in 1977), Ryohei Oda "Polymer Fine Chemicals" Kodansha (published in 1976), JP-A-61-43757, Patent Application Hei 1-14
It is described in detail in the specification filed as No. 9305.
例えば、下記表−1のA群の官能基とB群の官能基の組
み合わせによる高分子反応が、通常よく知られた方法と
して挙げられる。なお表1のR2□、R23は炭化水素
基で、前出の式(n)のLlにおけるIs、Isと同一
の内容を表す。For example, a polymer reaction using a combination of a group A functional group and a group B functional group shown in Table 1 below is a commonly known method. Note that R2□ and R23 in Table 1 are hydrocarbon groups, and represent the same contents as Is and Is in Ll of the above formula (n).
表−1
本発明の分散安定用樹脂として更に好
ましい、重合性二重結合基部分を主鎖の片末端に含有す
る一官能性重合体[M]は、従来公知の合成方法によっ
て製造することができる。例えば、イ)アニオン重合あ
るいはカチオン重合によって得られるリビングポリマー
の末端に種々の試薬を反応させて一官能性重合体〔M〕
を得る、イオン重合法による方法、口)分子中にカルボ
キシル基、ヒドロキシル基、アミノ基等の反応性基を含
有した重合開始剤及び/又は連鎖移動剤を用いて、ラジ
カル重合して得られる末端反応性基結合の重合体と種々
の試薬を反応させて一官能性重合体〔M〕を得るラジカ
ル重合法による方法、ハ)重付加あるいは重縮合反応に
より得られた重合体に上記ラジカル重合法と同様にして
、重合性二重結合基を導入する重付加縮合法による方法
等が挙げられる。Table 1 The monofunctional polymer [M] containing a polymerizable double bond group at one end of the main chain, which is more preferable as the dispersion stabilizing resin of the present invention, can be produced by a conventionally known synthesis method. can. For example, a) a monofunctional polymer [M] is produced by reacting various reagents at the ends of a living polymer obtained by anionic or cationic polymerization.
Terminal obtained by radical polymerization using a polymerization initiator and/or chain transfer agent containing a reactive group such as a carboxyl group, hydroxyl group, or amino group in the molecule. A method using a radical polymerization method to obtain a monofunctional polymer [M] by reacting a polymer with a reactive group bond with various reagents, c) A method using the above radical polymerization method on a polymer obtained by a polyaddition or polycondensation reaction. Examples include a method using a polyaddition condensation method in which a polymerizable double bond group is introduced in the same manner as described above.
具体的には、P、Dreyfuss & RoP、Qu
irk 。Specifically, P, Dreyfuss & RoP, Qu
irk.
Bncycl、Polym、Sci、Bng、、7.
551 (1987)P、P、ReLIlpp、 B
、Franta、 Adv、Polym、Sci、、
58゜1 (1984) 、V、Percec、 A
ppl、Po1y、Sci、。Bncycle, Polym, Sci, Bng, 7.
551 (1987) P, P, ReLIlpp, B
, Franta, Adv, Polym, Sci, .
58゜1 (1984), V. Percec, A.
ppl, Poly, Sci.
285.95 (1984)、R0^sami、 M、
Taka−ri、 Macroo+o1.Chem、
5upp1.、 1 2. 1 6 3 (1985
) 、P、Rempp、、 et al、Mac
romol、Chem。285.95 (1984), R0^sami, M.
Taka-ri, Macroo+o1. Chem,
5upp1. , 1 2. 1 6 3 (1985
), P,Rempp,, et al, Mac
romol, Chem.
5upp1.、 8. 3 (1984) 、用上雄資
、化学工業、38.56 (1987)、山下雄也、高
分子、31.988 (1982)、小林四部。5upp1. , 8. 3 (1984), Yuji Yogami, Kagaku Kogyo, 38.56 (1987), Yuya Yamashita, Kobunshi, 31.988 (1982), Shibe Kobayashi.
高分子、30,625 (1981)、東村敏延。Kobunshi, 30, 625 (1981), Toshinobu Higashimura.
日本接着協会誌、18.536 (1982)伊藤浩−
1高分子加工、35.262 (1986)、東貴四部
、津田隆1機能材料、1987゜klo、5等の総説及
びそれに引例の文献・特許等に記載の方法に従って合成
することができる。Japan Adhesive Association Journal, 18.536 (1982) Hiroshi Ito -
1 Polymer Processing, 35.262 (1986), Takashi Higashi, Takashi Tsuda 1 Functional Materials, 1987゜klo, 5, and other reviews, and the literature and patents cited therein.
以上の如き一官能性重合体[M]の合成方法として更に
具体的には、ラジカル重合性単量体に相当する繰り返し
単位を含有する重合体〔M〕は、特開平2−67563
号公報、特願昭63−64970、特願平1−2069
89、同1−69011各号として出願の明細書等に記
載されており、又、ポリエステル構造又はポリエーテル
構造を繰り返し単位として含有する重合体[Mlは、特
願平1−56379、同1−58989、同1−563
80各号として出願の胡細書等に各々記載されている方
法と同様にして得られる。More specifically, as a method for synthesizing the monofunctional polymer [M] as described above, a polymer [M] containing a repeating unit corresponding to a radically polymerizable monomer is synthesized according to Japanese Patent Application Laid-Open No. 2-67563.
Publication No. 63-64970, Japanese Patent Application No. 1-2069
89, No. 1-69011 in the application specifications, etc., and is a polymer containing a polyester structure or a polyether structure as a repeating unit [Ml is described in Japanese Patent Application No. 1-56379, No. 1-69011. 58989, 1-563
It can be obtained in the same manner as the methods described in the detailed description of the application as each item No. 80.
本発明の分散樹脂粒子は以上説明した様に、極性基含有
の一官能性単量体(A)、ケイ素原子及び/又はフッ素
原子含有の一官能性単量体(B)を上記分散安定用樹脂
の存在下で分散重合させて得られる共重合体樹脂粒子で
ある。As explained above, the dispersed resin particles of the present invention contain a monofunctional monomer containing a polar group (A) and a monofunctional monomer containing a silicon atom and/or a fluorine atom (B) for stabilizing the dispersion. These are copolymer resin particles obtained by dispersion polymerization in the presence of a resin.
更に、本発明の分散樹脂粒子が網目構造を有する場合は
、上記した極性基含有−官能性単量体(A)及びフッ素
原子及び/又はケイ素原子を含有の一官能性単量体(B
)を重合体成分〔重合体成分(A)と略記する〕として
成る重合体の重合体間が橋架けされており、高次の網目
構造を形成している。Furthermore, when the dispersed resin particles of the present invention have a network structure, the above-mentioned polar group-containing functional monomer (A) and the monofunctional monomer containing a fluorine atom and/or a silicon atom (B
) as a polymer component [abbreviated as polymer component (A)], the polymers are bridged to form a high-order network structure.
すなわち、本発明の分散樹脂粒子は、重合体成分(A)
から構成される非水分散溶媒に不溶な部分と、該溶媒に
可溶となる重合体とで構成される、非水系ラテックスで
あり、網目構造を有する場合は、この該溶媒に不溶な部
分を形成している重合体成分(A)の分子間が橋架けさ
れているものである。That is, the dispersed resin particles of the present invention contain polymer component (A)
It is a non-aqueous latex consisting of a part insoluble in a non-aqueous dispersion solvent and a polymer that is soluble in the solvent, and if it has a network structure, the part insoluble in the solvent is The molecules of the formed polymer component (A) are bridged.
これにより、網目樹脂粒子は水に対して難溶性あるいは
不溶性となったものである。具体的には、該樹脂の水へ
の溶解性は、80重量%以下好ましくは50重量%以下
である。As a result, the network resin particles become poorly soluble or insoluble in water. Specifically, the solubility of the resin in water is 80% by weight or less, preferably 50% by weight or less.
本発明の架橋は、従来公知の架橋方法によって行うこと
ができる。即ち、(a)該重合体成分(A>を含有する
重合体を種々の架橋剤あるいは硬化剤によって架橋する
方法、(社)該重合体成分(A)に相当する単量体を少
なくとも含有させて重合反応を行う際に、重合性官能基
を2個以上含有する多官能性単量体あるいは多官能性オ
リゴマーを共存させることにより分子間に網目構造を形
成する方法、及び(C)該重合体成分(A)と反応性基
を含有する成分を含む重合体類とを重合反応あるいは高
分子反応によって架橋させる方法等の方法によって行う
ことができる。The crosslinking of the present invention can be carried out by conventionally known crosslinking methods. That is, (a) a method of crosslinking a polymer containing the polymer component (A) with various crosslinking agents or curing agents; (C) a method of forming a network structure between molecules by coexisting a polyfunctional monomer or a polyfunctional oligomer containing two or more polymerizable functional groups when carrying out a polymerization reaction; This can be carried out by a method such as a method in which the combined component (A) and a polymer containing a component containing a reactive group are crosslinked by a polymerization reaction or a polymer reaction.
上記(a)の方法の架橋剤としては、通常架橋剤として
用いられる化合物を挙げることができる。Examples of the crosslinking agent used in the method (a) above include compounds commonly used as crosslinking agents.
具体的には、山下晋三、金子東助編「架橋剤ハンドブッ
ク」大成社刊(1981年)、高分子学会線「高分子デ
ータハンドブック 基礎編」培風館(1986年)等に
記載されている化合物を用いることができる。Specifically, the compounds described in "Crosslinking Agent Handbook" edited by Shinzo Yamashita and Tosuke Kaneko, published by Taiseisha (1981), "Polymer Data Handbook Basic Edition" published by the Society of Polymer Science, Baifukan (1986), etc. Can be used.
例えば、有機シラン系化合物(例えば、ビニルトリメト
キシシラン、ビニルトリブトキシシラン、γ−グリシド
キシプロピルトリメト牛ジシラン、T−メルカプトプロ
ピルトリエトキシシラン、T−アミノプロピルトリエト
キシシラン等のシランカップリング剤等) ポリイソシ
アナート系化合物(例えば、トルイレンジイソシアナー
ト、0−トルイレンジイソシアナート、ジフェニルメタ
ンジイソシアナート、トリフェニルメタントリイソシア
ナート、ポリメチレンポリフェニルイソシアナート、ヘ
キサメチレンジイソシアナート、イソホロンジイソシア
ナート、高分子ポリイソシアナート等)、ポリオール系
化合物(例えば、1.4−ブタンジオール、ポリオキシ
プロピレングリコール、ポリオキシアルキレングリコー
ル、1.1.1−トリメチロールプロパン等) ポリア
ミン系化合物(例えば、エチレンジアミン、r−ヒドロ
キシプロピル化エチレンジアミン、フェニレンジアミン
、ヘキサメチレンジアミン、N−アミノエチルピペラジ
ン、変性脂肪族ポリアミン類等) ポリエポキシ基含有
化合物及びエポキシ樹脂(例えば、垣内弘編著「新エポ
キシ樹脂」昭晃堂(1985年刊)、橋本邦之編著「エ
ポキシ樹脂」日刊工業新聞社(1969年刊)等に記載
された化合物類) メラミン樹脂(例えば、三輪−部、
松永英夫編著「ユリア・メラミン樹脂」日刊工業新聞社
(1969年刊)等に記載された化合物類)、ポリ (
メタ)アクリレート系化合物′(例えば、大河原信、三
枝武夫、東村敏延編「オリゴマー」講談社(1976年
刊)、大森英三「機能性アクリル系樹脂」テクノシステ
ム(1985年刊)等に記載された化合物類が挙げられ
、具体的には、ポリエチレングリコールジアクリレート
、ネオペンチルグリコールジアクリレート、1.6−ヘ
キサンジオールジアクリレート、トリメチロールプロパ
ントリアクリレート、ペンタエリスリトールポリアクリ
レート、ビスフェノールA−ジグリシジルエーテルジア
クリレート、オリゴエステルアクリレート及びこれらの
メタクリレート体等がある。For example, silane coupling of organic silane compounds (e.g., vinyltrimethoxysilane, vinyltributoxysilane, γ-glycidoxypropyltrimethoxysilane, T-mercaptopropyltriethoxysilane, T-aminopropyltriethoxysilane, etc.) (e.g., toluylene diisocyanate, 0-toluylene diisocyanate, diphenylmethane diisocyanate, triphenylmethane triisocyanate, polymethylene polyphenylisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, etc.) isocyanate, polymeric polyisocyanate, etc.), polyol-based compounds (e.g., 1,4-butanediol, polyoxypropylene glycol, polyoxyalkylene glycol, 1.1.1-trimethylolpropane, etc.), polyamine-based compounds (e.g., , ethylenediamine, r-hydroxypropylated ethylenediamine, phenylenediamine, hexamethylenediamine, N-aminoethylpiperazine, modified aliphatic polyamines, etc.) Polyepoxy group-containing compounds and epoxy resins (for example, "New Epoxy Resins" edited by Hiroshi Kakiuchi, Sho. Compounds described in Kodo (published in 1985), “Epoxy Resin” edited by Kuniyuki Hashimoto, Nikkan Kogyo Shimbun (published in 1969), etc. Melamine resins (for example, Miwa-be,
Compounds described in "Uria Melamine Resin" edited by Hideo Matsunaga, Nikkan Kogyo Shimbunsha (published in 1969), poly(
meth)acrylate compounds' (for example, compounds described in Makoto Okawara, Takeo Saegusa, and Toshinobu Higashimura, "Oligomer", Kodansha (published in 1976), Eizo Omori, "Functional Acrylic Resin", Technosystem (published in 1985), etc. Specific examples include polyethylene glycol diacrylate, neopentyl glycol diacrylate, 1,6-hexanediol diacrylate, trimethylolpropane triacrylate, pentaerythritol polyacrylate, bisphenol A-diglycidyl ether diacrylate, Examples include oligoester acrylates and methacrylates thereof.
