JPH04187777A - Electroless plating method - Google Patents
Electroless plating methodInfo
- Publication number
- JPH04187777A JPH04187777A JP31482790A JP31482790A JPH04187777A JP H04187777 A JPH04187777 A JP H04187777A JP 31482790 A JP31482790 A JP 31482790A JP 31482790 A JP31482790 A JP 31482790A JP H04187777 A JPH04187777 A JP H04187777A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- electroless plating
- plating
- plated
- pretreatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007772 electroless plating Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims description 52
- 238000011282 treatment Methods 0.000 claims abstract description 55
- 230000004913 activation Effects 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000005530 etching Methods 0.000 claims abstract description 11
- 239000002904 solvent Substances 0.000 claims abstract description 9
- 239000004033 plastic Substances 0.000 claims abstract description 8
- 229920003023 plastic Polymers 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 6
- 229920002994 synthetic fiber Polymers 0.000 claims abstract description 6
- 239000012209 synthetic fiber Substances 0.000 claims abstract description 6
- 239000003513 alkali Substances 0.000 claims abstract description 5
- FWPIDFUJEMBDLS-UHFFFAOYSA-L tin(II) chloride dihydrate Chemical compound O.O.Cl[Sn]Cl FWPIDFUJEMBDLS-UHFFFAOYSA-L 0.000 claims abstract 4
- XILWPJQFJFHOSI-UHFFFAOYSA-L dichloropalladium;dihydrate Chemical compound O.O.[Cl-].[Cl-].[Pd+2] XILWPJQFJFHOSI-UHFFFAOYSA-L 0.000 claims abstract 2
- 206010070834 Sensitisation Diseases 0.000 claims description 19
- 230000008313 sensitization Effects 0.000 claims description 19
- 238000005238 degreasing Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 9
- 238000007747 plating Methods 0.000 abstract description 34
- 230000003213 activating effect Effects 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 230000008569 process Effects 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 238000001994 activation Methods 0.000 description 17
- 239000000047 product Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229920002972 Acrylic fiber Polymers 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002351 wastewater Substances 0.000 description 5
- 238000004065 wastewater treatment Methods 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- -1 dimethinoformamide Chemical compound 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101100028920 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) cfp gene Proteins 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229910001380 potassium hypophosphite Inorganic materials 0.000 description 1
- CRGPNLUFHHUKCM-UHFFFAOYSA-M potassium phosphinate Chemical compound [K+].[O-]P=O CRGPNLUFHHUKCM-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は合成繊維又はプラスチックに対して無電解メッ
キする際に感応化処理及び活性化処理を高温で行なうこ
とにより工程の省略化、安定性の優れたメッキを得る新
規な無電解メッキ方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention achieves process simplification and stability by performing sensitization treatment and activation treatment at high temperatures when performing electroless plating on synthetic fibers or plastics. This invention relates to a new electroless plating method for obtaining excellent plating.
[従来の技術]
無電解メッキは被メッキ体をメッキ浴に単に浸漬するこ
とによりメッキする方法である。[Prior Art] Electroless plating is a method of plating by simply immersing an object to be plated in a plating bath.
無電解メッキの特徴として(1)感応化処理および活性
化処理を行なうことにより金属以外のプラスチック、セ
ラミックス等の非導電体にもメッキが可能であること、
(2)複雑な形状の物体にも厚さが均一にメッキできる
こと、(3)ピンホールが少ないメッキ膜が得られるた
め電気メッキより耐食性の良い膜が得られること、(4
)特異な機能性(磁性、非晶質性など)をもつメッキ膜
も可能であること、(5)設備、操作が簡単であること
等の利点がある反面、filメッキ速度が小さい、(2
)メッキ浴の寿命が短い、(3)電気メッキよりコスト
が高い等の問題がある。The characteristics of electroless plating are (1) It is possible to plate non-conductive materials such as plastics and ceramics other than metals by performing sensitization treatment and activation treatment;
(2) Even objects with complex shapes can be plated to a uniform thickness; (3) a plated film with fewer pinholes can be obtained, resulting in a film with better corrosion resistance than electroplating; (4)
) It is possible to produce plating films with unique functionality (magnetism, amorphous, etc.); (5) Although it has advantages such as easy equipment and operation, the fil plating speed is slow; (2)
) There are problems such as short life of the plating bath and (3) higher cost than electroplating.
