JPH04180984A - Adhesive composition for chemical plating, adhesive film for chemical plating, and method for producing printed wiring board - Google Patents

Adhesive composition for chemical plating, adhesive film for chemical plating, and method for producing printed wiring board

Info

Publication number
JPH04180984A
JPH04180984A JP31004090A JP31004090A JPH04180984A JP H04180984 A JPH04180984 A JP H04180984A JP 31004090 A JP31004090 A JP 31004090A JP 31004090 A JP31004090 A JP 31004090A JP H04180984 A JPH04180984 A JP H04180984A
Authority
JP
Japan
Prior art keywords
chemical plating
film
adhesive
adhesive composition
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31004090A
Other languages
Japanese (ja)
Other versions
JP2602992B2 (en
Inventor
Hiroshi Yamazaki
宏 山崎
Eiji Fujita
藤田 瑛二
Mineo Kawamoto
川本 峰雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2310040A priority Critical patent/JP2602992B2/en
Publication of JPH04180984A publication Critical patent/JPH04180984A/en
Application granted granted Critical
Publication of JP2602992B2 publication Critical patent/JP2602992B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesive Tapes (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、化学めっき相接着剤組成物、化学めっき用接
着剤フィルムおよび印刷配線板の製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a chemical plating phase adhesive composition, a chemical plating adhesive film, and a method for producing a printed wiring board.

(従来の技術) 従来より絶縁基板の表面に無電解めっきによって回路を
形成するプリント配線板の製造方法において、予め絶縁
基板の表面に、無電解めっき用の下地接着剤を形成する
方法が知られている。この接着剤としては1%公昭45
−9843号公報。
(Prior Art) Conventionally, in the manufacturing method of printed wiring boards in which circuits are formed on the surface of an insulating substrate by electroless plating, a method is known in which a base adhesive for electroless plating is formed on the surface of the insulating substrate in advance. ing. This adhesive is 1% Kosho 45
-9843 publication.

特開昭58−57776号公報9%開昭59−6268
3号公報、I¥j開昭開開−248291号公報等に記
載されているように、主成分がエポキシ樹脂9舎成ゴム
およびフェノール樹脂からなっているものが知られてい
る。また1%公昭58−30760号公報1%公昭60
−5079号公報。
Japanese Patent Publication No. 58-57776 9% Publication No. 59-6268
As described in Publications No. 3, IJJ Kaisho Kaikai-248291, etc., there are known materials whose main components are epoxy resin, synthetic rubber, and phenol resin. Also, 1% Publication No. 58-30760, 1% Publication No. 1983
-5079 publication.

特開昭63−213676号公報1%開昭63−213
677号公報等には1合成ゴムとフェノール樹脂を主成
分とする接着剤が記載されている。
Japanese Unexamined Patent Publication No. 63-213676 1% Publication No. 63-213
No. 677, etc., describes an adhesive whose main components are synthetic rubber and phenolic resin.

これらにおいては、エポキシ樹脂の硬化剤にイミダゾー
ル類、アミン類、酸無水物、ノボランクフェノール樹脂
等公知の熱硬化触媒を使用し9合成ゴムの加硫にレゾー
ル形フェノール、イオウ化合物等を、加硫助剤に酸化亜
鉛、酸化マグネシウム等が用いられている。一方、これ
ら接着剤には、クロム硫酸混液での粗化効率の向上や、
めっき膜とのビール強度、半田耐熱性の向上を目的に、
炭酸カルシウム、ケイ酸カルシウム、酸化ケイ素、ジル
コニウムシリケート、酸化チタン等の無機フィラーを用
いている。
In these methods, known thermosetting catalysts such as imidazoles, amines, acid anhydrides, and novolanc phenol resins are used as curing agents for epoxy resins, and resol type phenols, sulfur compounds, etc. are used for vulcanization of synthetic rubber. Zinc oxide, magnesium oxide, etc. are used as sulfur aids. On the other hand, these adhesives have improved roughening efficiency with a chromium sulfuric acid mixture,
In order to improve beer strength and solder heat resistance with plating film,
Inorganic fillers such as calcium carbonate, calcium silicate, silicon oxide, zirconium silicate, and titanium oxide are used.

上記した接着剤成分は、溶剤に溶解してデイツプ法、ロ
ールコート法、カーテンコート法等で絶縁基板に塗布・
乾燥するか、まfcは、あらかじめ支持体フィルム上に
塗布・乾燥して得られfc接着剤フィルムを接着剤面を
絶縁基板側にしてラミネートし、その後、加熱硬化する
方法がとられている。上記に示される接着剤の硬化条件
は、前述の特開昭62−248291号公報にも記載の
ように、150〜200℃の温度で30〜120分とさ
れている。しかし、150℃・30分の条件では、熱硬
化成分が十分に反応せず、このため硬化した接着剤の絶
縁抵抗が低く、また無電解めっき時にめっきの析出応力
の作用で接着剤皮膜がふくれを発生しfc6.めっき膜
とのビール強&f半田耐熱性が低下したすする問題がめ
る。このため。
The above-mentioned adhesive components are dissolved in a solvent and applied to an insulating substrate by a dip method, roll coating method, curtain coating method, etc.
Alternatively, fc can be obtained by coating and drying the fc adhesive film on a support film in advance, then laminating the fc adhesive film with the adhesive side facing the insulating substrate, and then heating and curing it. The curing conditions for the adhesive shown above are set at a temperature of 150 to 200° C. for 30 to 120 minutes, as described in the above-mentioned Japanese Unexamined Patent Publication No. 62-248291. However, under the conditions of 150°C for 30 minutes, the thermosetting component does not react sufficiently, and as a result, the insulation resistance of the cured adhesive is low, and the adhesive film swells due to the precipitation stress of the plating during electroless plating. Generates fc6. There is a problem of sipping due to decreased beer strength & f solder heat resistance with the plating film. For this reason.

−船釣には前述の特開昭62−248291号公報の実
施例にも記載のように、160℃以上、60分以上の硬
化条件が行われている。
- For boat fishing, as described in the examples of JP-A No. 62-248291, curing conditions are applied at 160° C. or higher and for 60 minutes or longer.

ところで近年、プリント配線板の板厚は1年々薄型化し
、用いる絶縁基材は紙フエノール板で0.8〜1.0−
厚、ガラスエポキシ板では0.5〜1.0ト厚が使用さ
れるようになってきている。
By the way, in recent years, the thickness of printed wiring boards has become thinner year by year, and the insulating base material used is paper phenol board with a thickness of 0.8 to 1.0 -
For glass epoxy plates, a thickness of 0.5 to 1.0 t has come to be used.

このように薄い絶縁基板上に上記した接着剤を形成して
、160℃以上で60分以上の硬化を行うと、絶縁基板
に反力、ねじれが発生し、無電解めっきを行う前のメツ
キレジスト形成工程で、レジストインクの印刷や、ドラ
イフィルムを用いたメンキレジストの形成に不具合を生
じるようKなシ、事実上、微細回路が形成できない問題
が起こる。
If the above-mentioned adhesive is formed on a thin insulating substrate and cured for 60 minutes or more at 160°C or higher, reaction force and twisting will occur on the insulating substrate, and the plating resist before electroless plating will be damaged. In the formation process, problems arise in printing the resist ink and forming the Menki resist using a dry film, and in fact, it becomes impossible to form fine circuits.

(発明が解決しようとする問題点) 本発明は、前述した従来技術の問題、即ち、薄型化絶縁
基材を用いたときの反応、ねじれ及び紙フエノール板の
熱劣化を解決するために、低温。
(Problems to be Solved by the Invention) The present invention solves the problems of the prior art described above, namely, the reaction, twisting, and thermal deterioration of paper phenol plates when using a thinned insulating base material. .

短時間の条件で硬化する化学めっき用接着剤組成物、こ
れを用いた化学めっき用接着剤フィルムおよび印刷配線
板の製造法を提供するものである。
The present invention provides an adhesive composition for chemical plating that hardens in a short period of time, and a method for producing an adhesive film for chemical plating and a printed wiring board using the same.

(問題点を解決するための手段) 本発明は、エポキシ樹脂9舎成ゴム,フエノール樹脂、
化学めっきの触媒となる貴金属化合物および光感知性芳
香族オニウム塩を含有してなる化学めっき用接着剤組成
物1.この接着剤組成物の層を透明な支持体フィルム上
に形成した化学めっき用接着剤フィルムならびにこの接
着剤組成物ま友は接着剤フィルムを用いた印刷配線板の
製造法に関する。
(Means for Solving the Problems) The present invention comprises nine epoxy resin rubbers, phenolic resins,
Adhesive composition for chemical plating containing a noble metal compound and a photosensitive aromatic onium salt as a catalyst for chemical plating 1. The present invention relates to an adhesive film for chemical plating in which a layer of this adhesive composition is formed on a transparent support film, and to a method for manufacturing a printed wiring board using the adhesive film.

本発明は、積層板として厚さα61Im以下の薄型積層
板に適用することが好ましい。
The present invention is preferably applied to a thin laminate having a thickness of α61 Im or less.

本発明の化学めっき用接着剤組成物及び化学めっき用接
着剤フィルムについて以下に詳細に説明する。
The adhesive composition for chemical plating and the adhesive film for chemical plating of the present invention will be explained in detail below.

本発明に用いる光感知性芳香族オニウム塩としては1%
公昭52−14277号公報記載の第■a族元素の芳香
族オニウム塩、特公昭52−14278号公報記載の第
■a族元素の芳香族オニウム塩1%公昭52−1427
9号公報記載の第VJI族元素の芳香族オニウム塩等を
使用できる。
1% as the photosensitive aromatic onium salt used in the present invention
Aromatic onium salt of group ■a element described in Japanese Patent Publication No. 52-14277, 1% aromatic onium salt of group ■a element described in Japanese Patent Publication No. 52-14278
Aromatic onium salts of Group VJI elements described in Publication No. 9 can be used.

具体的には、テトラフルオロホウ酸トリフェニルフェナ
シルホスニウム、ヘキサフルオロアンチモン酸トリフェ
ニルスルホニウム、テトラフルオロホウ酸ホウ酸ジフェ
ニルヨードニウム等が使用できる。これら光感知性芳香
族オニウム塩の配合量としては、エポキシ樹脂の硬化の
点から組成物中の固形分として0.2〜5重量%が好ま
しい。
Specifically, triphenylphenacylphosnium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, etc. can be used. The amount of these photosensitive aromatic onium salts is preferably 0.2 to 5% by weight as a solid content in the composition from the viewpoint of curing the epoxy resin.

