JPH04122941A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPH04122941A JPH04122941A JP24273390A JP24273390A JPH04122941A JP H04122941 A JPH04122941 A JP H04122941A JP 24273390 A JP24273390 A JP 24273390A JP 24273390 A JP24273390 A JP 24273390A JP H04122941 A JPH04122941 A JP H04122941A
- Authority
- JP
- Japan
- Prior art keywords
- water
- polyester
- metal salt
- salt type
- sulfonic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 18
- 229920000728 polyester Polymers 0.000 claims abstract description 31
- -1 for example Polymers 0.000 claims abstract description 29
- 125000000542 sulfonic acid group Chemical group 0.000 claims abstract description 13
- 229920001971 elastomer Polymers 0.000 claims abstract description 11
- 239000000806 elastomer Substances 0.000 claims abstract description 7
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 229920006395 saturated elastomer Polymers 0.000 claims description 13
- 229910052783 alkali metal Inorganic materials 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000000178 monomer Substances 0.000 abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 239000002253 acid Substances 0.000 abstract description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 229920002857 polybutadiene Polymers 0.000 abstract description 5
- 150000003839 salts Chemical class 0.000 abstract description 5
- 239000005062 Polybutadiene Substances 0.000 abstract description 4
- 239000012965 benzophenone Substances 0.000 abstract description 3
- 150000002148 esters Chemical class 0.000 abstract description 3
- 125000000524 functional group Chemical group 0.000 abstract description 3
- 150000008366 benzophenones Chemical class 0.000 abstract description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- 239000004925 Acrylic resin Substances 0.000 abstract 1
- 229920000178 Acrylic resin Polymers 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 230000002194 synthesizing effect Effects 0.000 abstract 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 17
- 239000000203 mixture Substances 0.000 description 14
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 239000000976 ink Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000012643 polycondensation polymerization Methods 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920006132 styrene block copolymer Polymers 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- GRDGBWVSVMLKBV-UHFFFAOYSA-N (2-amino-5-nitrophenyl)-(2-chlorophenyl)methanone Chemical compound NC1=CC=C([N+]([O-])=O)C=C1C(=O)C1=CC=CC=C1Cl GRDGBWVSVMLKBV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
- PIYJQTKZHLLZQE-UHFFFAOYSA-N 2-methyl-n-[2-(2-methylprop-2-enoylamino)ethyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCNC(=O)C(C)=C PIYJQTKZHLLZQE-UHFFFAOYSA-N 0.000 description 1
- JDABGIQPZLWDFW-UHFFFAOYSA-N 2-methyl-n-[2-(2-methylprop-2-enoylamino)propyl]prop-2-enamide Chemical compound CC(=C)C(=O)NC(C)CNC(=O)C(C)=C JDABGIQPZLWDFW-UHFFFAOYSA-N 0.000 description 1
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- WMRCTEPOPAZMMN-UHFFFAOYSA-N 2-undecylpropanedioic acid Chemical compound CCCCCCCCCCCC(C(O)=O)C(O)=O WMRCTEPOPAZMMN-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- NIOAVQYSSKOCQP-UHFFFAOYSA-N 4-hydroxynaphthalene-2-carboxylic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CC(O)=C21 NIOAVQYSSKOCQP-UHFFFAOYSA-N 0.000 description 1
- OQAOQXNFYZLMNJ-UHFFFAOYSA-N 4-methylocta-2,6-dienediamide Chemical compound NC(=O)C=CC(C)CC=CC(N)=O OQAOQXNFYZLMNJ-UHFFFAOYSA-N 0.000 description 1
- KAUQJMHLAFIZDU-UHFFFAOYSA-N 6-Hydroxy-2-naphthoic acid Chemical compound C1=C(O)C=CC2=CC(C(=O)O)=CC=C21 KAUQJMHLAFIZDU-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000519695 Ilex integra Species 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 229940048053 acrylate Drugs 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- WPKYZIPODULRBM-UHFFFAOYSA-N azane;prop-2-enoic acid Chemical compound N.OC(=O)C=C WPKYZIPODULRBM-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- FBNZWXVYNKUWIC-UHFFFAOYSA-L dipotassium;2-sulfobenzene-1,3-dicarboxylate Chemical compound [K+].[K+].OS(=O)(=O)C1=C(C([O-])=O)C=CC=C1C([O-])=O FBNZWXVYNKUWIC-UHFFFAOYSA-L 0.000 description 1
- NCTJHYCOXOYZMU-UHFFFAOYSA-L dipotassium;2-sulfoterephthalate Chemical compound [K+].[K+].OS(=O)(=O)C1=CC(C([O-])=O)=CC=C1C([O-])=O NCTJHYCOXOYZMU-UHFFFAOYSA-L 0.000 description 1
- NVLHKSGUMYMKRR-UHFFFAOYSA-N dodeca-2,10-dienediamide Chemical compound NC(=O)C=CCCCCCCC=CC(N)=O NVLHKSGUMYMKRR-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000005802 health problem Effects 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 150000004059 quinone derivatives Chemical class 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は感光性樹脂組成物に関し、さらに詳しくは、水
溶液で現像可能な柔軟性に富んだフレキソ印刷版用とし
て好適な感光性樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photosensitive resin composition, and more specifically, a photosensitive resin composition suitable for use in a flexible flexographic printing plate that can be developed with an aqueous solution. Regarding.
[従来の技術]
基本的組成が結合剤、光重合性不飽和化合物及び光重合
開始剤から成る感光性樹脂組成物はレリーフ画像を形成
するのに好適な材料として多方面で使用され、フレキソ
印刷版もその一つとして供されている。[Prior Art] Photosensitive resin compositions whose basic composition consists of a binder, a photopolymerizable unsaturated compound, and a photoinitiator are used in many fields as suitable materials for forming relief images, and are used in flexographic printing. The edition is also available as one of them.
ところで、従来のフレキソ印刷版用としての感光性樹脂
組成物は、例えば米国特許第
2.948,611号明細書、同第3,024,180
号明細書、特公昭51−43374号公報、特公昭59
−22219号公報等に記載されているように、t=S
化ゴム、スチレン−ブタジェンのブロンク共重合体、ポ
リウレタン等のエラストマーを結合剤とし、これに光重
合性不飽和化合物及び光重合開始剤が添加されたものか
ら成っている。しかしながらこのような組成物では結合
剤が多量使用されていることに起因して、画像を形成す
るための現像液にハロゲン化炭化水素を必要とする。By the way, conventional photosensitive resin compositions for flexographic printing plates are disclosed in, for example, U.S. Pat.
specification, Japanese Patent Publication No. 51-43374, Japanese Patent Publication No. 59
As described in Publication No.-22219 etc., t=S
The binder is an elastomer such as rubber, styrene-butadiene bronc copolymer, or polyurethane, to which a photopolymerizable unsaturated compound and a photopolymerization initiator are added. However, due to the large amount of binder used in such compositions, halogenated hydrocarbons are required in the developer solution to form the image.
したがってS康障害、環境汚染等の問題点を有している
。一方、ハロゲン化炭化水素を必要としない現像液を使
用する感光性樹脂組成物には、フレキソ印刷版用以外で
種々知られている。例えば、特公昭46−26125号
公報、特公昭50−32645号公報、特公昭54−3
790号公報、特公昭57−28485号公報等に記載
されているように、結合剤として水やアルコールに可溶
のポリビニルアルコール又はポリアミドを使用するもの
であるが、光硬化して得られる印刷版は固く、フレキソ
印刷用としては不向きである。また特開昭52−134
655号公報、特開昭53=10648号公報、特開昭
61−22339号公報、特開平1−219735号公
報、特開平1−306836号公報等に記載されている
ように、共役ジエン系炭化水素とa、β−エチレン性不
飽和カルボン酸又はその塩を必須成分とし、これにモノ
オレフィン系不飽和化合物とを含む共重合性不飽和単量
体、光増感剤を含有する水系現像液で現像可能な感光性
樹脂組成物がある。しかし、このような組成物から得ら
れる印刷版は、PH5,0〜9.0の生活用水による現
像が困難であり、かつレリーフ部の耐インキ性が十分で
なかったり、また耐オゾン性、耐候性、耐酸化性が不十
分であるという問題点を有している。Therefore, there are problems such as health problems and environmental pollution. On the other hand, various photosensitive resin compositions that use a developer that does not require a halogenated hydrocarbon are known for purposes other than those for flexo printing plates. For example, Japanese Patent Publication No. 46-26125, Japanese Patent Publication No. 50-32645, Japanese Patent Publication No. 54-3
As described in Japanese Patent Publication No. 790, Japanese Patent Publication No. 57-28485, etc., polyvinyl alcohol or polyamide soluble in water or alcohol is used as a binder, but printing plates obtained by photocuring is hard and unsuitable for flexo printing. Also, JP-A-52-134
As described in JP-A No. 655, JP-A-53-10648, JP-A-61-22339, JP-A-1-219735, JP-A-1-306836, etc., conjugated diene carbonization An aqueous developer containing hydrogen and a,β-ethylenically unsaturated carboxylic acid or its salt as essential components, a copolymerizable unsaturated monomer containing a monoolefinically unsaturated compound, and a photosensitizer. There are photosensitive resin compositions that can be developed with. However, printing plates obtained from such compositions are difficult to develop using household water with a pH of 5.0 to 9.0, have insufficient ink resistance in relief areas, and have poor ozone resistance and weather resistance. However, it has the problem that its properties and oxidation resistance are insufficient.
また、特開昭52−260142号公報には、(a)ア
ルカリ金属塩型のスルホン酸基を有する水溶性飽和ポリ
エステル、(b)光重合性不飽和化合物及び(c)光重
合開始剤を必須成分としてg有することを特徴とする感
光性樹脂組成物が開示されているが、この組成物では得
られる印刷版は油性インキに耐性を有しているものの、
水性あるいはアルコール性等の極性溶剤を含有するイン
キに対して耐性を有していないという欠点があり実用的
ではない。In addition, JP-A-52-260142 discloses that (a) a water-soluble saturated polyester having an alkali metal salt type sulfonic acid group, (b) a photopolymerizable unsaturated compound, and (c) a photopolymerization initiator are essential. A photosensitive resin composition characterized by containing g as a component has been disclosed, but although the printing plate obtained with this composition has resistance to oil-based inks,
It has the disadvantage of not being resistant to inks containing polar solvents such as aqueous or alcoholic solvents, and is therefore impractical.
U発明が解決しようとする課題]
本発明は、水現像可能なフレキソ印刷版に適用できるた
めに、前記したような従来の感光性樹脂組成物における
欠点を克服し、生活用水による現像が可能で耐インキ性
を満足できるフレキソ印刷版に好適な感光性樹脂組成物
を提供することを目的としてなされたものである。Problems to be Solved by the Invention] Since the present invention can be applied to water-developable flexographic printing plates, it overcomes the drawbacks of conventional photosensitive resin compositions as described above, and can be developed with household water. The purpose of this invention is to provide a photosensitive resin composition suitable for a flexographic printing plate that has satisfactory ink resistance.
U課組を解決するための手段]
本発明者らは、水現像可能で耐インキ性に冨み、生活用
水による現像が可能な感光性樹脂組成物を開発すべく鋭
意研究を重ねた結果、結合剤としてアルカリ金属塩型の
スルホン酸基を有する水溶性飽和ポリエステルを使用し
た感光性樹脂組成物がその目的を達成することを見い出
し、この知見に基づいて本発明を完成するに至った。Means for Solving Problems U] The present inventors have conducted intensive research to develop a photosensitive resin composition that is water-developable, has high ink resistance, and can be developed with household water. It has been discovered that a photosensitive resin composition using a water-soluble saturated polyester having an alkali metal salt type sulfonic acid group as a binder achieves the objective, and based on this knowledge, the present invention has been completed.
すなわち、本発明は、(イ)アルカリ金属塩型スルホン
酸基を有する水溶性飽和ポリエステル、(ロ)エラスト
マー、(ハ)光重合性不飽和化合物及び(ニ)光重合開
始剤から成る感光性樹脂組成物を提供するものである。That is, the present invention provides a photosensitive resin comprising (a) a water-soluble saturated polyester having an alkali metal salt type sulfonic acid group, (b) an elastomer, (c) a photopolymerizable unsaturated compound, and (d) a photopolymerization initiator. A composition is provided.
以下に本発明の詳細な説明する。The present invention will be explained in detail below.
本発明組成物において使用する(イ)アルカリ金属塩型
スルホン酸基を有する水溶性飽和ポリエステルは、通常
の飽和ポリエステルの原料単量体として用いられている
酸成分単量体及びアルコール成分単量体と、アルカリ金
属塩型スルホン酸基及び2個以上のエステル形成性官能
基を有する単量体とを共重合させることによって製造す
ることができる。(a) The water-soluble saturated polyester having an alkali metal salt type sulfonic acid group used in the composition of the present invention is composed of acid component monomers and alcohol component monomers that are used as raw material monomers for ordinary saturated polyesters. and a monomer having an alkali metal salt type sulfonic acid group and two or more ester-forming functional groups.