従来の無電解メッキ方法は被メッキ材料の材質により前
処理工程の構成は一定しないが、プラスチック等をメッ
キするときは、通常アルカリ溶液(NaO820〜30
g/f2.Na2CO320−30g/ff、Na3P
O420〜30g/ρ、界面活性剤)または有機溶剤に
浸漬する脱脂工程、キシレン、ジオキサン、トルエン、
テト・ラリン、ジメチノしフォルムアミド、ジメチルス
ルホキシド
る溶剤処理工程、被メッキ材料のメッキ面を粗面化する
ためのCrO3−H2S04−H20溶液(CrO,1
00〜500g/12)あるいはこれに83PO4を添
加した溶液に高温で浸漬するエツチング工程、ついでS
nC1.・2H202 0 〜4 0 g / 12、
HCI”c 10〜20mj2/I2の感応化処理液に
浸漬し、Sn”を吸着させる感応化工程と、このSn”
によりPd”の反応によりPd0を被メッキ材料表面に
析出させる活性化工程を経て無電解メッキ工程の前処理
工程が完了することになる。In conventional electroless plating methods, the composition of the pretreatment process varies depending on the material to be plated, but when plating plastic etc., an alkaline solution (NaO820-30
g/f2. Na2CO320-30g/ff, Na3P
O420~30g/ρ, surfactant) or degreasing step by immersion in organic solvent, xylene, dioxane, toluene,
Solvent treatment process using tetralin, dimethinoformamide, dimethyl sulfoxide, CrO3-H2S04-H20 solution (CrO, 1
00~500g/12) or an etching process of immersing it in a solution containing 83PO4 at high temperature, then S
nC1.・2H202 0 ~ 40 g / 12,
A sensitization step in which Sn" is adsorbed by immersion in a sensitization treatment solution of HCI"c 10 to 20 mj2/I2, and this Sn"
As a result, the pretreatment process for the electroless plating process is completed through an activation process in which Pd0 is precipitated on the surface of the material to be plated by the reaction of Pd''.
この場合、感応化工程と活性化工程は常温(20℃前後
)の低温で1〜2分間感応化処理液及び活性化処理液に
浸漬するがそれぞれの処理が終了し、次の工程に移る前
に多量の水で洗浄が必要とされる。また、これらの処理
はメッキを完全にイ」けるため単に一回のみの処理で済
ませることは少なく、通常は複数回の繰返し処理するこ
とが行なわれている。In this case, the sensitization process and activation process are immersed in the sensitization treatment solution and activation treatment solution for 1 to 2 minutes at a low temperature of room temperature (around 20℃), but after each treatment is completed, before moving on to the next process. Washing with plenty of water is required. Furthermore, since these treatments completely destroy the plating, they are rarely done just once, but are usually repeated multiple times.
ついでこのような前処理の済んだ被メッキ材料は,メッ
キをする金属を含む金属塩、錯化剤及び還元剤からなる
メッキ浴に、通常は浸漬法によりメッキを行なう。メッ
キをする金属としてはニッケル、銅、コバルトおよび金
、銀、インジウム等の貴金属が主として使用されている
。The material to be plated that has undergone such pretreatment is then plated, usually by dipping, in a plating bath consisting of a metal salt containing the metal to be plated, a complexing agent, and a reducing agent. The metals used for plating are mainly nickel, copper, cobalt, and noble metals such as gold, silver, and indium.
以下ニッケルを代表例として取りFげ、説明する。Below, nickel will be taken as a representative example and explained.
