JPH04195058A - Photosensitive body - Google Patents
Photosensitive bodyInfo
- Publication number
- JPH04195058A JPH04195058A JP32722890A JP32722890A JPH04195058A JP H04195058 A JPH04195058 A JP H04195058A JP 32722890 A JP32722890 A JP 32722890A JP 32722890 A JP32722890 A JP 32722890A JP H04195058 A JPH04195058 A JP H04195058A
- Authority
- JP
- Japan
- Prior art keywords
- group
- photoreceptor
- resin
- layer
- ucl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 239000011347 resin Substances 0.000 claims abstract description 32
- 239000004593 Epoxy Substances 0.000 claims abstract description 8
- 230000005855 radiation Effects 0.000 claims abstract description 3
- 108091008695 photoreceptors Proteins 0.000 claims description 52
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 1
- 239000011976 maleic acid Substances 0.000 claims 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 14
- 239000004065 semiconductor Substances 0.000 abstract description 13
- 238000002347 injection Methods 0.000 abstract description 9
- 239000007924 injection Substances 0.000 abstract description 9
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- 230000007423 decrease Effects 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract description 4
- 238000010030 laminating Methods 0.000 abstract description 3
- 230000004888 barrier function Effects 0.000 abstract description 2
- 239000000969 carrier Substances 0.000 abstract description 2
- 238000003847 radiation curing Methods 0.000 abstract 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 44
- 125000003118 aryl group Chemical group 0.000 description 23
- 238000000576 coating method Methods 0.000 description 23
- 125000000217 alkyl group Chemical group 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 22
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 15
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- 125000005843 halogen group Chemical group 0.000 description 11
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- 125000003277 amino group Chemical group 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000003710 aryl alkyl group Chemical group 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 5
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- 230000000903 blocking effect Effects 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
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- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 4
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- 238000012360 testing method Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
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- 229920000877 Melamine resin Polymers 0.000 description 3
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 102100039496 Choline transporter-like protein 4 Human genes 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 101000889282 Homo sapiens Choline transporter-like protein 4 Proteins 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 101100189554 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) PCL8 gene Proteins 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 231100000987 absorbed dose Toxicity 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
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- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
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- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 150000004866 oxadiazoles Chemical class 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
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- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
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- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- QLUXVUVEVXYICG-UHFFFAOYSA-N 1,1-dichloroethene;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C QLUXVUVEVXYICG-UHFFFAOYSA-N 0.000 description 1
- ZXBSSAFKXWFUMF-UHFFFAOYSA-N 1,2,3-trinitrofluoren-9-one Chemical compound C12=CC=CC=C2C(=O)C2=C1C=C([N+](=O)[O-])C([N+]([O-])=O)=C2[N+]([O-])=O ZXBSSAFKXWFUMF-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- NMNSBFYYVHREEE-UHFFFAOYSA-N 1,2-dinitroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C([N+]([O-])=O)C([N+](=O)[O-])=CC=C3C(=O)C2=C1 NMNSBFYYVHREEE-UHFFFAOYSA-N 0.000 description 1
- XVMIKRZPDSXBTP-UHFFFAOYSA-N 1,3-dibromobutan-2-one Chemical compound CC(Br)C(=O)CBr XVMIKRZPDSXBTP-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
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- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
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- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
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Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は感光体、特に電子写真感光体に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a photoreceptor, particularly an electrophotographic photoreceptor.
カールソン法の電子写真複写方法においては、感光体表
面に帯電させた後、露光によって静電潜像を形成すると
共に、その静電潜像をトナーによって現像し、ついでそ
の可視像を紙等に転写、定着させる。同時に、感光体は
付着トナーの除去や除電、表面の清浄化が施され、長期
にわたって反復使用される。In the Carlson electrophotographic copying method, after the surface of the photoreceptor is charged, an electrostatic latent image is formed by exposure, the electrostatic latent image is developed with toner, and then the visible image is transferred to paper or the like. Transfer and fix. At the same time, the photoreceptor is subjected to removal of adhering toner, neutralization of static electricity, and surface cleaning, and is used repeatedly over a long period of time.
従って、電子写真感光体としては、帯電特性及び感度が
良好で暗減衰か小さい等の電子写真特性は勿論であるが
、加えて繰返し使用での耐刷性、耐摩耗性、耐湿性など
の物理的性質や、コロナ放電時に発生するオゾン、露光
時の紫外線等への耐性(耐環境性)においても良好であ
ることが要求される。Therefore, as an electrophotographic photoreceptor, it is important not only to have electrophotographic properties such as good charging characteristics and sensitivity, and low dark decay, but also physical properties such as printing durability, abrasion resistance, and moisture resistance after repeated use. It is also required to have good physical properties and resistance to ozone generated during corona discharge, ultraviolet rays during exposure, etc. (environmental resistance).
従来、電子写真感光体としては、セレン、酸化亜鉛、硫
化カドミウム等の無機光導電性物質を主成分とする感光
体層を有する無機感光体が広く用いられている。Conventionally, inorganic photoreceptors having a photoreceptor layer containing an inorganic photoconductive substance such as selenium, zinc oxide, or cadmium sulfide as a main component have been widely used as electrophotographic photoreceptors.
一方、種々の有機光導電性物質を電子写真感光体の感光
体層の材料として利用することが近年活発に研究、開発
されている。On the other hand, the use of various organic photoconductive substances as materials for photoreceptor layers of electrophotographic photoreceptors has been actively researched and developed in recent years.
しかしながら、感度及び耐久性において必ずしも満足で
きるものではない。However, sensitivity and durability are not necessarily satisfactory.
二のために、感光層において、キャリア発生機能とキャ
リア輸送機能とを異なる物質に個別に分担させることに
より、感度か高くて耐久性の大きい所謂機能分離型更番
こ夫々の機能層を積層した有機感光体を開発する試みか
なされている。For the second purpose, in the photosensitive layer, the carrier generation function and the carrier transport function are assigned to different substances, so that the so-called functionally separated layers with high sensitivity and durability are laminated. Attempts have been made to develop organic photoreceptors.
このような機能分離型の電子写真感光体においては、各
機能を発揮する物質を広い範囲のものから選択すること
ができるので、任意の特性を有する電子写真感光体を比
較的容易に作製することが可能である。そのため、感度
が高く、耐久性の大きい有機感光体が得られることが期
待される。In such functionally separated electrophotographic photoreceptors, substances that exhibit each function can be selected from a wide range of materials, so it is relatively easy to produce an electrophotographic photoreceptor with arbitrary characteristics. is possible. Therefore, it is expected that an organic photoreceptor with high sensitivity and durability will be obtained.
第2図及び第4図は、こうした有機光導電性物質を用い
る機能分離型の積層電子写真感光体を示すものである。FIGS. 2 and 4 show a function-separated type laminated electrophotographic photoreceptor using such an organic photoconductive substance.
又、第3図は機能分離型単層電子写真感光体である。FIG. 3 shows a functionally separated single-layer electrophotographic photoreceptor.
この第2図の電子写真感光体は、導電性支持体1の上に
下引層(UCL)7、キャリア発生層(CGL)6、キ
ャリア輸氷層(CTL)4を順次積層して構成されてお
り、負帯電用として使用されているものである。即ち、
感光層(P CL)81;i CG L 6 トCT
L 4から構成されている。The electrophotographic photoreceptor shown in FIG. 2 is constructed by sequentially laminating an undercoating layer (UCL) 7, a carrier generation layer (CGL) 6, and a carrier transporting layer (CTL) 4 on a conductive support 1. It is used for negative charging. That is,
Photosensitive layer (P CL) 81; i CG L 6 to CT
It is composed of L4.
このような層構成を有する電子写真感光体においては、
負帯電性の場合に電子よりもポールの移動度か大きいこ
とから、良好な特性ををするホール輸送性の光導電材料
を使用でき、光感度等の点で有利である。In an electrophotographic photoreceptor having such a layer structure,
In the case of negative chargeability, the mobility of poles is greater than that of electrons, so a hole-transporting photoconductive material with good properties can be used, which is advantageous in terms of photosensitivity and the like.
次に第4図に正帯電用の感光体を示す。こうした積層型
感光体、特に有機光導電性物質を用いる感光体において
は、負帯電時に導電性支持体又は下層側からの不均一な
キャリア(ポール)注入が生じ易く、このために表面電
荷が微視的にみて消失し、あるいは減少してしまう。こ
れは特に、反転現像法において黒い斑点状の画像欠陥と
なり(黒斑点)、画像の品質を著しく低下させる。Next, FIG. 4 shows a photoreceptor for positive charging. In such laminated photoreceptors, especially photoreceptors using organic photoconductive materials, non-uniform carrier (pole) injection from the conductive support or lower layer side tends to occur when negatively charged, resulting in slight surface charge. It visually disappears or decreases. This results in image defects in the form of black spots (black spots), particularly in the reversal development method, which significantly reduces the quality of the image.
こうした黒斑点の問題は、ホール移動度の大きい有機系
光導電性物質を用いる感光体での特有の現象であり、こ
の原因は、上記したキャリア注入が不均一に生したこと
が考えられる。The problem of black spots is a phenomenon peculiar to photoreceptors using organic photoconductive materials with high hole mobility, and the cause of this problem is thought to be the non-uniform carrier injection described above.
そこで、導電性支持体1とPCLとの間にUCLを設け
、キャリア注入をブロッキングすることが提案されてい
る。Therefore, it has been proposed to provide a UCL between the conductive support 1 and the PCL to block carrier injection.
従来、UCL7を構成する材料としては、ポリエステル
系、ポリウレタン系、ポリアミド系、エポキン樹脂系、
ポリカーボネート系、ヒニルポリマー系例えばポリビニ
ルピリジンアクリル樹脂等、セルロース系、ポリケター
ル系、縮合重合系例えはフェノール樹脂、メラミン樹脂
等が知られている。しかしながら、上記の公知の下引層
では、十分lこ黒斑点抑制効果がない。しかも、ブロッ
キング性と感光体としての感度を双方とも良好にするこ
とは寅現されていない。即ち、従来採用されている樹脂
においては、ブロッキング性が有効で黒斑点抑制効果が
あると思われるものは感度が悪く、逆に、感度を良好に
しようとすると、ブロッキング性が不十分となり黒斑点
を十分に抑制することかできない。Conventionally, materials constituting UCL7 include polyester, polyurethane, polyamide, Epoquine resin,
Known materials include polycarbonate, vinyl polymer, such as polyvinylpyridine acrylic resin, cellulose, polyketal, and condensation polymer, such as phenol resin and melamine resin. However, the above-mentioned known undercoat layer does not have a sufficient effect of suppressing black spots. Moreover, it has not yet been demonstrated that both the blocking property and the sensitivity as a photoreceptor can be improved. In other words, among the resins conventionally used, those that have effective blocking properties and are thought to have the effect of suppressing black spots have poor sensitivity, and conversely, when trying to improve sensitivity, the blocking properties are insufficient and black spots appear. cannot be sufficiently suppressed.
さらに、重層塗布過程で問題が生じる。上層、下層のポ
リマーの溶解性が類似していれば、上層塗布時、下層の
一部が溶出し、上層と下層界面が乱れ塗布できなくなっ
たり、ディッピング塗布で塗布した場合、上層塗布槽が
一部下層構成成分で汚染されてしまい高価な上層塗布液
の寿命が短くなる他、感光体の電位特性も悪化させる。Additionally, problems arise during the multilayer coating process. If the solubility of the polymers in the upper and lower layers is similar, part of the lower layer will dissolve when the upper layer is applied, and the interface between the upper and lower layers will be disturbed and coating will not be possible, or if coating is done by dipping, the upper layer coating tank will be This not only shortens the life of the expensive upper layer coating solution but also deteriorates the potential characteristics of the photoreceptor due to contamination with the constituent components of the lower layer.
これらのことは、上層、下層のポリマーや溶媒に対して
厳しい処方制限を加えることになる。These factors impose strict prescription restrictions on the polymers and solvents in the upper and lower layers.
熱硬化性樹脂をUCLに適用した例もあるが、高い硬化
温度(少なくとも1.10 ′c以上)と比較的長い時
間(30分以上)が必要であるので生産性が悪化する。Although there are examples of applying thermosetting resins to UCL, productivity deteriorates because a high curing temperature (at least 1.10'C or more) and a relatively long time (30 minutes or more) are required.
又、硬化剤が混入した塗布液の安定性は本質的に悪くな
る。Moreover, the stability of the coating liquid mixed with the curing agent is essentially deteriorated.
更に接着性についても未だ充分でなく、支持体とUCL
との接着性以外に、UCL−上層間の接着性が悪いのが
現状である。Furthermore, the adhesion is still insufficient, and the support and UCL
At present, the adhesion between the UCL and the upper layer is poor in addition to the adhesion between the UCL and the upper layer.
又、近年、電子写真複写方法において、安価、小型で直
接変調できるなどの特徴を有する半導体レーザ光源か用
いられている。現在、半導体レーザとして広範にもちい
られているガリウム−アルミニウムー砒素(Ga−AI
−As)系発光素子は、発振波長が750nm程度以上
である。Furthermore, in recent years, semiconductor laser light sources have been used in electrophotographic copying methods, which are inexpensive, compact, and capable of direct modulation. Currently, gallium-aluminum-arsenide (Ga-AI) is widely used in semiconductor lasers.
-As) type light emitting element has an oscillation wavelength of about 750 nm or more.
こうしたレーザビーム等を用いる技術体系はプリンタへ
の応用が期待されているか、長波長光に高感度を有する
感光体が未だ開発されていないのが現状である。The technical system using such a laser beam or the like is expected to be applied to printers, but the current situation is that a photoreceptor having high sensitivity to long wavelength light has not yet been developed.
本発明の目的は、黒斑点等の画像欠陥を抑止でき、しか
も半導体レーザ等の比較的長波長の光に十分な感度を有
する感光体を提供することである。An object of the present invention is to provide a photoreceptor that can suppress image defects such as black spots and has sufficient sensitivity to relatively long wavelength light from semiconductor lasers and the like.
本発明の他の目的は、耐刷性、電位安定性、残留電位特
性に優れた感光体を提供することである。Another object of the present invention is to provide a photoreceptor with excellent printing durability, potential stability, and residual potential characteristics.
Tlこ本発明の他の目的は導電性支持体上に、少なくと
もUCL%PCLとが設けされている感光体に於て、塗
工性、接着性のよい感光体を提供することである。Another object of the present invention is to provide a photoreceptor having good coating properties and adhesion properties, in which at least UCL%PCL is provided on a conductive support.
本発明は導電性支持体上に少くとも下引層と感光層とが
設けられている感光体において、UCLがエポキ/系の
放射線硬化型樹脂によって形成することを特徴として構
成される。The present invention is a photoreceptor in which at least a subbing layer and a photosensitive layer are provided on a conductive support, and the UCL is formed of an epoxy/based radiation-curable resin.
本発明によれば、支持体上に設けられている下引層を前
記組成の重合体で形成していることが極めて重要である
。According to the present invention, it is extremely important that the undercoat layer provided on the support is formed of a polymer having the above composition.
上記樹脂は、基体との接着及び上層との接着が良好であ
り、かつ上層を塗工する際、下引層の樹脂か溶出するこ
ともないので、上層塗布液汚染による感光体の性能悪化
もみられないし、上層塗布液の寿命も長くなる。The above resin has good adhesion to the substrate and the upper layer, and when the upper layer is coated, the resin of the subbing layer does not elute, so there is no possibility of deterioration of the performance of the photoreceptor due to contamination of the upper layer coating solution. The life of the upper layer coating solution is also extended.
この重合体は、既述したごこく、ホール移動度の大きい
有機光導電性物質をPCLに用いたときに生じ易い支持
体からの不均一なポールの注入を効果的に防止するブロ
ッキング機能を有している。As mentioned above, this polymer has a blocking function that effectively prevents uneven pole injection from the support, which tends to occur when organic photoconductive materials with high hole mobility are used in PCL. are doing.
従って、この下引層の存在によって、支持体側からの局
所的なキャリア注入に対する障壁を設けることができ、
局所的なキャリア注入による表面電荷の消失、減少を阻
止できると考えられる。Therefore, the presence of this undercoat layer can provide a barrier to local carrier injection from the support side.
It is thought that it is possible to prevent the surface charge from disappearing or decreasing due to local carrier injection.
従って、特に反転現像を行った場合に画像上に黒斑点か
生ずることはなく、白斑点や画面肌荒れ、ピンホールの
発生もなく、画像欠陥のない高品質の画像を得るという
顕著な作用効果を奏することができる。Therefore, especially when reversal development is performed, there are no black spots on the image, no white spots, no rough edges, no pinholes, and a high-quality image without image defects. can play.
本発明に用いられるエポキシ系ポリマーとして、例えば
エポキシアクリレートの合成法としては、一般的にはエ
ポキシ化合物にアクリル酸又は末端カルボキンル基を有
するアクリレートを付加反応させて得られる。The epoxy polymer used in the present invention, for example, epoxy acrylate, is generally synthesized by adding acrylic acid or an acrylate having a terminal carboxyl group to an epoxy compound.