この光感知性芳香族オニウム塩は、紫外線を照射すると
(365nm)−1=ン?で0.5〜3.. OJ/3
”程度)分解し、エポキシ樹脂の硬化種であるルイス醗
を放出し、その後または同時の加熱によりエポキシ樹脂
を硬化するものでるる。この作用によシ100〜150
℃での低温硬化が可能となる。
When this photosensitive aromatic onium salt is irradiated with ultraviolet light (365 nm) -1=N? 0.5 to 3. .. OJ/3
It decomposes (degree) and releases Lewis alcohol, which is a curing species of epoxy resin, and then or simultaneously cures the epoxy resin.
Low temperature curing at ℃ is possible.

本発明に用いるエポキシ樹脂としては、ビスフェノール
型、ノボランク型、タレゾールノボラック型脂環式等の
エポキシ樹脂が使用できる。エポキシ当量が450〜2
,100g/eqのビスフェノールA型エポキシ樹脂が
耐熱性、絶ll1k4!性の点でより好ましく、配合量
としては、接着剤皮膜の絶縁抵抗とビール強度の点から
組成物中の固形分として15〜40重量%が好ましい。
As the epoxy resin used in the present invention, bisphenol type, novolank type, talesol novolak type alicyclic epoxy resins, etc. can be used. Epoxy equivalent is 450-2
, 100g/eq of bisphenol A type epoxy resin has excellent heat resistance! It is more preferable from the viewpoint of properties, and the blending amount is preferably 15 to 40% by weight as a solid content in the composition from the viewpoints of insulation resistance of the adhesive film and beer strength.

本発明に用いる合成ゴムとしては、アクリロニトリルブ
タジェンゴム、イソプレン含有アクリロニトリルブタジ
ェンゴム、カルボキシル含有アクリロニトリルブタジェ
ンゴム、スチレンブタジェンゴム等がある。配合量とし
ては、めっき皮膜のビール強度と得られる印刷配線板の
絶縁抵抗の点から組成物の固形分として4−0〜60重
量%が好ましい。硬化した接着剤皮膜の絶縁抵抗が1 
gl!Ω以下と低くなる傾向がめる。
Examples of the synthetic rubber used in the present invention include acrylonitrile butadiene rubber, isoprene-containing acrylonitrile butadiene rubber, carboxyl-containing acrylonitrile butadiene rubber, and styrene butadiene rubber. The amount to be blended is preferably 4-0 to 60% by weight based on the solid content of the composition from the viewpoint of beer strength of the plating film and insulation resistance of the resulting printed wiring board. The insulation resistance of the cured adhesive film is 1
gl! There is a tendency for the value to be lower than Ω.

本発明に用いるフェノール樹脂としては、レゾール型フ
ェノール樹脂、純フェノール樹脂、アルキル変性フェノ
ール樹脂、カシュー変性フェノール樹脂等がめる。フェ
ノール樹脂の配合量としては9合成ゴムとの反応性およ
びめっき皮膜のビール強度の点から組成物の固形分とし
て20〜40重量%が好ましい。
Examples of the phenol resin used in the present invention include resol type phenol resin, pure phenol resin, alkyl-modified phenol resin, and cashew-modified phenol resin. The amount of the phenol resin to be blended is preferably 20 to 40% by weight based on the solid content of the composition from the viewpoints of reactivity with the 9 synthetic rubber and beer strength of the plating film.

本発明で用いる化学めっきの触媒となる貴金属化合物と
しては、塩化パラジウム等のパラジウム化合物、塩化ロ
ジウム等のロジウム化合物などがあり、無機充填材に吸
着させた微粒子状のものや樹脂溶液に分散させた溶液状
のものとして使用できる。商品としては例えば9日立化
成工業株式会社製、PEC−8がめる。配合量としては
、めっき膜の析出性と得られる印刷配線板の絶縁抵抗の
点から組成物の固形分中0.01〜2重量%が好ましい
。エポキシ樹脂9会成ゴム,フエノール樹脂。
The noble metal compounds used as catalysts for chemical plating used in the present invention include palladium compounds such as palladium chloride, rhodium compounds such as rhodium chloride, etc., and they can be used in the form of fine particles adsorbed on an inorganic filler or dispersed in a resin solution. Can be used as a solution. An example of a commercial product is PEC-8, manufactured by Hitachi Chemical Co., Ltd. The amount to be blended is preferably 0.01 to 2% by weight based on the solid content of the composition from the viewpoint of the precipitation properties of the plating film and the insulation resistance of the printed wiring board obtained. Epoxy resin 9 composition rubber, phenolic resin.

化学めっきの触媒となる貴金属化合物および光感知性芳
香族オニウム塩は必要に応じて2種以上を用いることも
できる。
Two or more kinds of noble metal compounds and photosensitive aromatic onium salts that serve as catalysts for chemical plating can be used as necessary.

本発明ではさらに、公知の合成ゴムの加硫助剤の酸化亜
酸、酸化マグネシウム、酸化コバルト等が使用でき、a
i!工時の流出防止剤として表面積の大きい酸化けい素
、化学粗化時の粗化を容易にする効果のめる炭酸カルシ
ウム、けい酸カルシウム。
In the present invention, furthermore, known synthetic rubber vulcanization aids such as nitrite oxide, magnesium oxide, cobalt oxide, etc. can be used.
i! Silicon oxide, which has a large surface area, is used as a runoff prevention agent during construction, and calcium carbonate and calcium silicate are used to facilitate roughening during chemical roughening.

ジルコニウムシリケート等の微粉末フィラーを用いるこ
ともできる。その他添加剤1着色剤、熱硬化用触媒等を
用いることもできる。
Fine powder fillers such as zirconium silicate can also be used. Other additives 1. Colorants, thermosetting catalysts, etc. can also be used.

本発明の接着剤組成物の製法としては、公知の二本ロー
ル、ニーダ等の装置を用いて常法で行うことができる。
The adhesive composition of the present invention can be produced by a conventional method using a known device such as two rolls or a kneader.

無機材料は、これらの装置を用いて合成ゴム等と分散し
、有機材料は、ケトン類。
Inorganic materials are dispersed with synthetic rubber etc. using these devices, and organic materials are dispersed with ketones.

セロソルブ類等の溶剤に溶解することによシ2本発明の
接着剤組成物の溶液を得ることができる。
A solution of the adhesive composition of the present invention can be obtained by dissolving it in a solvent such as cellosolve.

接着剤組成物の溶液を積層板上に塗工する方法としては
、ロール印刷法、カーテンコート法、ティップ法、スク
リーン印刷法等、公知の方法が用いられる。この際、塗
布厚は接着剤溶液濃度と塗布方法で調整することができ
るが、乾燥後の接着剤組成物層の皮膜の厚さは、めっき
皮膜のビール強度とエポキシ樹脂の硬化の点から20〜
70μm厚が好ましい。
As a method for applying the solution of the adhesive composition onto the laminate, known methods such as a roll printing method, a curtain coating method, a tip method, and a screen printing method are used. At this time, the coating thickness can be adjusted by adjusting the concentration of the adhesive solution and the coating method, but the thickness of the adhesive composition layer after drying is determined from the viewpoint of beer strength of the plating film and curing of the epoxy resin. ~
A thickness of 70 μm is preferred.

本発明の接着剤フィルムの製法は、常法によシ行うこと
ができる。例えば、前述の接着剤組成物の溶液をポリプ
ロピレンフィルム、ポリエチレンフィルム、トリアセテ
ートフィルム、フッ化ビニル系フィルム、シリコン離型
処理ポリエステルフィルム、オレフィン離型処理ポリエ
ステルフィルム、未延伸のポリメチルペンテンフィルム
等の支持体フィルム上にナイフコート法、ロールコート
法等で塗布し、乾燥して行われる。支持体フィルムとし
ては、塗工時の耐熱性、離型性さらに離型剤の非転写性
等の点でオレフィン離型処理ポリエステルフィルムが好
ましい◎ 長尺の接着剤フィルムを製造する場合は、製造の最終段
階で該接着剤フィルムをロール状に巻き取る。この場合
、感圧性粘着テープ等の製造において公知の方法を用い
、露出した接着剤組成物層表面(支持体の反対面)上に
支持体フィルムよりも接着剤層との密着力が小さい保護
フィルムで被覆することが好ましい。保護フィルムて接
着剤組成物層を被覆することによシ、ロール状に巻き取
ったときの接着剤組成物層の該支持体フィルム背面への
転着を防ぐことが可能でメ夛、併せて塵の付着をも防止
することができる。保護フィルムとしては1例えば、ポ
リエチレンフィルム、ポリプロピレンフィルム、テフロ
ンフィルム等力るる。
The adhesive film of the present invention can be produced by a conventional method. For example, a solution of the adhesive composition described above may be applied to a support such as a polypropylene film, a polyethylene film, a triacetate film, a vinyl fluoride film, a polyester film treated with silicone mold release, a polyester film treated with olefin mold release, or an unstretched polymethylpentene film. It is applied by knife coating, roll coating, etc. onto the body film and drying. As the support film, an olefin release-treated polyester film is preferable in terms of heat resistance during coating, release properties, and non-transferability of the release agent.◎ When producing a long adhesive film, the production In the final step, the adhesive film is wound up into a roll. In this case, using a method known in the production of pressure-sensitive adhesive tapes, etc., a protective film with a smaller adhesion force to the adhesive layer than the support film is placed on the exposed surface of the adhesive composition layer (the opposite side of the support). It is preferable to coat with. By covering the adhesive composition layer with a protective film, it is possible to prevent the adhesive composition layer from transferring to the back surface of the support film when it is wound up into a roll. It is also possible to prevent dust from adhering. Examples of the protective film include polyethylene film, polypropylene film, and Teflon film.

本発明の接着剤フィルムの接着剤組成物層の厚さは、I
#に制限するものではないが、前述どおり20〜70μ
mが好ましい。
The thickness of the adhesive composition layer of the adhesive film of the present invention is I
Although not limited to #, as mentioned above, 20 to 70μ
m is preferred.