ニッケルの実用メッキ浴としては酸性浴、中性浴、アル
カリ性浴など多くの浴組成が発表されている。Many bath compositions have been announced as practical nickel plating baths, including acidic baths, neutral baths, and alkaline baths.
これに使用する還元剤もいくつか発表されているが、次
亜リン酸ナトリウムおよびホウ素化合物を用いる例が多
く、析出メッキ層がNi−P、Ni−Bとなるメッキ膜
は耐摩耗性、潤滑性などの機械的特性に優れているので
多(用いられている。Several reducing agents have been announced for use in this process, but sodium hypophosphite and boron compounds are often used. It is widely used because it has excellent mechanical properties such as elasticity.
しかし、前述の如く無電解メッキ法そのものはメッキ速
度が遅いこと、コストが高くなること、メッキ浴の寿命
が短く、また還元剤、錯化剤等多くの不純物を含むため
再生が困難であるにも拘らず、メッキ廃水中に含有され
る有効金属塩の濃度が高く、廃水処理が難しい等、いく
つかの問題を抱えている。However, as mentioned above, the electroless plating method itself has slow plating speed, high cost, short plating bath life, and contains many impurities such as reducing agents and complexing agents, making it difficult to recycle. However, there are several problems, such as the high concentration of effective metal salts contained in plating wastewater, which makes wastewater treatment difficult.
[発明が解決しようとする課題]
本発明は、従来の無電解メッキ法の未解決の問題である
コストダウン、廃水処理の簡易化、工程の簡略化を目的
として検討を行ない、本発明に到達した。 。[Problems to be Solved by the Invention] The present invention has been achieved through studies aimed at reducing costs, simplifying wastewater treatment, and simplifying processes, which are unresolved problems of conventional electroless plating methods. did. .
[課題を解決するための手段]
本発明は、合成mta又はプラスデック製品の無電解メ
ッキ方法の前処理において、少なくとも脱脂工程を稀薄
な酸、ついで稀薄なアルカリで被メッキ材料の軟化点以
下の高温で処理し、ついで感応化処理および活性化処理
を40℃と軟化点の間の温度において行なうことを特徴
とする無電解メッキ方法に関する5
本発明の対象となる合成繊維又はプラスチック製品とし
ては、ポリアミド(ナイロン)、ポリエステル、アクリ
ル繊維等の合成繊維、ポリエチレン、ポリプロピレン、
アクリロニトリル−ブタジェン−スチレン樹脂(ABS
)、スチレン、塩化ビニル等の通常の熱可塑性プラスチ
ックあるいはポリカーボネート、ポリアミド、ポリブチ
ルテレツクレート、ボリアセタ・−ル等のいわゆるエン
ジニャリングプラスチック等がその対象としてあげるこ
とが出来る。[Means for Solving the Problems] The present invention provides, in the pretreatment of the electroless plating method for synthetic mta or plus deck products, at least the degreasing step with a dilute acid and then with a dilute alkali to a temperature below the softening point of the material to be plated. 5 relating to an electroless plating method characterized in that treatment is carried out at a high temperature, followed by sensitization treatment and activation treatment at a temperature between 40° C. and the softening point.Synthetic fibers or plastic products that are the subject of the present invention include: Synthetic fibers such as polyamide (nylon), polyester, and acrylic fibers, polyethylene, polypropylene,
Acrylonitrile-butadiene-styrene resin (ABS
), styrene, vinyl chloride, and so-called engineering plastics such as polycarbonate, polyamide, polybutyl terreclate, and polyacetal.
製品の形状としては無電解メッキの特色である複雑な形
状の物体に対しても均一の厚さのメッキが可能であり、
被メッキ材料を電極に接続する必要がないところから、
繊維、粉末、その他各種の形状の製品に対しても使用可
能である。特に繊維状製品に対しての適用は重量あたり
の表面積が大きいところから溶剤処理、エツチング処理
等の工程において多量の洗浄水の使用を余儀なくされる
工程を省略できるメリットを享受できるので好ましい対
象である。Regarding the shape of the product, it is possible to plate objects with a uniform thickness even on objects with complex shapes, which is a feature of electroless plating.