エポキシ化合物としては、
ビスフェノールAジグリシジルエーテル型、ノボラック
ポリグリシジルエーテル型、エボキン化油脂、
エボキン化ポリブタジェン、
脂肪酸変性エポキシ樹脂
などが使用される。As the epoxy compound, bisphenol A diglycidyl ether type, novolac polyglycidyl ether type, evoquinated oil and fat, evoquinated polybutadiene, fatty acid-modified epoxy resin, etc. are used.
これらは単独でも又、混合しても用いられる。These may be used alone or in combination.
アクリル系二重結合を有するエポキシ系樹脂の例として
は、
l。Examples of epoxy resins having acrylic double bonds include l.
本−CH2qOCOCHCH2 ビスコート#540 2 。Book-CH2qOCOCHCH2 Viscoat #540 2.
CH。CH.
CH=CH2 等がある。CH=CH2 etc.
本発明の化合物を用いるに当り、UV吸収率、硬化速度
を速める為、光重合開始剤を添加してもよい。この例と
しては、例えばベンゾインエーテル系、ベンジルケター
ル系、α−ヒドロキ/アセトフェノノン、タロルアセト
フェノン系、a−アミノアセトフェノン系、アシルポス
フィンオキサイド系、a−ジカルボニル系、a−アンル
オキシムエステル等がある。用いられる放射線としては
紫外線、電子線、X線、γ線などがあるが紫外線及び電
子線が好ましい。When using the compound of the present invention, a photopolymerization initiator may be added to increase UV absorption and curing speed. Examples include benzoin ethers, benzyl ketals, α-hydroxy/acetophenonones, talolacetophenones, a-aminoacetophenones, acylphosphine oxides, a-dicarbonyls, and a-anroxime esters. etc. Examples of the radiation that can be used include ultraviolet rays, electron beams, X-rays, and gamma rays, with ultraviolet rays and electron beams being preferred.
紫外線照射による硬化は、波長約2000〜4000
Aの紫外線を照射することによって行なわれる。又、紫
外線発生装置には、約50〜100W/cm出カの水銀
灯が好適である。電子線照射は加速電圧100〜750
KV、好ましくは150〜300KVの電子線加速器を
用いて吸収線量が2〜20Mradになるように行なわ
れる。Curing by ultraviolet irradiation has a wavelength of approximately 2000 to 4000
This is done by irradiating ultraviolet A. Furthermore, a mercury lamp with an output of about 50 to 100 W/cm is suitable for the ultraviolet ray generator. Electron beam irradiation uses an accelerating voltage of 100 to 750
It is carried out using an electron beam accelerator of KV, preferably 150 to 300 KV, so that the absorbed dose is 2 to 20 Mrad.
紫外線を用いる場合と、電子線を用いる場合との処方上
の差は、紫外線を用いる場合、光重合開始剤か必要なこ
とがある以外大きな差はない。There is no major difference in prescription between using ultraviolet rays and using electron beams, except that when using ultraviolet rays, a photopolymerization initiator may be required.
本発明におけるUCLは、2μm以下の薄い膜厚を有し
ていることか、ブロッキング性能を十分に発揮しつつ、
残留電位の抑制等の感光体性能を良好に保持する点で望
ましい。更に好ましくは0.2〜1.0μmである。The UCL in the present invention has a thin film thickness of 2 μm or less, and while exhibiting sufficient blocking performance,
This is desirable in terms of maintaining good photoreceptor performance such as suppression of residual potential. More preferably, it is 0.2 to 1.0 μm.
本発明の感光体は例えば第2図に示す構成からなってい
る。The photoreceptor of the present invention has the structure shown in FIG. 2, for example.
この感光体においては、導電性支持体(基体)1上に、
上記したUCL7を介してCGL6が設けられ、このC
GL5上にCTL4か設けられている。8はPCLを示
す。従って、CGL5と支持体lとの間にUCL7が設
けられているので、第8図に示す支持体側からの不均一
なホールの注入を効果的に阻止する一方、光照射時には
支持体側へ光キャリアである電子を効率良く輸送するこ
とかできる。In this photoreceptor, on a conductive support (substrate) 1,
CGL6 is provided via the above-described UCL7, and this CGL6 is provided via the above-mentioned UCL7.
CTL4 is provided on GL5. 8 indicates PCL. Therefore, since the UCL 7 is provided between the CGL 5 and the support l, it effectively prevents the injection of non-uniform holes from the support side as shown in FIG. It is possible to transport electrons efficiently.
なお、本発明の感光体は、上記した構成(即ち、CGL
上にCTLを積層)以外にも、第3図のように、キャリ
ア発生物質(CGM)とキャリア輸送物質(CT〜1)
を混合した単一層のPCL8からなっていてもよい。又
、第4図のように、CGL6とCTL4とを上下逆にし
た層構成(正帯電用)としてもよい。又、本発明の感光
体において、耐刷性向上等のため感光体表面に保護層(
保護層;0CL)を形成しても良く、例えば合成樹脂被
膜をコーティングして良い。Note that the photoreceptor of the present invention has the above-described structure (i.e., CGL
In addition to stacking CTL on top), as shown in Figure 3, carrier generating material (CGM) and carrier transporting material (CT~1)
It may consist of a single layer of PCL8 mixed with. Alternatively, as shown in FIG. 4, the layer structure may be such that the CGL6 and CTL4 are turned upside down (for positive charging). In addition, in the photoreceptor of the present invention, a protective layer (
A protective layer (0CL) may be formed, for example, a synthetic resin film may be coated.
次に、本発明の感光体に使用するCGMを一般式で示す
。Next, CGM used in the photoreceptor of the present invention is shown by a general formula.
1、多環キノン顔料
(1)アントアントロン顔料
一般式(GIN:
(2) ジベンスピレンキノン顔料
一般式〔G2〕 :
(3)ピラントロン顔料
一般式CG3〕 :
上記において、
X:ハロゲン原子、ニトロ基、シアノ基、アシル基、又
はカルボキシル基。1. Polycyclic quinone pigment (1) Anthorone pigment general formula (GIN: (2) Dibenspirene quinone pigment general formula [G2]: (3) Pyranthrone pigment general formula CG3]: In the above, X: halogen atom, nitro group, cyano group, acyl group, or carboxyl group.
n=0〜4
m=0〜6
2.7ズレニウム化合物
アズレニウム化合物は例えば下記公報記載の化金物であ
る。n=0-4 m=0-6 2.7 Zulenium Compound The azulenium compound is, for example, a metal compound described in the following publication.
(イ)特開昭61−1547
(ロ) 同 61−1548
(ハ) 同 6l−15147
(ニ) 同 6l−15150
(ホ) 同 61−15151
アズレニウム化合物の具体例としては、例えば下記一般
式のものが挙げられる。(a) JP 61-1547 (b) JP 61-1548 (c) JP 61-15147 (d) JP 61-15150 (e) JP 61-15151 Specific examples of azulenium compounds include those of the following general formula. Things can be mentioned.
一般式〔G4〕 :
但し、上記一般式中、
8口、R”、RI3、R14、R”、R16、R17:
水素原子、ハロゲン原子、又は有機残基を表す。又、R
”とR12、R12とR13、R目と814% 8口と
R15、RISとR目、R”とRI7の組合せのうち、
いずれか1つの組合せで置換又は無置換の縮合環を形成
しても良い。General formula [G4]: However, in the above general formula, 8 units, R", RI3, R14, R", R16, R17:
Represents a hydrogen atom, a halogen atom, or an organic residue. Also, R
Among the combinations of "and R12, R12 and R13, R eye and 814%, 8 mouths and R15, RIS and R eye, R" and RI7,
Any one combination may form a substituted or unsubstituted condensed ring.
Ar’、Ar2ニアリール基を表す。Ar', Ar2 represents a nialyl group.
RIB、R1!、置換若しくは無置換の統記3種の基;
アルキル基、アリール基、アラJレキル基を表す。又、
R18とR19とで窒素原子と共番こ環を形成しても良
い。RIB, R1! , substituted or unsubstituted syntactic three types of groups;
Represents an alkyl group, an aryl group, and an araJrekyl group. or,
R18 and R19 may form a symcyclic ring with the nitrogen atom.
L lit 、アニオン残基を表す。L lit represents an anion residue.
かかるアズレニウム塩の代表的具体例として1よ、次の
ものが挙げられる。Typical specific examples of such azulenium salts include the following.
3、ンアニン色素
ノアニン色素は公知であり、例えば特開昭58−118
650号、同58−224354号、同59−1460
6号記載の化′合物がある。3. Noanine dye Noanine dye is known, for example, disclosed in JP-A-58-118.
No. 650, No. 58-224354, No. 59-1460
There is a compound described in No. 6.