又、上記ら)の方法で共存させる重合性官能基を2個以
上含有する多官能性単量体〔多官能性単量体(D)とも
称する〕あるいは多官能性オリゴマーの重合性官能基と
しては、具体的にはCH2=CH−CH2−、CH,=
CH−C−0−、CH,=CH−CL=C−C−0−C
H=CH−C−0−、CH2=CHC0NHI
CH,=C−C0NH−CH=CH−C0NH−CH,
=C1l−CH,−0−C−CH,=[”H−NHCO
CH,=CH−CH2−NHCO−CH2=CH−8口
。In addition, as a polyfunctional monomer containing two or more polymerizable functional groups (also referred to as polyfunctional monomer (D)) or a polymerizable functional group of a polyfunctional oligomer, which are caused to coexist by the above method, Specifically, CH2=CH-CH2-, CH,=
CH-C-0-, CH,=CH-CL=C-C-0-C
H=CH-C-0-, CH2=CHC0NHI CH, =C-C0NH-CH=CH-C0NH-CH,
=C1l-CH,-0-C-CH,=[”H-NHCO
CH,=CH-CH2-NHCO-CH2=CH-8 ports.
CH2=CH−C0CH2=CHOCH2=CHS等を
挙げることができる。これらの重合性官能基の同一のも
のあるいは異なったものを2個以上有した単量体あるい
はオリゴマーであればよい。Examples include CH2=CH-COCH2=CHOCH2=CHS. Any monomer or oligomer having two or more of the same or different polymerizable functional groups may be used.
重合性官能基を2個以上有した単量体の具体例は、例え
ば同一の重合性官能基を有する単量体あるいはオリゴマ
ーとして、ジビニルベンゼン、トリビニルベンゼン等の
スチレン誘導体:多価アルコール(例えば、エチレング
リコーノベジエチレングリコール、トリエチレングリコ
ール、ポリエチレングリコール# 200 、# 40
0、#600.1.3−ブチレングリコール、ネオペン
チルグリコール、ジプロピレンクリコール、ポリプロピ
レングリコール、トリメチロールプロパン、トリメチロ
ールエタン、ペンタエリスリトールなど)、又はポリヒ
ドロキシフェノール(例えばヒドロキノン、レゾルシン
、カテコールおよびそれらの誘導体)のメタクリル酸、
アクリル酸又はクロトン酸のエステル類、ビニルエーテ
ル類又はアリルエーテル類二二塩基酸(例えばマロン酸
、コハク酸、グルタル酸、アジピン酸、ピメリン酸、マ
レイン酸、フタル酸、イタコン酸等)のビニルエステル
類、アリルエステル類、ビニルアミド類又はアリルアミ
ド類:ポリアミン(例えばエチレンジアミン、1゜3−
プロピレンジアミン、1,4−ブチレンジアミン等)と
ビニル基を含有するカルボン酸(例えば、メタクリル酸
、アクリル酸、クロトン酸、アリル酢酸等)との縮合体
などが挙げられる。Specific examples of monomers having two or more polymerizable functional groups include styrene derivatives such as divinylbenzene and trivinylbenzene; polyhydric alcohols (e.g. , ethylene glycol, vegetal ethylene glycol, triethylene glycol, polyethylene glycol #200, #40
0, #600.1.3-butylene glycol, neopentyl glycol, dipropylene glycol, polypropylene glycol, trimethylolpropane, trimethylolethane, pentaerythritol, etc.), or polyhydroxyphenol (such as hydroquinone, resorcinol, catechol, etc.) (derivative of) methacrylic acid,
Acrylic acid or crotonic acid esters, vinyl ethers or allyl ethers, vinyl esters of dibasic acids (e.g. malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, maleic acid, phthalic acid, itaconic acid, etc.) , allyl esters, vinylamides or allylamides: polyamines (e.g. ethylenediamine, 1°3-
Examples include condensates of propylene diamine, 1,4-butylene diamine, etc.) and carboxylic acids containing vinyl groups (for example, methacrylic acid, acrylic acid, crotonic acid, allyl acetic acid, etc.).
又、異なる重合性官能基を有する単量体あるいはオリゴ
マーとしては、例えば、ビニル基を含有するカルボン酸
(例えばメタクリル酸、アクリル酸、メタクリロイル酢
酸、アクリロイル酢酸、メタクリロイルプロピオン酸、
アルリロイルプロピオン酸、イタコニロイル酢酸、イタ
コニロイルプロピオン酸、カルボン酸無水物等)とアル
コール又はアミンの反応体(例えばアリルオキシカルボ
ニルプロピオン酸、アリルオキシカルボニル酢酸、2−
アリルオキシカルボニル安息香酸、アリルアミノカルボ
ニルプロピオン酸等)等のビニル基を含有したエステル
誘導体又はアミド誘導体(例えばメタクリル酸ビニル、
アクリル酸ビニル、イタコン酸ビニル、メタクリル酸ア
リル、アクリル酸アリル、イタコン酸アリル、メタクリ
ロイル酢酸ビニノペメタクリロイルブロピオン酸ビニル
、メタクリロイルプロピオン酸アリル、メタクリル酸ビ
ニルオキシカルボニルメチルエステル、アクリル酸ビニ
ルオキシカルボニルメチルオキシカルボニルエチレンエ
ステル、N−アリルアクリルアミド、N−アリルメタク
リルアミド、N−アリルイタコン酸アミド、メタクリロ
イルプロピオン酸アリルアミド等)又はアミノアルコー
ル@(例えばアミノエタノール、■−アミノプロパツー
ル、1−アミノブタノール、1−アミノヘキサノール、
2〜アミノブタノール等)とビニル基を含有したカルボ
ン酸との縮合体などが挙げられる。In addition, monomers or oligomers having different polymerizable functional groups include, for example, carboxylic acids containing vinyl groups (such as methacrylic acid, acrylic acid, methacryloyl acetic acid, acryloyl acetic acid, methacryloyl propionic acid,
Reactants of alcohols or amines (e.g. allyloxycarbonylpropionic acid, allyloxycarbonyl acetic acid, 2-
ester derivatives containing vinyl groups such as allyloxycarbonylbenzoic acid, allylaminocarbonylpropionic acid, etc.) or amide derivatives containing vinyl groups (such as vinyl methacrylate,
Vinyl acrylate, vinyl itaconate, allyl methacrylate, allyl acrylate, allyl itaconate, vinyl methacryloyl acetate, vinyl methacryloyl propionate, allyl methacryloyl propionate, vinyloxycarbonyl methyl methacrylate, vinyloxycarbonyl methyl acrylate oxycarbonyl ethylene ester, N-allylacrylamide, N-allyl methacrylamide, N-allyl itaconic acid amide, methacryloylpropionic acid allylamide, etc.) or amino alcohol @ (e.g. aminoethanol, ■-aminopropanol, 1-aminobutanol, 1 -aminohexanol,
2 to aminobutanol, etc.) and a carboxylic acid containing a vinyl group.
本発明に用いられる2個以上の重合性官能基を有する単
量体あるいはオリコマ−は、単量体(A)及び(A)と
共存する他の単量体との総量に対して10モル%以下、
好ましくは5モル%以下用いて重合し、樹脂を形成する
。The monomer or oligomer having two or more polymerizable functional groups used in the present invention is 10 mol% based on the total amount of monomer (A) and other monomers coexisting with (A). below,
Preferably, it is used in an amount of 5 mol % or less to polymerize and form a resin.
更には、上記(C)の方法の高分子間の反応性基同志の
反応により化学結合を形成し高分子間の橋架けを行う場
合には、通常の有機低分子化合物の反応と同様に行うこ
とができる。具体的には、分散安定用樹脂の合成法にお
いて記載したと同様の方法に従って合成することができ
る。Furthermore, in the case of forming a chemical bond and bridging the polymers by the reaction of the reactive groups between the polymers in the method (C) above, it can be carried out in the same manner as the reaction of ordinary organic low-molecular compounds. be able to. Specifically, it can be synthesized according to the same method as described in the method for synthesizing the dispersion stabilizing resin.
分散重合にふいて、粒子の粒径が揃った単分散性の粒子
が得られること及び0.5μm以下の微小粒子が得られ
易いこと等から、網目構造形成の方法としては、多官能
性単量体を用いる但〕の方法が好ましい。As a method for forming a network structure, polyfunctional monomers can be used as a method for forming a network structure, because monodisperse particles with a uniform particle size can be obtained through dispersion polymerization, and microparticles of 0.5 μm or less can be easily obtained. The method in which a polymer is used is preferred.
以上の如く、本発明の網目分散樹脂粒子は、極性基を含
有する繰り返し単位と、フッ素原子及び/又はケイ素原
子含有置換基を有する繰り返し単位とを含む重合体成分
と、該非水溶媒に可溶性の重合体成分とを含有し、且つ
分子鎮間が高次に橋架けされた構造を有する重合体の粒
子である。As described above, the network-dispersed resin particles of the present invention consist of a polymer component containing a repeating unit containing a polar group, a repeating unit having a fluorine atom and/or a silicon atom-containing substituent, and a polymer component that is soluble in the non-aqueous solvent. These are polymer particles containing a polymer component and having a structure in which molecular chains are highly cross-linked.
非水溶媒系分散樹脂粒子の製造に用いられる非水溶媒と
しては、沸点200℃以下の有機溶媒であればいずれで
もよく、それは単独であるいは2種以上を混合して使用
してもよい。The non-aqueous solvent used for producing the non-aqueous solvent-based dispersed resin particles may be any organic solvent as long as it has a boiling point of 200° C. or lower, and it may be used alone or in combination of two or more.
この有機溶媒の具体例は、メタノール、エタノール、プ
ロパツール、ブタノール、フッ化アルコール、ベンジル
アルコール等のアルコール類、アセトン、メチルエチル
ケトン、シクロヘキサノン、ジエチルケトン等のケトン
類、ジエチルエーテル、テトラヒドロフラン、ジオキサ
ン等のエーテル類、酢酸メチル、酢酸エチル、酢酸ブチ
ル、゛プロピオン酸メチル等のカルボン酸エステル類、
ヘキサン、オクタン、デカン、ドデカン、トリデカン、
シクロヘキサン、シクロオクタン等の炭素数6〜14の
脂肪族炭化水素類、ベンゼン、トルエン、キシレン、ク
ロロベンゼン等の芳香族炭化水素類、メチレンクロリド
、ジクロロエタン、テトラクロロエタン、クロロホルム
、メチルクロロホルム、ジクロロプロパン、トリクロロ
エタン等のハロゲン化炭化水素類等が挙げられる。ただ
し、以上述べた化合物例に限定されるものではない。Specific examples of this organic solvent include alcohols such as methanol, ethanol, propatool, butanol, fluorinated alcohol, and benzyl alcohol, ketones such as acetone, methyl ethyl ketone, cyclohexanone, and diethyl ketone, and ethers such as diethyl ether, tetrahydrofuran, and dioxane. carboxylic acid esters such as methyl acetate, ethyl acetate, butyl acetate, methyl propionate,
hexane, octane, decane, dodecane, tridecane,
Aliphatic hydrocarbons with 6 to 14 carbon atoms such as cyclohexane and cyclooctane, aromatic hydrocarbons such as benzene, toluene, xylene, and chlorobenzene, methylene chloride, dichloroethane, tetrachloroethane, chloroform, methylchloroform, dichloropropane, trichloroethane Examples include halogenated hydrocarbons such as. However, it is not limited to the compound examples described above.
これらの非水溶媒系で分散樹脂粒子を分散重合法で合成
することにより、樹脂粒子の平均粒子径は容易に1μm
以下となり、しかも粒子径の分布が非常に狭く且つ単分
散の粒子とすることができる。By synthesizing dispersed resin particles using a dispersion polymerization method in these non-aqueous solvent systems, the average particle diameter of the resin particles can easily be 1 μm.
In addition, the particle size distribution is very narrow and monodisperse particles can be obtained.
具体的には、K、Bj、Barrett r Dis
persionPolymerization in
Organic Media J John
Wiley(1975年)、村田絣一部、高分子加工
、23.20 (1974)、松本恒隆・丹下豊吉、日
本接着協会跡9.183 (1973>、丹下豊吉、日
本接着協会跡23.26(1987)、D、J、 W
albridge 5NATO,^dv、 5tudy
、 In5t、Ser。Specifically, K, Bj, Barrett Dis
persionPolymerization in
Organic Media J John
Wiley (1975), Part of Murata Kasuri, Polymer processing, 23.20 (1974), Tsunetaka Matsumoto and Toyokichi Tange, Japan Adhesive Association trace 9.183 (1973>, Tange Toyokichi, Japan Adhesive Association trace 23.26 ( (1987), D.J., W.
albridge 5NATO, ^dv, 5tudy
, In5t, Ser.
B、 Nα67.40(1983)、英国特許第89
3429、同934038各号明細書、米国特許第11
22397、同3900412、同4606989各号
明細書、特開昭60−179751、同60−1859
63各号公報等にその方法が開示されている。B, Nα67.40 (1983), British Patent No. 89
3429, 934038, U.S. Patent No. 11
22397, 3900412, 4606989 specifications, JP 60-179751, JP 60-1859
The method is disclosed in 63 publications and the like.
本発明の分散樹脂は、単量体(A)及び単量体(B)と
分散安定用樹脂の少なくとも各々1種以上から成り、網
目構造を形成する場合には必要に応じて多官能性単量体
(D)を共存させて成り、いずれにしても重要な事は、
これら単量体から合成された樹脂が該非水溶媒に不溶で
あれば、所望の分散樹脂を得ることができる。The dispersion resin of the present invention is composed of at least one of monomers (A), monomers (B), and a dispersion stabilizing resin, and when forming a network structure, polyfunctional monomers are optionally added. In any case, the important thing is that
If the resin synthesized from these monomers is insoluble in the nonaqueous solvent, a desired dispersed resin can be obtained.
より具体的には、不溶化する単量体(A)及び単量体(
B)に対して、分散安定用樹脂を1〜50重量%使用す
ることが好ましく、さらに好ましくは2〜30重量%で
ある。又本発明の分敗樹脂粒子の分子量は104〜10
6であり、好ましくは104〜5X105である。More specifically, the monomer (A) and the monomer (
Based on B), it is preferable to use the dispersion stabilizing resin in an amount of 1 to 50% by weight, more preferably 2 to 30% by weight. Further, the molecular weight of the decomposed resin particles of the present invention is 104 to 10.
6, preferably 104 to 5X105.
以上の如き本発明で用いられる分散樹脂粒子を製造する
には、一般に、単量体(A)、単量体(B)9分散安定
用樹脂更には、多官能性単量体(D)とを非水溶媒中で
過酸化ベンゾイル、アゾビスイソブチロニトリル、ブチ
ルリチウム等の重合開始剤の存在下に加熱重合させれば
よい。具体的には、(i)単量体(A)、単量体(B)
9分散安定用樹脂及び多官能性単量体(D)の混合溶液
中に重合開始剤を添加する方法、(ii)非水溶媒中に
、上記重合性化合物及び重合開始剤の混合物を滴下又は
任意に添加する方法等があり、これらに限定されずいか
なる方法を用いても製造することができる。In order to produce the dispersed resin particles used in the present invention as described above, monomer (A), monomer (B) 9, a dispersion stabilizing resin, and a polyfunctional monomer (D) are generally used. may be polymerized by heating in a nonaqueous solvent in the presence of a polymerization initiator such as benzoyl peroxide, azobisisobutyronitrile, butyllithium. Specifically, (i) monomer (A), monomer (B)
9. A method of adding a polymerization initiator to a mixed solution of a dispersion stabilizing resin and a polyfunctional monomer (D), (ii) dropping a mixture of the above polymerizable compound and a polymerization initiator into a nonaqueous solvent, or There are methods of adding it arbitrarily, and the method is not limited to these, and any method can be used for production.
重合性化合物の総量は非水溶媒100重量部に対して5
〜80重量部程度であり、好ましくは10〜50重量部
である。The total amount of polymerizable compounds is 5 parts by weight per 100 parts by weight of the nonaqueous solvent.
The amount is about 80 parts by weight, preferably 10 to 50 parts by weight.
重合開始剤の量は、重合性化合物の総量の0、1〜5重
量%である。又、重合温度は30〜180℃程度であり
、好ましくは40〜120℃である。反応時間は1〜1
5時間が好ましい。The amount of polymerization initiator is 0.1 to 5% by weight of the total amount of polymerizable compounds. Further, the polymerization temperature is about 30 to 180°C, preferably 40 to 120°C. Reaction time is 1-1
5 hours is preferred.
以上の如くして本発明により製造された非水系分散樹脂
は、微細でかつ粒度分布が均一な粒子となる。The non-aqueous dispersion resin produced according to the present invention as described above becomes fine particles with a uniform particle size distribution.
本発明の光導電層の結着樹脂としては、従来公知の樹脂
のいずれも用いることができる。例えば従来技術の説明
において引例した如き、アルキッド樹脂、酢酸ビニル樹
脂、ポリエステル樹脂、スチレン−ブタジェン樹脂、ア
クリル樹脂等が挙げられ、具体的には栗田隆治・石渡次
部、高分子、第17巻、第278頁(1968年)、宮
本晴視、武井秀彦、イメージング、1973(N118
)第9頁等の総説引例の公知材料等が挙げられる。As the binder resin for the photoconductive layer of the present invention, any conventionally known resin can be used. For example, alkyd resins, vinyl acetate resins, polyester resins, styrene-butadiene resins, acrylic resins, etc., as cited in the explanation of the prior art, are mentioned, and specifically, Ryuji Kurita and Tsugube Ishiwata, Kobunshi, Vol. No. 278 (1968), Harumi Miyamoto, Hidehiko Takei, Imaging, 1973 (N118
), page 9, and other known materials cited in the review.
好ましくは、無機光導電体として光導電性酸化亜鉛を用
いる電子写真感光体の結着樹脂として知られるメタクリ
レートを重合体成分として含有するランダム共重合体群
がその1つとして挙げられる。例えば特公昭50−22
42、同50〜31011、特開昭50−98324、
同50−98325、特公昭54−13977、同59
−35013、特開昭54−20735、同57−20
2544各号公報等に記載されるものが挙げられる。Preferably, one of them is a random copolymer group containing methacrylate as a polymer component, which is known as a binder resin for electrophotographic photoreceptors that use photoconductive zinc oxide as an inorganic photoconductor. For example, special public service
42, 50-31011, JP-A-50-98324,
No. 50-98325, Special Publication No. 54-13977, No. 59
-35013, JP-A-54-20735, JP-A-57-20
Examples include those described in 2544 publications.
更に重量平均分子量が2万以下でメタクリレートとカル
ボキシル基、スルホ基、ホスホノ基等の酸性成分含有子
ツマ−とのランダム共重合体と重量平均分子量が3万以
上の他の樹脂又は熱及び/又は光で硬化する化合物との
組み合せで構成される結着樹脂:例えば特開昭63−2
20148、特開昭63−220149、特開平2−3
4860、同2−40660、同253064、同1−
102573各号公報に記載されるもの等が挙げられる
。Further, a random copolymer of methacrylate and a copolymer containing an acidic component such as a carboxyl group, a sulfo group, or a phosphono group with a weight average molecular weight of 20,000 or less, and another resin or heat and/or a weight average molecular weight of 30,000 or more. Binder resin composed of a combination with a compound that hardens with light: For example, JP-A-63-2
20148, JP 63-220149, JP 2-3
4860, 2-40660, 253064, 1-
Examples include those described in each No. 102573 publication.
あるいは重量平均分子量が2万以下でメタクリレート成
分含有の重合体であり且つその重合体主鎖の片末端に酸
性基を含有して成る重合体と、重量平均分子量が3万以
上の他の樹脂又は熱及び/又は光で硬化する化合物との
組み合せで構成される結着樹脂:例えば特開平1−16
9455、同1−280761、同1〜214865、
同2−874各号公報、特願昭63−221485、同
63−220442、同63−220441各号明細書
に記載のもの等が挙げられる、等の重合体群も挙げられ
る。Alternatively, a polymer having a weight average molecular weight of 20,000 or less, containing a methacrylate component, and containing an acidic group at one end of the polymer main chain, and another resin having a weight average molecular weight of 30,000 or more, or Binder resin composed of a combination with a compound that cures with heat and/or light: For example, JP-A-1-16
9455, 1-280761, 1-214865,
Also included are polymer groups such as those described in Japanese Patent Application No. 2-874, Japanese Patent Application No. 63-221485, Japanese Patent Application No. 63-220442, and Japanese Patent Application No. 63-220441.
本発明に使用する無機光導電材料は、光導電性酸化亜鉛
である。さらに他の無機光導電体として酸化チタン、硫
化亜鉛、硫化カドミウム、炭酸カドミウム、セレン化亜
鉛、セレン化カドミウム、セレン化テルル、硫化鉛等を
併用してもよい。The inorganic photoconductive material used in the present invention is photoconductive zinc oxide. Furthermore, other inorganic photoconductors such as titanium oxide, zinc sulfide, cadmium sulfide, cadmium carbonate, zinc selenide, cadmium selenide, tellurium selenide, lead sulfide, etc. may be used in combination.
しかし、これら他の光導電材料は、光導電性酸化亜鉛の
40重量%以下であり、好ましくは20重量%以下であ
る。However, these other photoconductive materials account for no more than 40% by weight of the photoconductive zinc oxide, preferably no more than 20% by weight of the photoconductive zinc oxide.
他の光導電材料が40重量%を越えると、平版印刷用原
版としての非画像部の親水性向上の効果が薄れてしまう
。If the content of other photoconductive materials exceeds 40% by weight, the effect of improving the hydrophilicity of non-image areas as a lithographic printing original plate will be weakened.
無機光導電材料に対して用いる結着樹脂の総量は、光導
電体100重量部に対して、結着樹脂を10〜100重
量部なる割合、好ましくは15〜50重量部なる割合で
使用する。The total amount of binder resin used for the inorganic photoconductive material is 10 to 100 parts by weight, preferably 15 to 50 parts by weight, per 100 parts by weight of the photoconductor.
本発明では、必要に応じて各種の色素を分光増感剤とし
て併用することができる。例えば、宮本晴視、武井秀彦
:イメージング1973 (No。In the present invention, various dyes can be used in combination as spectral sensitizers, if necessary. For example, Harumi Miyamoto, Hidehiko Takei: Imaging 1973 (No.
8)第12頁、C,J、Young等: RCA Re
view 15 。8) Page 12, C. J. Young et al.: RCA Re
view 15.
469頁(1954)、清田航平等:電気通信学会論文
誌J 63−C(No、2) 97頁(1980)、原
崎勇次等、工業化学雑誌66、78及び18B頁(19
63)、谷忠昭、日本写真学会誌35.208頁(19
72)等の総説引例ノカーボニウム系色素、ジフェニル
メタン色素、トリフェニルメタン色素、キサンチン系色
素、フタレイン系色素、ポリメチン色素(例えば、オキ
ソノール色素、メロシアニン色素、シアニン色素、ログ
シアニン色素、スチリル色素等)フタロシアニン色素(
金属を含有してもよい)等が挙げられる。469 pages (1954), Wataru Kiyota: Transactions of the Institute of Electrical Communication Engineers J 63-C (No, 2) 97 pages (1980), Yuji Harasaki et al., Industrial Chemistry Journal pages 66, 78 and 18B (19
63), Tadaaki Tani, Journal of the Photographic Society of Japan 35.208 pages (19
72), etc. Review references such as nocarbonium dyes, diphenylmethane dyes, triphenylmethane dyes, xanthine dyes, phthalein dyes, polymethine dyes (e.g., oxonol dyes, merocyanine dyes, cyanine dyes, logcyanine dyes, styryl dyes, etc.) Phthalocyanine dyes (
may contain metal), etc.
更に具体的には、カーボニウム系色素、トリフェニルメ
タン系色素、キサンチン系色素、フタレイン系色素を中
心に用いたものとしては、特公昭51−452、特開昭
50−90334、同50−114227、同53−3
9130、同53−82353各号公報、米国特許第3
052540、同第4054450各号明細書、特開昭
57−16456号公報等に記載のものが挙げられる。More specifically, examples of those mainly using carbonium dyes, triphenylmethane dyes, xanthine dyes, and phthalein dyes include JP-B No. 51-452, JP-A No. 50-90334, JP-A No. 50-114227, 53-3
No. 9130, No. 53-82353, U.S. Patent No. 3
Examples include those described in the specifications of No. 052540 and No. 4054450, and Japanese Patent Application Laid-open No. 16456/1983.
オキソノール色素、メロシアニン色素、シアニン色素、
ロダシアニン色素等のポリメチン色素としては、F、M
、Harmmer rThe Cyanine Dy
esand Re1ated Compounds J
等に記載の色素類が使用可能であり、更に具体的には、
米国特許第3047384、同3110591、同31
21008、同3125447、同3128179、同
3132942、同3622317各号明細書、英国特
許第1226892、同1309274、同14058
98各号明細書、特公昭48−7814、同55−18
892各号公報等に記載の色素が挙げられる。oxonol dye, merocyanine dye, cyanine dye,
Polymethine dyes such as rhodacyanine dyes include F, M
, Hammer rThe Cyanine Dy
esand Re1ated Compounds J
It is possible to use the pigments described in et al., and more specifically,
U.S. Patent No. 3047384, U.S. Patent No. 3110591, U.S. Patent No. 31
21008, 3125447, 3128179, 3132942, 3622317, British Patent Nos. 1226892, 1309274, 14058
98 specifications, Japanese Patent Publication No. 48-7814, No. 55-18
Examples include dyes described in 892 publications and the like.
更に、700nm以上の長波長の近赤外〜赤外光域を分
光増感するポリメチン色素として、特開昭47−840
、同47−44180、特公昭51−41061、特開
昭49−5034、同49−45122、同57−46
245、同56−35141、同57−157254、
同61−26044、同61−27551各号公報、米
国特許第361954、同4175956各号明細書、
rResearch Disclosure J 19
82年、216、第117〜118頁等に記載のものが
挙げられる。本発明の感光体は種々の増感色素を併用さ
せても、その性能が増感色素により変動しにくい点にお
いても優れている。Furthermore, as a polymethine dye that spectrally sensitizes the near-infrared to infrared light region with a long wavelength of 700 nm or more, JP-A-47-840
, 47-44180, JP 51-41061, JP 49-5034, 49-45122, 57-46
245, 56-35141, 57-157254,
61-26044, 61-27551, U.S. Pat. No. 361954, U.S. Pat. No. 4175956,
rResearch Disclosure J 19
Examples include those described in 1982, 216, pp. 117-118. The photoreceptor of the present invention is also excellent in that its performance does not easily vary depending on the sensitizing dye, even when various sensitizing dyes are used together.
更には、必要に応じて、化学増感剤等の従来知られてい
る電子写真感光層用各種添加剤を併用することもできる
。例えば、前記した総説:イメージング1973(No
、8)第12頁等の総説引例の電子受容性化合物(例え
ば、ハロゲン、ベンゾキノン、クロラニル、酸無水物、
有機カルボン酸等)、小門宏等、「最近の光導電材料と
感光体の開発・実用化」第4章〜第6章二日本科学情報
■出版部(1986年)の総説引例のポリアリールアル
カン化合物、ヒンダードフェノール化合物、p−フ二二
レンジアミン化合物等が挙げられる。Furthermore, if necessary, various conventionally known additives for electrophotographic photosensitive layers such as chemical sensitizers can be used in combination. For example, the above-mentioned review: Imaging 1973 (No.
, 8) Electron-accepting compounds cited in reviews such as page 12 (e.g., halogens, benzoquinones, chloranil, acid anhydrides,
(Organic carboxylic acids, etc.), Hiroshi Komon et al., “Recent Development and Practical Application of Photoconductive Materials and Photoreceptors,” Chapters 4 to 6, Nihon Kagaku Information Publishing Department (1986) Examples include alkane compounds, hindered phenol compounds, p-phenyl diamine compounds, and the like.
これら各種添加剤の添加量は、特に限定的ではないが、
通常光導電体100重量部に対して0、 OO1〜2.
0重量部である。The amount of these various additives added is not particularly limited, but
Usually 0, OO1 to 2.0 per 100 parts by weight of photoconductor.
It is 0 parts by weight.
光導電層の厚さは1〜100μ、特には10〜50μが
好適である。The thickness of the photoconductive layer is preferably 1 to 100 microns, particularly 10 to 50 microns.
また、電荷発生層と電荷輸送層の積層型感光体の電荷発
生層として光導電層を使用する場合は電荷発生層の厚さ
は0.01〜1μ、特には0.05〜0.5μが好適で
ある。In addition, when a photoconductive layer is used as a charge generation layer in a laminated photoreceptor consisting of a charge generation layer and a charge transport layer, the thickness of the charge generation layer is 0.01 to 1μ, particularly 0.05 to 0.5μ. suitable.
積層型感光体の電荷輸送材料としてはポリビニルカルバ
ゾール、オキサゾール系色素、ピラゾリン系色素、トリ
フェニルメタン系色素などがある。電荷輸送層の厚さと
しては5〜40μ、特には10〜30μが好適である。Charge transport materials for the laminated photoreceptor include polyvinylcarbazole, oxazole dyes, pyrazoline dyes, triphenylmethane dyes, and the like. The thickness of the charge transport layer is preferably 5 to 40 microns, particularly 10 to 30 microns.
電荷輸送層の形成に用いる樹脂としては、代表的なもの
は、ポリスチレン樹脂、ポリエステル樹脂、セルロース
樹脂、ポリエーテル樹脂、塩化ビニル樹脂、酢酸ビニル
樹脂、塩ビー酸ビ共重合体樹脂、ポリアクリル樹脂、ポ
リオレフィン樹脂、ウレタン樹脂、ポリエステル樹脂、
エポキシ樹脂、メラミン樹脂、シリコン樹脂の熱可塑性
樹脂及び硬化性樹脂が適宜用いられる。Typical resins used to form the charge transport layer include polystyrene resin, polyester resin, cellulose resin, polyether resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride vinyl oxide copolymer resin, and polyacrylic resin. , polyolefin resin, urethane resin, polyester resin,
Thermoplastic resins and curable resins such as epoxy resins, melamine resins, and silicone resins are used as appropriate.
本発明による光導電層は、従来公知の支持体上に設ける
ことができる。一般に云って電子写真感光層の支持体は
、導電性であることが好ましく、導電性支持体としては
、従来と全く同様、例えば、金属、紙、プラスチックシ
ート等の基体に低抵抗性物質を含浸させるなどして導電
処理したもの、基体の裏面(感光層を設ける面と反対面
)に導電性を付与し、更にはカール防止を図る等の目的
で少なくとも1層以上をコートしたもの、前記支持体の
表面に耐水性接着層を設けたもの、前記支持体の表面層
に必要に応じて少なくとも1層以上のプレコート層が設
けたもの、A1等を蒸着した基体導電化プラスチックを
紙にラミネートしたもの等が使用できる。The photoconductive layer according to the invention can be provided on a conventionally known support. Generally speaking, the support for the electrophotographic photosensitive layer is preferably electrically conductive.As the electrically conductive support, for example, a base material such as metal, paper, or plastic sheet impregnated with a low-resistance substance is used in the same manner as in the past. those that have been subjected to conductive treatment, such as those that have been coated with at least one layer for the purpose of imparting conductivity to the back surface of the substrate (the surface opposite to the surface on which the photosensitive layer is provided) and also to prevent curling, and those that have been coated with at least one layer for the purpose of preventing curling, etc. A water-resistant adhesive layer is provided on the surface of the support, at least one pre-coat layer is provided as necessary on the surface layer of the support, and a conductive plastic base coated with A1 or the like is laminated onto paper. Things can be used.
具体的に、導電性基体あるいは導電化材料の例として、
坂本幸男、電子写真、14、(NOll) p2〜11
(1975)、森賀弘之。Specifically, examples of conductive substrates or conductive materials include:
Yukio Sakamoto, electronic photography, 14, (NOll) p2-11
(1975), Hiroyuki Moriga.
「入門特殊紙の化学」高分子刊行会(1975)M、F
、Hoover、 J1Macroo+o1.Sci、
Chern、^−4(6) 。"Introductory Special Paper Chemistry" Kobunshi Publishing Association (1975) M, F
, Hoover, J1Macroo+o1. Sci,
Chern, ^-4(6).
第1327〜1417頁(1970)等に記載されてい
るもの等を用いる。Those described on pages 1327 to 1417 (1970) and the like are used.
実際に本発明の平版印刷用原版を作るには、常法に従っ
て導電性支持体上に本発明の樹脂、更には必要により前
記した添加剤等を沸点が200℃以下の揮発性炭化水素
溶剤に溶解又は分散し、これを塗布・乾燥することによ
って電子写真感光層(光導電層)を形成して製造するこ
とができる。用いる有機溶剤としては、具体的には特に
ジクT:10メタン、クロロホルム、1゜2−ジクロロ
エタン、テトラクロロエタン、ジクロロプロパンまたは
トリクロロエタンなどの如き、炭素数1〜3のハロゲン
化炭化水素が好ましい。その他クロロベンゼン、トルエ
ン、キシレンまたはベンゼンなどの如き芳香族炭化水素
、アセトンまたは2−ブタノン等の如きケトン類、テト
ラヒドロフランなどの如きエーテルおよびメチレンクロ
リドなど、塗布用組成物に用いられる各種の溶剤及び上
記溶剤の混合物も使用可能である。In order to actually produce the lithographic printing original plate of the present invention, the resin of the present invention and, if necessary, the above-mentioned additives are placed on a conductive support in a volatile hydrocarbon solvent with a boiling point of 200°C or less. An electrophotographic photosensitive layer (photoconductive layer) can be formed and manufactured by dissolving or dispersing it, coating it, and drying it. Specifically, preferred organic solvents are halogenated hydrocarbons having 1 to 3 carbon atoms, such as di-T:10 methane, chloroform, 1°2-dichloroethane, tetrachloroethane, dichloropropane, and trichloroethane. Other various solvents used in coating compositions, such as aromatic hydrocarbons such as chlorobenzene, toluene, xylene or benzene, ketones such as acetone or 2-butanone, ethers such as tetrahydrofuran, and methylene chloride, and the above-mentioned solvents. Mixtures of can also be used.
本発明の平版印刷用原版を用いた印刷版の作製は、上記
した構成から成る電子写真用原版に常法により複写画像
を形成後、非画像部を不感脂化処理する事で作製される
。本発明に供される不感脂化処理は、従来公知の方法に
従がい、酸化亜鉛の不感脂化反応を行なえばよい。A printing plate using the lithographic printing original plate of the present invention is produced by forming a copy image on the electrophotographic original plate having the above-described structure by a conventional method, and then subjecting the non-image area to a desensitization treatment. The desensitizing treatment used in the present invention may be carried out by desensitizing zinc oxide according to a conventionally known method.
酸化亜鉛の不感脂化方法としては、従来公知の処理液の
いずれをも用いることができる。例えば、フェロシアン
系化合物を不感脂化の主剤として用いた、特開昭62−
239158、同62−292492、同63−999
93、同63−9994、特公昭40−7334、同4
5−33683、特開昭57−107889、特公昭4
6−21244、同44−9045、同47−3268
1、同55−9315、特開昭52−101102各号
公報等が挙げられる。As a method for desensitizing zinc oxide, any conventionally known treatment liquid can be used. For example, JP-A-62-2003, which uses ferrocyanic compounds as the main desensitizing agent,
239158, 62-292492, 63-999
93, 63-9994, Special Publication No. 40-7334, 4
5-33683, Japanese Patent Publication No. 57-107889, Special Publication No. 4
6-21244, 44-9045, 47-3268
1, 55-9315, and JP-A-52-101102.
また、フィチン酸系化合物を主剤として用いた、特公昭
43−28408、同45−24609、特開昭51−
103501、同54−10003号、同53−838
05、同53−83806、同53−127002、同
54−44901、同56−218.9、同57−27
96、同57−20394、同59−207290各号
公報に記載のもの、金属キレート形成可能な水溶性ポリ
マーを主剤として用いた、特公昭38−9665、同3
9−22263、同40−763、同43−28404
、同47−29642、特開昭52−126302、同
52−134501、同53−49506、同53−5
9502、同53−104302各号公報等に記載のも
の、金属錯体系化合物を主剤として用いた、特開昭53
−104301、特公昭55−15313、同54−4
1924各号公報等に記載のもの、あるいは無機及び有
機酸系化合物を主剤として用いた、特公昭39−137
02、同40−10308、同46−26124、特開
昭51−118501、同56−111695各号公報
等に記載されたもの等が挙げられる。In addition, Japanese Patent Publications No. 43-28408, No. 45-24609, and No. 51-Sho.
103501, No. 54-10003, No. 53-838
05, 53-83806, 53-127002, 54-44901, 56-218.9, 57-27
96, No. 57-20394, No. 59-207290, Japanese Patent Publications No. 38-9665, No. 3, using a water-soluble polymer capable of forming metal chelates as the main ingredient.
9-22263, 40-763, 43-28404
, No. 47-29642, No. 52-126302, No. 52-134501, No. 53-49506, No. 53-5
9502, 53-104302, etc., and those described in JP-A-53-1989 using a metal complex compound as the main ingredient.
-104301, Tokuko Shou 55-15313, Shou 54-4
1924 publications, etc., or Japanese Patent Publication No. 39-137 using inorganic and organic acid compounds as main ingredients.
Examples include those described in JP-A No. 02, JP-A No. 40-10308, JP-A No. 46-26124, JP-A-51-118501, and JP-A No. 56-111695.
処理の条件は、温度15℃〜60℃で浸漬時間は10秒
〜5分間が好ましい。The conditions for the treatment are preferably a temperature of 15°C to 60°C and an immersion time of 10 seconds to 5 minutes.
以下に本発明の実施例を例示するが、本発明の内容がこ
れらに限定されるものではない。Examples of the present invention are illustrated below, but the content of the present invention is not limited thereto.
分散安定用樹脂の製造例1 : 〔P−1:1ドデシル
メタクリレ一ト97g1グリシジルメタクリレート3g
及びトルエン200gの混合溶液を、窒素気流下攪拌し
ながら、温度75℃に加温した。2.2′−アゾビスイ
ソブチロニトリル(略称A、1.B、N、) 1.0
gを加え4時間攪拌し、更に^、1.B、N、0.5g
を加え4時間攪拌した。次に、この反応混合物にメタア
クリル酸5g、N、N−ジメチルドデシルアミン1.0
g 。Production example 1 of resin for dispersion stabilization: [P-1:1 dodecyl methacrylate 97 g 1 glycidyl methacrylate 3 g
A mixed solution of 200 g of toluene and 200 g of toluene was heated to 75° C. while stirring under a nitrogen stream. 2.2'-azobisisobutyronitrile (abbreviation A, 1.B, N,) 1.0
g was added and stirred for 4 hours, and further ^, 1. B, N, 0.5g
was added and stirred for 4 hours. Next, 5 g of methacrylic acid and 1.0 g of N,N-dimethyldodecylamine were added to the reaction mixture.
g.
t−ブチルハイドロキノン0.5 gを加え、温度11
0℃にて、8時間攪拌した。冷却後、メタノール21中
に再沈し、やや褐色気味の油状物を補集後、乾燥した。Add 0.5 g of t-butylhydroquinone and raise the temperature to 11
The mixture was stirred at 0°C for 8 hours. After cooling, it was re-precipitated in methanol 21 to collect a slightly brownish oil, and then dried.
収量73gで重量平均分子量(−)3.6X10’であ
った。The yield was 73 g, and the weight average molecular weight (-) was 3.6 x 10'.
[P−13
H3CH3
f C’H,−C+T−fCH,−C−+r−分散安定
用樹脂の製造例2 : [P−212−エチルへキシ
ルメタクリレート100g。[P-13 H3CH3 f C'H, -C+T-fCH, -C-+r- Production example 2 of resin for dispersion stabilization: [P-212-Ethylhexyl methacrylate 100 g.
トルエン150g及Uイソプロパツール50gの混合溶
液を、窒素気流下攪拌しながら温度75℃に加温した。A mixed solution of 150 g of toluene and 50 g of U isopropanol was heated to 75° C. with stirring under a nitrogen stream.
2.2′−アゾビス(4−シアノ吉草酸)(略称A、
C,V、 )を2g加え4時間反応し、更にA、C4,
0,8gを加えて4時間反応した。冷却後、メタノール
21中に再沈し、油状物を補集し乾燥した。2.2'-azobis(4-cyanovaleric acid) (abbreviation A,
Add 2g of C, V, ) and react for 4 hours, and then add A, C4,
0.8 g was added and reacted for 4 hours. After cooling, it was reprecipitated into methanol 21, and the oil was collected and dried.
得られた油状物50g、2−ヒドロキシエチルメタクリ
レート6g1テトラヒドロフラン150gの混合物を溶
解し、これにジシクロヘキシルカルボンジイミド(D、
C,C,) 8 g、 4−(N、N−ジメチルアミ
ノ)ピリジン0.2 g及び塩化メチレン20gの混合
溶液を温度25〜30℃で滴下し、更にそのまま4時間
攪拌した。次にこの反応混合物にギ酸5gを加え1時間
攪拌した。析出した不溶物を濾別した後、濾液をメタノ
ール11中に再沈し油状物を濾葉した。更に、この油状
物をテトラヒドロフラン200gに溶解し、不溶物を濾
別後再びメタノールll中に再沈し、油状物を補集し乾
燥した。収量32gで−4,2X 10 ’であった。A mixture of 50 g of the obtained oil, 6 g of 2-hydroxyethyl methacrylate, and 150 g of tetrahydrofuran was dissolved, and dicyclohexylcarboniimide (D,
A mixed solution of 8 g of C,C,), 0.2 g of 4-(N,N-dimethylamino)pyridine, and 20 g of methylene chloride was added dropwise at a temperature of 25 to 30°C, and the mixture was further stirred for 4 hours. Next, 5 g of formic acid was added to this reaction mixture and stirred for 1 hour. After filtering off the precipitated insoluble matter, the filtrate was reprecipitated into methanol 11 and the oily matter was filtered. Furthermore, this oily substance was dissolved in 200 g of tetrahydrofuran, and after filtering off insoluble matter, it was reprecipitated again in 1 liter of methanol, and the oily substance was collected and dried. The yield was 32g and -4,2X10'.
CP−21 CH。CP-21 CH.
ル酸4g及びトルエン200gの混合溶液を、窒素気流
下攪拌しながら、温度70℃に加温した。A、 1.B
、 N、を1.Ogを加え8時間反応した。A mixed solution of 4 g of toluene and 200 g of toluene was heated to 70° C. while stirring under a nitrogen stream. A.1. B
, N, as 1. Og was added and reacted for 8 hours.
次にこの反応溶液にグリシジルメタクリレート8g、N
、N−ジメチルドデシルアミン1.0g及びt−ブチル
ハイドロキノン0.5gを加え、温度100℃にて、1
2時間攪拌した。冷却後この反応溶液をメタノール2I
!中に再沈し、油状物を82g得た。重合体の数平均分
子量は5.600であった。Next, 8 g of glycidyl methacrylate and N
, 1.0 g of N-dimethyldodecylamine and 0.5 g of t-butylhydroquinone were added, and at a temperature of 100°C, 1.
Stirred for 2 hours. After cooling, the reaction solution was mixed with methanol 2I
! 82 g of an oily substance was obtained. The number average molecular weight of the polymer was 5.600.
CP−3:]
Hs
sH−
分散安定用樹脂の製造例3 : [P−3)ブチルメタ
クリレ−) 96 g、チオグリコ−樹脂粒子の製造例
1 : CL−1〕アクリル酸47.5 g、 2,
2.2.2 ’ 、2’ 、2’へキサフロロイソプロ
ピルメタクリレート〔単量体(B−1))2.5g、分
散安定用樹脂の製造例1の樹脂〔P−117,5g及び
メチルエチルケトン275.8 gの混合溶液を窒素気
流下攪拌しながら65℃に加温した。2.2′−アゾビ
ス(イソバレロニ)IJル)(略称A、I、 V、 N
、 )を0.5g加え2時間反応シ、更ニA、1.V、
N。CP-3: ] Hs sH- Production example 3 of dispersion stabilizing resin: [P-3) butyl methacrylate] 96 g, Production example 1 of thioglyco resin particles: CL-1] acrylic acid 47.5 g, 2,
2.2.2', 2', 2' Hexafluoroisopropyl methacrylate [monomer (B-1)] 2.5 g, resin of Production Example 1 of dispersion stabilizing resin [P-117.5 g and methyl ethyl ketone 275 .8 g of the mixed solution was heated to 65° C. with stirring under a nitrogen stream. 2.2'-Azobis(isovaleroni)IJru) (abbreviation A, I, V, N
, ) was added and reacted for 2 hours. V,
N.
0、25 gを加えて2時間反応した。冷却後200メ
ツシユのナイロン布を通して得られた白色分散物〔L−
11は重合率100%で平均粒径0.38μmのラテッ
クスであった。0.25 g was added and reacted for 2 hours. After cooling, the resulting white dispersion was passed through a 200 mesh nylon cloth [L-
No. 11 was a latex with a polymerization rate of 100% and an average particle size of 0.38 μm.
樹脂粒子の製造例2:CL−21
分散安定用樹脂AA−2[:東亜合成側製マクロモノマ
ー:メチルメタクリレートを繰り返し単位とするマクロ
モノマーIW 3X10317.5g及びメチルエチ
ルケトン133gの混合溶液を窒素気流下攪拌しながら
65℃に加温した。Production Example 2 of Resin Particles: CL-21 Dispersion Stabilizing Resin AA-2 [: Manufactured by Toagosei Macromonomer: Macromonomer IW 3X10317.5g having methyl methacrylate as a repeating unit and 133g of methyl ethyl ketone were stirred under a nitrogen stream. The mixture was heated to 65°C.
これに、アクリル酸41.5 g、 2,2.2−)リ
フロロエチルメタクリレート〔単量体(B−2):12
、5 g、 A、1.V、N、 0.5 g及Uメチ
ルxチルケトン150gの混合溶液を1時間で滴下し更
にそのまま1時間攪拌した。更にA、I、V、N、
0.25gを加え2時間攪拌した。冷却後、200メツ
シユナイロン布を通して得られた白色分散物〔L−21
は重合率100%で平均粒径0.19μmのラテックス
であった。To this, 41.5 g of acrylic acid, 2,2.2-)lifluoroethyl methacrylate [monomer (B-2): 12
, 5 g, A, 1. A mixed solution of 0.5 g of V, N, and 150 g of U methyl x thyl ketone was added dropwise over 1 hour, and the mixture was further stirred for 1 hour. Furthermore, A, I, V, N,
0.25 g was added and stirred for 2 hours. After cooling, the obtained white dispersion [L-21
The latex had a polymerization rate of 100% and an average particle size of 0.19 μm.
樹脂粒子の製造例3〜16 : 〔L−31〜〔L−
16〕
樹脂粒子の製造例2において、2.2.2 ’ −)リ
フロロエチルメタクリレート2.5gの代わりに下記表
−2の各単量体[(B−3)〜(B16):12.5g
を用いた他は、製造例2と同様にして、白色分散物を得
た。各ラテックス[: (L−3)〜(L−16)]の
重合率は100%で、平均粒径は0.15〜0.23μ
mの範囲であった。Production examples 3 to 16 of resin particles: [L-31 to [L-
16] In Production Example 2 of Resin Particles, each monomer in Table 2 below [(B-3) to (B16):12. 5g
A white dispersion was obtained in the same manner as in Production Example 2, except that . The polymerization rate of each latex [: (L-3) to (L-16)] was 100%, and the average particle size was 0.15 to 0.23μ.
It was in the range of m.
表
樹脂粒子の製造例17〜24 : CL−17〕〜[
L−24:]
分散安定用樹脂AB−6C東亜合成味製マクロモノマー
:n−ブチルアクリレートを繰り返し単位とするマクロ
モノマーHMw lX10’〕7.5g及びメチルエ
チルケトン133gの混合溶液を窒素気流下攪拌しなが
ら65℃に加温した。Production examples 17 to 24 of surface resin particles: CL-17] to [
L-24: ] Dispersion stabilizing resin AB-6C Macromonomer manufactured by Toagosei Aji: A mixed solution of 7.5 g of macromonomer HMw lX10' with n-butyl acrylate as a repeating unit and 133 g of methyl ethyl ketone was stirred under a nitrogen stream. It was heated to 65°C.
これに、下記表−3の単量体(A)48.5g。To this, 48.5 g of monomer (A) shown in Table 3 below was added.
前記の単量体(B−6) 1.5 g%A、1.V、N
、0.5g及びメチルエチルケトン150gの混合溶液
を、1時間で滴下した。更にそのまま1時間攪拌シタ&
、A、1.V、N、0.25 gを加え、2時間攪拌し
た。冷却後、200メツシユナイロン布で濾過して得ら
れた各白色分散物(L−17]〜CL−241は、重合
率100%で平均粒径0.13〜0.25μlの範囲の
ラテックスであった。Said monomer (B-6) 1.5 g%A, 1. V,N
, and 150 g of methyl ethyl ketone was added dropwise over 1 hour. Continue stirring for another 1 hour.
,A,1. 0.25 g of V and N were added and stirred for 2 hours. After cooling, each of the white dispersions (L-17] to CL-241 obtained by filtering through a 200 mesh nylon cloth was a latex with a polymerization rate of 100% and an average particle size in the range of 0.13 to 0.25 μl. there were.
樹脂粒子の製造例25 : CL−25:1アクリル
酸47.5g、単量体(B−4)2.5g1工チレング
リコールジメタクリレート1g1分散安定用樹脂の製造
例3の樹脂〔P−317g及びジエチルケトン27.5
gの混合溶液とし、以降の操作は樹脂粒子の製造例1
と同様の方法で合成した。得られた白色分散物〔L−2
5〕は重合率100%で平均粒径0.18μmであった
。Production Example 25 of Resin Particles: 47.5 g of CL-25:1 acrylic acid, 2.5 g of monomer (B-4), 1 g of ethylene glycol dimethacrylate, 1 g of resin for dispersion stabilization [P-317 g and diethyl ketone 27.5
g as a mixed solution, and the subsequent operations are as in Production Example 1 of Resin Particles.
It was synthesized in a similar manner. The obtained white dispersion [L-2
5] had a polymerization rate of 100% and an average particle size of 0.18 μm.
樹脂粒子の製造例26〜36 : [L−26E〜〔
L−36:]
樹脂粒子の製造例25において、エチレングリコールジ
メタクリレート1gに代えて、下記表−4の多官能性化
合物を用いた他は製造例25と同様にして樹脂粒子CL
−263〜〔L36〕を製造した。各粒子とも重合率は
100%で平均粒径は0.18〜0.23μmであった
。Production examples 26 to 36 of resin particles: [L-26E~]
L-36:] In Production Example 25 of Resin Particles, resin particles CL were produced in the same manner as in Production Example 25, except that the polyfunctional compound shown in Table 4 below was used instead of 1 g of ethylene glycol dimethacrylate.
-263 to [L36] were produced. The polymerization rate of each particle was 100%, and the average particle size was 0.18 to 0.23 μm.
実施例1及び比較例A−B
実施例1
下記構造の結着樹脂CB−1]40g、光導電性酸化亜
鉛200 g、ウラニン0.03g、ローズベンガル0
.06g、テトラブロムフェノールブルー0.02g、
無水マレイン酸0.20 g及びトルエン300gの混
合物を、ボールミル中で4時間分散した。これに分散樹
脂粒子[L−2]0.8g(固形分量として)を添加し
、更に10分間分散した。この感光層形成用分散物を導
電処理した紙に乾燥付着量が20g/m”となるように
ワイヤーパーで塗布し、100℃で3分間乾燥した。つ
いで暗所で20℃、65%RHの条件下で24時間放置
することにより、電子写真感光材料を作製した。Example 1 and Comparative Examples A-B Example 1 Binder resin CB-1 having the following structure] 40 g, photoconductive zinc oxide 200 g, uranine 0.03 g, rose bengal 0
.. 06g, tetrabromophenol blue 0.02g,
A mixture of 0.20 g of maleic anhydride and 300 g of toluene was dispersed in a ball mill for 4 hours. To this was added 0.8 g (as solid content) of dispersed resin particles [L-2], and the mixture was further dispersed for 10 minutes. This dispersion for forming a photosensitive layer was applied to electrically conductive treated paper using a wire spar so that the dry adhesion amount was 20 g/m'' and dried at 100°C for 3 minutes. An electrophotographic light-sensitive material was produced by leaving it for 24 hours under these conditions.
−5,3X10’(重量比)
比較例A
実施例1において、分散樹脂粒子[:L−212、Og
を加えない他は、実施例1と同様の操作して電子写真感
光材料を作製した。-5,3X10' (weight ratio) Comparative Example A In Example 1, dispersed resin particles [:L-212, Og
An electrophotographic light-sensitive material was prepared in the same manner as in Example 1 except that .
比較例B
比較用樹脂粒子の製造: [LR−1〕アクリル酸50
g1分散安定用樹脂[AA2]7.5g及びメチルエチ
ルケトン275gの混合溶液とした後、以降は、樹脂粒
子の製造例1と同様に操作して樹脂粒子[LR−1〕を
製造した。重合率は100%で平均粒径は0.20μの
であった0
比較用感光体の製造
実施例1において、樹脂粒子[L−2:10.8gの代
わりに、上記樹脂粒子[:LR−1〕0.8g(固形分
量として)を用いた他は、実施例1と同様に操作して感
光体を作成した。Comparative Example B Production of comparative resin particles: [LR-1] Acrylic acid 50
After preparing a mixed solution of 7.5 g of g1 dispersion stabilizing resin [AA2] and 275 g of methyl ethyl ketone, the following operations were performed in the same manner as in Resin Particle Production Example 1 to produce resin particles [LR-1]. The polymerization rate was 100% and the average particle size was 0.20μ. ] A photoreceptor was prepared in the same manner as in Example 1, except that 0.8 g (in terms of solid content) was used.
これらの感光材料の皮膜性(表面の平滑度)静電特性、
光導電層の不感脂化性(不感脂化処理後の光導電層の水
との接触角で表わす)及び印刷性を調べた。印刷性は、
全自動製版機ELP404V(富士写真フィルム■製)
に現像剤ELF−Tを用いて、露光・現像処理して画像
を形成し、不感脂化処理をして得られた平版印刷板を用
いて調べた。(なお印刷機にはハマダスター■製ハマダ
スター800SX型を用いた)以上の結果をまとめて、
表−5に示す。The film properties (surface smoothness) and electrostatic properties of these photosensitive materials,
The desensitization property (represented by the contact angle of the photoconductive layer with water after desensitization treatment) and printability of the photoconductive layer were investigated. Printability is
Fully automatic plate making machine ELP404V (manufactured by Fuji Photo Film)
An image was formed by exposure and development using developer ELF-T, and a lithographic printing plate obtained by desensitization was used for investigation. (The printing machine used was Hamadastar 800SX model made by Hamadastar ■.) Summarizing the above results,
It is shown in Table-5.
表−5に記した評価項目の実施の態様は以下の通りであ
る。The implementation aspects of the evaluation items listed in Table-5 are as follows.
注1)光導電層の平滑性:
得られた感光材料を、ベック平滑度試験機(熊谷理工□
製)を用い、空気容量1 ccの条件にて、その平滑度
(sec/cc)を測定した。Note 1) Smoothness of photoconductive layer: The obtained photosensitive material was tested using a Beck smoothness tester (Kumagai Riko □
The smoothness (sec/cc) was measured under the condition of an air volume of 1 cc.
注2)静電特性:
温度20℃、65%RHの暗室中で、各感光材料にペー
パーアナライザー(川口電機■製ペーパーアナライザー
−3P−428型)を用いて一6kVで20秒間コロナ
放電をさせた後10秒間放置し、この時の表面電位をV
+oを測定した。ついでそのまま暗中で6D秒間静置し
た後の電位V70を測定し、60秒間暗減衰させた後の
電位の保持性、即ち、暗減衰保持率[D、 R,R(%
)]を(: (V?O/V、D) x 100 (%)
〕で求めた。又コロナ放電により光導電層表面を一40
0Vに帯電させた後、ついで光導電層表面を照度2.0
ルツクスの可視光で照射し、表面電位V +。Note 2) Electrostatic properties: In a dark room at a temperature of 20°C and 65% RH, each photosensitive material was subjected to corona discharge at -6 kV for 20 seconds using a paper analyzer (Paper Analyzer-3P-428 model manufactured by Kawaguchi Electric). After that, leave it for 10 seconds, and the surface potential at this time is V
+o was measured. Then, the potential V70 was measured after standing in the dark for 6D seconds, and the potential retention after dark decaying for 60 seconds, that is, the dark decay retention rate [D, R, R (%)
)] to (: (V?O/V,D) x 100 (%)
]. In addition, the surface of the photoconductive layer is heated by corona discharge.
After charging to 0V, the surface of the photoconductive layer was then illuminated with an illumination intensity of 2.0.
Irradiated with visible light of Lux, surface potential V +.
が1/10に減衰するまでの時間を求め、これから露光
量El、、O(ルックス・秒)を算出する。同様にV
+oが1/100に減衰するまでの時間を求め、これか
ら露光量E l/100 (1ux−sec )を算出
する。The time required for the light to attenuate to 1/10 is determined, and the exposure amount El,, O (lux seconds) is calculated from this. Similarly, V
The time required for +o to attenuate to 1/100 is determined, and the exposure amount E 1/100 (1ux-sec) is calculated from this.
注3)撮像性:
各感光材料及び全自動製版機ELP404V(富士写真
フィルム■製)を1昼夜常温・常湿(20℃、65%)
に放置した後、製版して複写画像を形成し、得られた複
写原版の画像(カブリ、画像の画質)を目視で観察する
(これをIとする)。複写画像の画質■は、製版を高温
・高湿(30℃、80%)で行なう他は、前記Iと同様
の方法で試験する。Note 3) Imaging performance: Each photosensitive material and fully automatic plate making machine ELP404V (manufactured by Fuji Photo Film ■) were used for one day and night at room temperature and humidity (20℃, 65%).
After being left to stand, a copy image is formed by making a plate, and the image (fogging, image quality) of the obtained copy original plate is visually observed (this is referred to as I). The image quality (2) of the copied image is tested in the same manner as in (I) above, except that plate making is performed at high temperature and high humidity (30° C., 80%).
注4) 生版保水性:
各感光材料そのものを(製版しない原版コ即ち、生版と
略称)富士写真フィルム■製不感脂化処理液ELF−E
Xを蒸留水で5倍に希釈した水溶液を用いて、エツチン
グマシーンを1回通した。次に、これらの版をハマダス
ター■製ハマダスター8005X型を用いて印刷し、刷
り出しから50枚目の印刷物の地汚れの有無を目視で評
価した。Note 4) Raw plate water retention: Each photosensitive material itself (original plate without plate making, abbreviated as raw plate) is treated with desensitizing treatment liquid ELF-E manufactured by Fuji Photo Film ■.
An aqueous solution prepared by diluting X 5 times with distilled water was used and passed through an etching machine once. Next, these plates were printed using a Hamada Star 8005X model manufactured by Hamada Star ■, and the presence or absence of scumming on the 50th printed matter after printing was visually evaluated.
注5) 印刷物の地汚れ:
各感光材料を上記性3)と同一の操作で製版した後、E
LP−EXを蒸留水で2倍に希釈した水溶液を用いて、
エツチングマシーンを1回通した後、これらのオフセッ
トマスター用原版を印刷し、印刷物の地汚れが目視で判
別できるまでの印刷枚数を調べた。Note 5) Background stains on printed matter: After making each photosensitive material in the same manner as in 3) above,
Using an aqueous solution of LP-EX diluted twice with distilled water,
After passing through an etching machine once, these original plates for offset masters were printed, and the number of prints until background stains on the printed matter could be visually determined was determined.
本発明及び比較例A−Bの静電特性は良好で実際の撮像
性も、複写画像はいずれも鮮明な画質であった。The electrostatic properties of the present invention and Comparative Examples A to B were good, and the actual imaging performance and the copied images were all clear.
これら各感光体を不感脂化処理して、非画像部の親水化
の度合を評価した所、比較例A及びBは、ともに印刷イ
ンキ付着による地汚れが著しく、非画像部の親水化が充
分に行なわれなかった。When each of these photoreceptors was desensitized and the degree of hydrophilization of the non-image area was evaluated, both Comparative Examples A and B showed significant background smudge due to adhesion of printing ink, and the hydrophilization of the non-image area was not sufficient. was not carried out.
更に実際に製版した後不感脂化処理して印刷した所、本
発明の平版は地汚れの発生も見られず且つ鮮明な画像の
印刷画質の印刷物が6000枚得られた。Furthermore, when the lithographic plate of the present invention was actually printed after making a plate and subjected to a desensitization process, 6,000 prints with clear images and print quality were obtained without any occurrence of scumming.
他方、比較例へ及びBは、刷り出しから非画像部の地汚
れが著しくなった。On the other hand, in Comparative Examples and B, the background smudge in the non-image area became significant from the beginning of printing.
以上の様に、非画像部の親水性が充分進行し地力ブリを
発生しない電子写真式平版印刷用原版は、本発明のもの
のみであった。As described above, the electrophotographic lithographic printing original plate of the present invention is the only one in which the hydrophilicity of the non-image area has sufficiently progressed and free from blurring.
実施例2
実施例1において結着樹脂CB−1]38gの代わりに
、下記構造の結着樹脂[B−2)5.7g及び結着樹脂
1”B−3:132.3gを用いた他は、実施例1と同
様に操作して電子写真感光材料を作製した。Example 2 In Example 1, 5.7 g of binder resin [B-2] having the following structure and 132.3 g of binder resin 1"B-3 were used instead of 38 g of binder resin CB-1. An electrophotographic material was prepared in the same manner as in Example 1.
CD[1CH2C’gH5CDDH 〜 6. OX 1 0 ’ [3−33 PS%Il 6.5X10’ 実施例1と同様にして各特性を測定した。CD[1CH2C’gH5CDDH ~ 6. OX 1 0’ [3-33 PS%Il 6.5X10' Each characteristic was measured in the same manner as in Example 1.
以下に特に過酷な環境条件である(30℃。The following are particularly harsh environmental conditions (30°C.
80%RH)下での測定結果を示す。80% RH).
静電特性 V、、 : −560VD、R,R:
90%
E l/la : 11.31ux−secE l/
loo : 32 1ux0sec撮像性 : 非常
に良好(◎)
生版保水性:〃(◎)
印刷物の地汚れ:6000枚まで地汚れなし本発明の各
感光材料は、いずれも帯電性、暗電荷保持率、光感度に
優れ、実際の複写画像及び印刷物も高温高湿(30℃、
80%RH)の過酷な条件においても、地力ブリの発生
のない鮮明な画像を得た。Electrostatic characteristics V,, : -560VD, R,R:
90% E l/la: 11.31ux-sec E l/
loo: 32 1ux0sec Imaging performance: Very good (◎) Fresh plate water retention: 〃 (◎) Background smudge on printed matter: No background smudge up to 6000 sheets Each of the photosensitive materials of the present invention has chargeability and dark charge retention rate. , has excellent photosensitivity, and actual copied images and printed matter can be used at high temperatures and high humidity (30℃,
Even under the harsh conditions of 80% RH), clear images with no soil burr were obtained.
実施例3〜12
実施例2において分散樹脂粒子0.8 gの代わりに、
下記表−6の本発明の樹脂粒子[L]各1.0g(固形
分量として)を用いた他は、実施例2と同様にして各感
光材料を作製した。Examples 3 to 12 Instead of 0.8 g of dispersed resin particles in Example 2,
Each photosensitive material was produced in the same manner as in Example 2, except that 1.0 g (in terms of solid content) of each resin particle [L] of the present invention shown in Table 6 below was used.
静電特性及び印刷特性を実施例2と同様に操作して評価
した。The electrostatic properties and printing properties were evaluated in the same manner as in Example 2.
表−6
各感光材料とも、静電特性、撮像性ともに、実施例2と
ほぼ同等の特性を示した。Table 6 Each photosensitive material exhibited almost the same characteristics as Example 2 in terms of electrostatic properties and imaging performance.
又、不感脂化処理してオフセット平版原版の性能を評価
した所、いずれも生版保水性は良好で実際の製版後の印
刷結果でも6000枚印刷できた。Furthermore, when the performance of the offset lithographic original plates was evaluated after being desensitized, the water retention properties of the green plates were good, and 6,000 sheets could be printed after actual plate making.
実施例13及び比較例C−D
下記構造の樹脂CB−516,Og、下記構造の樹脂〔
B−6〕34g1酸化亜鉛200g、下記構造のシアニ
ン色素[A] Oyo 18 g及びトルエン300g
の混合物をボールミル中で4時間分散した後、これに樹
脂粒子[L−1711゜Og(固形分量として)を添加
し更に5分間分散した。これを導電処理した紙に、乾燥
付着量が20g/m’となる様に、ワイヤーバーで塗布
し、100℃で3分間乾燥し、ついで暗所で20℃、6
5%RHの条件下で24時間放置することにより、電子
写真感光材料を作製した。Example 13 and Comparative Examples CD Resin CB-516, Og with the following structure, resin with the following structure [
B-6] 34 g 1 200 g of zinc oxide, 18 g of cyanine dye [A] Oyo with the following structure and 300 g of toluene
After the mixture was dispersed in a ball mill for 4 hours, resin particles [L-1711°Og (as solid content) were added thereto and further dispersed for 5 minutes. This was applied to conductive-treated paper using a wire bar so that the dry adhesion amount was 20 g/m', dried at 100°C for 3 minutes, and then heated at 20°C in the dark for 6 minutes.
An electrophotographic light-sensitive material was prepared by leaving it for 24 hours under the condition of 5% RH.
樹脂CB−5]
〜 6.5 X 1 03
樹脂〔B
6〕
〜 8X10’
シアニン色素[A]
比較例C
実施例13にふいて樹脂粒子[L−17]1.0gを加
えない他は、実施例1と同様に操作して電子写真感光材
料を作製した。Resin CB-5] 〜6.5 An electrophotographic material was prepared in the same manner as in Example 1.
比較例り
実施例13において樹脂粒子CL−1711、Ogの代
わりに、樹脂粒子[LR−1]3gを加えた他は、実施
例13と同様に操作して電子写真感光材料を作製した。Comparative Example An electrophotographic light-sensitive material was prepared in the same manner as in Example 13, except that 3 g of resin particles [LR-1] were added instead of resin particles CL-1711 and Og.
これらの感光材料の皮膜性(表面の平滑度)膜強度、静
電特性、撮像性及び環境条件を30℃、80%RHとし
た時の静電特性撮像体を調べた。更に、これらの感光材
料をオフセットマスター用原版として用いた時の光導電
性の不感脂化性(保水性)及び印刷性(地汚れ、耐刷性
等)を調べた。The film properties (surface smoothness), film strength, electrostatic properties, imaging performance, and electrostatic properties of these photosensitive materials under environmental conditions of 30° C. and 80% RH were investigated. Furthermore, when these photosensitive materials were used as original plates for offset masters, the photoconductive desensitization properties (water retention properties) and printability (scumming, printing durability, etc.) were investigated.
以上の結果をまとめて、表−7に示す。The above results are summarized in Table 7.
表−7に示した評価項目において、光導電層の平滑性及
び印刷物の地汚れの項目については、実施例1と同様に
して行なった。Among the evaluation items shown in Table 7, the smoothness of the photoconductive layer and the scumming of printed matter were evaluated in the same manner as in Example 1.
静電特性及び撮像性については以下の態様で実施した。Electrostatic properties and imaging properties were tested in the following manner.
注6)静電特性:
温度20℃、65%RHの暗室中で、各感光材料にペー
パーアナライザー(川口電機■製ペーパーアナライザー
5P−428型)を用いて−6kVで20秒間コロナ放
電をさせた後、10秒間放置し、この時の表面電位V
1Gを測定した。Note 6) Electrostatic properties: In a dark room at a temperature of 20°C and 65% RH, each photosensitive material was subjected to corona discharge at -6 kV for 20 seconds using a paper analyzer (Paper Analyzer 5P-428 model manufactured by Kawaguchi Electric). After that, leave it for 10 seconds, and at this time the surface potential V
1G was measured.
次いでそのまま暗中で180秒間静置させた後の電位V
+110を測定し、180秒間暗減衰させた後の電位
を保持性、即ち、暗減衰保持率[DRR(%)〕を、(
Visa /Via) x 100 (%) テ求めた
。Then, the potential V after being allowed to stand still for 180 seconds in the dark
+110 and the retention of the potential after dark decaying for 180 seconds, that is, the dark decay retention rate [DRR (%)] is (
Visa/Via) x 100 (%) was calculated.
又、コロナ放電により光導電層表面を一400Vに帯電
させた後、波長780 n+nの単色光で照射し、表面
電位(V、。)が171Oに減衰するまでの時間を求め
、これから露光量E 1/10 (erg/co+’)
を算出する。In addition, after the surface of the photoconductive layer is charged to -400V by corona discharge, it is irradiated with monochromatic light with a wavelength of 780n+n, the time required for the surface potential (V,.) to decay to 171O is determined, and from this the exposure amount E is determined. 1/10 (erg/co+')
Calculate.
又表面電位(Vto)が17100に減衰するまでの時
間を求め、これから露光量E l/+011 (er
g/cm2)を算出する。Also, find the time until the surface potential (Vto) attenuates to 17100, and calculate the exposure amount E l/+011 (er
g/cm2).
注7)撮像性:
各感光材料を以下の環境条件で1昼夜放置した。次に一
5kVで帯電し、光源として2.0mW出力のガリウム
ーアルミニウムーヒ素半導体レーザー(発振波長780
nm)を用いて、感光材料表面上で、45 erg/
cm2の照射量下、ピッチ25μm及びスキャニング速
度330m/secのスピード露光後、液体現像剤とし
て、ELFT(富士写真フィルム■製)を用いて現像し
、定着することで得られた複写画像(カブリ、画像の画
質)を目視評価した。Note 7) Imaging properties: Each photosensitive material was left for one day and night under the following environmental conditions. Next, it is charged with -5kV and used as a light source with a 2.0mW output gallium-aluminum-arsenide semiconductor laser (oscillation wavelength 780).
45 erg/nm) on the surface of the photosensitive material.
After exposure at a irradiation dose of cm2, a pitch of 25 μm, and a scanning speed of 330 m/sec, the reproduced image (fogging, Image quality) was visually evaluated.
本発明実施例12及び比較例Cの感光体は、静電特性及
び撮像性ともに良好であった。The photoreceptors of Example 12 of the present invention and Comparative Example C had good electrostatic properties and good imaging properties.
一方比較例りは、静電特性が低下し、特に環境条件が変
動した時にその影響を著しく受け、実際の複写画像でも
、地力ブリや文字・細線の切れが発生した。On the other hand, the comparative example had deteriorated electrostatic properties and was significantly affected by it, especially when the environmental conditions changed, and even in actual copied images, ground force blur and breaks in letters and thin lines occurred.
一方、不感脂化処理した原版では、本発明のもののみ、
非画像部の親水化が充分で印刷インキ等の付着が見られ
ず6000枚まで印刷できた。On the other hand, among the desensitized original plates, only those of the present invention;
The non-image area was sufficiently hydrophilized and no adhesion of printing ink was observed, and up to 6,000 sheets could be printed.
比較例Cは、親水化が不充分であり、比較例りは生版保
水性は充分であったが、実際に製版後の原版では、複写
画像が劣化しているため、印刷物でもその影響で刷り出
しから不充分な印刷物しか得られなかった。In Comparative Example C, the hydrophilicity was insufficient, and in Comparative Example, the raw plate water retention was sufficient, but the copied image actually deteriorated in the original plate after plate making, so the printed matter was also affected by this. An unsatisfactory print was obtained from the press run.
実施例14〜19
実施例13において、本発明の結着樹脂粒子CL−17
)Igの代わりに下記表−8の樹脂粒子CL)各1gを
用いた他は、実施例13と同様にして各感光材料を作成
した。Examples 14 to 19 In Example 13, binder resin particles CL-17 of the present invention
Each photosensitive material was prepared in the same manner as in Example 13, except that 1 g of each of the resin particles CL) shown in Table 8 below was used in place of Ig.
表−8に示す様に、常温常温(20℃、65%RH)の
みならず、高温高湿(30℃、80%RH)下でも、本
発明では優れた静電特性が得られた。As shown in Table 8, excellent electrostatic properties were obtained in the present invention not only at room temperature (20° C., 65% RH) but also at high temperature and high humidity (30° C., 80% RH).
又撮像性及び保水性はいずれも良好で、オフセットマス
ター原版として用いて印刷した所、地汚れのない鮮明な
画質の印刷物が6000枚以上得られた。In addition, both the imaging properties and the water retention properties were good, and when printing was performed using it as an offset master original plate, more than 6,000 prints with clear image quality and no background smudge were obtained.
実施例20〜31
下記構造の樹脂CB−7〕6.0g、下記構造の樹脂C
B−8334g、光導電性酸化亜鉛200 g、無水フ
タル酸0.20g、下記構造のシアニン色素[B)O,
fi18g及びトルエン300gの混合物をボールミル
中で4時間分散した後、下記表−9の樹脂粒子0.9g
(固形分量として)を添加して5分間分散した。これを
導電処理した紙に、乾燥付着量が20g/m”となる様
に、ワイヤーバーで塗布し、100℃で3分間乾燥し、
ついで暗所で20℃、65%RHの条件下で24時間放
置することにより、電子写真感光材料を作製した。Examples 20 to 31 Resin CB-7 with the following structure] 6.0 g, Resin C with the following structure
B-8334g, photoconductive zinc oxide 200g, phthalic anhydride 0.20g, cyanine dye with the following structure [B)O,
After dispersing a mixture of 18 g of fi and 300 g of toluene in a ball mill for 4 hours, 0.9 g of resin particles shown in Table 9 below were obtained.
(as solid content) and dispersed for 5 minutes. This was applied to conductive-treated paper using a wire bar so that the dry adhesion amount was 20 g/m'', dried at 100°C for 3 minutes,
Then, an electrophotographic light-sensitive material was prepared by leaving it in a dark place for 24 hours at 20° C. and 65% RH.
樹脂[B−’71
樹脂CB−8)
Hs
シアニン色素
〔B〕
表
本発明によれば、苛酷な条件下においても優れた静電特
性と機械的特性を有する電子写真感光体を得ることがで
き、また、平版印刷用原版としても、地汚れのない鮮明
な画質の印刷物を多数枚印刷することができる。Resin [B-'71 Resin CB-8) Hs Cyanine Dye [B] Table According to the present invention, it is possible to obtain an electrophotographic photoreceptor having excellent electrostatic properties and mechanical properties even under severe conditions. Also, as a planographic printing original plate, it is possible to print a large number of prints with clear image quality and no background smear.
更にまた、本発明の原版は半導体レーザー光を用いたス
キャニング露光方式に有効である。Furthermore, the original plate of the present invention is effective in a scanning exposure method using semiconductor laser light.
実施例20〜31で作製した各感光材料について、実施
例13と同様に操作して静電特性、印刷特性を測定した
ところ、いずれも帯電性、暗電荷保持率、光感度に優れ
、実際の複写画像も高温高湿(30℃、80%RH)の
苛酷な条件においても地力ブリの発生や細線飛びの発生
等のない鮮明な画像を与えた。更にオフセットマスター
原版として印刷したところ、非画像部に地力ブリのない
鮮明な画像の印刷物を6000〜8000枚以上印刷す
ることができた。The electrostatic properties and printing properties of each of the photosensitive materials produced in Examples 20 to 31 were measured in the same manner as in Example 13. All of them had excellent chargeability, dark charge retention, and photosensitivity, and were superior to actual Even under severe conditions of high temperature and high humidity (30° C., 80% RH), the copied images provided clear images with no occurrence of soil blurring or skipping of thin lines. Furthermore, when printed as an offset master original plate, more than 6,000 to 8,000 prints with clear images without blurring in the non-image areas could be printed.
Claims (3)
とを含有してなる光導電層を少なくとも1層設けてなる
電子写真式平版印刷用原版において、該光導電層中に前
記光導電性酸化亜鉛粒子の最大粒子径と同じかそれより
小さい粒子径を有する下記の非水溶媒系分散樹脂粒子を
少なくとも1種含有することを特徴とする電子写真式平
版印刷用原版。 非水溶媒系分散樹脂粒子: 非水溶媒中において、該非水溶媒には可溶であるが重合
することにより不溶化する、カルボキシル基、スルホ基
、スルフィノ基、ホスホノ基、▲数式、化学式、表等が
あります▼〔R_0は炭化水素基又は−OR_1_0(
R_1_0は炭化水素基を表す)を表す〕、ヒドロキシ
ル基、ホルミル基、アミド基、シアノ基、アミノ基、環
状酸無水物含有基及び窒素原子含有の複素環基から選ば
れる少なくとも1種の極性基を含有してなる一官能性単
量体(A)と、ケイ素原子及び/又はフッ素原子を含有
する置換基を含み該一官能性単量体(A)と共重合可能
な一官能性単量体(B)とを、該非水溶媒に可溶性の分
散安定用樹脂の存在下に分散重合反応させることにより
得られる共重合体樹脂粒子。(1) In an electrophotographic lithographic printing original plate comprising at least one photoconductive layer containing photoconductive zinc oxide and a binder resin on a conductive support, the photoconductive layer contains An original plate for electrophotographic lithographic printing, characterized in that it contains at least one type of non-aqueous solvent-based dispersed resin particles below having a particle diameter that is the same as or smaller than the maximum particle diameter of the photoconductive zinc oxide particles. Non-aqueous solvent-based dispersed resin particles: In a non-aqueous solvent, carboxyl groups, sulfo groups, sulfino groups, phosphono groups, ▲ mathematical formulas, chemical formulas, tables, etc. that are soluble in the non-aqueous solvent but become insolubilized by polymerization. There is ▼ [R_0 is a hydrocarbon group or -OR_1_0(
R_1_0 represents a hydrocarbon group], at least one polar group selected from a hydroxyl group, a formyl group, an amide group, a cyano group, an amino group, a cyclic acid anhydride-containing group, and a nitrogen atom-containing heterocyclic group and a monofunctional monomer containing a substituent containing a silicon atom and/or a fluorine atom and copolymerizable with the monofunctional monomer (A). copolymer resin particles obtained by carrying out a dispersion polymerization reaction with the compound (B) in the presence of a dispersion stabilizing resin soluble in the nonaqueous solvent.
形成していることを特徴とする請求項(1)記載の電子
写真式平版印刷用原版。(2) The original plate for electrophotographic lithographic printing according to claim (1), wherein the non-aqueous solvent-based dispersed resin particles form a high-order network structure.
式( I )で示される重合性二重結合基部分を少なくと
も1種含有していることを特徴とする請求項(1)記載
の電子写真式平版印刷用原版。 一般式( I ) ▲数式、化学式、表等があります▼ 〔一般式( I )において、V_0は−O−、−COO
−、−OCO−、▲数式、化学式、表等があります▼、 ▲数式、化学式、表等があります▼、−SO_2−、 ▲数式、化学式、表等があります▼ −CONHCOO−、又は−CONHCONH−を表わ
し(但し、pは1〜4の整数を表わし、R_1は水素原
子又は炭素数1〜18の炭化水素基を表わす)、a_1
、a_2は、互いに同じでも異なってもよく、水素原子
、ハロゲン原子、シアノ基、炭化水素基、−COO−R
_2又は炭化水素基を介した−COO−R_2(R_2
は水素原子又は置換されてもよい炭化水素基を示す)を
表わす〕(3) Claim (1) characterized in that the dispersion stabilizing resin contains at least one kind of polymerizable double bond group moiety represented by the following general formula (I) in the polymer chain. The original plate for electrophotographic lithographic printing described above. General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the general formula (I), V_0 is -O-, -COO
-, -OCO-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -SO_2-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ -CONHCOO-, or -CONHCONH- (however, p represents an integer of 1 to 4, R_1 represents a hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms), a_1
, a_2 may be the same or different, and may be a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, -COO-R
_2 or -COO-R_2 (R_2
represents a hydrogen atom or a hydrocarbon group that may be substituted]
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22419090A JP2615252B2 (en) | 1990-08-28 | 1990-08-28 | Electrophotographic lithographic printing original plate |
| EP91306020A EP0485049B1 (en) | 1990-07-06 | 1991-07-02 | An electrophotographic lithographic printing plate precursor |
| DE69130250T DE69130250T2 (en) | 1990-07-06 | 1991-07-02 | Electrophotographic planographic printing plate precursor |
| US07/725,091 US5229236A (en) | 1990-07-06 | 1991-07-03 | Electrophotographic lithographic printing plate precursor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22419090A JP2615252B2 (en) | 1990-08-28 | 1990-08-28 | Electrophotographic lithographic printing original plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04106552A true JPH04106552A (en) | 1992-04-08 |
| JP2615252B2 JP2615252B2 (en) | 1997-05-28 |
Family
ID=16809934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22419090A Expired - Fee Related JP2615252B2 (en) | 1990-07-06 | 1990-08-28 | Electrophotographic lithographic printing original plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2615252B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013519758A (en) * | 2010-02-12 | 2013-05-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Non-aqueous composition comprising partially fluorinated methacrylic polymer |
| JP2021047236A (en) * | 2019-09-17 | 2021-03-25 | 富士ゼロックス株式会社 | Electrophotographic photosensitive member, process cartridge, and image forming apparatus |
-
1990
- 1990-08-28 JP JP22419090A patent/JP2615252B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013519758A (en) * | 2010-02-12 | 2013-05-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Non-aqueous composition comprising partially fluorinated methacrylic polymer |
| JP2021047236A (en) * | 2019-09-17 | 2021-03-25 | 富士ゼロックス株式会社 | Electrophotographic photosensitive member, process cartridge, and image forming apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2615252B2 (en) | 1997-05-28 |
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