Since there is no need to connect the material to be plated to the electrode,
It can also be used for fibers, powders, and other products in various shapes. In particular, it is preferable to apply it to fibrous products because it has a large surface area per weight, so it can enjoy the advantage of omitting processes that require the use of large amounts of washing water in processes such as solvent treatment and etching treatment. .
本発明方法の無電解メッキの前処理としては、少なくと
も脱脂工程、感応化処理工程及び活性化処理工程の3工
程を必要とし、従来法においてプラスチック製品に対す
る無電解メッキに必要とされている溶剤処理工程、エツ
チング工程を省略できる特徴を有している。The pretreatment for electroless plating in the method of the present invention requires at least three steps: a degreasing step, a sensitization step, and an activation step, and the solvent treatment required for electroless plating of plastic products in the conventional method. It has the feature that the etching process can be omitted.
溶剤処理工程は、環境汚染や引火、爆発の原因となる大
量の有機溶剤の使用が必要とされているのに、この工程
の省略はコストダウンのみならず、上記のトラブルを回
避できることを意味する。Although the solvent treatment process requires the use of large amounts of organic solvents that can cause environmental pollution, ignition, and explosions, omitting this process not only reduces costs but also means that the above problems can be avoided. .
また、エツチング工程はプラスチック材料の前処理工程
としては被メッキ面を粗面化し、メッキ膜の密着性を向
上させるために必要な工程と認識され、Crys−H2
SOa系のエツチング浴を使用している。しかし、この
洛は毒性の強い6価のクロムイオンを含有するものであ
り、この処理後水洗浄すれば稀薄な6価クロムの廃水が
多量に生成するのでこの後処理のコストも高くなり、全
体のコストアップにつながるのでこの工程の省略は廃水
処理の簡易化、工程の短縮等大きな効果がある。In addition, the etching process is recognized as a pretreatment process for plastic materials to roughen the surface to be plated and improve the adhesion of the plating film.
An SOa-based etching bath is used. However, this Raku contains highly toxic hexavalent chromium ions, and if it is washed with water after this treatment, a large amount of dilute hexavalent chromium wastewater will be generated, which will increase the cost of this post-treatment and reduce the overall cost. Therefore, omitting this step has great effects such as simplifying wastewater treatment and shortening the process.
もちろんこれら溶剤処理工程、エツチング工程を追加し
ても上記の工程を省略したメリットを失うに止まるだけ
で本発明方法は実施可能である。Of course, even if these solvent treatment steps and etching steps are added, the method of the present invention can be implemented without losing the advantage of omitting the above steps.
本発明の前処理第1工程としての脱脂工程は、従来法の
常温のアルカリ溶液単独に浸漬、有機温媒に浸漬等の工
程でも良いが、稀薄強酸な強酸の水溶液、例えば塩酸、
硫酸、硝酸、スルホン酸等の05〜10%程度の溶液で
、少なくとも50℃以上であって、被メッキ材料が軟化
する温度に近い高温で3〜10分間程度処理し、ついで
稀薄な力性アルカリ等の強アルカリ水溶液(濃度は0.
5〜5%程度)の溶液で強酸水溶液処理とほぼ同一条件
で処理する。The degreasing step as the first pre-treatment step of the present invention may be a conventional process such as immersion in an alkaline solution at room temperature alone or immersion in an organic hot medium, but it may also be carried out using a dilute aqueous solution of a strong acid, such as hydrochloric acid,
Treat with a 05-10% solution of sulfuric acid, nitric acid, sulfonic acid, etc. at a temperature of at least 50°C or higher, close to the temperature at which the material to be plated softens, for about 3-10 minutes, and then treat with a dilute alkali solution. A strong alkaline aqueous solution such as (concentration is 0.
5% to 5%) solution under almost the same conditions as the strong acid aqueous solution treatment.