4、フタロンアニン化合物
有機系光導電材料の一つであるフタロシアニン系化合物
は、他のものに比べ感光域が長波長域に拡大しているこ
とが知られている。そしてα型のフタロンアニン化合物
が結晶形の安定なβ型の7タロンアニン化合物に変わる
過程で各種結晶形のフタロンアニン化合物が見出されて
いる。4. Phthalonanine Compound Phthalocyanine compounds, which are one of the organic photoconductive materials, are known to have a photosensitive range extended to longer wavelengths than other compounds. Various crystalline forms of phthalonanine compounds have been discovered in the process of converting α-type phthalonanine compounds into stable crystalline β-type 7-talonanine compounds.
これらの光導電性を示すフタロシアニン系化合物として
は、例えば特公昭49−4338号記載のX型無金属フ
タロシアニン化合物、特開昭58−182639号、同
60−19151号に記載されているτ、τ′、111
′型無金属フタロンアニン化合物、特開昭63−148
269号に記載されているフタロシアニン化合物等の他
、各種の金属フタロシアニン化合物が例示される。Examples of these phthalocyanine compounds exhibiting photoconductivity include X-type metal-free phthalocyanine compounds described in Japanese Patent Publication No. 49-4338, τ and τ described in JP-A Nos. 58-182639 and 60-19151. ', 111
' type metal-free phthalonanine compound, JP-A-63-148
In addition to the phthalocyanine compounds described in No. 269, various metal phthalocyanine compounds are exemplified.
例えばチタルフタロシアニン化合物について特願昭62
−241938号に記載されているものがある。For example, a patent application was filed in 1983 regarding titalphthalocyanine compounds.
There is one described in No.-241938.
この他、特に半導体レーザに好適なフタロシアフタロシ
アニン例示化合物
5.7ゾ化合物
ジスアゾ化合物として、下記一般式に示すものが例示さ
れる。In addition, examples of phthalocyanophthalocyanine exemplified compounds 5.7zo compounds and disazo compounds particularly suitable for semiconductor lasers include those shown in the following general formula.
一般式[G6):
%式%
又、その他のアゾ化合物として、下記各一般式に示すも
のがある。General formula [G6): %Formula% In addition, as other azo compounds, there are those shown in the following general formulas.
一般式(G7):
%式%
一般式(G8):
Cp−N=N−Ar”−N−N−Ar’−N=N−Cp
一般式(G9:l :
Cp−N −N−Ar5−N −N−Ar’−N −N
−Ar’−N = N −Cp但し、Ar3、Ar’、
Ar’は、それぞれ蓋換若しくは無置換の次記2種の基
;炭素環式芳香族環基、複素環式芳香族環基を表す。General formula (G7): %Formula% General formula (G8): Cp-N=N-Ar"-N-N-Ar'-N=N-Cp
General formula (G9:l: Cp-N-N-Ar5-N-N-Ar'-N-N
-Ar'-N = N -CpHowever, Ar3, Ar',
Ar' represents the following two groups, each of which is capsubstituted or unsubstituted; a carbocyclic aromatic ring group and a heterocyclic aromatic ring group.
更に、Ar3、Ar’、Ar’の具体例を例示すると、
又、cpcカプラー)としては、例えば次のようなもの
がある。Furthermore, specific examples of Ar3, Ar', and Ar' are given below:
Examples of CPC couplers include the following.
但し、Aとしては、
CGLにおいて、CGMのバインダ物質に対する含有量
比は5/l −1/10とするのが好ましく、3/l〜
1/3とすると更に好ましい。However, as for A, in CGL, the content ratio of CGM to the binder substance is preferably 5/l - 1/10, and 3/l to 1/10.
It is more preferable to set it to 1/3.
CGMの含有量比が上記範囲より大きいと黒斑点等が現
れ易くなる。但し、CGMの割合があまり小さいと却っ
て光感度等が低下してしまう。When the content ratio of CGM is larger than the above range, black spots etc. tend to appear. However, if the proportion of CGM is too small, the photosensitivity etc. will actually decrease.
CGLの膜厚は0.1−10μm以上とすることが好ま
しく、0.2〜5μmの範囲内とすることがより好まし
い。CTLの膜厚は10μm以上であることか好ましい
。The thickness of the CGL is preferably 0.1-10 μm or more, more preferably 0.2-5 μm. It is preferable that the thickness of the CTL is 10 μm or more.
感光層全体の膜厚は10〜40μmの範囲内とするのが
好ましく、15〜30μmの範囲内とすると更に好まし
い。この膜厚が上記範囲内よりも小さいと、薄いために
帯電電位が小さくなり、耐刷性も低下する傾向がある。The thickness of the entire photosensitive layer is preferably within the range of 10 to 40 μm, and more preferably within the range of 15 to 30 μm. If the film thickness is smaller than the above range, the charging potential will be low due to the thinness, and the printing durability will also tend to decrease.
又、膜厚が上記範囲よりも大きいと、却って残留電位は
上昇する上に、上記したCGLが厚すぎる場合と同様に
キャリア移動途中でトラ7プサイトにつかまり、十分な
輸送能が得がたくなる傾向が現れ、このため繰返し使用
時には残留電位の上昇が起こり易くなる。Moreover, if the film thickness is larger than the above range, the residual potential will increase on the contrary, and, as in the case where the CGL is too thick, carriers will be caught by trap7 psite during movement, making it difficult to obtain sufficient transport ability. Therefore, the residual potential tends to increase during repeated use.
CGL中にCTMをも含有せしめることも可能である。It is also possible to include CTM in CGL.
粒状のCGMを分散せしめてPCLを形成する場合にお
いては、該CGMは2IIm以下、好ましくは1μm以
下、更に好ましくは0.5μm以下の平均粒径の粉粒体
とされるのが好ましい。When PCL is formed by dispersing granular CGM, the CGM is preferably in the form of powder with an average particle size of 2IIm or less, preferably 1 μm or less, and more preferably 0.5 μm or less.
又、キャリア輸送層において、キャリア輸送物質は、バ
インダ物質との相溶性に優れたものが好ましい。Further, in the carrier transport layer, the carrier transport substance preferably has excellent compatibility with the binder substance.
これにより、バインダ物質に対する量を多くしても濁り
及び不透明化を生ずることがないので、バインダ物質と
の混合割合を非常に広くとることができ、又、相溶性が
優れていることから電荷発生層が均一、かつ安定であり
、結果的に感度、帯電特性がより良好となり、更に高感
度で鮮明な画像を形成できる感光体をうろことができる
。As a result, turbidity and opacity do not occur even if the amount of the binder substance is increased, so the mixing ratio with the binder substance can be set at a very wide range. The layer is uniform and stable, resulting in better sensitivity and charging characteristics, and a photoreceptor that can form clear images with higher sensitivity can be used.
更に、特に反復転写式電子写真に用いたとき、疲労劣化
を生ずることが少ないという作用効果を奏することがで
きる。Furthermore, especially when used in repeated transfer type electrophotography, it is possible to achieve the effect that fatigue deterioration is less likely to occur.
本発明で使用可能なCTMは、カルバゾール誘導体、オ
キサゾール誘導体、オキサジアゾール誘導体、チアゾー
ル誘導体、チアジアゾール誘導体、トリアゾール誘導体
、イミダゾール誘導体、イミダゾロン誘導体、イミダゾ
リジン誘導体、ビスイミダゾリジン誘導体、スチリル化
合物、ヒドラゾン化合物、ピラゾリン誘導体、オキサシ
ロン誘導体、ベンゾチアゾール誘導体、ベンズイミダゾ
ール誘導体、キナゾリン誘導体、ベンゾフラン誘導体、
アクリジン誘導体、7工ナジン誘導体、アミノスチルベ
ン誘導体、トリアリールアミン銹導体、フェニレンジア
ミン誘導体、スチルベン誘導体、ポリ−N−ビニルカル
バゾール、ポリ−1−ビニルピレン、ポリ−9−ビニル
アントラセン等から選ばれた1種又は2種以上であって
よい。CTMs that can be used in the present invention include carbazole derivatives, oxazole derivatives, oxadiazole derivatives, thiazole derivatives, thiadiazole derivatives, triazole derivatives, imidazole derivatives, imidazolone derivatives, imidazolidine derivatives, bisimidazolidine derivatives, styryl compounds, hydrazone compounds, Pyrazoline derivatives, oxacilone derivatives, benzothiazole derivatives, benzimidazole derivatives, quinazoline derivatives, benzofuran derivatives,
1 selected from acridine derivatives, heptanazine derivatives, aminostilbene derivatives, triarylamine conductors, phenylenediamine derivatives, stilbene derivatives, poly-N-vinylcarbazole, poly-1-vinylpyrene, poly-9-vinylanthracene, etc. It may be one species or two or more species.
かかるキャリア輸送物質の具体的化合物例は特開昭63
−50851号に記載されている。Specific examples of such carrier transport substances are disclosed in JP-A-63
-50851.
以下l二その一般式を掲げる。The general formula is listed below.