前記酸成分単量体としては、カルボキシル基2個以上を
有する多価カルボン酸、例えばテレフタル酸、イソフタ
ル酸、フタル酸、ナフタレンジカルボン酸などの芳香族
ジカルボン酸、トリメリット酸、ピロメリット酸などの
芳香族ポリカルボン酸、コハク酸、グルタル酸、アジピ
ン酸、アゼライン酸、セバシン酸、ドデカンジカルボン
酸などの脂肪族ジカルボン酸などが挙げられる。The acid component monomers include polycarboxylic acids having two or more carboxyl groups, such as aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, phthalic acid, and naphthalene dicarboxylic acid, trimellitic acid, and pyromellitic acid. Examples include aromatic polycarboxylic acids, succinic acid, glutaric acid, adipic acid, azelaic acid, sebacic acid, and aliphatic dicarboxylic acids such as dodecanedicarboxylic acid.
またアルコール成分の単量体としては、水酸基2個以上
を有する多価アルコール、例えば、エチレングリコール
、プロピレングリコール、1.3=プロパンジオール、
1,4−ブタンジオール、1,5ベンタンジオール、1
.6−ヘキサンジオール、1.4−シクロヘキサンジメ
タツールなどのグリコール、ジエチレングリコール、ト
リエチレングリコールなどのポリエチレングリコールや
ポリプロピレングリコール、あるいはトリメチロールプ
ロパン、ペンタエリスリトールなどが用いられる。Further, as monomers of the alcohol component, polyhydric alcohols having two or more hydroxyl groups, such as ethylene glycol, propylene glycol, 1.3=propanediol,
1,4-butanediol, 1,5bentanediol, 1
.. Glycols such as 6-hexanediol and 1,4-cyclohexane dimetatool, polyethylene glycols and polypropylene glycols such as diethylene glycol and triethylene glycol, trimethylolpropane, and pentaerythritol are used.
また該ポリエステルの単量体としては、所望に応じヒド
ロキシカルボン酸成分、例えばp−ヒドロキシ安息香酸
、サリチル酸、2−ヒドロキシ−6−ナフトエ酸、2−
ヒドロキシ−3−ナフトエ酸などの芳香族ヒドロキシカ
ルボン酸、γ−ブチロラクトン、ε−カプロラクトンな
どの脂肪族環状エステルを用いることもできる。Further, the monomer of the polyester may include a hydroxycarboxylic acid component, such as p-hydroxybenzoic acid, salicylic acid, 2-hydroxy-6-naphthoic acid, 2-hydroxycarboxylic acid component, as desired.
Aromatic hydroxycarboxylic acids such as hydroxy-3-naphthoic acid, and aliphatic cyclic esters such as γ-butyrolactone and ε-caprolactone can also be used.
アルカリ金属塩型スルホン酸基及び2個以上のエステル
形成性官能基を有する単量体としては、前記の酸成分単
量体、アルコール成分単量体又はヒドロキシカルボン酸
成分単量体にアルカリ金属塩型スルホン酸基が導入され
たものが用いられるが、入手の容易さや得られるポリエ
ステルの物性などの点から、芳香族ジカルボン酸にアル
カリ金属塩型スルホン酸基が導入されたものが好ましい
。As the monomer having an alkali metal salt type sulfonic acid group and two or more ester-forming functional groups, an alkali metal salt is added to the acid component monomer, alcohol component monomer or hydroxycarboxylic acid component monomer. An aromatic dicarboxylic acid into which an alkali metal salt-type sulfonic acid group has been introduced is preferably used from the viewpoint of ease of availability and physical properties of the resulting polyester.
このようなものとしては、例えば2−ナトリウム又はカ
リウムスルホテレフタル酸、5−ナトリウム又はカリウ
ムスルホイソフタル酸などが挙げられる。Examples of these include 2-sodium or potassium sulfoterephthalate, 5-sodium or potassium sulfoisophthalate, and the like.
このアルカリ金属塩型スルホン酸基を有する単量体は、
使用するポリエステル95〜20モル%、好ましくは8
〜13モル%の割合で含有されるように用いることが望
ましい。含有量が5モル%未満のポリエステルは水溶液
や水溶性にした場合の安定性が劣る。一方、20モル%
を超えると、ボッエステルの溶融粘度が極めて高くなる
ため、重合において十分な凝集力のあるポリエステルが
得られにくい。This monomer having an alkali metal salt type sulfonic acid group is
Polyester used 95-20 mol%, preferably 8
It is desirable to use it so that it is contained in a proportion of ~13 mol%. Polyester containing less than 5 mol% has poor stability when made into an aqueous solution or water-soluble. On the other hand, 20 mol%
If it exceeds 20%, the melt viscosity of the Bossester becomes extremely high, making it difficult to obtain a polyester with sufficient cohesive strength during polymerization.
本発明で使用される水溶性飽和ポリエステルにおいて、
酸成分及び所望により用いられるヒドロキシカルボン酸
として、芳香族ジカルボン酸や芳香族ヒドロキシカルボ
ン酸などの芳香族系成分が10〜85モル%、脂肪族ジ
カルボン酸や脂肪族ヒドロキシカルボン酸などの脂肪族
系成分が90〜15モル%の割合になるように用いるこ
とが好ましい。さらに芳香族ジカルボン酸成分としては
、テレフタル酸とイソフタル酸とで構成され、そのモル
比が8:2ないし5:5の範囲にあるもの、また脂肪族
ジカルボン酸成分や脂肪族ヒドロキシカルボン酸成分と
しては、メチレン基の数が2〜IOのアジピン酸、アゼ
ライン酸、セバシン酸、C−カプロラクトンなどが好ま
しい。In the water-soluble saturated polyester used in the present invention,
As the acid component and optionally used hydroxycarboxylic acid, aromatic components such as aromatic dicarboxylic acids and aromatic hydroxycarboxylic acids are 10 to 85 mol%, and aliphatic components such as aliphatic dicarboxylic acids and aliphatic hydroxycarboxylic acids are used. It is preferable to use the components in a proportion of 90 to 15 mol%. Further, as aromatic dicarboxylic acid components, those composed of terephthalic acid and isophthalic acid with a molar ratio in the range of 8:2 to 5:5, and as aliphatic dicarboxylic acid components and aliphatic hydroxycarboxylic acid components. is preferably adipic acid, azelaic acid, sebacic acid, C-caprolactone, etc., each having 2 to IO methylene groups.