なお酸性処理及びアルカリ性処理の順は任意であって良
い。Note that the order of acidic treatment and alkaline treatment may be arbitrary.
この処理製品を良く水洗し、感応化処理を行なう。This treated product is thoroughly washed with water and subjected to sensitization treatment.
感応化処理液としては、5nC1□・2H20として0
.1〜20 g / 12の塩酸酸性水溶液(HCl
concとして1〜20 m !!、 / 2 )を使
用する。As a sensitization treatment solution, 0 as 5nC1□・2H20
.. 1-20 g / 12 hydrochloric acid acidic aqueous solution (HCl
1-20m as conc! ! , /2).
SnCl□・2H,Oの濃度が極度に希釈された場合、
充分な液量、時間をかけることによってメッキをするこ
とは可能であるが、多量の溶液、長い時間を必要とする
ため経済的に好ましくない。When the concentration of SnCl□・2H,O is extremely diluted,
Although it is possible to perform plating by using a sufficient amount of liquid and taking a sufficient amount of time, it is economically unfavorable because it requires a large amount of solution and a long time.
また20g/l以上になっても効果が飽和しておりメリ
ットはない。処理温度は40℃以上、被メッキ材料の軟
化点以下の温度で3〜lO分程度処理する。この時間は
処理温度が低いときは長時間必要となることはもちろん
で、この時間は一応の目安として見るべきである。Moreover, even if it exceeds 20 g/l, the effect is saturated and there is no merit. The treatment temperature is 40° C. or higher and the temperature is lower than the softening point of the material to be plated for about 3 to 10 minutes. It goes without saying that this time is required for a long time when the processing temperature is low, and this time should be seen as a rough guide.
活性化処理液としてはPdC1□−2H20として0.
01〜0.4g/I2の塩酸酸性水溶液(HCl ”c
として1〜20+nI2/、9) を使用する。pac
tz・2H20の濃度が極度に稀薄であっても、充分な
液量と時間をかけることによりメッキをすることは可能
ではあるが、経済的には上記の濃度程度が好ましい範囲
である。0.4g/i以上にしても活性化処理済液中の
Pdイオンが多く残り、循環使用してライフを失った最
終廃液中の濃度を高(し、廃水処理にロードをかけるこ
とになるだけであまりメリットはない。The activation treatment liquid was PdC1□-2H20 with 0.
Hydrochloric acid acidic aqueous solution (HCl ”c
1 to 20+nI2/, 9). pac
Even if the concentration of tz.2H20 is extremely dilute, it is possible to perform plating by taking a sufficient amount of liquid and time, but economically, the above concentration range is preferable. Even if the concentration is 0.4 g/i or more, many Pd ions remain in the activated liquid, which increases the concentration in the final waste liquid that has lost its life due to circulation use (and only adds load to the waste water treatment). There's not much benefit.
この際の処理温度は40℃以上、被メッキ材料の軟化点
以下の温度で3〜10分程度処理する。At this time, the treatment temperature is 40° C. or higher, and the treatment is performed at a temperature lower than the softening point of the material to be plated for about 3 to 10 minutes.
これら各工程間の移動の際には充分な水洗が必要であり
、前工程の処理液の次工程への送入は厳に避けることが
必要である。Sufficient water washing is required when transferring between these steps, and it is necessary to strictly avoid transferring the treatment liquid from the previous step to the next step.
このように前処理工程を行なった被メッキ材料は充分に
水洗され、無電解メッキ工程に送られ各種の金属、例え
ばAu、Ag、Pd、Cu。The material to be plated that has undergone the pretreatment process in this way is thoroughly washed with water and sent to an electroless plating process to coat various metals such as Au, Ag, Pd, and Cu.
Ni、Co、Fe、Ir等の金属メッキをする。Plate with metal such as Ni, Co, Fe, Ir, etc.
本発明の無電解メッキ方法の前処理した製品は従来法に
よる前処理した製品と同様に無電解メッキに付すること
が出来る。Products pretreated by the electroless plating method of the present invention can be subjected to electroless plating in the same manner as products pretreated by conventional methods.
