JPH0418258B2 - - Google Patents

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Publication number
JPH0418258B2
JPH0418258B2 JP59119807A JP11980784A JPH0418258B2 JP H0418258 B2 JPH0418258 B2 JP H0418258B2 JP 59119807 A JP59119807 A JP 59119807A JP 11980784 A JP11980784 A JP 11980784A JP H0418258 B2 JPH0418258 B2 JP H0418258B2
Authority
JP
Japan
Prior art keywords
gas
mol
antimony
gas detection
detection element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59119807A
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Japanese (ja)
Other versions
JPS60263845A (en
Inventor
Yoshiaki Okayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nohmi Bosai Ltd
Original Assignee
Nohmi Bosai Ltd
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Filing date
Publication date
Application filed by Nohmi Bosai Ltd filed Critical Nohmi Bosai Ltd
Priority to JP11980784A priority Critical patent/JPS60263845A/en
Publication of JPS60263845A publication Critical patent/JPS60263845A/en
Publication of JPH0418258B2 publication Critical patent/JPH0418258B2/ja
Granted legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔〔産業上の利用分野〕〕 この発明は、空気などの他の気体と接触混合す
ると数%の濃度で自然発火する特殊ガスを検出で
きるガス検出素子とその製造方法に関するもので
ある。 〔〔従来技術〕〕 半導体工場、化学工場や研究所などで、空気な
どの他の気体と接触あるいは混合すると数%の濃
度でも自然発火して燃焼する、モノシラン
(SiH4)、ジクロルシラン(SiH2Cl2)、トリクロ
ルシラン(SiHCl3)、ホスフイン(PH3)、ジボ
ラン(B2H6)やアルシン(AsH3)などの特殊ガ
スが多量に使用されるようになるにつれて、これ
らの特殊ガスが空気中に漏洩するなどして自然発
火し、火災となる事故が増加している。 〔〔従来技術の問題点〕〕 このようなガスを検出するのに、従来はスペク
トル成分などによつてガスの存在や濃度を測定す
る計測器が使用されている。しかし、このような
計測器は調整や測定に時間や手間を必要とし、い
つ生じるかわからない、また早期に検出しなけれ
ばならないガスの漏洩の検出には全く不向きであ
る。このため、このような特殊ガスを簡単に検出
できるガス検出素子が望まれているが、現状はこ
のようなガス検出素子は見当らない。 〔〔問題点の解決手段〕〕 本発明者は特殊ガスを検出できるガス検出素子
を得るべく種々の実験を行なつたところ、白金と
酸化第二スズと三酸化アンチモンとをSb/Sn=
1〜8モル%、Pt/Sn=1〜8モル%の組成比
で混合し、600〜850℃の空気またはアンチモン酸
化ガスの雰囲気中で焼成し、さらに25〜400ppm
のモノシランなどのシラン系ガス雰囲気にさらし
て、シラン化合物を素子表面に分散担持させた金
属酸化物半導体素子と、この半導体素子を加熱す
る手段とでガス検出素子を構成し、加熱する手段
によつて半導体素子を200〜400℃に加熱すること
により、特殊ガスの検出に適当なガス検出素子と
その製造方法を見い出したものである。 〔〔作用〕〕 この発明によるガス検出素子は、特殊ガスを低
濃度でかつ選択性をもつて検出できるとともに、
特殊ガスが存在しない環境下ではアルコールガス
の検出素子としても用いることが可能である。 〔〔実施例〕〕 以下、この発明によりガス検出素子とその製造
方法について、実験例により説明する。 〔実験例 1〕 酸化第二スズ(SnO2)に塩化白金酸(H2
PtCl6)水溶液をPt/Sn=1〜8モル%となるよ
うに加え、超音波により良く分散させる。この分
散水溶液を真空凍結乾燥器にセツトし、−40℃で
急速凍結ならびに乾燥させる。次に、この乾燥さ
れた試料に三酸化アンチモン(Sb2O3)をSb/
Sn=1〜8モル%となるように加え、乳鉢で30
分間混合する。この混合した試料にイソプロピル
アルコールを加えてペースト状にし、電極が取り
付けられたアルミナ磁器管に塗布して自然乾燥さ
せる。この乾燥させた素子を、大気開放され700
±5℃にセツトされた空気酸化雰囲気(以後、空
気雰囲気と言う)の石英管内に入れ、15分間焼成
する。次にこの焼成した素子のアルミナ磁器管内
にヒータを挿入して取り付け、このヒータに通電
して素子を300±50℃に加熱し、この加熱状態の
まま空気中で12時間エージングする。さらにエー
ジングの終了した素子をヒータにより325±5℃
に加熱し、ガス濃度が100ppmのSiH4ガス雰囲気
に10分間さらし、後処理としてSiH4ガスからの
シラン化合物を素子表面に分散的に担持させるこ
とにより、素子の安定化をはかる。その後、ヒー
タで素子を300±50℃に加熱し、空気中で12時間
エージングを行なう。 このようにして、PtとSnO2とSb2O3との組成
比を種々変化させ、それぞれの組成比で4個ずつ
ガス検出素子を製作した。 そして、これらのガス検出素子を、その素子温
度が325℃となるようにヒータに通電して加熱し、
25℃の清浄空気中ならびにそれぞれの濃度が
100ppmの水素(H2)、一酸化炭素(CO)、アン
モニア(NH3)、メタン(CH4)、エチレン(C2
H4)、エタン(C2H6)、イソブタン(iC4H10)、
イソプロピルアルコール(iC3H7OH)、モノシラ
ン(SiH4)の各ガス中にさらして抵抗値を測定
し、測定結果より空気中の抵抗値(R0)と各ガ
ス中での抵抗値(Rg)との比R0/Rgを求めたと
ころ、それぞれの組成比での4個の素子の平均値
は表1に示す結果となつた。・ そしてこの測定結果より、SiH4ガスに対する