積層板上に9本発明の化学めっき用接着剤組成物の溶液
を塗工し、ついで接着剤組成物を硬化し配線パターン形
成部以外にめっきレジストを被覆し、ついで化学めっき
で配線パターン形成部にめっきを析出して印刷配線板が
製造される。
9. A solution of the adhesive composition for chemical plating of the present invention is applied on the laminate, and then the adhesive composition is cured to cover areas other than the wiring pattern forming area with a plating resist, and then chemical plating is applied to the wiring pattern forming area. A printed wiring board is manufactured by depositing plating on the substrate.

積層板上に1本発明の化学めっき用接着剤フィルムを、
接着剤組成物層を積層板側にして加熱加圧ラミネートし
、ついで接着剤組成物を硬化し。
A chemical plating adhesive film of the present invention is placed on a laminate,
The adhesive composition layer is placed on the laminate side and laminated under heat and pressure, and then the adhesive composition is cured.

配線パターン形成部以外にめっきレジストを被覆し、つ
いで化学めっきで配線パターン形成部にめっきを析出し
て印刷配線板が装造される。
A printed wiring board is fabricated by covering areas other than the wiring pattern forming area with a plating resist, and then depositing plating on the wiring pattern forming area by chemical plating.

本発明の化学めっき用接着剤フィルムを積層板にラミネ
ートする方法について説明する。
A method for laminating a laminate with the chemical plating adhesive film of the present invention will be explained.

これらの工程は、特開昭50−15876号公報1%開
昭63−277772号公報等に記載される公知の方法
で行われる。接着剤フィルムの積層板、飼えば9紙基板
フェノール樹脂積層板等へのラミネートは容易である。
These steps are carried out by the known methods described in JP-A-50-15876 and 1% JP-A-63-277772. It is easy to laminate adhesive films to laminates, paper substrates, phenolic resin laminates, etc.

すなわち、ポリエチレン等の保護フィルムが無い場合は
そのまま、保護フィルムのめる場合は保護フィルムを剥
離して又は剥離しながら接着剤面を積層板側にして、積
層板の両面または反面に加熱加圧ラミネートする。
In other words, if there is no protective film such as polyethylene, then heat and pressure laminate on both sides or the other side of the laminate, with the adhesive side facing the laminate, or with the protective film peeled off or while peeling it off. .

加熱加圧ラミネートは、印刷配線板製造業者では周知の
常圧下のホットロールラミネータや%開開52−527
03公報報、特公昭55−13341号公報等に記載さ
れる減圧下又は真空下のラミネータを用いて行うことが
できる。
Heat-pressure lamination is carried out using a hot roll laminator under normal pressure or a 52-527 % opening lamination machine, which is well known in printed wiring board manufacturers.
This can be carried out using a laminator under reduced pressure or vacuum as described in Japanese Patent Publication No. 03, Japanese Patent Publication No. 55-13341, and the like.

接着剤フィルムをラミネートした積層板は9次に必要な
場合KFi支持体フィルムを剥離して、またはこれを剥
離せずに接着剤組成物層を硬化する。
The adhesive film laminated laminate is then cured to cure the adhesive composition layer, with or without peeling off the KFi support film if necessary.

接着剤組成物を基板に塗工して得られる接着剤皮膜は、
そのまま硬化する。硬化Fi、紫外線を照射する工程と
同時または、その後に100〜150℃で加熱すること
により行われる。
The adhesive film obtained by applying the adhesive composition to the substrate is
It will harden as it is. Curing Fi is performed by heating at 100 to 150° C. simultaneously with or after the step of irradiating ultraviolet rays.

次に常法によシ接着剤皮膜を形成した積層板の化学めっ
きする部分以外へのめつきレジストの形成と、接着剤の
化学粗化、めっき核の析出及び活性化を行う。めっきレ
ジストの形成接着剤の粗面化、めっき核の析出及び活性
化とはいずれを先に行ってもよい。
Next, a plating resist is formed on areas other than the areas to be chemically plated of the laminate on which the adhesive film has been formed by a conventional method, the adhesive is chemically roughened, and plating nuclei are precipitated and activated. Roughening of the plating resist forming adhesive, precipitation of plating nuclei, and activation may be performed first.

次に無電解めっきで化学めっきする部分に常法により化
学めっき膜を析出させる。
Next, a chemical plating film is deposited by a conventional method on the part to be chemically plated by electroless plating.

本発明の接着剤層を形成した積層板は1反シ。The laminated board on which the adhesive layer of the present invention was formed was one sheet.

ねじれが発生しないため、めっきレジストの印刷やドラ
イフィルムめっきレジストのラミネートが容易となシ、
微細回路が安定して形成できる。
Since no twisting occurs, it is easy to print plating resists and laminate dry film plating resists.
Fine circuits can be stably formed.

(実施例) 次に実施例によシ本発明を更に詳しく説明するが9本発
明はこれに限定されるものではない。なお1例中の「部
」は、特に断らない限り[Ii量置部を示す。
(Example) Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto. In addition, "part" in one example indicates the quantity [Ii] unless otherwise specified.

実施例1.2および比較例 ナイフコーターを用いて第1表に示したように。Example 1.2 and comparative example As shown in Table 1 using a knife coater.