[作 用]
本発明における無電解メッキ方法の前処理工程は、脱脂
工程、感応化処理工程、活性化処理工程のいづれも従来
の前処理工程における処理温度より相当高温である50
℃〜軟化点、40℃〜軟化点の温度で行なうことが要求
される。[Function] The pretreatment process of the electroless plating method in the present invention includes a degreasing process, a sensitization process, and an activation process, all of which are performed at a considerably higher temperature than the treatment temperature in the conventional pretreatment process.
It is required to carry out the process at a temperature of 40°C to the softening point.
このため製品の被メッキ表面が従来法の前処理工程にお
けるよりも粗面化され、したがって溶剤処理、エツチン
グ処理をしなくとも良い結果を得ているのかも知れない
。For this reason, the surface of the product to be plated is made rougher than in the pretreatment process of the conventional method, and therefore good results may be obtained without the need for solvent treatment or etching treatment.
また、本発明の前処理をした場合には、高温での処理の
ためか感応化処理、活性化処理は1回の処理で充分であ
り、この工程を場合にもよるが複数回の処理を要求され
ることのある従来法とは格段に優れた方法である。In addition, when the pretreatment of the present invention is performed, one sensitization treatment and activation treatment is sufficient, perhaps because of the high temperature treatment, but this step may be performed multiple times depending on the case. This method is far superior to conventional methods that may be required.
また理由までは解明できなかったが、本発明の前処理し
た場合には、無電解メッキ方法の最大の欠陥であるメッ
キ速度を大にすることができ、またメッキ膜の付着強度
が大である製品が得られる。Although the reason was not clear, the pretreatment of the present invention can increase the plating speed, which is the biggest drawback of electroless plating methods, and also increases the adhesion strength of the plating film. product is obtained.
以下、実施例をあげ本発明を具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
[実施例〕
被メッキ材料として、繊度2デニール、10mm長さに
カットしたアクリル繊維を用いた。[Example] Acrylic fibers having a fineness of 2 denier and cut into a length of 10 mm were used as the material to be plated.
使用した水は水道水をそのまま便用した。The water used was tap water.
脱脂工程は第1段としてHCI 1%水溶液を用い、
80℃、5分間処理をした後、よ(水洗し、第2段とし
て水酸化ナトリウム1%水溶液を用い、80℃、5分間
処理した後よく水洗した。The degreasing process uses a 1% HCI aqueous solution as the first step,
After being treated at 80°C for 5 minutes, it was washed with water. In the second stage, a 1% aqueous solution of sodium hydroxide was used, and after being treated at 80°C for 5 minutes, it was thoroughly washed with water.
感応化処理は、試薬特級のSnC1□・2H。Sensitization treatment is with reagent grade SnC1□2H.
Oを10g/E及び濃塩酸1mρ/ρとなるように水で
希釈し、感応化処理液とした。この処理液3.000m
βに対し、前処理したアクリル繊維50g(脱脂処理前
の重量)を入れ、所定温度(20℃、40℃、60℃、
80℃)で5分間処理し、よく水洗して活性化処理工程
へ送った。O was diluted with water to 10 g/E and concentrated hydrochloric acid 1 mρ/ρ to obtain a sensitized solution. This treatment liquid 3.000m
Add 50g of pretreated acrylic fiber (weight before degreasing) to
80° C.) for 5 minutes, thoroughly washed with water, and sent to the activation treatment step.
活性化処理は試薬特級のPdCl□・2H200,1g
/I2、濃塩酸1 m 9 / 9となるように水で希
釈し、活性化処理液とした。この処理液3゜000mI
2に対し、感応化処理したアクリル繊維50g (脱脂
処理前の重量)を入れ、所定温度(感応化処理と同温度
)で5分間処理し、よく水洗した。Activation treatment is performed using reagent grade PdCl□・2H200, 1g
/I2 and concentrated hydrochloric acid were diluted with water to 1 m 9 /9 to obtain an activation treatment solution. This treatment solution 3゜000mI
2, 50 g (weight before degreasing) of sensitized acrylic fiber was added, treated at a predetermined temperature (same temperature as the sensitization) for 5 minutes, and thoroughly washed with water.
