JPH04180215A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH04180215A
JPH04180215A JP2307153A JP30715390A JPH04180215A JP H04180215 A JPH04180215 A JP H04180215A JP 2307153 A JP2307153 A JP 2307153A JP 30715390 A JP30715390 A JP 30715390A JP H04180215 A JPH04180215 A JP H04180215A
Authority
JP
Japan
Prior art keywords
chamber
gas
pressure
atmosphere
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2307153A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574214B2 (de
Inventor
Masaharu Kusumoto
楠本　正治
Koji Matsuo
松尾　耕次
Koichi Hara
光一 原
Itsuki Tokawa
東川　厳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soltec Co Ltd
Original Assignee
Soltec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soltec Co Ltd filed Critical Soltec Co Ltd
Priority to JP2307153A priority Critical patent/JPH04180215A/ja
Publication of JPH04180215A publication Critical patent/JPH04180215A/ja
Publication of JPH0574214B2 publication Critical patent/JPH0574214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2307153A 1990-11-15 1990-11-15 露光装置 Granted JPH04180215A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2307153A JPH04180215A (ja) 1990-11-15 1990-11-15 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2307153A JPH04180215A (ja) 1990-11-15 1990-11-15 露光装置

Publications (2)

Publication Number Publication Date
JPH04180215A true JPH04180215A (ja) 1992-06-26
JPH0574214B2 JPH0574214B2 (de) 1993-10-18

Family

ID=17965671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2307153A Granted JPH04180215A (ja) 1990-11-15 1990-11-15 露光装置

Country Status (1)

Country Link
JP (1) JPH04180215A (de)

Also Published As

Publication number Publication date
JPH0574214B2 (de) 1993-10-18

Similar Documents

Publication Publication Date Title
US6721032B2 (en) Exposure apparatus and control method therefor, and device manufacturing method
CN100533273C (zh) 光刻装置和器件制造方法
US5552888A (en) Apparatus for measuring position of an X-Y stage
JPS60262421A (ja) 投影露光方法およびその装置
US6714277B2 (en) Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method
US6833903B2 (en) Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method
KR100585474B1 (ko) 리소그래피장치, 디바이스 제조방법 및 그 디바이스
US20030094059A1 (en) Slide apparatus and its stage mechanism for use in vacuum
JP2015536476A (ja) パターニングデバイス支持体、リソグラフィ装置及びパターニングデバイスの温度制御方法
US5448612A (en) X-ray exposure apparatus
US9373926B2 (en) Laser chamber and discharge excitation gas laser apparatus
US7391498B2 (en) Technique of suppressing influence of contamination of exposure atmosphere
US5172403A (en) X-ray exposure apparatus
US20140198307A1 (en) Interferometer system, lithography apparatus, and article manufacturing method
US11320751B2 (en) Apparatus incorporating a gas lock
US6994507B2 (en) Transport apparatus
KR100524265B1 (ko) 진공챔버용 격리 마운트와 리소그래피 투영장치에의 그 적용
JPH04180215A (ja) 露光装置
US8248578B2 (en) Projection exposure method and projection exposure system therefor
JP2012009711A (ja) 露光装置及びデバイスの制御方法
KR102762549B1 (ko) 리소그래피 장치
JPH02156625A (ja) 直動案内装置
JP2641692B2 (ja) Ｌｓｉ素子製造方法、及び装置
JP2856626B2 (ja) 縮小投影露光装置
EP1500983A2 (de) Isolierende Stützvorrichtungen zur Verwendung mit Vakuumkammern und deren Anwendung in lithographischen Projektionsapparaten

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees