JPH0415231U - - Google Patents
Info
- Publication number
- JPH0415231U JPH0415231U JP5531790U JP5531790U JPH0415231U JP H0415231 U JPH0415231 U JP H0415231U JP 5531790 U JP5531790 U JP 5531790U JP 5531790 U JP5531790 U JP 5531790U JP H0415231 U JPH0415231 U JP H0415231U
- Authority
- JP
- Japan
- Prior art keywords
- magnetron
- microwaves
- semiconductor manufacturing
- temperature
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の実施例の要部説明図、第２図
は本考案の適用される半導体製造装置の全体図、
第３図は実験系統図、第４図は従来の半導体製造
装置の作動開始時のマグネトロン表面温度とマイ
クロ波パワーのグラフ、第５図は本考案によるマ
グネトロン表面温度とマイクロ波のパワーのグラ
フである。
１……搬送ロボツト、２……真空ポンプ、３…
…ベルジヤー、４……ガスボツクス、５……マグ
ネトロン、６……方向性結合器、７……スタブチ
ユーナ、８……導波管、９……マスフローコント
ローラ、１０……ウエハ、１１……温度センサ、
１２……温度計、１３……パワーメータ、２１…
…ヒータ、２２……センサ、２３……温度調節器
。
FIG. 1 is an explanatory diagram of the main parts of an embodiment of the present invention, and FIG. 2 is an overall diagram of a semiconductor manufacturing apparatus to which the present invention is applied.
Figure 3 is an experimental system diagram, Figure 4 is a graph of the magnetron surface temperature and microwave power at the start of operation of the conventional semiconductor manufacturing equipment, and Figure 5 is a graph of the magnetron surface temperature and microwave power according to the present invention. be. 1... Transfer robot, 2... Vacuum pump, 3...
... bell gear, 4 ... gas box, 5 ... magnetron, 6 ... directional coupler, 7 ... stub tube, 8 ... waveguide, 9 ... mass flow controller, 10 ... wafer, 11 ... temperature sensor,
12...Thermometer, 13...Power meter, 21...
...heater, 22...sensor, 23...temperature regulator.
Claims (1)
製造装置において、マグネトロンの表面を加熱す
るヒータと、マグネトロンの表面温度を一定に保
つ温度調節装置とを備えたことを特徴とするマイ
クロ波を用いた半導体製造装置。 Semiconductor manufacturing equipment using microwaves that excites plasma using microwaves, characterized in that it is equipped with a heater that heats the surface of a magnetron, and a temperature control device that keeps the surface temperature of the magnetron constant. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5531790U JPH0415231U (en) | 1990-05-29 | 1990-05-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5531790U JPH0415231U (en) | 1990-05-29 | 1990-05-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0415231U true JPH0415231U (en) | 1992-02-06 |
Family
ID=31578162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5531790U Pending JPH0415231U (en) | 1990-05-29 | 1990-05-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0415231U (en) |
-
1990
- 1990-05-29 JP JP5531790U patent/JPH0415231U/ja active Pending
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