JPH04154192A - Plating of printed wiring board - Google Patents

Plating of printed wiring board

Info

Publication number
JPH04154192A
JPH04154192A JP28027190A JP28027190A JPH04154192A JP H04154192 A JPH04154192 A JP H04154192A JP 28027190 A JP28027190 A JP 28027190A JP 28027190 A JP28027190 A JP 28027190A JP H04154192 A JPH04154192 A JP H04154192A
Authority
JP
Japan
Prior art keywords
printed wiring
hole
wiring board
plating
electroless copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28027190A
Other languages
Japanese (ja)
Inventor
Takeshi Saito
武 齊藤
Yoko Negishi
洋子 根岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP28027190A priority Critical patent/JPH04154192A/en
Publication of JPH04154192A publication Critical patent/JPH04154192A/en
Pending legal-status Critical Current

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

PURPOSE:To form an equalized plating layer within a through hole by installing a printed wiring board so that its exposed through hole may be located at an angle of 45 deg. and below to the liquid level of an electroless copper plating solution and vibrating said board. CONSTITUTION:A printed wiring board 2 is installed in such a manner that a through hole exposed side 2A, which calls for plating, may keep an angle thetaof 45 deg. and below to a liquid level 4A of an electroless copper plating solution 4. Then, an attempt is made to vibrate the board 2 by giving impact whose gravitational acceleration may range from 0.1 to 0.5G by means of a vibrator device, such as a hammer 7 of a hammering device. When air is supplied into a solution 4 from an air supply pipeline 8 so that the amount of dissolved oxygen in the solution 4 may range from 3 to 6ppm, the oxygen gas is mixed with the air bubbles comprising the reaction gas generated in the hole 1, which makes it possible to circulate through the hole with ease. As a result, the air bubbles easily flow out from the hole 1, which makes it possible to form an equalized electroless copper plating layer under such a state where no plating layer is lacking.

Description

【発明の詳細な説明】 〔概 要〕 プリント配線板の無電解銅メッキ方法に関し、無電解銅
メッキ時にスルーホール内に発生する反応ガスが容易に
スルーホール内より外部に抜は出て、均一にスルーホー
ル内に導体層がメッキされる方法の提供を目的とし、 スルーホールを穴開けしたプリント配線板をメッキ液中
に浸漬し、該スルーホール内に導体層をメッキする場合
に於いて、 前記メッキすべきプリント配線板を、該スルーホールが
露出したプリント配線板の面が、前記メッキ液面に対し
て45度以下の角度に成るように傾斜して浸漬し、該プ
リント配線板の設置治具を、重力加速度が0.1〜0.
5Gの範囲のハンマで衝撃して前記プリント配線板を振
動させ、かつ前記メッキ液中の溶存酸素量が3〜6 p
pmと成るように該メッキ液中に酸素ガスを供給しなが
ら、前記プリント配線板をメッキすることで構成する。
[Detailed Description of the Invention] [Summary] Regarding the electroless copper plating method for printed wiring boards, the reaction gas generated in the through-hole during electroless copper plating is easily extracted from the inside of the through-hole to the outside, and the process is uniform. The purpose of the present invention is to provide a method for plating a conductor layer inside a through hole, in which a printed wiring board with a through hole drilled therein is immersed in a plating solution, and a conductor layer is plated inside the through hole. The printed wiring board to be plated is immersed at an angle such that the surface of the printed wiring board where the through holes are exposed is at an angle of 45 degrees or less with respect to the plating liquid level, and the printed wiring board is installed. The jig has a gravitational acceleration of 0.1 to 0.
The printed wiring board is vibrated by impact with a hammer in the range of 5G, and the amount of dissolved oxygen in the plating solution is 3 to 6 p.
The printed wiring board is plated while supplying oxygen gas to the plating solution so that the plating temperature becomes pm.

?産業上の利用分野〕 本発明はプリント配線板の無電解銅メッキ方法に関する
? INDUSTRIAL APPLICATION FIELD The present invention relates to a method for electroless copper plating of printed wiring boards.

多層プリント配線板を製造する場合、所定のパターンの
銅箔を、基材の両面に形成した中間層基材の両面に、半
硬化性のエポキシ樹脂よりなるプリプレグを設置し、こ
のプリプレグの上下に銅箔を設置した後、これら中間層
基材、プリプレグおよび銅箔を加圧積層した後、上記中
間層基材、プリプレグおよび銅箔を貫通するスルーホー
ルを設け、このスルーホール内を無電解銅メッキ、およ
び電解銅メッキして該スルーホール内に導体層を形成す
る工程が採られている。
When manufacturing multilayer printed wiring boards, prepregs made of semi-curing epoxy resin are installed on both sides of an intermediate layer base material with copper foil in a predetermined pattern formed on both sides of the base material. After installing the copper foil, the intermediate layer base material, prepreg, and copper foil are laminated under pressure, and then a through hole is provided that penetrates the intermediate layer base material, prepreg, and copper foil, and the inside of this through hole is filled with electroless copper. The process of forming a conductor layer in the through hole by plating and electrolytic copper plating is adopted.

近来、このようなプリント配線板は高速コンピュータに
用いるために、益々高密度に形成することが要求され、
そのため内層導体を多数積層し、かつスルーホール径の
小さい高アスペクト比のプリント配線板が要求され、そ
のため、微細なスルーホール内に均一に無電解銅メッキ
法で導体層を形成する技術が要求されている。
In recent years, such printed wiring boards have been required to be formed with higher density in order to be used in high-speed computers.
Therefore, a high aspect ratio printed wiring board with a large number of laminated inner layer conductors and small through-hole diameters is required.Therefore, a technology is required to uniformly form a conductor layer within the minute through-holes by electroless copper plating. ing.

〔従来の技術〕[Conventional technology]

従来、このようなスルーホール内に無電解銅メッキ層を
均一な厚さで形成する方法として第4図に示すように、
前記メッキすべきスルーホール1を穴開けしたプリント
配線板2を設置治具3に設置して無電解銅メッキ液4に
浸漬し、この配線板を揺動したり、或いはプリント配線
板自体を反転させる方法を採って、メッキ工程中にスル
ーホール内に発生した水素ガスがスルーホール内より外
部に抜は出るようにし、前記スルーホール内に無電解銅
メッキ層が均一に析出されるようにしていた。
Conventionally, as shown in Fig. 4, a method of forming an electroless copper plating layer with a uniform thickness in such a through hole is used.
The printed wiring board 2 with the through-holes 1 to be plated drilled therein is placed on the installation jig 3, immersed in the electroless copper plating solution 4, and the wiring board is rocked or the printed wiring board itself is turned over. A method is adopted to allow the hydrogen gas generated in the through hole during the plating process to escape from the inside of the through hole to the outside, so that the electroless copper plating layer is uniformly deposited within the through hole. Ta.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところでアスペクト比(スルーホールの直径/プリント
配線板の板厚)が15以上も存る高アスペクト比のプリ
ント配線板では、第5図(a)に示すようにスルーホー
ル1内で発生し、主として水素ガスより成る反応ガスが
気泡5と成って容易にプリント配線板2から外部に抜は
出ることができず、スルーホール内に滞留する。そのた
め、第5図(b)に示すようにこの気泡が滞留したスル
ーホール1の箇所には無電解銅メッキ層6が形成されず
、その部分で前記メッキ層がその気泡の部分で欠落する
問題がある。
By the way, in a printed wiring board with a high aspect ratio (through hole diameter/printed wiring board thickness) of 15 or more, as shown in Fig. 5(a), it occurs within the through hole 1, and mainly The reaction gas consisting of hydrogen gas forms bubbles 5 and cannot be easily extracted from the printed wiring board 2 to the outside, but remains in the through hole. Therefore, as shown in FIG. 5(b), the electroless copper plating layer 6 is not formed at the part of the through hole 1 where the air bubbles have accumulated, causing the problem that the plating layer is missing at the part of the air bubble. There is.

本発明は上記した問題点を解決し、上記したスルーホー
ル内に発生した反応ガスによる気泡が容易にスルーホー
ル内より外部に抜は出るようにして、スルーホール内に
均一なメッキ層が形成されるようにしたプリント配線板
のメッキ方法の提供を目的とする。
The present invention solves the above-mentioned problems, and allows bubbles caused by the reaction gas generated in the through-hole to be easily drawn out from inside the through-hole, thereby forming a uniform plating layer inside the through-hole. The purpose of the present invention is to provide a method for plating printed wiring boards.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成する本発明のプリント配線板のメッキ方
法は、メッキすべきプリント配線板を、該スルーホール
が露出したプリント配線板の面が、前記メッキ液面に対
して45度以下の角度に成るように傾斜して浸漬し、該
プリント配線板の設置治具を、重力加速度が0.1〜0
.5Gの範囲のハンマで衝撃して前記プリント配線板を
振動させ、かつ前記メッキ液中の溶存酸素量が3〜6 
plllllと成るように該メッキ液中に酸素ガスを供
給しながら、前記プリント配線板をメ・ツキすることを
特徴とする。
The method for plating a printed wiring board of the present invention that achieves the above object is characterized in that the printed wiring board to be plated is placed so that the surface of the printed wiring board where the through hole is exposed is at an angle of 45 degrees or less with respect to the level of the plating solution. The installation jig for the printed wiring board is immersed at an angle so that the gravitational acceleration is 0.1 to 0.
.. The printed wiring board is vibrated by impact with a hammer in the range of 5G, and the amount of dissolved oxygen in the plating solution is 3 to 6.
The method is characterized in that the printed wiring board is plated while supplying oxygen gas to the plating solution so that the printed wiring board becomes pllllll.

〔作 用] 第1図に示すようにプリント配線板2を無電解銅メッキ
液4中に浸漬する場合、メッキすべきスルーホール1が
露出したプリント配線板の面2Aが、無電解銅メッキ液
4の液面4Aに対して水平に成る、つまりメッキすべき
スルーホール1が液面4Aに対して垂直になる(プリン
ト配線板の設置治具3の設置角度θ−90度)より、本
発明のようにθが45度以下の角度で傾けると、スルー
ホール内の気泡が重力の影響を受けずにスルーホール内
より外部に抜は出ることが容易となる。
[Function] When the printed wiring board 2 is immersed in the electroless copper plating solution 4 as shown in FIG. 4, that is, the through hole 1 to be plated is perpendicular to the liquid level 4A (installation angle θ - 90 degrees of the printed wiring board installation jig 3). When the through hole is tilted at an angle of 45 degrees or less, the air bubbles in the through hole can easily escape from the inside of the through hole to the outside without being affected by gravity.

また上記プリント配線板2のスルーホールlが露出して
いる面2Aを無電解銅メッキ液の液面4Aに対して45
度以上傾けると、つまりθが45度以上になると気泡5
が上部に抜は出ることが出来難くなり、上記気泡がスル
ーホール内に滞留するように成り、無電解銅メッキ層の
欠落が生しる。
In addition, the surface 2A of the printed wiring board 2 where the through holes 1 are exposed is 45 mm with respect to the liquid level 4A of the electroless copper plating solution.
If the tilt is more than 45 degrees, that is, if θ is 45 degrees or more, bubbles 5
It becomes difficult for the bubbles to come out to the top, and the bubbles become trapped in the through-holes, causing the electroless copper plating layer to be missing.

またこのプリント配線板2の設置治具3に0.1G以下
の重力加速度でハンマ7で打撃して衝撃を与えて、この
プリント配線板に振動を与えても、その振動力は弱いの
で反応ガスの気泡はスルーホール1より抜は出す、また
0、5G以上の重力加速度でハンマ7で打撃して振動を
与えると、反応ガスの気泡同士がくっついてスルーホー
ル内より外部に抜は出るのが困難になる。
Furthermore, even if the installation jig 3 of this printed wiring board 2 is hit with a hammer 7 with a gravitational acceleration of 0.1 G or less to give a shock and give vibration to this printed wiring board, the vibration force is weak, so the reactive gas The bubbles will be drawn out from the through hole 1. Also, when the hammer 7 is applied with a gravitational acceleration of 0.5G or more and vibration is applied, the bubbles of the reaction gas will stick together and be drawn out from inside the through hole. It becomes difficult.

そのため、上記設置治具に0.1〜0.5Gの範囲の重
力加速度で衝撃することで、最もスルーホール内の気泡
が抜は易くなり、メッキ層の欠落が少なくなる。
Therefore, by impacting the installation jig with a gravitational acceleration in the range of 0.1 to 0.5 G, air bubbles in the through hole can be removed most easily and the plating layer is less likely to be missing.