この感応化処理、水洗、活性化処理、水洗の工程を1サ
イクルとし、1〜3サイクル行ない、前処理工程とした
。The steps of sensitization treatment, water washing, activation treatment, and water washing were defined as one cycle, and 1 to 3 cycles were performed to form a pretreatment step.
〈メッキ膜の安定性の試験〉 上記前処理済の被メッキ材料(アクリル繊維)を、 硫酸ニッケル 30g/l 酢酸ナトリウム 10g/j2 次亜リン酸カリウム lOg/l2 pH6の無電解メッキ浴を調製した。<Test of stability of plating film> The above pretreated material to be plated (acrylic fiber) is Nickel sulfate 30g/l Sodium acetate 10g/j2 Potassium hypophosphite lOg/l2 An electroless plating bath with pH 6 was prepared.
上記メッキ浴3000ccに対し、被メッキ材料として
のアクリル繊維50g (脱脂処理前の重量)を95℃
、5分間浸漬し、無電解メッキを行ない、よく水洗し、
乾燥してメッキ製品を得た。To 3000 cc of the above plating bath, 50 g of acrylic fiber (weight before degreasing) as the material to be plated was added at 95°C.
, soak for 5 minutes, perform electroless plating, rinse thoroughly with water,
It was dried to obtain a plated product.
このメッキ製品を80℃、6時間、ついで−20℃、1
8時間保持することを1サイクルとして5サイクル加熱
、冷却を繰返した後、この製品を水中に撹拌懸濁させ、
メッキの剥離状況を観察した。This plated product was heated to 80°C for 6 hours, then to -20°C for 1 hour.
After repeating heating and cooling for 5 cycles (one cycle is holding for 8 hours), this product is stirred and suspended in water.
The peeling status of the plating was observed.
結果を第1表に示す。The results are shown in Table 1.
第1表 X:沈殿が多量に見られ、繊維は脱色も見られた。Table 1 X: A large amount of precipitate was observed, and the fibers were also observed to be discolored.
△:わずかに沈殿が見られた。繊維の色は変化ない。Δ: Slight precipitation was observed. The color of the fibers does not change.
○:沈殿は見られない。○: No precipitate observed.
〈メッキ速度)
メッキ浴は、初めはニッケルとしての濃度15g/lで
あると不透明であるが、充分にメッキが行なわれると浴
はニッケル濃度0.4g/Pになり透明になる。この場
合の透明度になるまでの時間を前処理の感応化、活性化
サイクル及び同処理温度との関係を第2表に示す。メッ
キ条件はメッキ膜の安定性試験と同一である。(Plating speed) The plating bath is initially opaque at a nickel concentration of 15 g/l, but after sufficient plating, the bath becomes transparent with a nickel concentration of 0.4 g/P. Table 2 shows the relationship between the time required to achieve transparency in this case and the sensitization and activation cycles of the pretreatment and the treatment temperature. The plating conditions were the same as those for the stability test of the plating film.
第2表
以上のことから感応化、活性化処理温度を高くすること
により、無電解メッキ法の最大の欠陥の一つであるメッ
キ速度の小さいことをメッキ条件は同一であっても前処
理温度を変えることにより大幅に加速できることが確認
された。特に60℃以上の高温側での処理はこの効果は
大きい。As shown in Table 2, by increasing the sensitization and activation treatment temperature, the plating speed is low, which is one of the biggest drawbacks of electroless plating, even if the plating conditions are the same. It was confirmed that the process could be significantly accelerated by changing the . This effect is particularly significant when processing at a high temperature of 60° C. or higher.