R0/Rgと、他のガスに対するR0/Rgのうち最大
を示したものとの比、つまりSN比を求めたとこ
ろ、表1のSN比の欄に示す結果となり、また
iC3H7OHガスに対するR0/Rgと、SiH4ガスを除
く他のガスに対するR0/Rgのうち最大を示した
ものとのSN比を求めたところ、表1のSN比の
欄に示す結果となつた。 また、表1に示したガス検出素子のうち、組成
比がPt/Sn=2モル%、Sb/Sn=4モル%の素
子の各種ガスに対する抵抗変化特性は第1図に示
す通りであり、R0の最小はPt/Sn=2モル%、
Sb/Sn=4モル%の素子の15KΩ、R0の最大は
Pt/Sn=5モル%、Sb/Sn=2モル%の素子の
373KΩであり、前者の素子はSN比が最大、後者
の素子はSN比が最小であつた。 なお、組成比でPt/Snが0.5モル%ならびに10
モル%以上、またSb/Sn=0.5モル%ならびに10
モル%以上の素子を上記製造方法で製作し、各種
ガスに対する特性を測定したところ、これらの素
子の多くはSiH4ガスの他のガスに対するSN比が
1.5以下を示した。 また、上記製造方法において焼成温度を500〜
1000℃の範囲で変化させてみたところ、600〜850
℃の温度範囲で焼成した素子はSiH4ガスの他の
ガスに対するSN比は1.5以上得られたが、これ以
外の温度でSN比が1.5以下に低下した。 さらに素子の加熱温度を種々変化させたとこ
ろ、SiH4ガスの他のガスに対するSN比は200〜
400℃ではそのほとんどが1.5以上を示したが、こ
の温度範囲をはずれると多くの素子はSN比が大
巾に低下する傾向を示した。 また、後処理工程のSiH4ガス濃度を変化させ
たところ、400ppm以上で後処理、つまり表面処
理をした素子は、SiH4ガスに対する応答性が低
下した。これは、分散担持を目的とするシラン化
合物の量が過剰で層状となるためと考えられる。
また、25ppm以下で後処理した素子は、SiH4
スに繰り返してさらした時の変化比(経時特性)
が悪化する傾向を示した。 なお、後処理工程のガスとして、SiH4ガスの
外、SiH2Cl2ガスなどのシラン系ガスを用いても
よい。例えばSiH2Cl2ガスで後処理した素子は、
組成比によつて異なるものの、SiH4ガスで後処
理したものに比べ、SiH4ガスに対する選択性が
多少向上する傾向が見られる。 この実験の結果、PtとSnO2とSb2O3とをPt/
Sn=1〜8モル%、Sb/Sn=1〜8モル%の組
成比で混合し、600〜850℃の空気雰囲気中で焼成
し、さらに25〜400ppmのシラン系ガス中で後処
理した素子を、200〜400℃に加熱して用いること
により、SiH4などの特殊ガスに対し選択性を有
する、また特殊ガスを含まない気体中ではアルコ
ールガスに対し選択性を有するガス検出素子が得
られることが判明した。
[[Industrial Application Field]] The present invention relates to a gas detection element capable of detecting a special gas that spontaneously ignites at a concentration of several percent when mixed with other gases such as air, and a method for manufacturing the same. [[Prior art]] Monosilane (SiH 4 ) and dichlorosilane (SiH 2 As special gases such as Cl 2 ), trichlorosilane (SiHCl 3 ), phosphine (PH 3 ), diborane (B 2 H 6 ) and arsine (AsH 3 ) are used in large quantities, these special gases Accidents resulting in spontaneous ignition due to leakage into the air and fires are increasing. [[Problems with Prior Art]] Conventionally, to detect such gases, measuring instruments have been used that measure the presence and concentration of gases based on spectral components. However, such measuring instruments require time and effort for adjustment and measurement, and are completely unsuitable for detecting gas leaks that do not know when they will occur and must be detected early. For this reason, a gas detection element that can easily detect such a special gas is desired, but such a gas detection element is currently not available. [[Means for solving the problem]] The present inventor conducted various experiments in order to obtain a gas detection element capable of detecting special gases, and found that platinum, stannic oxide, and antimony trioxide were combined into Sb/Sn=
Mix at a composition ratio of 1 to 8 mol% and Pt/Sn = 1 to 8 mol%, sinter in an atmosphere of air or antimony oxide gas at 600 to 850°C, and further add 25 to 400 ppm.