前記芳香族系成分が10モル%未満ではポリエステルの
柔軟性が大きくなりすぎて、得られる印刷版が型くずれ
を起こしやすく、一方85モル%を超えるとポリエステ
ルの柔軟性が小さくナリスぎて、得られる印刷版の柔軟
性が低下する傾向があるので好ましくない。また脂肪族
ジカルボン酸成分や脂肪族ヒドロキシカルボン酸成分と
して、メチレン基の数が10を超えるものを用いると、
得られるポリエステルは水溶性や水溶液にした場合の安
定性を欠くようになるので好ましくない。If the aromatic component is less than 10 mol%, the flexibility of the polyester becomes too large, and the resulting printing plate tends to lose its shape; on the other hand, if it exceeds 85 mol%, the flexibility of the polyester is too small and the resulting printing plate is too thin. This is not preferred because it tends to reduce the flexibility of the printing plate. Furthermore, when an aliphatic dicarboxylic acid component or an aliphatic hydroxycarboxylic acid component having more than 10 methylene groups is used,
The resulting polyester is undesirable because it lacks water solubility and stability when made into an aqueous solution.
一方、アルコール成分としては、エチレングリコール、
1,3−プロパンジオール、1,4−ブタンジオールな
どの炭素原子数が2〜8のエーテル基を有しないグリコ
ールが好ましい。炭素数が9以上のエーテル基を有しな
いグリコールでは、ポリエステルの水溶性や水溶液にし
た場合の安定性を欠き好ましくない。またジエチレング
リコール、トリエチレングリコールなどのポリエチレン
グリコールやポリプロピレングリコールも有利に用いる
ことができるが、この場合分子量が500以下のものが
好ましく、またこれらは生成ポリエステルに対し40重
量%以下、特にジエチレングリコールの場合は35重量
%以下、分子量500のポリエチレングリコールの場合
は20重量%以下のの範囲で用いるのがよい。この使用
量が40重量%を超える場合や分子量が500より大き
いものを用いる場合は、得られる印刷版の型くずれを生
じやすいので好ましくない。On the other hand, alcohol components include ethylene glycol,
Glycols having 2 to 8 carbon atoms and not having an ether group, such as 1,3-propanediol and 1,4-butanediol, are preferred. Glycols having 9 or more carbon atoms and not having an ether group are not preferred because they lack the water solubility of polyester and the stability when made into an aqueous solution. Polyethylene glycols and polypropylene glycols such as diethylene glycol and triethylene glycol can also be advantageously used, but in this case, those with a molecular weight of 500 or less are preferred, and these are 40% by weight or less based on the polyester produced, especially in the case of diethylene glycol. It is preferably used in a range of 35% by weight or less, and in the case of polyethylene glycol with a molecular weight of 500, 20% by weight or less. If the amount used exceeds 40% by weight or if the molecular weight is greater than 500, the resulting printing plate tends to lose its shape, which is not preferred.
本発明で使用される水溶性飽和ポリエステルは、本発明
の目的を損なわない範囲で、前記以外の他の共重合成分
を含んだものであってもよい。このものの製法について
は特に制限はなく、ポリエステルの製造に慣用されてい
る方法の中から任意の方法を用いることができる。例え
ばジカルボン酸のジメチルエステルとグリコールとを触
媒の存在下で加熱してエステル交換反応し、次いで触媒
の存在下、加熱減圧しながらグリコールを留去して縮重
合する方法、あるいはジカルボン酸とグリコールとを加
圧下で加熱してエステル化反応し、次いで触媒の存在下
、加熱減圧しながらグリコールを留去して縮重合する方
法などによって製造することができる。この際着色防止
剤、熱安定剤などを加え、可能な範囲で低温、短時間の
重合条件を選ぶことが好ましい。The water-soluble saturated polyester used in the present invention may contain other copolymer components other than those described above, as long as the purpose of the present invention is not impaired. There are no particular restrictions on the method for producing this product, and any method commonly used for producing polyester can be used. For example, dimethyl ester of a dicarboxylic acid and a glycol are heated in the presence of a catalyst to undergo a transesterification reaction, and then the glycol is distilled off while heating and depressurizing in the presence of a catalyst to perform condensation polymerization. It can be produced by heating under pressure to carry out an esterification reaction, and then in the presence of a catalyst, glycol is distilled off while heating under reduced pressure to perform condensation polymerization. At this time, it is preferable to add a coloring inhibitor, a heat stabilizer, etc., and to select polymerization conditions that are as low temperature and short as possible.
本発明に使用される水溶性飽和エステルは、フェノール
/テトラクロロエタン混合溶媒(重量比に1)中におい
て、温度20℃で測定した固有粘度が0.28〜0,6
5の範囲にあるものが好ましい。The water-soluble saturated ester used in the present invention has an intrinsic viscosity of 0.28 to 0.6 when measured at a temperature of 20°C in a mixed solvent of phenol/tetrachloroethane (weight ratio: 1).
Those in the range of 5 are preferred.
この固有粘度が0.28未満のものはポリエステルの凝
集力が不足し、一方0.65を超えるものは印刷版作成
時の溶出速度が小さくなるので好ましくない。If the intrinsic viscosity is less than 0.28, the cohesive force of the polyester will be insufficient, while if it exceeds 0.65, the elution rate during printing plate preparation will be low, which is not preferred.
本発明の(ロ)成分であるエラストマーとしては常温付
近でゴム弾性を有するものであって伸びが大きく、繰り
返し荷重の下で耐久性が大きく、耐摩耗性、電気絶縁性
が良好なものであるが、前記した(イ)成分と相溶性が
よければどのようなものも使用することができる。この
ようなものとしては、ブタジェンゴム、スチレン・ブタ
ジェン・スチレンブロック共重合体、スチレン・イソプ
レン・スチレンブロック共重合体、エチレン・酢酸ビニ
ル共重合体、ポリウレタン等を好適な例として挙げるこ
とができる。(ロ)成分の好ましい配合割合は(イ)成
分100重量部に対して5〜200重量部、好ましくは
10〜150重量部て゛ある。5重量部未満のときは光
硬化後の水性インキに対する1性が悪くなるばかりでな
く、柔軟性、弾力性を得ることができない。また200
重量部を超えると水性現像液で現像できなくなるので好
ましくない。The elastomer that is the component (b) of the present invention has rubber elasticity at around room temperature, has high elongation, has high durability under repeated loads, and has good abrasion resistance and electrical insulation properties. However, any material can be used as long as it has good compatibility with component (a) described above. Suitable examples of such materials include butadiene rubber, styrene/butadiene/styrene block copolymer, styrene/isoprene/styrene block copolymer, ethylene/vinyl acetate copolymer, polyurethane, and the like. The preferred blending ratio of component (b) is 5 to 200 parts by weight, preferably 10 to 150 parts by weight, per 100 parts by weight of component (a). When the amount is less than 5 parts by weight, not only the compatibility with water-based ink after photocuring becomes poor, but also flexibility and elasticity cannot be obtained. 200 again
If the amount exceeds 1 part by weight, development with an aqueous developer becomes impossible, which is not preferable.
