JPH04145585A - Mask pattern editing method - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention]

[[E Required] Concerning the mask pattern editing method used in the pattern design of semiconductor integrated circuits, the purpose is to combine multiple figures to generate various figures, and the shift direction and shift amount for enlargement shift or reduction shift. The shift process is based on a shift process in which the specified figure is shifted in the set shift direction by the set shift amount, and the specified figure is shifted by the set shift amount. By enlarging and shifting in the setting direction by the shift processing, performing a graphic logical operation between the shifted figures to generate a new figure, and shrinking and shifting the new figure in the setting direction by the shift process. , is configured to generate a figure that connects figures only in the shift direction.

[Industrial application field]

The present invention relates to a mask pattern editing method used for pattern design of semiconductor integrated circuits.

[Conventional technology]

In pattern design, there is an editing process in which a figure is made thicker or thinner and then a new figure is generated by performing logical operations between the figures. For example, when generating one figure 16 as shown in Figure 4B, which fills the gap between these figures, from three figures 10, 12 and 14 as shown in Figure 4A, the following editing process is performed. conduct. That is, the figure 10 is enlarged and shifted and converted into a figure 10A indicated by a dashed-dotted line, the figure 12 is enlarged and shifted and converted into a figure 12A indicated by a dashed-dotted line, and the figure 1
4 is enlarged and shifted and converted into a figure 14A indicated by a dotted line to fill the gap between these figures. In the figure, the shaded area indicates an enlarged area. Next, a graphic OR operation is performed on the figures 10A, 128, and 14A to generate one figure containing three figures, and then this figure is reduced to form a figure 16 as shown in FIG. 4B. generate. In the figure, 16a indicates the area between the figures 10, 12 and 14 filled in by such editing processing.

[Problem to be solved by the invention]

However, in the conventional shift process, it was only possible to simultaneously enlarge or reduce the same ratio in both the X and Y directions in the x-Y orthogonal coordinate system, so when the figures 10 to 14 are at the same interval, is the figure 10 shown in FIG. 4A.
．． 12 and 14, between figures IO and 14 and figure 1
It was not possible to generate a concave figure 18 as shown in FIG. 4C in which only the space between numbers 2 and 14 was filled. SUMMARY OF THE INVENTION In view of these problems, an object of the present invention is to provide a mask pattern editing method that can generate various shapes by combining a plurality of shapes.

[Means to solve the problem]

A mask pattern editing method according to the present invention will be explained with reference to FIG. 1 of the embodiment drawings. This mask pattern editing method includes: (50) setting the shift direction and shift amount for enlarging or reducing shifting; (52) specifying the figure to be shifted;
) The method is based on a method of shifting the specified figure by the set soft amount in the set shift direction. (50-60) A plurality of figures that are close to each other are enlarged and shifted in a set direction by the above-mentioned shift processing, (66-68) A new figure is generated by performing a graphic logic operation between the shifted figures; (50-60) A new figure is reduced and shifted in the set direction by the shift process, thereby generating a figure in which figures connected only in the shift direction are connected.

[Effect]

According to the present invention, shift processing can be performed only in one set direction, so by combining this shift processing and graphic logical operations, it is possible to separate certain shapes that are close to each other while separating other shapes. It becomes possible to connect. Therefore, by combining a plurality of figures, it is possible to generate figures that could not be created conventionally.