[発明の効果]
無電解メッキの前処理として本発明方法を採用するとき
は、溶剤処理及びエツチング工程を省略できること、特
にエツチング工程に使用される6価クロムの使用を避け
られるためメッキ廃水処理への負荷を大きく軽減できる
。[Effects of the Invention] When the method of the present invention is adopted as a pretreatment for electroless plating, the solvent treatment and etching steps can be omitted, and in particular, the use of hexavalent chromium used in the etching process can be avoided, making it easier to treat plating wastewater. The load can be greatly reduced.
本発明方法においては使用する処理液は従来法に比し、
一般に濃度が薄くて済むことも洗浄水の減少、廃水処理
の軽減につながっている。そして工程の省略と共にコス
トダウンに大きく寄与するものである。In the method of the present invention, the processing liquid used is different from that in the conventional method.
In general, the fact that the concentration is low also leads to less washing water and wastewater treatment. In addition to omitting steps, this greatly contributes to cost reduction.
また、高温処理のためか、感応化処理、活性化処理も一
回で充分な前処理効果が得られ、廃水量の減少、工程数
の減少につながっている。Furthermore, perhaps due to the high temperature treatment, a sufficient pretreatment effect can be obtained with just one sensitization treatment and activation treatment, leading to a reduction in the amount of wastewater and the number of steps.
更に高温前処理は、理由は不明であるが、無電解メッキ
の欠点であるメッキ速度を大幅に増加させ、必要とする
時間を短縮でき、またこのようにして被覆されたメッキ
膜は加熱−冷却のテストにおいても付着強度が優れてお
り、良いメッキ膜が得られることも分かった。Furthermore, for reasons that are unclear, high-temperature pretreatment can significantly increase the plating speed and shorten the required time, which is a disadvantage of electroless plating. It was also found that the adhesion strength was excellent in the test, and that a good plating film could be obtained.
以上のごとく本発明方法による前処理を行なえば工程も
簡易化され、廃水量も少なくコストダウンも可能となり
、また得られるメッキ膜も良好な付着強度を示すことが
明らかとなった。As described above, it has been revealed that by performing the pretreatment according to the method of the present invention, the process is simplified, the amount of waste water is reduced, and costs can be reduced, and the resulting plating film also exhibits good adhesion strength.
Claims (3)
法の前処理において、少なくとも脱脂工程を稀薄な酸、
ついで稀薄なアルカリで被メッキ材料の軟化点以下の高
温で処理し、ついで感応化処理および活性化処理を40
℃と軟化点の間の温度において行なうことを特徴とする
無電解メッキ方法。(1) In the pretreatment of the electroless plating method for synthetic fibers or plastic products, at least the degreasing step is performed using dilute acid.
Next, it is treated with dilute alkali at a high temperature below the softening point of the material to be plated, and then sensitized and activated for 40 minutes.
An electroless plating method characterized by being carried out at a temperature between °C and the softening point.
〜20g/l、活性化処理液として塩化パラジウム2水
塩を0.01〜0.4g/lの範囲に含む溶液を使用す
る特許請求の範囲第1項の無電解メッキ方法。(2) Add 0.1 stannous chloride dihydrate as the sensitization treatment solution.
20 g/l, and the electroless plating method according to claim 1, wherein a solution containing palladium chloride dihydrate in the range of 0.01 to 0.4 g/l is used as the activation treatment liquid.
略した特許請求の範囲第1項の無電解メッキ方法。(3) The electroless plating method according to claim 1, in which solvent treatment and etching steps are omitted as pretreatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31482790A JPH04187777A (en) | 1990-11-20 | 1990-11-20 | Electroless plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31482790A JPH04187777A (en) | 1990-11-20 | 1990-11-20 | Electroless plating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04187777A true JPH04187777A (en) | 1992-07-06 |
Family
ID=18058077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31482790A Pending JPH04187777A (en) | 1990-11-20 | 1990-11-20 | Electroless plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04187777A (en) |
-
1990
- 1990-11-20 JP JP31482790A patent/JPH04187777A/en active Pending
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