本発明の(ハ)成分である光重合性不飽和化合物として
は、例えばアクリル酸、メタクリル酸、メチルアクリレ
ート、メチルメタクリレート、グリシジルアクリレート
、グリシジルメタクリレート、ベンジルアクリレート、
トリフ゛ロモフェニルアクル−ト、シクロへキシルアク
リレート、2−ヒドロキシエチルアクリレート、2−ヒ
ドロキシプロピルアクリレート、アクリルアミド、メタ
クリルアミド、N−メ千ロールアクリルアミド、Nエチ
ロールアクリルアミド、N−プロピロールアクリルアミ
ド、N−メチロールメタクリルアミド、N−メチロール
メタクリルアミド、N−プロビロールメタクリルアミド
、n−ブ)・キシメチルアクノルアミド、180−ブト
キシメチルアクリルアミド、N−terj−ブチルアク
リルアミド、ナトリウムアクリレート、アンモニウムア
クリレート、アクリロニトリル、スチレン、スチレンス
ルホン酸ナトリウム、ビニルピリジンなどの不飽和二重
結合を1個有する光重合性不飽和化合物あるいはアリル
メタクリレート、エチレングリコールジアクリレート、
エチレングリコールジメタクリレート、1.3−プロパ
ンジオールジアクリレート、1.4−ブタンジオールジ
アクリレート、1.3−プロパンジオールメタクリレー
ト、1.4−ブタンジオールジメタクリレート、1,6
−ヘキサンジオールジアクリレート、1,6−ヘキサン
ジオールジアクリレート、トリメチロールプロパントリ
アクリレート、テトラメチロールメタントリアクリレー
ト、トリアクリロイルオキシエチルホスフェート、メチ
レンビスアクリルアミド、エチレンビスアクリルアミド
、プロピレンビスアクリルアミド、ヘキサメチレンビス
アクリルアミド、メチレンビスメタクリルアミド、エチ
レンビスメタクリルアミド、プロピレンビスメタクリル
アミドなどの不飽和二重結合を2個以上有する光重合性
不飽和化合物が挙げられる。これらの光重合性不飽和化
合物はそれぞれ単独で用いてもよく、2個以上を組み合
わせて用いてもよい。この(ハ)成分の配合割合は、(
イ)成分100重量部に対して5〜200重量部、好ま
しくは10〜150重量部である。Examples of the photopolymerizable unsaturated compound which is component (iii) of the present invention include acrylic acid, methacrylic acid, methyl acrylate, methyl methacrylate, glycidyl acrylate, glycidyl methacrylate, benzyl acrylate,
Triphromophenyl acrylate, cyclohexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, acrylamide, methacrylamide, N-methylol acrylamide, N-ethylol acrylamide, N-propylol acrylamide, N-methylol Methacrylamide, N-methylolmethacrylamide, N-provirolmethacrylamide, n-butoxymethylacrylamide, 180-butoxymethylacrylamide, N-terj-butylacrylamide, sodium acrylate, ammonium acrylate, acrylonitrile, styrene, Photopolymerizable unsaturated compounds having one unsaturated double bond such as sodium styrene sulfonate, vinylpyridine, allyl methacrylate, ethylene glycol diacrylate,
Ethylene glycol dimethacrylate, 1.3-propanediol diacrylate, 1.4-butanediol diacrylate, 1.3-propanediol methacrylate, 1.4-butanediol dimethacrylate, 1,6
-hexanediol diacrylate, 1,6-hexanediol diacrylate, trimethylolpropane triacrylate, tetramethylolmethane triacrylate, triacryloyloxyethyl phosphate, methylenebisacrylamide, ethylenebisacrylamide, propylenebisacrylamide, hexamethylenebisacrylamide, Examples include photopolymerizable unsaturated compounds having two or more unsaturated double bonds, such as methylene bis methacrylamide, ethylene bis methacrylamide, and propylene bis methacrylamide. These photopolymerizable unsaturated compounds may be used alone or in combination of two or more. The blending ratio of this component (c) is (
The amount is 5 to 200 parts by weight, preferably 10 to 150 parts by weight, based on 100 parts by weight of component a).
5重量部未満では紫外線照射部の光架橋密度が低く照射
時間が長くなったり、機械的強度が不足する。また20
0重量部を超えると画像の形状保持性が悪くなったり、
照射後の版が硬く、もろくなるためフレキソ印刷用版材
としては適当でない。If it is less than 5 parts by weight, the photocrosslinking density of the ultraviolet irradiated area will be low, the irradiation time will be long, and the mechanical strength will be insufficient. 20 again
If it exceeds 0 parts by weight, the shape retention of the image will deteriorate,
After irradiation, the plate becomes hard and brittle, making it unsuitable as a flexographic printing plate material.
本発明組成物で使用する(二)成分の光重合開始剤とし
ては、例えばベンゾフェノン類、ベンゾイン類、アセト
フェノン類、ベンジル類、ベンゾインアルキルエーテル
類、ベンジルアルキルケタール類、アントラキノン類、
チオキサントン類などを挙げることができ、これらの具
体的な例としてベンゾフェノン、クロロベンゾフェノン
、ベンゾイン、アセトフェノン、ベンジル、ベンゾイン
メチルエーテル、ベンゾインエチルエーテル、ベンゾイ
ンイソプロピルエーテル、ペンゾインイソブチルエーテ
ル、ベンジルメチルケタール、ベンジルエチルケタール
、ベンジルジイソプロピルケタール、アントラキノン、
2−クロロアントラキノン、チオキサントン、2−クロ
ロチオキサントンなどがある。この(ニ)成分の配合割
合は、(イ)成分、(ロ)成分及び(ハ)成分の合計1
00重量部に対して0.01〜5重量部、好ましくは0
.1〜3重量部である。Examples of the photopolymerization initiator (component (2)) used in the composition of the present invention include benzophenones, benzoins, acetophenones, benzyls, benzoin alkyl ethers, benzyl alkyl ketals, anthraquinones,
Thioxanthones can be mentioned, and specific examples thereof include benzophenone, chlorobenzophenone, benzoin, acetophenone, benzyl, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, penzoin isobutyl ether, benzyl methyl ketal, and benzyl. Ethyl ketal, benzyl diisopropyl ketal, anthraquinone,
Examples include 2-chloroanthraquinone, thioxanthone, and 2-chlorothioxanthone. The blending ratio of this (d) component is 1 in total of component (a), component (b), and component (c).
0.01 to 5 parts by weight, preferably 0.00 parts by weight
.. It is 1 to 3 parts by weight.
本発明組成物には、必要に応じて熱重合防止剤、例えば
ヒドロキノン、メチルヒドロキノン、ヒドロキノンモノ
メチルエーテルなどのヒドロキノン誘導体、2,6−シ
ーtert−ブチル−p−クレゾールなどのフェノール
誘導体、p−ベンゾキノンなどのキノン誘導体、そのほ
かにニトロベンゼンやその誘導体などを添加することが
できる。これらの熱重合防止剤の使用量は2(イ)成分
、(ロ)成分及び(ハ)成分の合計100重量部に対し
て0001〜2重量部、好ましくは0.05〜0.5重
量部の範囲で選ばれる。The composition of the present invention may optionally contain thermal polymerization inhibitors, such as hydroquinone derivatives such as hydroquinone, methylhydroquinone, and hydroquinone monomethyl ether, phenol derivatives such as 2,6-tert-butyl-p-cresol, and p-benzoquinone. In addition, quinone derivatives such as nitrobenzene and its derivatives can be added. The amount of these thermal polymerization inhibitors to be used is 0,001 to 2 parts by weight, preferably 0.05 to 0.5 parts by weight, based on the total of 100 parts by weight of components 2 (a), (b), and (c). selected within the range.
本発明の感光性餅脂組成物には前記のほかに可塑剤とし
ての液状ポリブタジェンゴム、液状ポリアクリロニトリ
ルブタジェンゴム、液状ポリスチレンブタジェンゴム、
液状イソプレンゴムなどの液状ゴムや、ポリビニルクロ
リド、塩素化ポリエチレン、塩素化ポリプロピレンなど
の比較的低分子量のエラストマー、トリメチロールプロ
パンシリカ、珪藻土などの微粉末などを含有させること
ができる。In addition to the above, the photosensitive mochi fat composition of the present invention includes liquid polybutadiene rubber, liquid polyacrylonitrile butadiene rubber, liquid polystyrene butadiene rubber as a plasticizer,
It can contain liquid rubber such as liquid isoprene rubber, relatively low molecular weight elastomers such as polyvinyl chloride, chlorinated polyethylene, and chlorinated polypropylene, and fine powders such as trimethylolpropane silica and diatomaceous earth.
次に本発明組成物の好適な使用方法につき1例を示せば
、まず(イ)成分、(ロ)成分、(ハ)Fl;を分、(
ニ)成分及び必要に応じて添加される添加剤を適当な溶
剤、例えばテトラヒドロフラン、ジオキサン、クロロホ
ルム、メチルエチルケトン、トルエン、シクロヘキサン
などに溶解し、その溶液を基体上に塗布して溶剤を乾燥
除去することによって感光性樹脂被膜を形成することが
できる。Next, to give an example of a preferred method of using the composition of the present invention, first, component (a), component (b), and (c) Fl;
d) Dissolving the components and additives added as necessary in a suitable solvent such as tetrahydrofuran, dioxane, chloroform, methyl ethyl ketone, toluene, cyclohexane, etc., applying the solution onto the substrate, and drying and removing the solvent. A photosensitive resin film can be formed by.
他の方法としては、(イ)成分及び(ロ)成分を加温下
で溶解させてから、これらに(ハ)成分、(ニ)成分を
溶解し、基体上に塗布することもできる。このときの基
体としてはスチール、ステンレス、アルミニウム、銅な
どの金属板、ポリエステルなどのプラスチックシート、
合成ゴムシートなどが用いられ、これらの基体表面には
接着層をあらかじめ設けておいてもよい。As another method, components (a) and (b) may be dissolved under heating, and then components (c) and (d) may be dissolved therein and applied onto the substrate. In this case, the base material is a metal plate made of steel, stainless steel, aluminum, copper, etc., a plastic sheet made of polyester, etc.
Synthetic rubber sheets or the like are used, and an adhesive layer may be provided on the surface of these substrates in advance.
このようにして得られる感光性樹脂被膜の厚さは0.1
〜10mmであることが印刷の版としては好ましい。次
に感光性樹脂被膜の上に所要の原画マスクを密着させ、
300〜450μmの紫外線に発光強度を有する高圧水
銀灯、、超高圧水銀灯、メタルハライドランプ、キセノ
ンランプ、ケミカルランプ、カーボンアーク灯などから
原画マスクを介して感光性樹脂被膜に紫外線を照射し、
照射部分を光重合せしめて現像液に不溶化させ、非照射
部分を現像液で溶解除去して原画マスクに忠実な画像を
形成して印刷用の版材とする。The thickness of the photosensitive resin film obtained in this way is 0.1
-10 mm is preferable as a printing plate. Next, place the required original mask on the photosensitive resin film,
The photosensitive resin coating is irradiated with ultraviolet light from a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, a carbon arc lamp, etc., which has an emission intensity of ultraviolet light of 300 to 450 μm, through an original mask,
The irradiated areas are photopolymerized and insolubilized in a developer, and the non-irradiated areas are dissolved and removed by the developer to form an image faithful to the original mask, thereby producing a printing plate material.
[実施例]
次に実施例を示して本発明をさらに詳しく説明するが、
本発明はこれらの実施例によって何ら限定されるもので
はない。[Example] Next, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited in any way by these Examples.