【Example】

Hereinafter, the present invention will be described in detail based on the drawings. The hardware of the pattern design CAD consists of a computer and standard input/output devices, and the explanation thereof will be omitted. FIG. 1 shows the software configuration of graphic editing, which is a combination of shift processing and graphic logical operations, of the pattern design CAD software. In the following, from three figures 10, 12 and 14 with the same mutual spacing as shown in Fig. 2A, the space between figures 10 and 14 and between figures 12 and 14 is filled in as shown in Fig. 2C. This software configuration will be explained by taking as an example a case where a graphic 22 is generated. (50) Set the shift direction and shift amount. In this example, the shift direction is the Y direction shown in FIG. 2A,
For example, let the shift amount be 80%. (52) Specify the figure to be shifted. For example, figure 10 is specified first. (54) Branch according to the shift direction set in step 50, (56-60) For the figure specified in step 52, shift amount set in step 50 in the set X direction, Y direction or Shift processing is performed in both the X and Y directions. This shift processing is performed without moving the center of gravity of the figure. Graphic 10 is converted into graphic 10B by this shift process. In FIG. 2A, the shaded area indicates an enlarged area. (62, 64) At first, the process returns to step 50 without performing any graphic logic operations, and performs the same X-direction shift process on the graphic 12 to convert the graphic 12 into a graphic 12B. In the same manner as described above, the graphic 14 is also subjected to the X direction shift process to convert the graphic 14 into a graphic 14B. (66) Next, specify the graphic to perform the graphical logic operation and the type of operation. In this example, shapes 10B, 112B and 14
Specify B and specify the graphical OR operation. (68) A graphical logical operation is performed, and a concave graphic 20 as shown in FIG. 2B is generated. Next, return to step 50 through step 64,
Similarly to the above, reduction and shift processing in the Y direction is performed to generate a figure 22 as shown in FIG. 2C. Through such processing, the figure 10.12 shown in FIG. 2A is created.
and 14, the second C, which could not be generated conventionally.
A figure 22 as shown in the figure can be obtained. Next, the case of shifting in the X direction will be described with reference to FIGS. 3A and 3B. As shown in FIG. 3A, when there are figures 24, 26, and 28 separated from each other,
In order to generate a figure in which figures 26 and 28 are connected, while 26 and 26 and figures 24 and 28 remain separated, the following editing process is performed. That is, the figures 26 and 28 are enlarged and shifted in the X direction and converted into figures 26A and 28A, respectively. next,
Performing a graphic OR operation on figures 26A and 28A,
Make it into one shape. Next, this figure is subjected to reduction and shift processing in the X direction to generate a figure 30 as shown in FIG. 3B. Note that the present invention includes various other modifications. For example, in the above embodiment, a case has been described in which the shift process is performed only in one direction of the X direction or the Y direction, but the present invention may also be configured to perform the shift process at different magnifications in both the X direction and the Y direction. . Further, the shift direction is not limited to the X direction or the Y direction, and may be shifted in any direction.

【Effect of the invention】

As explained above, in the mask pattern editing method according to the present invention, shift processing can be performed only in one set direction, so by combining this shift processing and graphic logical operation, it is possible to perform shift processing between certain figures that are close to each other. It is possible to connect other figures while keeping them separated, and it is possible to combine a plurality of figures to create a figure that could not be created in the past.

[Brief explanation of drawings]

1 to 3B relate to an embodiment of the mask pattern editing method according to the present invention; FIG. 1 is a flowchart showing the software configuration of graphic editing that combines shift processing and graphic logic operations; FIGS. 2A to 2C The figure shows the case where a new figure is generated by shifting the figure in the Y direction, Figure 3A and Figure 3.
BYllJ is a diagram showing a case where a new graphic is generated by shifting the graphic in the X direction. FIGS. 4A to 4C are diagrams showing a conventional example in which a new figure is generated by performing a shift process. In the figure, 10 to 30 are figures 1o to 22 and figures

Claims (1)

[Claims] 1) Set the shift direction and shift amount for the enlargement shift or reduction shift (50), specify the figure to be shifted (52), and perform the set shift for the specified figure. A mask pattern editing method characterized by shifting in the shift direction by the set shift amount (54 to 60). 2) A plurality of figures that are close to each other are enlarged and shifted in a set direction by the process of claim 1 (50 to 60), and a graphic logical operation is performed between the shifted figures to generate a new figure (66, 68), by reducing and shifting the new figure in the setting direction by the process of claim 1 (50 to 6
0), a mask pattern editing method characterized by generating a figure that connects figures only in the shift direction.