キャリア輸送物質として次の一般式(TI)又は〔T2
〕のスチリル化合物が使用可能である。The following general formula (TI) or [T2
] styryl compounds can be used.
一般式(TI):
但し、この−数式中、
R11、His、置換若しくは無置換ま2種の基:アル
キル基、アリール基を表し、
置換基としてはアルキル基、アル
コキシ基、置換アミノ基、水酸基、
ハロゲン原子、アリール基を用い
る。General formula (TI): However, in this formula, R11, His, substituted or unsubstituted, represents two types of groups: an alkyl group, an aryl group, and the substituents include an alkyl group, an alkoxy group, a substituted amino group, and a hydroxyl group. , a halogen atom, and an aryl group are used.
Ar”、Ar”:置換若しくは無置換のアリール基を表
し、置換基としてアルキル
基、アルコキシ基、置換アミノ基、
水酸基、ハロゲン原子、アリール
基を用いる。Ar", Ar": represents a substituted or unsubstituted aryl group, and an alkyl group, alkoxy group, substituted amino group, hydroxyl group, halogen atom, or aryl group is used as a substituent.
R13、R26:置換若しくは無置換のアリール基、水
素原子を表し、置換基としては
アルキル基、アルコキシ基、置換
アミノ基、水酸基、ノ)ロゲン原子、
アリール基を用いる。R13, R26: Represents a substituted or unsubstituted aryl group or hydrogen atom, and as a substituent, an alkyl group, an alkoxy group, a substituted amino group, a hydroxyl group, a halogen atom, or an aryl group is used.
一般式(T2):
但し、この−数式中、
R25:置換若しくは無置換のアリール基、R26:水
素原子、ノ・ロケン原子、置換若しくは無置換の3種の
基:アルキ
ル基、アルコキン基、アミノ基及
び水酸基、
R27:置換若しくは無置換の2種の基;アルキル基、
複素環基を表す。General formula (T2): However, in this formula, R25: substituted or unsubstituted aryl group, R26: hydrogen atom, hydrogen atom, three types of substituted or unsubstituted groups: alkyl group, alkokene group, amino group and hydroxyl group, R27: two types of substituted or unsubstituted groups; alkyl group,
Represents a heterocyclic group.
又、CTMとして次の一般式〔T3〕、〔T4〕、〔T
4a〕、(T4b)又は〔T5〕のヒドラゾン化合物も
使用可能である。In addition, as CTM, the following general formulas [T3], [T4], [T
4a], (T4b) or [T5] can also be used.
一般式CT3):
但し、この−数式中、
Rjj及びR2′:それぞれ水素原子又はハロゲン原子
、
R,30及びR31・それぞれ置換若しくは無置換のア
リール基、
Ar17:置換若しくは無置換のアリール基を表す。General formula CT3): However, in this formula, Rjj and R2': each represent a hydrogen atom or a halogen atom, R, 30 and R31 each represent a substituted or unsubstituted aryl group, Ar17: represents a substituted or unsubstituted aryl group .
一般式(T4):
但し、この−数式中、
R32:R換若しくは無置換の3種の基、カルバゾリル
基、複素環基を表し、
R33、R″4及びR3s:水素原子、アルキル基ニア
リール基、置換若しくは無置換
の2種の基;アリール基、アラル
キル基を表す。General formula (T4): However, in this formula, R32: represents three types of R-substituted or unsubstituted groups, a carbazolyl group, and a heterocyclic group; R33, R″4, and R3s: a hydrogen atom, an alkyl group, and a diaryl group. , represents two types of substituted or unsubstituted groups; an aryl group and an aralkyl group.
一般式(T4a):
但し、この−数式中、
R3′=メチル基、エチル基、2−ヒドロキシエチル基
又は2−クロルエチル
基、
R37:メチル基、エチル基、ベンジル基又はフェニル
基、
R38:メチル基、エチル基、ベンジル基又はフェニル
基を示す。General formula (T4a): However, in this formula, R3' = methyl group, ethyl group, 2-hydroxyethyl group, or 2-chloroethyl group, R37: methyl group, ethyl group, benzyl group, or phenyl group, R38: methyl group, ethyl group, benzyl group or phenyl group.
但し、この−数式中、R31は置換若しくは無置換のす
7チル基;R4″は置換若しくは無置換のアルキル基、
アラルキル基、アリール基;R41は水素原子、アルキ
ル基又はアリール基;R42及びR13は置換若しくは
無置換のアルキル基、アラルキル基又はアリール基から
なる互いに同一の若しくは異なる基を示す。However, in this formula, R31 is a substituted or unsubstituted 7-tyl group; R4'' is a substituted or unsubstituted alkyl group,
Aralkyl group, aryl group; R41 is a hydrogen atom, alkyl group or aryl group; R42 and R13 are the same or different groups consisting of a substituted or unsubstituted alkyl group, aralkyl group or aryl group.
一般式(T5):
但し、この一般式中、
R′4=置換若しくは無置換の2種の基ニアリール基、
複素環基、
R4S、水素原子、置換若しくは無置換の2種の基;ア
ルキル基、アリール
基、
Q : 水素原子、ハロゲン原子、アルキル基、置換ア
ミノ基、アルコキシ
基又はシアノ基、
Sho又はlの整数を表す。General formula (T5): However, in this general formula, R'4 = two types of substituted or unsubstituted groups, nialyl group,
Heterocyclic group, R4S, hydrogen atom, two types of substituted or unsubstituted groups; alkyl group, aryl group, Q: hydrogen atom, halogen atom, alkyl group, substituted amino group, alkoxy group or cyano group, Sho or l Represents an integer.
又、CTMとして、次の一般式〔T6〕のピアゾリン化
合物も使用可能である。Furthermore, a piazoline compound represented by the following general formula [T6] can also be used as the CTM.
一般式(T6):
但し、この一般式中、
l:0又は11
R46及びR47:置換若しくは無置換のアリール基、
R4a=置換若しくは無置換のアリール基若しくは複素
環基、
R49及びR50:水素原子、炭素原子数1〜4のアル
キル基、又は置換若しくは装置
換のアリール基若しくはアラルキ
ル基(但し、R49及びROGは共に
水素原子であることはなく、又前
記lが0のときはR4sは水素原子
ではない。)
更に、次の一般式〔T7〕のアミン誘導体もCTMとし
て使用できる。General formula (T6): However, in this general formula, l: 0 or 11 R46 and R47: substituted or unsubstituted aryl group,
R4a = substituted or unsubstituted aryl group or heterocyclic group, R49 and R50: hydrogen atom, alkyl group having 1 to 4 carbon atoms, or substituted or device-substituted aryl group or aralkyl group (however, R49 and ROG are both (R4s is not a hydrogen atom, and when l is 0, R4s is not a hydrogen atom.) Furthermore, an amine derivative of the following general formula [T7] can also be used as a CTM.
一般式(T7):
但し、この一般式中、
A「16、Ar”:置換若しくは無置換のフェニル基を
表し、置換基としてはハロゲン
原子、アルキル基、ニトロ基、ア
ルコキシ基を用いる。General formula (T7): However, in this general formula, A "16, Ar": represents a substituted or unsubstituted phenyl group, and a halogen atom, an alkyl group, a nitro group, or an alkoxy group is used as a substituent.
A S’ :置換若しくは無置換のフェニル基、ナフチ
ル基、アントリル基、フル
オレニル基、複素環基を表し、置
換基としてはアルキル基、アルコ
キシ基、ハロゲン原子、水酸基、
アリールオキシ基、アリール基、
アミノ基、ニトロ基、ピペリジノ
基、モルホリノ基、ナフチル基、
アンスリル基及び置換アミノ基を
用いる。A S': Represents a substituted or unsubstituted phenyl group, naphthyl group, anthryl group, fluorenyl group, or heterocyclic group, and substituents include an alkyl group, an alkoxy group, a halogen atom, a hydroxyl group, an aryloxy group, an aryl group, and an amino group. group, nitro group, piperidino group, morpholino group, naphthyl group, anthryl group and substituted amino group.
但し、置換アミノ基の置換基と してアシル基、アルキル基、アリ ール基を用いる。However, the substituent of the substituted amino group acyl group, alkyl group, ali Uses a metal group.
更に、次の一般式〔T8〕の化合物もCTMとして使用
できる。Furthermore, a compound of the following general formula [T8] can also be used as a CTM.
一般式(T8): %式% 但し、この一般式中、 Ar”:置換又は無置換のアリーレン 基を表し、 R51、B、sx、R53及ヒR64 :置換若しくは無置換の3種の基; アルキル基、アリール基、アラル キル基を表す。General formula (T8): %formula% However, in this general formula, Ar”: substituted or unsubstituted arylene represents the group, R51, B, sx, R53 and R64 : Three types of substituted or unsubstituted groups; Alkyl group, aryl group, aral Represents a kill group.