また無電解銅メッキ液4中の溶存酸素量が3〜Eipp
mとなるように、該無電解銅メッキ液4に配管8より空
気をポンプ等で送って酸素ガスを無電解銅メッキ液中に
供給すると、スルーホール内の反応ガスの気泡と混合し
て気泡が移動し易くなり、前記メッキ液がスルーホール
内で循環性良く移動するようになる。また溶存酸素量の
含有量を6ppm以上とすると無電解銅メッキ液中の添
加剤が分解してメッキ速度が低下する問題があるので上
記3〜6 ppmの範囲とする。
In addition, the amount of dissolved oxygen in the electroless copper plating solution 4 is 3 to Eipp.
When oxygen gas is supplied into the electroless copper plating solution by pumping air through the pipe 8 to the electroless copper plating solution 4 so that the oxygen gas is mixed with the bubbles of the reaction gas in the through hole, bubbles are generated. becomes easier to move, and the plating solution moves with good circulation within the through-hole. Further, if the dissolved oxygen content is 6 ppm or more, there is a problem that additives in the electroless copper plating solution will decompose and the plating rate will decrease, so it is set in the above range of 3 to 6 ppm.

〔実 施 例〕〔Example〕

以下、図面を用いて本発明の実施例につき詳細に説明す
る。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は本発明の詳細な説明図である。FIG. 1 is a detailed explanatory diagram of the present invention.

図示するように、本発明の方法に於いて、プリント配線
板2は、メッキすべきスルーホール1が露出した面2A
が、無電解銅メッキ液4の液面4^に対して45度以下
の角度θを保つように設置する。
As shown in the figure, in the method of the present invention, a surface 2A of the printed wiring board 2 where the through holes 1 to be plated are exposed.
is installed so as to maintain an angle θ of 45 degrees or less with respect to the liquid level 4^ of the electroless copper plating solution 4.

そしてこのプリント配線板2をハンマリング装置のハン
マ7のような振動装置で重力加速度が0.1〜0.5G
となるように衝撃を与えて振動させる。
Then, this printed wiring board 2 is moved to a vibration device such as a hammer 7 of a hammering device, so that the gravitational acceleration is 0.1 to 0.5G.
Apply a shock and vibrate so that

また空気供給用の配管8より無電解銅メッキ液4中の溶
存酸素量が3〜6 ppmに成るように空気を無電解銅
メッキ液中に供給すると、この酸素ガスとスルーホール
内に発生した反応ガスの水素ガスより成る気泡と混合し
て無電解銅メッキ液がスルーホール内を通じて循環し易
くなり、気泡が容易にスルーホール内より外部に抜は出
るのでスルーホール内にメッキ層の欠落が無い状態でス
ルーホール内に均一な無電解銅メッキ層が形成される。
In addition, when air is supplied to the electroless copper plating solution from the air supply piping 8 so that the amount of dissolved oxygen in the electroless copper plating solution 4 becomes 3 to 6 ppm, this oxygen gas and the gas generated in the through hole are generated. The electroless copper plating solution mixes with bubbles made of hydrogen gas as a reaction gas, and the electroless copper plating solution easily circulates through the through-hole, allowing the bubbles to easily escape from the inside of the through-hole to the outside, resulting in no missing plating layer inside the through-hole. A uniform electroless copper plating layer is formed within the through hole.

第2図は本発明の方法に於いて、ハンマ衝撃の加速度G
とメッキ層の欠落したスルーホール発生率との関係図で
、本発明の方法に用いたプリント配線板の寸法は615
 ma+X520 mm、板厚は7.2 mm、スルー
ホールの直径は0.35mm、スルーホールの数は8〜
9万個71枚で、また該プリント配線板の傾斜角θは4
5度とした。
Figure 2 shows the acceleration G of the hammer impact in the method of the present invention.
This diagram shows the relationship between the rate of occurrence of through holes with missing plating layers, and the dimensions of the printed wiring board used in the method of the present invention are 615.
ma+X520 mm, plate thickness 7.2 mm, through hole diameter 0.35 mm, number of through holes 8~
There are 90,000 pieces and 71 pieces, and the inclination angle θ of the printed wiring board is 4.
It was set to 5 degrees.

また上記メッキ層の欠落したスルーホールの発生率は第
(1)式に示すようにして算出した。
Furthermore, the incidence of missing through holes in the plated layer was calculated as shown in equation (1).

発生率(ppm) −(メッキ層の欠落したスルーホール数/検査したスル
ーホール数)×100万・・・・・・・・・(1)第2
図に示すように、ハンマの重力加速度を0.1〜0.5
Gの範囲の時にメッキ層の欠落したスルーホールの発生
率が急激に低下することを示している。
Occurrence rate (ppm) - (Number of through holes with missing plating layer/Number of through holes inspected) x 1 million (1) Second
As shown in the figure, the gravitational acceleration of the hammer is 0.1 to 0.5.
It is shown that in the range of G, the rate of occurrence of through holes with missing plating layers decreases rapidly.

また第3図は本発明の方法に於いて、メッキ液中の溶存
酸素量(ppm)とメッキ層の欠落したスルーホールの
発生率との関係図で、上記したようにプリント配線板を
θ−45度の傾斜角度で設置し、ハンマの重力加速度を
0.3Gとした時の値である。
FIG. 3 is a diagram showing the relationship between the amount of dissolved oxygen (ppm) in the plating solution and the rate of occurrence of through holes with missing plating layers in the method of the present invention. This is the value when the hammer is installed at an inclination angle of 45 degrees and the gravitational acceleration of the hammer is 0.3G.

図示するように溶存酸素量が無電解銅メッキ液に対して
3〜6ppmの時にメッキ層の欠落したスルーホールの
発生率が大幅に低下してlppm以下となった。
As shown in the figure, when the amount of dissolved oxygen was 3 to 6 ppm relative to the electroless copper plating solution, the rate of occurrence of through holes in which the plating layer was missing was significantly reduced to 1 ppm or less.

以上述べたように本発明の方法を用いてプリント配線板
のスルーホールに無電解銅メッキを施した結果、従来、
アスペクト比が21の高アスペクト比のプリント配線板
の場合、メッキ層の欠落したスルーホールの発生率が2
0ppa+ (メッキ層の欠落したスルーホール数/検
査スルーホール数)で有ったのが、1/20のippm
と成って大幅に減少した。
As described above, as a result of applying electroless copper plating to through holes of printed wiring boards using the method of the present invention, conventionally,
In the case of a printed wiring board with a high aspect ratio of 21, the incidence of through holes with missing plating layers is 2.
The one with 0 ppa+ (number of through holes with missing plating layer/number of inspected through holes) was 1/20 of the ippm.
This resulted in a significant decrease.

なお、本発明の方法は無電解銅メッキ方法に限らず、無
電解ニンケルメッキ、無電解金メッキ方法にも適用でき
る。
Note that the method of the present invention is not limited to electroless copper plating, but can also be applied to electroless nickel plating and electroless gold plating.

また電解銅メッキ、或いは電解ニッケルメッキ等の電解
金属メッキにも適用して同様な効果がある。
Further, similar effects can be obtained when applied to electrolytic metal plating such as electrolytic copper plating or electrolytic nickel plating.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように本発明によれば、高アス
ペクト比のプリント配線板に於いても、無電解銅メッキ
工程中に発生する反応ガスによる気泡が充分除去でき、
無電解銅メッキ液が確実にスルーホール内に浸透できる
ため、スルーホール内に於けるメ・ツキ層の欠落の現象
が殆ど無くなり、高品質、高信顧度のプリント配線板が
得られる効果を生じる。
As is clear from the above description, according to the present invention, even in high aspect ratio printed wiring boards, bubbles caused by reactive gases generated during the electroless copper plating process can be sufficiently removed.
Since the electroless copper plating solution can reliably penetrate into the through-holes, the phenomenon of missing metal layers in the through-holes is almost eliminated, resulting in high-quality, highly reliable printed wiring boards. arise.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の詳細な説明図、 第2図はハンマ衝撃の加速度とメッキ層欠落スルーホー
ルの発生率との関係図、 第3図は無電解銅メッキ液の溶存酸素量とメッキ層欠落
スルーホールの発生率との関係図、第4図は従来の方法
を示す説明図、 第5図(a)および第5図(ト))は従来の方法に於け
る不都合な状態の説明図である。 図に於いて、 1はスルーホール、2はプリント配線板、面、3は設置
治具、4は無電解銅メッキ液、液面、5は気泡、6は無
電解銅メッキ層、7ンマ、8は配管を示す。 2Aは 4Aは はハ 簿介1猷先i<pe完D
Figure 1 is a detailed explanatory diagram of the present invention. Figure 2 is a diagram showing the relationship between the acceleration of hammer impact and the rate of occurrence of plated layer missing through holes. Figure 3 is a graph showing the amount of dissolved oxygen in the electroless copper plating solution and the plated layer. Relationship diagram with the incidence of missing through holes, Figure 4 is an explanatory diagram showing the conventional method, and Figures 5 (a) and 5 (g)) are explanatory diagrams of inconvenient conditions in the conventional method. It is. In the figure, 1 is a through hole, 2 is a printed wiring board, surface, 3 is an installation jig, 4 is an electroless copper plating solution, liquid level, 5 is a bubble, 6 is an electroless copper plating layer, 7 is a copper plating layer, 8 indicates piping. 2A is 4A is ha book suke 1 猷 saki < pe complete D