A gas detection element is composed of a metal oxide semiconductor element in which a silane compound is dispersed and supported on the element surface by exposure to a silane-based gas atmosphere such as monosilane, and a means for heating this semiconductor element. By heating the semiconductor element to 200 to 400°C, we have discovered a gas detection element suitable for detecting special gases and a method for manufacturing the same. [[Function]] The gas detection element according to the present invention can detect special gases at low concentrations and with selectivity, and
It can also be used as an alcohol gas detection element in an environment where no special gas exists. [[Example]] Hereinafter, a gas detection element according to the present invention and a method for manufacturing the same will be explained using experimental examples. [Experimental example 1] Chloroplatinic acid ( H 2
PtCl 6 ) aqueous solution is added so that Pt/Sn=1 to 8 mol %, and dispersed well by ultrasonication. This aqueous dispersion solution is placed in a vacuum freeze dryer and rapidly frozen and dried at -40°C. Next, antimony trioxide (Sb 2 O 3 ) was added to this dried sample.
Add so that Sn = 1 to 8 mol%, and use a mortar to
Mix for a minute. Add isopropyl alcohol to this mixed sample to make a paste, apply it to an alumina porcelain tube with an electrode attached, and let it air dry. This dried element was exposed to the atmosphere for 700 minutes.
It is placed in a quartz tube in an air oxidation atmosphere (hereinafter referred to as air atmosphere) set at ±5°C and fired for 15 minutes. Next, a heater is inserted and attached to the alumina porcelain tube of this fired element, electricity is applied to this heater to heat the element to 300±50°C, and the element is aged in this heated state for 12 hours in air. Furthermore, the aged element is heated to 325±5℃.
The device is stabilized by heating it to 100% and exposing it to a SiH 4 gas atmosphere with a gas concentration of 100 ppm for 10 minutes, and as a post-treatment, a silane compound from the SiH 4 gas is dispersedly supported on the device surface. Thereafter, the element was heated to 300±50°C with a heater and aged in air for 12 hours. In this way, the composition ratios of Pt, SnO 2 and Sb 2 O 3 were varied, and four gas detection elements were manufactured for each composition ratio. Then, these gas detection elements are heated by energizing the heater so that the element temperature becomes 325°C.
In clean air at 25℃ and each concentration
100ppm hydrogen ( H2 ), carbon monoxide (CO), ammonia ( NH3 ), methane ( CH4 ), ethylene ( C2
H 4 ), ethane (C 2 H 6 ), isobutane (iC 4 H 10 ),
The resistance value was measured by exposing it to isopropyl alcohol (iC 3 H 7 OH) and monosilane (SiH 4 ) gases, and from the measurement results, the resistance value in air (R 0 ) and the resistance value in each gas (Rg ) was calculated , and the average values of the four elements at each composition ratio were as shown in Table 1.・And from this measurement result, for SiH 4 gas
When we calculated the ratio of R 0 /Rg to the maximum R 0 /Rg for other gases, that is, the SN ratio, we obtained the results shown in the SN ratio column of Table 1.
When we calculated the SN ratio between R 0 /Rg for iC 3 H 7 OH gas and the maximum R 0 /Rg for other gases except SiH 4 gas, we found the following in the SN ratio column of Table 1. The results are shown below. Furthermore, among the gas detection elements shown in Table 1, the resistance change characteristics for various gases of elements with composition ratios of Pt/Sn = 2 mol% and Sb/Sn = 4 mol% are as shown in Figure 1. The minimum of R 0 is Pt/Sn = 2 mol%,
The maximum of 15KΩ and R 0 of the element with Sb/Sn = 4 mol% is
For elements with Pt/Sn=5 mol% and Sb/Sn=2 mol%
The resistance was 373KΩ, and the former element had the maximum SN ratio, and the latter element had the minimum SN ratio. In addition, the composition ratio of Pt/Sn is 0.5 mol% and 10
mol% or more, and Sb/Sn=0.5 mol% and 10
When we fabricated devices with a mol% or more of SiH4 gas using the above manufacturing method and measured their characteristics with respect to various gases, we found that most of these devices had a SN ratio of SiH 4 gas relative to other gases.
It showed 1.5 or less. In addition, in the above manufacturing method, the firing temperature is 500~
When I tried changing it in the range of 1000℃, it was 600 to 850
In the device fired in the temperature range of °C, the SN ratio of SiH 4 gas to other gases was 1.5 or more, but at other temperatures the SN ratio decreased to 1.5 or less. Furthermore, by varying the heating temperature of the element, the S/N ratio of SiH 4 gas relative to other gases was 200~
At 400°C, most of them showed a value of 1.5 or higher, but outside this temperature range, many of the elements showed a tendency for the S/N ratio to drop significantly. Furthermore, when the SiH 4 gas concentration in the post-treatment step was varied, the responsiveness to SiH 4 gas was reduced in the elements that were subjected to post-treatment, that is, surface treatment, at 400 ppm or more. This is thought to be because the amount of the silane compound intended for dispersion and support is excessive, resulting in a layered structure.
In addition, elements post-treated at 25 ppm or less have a change ratio (time-dependent characteristics) when repeatedly exposed to SiH 4 gas.
showed a tendency to worsen. Note that, in addition to SiH 4 gas, a silane-based gas such as SiH 2 Cl 2 gas may be used as the gas for the post-treatment process. For example, elements post-treated with SiH 2 Cl 2 gas,
Although it differs depending on the composition ratio, there is a tendency for the selectivity to SiH 4 gas to be somewhat improved compared to those post-treated with SiH 4 gas. As a result of this experiment, Pt, SnO 2 and Sb 2 O 3 were
Elements mixed with a composition ratio of Sn = 1 to 8 mol% and Sb/Sn = 1 to 8 mol%, fired in an air atmosphere at 600 to 850°C, and further post-treated in a 25 to 400 ppm silane gas. By heating to 200 to 400°C, a gas detection element can be obtained that is selective to special gases such as SiH 4 and selective to alcohol gas in gases that do not contain special gases. It has been found.

〔実験例 2〕[Experiment example 2]

SnO2にH2PtCl6水溶液をPt/Sn=1〜8モル
%となるように加え、超音波により良く分散させ
る。この分散水溶液を真空凍結乾燥器にセツト
し、−40℃で急速凍結ならびに乾燥させる。次に、
この乾燥された試料にSb2O3をSb/Sn=1〜8
モル%となるように加え、乳鉢で30分間混合す
る。この混合した試料にイソプロピルアルコール
を加えてペースト状にし、電極が取り付けられた
アルミナ磁器管に塗布して自然乾燥させる。一
方、700±5℃にセツトされた内径40mm、電気炉
挿入部分50cmの石英管内にオキシ塩化アンチモン
(SbOCl)を2.5mg載置したアルミナボートを30分
間封入し、石英管内をアンチモン酸化ガス雰囲気
にする。そしてこの700±5℃にセツトされたア
ンチモン酸化ガス雰囲気の石英管内に上記の自然
乾燥させた素子を封入し、15分間焼成する。次
に、この焼成した素子のアルミナ磁器管内にヒー
タを挿入して取り付け、このヒータに通電して素
子を300±50℃に加熱し、加熱状態のまま空気中
で12時間エージングする。さらに、エージングの
終了した素子をヒータで325±5℃に加熱し、濃
度が100ppmのSiH4ガス雰囲気中に10分間さらし
てシラン化合物を素子表面に分散担持させ、素子
の安定化をはかる。その後、素子をヒータで300
±50℃に加熱し、空気中で12時間エージングを行
なう。 このようにして、PtとSnO2とSb2O3との組成
比を種々変化させ、それぞれの組成比で4個ずつ
ガス検出素子を製作した。 そして、これらのガス検出素子を、その素子温
度が325℃となるようにヒータに通電して加熱し、
25℃の清浄空気中ならびにそれぞれの濃度が
100ppmのH2,CO,NH3,CH4,C2H4,C2H6
iC4H10,iC3H7OH,SiH4の各ガス中にさらして
抵抗値を測定した。この測定結果より空気中の
R0と各ガス中でのRgとの比R0/Rgを求めたとこ
ろ、それぞれの組成比での4個の素子の平均値は
表2に示す結果となつた。 これらの測定結果より、SiH4ガスに対する
R0/Rgと、他のガスに対するR0/Rgのうち最大
を示したものとのSN比を求めたところ、表2の
SN比の欄に示す結果となり、またiC3H7OHガ
スに対するR0/Rgと、SiH4ガスを除く他のガス
に対するR0/Rgのうち最大を示したものとのSN
比を求めたところ、表2のSN比の欄に示す結
果となつた。 なお、表2のガス検出素子のうち、組成比が
Pt/Sn=2モル%、Sb/Sn=4モル%の素子の
各種ガスに対する抵抗変化特性は第2図に示す通
りであり、R0の最小はPt/Sn=2モル%、Sb/
Sn=4モル%の素子の50KΩ、R0の最大はPt/
Sn=8モル%、Sb/Sn=8モル%の素子の
1.3MΩ、SN比が最小のPt/Sn=4モル%、Sb/
Sn=4モル%の素子のR0は374KΩ、SN比が最大
のPt/Sn=8モル%、Sb/Sn=4モル%の素子
のR0は645KΩであつた。 また、組成比でPt/Snが0.5モル%ならびに10
モル%以上、またSb/Snが0.5モル%ならびに10
モル%以上の素子を上記製造方法で製作したとこ
ろ、これらの素子の多くはSiH4ガスの他のガス
に対するSN比が1.5前後あるいはそれ以下に低下
した。 また、上記製造方法において焼成温度を変化さ
せたところ、600〜850℃の範囲で焼成した素子は
SiH4ガスの他のガスに対するSN比が1.5以上得ら
れるが、550℃以下あるいは900℃以上で焼成した
素子のSN比はその多くが1.5以下に低下した。 次に、石英管内をアンチモン酸化ガス雰囲気と
するのに、SbOClの量を変化させて素子を製作し
たところ、SbOClを0.25〜7.5mg焼成して作成した
アンチモン酸化ガス雰囲気中で製作した素子を
SiH4ガスの他のガスに対するSN比が1.5以上得ら
れた。 またSbOClの代りにSb2O3を用いてアンチモン
酸化ガス雰囲気を作成したところ、Sb2O3を0.25
〜7.5mg焼成して作成した雰囲気中で製作した素
子は上記と同様の結果を示した。 この結果、アンチモン酸化ガス雰囲気は、Sb2
O3のモル数に換算して2×10-9〜3×10-8モル/
cm3の分量のアンチモン化合物を焼成して作成すれ
ばよいことが判明した。 さらに、後処理工程のSiH4ガス濃度を変化さ
せたところ、400ppm以上で表面処理した素子は
SiH4ガスに対する応答性が低下し、25ppmで表
面処理した素子は経時特性が悪化する傾向を示し
た。また後処理時間はガス濃度によつて異なる
が、1〜30分位の範囲が適当である。 また、素子の加熱温度を変化させたところ、
SiH4ガスに対するSN比は200〜400℃ではそのほ
とんどが1.5以上を示したが、この温度範囲をは
ずれるとほとんどの素子は大巾に低下する傾向を
示した。 なお、後処理工程のガスとしては、実験例1と
同様に、SiH2Cl2などのシラン系ガスを用いても
よい。 この実験の結果、PtとSnO2とSb2O3とをPt/
Sn=1〜8モル%、Sb/Sn=1〜8モル%の組
成比で混合し、600〜850℃のアンチモン酸化ガス
雰囲気中で焼成し、さらに25〜400ppmのシラン
系ガス中で後処理した素子を200〜400℃に加熱し
て用いることにより、SiH4などの特殊ガスに対
し選択性を有する、また特殊ガスを含まない気体
中ではアルコールガスに対し選択性を有するガス
検出素子が得られることが判明した。
An aqueous H 2 PtCl 6 solution is added to SnO 2 so that Pt/Sn=1 to 8 mol %, and the mixture is well dispersed by ultrasonication. This aqueous dispersion solution is placed in a vacuum freeze dryer and rapidly frozen and dried at -40°C. next,
Sb 2 O 3 was added to this dried sample as Sb/Sn=1 to 8.
Add to the desired mol% and mix in a mortar for 30 minutes. Add isopropyl alcohol to this mixed sample to make a paste, apply it to an alumina porcelain tube with an electrode attached, and let it air dry. On the other hand, an alumina boat containing 2.5 mg of antimony oxychloride (SbOCl) was sealed in a quartz tube with an inner diameter of 40 mm and an electric furnace insertion portion of 50 cm set at 700±5°C for 30 minutes, creating an antimony oxidation gas atmosphere inside the quartz tube. do. Then, the air-dried element was sealed in a quartz tube in an antimony oxidation gas atmosphere set at 700±5°C, and fired for 15 minutes. Next, a heater is inserted and attached into the alumina porcelain tube of this fired element, electricity is applied to this heater to heat the element to 300±50°C, and the element is aged in the air for 12 hours in the heated state. Further, the aged device is heated to 325±5° C. with a heater and exposed for 10 minutes in an SiH 4 gas atmosphere with a concentration of 100 ppm to disperse and support the silane compound on the device surface, thereby stabilizing the device. After that, the element is heated to 300℃ with a heater.
Heat to ±50°C and age in air for 12 hours. In this way, the composition ratios of Pt, SnO 2 and Sb 2 O 3 were varied, and four gas detection elements were manufactured for each composition ratio. Then, these gas detection elements are heated by energizing the heater so that the element temperature becomes 325°C.
In clean air at 25℃ and each concentration
100ppm H2 , CO , NH3 , CH4 , C2H4 , C2H6 ,
The resistance was measured by exposing it to iC 4 H 10 , iC 3 H 7 OH, and SiH 4 gases. From this measurement result, in the air
When the ratio R 0 /Rg between R 0 and Rg in each gas was determined, the average values of the four elements at each composition ratio were as shown in Table 2. From these measurement results, for SiH 4 gas
When we calculated the SN ratio between R 0 /Rg and the maximum value of R 0 /Rg for other gases, we obtained the results shown in Table 2.
The results are shown in the SN ratio column, and the SN ratio between R 0 /Rg for iC 3 H 7 OH gas and R 0 /Rg for other gases except SiH 4 gas is the highest.
When the ratio was determined, the results were shown in the SN ratio column of Table 2. In addition, among the gas detection elements in Table 2, the composition ratio is
The resistance change characteristics of the element with Pt/Sn = 2 mol% and Sb/Sn = 4 mol% against various gases are shown in Figure 2, and the minimum R 0 is Pt/Sn = 2 mol%, Sb/
The maximum of 50KΩ and R 0 of the element with Sn = 4 mol% is Pt/
For an element with Sn=8 mol% and Sb/Sn=8 mol%
1.3MΩ, minimum S/N ratio Pt/Sn=4 mol%, Sb/
The R 0 of the element with Sn = 4 mol % was 374 KΩ, and the R 0 of the element with Pt/Sn = 8 mol % and Sb/Sn = 4 mol %, which had the maximum S/N ratio, was 645 K Ω. In addition, the composition ratio of Pt/Sn is 0.5 mol% and 10
mol% or more, and Sb/Sn is 0.5 mol% and 10
When devices containing more than mol% of SiH 4 gas were manufactured using the above manufacturing method, the S/N ratio of SiH 4 gas to other gases decreased to around 1.5 or lower in many of these devices. In addition, when the firing temperature was varied in the above manufacturing method, the elements fired in the range of 600 to 850℃ were
Although the S/N ratio of SiH 4 gas relative to other gases is 1.5 or more, the S/N ratio of devices fired at temperatures below 550°C or above 900°C decreased to below 1.5 in most cases. Next, we fabricated devices by varying the amount of SbOCl to create an antimony oxide gas atmosphere inside the quartz tube.
The S/N ratio of SiH 4 gas to other gases was greater than 1.5. Furthermore, when an antimony oxidation gas atmosphere was created using Sb 2 O 3 instead of SbOCl, Sb 2 O 3 was reduced to 0.25
Devices fabricated in an atmosphere created by firing ~7.5mg showed similar results as above. As a result, the antimony oxidation gas atmosphere becomes Sb 2
Converted to the number of moles of O 3 2×10 -9 to 3×10 -8 mol/
It was found that the antimony compound can be created by firing an amount of antimony compound in an amount of cm3 . Furthermore, when we varied the SiH 4 gas concentration in the post-treatment process, we found that the elements surface-treated with 400 ppm or more
The responsiveness to SiH 4 gas decreased, and the elements surface-treated with 25 ppm showed a tendency for the aging characteristics to deteriorate. Further, the post-treatment time varies depending on the gas concentration, but a range of about 1 to 30 minutes is appropriate. In addition, when the heating temperature of the element was changed,
The S/N ratio for SiH 4 gas was mostly 1.5 or higher between 200 and 400°C, but outside this temperature range, most of the devices showed a tendency to drop significantly. Note that, as in Experimental Example 1, a silane-based gas such as SiH 2 Cl 2 may be used as the gas for the post-treatment process. As a result of this experiment, Pt, SnO 2 and Sb 2 O 3 were
Mixed with a composition ratio of Sn = 1 to 8 mol% and Sb/Sn = 1 to 8 mol%, fired in an antimony oxidation gas atmosphere at 600 to 850°C, and further post-treated in 25 to 400 ppm silane gas. By heating the element to 200 to 400℃ and using it, a gas detection element can be obtained that has selectivity for special gases such as SiH4 , and also has selectivity for alcohol gas in gases that do not contain special gases. It turned out that it was possible.

【表】 〔〔効果〕〕 この発明によれば、特殊ガスに対して選択性を有
し、漏洩等の危険に対する低濃度の特殊ガスを検
知することに使用可能なガス検出素子、およびそ
の製造方法であり、また、特殊ガスが存在し得な
い環境下では、アルコールガスに対して選択性を
有するガス検出素子とすることが可能である。
[Table] [[Effects]] According to the present invention, there is provided a gas detection element that has selectivity for special gases and can be used to detect low concentration special gases against dangers such as leakage, and its manufacture. Furthermore, in an environment where special gases cannot exist, it is possible to create a gas detection element that is selective to alcohol gas.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の実験例1によつて、また第
2図は実験例2によつてそれぞれ製作したガス検
出素子の1実施例の各種ガスに対する抵抗変化特
性を示す図である。
FIG. 1 is a diagram showing resistance change characteristics for various gases of an example of a gas detection element manufactured according to Experimental Example 1 and FIG. 2 according to Experimental Example 2 of the present invention.

Claims (1)

【特許請求の範囲】 1 酸化第二スズを主材、白金を触媒、三酸化ア
ンチモンを安定材として、Pt/Sn=1〜8モル
%、Sb/Sn=1〜8モル%の組成比を有し、シ
ラン系ガスからのシラン化合物を素子表面に分散
担持させてなる素子と、この素子を200〜400℃に
加熱する手段と、を備えたことを特徴とするガス
検出素子。 2 塩化白金酸水溶液に酸化第二スズをPt/Sn
=1〜8モル%となるように加えて良く分散させ
る第1工程と、第1工程で製作した試料に三酸化
アンチモンをSb/Sn=1〜8モル%となるよう
に混合する第2工程と、第2工程で製作した試料
に有機溶剤を加えてペースト状にして電極付きの
絶縁体に塗布し乾燥させる第3工程と、第3工程
で製作した素子を600〜850℃の空気酸化雰囲気中
で焼成する第4工程と、第4工程で焼成した素子
を25〜400ppmのシラン系ガス雰囲気にさらす第
5工程とからなるガス検出素子の製造方法。 3 塩化白金酸水溶液に酸化第二スズをPt/Sn
=1〜8モル%となるように加えて良く分散させ
る第1工程と、第1工程で製作した試料に三酸化
アンチモンをSb/Sn=1〜8モル%となるよう
に混合する第2工程と、第2工程で製作した試料
に有機溶剤を加えてペースト状にして電極付きの
絶縁体に塗布し乾燥させる第3工程と、第3工程
で製作した素子を600〜850℃のアンチモン酸化ガ
ス雰囲気中で焼成する第4工程と、第4工程で焼
成した素子を25〜400ppmのシラン系ガス雰囲気
にさらす第5工程とからなるガス検出素子の製造
方法。 4 アンチモン酸化ガス雰囲気は、三酸化アンチ
モンのモル数に換算して2×10-9〜3×10-8
ル/cm3の分量のアンチモン化合物を焼成して作成
されるものである特許請求の範囲第3項記載のガ
ス検出素子の製造方法。 5 アンチモン化合物は、オキシ塩化アンチモン
である特許請求の範囲第4項記載のガス検出素子
の製造方法。 6 アンチモン化合物は、三酸化アンチモンであ
る特許請求の範囲第4項記載のガス検出素子の製
造方法。
[Scope of Claims] 1. Using stannic oxide as a main material, platinum as a catalyst, and antimony trioxide as a stabilizer, the composition ratio is Pt/Sn = 1 to 8 mol% and Sb/Sn = 1 to 8 mol%. 1. A gas detection element comprising: an element having a silane compound from a silane-based gas dispersedly supported on the element surface; and means for heating the element to 200 to 400°C. 2 Add stannic oxide to Pt/Sn chloroplatinic acid aqueous solution
The first step is to add Sb/Sn so that it is 1 to 8 mol% and to disperse it well, and the second step is to mix antimony trioxide to the sample produced in the first step so that Sb/Sn is 1 to 8 mol%. A third step is to add an organic solvent to the sample produced in the second step, make it into a paste, apply it to an insulator with electrodes, and dry it. A method for producing a gas detection element, comprising a fourth step of firing the element in a silane gas atmosphere, and a fifth step of exposing the element fired in the fourth step to a silane-based gas atmosphere of 25 to 400 ppm. 3 Adding stannic oxide to Pt/Sn chloroplatinic acid aqueous solution
The first step is to add Sb/Sn so that it is 1 to 8 mol% and to disperse it well, and the second step is to mix antimony trioxide to the sample produced in the first step so that Sb/Sn is 1 to 8 mol%. A third step involves adding an organic solvent to the sample produced in the second step, making it into a paste, applying it to an insulator with electrodes, and drying it.The device produced in the third step is exposed to antimony oxide gas at 600 to 850°C. A method for manufacturing a gas detection element, comprising a fourth step of firing in an atmosphere, and a fifth step of exposing the element fired in the fourth step to a silane-based gas atmosphere of 25 to 400 ppm. 4. The antimony oxidation gas atmosphere is created by firing an antimony compound in an amount of 2×10 -9 to 3×10 -8 mol/cm 3 in terms of the number of moles of antimony trioxide. A method for manufacturing a gas detection element according to scope 3. 5. The method for manufacturing a gas detection element according to claim 4, wherein the antimony compound is antimony oxychloride. 6. The method for manufacturing a gas detection element according to claim 4, wherein the antimony compound is antimony trioxide.
JP11980784A 1984-06-13 1984-06-13 Gas detecting element and its production Granted JPS60263845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11980784A JPS60263845A (en) 1984-06-13 1984-06-13 Gas detecting element and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11980784A JPS60263845A (en) 1984-06-13 1984-06-13 Gas detecting element and its production