更に、次に一般式〔T9〕の化合物もCTMとして使用
できる。Furthermore, the compound of general formula [T9] can also be used as a CTM.
一般式(T9):
但シ、コノ一般式中、Hss、R56、RS7及ヒRs
aは、それぞれ水素原子、置換若しくは無置換のアルキ
ル基、シクロアルキル基、アルケニル基、アリール基、
ヘンシル基又はアラルキル基、R”及びHieは、それ
ぞれ水素原子、置換若しくは無置換の炭素原子数1〜4
oのアルキル基、シクロアルキル基、アルケニル基、シ
クロアルケニル基、アリール基又はアラルキル基(但し
、Rb2とR2Oとが共同して炭素原子数3〜10の飽
和若しくは無飽和の炭化水素環を形成してもよい。)
R61、R62、R63及びRb4は、それぞれ水素原
子、ハロゲン原子、ヒドロキン基、置換若しくは無置換
のアルキル基、シクロアルキル基、アルケニル基、アリ
ール基、アラルキル基、アルコキシ基、アミノ基、アル
キルアミノ基又はアリールアミノ基である。General formula (T9): However, in the general formula, Hss, R56, RS7 and HiRs
a is a hydrogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkenyl group, an aryl group,
Hensyl group or aralkyl group, R'' and Hie are each a hydrogen atom, a substituted or unsubstituted carbon atom number of 1 to 4
o alkyl group, cycloalkyl group, alkenyl group, cycloalkenyl group, aryl group or aralkyl group (provided that Rb2 and R2O jointly form a saturated or unsaturated hydrocarbon ring having 3 to 10 carbon atoms) ) R61, R62, R63 and Rb4 each represent a hydrogen atom, a halogen atom, a hydroquine group, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, or an amino group. , an alkylamino group or an arylamino group.
CTL、CGL中に酸化防止剤を含有せしめることがで
きる。An antioxidant can be contained in CTL and CGL.
これにより放電で発生するオゾンの影響を抑制でき、繰
返し使用時の残留電位上昇や帯電電位の低下を防止でき
る。This can suppress the influence of ozone generated during discharge, and can prevent an increase in residual potential and a decrease in charged potential during repeated use.
酸化防止剤としては、ヒンダードフェノール、ヒンダー
ドアミン、パラフェニレンジアミン、アリールアルカン
、ハイドロキノン、スピロクロマン、スピロインダノン
及びそれらの誘導体、有機硫黄化合物、有機燐化合物等
が挙げられる。Examples of the antioxidant include hindered phenol, hindered amine, paraphenylene diamine, aryl alkane, hydroquinone, spirochroman, spiroindanone and derivatives thereof, organic sulfur compounds, organic phosphorus compounds, and the like.
これらの具体的化合物としては、特開昭63−4466
2号、同63−14153号、同63−50849号、
同63−18355号、同63−58455号、同63
−71856号、同63−71855号及び同66−1
46046号に記載がある。These specific compounds are disclosed in Japanese Patent Application Laid-Open No. 63-4466.
No. 2, No. 63-14153, No. 63-50849,
No. 63-18355, No. 63-58455, No. 63
-71856, 63-71855 and 66-1
It is described in No. 46046.
感光層中に高分子半導体を含有せしめることもできる。A polymer semiconductor can also be included in the photosensitive layer.
こうした高分子有機半導体のうちポリ−N−上ニルカル
バゾール又はその半導体か効果が大であり、好ましく用
いられる。かかるポリ−N−上ニルカルバゾール誘導体
とは、その繰返し単位における全部又は一部のカルバゾ
ール環が種々の置換基、例えばアルキル基、ニトロ基、
アミノ基、ヒドロキン基又はハロゲン原子によって置換
されたものである。Among these polymeric organic semiconductors, poly-N-onylcarbazole or its semiconductor is most effective and is preferably used. Such poly-N-onylcarbazole derivatives mean that all or part of the carbazole ring in the repeating unit has various substituents, such as an alkyl group, a nitro group,
Substituted with an amino group, a hydroquine group, or a halogen atom.
又、感光層内に感度の向上、残留電位ないし反復使用時
の疲労低減等を目的として、少なくとも1種の電子受容
性物質を含有せしめることができる。Further, at least one electron-accepting substance may be contained in the photosensitive layer for the purpose of improving sensitivity, reducing residual potential or fatigue during repeated use, and the like.
本発明の感光体に使用可能な電子受容性物質としては、
例えば無水琥珀醋酸、無水マレイン酸、ジブロム無水マ
レイン酸、無水フタル酸、テトラクロル無水フタル酸、
テトラブロム無水フタル酸、3−ニトロ無水フタル酸、
4−ニトロ無水フタル酸、無水ピロメリット酸、無水メ
リット酸、テトラシアノエチレン、テトラシアノキノジ
メタン、0−ジニトロベンゼン、m−ジニトロベンゼン
、1,3.5−トリニトロベンゼン、パラニトロベンゾ
ニトリル、ピクリルクロライド、キノンクロルイミド、
クロラニル、ブルマニル、2−メチルナフトキノン、ジ
クロルジシアノパラベンゾキノン、アントラキノン、ジ
ニトロアントラキノン、トリニトロフルオレノン、9−
フルオレニリデンー〔ジシアノメチレンマロノジニトリ
ル〕、ポリニトロ−9−フルオレニリデンー〔ジシアノ
メチリンマロノジニトリル〕、ピクリン酸、0−ニトロ
安息香酸、p−ニトロ安息香酸、3,5−ジニトロ安息
香酸、ペンタフルオル安息香酸、5−ニトロサリチル酸
、3,5−ジニトロサリチル酸、フタル酸、メリット酸
、その他の電子親和力の大きい化合物の一種又は二種以
上を挙げることができる。これらのうち、フルオレノン
系、キノン系やCL CN、 NO2等の電子吸引性の
置換基のあるベンゼン誘導体が特によい。Electron-accepting substances that can be used in the photoreceptor of the present invention include:
For example, succinic anhydride, maleic anhydride, dibromaleic anhydride, phthalic anhydride, tetrachlorophthalic anhydride,
Tetrabromo phthalic anhydride, 3-nitro phthalic anhydride,
4-nitrophthalic anhydride, pyromellitic anhydride, mellitic anhydride, tetracyanoethylene, tetracyanoquinodimethane, 0-dinitrobenzene, m-dinitrobenzene, 1,3.5-trinitrobenzene, paranitrobenzonitrile, Picryl chloride, quinone chlorimide,
Chloranil, brumanil, 2-methylnaphthoquinone, dichlordicyanoparabenzoquinone, anthraquinone, dinitroanthraquinone, trinitrofluorenone, 9-
Fluorenylidene [dicyanomethylene malonodinitrile], polynitro-9-fluorenylidene [dicyanomethylene malonodinitrile], picric acid, 0-nitrobenzoic acid, p-nitrobenzoic acid, 3,5-dinitrobenzoic acid Examples include one or more compounds having a large electron affinity, such as pentafluorobenzoic acid, 5-nitrosalicylic acid, 3,5-dinitrosalicylic acid, phthalic acid, mellitic acid, and other compounds. Among these, fluorenone series, quinone series, and benzene derivatives having electron-withdrawing substituents such as CLCN and NO2 are particularly preferred.
又、更に表面改質剤としてシリコーンオイル、弗素系界
面活性剤を存在させてもよい。又、耐久性向上剤として
アンモニウム化合物が含有されていてもよい。Furthermore, silicone oil or fluorine-based surfactant may be present as a surface modifier. Further, an ammonium compound may be contained as a durability improver.
更に紫外線吸収剤用いてもよい。Furthermore, an ultraviolet absorber may be used.
好ましい紫外線吸収剤としては、安息香酸、スチルベン
化合物等及びその誘導体、トリアゾール化合物、イミダ
ゾール化合物、トリアジン化合物、クマリン化合物、オ
キサジアゾール化合物、チアゾール化合物及びその誘導
体等の含窒素化合物類が用いられる。Preferred ultraviolet absorbers include nitrogen-containing compounds such as benzoic acid, stilbene compounds and derivatives thereof, triazole compounds, imidazole compounds, triazine compounds, coumarin compounds, oxadiazole compounds, thiazole compounds and derivatives thereof.