Claims (3)

【特許請求の範囲】[Claims] (1)スルーホール(1)を穴開けしたプリント配線板
(2)をメッキ液(4)中に浸漬し、該スルーホール(
1)内に導体層をメッキする場合に於いて、前記メッキ
すべきプリント配線板(2)を、該スルーホール(1)
が露出したプリント配線板の面(2A)が、前記メッキ
液の液面(4A)面に対して45度以下の角度に成るよ
うに傾斜して浸漬することを特徴とするプリント配線板
のメッキ方法。
(1) Immerse the printed wiring board (2) with the through holes (1) in the plating solution (4).
1) When plating a conductive layer inside the printed wiring board (2) to be plated, the through hole (1)
Plating of a printed wiring board, characterized in that the printed wiring board is immersed at an angle of 45 degrees or less with respect to the liquid level (4A) of the plating solution so that the exposed surface (2A) of the printed wiring board Method.
(2)前記プリント配線板(2)を設置する設置治具(
3)を、重力加速度が0.1〜0.5Gの範囲の衝撃手
段(7)で衝撃して前記プリント配線板(2)を振動さ
せながらメッキすることを特徴とする請求項(1)記載
のプリント配線板のメッキ方法。
(2) Installation jig (
3) is plated while vibrating the printed wiring board (2) by impacting it with an impact means (7) having a gravitational acceleration of 0.1 to 0.5 G. plating method for printed wiring boards.
(3)前記メッキ液中の溶存酸素量が3〜6ppmと成
るように該メッキ液中に酸素ガスを供給しながら、前記
プリント配線板をメッキすることを特徴とする請求項(
1)、或いは(2)に記載のプリント配線板のメッキ方
法。
(3) The printed wiring board is plated while supplying oxygen gas to the plating solution so that the amount of dissolved oxygen in the plating solution is 3 to 6 ppm.
The method for plating a printed wiring board according to 1) or (2).
JP28027190A 1990-10-17 1990-10-17 Plating of printed wiring board Pending JPH04154192A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28027190A JPH04154192A (en) 1990-10-17 1990-10-17 Plating of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28027190A JPH04154192A (en) 1990-10-17 1990-10-17 Plating of printed wiring board

Publications (1)

Publication Number Publication Date
JPH04154192A true JPH04154192A (en) 1992-05-27

Family

ID=17622667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28027190A Pending JPH04154192A (en) 1990-10-17 1990-10-17 Plating of printed wiring board

Country Status (1)

Country Link
JP (1) JPH04154192A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001073199A (en) * 1999-09-02 2001-03-21 Ibiden Co Ltd Plating device and plating method therefor
US6626196B2 (en) 2001-06-15 2003-09-30 International Busines Machines Corporation Arrangement and method for degassing small-high aspect ratio drilled holes prior to wet chemical processing
JP2013045957A (en) * 2011-08-25 2013-03-04 Kyocera Corp Wiring board and electronic device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158337A (en) * 1978-06-05 1979-12-14 Fujitsu Ltd Plating method for print substrate
JPS563690A (en) * 1979-06-20 1981-01-14 Ibiden Co Ltd High speed through-hole plating method
JPH0242475B2 (en) * 1984-11-20 1990-09-21

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158337A (en) * 1978-06-05 1979-12-14 Fujitsu Ltd Plating method for print substrate
JPS563690A (en) * 1979-06-20 1981-01-14 Ibiden Co Ltd High speed through-hole plating method
JPH0242475B2 (en) * 1984-11-20 1990-09-21

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001073199A (en) * 1999-09-02 2001-03-21 Ibiden Co Ltd Plating device and plating method therefor
US6626196B2 (en) 2001-06-15 2003-09-30 International Busines Machines Corporation Arrangement and method for degassing small-high aspect ratio drilled holes prior to wet chemical processing
JP2013045957A (en) * 2011-08-25 2013-03-04 Kyocera Corp Wiring board and electronic device

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