JPH0412629U - - Google Patents
Info
- Publication number
- JPH0412629U JPH0412629U JP5345390U JP5345390U JPH0412629U JP H0412629 U JPH0412629 U JP H0412629U JP 5345390 U JP5345390 U JP 5345390U JP 5345390 U JP5345390 U JP 5345390U JP H0412629 U JPH0412629 U JP H0412629U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- light shielding
- shielding plate
- exposing
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000008188 pellet Substances 0.000 description 1
Description
第１図ａ，ｂは本考案の一実施例の平面図及び
断面図、第２図は従来例の外観図、第３図は本考
案の実施例により露光されたウエーハの上面図、
第４図は従来例により露光されたウエーハの上面
図である。
１……ウエーハホルダ、２……遮光板、３……
ウエーハ、３Ａ……露光領域、３Ｂ……末露光領
域、４……遮蔽領域、５……有効ペレツト領域、
６……遮光板固定軸、１０……ウエーハステージ
。
1A and 1B are a plan view and a sectional view of an embodiment of the present invention, FIG. 2 is an external view of a conventional example, and FIG. 3 is a top view of a wafer exposed according to an embodiment of the present invention.
FIG. 4 is a top view of a wafer exposed according to the conventional example. 1... Wafer holder, 2... Light shielding plate, 3...
Wafer, 3A... exposure area, 3B... final exposure area, 4... shielding area, 5... effective pellet area,
6... light shielding plate fixed shaft, 10... wafer stage.
Claims (1)
ーハ表面に露光を行なう露光装置において、前記
ウエーハの外周部を覆う遮光板を設けたことを特
徴とする露光装置。 1. An exposure apparatus for holding a wafer in a wafer holder and exposing the surface of the wafer, characterized in that a light shielding plate is provided to cover the outer periphery of the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5345390U JPH0412629U (en) | 1990-05-22 | 1990-05-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5345390U JPH0412629U (en) | 1990-05-22 | 1990-05-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0412629U true JPH0412629U (en) | 1992-01-31 |
Family
ID=31574650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5345390U Pending JPH0412629U (en) | 1990-05-22 | 1990-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0412629U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59134409U (en) * | 1983-03-01 | 1984-09-08 | 鈴木 弘子 | eyelet perforation device |
| JP2008258634A (en) * | 2007-04-05 | 2008-10-23 | Asml Netherlands Bv | Lithographic apparatus and method for masking a substrate |
-
1990
- 1990-05-22 JP JP5345390U patent/JPH0412629U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59134409U (en) * | 1983-03-01 | 1984-09-08 | 鈴木 弘子 | eyelet perforation device |
| JP2008258634A (en) * | 2007-04-05 | 2008-10-23 | Asml Netherlands Bv | Lithographic apparatus and method for masking a substrate |
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