感光体の構成層に使用可能なバインダ樹脂としては、例
えばポリエチレン、ポリプロピレン、アクリル樹脂、メ
タクリル樹脂、塩化ビニル樹脂、酢酸ビニル樹脂、エボ
キン樹脂、ポリウレタン樹脂、ポリエステル樹脂、アル
キッド樹脂、ポリカーボネート樹脂、メラミン樹脂、メ
タクリル樹脂、アクリル樹脂、ポリ塩化ビリニデン、ポ
リスチレン等の付加重合型樹脂、重付加型樹脂、重縮合
型樹脂並びにこれらの繰返し単位のうち2つ以上を含む
共重合体樹脂、塩化ビニル−酢酸ビニル共重合体樹脂等
の絶縁性樹脂、スチレン−ブタジェン共重合体樹脂、塩
化ビニリデン−アクリロニトリル共重合体樹脂等、更に
はN−ビニルカンノくゾール等の高分子有機半導体、変
性ンリコーン樹脂等を挙げることができる。Examples of binder resins that can be used in the constituent layers of the photoreceptor include polyethylene, polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, vinyl acetate resin, Evokin resin, polyurethane resin, polyester resin, alkyd resin, polycarbonate resin, and melamine resin. , addition polymer resins such as methacrylic resins, acrylic resins, polyvinidene chloride, polystyrene, polyaddition resins, polycondensation resins, copolymer resins containing two or more of these repeating units, vinyl chloride-vinyl acetate Examples include insulating resins such as copolymer resins, styrene-butadiene copolymer resins, vinylidene chloride-acrylonitrile copolymer resins, polymeric organic semiconductors such as N-vinylcannoxol, modified linicone resins, etc. can.
上記のバインダは、単独であるいは2種以上の混合物と
して用いることができる。The above binders can be used alone or as a mixture of two or more.
必要に応じて設けられる保護層のバインダとしては、体
積抵抗108Ω・cm以上、好ましくはlOl。The binder for the protective layer provided if necessary has a volume resistivity of 108 Ω·cm or more, preferably 1Ol.
Ω・cm以上、より好ましくは1013Ω・cm以上の
透明樹脂が用いられる。A transparent resin having a resistance of Ω·cm or more, more preferably 10 13 Ω·cm or more is used.
又前記のバインダは熱により硬化する樹脂を用いてもよ
く、かかる熱により硬化する樹脂としては、例えば熱硬
化性アクリル樹脂、エポキン樹脂、ウレタン樹脂、尿素
樹脂、ポリエステル樹脂、アルキッド樹脂、メラミン樹
脂、又はこれらの共重合若しくは縮合樹脂かあり、その
他電子写真材料に供される熱硬化性樹脂の全てか利用さ
れる。Further, the binder may be a resin that is cured by heat, and examples of the resin that is cured by heat include thermosetting acrylic resin, Epoquine resin, urethane resin, urea resin, polyester resin, alkyd resin, melamine resin, Alternatively, copolymerized or condensed resins thereof, and all other thermosetting resins used in electrophotographic materials may be used.
又、前記保護層中には加工性及び物性の改良(亀裂防止
、柔軟性付与等)を目的として必要により熱可塑性樹脂
を50wt%未満含有せしめることができる。かかる熱
可塑性樹脂としては、例えばポリプロピレン、アクリル
樹脂、メタクリル樹脂、塩化ビニル樹脂、エポキン樹脂
、ポリカーボネート樹脂又はこれらの共重合体樹脂、ポ
リ−N−ビニルカルバゾール等の高分子有機半導体、そ
の他電子写真材料に供される熱可塑性樹脂の全てが利用
される。Further, if necessary, the protective layer may contain less than 50 wt % of a thermoplastic resin for the purpose of improving processability and physical properties (preventing cracks, imparting flexibility, etc.). Examples of such thermoplastic resins include polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, Epoquin resin, polycarbonate resin, or copolymer resins thereof, polymeric organic semiconductors such as poly-N-vinylcarbazole, and other electrophotographic materials. All of the thermoplastic resins that are available are utilized.
CGLは、次のような方法によって設けることができる
。CGL can be provided by the following method.
(イ)CGM等にバインダ、溶媒を加えて混合溶解した
溶液を塗布する方法。(a) A method in which a binder and a solvent are added to CGM, etc., and a mixed solution is applied.
(ロ)CGM等をボールミル、ホモミキサ、サンドミル
、超音波分散機、アトライタ等によって分散媒中で微細
粒子とし、バインダを加えて混合分散して得られる分散
液を塗布する方法。(b) A method in which CGM, etc. is made into fine particles in a dispersion medium using a ball mill, homomixer, sand mill, ultrasonic disperser, attritor, etc., and a binder is added, mixed and dispersed, and the resulting dispersion is applied.
これらの方法において超音波の作用下に粒子を分散させ
ると、均一分散が可能になる。Dispersing the particles under the action of ultrasound in these methods allows for homogeneous dispersion.
又、CTLは、既述のCTMを単独であるいは既述した
バインダ樹脂と共に溶解、分散せしめたものを塗布、乾
燥して形成することができる。Further, the CTL can be formed by applying and drying the CTM described above alone or dissolved and dispersed together with the binder resin described above.
この場合、CGL中にCTMを含有せしめる場合には、
上記(イ)の溶液、(ロ)の分散液中に予めCTMを溶
解又は分散せしめる方法、即ちCGL中にCTMを添加
する方法がある。この場合は、CTMの添加量をバイン
ダ100重量部に対して1〜100重量部の範囲内とす
るのが好ましい。In this case, when CTM is contained in CGL,
There is a method of dissolving or dispersing CTM in advance in the solution of (a) or the dispersion of (b), ie, a method of adding CTM to CGL. In this case, the amount of CTM added is preferably within the range of 1 to 100 parts by weight per 100 parts by weight of the binder.
又、CTMを含有する溶液をCGL上に塗布し、CGL
を膨潤あるいは一部溶解せしめてCTMをCGL内に拡
散せしめる方法がある。この方法を採用した場合には、
上述のようにCGL中にCTMを添加しておく必要はな
いが、上述の二方法を同時に行うことも差し支えない。In addition, a solution containing CTM is applied onto the CGL, and the CGL
There is a method of diffusing CTM into CGL by swelling or partially dissolving CTM. If this method is adopted,
Although it is not necessary to add CTM to CGL as described above, it is also possible to carry out the two methods described above at the same time.
層の形成に使用される溶剤あるいは分散媒としては、ブ
チルアミン、ジエチルアミン、エチレンジアミン、イン
プロパツールアミン、トリエタノールアミン、トリエチ
レンジアミン、N、N−ジメチルホルムアミド、アセト
ン、メチルエチルケトンシクロヘキサノン、ベンゼン、
トルエン、キシレン、クロロホルム、l12−ジクロル
エタン、ジクロルメタン、テトラヒドロフラン、ジオキ
サン、メタノール、エタノール、インプロパツール、酢
酸エチル、酢酸ブチル、ジメチルスルホキシド等を挙げ
ることができる。Solvents or dispersion media used to form the layer include butylamine, diethylamine, ethylenediamine, impropaturamine, triethanolamine, triethylenediamine, N,N-dimethylformamide, acetone, methylethylketonecyclohexanone, benzene,
Examples include toluene, xylene, chloroform, 112-dichloroethane, dichloromethane, tetrahydrofuran, dioxane, methanol, ethanol, impropatol, ethyl acetate, butyl acetate, dimethyl sulfoxide, and the like.
上記PCL,UCL,OCL等は、例えばブレード塗布
、デイツプ塗布、スプレー塗布、ロール塗布、スパイラ
ル塗布等により設けることができる。The above-mentioned PCL, UCL, OCL, etc. can be provided by, for example, blade coating, dip coating, spray coating, roll coating, spiral coating, or the like.
なお、導電性支持体は金属板、金属ドラム又は導電性ポ
リマー、酸化インジウム等の導電性化合物若しくはアル
ミニウム、パラジウム、金等の金属より成る導電性薄層
を塗布、蒸着、ラミネート等の手段により、紙、プラス
チックフィルム等の基体に設けて成るものが用いられる
。The conductive support is prepared by coating, vapor depositing, laminating, or the like a conductive thin layer made of a metal plate, metal drum, or a conductive polymer, a conductive compound such as indium oxide, or a metal such as aluminum, palladium, or gold. Those provided on a substrate such as paper or plastic film are used.
次に、本発明の感光体を用いる記録装置の一例を第5図
に示す。Next, FIG. 5 shows an example of a recording apparatus using the photoreceptor of the present invention.
第6図は電子写真法における反転現像法のフロ−チャー
トである。FIG. 6 is a flowchart of a reversal development method in electrophotography.
@5図の装置において、23は上述した有機光導電性物
質のPCL8とUCL7を有し、矢印方向に回転するド
ラム状の像担持体、22は像担持体、23の表面を一様
帯電する帯電器、24は像露光、15は現像器である。In the apparatus shown in Figure 5, 23 is a drum-shaped image carrier which has the above-mentioned organic photoconductive substances PCL8 and UCL7 and rotates in the direction of the arrow; 22 is an image carrier; the surface of 23 is uniformly charged; A charger, 24 is an image exposure device, and 15 is a developer.