Publications (2)

Publication Number Publication Date
JPS60263845A JPS60263845A (en) 1985-12-27
JPH0418258B2 true JPH0418258B2 (en) 1992-03-27

Family

ID=14770709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11980784A Granted JPS60263845A (en) 1984-06-13 1984-06-13 Gas detecting element and its production

Country Status (1)

Country Link
JP (1) JPS60263845A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62197755A (en) * 1986-02-26 1987-09-01 Agency Of Ind Science & Technol Manufacture of oxide semiconductor thin film for gas sensor
JPS62207945A (en) * 1986-03-08 1987-09-12 Shimizu Constr Co Ltd Gas leak detection device
JP2004003915A (en) * 2002-03-29 2004-01-08 Ngk Spark Plug Co Ltd Gas sensor heat treatment method, and gas sensor manufacturing method and inspection method using the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222275B2 (en) * 1972-09-22 1977-06-16
JPS5349493A (en) * 1976-10-18 1978-05-04 Saito Noboru Gas detecting element composed of oxide semiconductor
JPS53143298A (en) * 1977-05-19 1978-12-13 Nohmi Bosai Kogyo Co Ltd Carbon monoxide sensor element
JPS5499697A (en) * 1978-01-24 1979-08-06 Asahi Glass Co Ltd Gas sensing body for reductive gas
JPS54112179A (en) * 1978-02-23 1979-09-01 Sony Corp Semiconductor device
JPS54121795A (en) * 1978-03-15 1979-09-21 Fujitsu Ltd Production of gas detecting element material

Also Published As

Publication number Publication date
JPS60263845A (en) 1985-12-27

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