参考例1 水溶性飽和ポリエステルの製造テレフタル酸
エチレングリコールエステル0.30モル、イソフタル
酸0.25モル、セバシン酸0233モル、5−ナトリ
ウムスルホイソフタル酸エチレングリコールエステル0
.12モルエチレングリコール 0.76モル、三酸化
アンチモン60mg及び酢酸ナトリウム3水和物200
mgを重合試験管にとり、窒素雰囲気下でかきまぜなが
ら160〜220℃に加熱してエステル化反応を行った
。約2時間でほぼ水の留出が終り、さらに1時間反応さ
せた。次いで温度を270℃に上げ、徐々に反応系内を
減圧にして約1時間で圧力13pa以下とし、さらに1
時間縮重合反応を行った。Reference Example 1 Production of water-soluble saturated polyester Terephthalic acid ethylene glycol ester 0.30 mol, isophthalic acid 0.25 mol, sebacic acid 0233 mol, 5-sodium sulfoisophthalic acid ethylene glycol ester 0
.. 12 mol ethylene glycol 0.76 mol, antimony trioxide 60 mg and sodium acetate trihydrate 200 mol
mg was placed in a polymerization test tube and heated to 160 to 220°C while stirring under a nitrogen atmosphere to perform an esterification reaction. Almost all of the water was distilled off in about 2 hours, and the reaction was continued for another 1 hour. Next, the temperature was raised to 270°C, and the pressure inside the reaction system was gradually reduced to 13 pa or less in about 1 hour, and then the pressure was reduced to 13 pa or less for about 1 hour.
A time condensation polymerization reaction was performed.
得られたポリエステルは無色透明で弾力性があり、その
固有粘度は0.50であった。The obtained polyester was colorless and transparent, had elasticity, and had an intrinsic viscosity of 0.50.
実施例1
参考例1で得られた水溶性飽和ポリエステル100重量
部スチレン・イソプレンのブロック共重合体(シェル(
株)製カリフレックスTR1107) 100トリメ
チロールプロパントリアクリレート 20ヘキサンジ
オールジアクリレート 10ベンジルジメチ
ルケタール
(チバガイギ−(株)製 lR651) 2重量部
2.6−シーtert−ブチル−p−クレゾール 0.
05トルエン 200
上記組成から成る混合物をフラスコ中で60℃に加温下
、かきまぜながら均一に溶解させ感光性樹脂組成物を調
製した。このようにして得られた組成物をハレーション
防止層を設けた125μmのポリエチレンテレフタレト
フィルム上に一定の膜厚になるように流延し、50℃で
20時間乾燥させることにより膜厚1 mmの感光層を
得た。この感光層の上にテスト用ネガマスクを真空密着
して2 、4 cmの距離からケミカルランプ((株)
東芝製P L20B L型)により10分間照射し、次
0でブラシ式洗い出し機を用いて45℃の温水で6分間
非照射部を洗い出したのち、60℃で20分間乾燥し、
前記ケミカルランプで5分間全面に紫外線を照射した。Example 1 100 parts by weight of water-soluble saturated polyester obtained in Reference Example 1 Styrene-isoprene block copolymer (shell (
100 Trimethylolpropane triacrylate 20 Hexanediol diacrylate 10 Benzyl dimethyl ketal (lR651, manufactured by Ciba Geigy Co., Ltd.) 2 parts by weight 2.6-sheet tert-butyl-p-cresol 0.
05 Toluene 200
A photosensitive resin composition was prepared by uniformly dissolving the mixture having the above composition in a flask while heating to 60° C. and stirring. The composition thus obtained was cast onto a 125 μm polyethylene terephthalate film provided with an antihalation layer to a constant film thickness, and dried at 50°C for 20 hours to form a 1 mm thick film. A photosensitive layer was obtained. A test negative mask was vacuum-adhered onto this photosensitive layer, and a chemical lamp (Co., Ltd.) was applied from a distance of 2 to 4 cm.
Toshiba's PL L20B L type) was used to irradiate for 10 minutes, and then the non-irradiated area was washed out with warm water at 45°C for 6 minutes using a brush washing machine at 0°C, and then dried at 60°C for 20 minutes.
The entire surface was irradiated with ultraviolet rays for 5 minutes using the chemical lamp.
その結果、テスト用ネガマスクの85!/インチ。As a result, the test negative mask was 85! /inch.
3%の網点ハイライト部が再現された。またレリーフの
硬度はショアA60°であって柔軟で弾力性のあるフレ
キソ印刷用版材が得られた。The 3% halftone highlight area was reproduced. Further, the hardness of the relief was 60° Shore A, and a flexible and elastic flexographic printing plate material was obtained.
この版材を印刷機にかけ、印刷を行ったところ、インキ
の乗りが良好な、再現性の優れた印刷物が得られた。When this plate material was run on a printing machine and printed, printed matter with good ink coverage and excellent reproducibility was obtained.
実施例2
参考例1で得られた水溶性飽和ポリエステル100重量
部スチレン・ブタジェンのブロック共重合体(シェル(
株)製 カリフレックスTR1102) 120トリ
メチロールプロパントリアクリレート 30液状ゴム
(出光石油化学(株)製 Po1y bd R45HT
) 50ベンジルジメチルケタール
(チバガイギー(株)製 lR651)
22.6−シーtert−ブチル−p−クレゾール
1を加熱ニーダ−を用いて180℃で混練し、
脱泡して感光性樹脂組成物が得られた。これをヒートプ
レス機で150℃、100 Kg/ cm2の圧力で接
着剤を塗布しである125μm厚のポリエチレンテレフ
タートフィルムと2μm厚のポリビニルアルコール被膜
が設けられたポリエチレンテレフタレートフィルムとの
間に接着剤、ポリビニルアルコールが感光性樹脂組成物
側となるようにして、前記感光性樹脂組成物を1分間加
熱、加圧して厚さ2゜97mmの感光層積層シートを作
成した。次に接着剤を塗布したポリエチレンテレフタレ
ートフィルム側からケミカルランプにて4分間全面照射
し、次にポリビニルアルコールの被膜が設けられたポリ
エチレンテレフタレートフィルムをポリビニルアルコー
ルを感光層に残して剥離後、感光層上にテスト用ネガマ
スクを減圧密着してケミカルランプで15分間照射した
。ネガマスクを除いた後、30℃の水で15分間ブラシ
による現像を行い、60℃で30分間乾燥した。その結
果、しj−フ深度が1 、8 mmの画像パターンが得
られた。Example 2 100 parts by weight of water-soluble saturated polyester obtained in Reference Example 1 Styrene-butadiene block copolymer (shell (
Kaliflex TR1102) 120 trimethylolpropane triacrylate 30 Liquid rubber (Poly bd R45HT manufactured by Idemitsu Petrochemical Co., Ltd.)
) 50 benzyl dimethyl ketal (lR651 manufactured by Ciba Geigy)
22.6-tert-butyl-p-cresol
1 was kneaded at 180°C using a heating kneader,
After defoaming, a photosensitive resin composition was obtained. This was then coated with adhesive using a heat press machine at 150°C and a pressure of 100 Kg/cm2 to create an adhesive between the 125 μm thick polyethylene terephthalate film and the 2 μm thick polyethylene terephthalate film provided with the polyvinyl alcohol coating. The photosensitive resin composition was heated and pressed for 1 minute so that the polyvinyl alcohol was on the photosensitive resin composition side to prepare a photosensitive layer laminate sheet having a thickness of 2° and 97 mm. Next, the entire surface of the polyethylene terephthalate film coated with the adhesive was irradiated with a chemical lamp for 4 minutes, and then the polyethylene terephthalate film coated with polyvinyl alcohol was peeled off, leaving the polyvinyl alcohol on the photosensitive layer. A test negative mask was placed in close contact with the mask under reduced pressure and irradiated with a chemical lamp for 15 minutes. After removing the negative mask, development was carried out using a brush in water at 30°C for 15 minutes, and the film was dried at 60°C for 30 minutes. As a result, an image pattern with a depth of 1.8 mm was obtained.
この画像パターンはネガマスクを忠実に再現していた。This image pattern faithfully reproduced the negative mask.
硬度はショアA50°であった。これをフレキソ印刷機
にかけたところ、インキ受理性もよく、良好な印刷物が
得られた。The hardness was Shore A 50°. When this was applied to a flexo printing machine, it had good ink receptivity and good printed matter was obtained.
参考例2〜5
参考例1と同様の方法で水溶性ポリエステルを合成した
。その組成を表1に示す。Reference Examples 2 to 5 Water-soluble polyesters were synthesized in the same manner as in Reference Example 1. Its composition is shown in Table 1.
表 1
実施例3〜5
参考例2〜5の水溶性飽和ポリエステルを使用して実施
例1と同様にフレキン印刷用版材を作成し、その性能に
ついて調べた。Table 1 Examples 3 to 5 Flexible printing plates were prepared in the same manner as in Example 1 using the water-soluble saturated polyesters of Reference Examples 2 to 5, and their performance was investigated.
その結果を表2に示す。The results are shown in Table 2.
表 2
[発明の効果]
本発明の感光性樹脂組成物は、常温で固体状であり、ま
た加温することにより液状となる性質があるので、必要
により溶媒を使用しなくとも均一な感光性樹脂被膜を形
成することもできる。また水溶液で現像できるし、各種
インキに対しても耐性を有している。さらにまた柔軟性
、弾力性に優れ、かつ画像は極めて鮮明であるため高級
な印刷版とすることができる。Table 2 [Effects of the Invention] The photosensitive resin composition of the present invention is solid at room temperature, and has the property of becoming liquid when heated, so it can achieve uniform photosensitivity without using a solvent if necessary. A resin coating can also be formed. It can also be developed with an aqueous solution and is resistant to various inks. Furthermore, it has excellent flexibility and elasticity, and the image is extremely clear, so it can be used as a high-quality printing plate.
Claims (1)
溶性飽和ポリエステル、(ロ)エラストマー、(ハ)光
重合性不飽和化合物及び(ニ)光重合開始剤から成る感
光性樹脂組成物。(1) A photosensitive resin composition comprising (a) a water-soluble saturated polyester having an alkali metal salt type sulfonic acid group, (b) an elastomer, (c) a photopolymerizable unsaturated compound, and (d) a photopolymerization initiator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2242733A JP2681537B2 (en) | 1990-09-14 | 1990-09-14 | Photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2242733A JP2681537B2 (en) | 1990-09-14 | 1990-09-14 | Photosensitive resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04122941A true JPH04122941A (en) | 1992-04-23 |
| JP2681537B2 JP2681537B2 (en) | 1997-11-26 |
Family
ID=17093443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2242733A Expired - Lifetime JP2681537B2 (en) | 1990-09-14 | 1990-09-14 | Photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2681537B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1288720A1 (en) | 2001-08-29 | 2003-03-05 | Fuji Photo Film Co., Ltd. | Plate-making method of printing plate |
| WO2021210488A1 (en) * | 2020-04-15 | 2021-10-21 | 東洋紡株式会社 | Copolyester resin, molded article, heat-shrinkable film, and fiber |
| WO2023063218A1 (en) * | 2021-10-12 | 2023-04-20 | 東洋紡株式会社 | Copolyester resin, molded article, heat-shrinkable film, and fiber |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106501A (en) * | 1975-03-15 | 1976-09-21 | Tokyo Ohka Kogyo Co Ltd | FUREKISOBANYOKANKOSEIJUSHISOSEIBUTSU |
| JPS5960435A (en) * | 1982-08-31 | 1984-04-06 | ダブリユ.アール.グレイス アンド カンパニー ― コネチカット | Homogeneous elastomeric photosensitive composition |
| JPS62260142A (en) * | 1986-05-06 | 1987-11-12 | Fuotopori Ouka Kk | Photosensitive resin composition |
| JPS6370242A (en) * | 1986-09-11 | 1988-03-30 | Nippon Zeon Co Ltd | Photosensitive elastomer composition |
-
1990
- 1990-09-14 JP JP2242733A patent/JP2681537B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106501A (en) * | 1975-03-15 | 1976-09-21 | Tokyo Ohka Kogyo Co Ltd | FUREKISOBANYOKANKOSEIJUSHISOSEIBUTSU |
| JPS5960435A (en) * | 1982-08-31 | 1984-04-06 | ダブリユ.アール.グレイス アンド カンパニー ― コネチカット | Homogeneous elastomeric photosensitive composition |
| JPS62260142A (en) * | 1986-05-06 | 1987-11-12 | Fuotopori Ouka Kk | Photosensitive resin composition |
| JPS6370242A (en) * | 1986-09-11 | 1988-03-30 | Nippon Zeon Co Ltd | Photosensitive elastomer composition |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1288720A1 (en) | 2001-08-29 | 2003-03-05 | Fuji Photo Film Co., Ltd. | Plate-making method of printing plate |
| US6875557B2 (en) | 2001-08-29 | 2005-04-05 | Fuji Photo Film Co., Ltd. | Plate-making method of printing plate |
| WO2021210488A1 (en) * | 2020-04-15 | 2021-10-21 | 東洋紡株式会社 | Copolyester resin, molded article, heat-shrinkable film, and fiber |
| JPWO2021210488A1 (en) * | 2020-04-15 | 2021-10-21 | ||
| US12344741B2 (en) | 2020-04-15 | 2025-07-01 | Toyobo Co., Ltd. | Copolymerized polyester resin, molded product, heat-shrinkable film, and fiber |
| WO2023063218A1 (en) * | 2021-10-12 | 2023-04-20 | 東洋紡株式会社 | Copolyester resin, molded article, heat-shrinkable film, and fiber |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2681537B2 (en) | 1997-11-26 |
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