支持体フィルムとしてオレフィン離型処理をしたポリエ
ステルフィルム、今人■製、テトロンフィルムFLO2
(38μm厚)の離型面に、第1表に示す組成の接着剤
組成物溶液を接着剤層の乾燥膜厚で30μm[なるよう
に塗布し、引き続き乾燥(60〜110℃ 5分間)し
た後、採掘フィルム、ポリエチレンフィルム(30μm
厚)でカバーシ、ロール状に巻き取った化学めっき用接
着剤フィルムを得た。次いで、2本の接着剤フィルムの
ロール(幅500m、長さ100m)の接着剤組成物層
を積層板中に化学めっき用触媒を含む紙基材エポキシ樹
脂積層板(日立化成工業■製、商品名LE−144,0
,8m厚、500anX500m)の両表面に、ポリエ
チレンフィルムを剥離しながらホントロールラミネータ
(日立化成工業■製、商品名HLM−1500型)でラ
ミネートしくホ7 ) CI −ル温7150℃、ホン
トロール圧4kgf /am” 、ラミネートスピード
1m/分)積層板サイズに接着剤フィルムを切断した。
Polyester film subjected to olefin release treatment as a support film, manufactured by Konjin, Tetron Film FLO2
An adhesive composition solution having the composition shown in Table 1 was applied to the mold release surface (38 μm thick) so that the dry film thickness of the adhesive layer was 30 μm, and then dried (60 to 110°C for 5 minutes). After that, mining film, polyethylene film (30μm
An adhesive film for chemical plating was obtained by winding it up into a cover sheet and roll shape. Next, the adhesive composition layer of two rolls of adhesive film (width 500 m, length 100 m) was applied to the laminate to form a paper-based epoxy resin laminate containing a chemical plating catalyst (manufactured by Hitachi Chemical Co., Ltd., commercial product). Name LE-144,0
, 8m thick, 500an x 500m), while peeling the polyethylene film, laminate it with a Hontrol laminator (manufactured by Hitachi Chemical Co., Ltd., trade name HLM-1500 model). The adhesive film was cut to the size of a laminate (4 kgf/am", lamination speed 1 m/min).

次に紫外線と赤外線が同時に放射される平行光照射型反
射板を有する8 0 W / Cl11の高圧水銀灯2
本を有する紫外線照射機(オーク製作所N製、商品名H
MW−514型)を用いe 365 nmセンサで1.
2J/−の紫外線を照射した。比較例1については。
Next, an 80W/Cl11 high-pressure mercury lamp 2 has a parallel light irradiation type reflector that emits ultraviolet and infrared rays simultaneously.
Ultraviolet irradiation machine with book (manufactured by Oak Seisakusho N, product name H)
MW-514 type) using an e 365 nm sensor.
2 J/- of ultraviolet light was irradiated. Regarding Comparative Example 1.

この紫外線照射工程を行わなかった。次忙、ポリエステ
ルフィルムを剥離し、150℃の雰囲気温度を有する硬
化炉内で30分間加熱した。
This ultraviolet irradiation step was not performed. After that, the polyester film was peeled off and heated for 30 minutes in a curing oven with an ambient temperature of 150°C.

さらに比較例2としては、別の基板について紫外線照射
を行わず160℃の雰囲気温度を有する硬化炉内で60
分間加熱したものを作成した。
Furthermore, as Comparative Example 2, another substrate was heated for 60 hours in a curing furnace with an ambient temperature of 160°C without UV irradiation.
It was prepared by heating for a minute.

次に、この接着剤層の形成された基板の表面に1幅1a
nX長さ10cmのビール強度測定用パターンと幅2.
5 an X長さZ5anの260℃はんだ耐熱性測定
用パターンを除いて、紫外線硬化型めっきレジストイン
ク(日本曹達H裂 商品名RI−510)を印刷し、紫
外線を1.5J/iで照射してこのめつきレジストイン
クを硬化した。接着剤層の露出している上記の両パター
ン部を無水りOム酸65g/l、浸硫W1250 m!
/ /とからなる化学粗化液で50℃で7分間粗化し。
Next, on the surface of the substrate on which this adhesive layer was formed, one width 1a was applied.
Beer strength measurement pattern of nX length 10cm and width 2.
Except for the 260°C solder heat resistance measurement pattern of 5 an The lever plating resist ink was cured. Both of the patterned areas where the adhesive layer is exposed were treated with 65g/l of anhydrous acid and sulfurized at W1250m!
Roughen with a chemical roughening solution consisting of / / at 50°C for 7 minutes.

水洗稜e CuS 04 ・5 H*O150f4 /
 l * エチレンジアミン四酢酸309//、37チ
HCHO水溶液l0dll、シアン化ナトリウム25■
/jを含みNaOHでpH12,5に調整した無電解鋼
めっき液に70℃で15時間浸漬し、各パターン形成部
に約30μm厚の銅めつき膜を形成した。次に水洗した
後、150℃で30分間乾燥した。
Washing edge e CuS 04 ・5 H*O150f4 /
l * Ethylenediaminetetraacetic acid 309//, 37 t HCHO aqueous solution 10 dll, sodium cyanide 25
/J and adjusted to pH 12.5 with NaOH for 15 hours at 70° C. to form a copper plating film about 30 μm thick on each pattern forming part. Next, after washing with water, it was dried at 150°C for 30 minutes.

得られた印刷配線板を用いJIS−C6481法に従い
、パターン形成部の銅めつき膜のビール強度およびはん
だ耐熱性を測定した。結果を第2表にまとめて示し友。
Using the obtained printed wiring board, the beer strength and solder heat resistance of the copper plating film in the pattern forming area were measured according to the JIS-C6481 method. The results are summarized in Table 2.

ビール強度は、1a1幅のめつき皮膜を引張方向が積層
板に対し90°で50.7分の速さでレオメータを用い
て引きはがし、その強度によって示した。
Beer strength was determined by peeling off a 1a1-wide plating film using a rheometer at a rate of 50.7 minutes with the tensile direction at 90° to the laminate.

はんだ耐熱性は、260℃のフローはんだ浴に印刷配線
板の表面を接触させ、めっき膜のふくれ。
Solder heat resistance is measured by contacting the surface of a printed wiring board with a flow solder bath at 260°C and measuring the blistering of the plating film.

はがれ等が発生するまでの時間で示した。It is expressed as the time until peeling, etc. occurs.

実施例1.2とも紫外線を利用した150℃の低温硬化
が可能になったため、基板の反り、ねじれも1.0 m
以下と少なく印刷等に不具合もなく。
Both Examples 1 and 2 were able to be cured at a low temperature of 150°C using ultraviolet rays, so the warp and twist of the substrate was reduced to 1.0 m.
There are no problems with printing, etc. as shown below.

めっき鋼のビール強度、#′iんだ耐熱性などが良好な
印刷配線板が得られた。一方、比較例の150℃での硬
化では、エポキシ樹脂の硬化が不充分であシ1反シ、ね
じれは少ないものの、ビール強度。
A printed wiring board with good beer strength and heat resistance of plated steel was obtained. On the other hand, in the comparative example, curing at 150°C resulted in insufficient curing of the epoxy resin, causing only 1 crack and less twisting, but resulting in beer strength.

はんだ耐熱性に問題があつ几。また、160℃/60分
の加熱硬化したものは、ビール強度、tiんだ耐熱性に
は、はぼ問題ないものの反シがひどく。
There is a problem with solder heat resistance. In addition, those cured by heating at 160°C for 60 minutes have no problems with beer strength and heat resistance, but are extremely resistant to cracking.

レイシストインクの印刷前に反シを矯正する必要がめっ
た。
It was often necessary to correct wrinkles before printing with racist ink.

以下余白 (発明の効果) 本発明になる化学めっき用接着剤組成物および化学めっ
き用接着剤フィルムによって、基板の反り、ねじれが少
なく、めっき膜のビール強度およびはんだ耐熱性の高い
印刷配線板が得られる。
Margins below (Effects of the Invention) The chemical plating adhesive composition and chemical plating adhesive film of the present invention can produce printed wiring boards with less warping and twisting of the substrate, and with high beer strength and solder heat resistance of the plating film. can get.

代理人 弁理士 若 林 邦−彦一Agent Patent Attorney Kuni Wakabayashi Hikoichi

Claims (6)

【特許請求の範囲】[Claims] 1.エポキシ樹脂,合成ゴム,フエノール樹脂,化学め
つきの触媒となる貴金属化合物および光感知性芳香族オ
ニウム塩を含有してなる化学めつき用接着剤組成物。
1. An adhesive composition for chemical plating comprising an epoxy resin, a synthetic rubber, a phenolic resin, a noble metal compound serving as a catalyst for chemical plating, and a photosensitive aromatic onium salt.
2.組成物中の固形分としてエポキシ樹脂が15〜40
重量%,合成ゴムが40〜60重量,フエノール樹脂が
20〜40重量%,化学めつきの触媒となる貴金属化合
物が0.01〜2重量%および光感知性芳香族オニウム
塩が0.2〜5重量%である請求項1記載の化学めつき
用接着剤組成物。
2. The solid content of the epoxy resin in the composition is 15 to 40
40-60% by weight of synthetic rubber, 20-40% by weight of phenolic resin, 0.01-2% by weight of a noble metal compound that serves as a catalyst for chemical plating, and 0.2-5% by weight of a photosensitive aromatic onium salt. The adhesive composition for chemical plating according to claim 1, which is % by weight.
3.請求項1または2記載の化学めつき用接着剤組成物
層を透明な支持体フイルム上に形成した化学めつき用接
着剤フイルム。
3. An adhesive film for chemical plating comprising a layer of the adhesive composition for chemical plating according to claim 1 or 2 formed on a transparent support film.
4.透明な支持体フイルムがオレフイン離型処理をした
ポリエステルフイルムである請求項3記載の化学めつき
用接着剤フイルム。
4. 4. An adhesive film for chemical plating according to claim 3, wherein the transparent support film is a polyester film subjected to olefin release treatment.
5.積層板上に,請求項1または2記載の化学めつき用
接着剤組成物の溶液を塗工し,ついで接着剤組成物を硬
化し配線パターン形成部以外にめつきレジストを被覆し
,ついで化学めつきで配線パターン形成部にめつきを析
出する印刷配線板の製造法。
5. A solution of the adhesive composition for chemical plating according to claim 1 or 2 is applied onto the laminate, and then the adhesive composition is cured to cover areas other than the wiring pattern forming area with a plating resist. A method for manufacturing printed wiring boards that deposits plating on the wiring pattern forming area.
6.積層板上に,請求項3または4記載の化学めつき用
接着剤フイルムを,接着剤組成物層を積層板側にして加
熱加圧ラミネートし,ついで接着剤組成物を硬化し,配
線パターン形成部以外にめつきレジストを被覆し,つい
で化学めつきで配線パターン形成部にめつきを析出する
印刷配線板の製造法。
6. The adhesive film for chemical plating according to claim 3 or 4 is laminated on the laminate under heat and pressure with the adhesive composition layer facing the laminate, and then the adhesive composition is cured to form a wiring pattern. A method of manufacturing printed wiring boards in which areas other than the wiring pattern area are coated with a plating resist, and then plating is deposited on the wiring pattern forming area using chemical plating.
JP2310040A 1990-11-15 1990-11-15 Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board Expired - Lifetime JP2602992B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2310040A JP2602992B2 (en) 1990-11-15 1990-11-15 Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2310040A JP2602992B2 (en) 1990-11-15 1990-11-15 Manufacturing method of adhesive composition for chemical plating, adhesive film for chemical plating and printed wiring board

