JPS63200334U - - Google Patents
Info
- Publication number
- JPS63200334U JPS63200334U JP9003187U JP9003187U JPS63200334U JP S63200334 U JPS63200334 U JP S63200334U JP 9003187 U JP9003187 U JP 9003187U JP 9003187 U JP9003187 U JP 9003187U JP S63200334 U JPS63200334 U JP S63200334U
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- air core
- auxiliary yoke
- wound
- arrangement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims 2
- 239000012212 insulator Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
図は本発明にかかわる高速マグネトロン・プラ
ズマエツチング室の実例を示す。第1図は実施例
の中央縦断面図。第2図は第1図のA―A′端面
図。
1……磁界構成用コイル、2……空芯、3……
補助ヨーク、4……電子封じ込め用磁界、5……
対向電極、6……ターゲツト電極、7……被処理
物(ウエハー)、8……絶縁体、9……高周波電
源、10……DC電源。
The figure shows an example of a high speed magnetron plasma etching chamber according to the present invention. FIG. 1 is a central vertical sectional view of the embodiment. FIG. 2 is an end view taken along the line AA' in FIG. 1... Coil for magnetic field configuration, 2... Air core, 3...
Auxiliary yoke, 4...Magnetic field for electronic confinement, 5...
Counter electrode, 6... Target electrode, 7... Processing object (wafer), 8... Insulator, 9... High frequency power source, 10... DC power source.
Claims (1)
磁界構成用コイル1を巻いた空芯2の開講部に、
補助ヨーク3の磁極を配置したことを特色とする
エツチング室。 In magnetron type etching equipment,
At the opening part of the air core 2 around which the magnetic field configuring coil 1 is wound,
An etching chamber characterized by the arrangement of the magnetic poles of the auxiliary yoke 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9003187U JPS63200334U (en) | 1987-06-11 | 1987-06-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9003187U JPS63200334U (en) | 1987-06-11 | 1987-06-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63200334U true JPS63200334U (en) | 1988-12-23 |
Family
ID=30949542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9003187U Pending JPS63200334U (en) | 1987-06-11 | 1987-06-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63200334U (en) |
-
1987
- 1987-06-11 JP JP9003187U patent/JPS63200334U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN116193337A (en) | A bone conduction sounding device and a bone conduction earphone | |
| JPS63171954U (en) | ||
| JPS649347U (en) | ||
| JPS62193660U (en) | ||
| JPS6352254U (en) | ||
| JPS622152U (en) | ||
| JPS6139856U (en) | magnetron | |
| JPH0722841Y2 (en) | Magnetron | |
| JPH051152U (en) | Deflection yoke | |
| JPS6339170U (en) | ||
| JPH0267633U (en) | ||
| JPS63112745U (en) | ||
| JP2531052Y2 (en) | Magnetron sputtering equipment | |
| JPS6064558U (en) | discharge trigger | |
| JPS6455649U (en) | ||
| JPS63121362U (en) | ||
| JPH0197549U (en) | ||
| SU1807833A1 (en) | Multibeam induction electron accelerator | |
| JPH0295148U (en) | ||
| JPH02142977U (en) | ||
| JPH0410998U (en) | ||
| JPH038429U (en) | ||
| JPH0269500U (en) | ||
| JPH0425148U (en) | ||
| JPS63132118U (en) |