JPH0410998U - - Google Patents
Info
- Publication number
- JPH0410998U JPH0410998U JP5114990U JP5114990U JPH0410998U JP H0410998 U JPH0410998 U JP H0410998U JP 5114990 U JP5114990 U JP 5114990U JP 5114990 U JP5114990 U JP 5114990U JP H0410998 U JPH0410998 U JP H0410998U
- Authority
- JP
- Japan
- Prior art keywords
- concentric circles
- electric field
- permanent magnets
- polar directions
- vector due
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005684 electric field Effects 0.000 claims 3
- 230000004907 flux Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の実施例の縦断面図、第２図は
その平面図、第３図は磁力線の説明図、第４図は
従来技術の説明図である。１……真空チエンバー
、３……磁界、４……導波管、５……気密結合窓
、６……共鳴領域、７……基板支持装置、８……
保持板、９……ガス注入口、１０……永久磁石、
１１……円筒状永久磁石、１２……絶縁体、１３
……電極、１４……網状電極、１５……印加電源
、１６……電気力線、１７……ベクトル積方向、
１８……出力の流れ、２１，２２……励磁コイル
。
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, FIG. 2 is a plan view thereof, FIG. 3 is an explanatory diagram of lines of magnetic force, and FIG. 4 is an explanatory diagram of a prior art. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 3... Magnetic field, 4... Waveguide, 5... Hermetic coupling window, 6... Resonance region, 7... Substrate support device, 8...
Holding plate, 9... Gas inlet, 10... Permanent magnet,
11...Cylindrical permanent magnet, 12...Insulator, 13
...electrode, 14...mesh electrode, 15...applied power source, 16...line of electric force, 17...vector product direction,
18... Output flow, 21, 22... Excitation coil.
Claims (1)
方向を有する多数の永久磁石が配置され、隣接す
る同心円上に配置される永久磁石の極性方向は相
互に反対方向をなし、該同心円に直交する方向に
電界が加えられ、その電界による電界ベクトルと
上記永久磁石による磁束密度ベクトルのベクトル
積の方向に電子を運動捕捉することを特徴とする
電子サイクロトロン共鳴プラズマ発生装置。 A large number of permanent magnets having polar directions perpendicular to the concentric circles are arranged on a plurality of concentric circles, and the polar directions of the permanent magnets arranged on adjacent concentric circles are opposite to each other and perpendicular to the concentric circles. An electron cyclotron resonance plasma generation device characterized in that an electric field is applied in a direction, and electrons are captured in motion in the direction of the vector product of an electric field vector due to the electric field and a magnetic flux density vector due to the permanent magnet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5114990U JPH0633680Y2 (en) | 1990-05-16 | 1990-05-16 | Electron cyclotron resonance plasma generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5114990U JPH0633680Y2 (en) | 1990-05-16 | 1990-05-16 | Electron cyclotron resonance plasma generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0410998U true JPH0410998U (en) | 1992-01-29 |
| JPH0633680Y2 JPH0633680Y2 (en) | 1994-08-31 |
Family
ID=31570327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5114990U Expired - Lifetime JPH0633680Y2 (en) | 1990-05-16 | 1990-05-16 | Electron cyclotron resonance plasma generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0633680Y2 (en) |
-
1990
- 1990-05-16 JP JP5114990U patent/JPH0633680Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0633680Y2 (en) | 1994-08-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR890003266A (en) | Plasma treatment method and apparatus | |
| CN116193337B (en) | A bone conduction sounding device and a bone conduction earphone | |
| JPH08505516A (en) | DC motor with multiple magnetic poles | |
| CN116193338B (en) | A bone conduction sound generating device and electronic equipment | |
| JPH0410998U (en) | ||
| JP2952639B2 (en) | Sheet plasma device | |
| JPS61218120A (en) | Magnetic field generator | |
| JPH10146074A (en) | Superconducting dc power generator | |
| JPH0244482Y2 (en) | ||
| JPS62193660U (en) | ||
| JP2576139B2 (en) | Plasma equipment | |
| JPH0413048U (en) | ||
| JPS6346839U (en) | ||
| JPS62172699A (en) | Magnetic field generator for plasma confinement | |
| JPH02174227A (en) | Plasma ion etching | |
| JPH0238555Y2 (en) | ||
| JPH0650543Y2 (en) | Plasma processing device | |
| JP6952997B2 (en) | Mirror magnetic field generator and ECR ion source device | |
| JPH01128335A (en) | Electron cyclotron resonance ion source | |
| JPS63112745U (en) | ||
| JPS62184705U (en) | ||
| JPH0281037U (en) | ||
| JPS61260635A (en) | Method and device for plasma process | |
| JPS62107405U (en) | ||
| JPS63200334U (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |