JPH0412616B2 - - Google Patents

Info

Publication number
JPH0412616B2
JPH0412616B2 JP59022610A JP2261084A JPH0412616B2 JP H0412616 B2 JPH0412616 B2 JP H0412616B2 JP 59022610 A JP59022610 A JP 59022610A JP 2261084 A JP2261084 A JP 2261084A JP H0412616 B2 JPH0412616 B2 JP H0412616B2
Authority
JP
Japan
Prior art keywords
acid
group
concentrated
inorganic
epitaxial wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59022610A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60167333A (ja
Inventor
Hideo Iimura
Yuriko Hachimonji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP59022610A priority Critical patent/JPS60167333A/ja
Publication of JPS60167333A publication Critical patent/JPS60167333A/ja
Publication of JPH0412616B2 publication Critical patent/JPH0412616B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)
JP59022610A 1984-02-09 1984-02-09 無機化合物エピタキシヤルウエハ表面のしみ除去方法 Granted JPS60167333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59022610A JPS60167333A (ja) 1984-02-09 1984-02-09 無機化合物エピタキシヤルウエハ表面のしみ除去方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59022610A JPS60167333A (ja) 1984-02-09 1984-02-09 無機化合物エピタキシヤルウエハ表面のしみ除去方法

Publications (2)

Publication Number Publication Date
JPS60167333A JPS60167333A (ja) 1985-08-30
JPH0412616B2 true JPH0412616B2 (de) 1992-03-05

Family

ID=12087605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59022610A Granted JPS60167333A (ja) 1984-02-09 1984-02-09 無機化合物エピタキシヤルウエハ表面のしみ除去方法

Country Status (1)

Country Link
JP (1) JPS60167333A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103014875B (zh) * 2012-11-30 2015-10-21 甘肃虹光电子有限责任公司 一种人造蓝宝石薄片的处理方法

Also Published As

Publication number Publication date
JPS60167333A (ja) 1985-08-30

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term