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Publication Number Publication Date
JPH04180984A true JPH04180984A (en) 1992-06-29
JP2602992B2 JP2602992B2 (en) 1997-04-23

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ID=18000439

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Country Link
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5532105A (en) * 1992-08-07 1996-07-02 Hitachi Chemical Company, Ltd. Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board
EP0825809A3 (en) * 1996-07-25 2000-07-26 Hitachi Chemical Co., Ltd. Multilayer circuit board and photosensitive resin composition usable therefor
US7368524B2 (en) * 2004-04-30 2008-05-06 3M Innovative Properties Company Cationically curing two component materials containing a noble metal catalyst
US7784913B2 (en) * 2005-01-26 2010-08-31 Seiko Epson Corporation Mounted structure, liquid droplet ejection head, liquid droplet ejection apparatus and manufacturing method
CN103998650A (en) * 2012-02-06 2014-08-20 富士胶片株式会社 Laminate, method for producing same and base layer forming composition
WO2015039572A1 (en) * 2013-09-17 2015-03-26 Byd Company Limited Polymer article and ink compositon and methods for selectively metalizing polymer article and insulating substrate
CN112379649A (en) * 2020-11-19 2021-02-19 重庆电子工程职业学院 Intelligent household system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118553A (en) * 1980-11-04 1982-07-23 Ciba Geigy Ag Sulfoxonium salt, polymerizable composition containing same and use as polymerization catalyst
JPS60124622A (en) * 1983-11-03 1985-07-03 チバ‐カイギー アクチエンゲゼルシャフト Photopolymeric composition and manufacture of polymeric or bridgeable material
JPS60199024A (en) * 1984-03-24 1985-10-08 Nippon Soda Co Ltd Curable resin composition
JPS60226582A (en) * 1984-04-24 1985-11-11 Hitachi Chem Co Ltd Filmy adhesive
JPH02167381A (en) * 1988-09-20 1990-06-27 Hitachi Chem Co Ltd Adhesive for printed wiring board

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118553A (en) * 1980-11-04 1982-07-23 Ciba Geigy Ag Sulfoxonium salt, polymerizable composition containing same and use as polymerization catalyst
JPS60124622A (en) * 1983-11-03 1985-07-03 チバ‐カイギー アクチエンゲゼルシャフト Photopolymeric composition and manufacture of polymeric or bridgeable material
JPS60199024A (en) * 1984-03-24 1985-10-08 Nippon Soda Co Ltd Curable resin composition
JPS60226582A (en) * 1984-04-24 1985-11-11 Hitachi Chem Co Ltd Filmy adhesive
JPH02167381A (en) * 1988-09-20 1990-06-27 Hitachi Chem Co Ltd Adhesive for printed wiring board

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5532105A (en) * 1992-08-07 1996-07-02 Hitachi Chemical Company, Ltd. Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board
EP0825809A3 (en) * 1996-07-25 2000-07-26 Hitachi Chemical Co., Ltd. Multilayer circuit board and photosensitive resin composition usable therefor
US7368524B2 (en) * 2004-04-30 2008-05-06 3M Innovative Properties Company Cationically curing two component materials containing a noble metal catalyst
US7784913B2 (en) * 2005-01-26 2010-08-31 Seiko Epson Corporation Mounted structure, liquid droplet ejection head, liquid droplet ejection apparatus and manufacturing method
US8839520B2 (en) 2005-01-26 2014-09-23 Seiko Epson Corporation Mounted structure, liquid droplet ejection head, liquid droplet ejection apparatus and manufacturing method
CN103998650A (en) * 2012-02-06 2014-08-20 富士胶片株式会社 Laminate, method for producing same and base layer forming composition
WO2015039572A1 (en) * 2013-09-17 2015-03-26 Byd Company Limited Polymer article and ink compositon and methods for selectively metalizing polymer article and insulating substrate
US10017859B2 (en) 2013-09-17 2018-07-10 Byd Company Limited Polymer articles, ink compositions, and methods for selectively metalizing polymer articles
CN112379649A (en) * 2020-11-19 2021-02-19 重庆电子工程职业学院 Intelligent household system
CN112379649B (en) * 2020-11-19 2021-09-17 重庆电子工程职业学院 Intelligent household system

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