20は像担持体23上にトナー像が形成された画像を記
録体Pに転写し易くするために必要に応じて設けられる
転写前露光ランプ、21は転写器、19は分離用コロナ
放電器、12は記録体Pに転写されたトナー像を定着さ
せる定着器である。20 is a pre-transfer exposure lamp provided as necessary to facilitate the transfer of the toner image formed on the image carrier 23 onto the recording medium P; 21 is a transfer device; 19 is a separation corona discharger; A fixing device 12 fixes the toner image transferred to the recording medium P.
13は除電ランプと除電用コロナ放電器の一方又は両者
の組合せからなる除電器、14は像担持体23の画像を
転写した後の表面の残留トナーを除去するl;めのクリ
ーニングブレードやファープランを有するクリーニング
装置である。13 is a static eliminator consisting of one or a combination of a static eliminator lamp and a corona discharger for static elimination; 14 is a cleaning blade or fur plan for removing residual toner on the surface of the image carrier 23 after the image has been transferred; This is a cleaning device with
像露光を半導体レーザで行う場合、第2図の記録装置の
ようにドラム状の像担持体23を用いるものにあっては
、像露光24は、レーザビームスキャナによるものが好
ましい。When the image exposure is performed using a semiconductor laser, it is preferable that the image exposure 24 be performed using a laser beam scanner in a recording apparatus that uses a drum-shaped image carrier 23 like the recording apparatus shown in FIG.
又、像担持体かベルト状のように平面状態をとり得る記
録装置にあっては、像露光を7ラツンユ露光とすること
もできる。In addition, in a recording device in which the image carrier can be in a flat state, such as a belt-like image carrier, the image exposure can be made into 7-ratunyu exposure.
以上のような記録装置によって、第6図に示したような
方法を実施することかできる。The method shown in FIG. 6 can be implemented using the recording apparatus as described above.
第6図は、像露光部か背景部よりも低電位の静電像とな
る静電像形成法によって静電像が形成され、現像が静電
後に背景部電位と同極性に帯電するトナーか付着するこ
とによって行われる、反転現像の例を示している。Figure 6 shows that an electrostatic image is formed by an electrostatic image forming method in which the image exposure area has a lower potential than the background area, and development is performed using toner that is charged to the same polarity as the background area potential after electrostatic development. An example of reversal development performed by adhesion is shown.
即ち、最初に、除電器13で除電され、クリーニング装
置14でクリーニングされて、電位が0となっている初
期状態の像担持体23の表面に、帯電器22によって一
様に帯電を施し、その帯電面に像露光24を投影して勢
電像部の電位が略0となる像露光を行い、得られた静電
像を現像器15(トナーT)によって現像する。That is, first, the surface of the image carrier 23 in the initial state, which has been neutralized by the static eliminator 13 and cleaned by the cleaning device 14 and has a potential of 0, is uniformly charged by the charger 22. Image exposure 24 is projected onto the charged surface to perform image exposure such that the potential of the electrostatic image portion becomes approximately 0, and the obtained electrostatic image is developed by a developer 15 (toner T).
なお、この画像形成方法は、ハロゲンランプ、タングス
テンランプ、LED (発光ダイオード)、ヘリウム−
ネオン、アルコ゛ン、ヘリウム−カドミウム等の気体レ
ーザ、半導体レーザ等の各種光源に対し適用できる。Note that this image forming method uses halogen lamps, tungsten lamps, LEDs (light emitting diodes), and helium lamps.
It can be applied to various light sources such as neon, alkon, helium-cadmium gas lasers, and semiconductor lasers.
本発明の画像形成方法は、電子写真複写機、プリンタ等
の多種多様の用途を有するものである。The image forming method of the present invention has a wide variety of applications such as electrophotographic copying machines and printers.
以下、本発明を実施例について更に詳細に説明するが、
これにより本発明は限定されるものではなく、種々の変
形した他の実施例も勿論含むものである。Hereinafter, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited thereby, and of course includes other embodiments with various modifications.
まず、表1に記したように、U CLNo、U CL−
IE〜9Eの計9個の塗布液を調製し、各々0.6pm
のフィルタに濾過し、UCL用塗布液とした。First, as shown in Table 1, U CLNo, U CL-
A total of 9 coating solutions from IE to 9E were prepared, each with a concentration of 0.6 pm.
The solution was filtered through a filter to obtain a coating solution for UCL.
これらUCL塗布液にアルミニウムドラム(フニカLP
−3010レーザプリンタ用)を浸漬し、4mg/dm
”になるように引き上げ速度を調節し、UCLを形成し
た。These UCL coating liquids were applied to an aluminum drum (Funica LP).
-3010 for laser printer), 4mg/dm
The pulling speed was adjusted so that the UCL was formed.
UCL−IEはフェノキシ樹脂でありブランクである。UCL-IE is a phenoxy resin and is a blank.
UCL−2E−UCL−6Eについては、浸漬塗布後、
ドラムをゆっくり回転させなから80W/cm出力の集
光型中圧水銀灯に約50c+oの距離から紫外線照射を
60秒間行ない、付量4 mg/dII+2になるよう
UCLを形成せしめた。For UCL-2E-UCL-6E, after dip coating,
While rotating the drum slowly, ultraviolet rays were irradiated for 60 seconds from a distance of about 50 c+o using a concentrating medium pressure mercury lamp with an output of 80 W/cm to form a UCL with a coating amount of 4 mg/dII+2.
UCL−7E−DCL−9Eについては、浸漬塗布後、
ドラムを回転させながら加速電圧300KV。For UCL-7E-DCL-9E, after dip coating,
Accelerating voltage 300KV while rotating the drum.
ビーム電流lO〜15mAのESI (カーテンタイプ
方式)の電子線加速器を用いて吸収線量が3〜lOMr
adの範囲で電子線照射を行ない、4 B/da”にな
るようUCLを形成せしめt;。Using an ESI (curtain type) electron beam accelerator with a beam current of 10 to 15 mA, the absorbed dose is 3 to 10 Mr.
Electron beam irradiation was performed in the range of ad to form a UCL of 4 B/da.
これらUCL塗布済みドラムは各々2本塗布し、1本は
次のCGL重層塗布を行い、他の1本は、後述する接着
性テスト(基盤目テスト)及び耐溶次に表2に示す各c
cM40gを各バインダ40gと各溶媒200m1のポ
リマー溶液に加えて、サンドグラインダにて12時間分
散させ、CGL用分数分散液製しt二。Two of these UCL-coated drums were coated, one was coated with the next CGL multilayer coating, and the other was subjected to the adhesion test (baseline test) described later and the melt resistance test, followed by each CGL shown in Table 2.
40 g of cM was added to a polymer solution containing 40 g of each binder and 200 ml of each solvent, and dispersed for 12 hours using a sand grinder to prepare a fractional dispersion for CGL.
この分散液に上記UCLを有するンリンダを浸漬し、C
GL付量5mg/dm2になるよう塗布速度を*#して
塗布した。A cylinder having the above UCL is immersed in this dispersion, and C
Coating was performed at a coating speed of *# so that the amount of GL applied was 5 mg/dm2.
表 2
更に表3に示したC T M 200gと表3に記載の
樹脂450gとを1.2−ジクロルエタン1500ml
に溶解し、得られた溶液に、前記CGLまで塗布しI;
各々のドラムを浸漬し、200μmの膜厚になるよう塗
布速度を調節して塗布し、100℃で1時間乾燥してC
TLを形成せしめ、積層型感光体を作成した。Table 2 Furthermore, 200 g of CTM shown in Table 3 and 450 g of the resin shown in Table 3 were added to 1,500 ml of 1,2-dichloroethane.
and apply to the obtained solution up to the CGL I;
Dip each drum, adjust the coating speed so that the film thickness is 200 μm, dry at 100°C for 1 hour, and coat with C.
A TL was formed to produce a laminated photoreceptor.
表 3
最終的な感光体の積層形態は表4に記載し、併せて、下
記に述べる。Table 3 The final laminated form of the photoreceptor is shown in Table 4, and will also be described below.
測定法により、測定した電子写真特性及び、物〔特性評
価〕
実施例及び比較例の各感光体のそれぞれをrLP−30
10J (コニカ社製)改造機(半導体レーザ光源搭
載)に搭載し、vMが一600±lO(V) ニfする
ようにグリッド電圧を調節し、0.711IWの照射時
の露光面の電位をV、とし、現像バイアス−500CV
)で反転現像を行い、画像の白地部分の黒ぼちを評価
した。Electrophotographic properties and properties measured by the measurement method [Characteristics evaluation] Each of the photoreceptors of Examples and Comparative Examples was
It was installed on a modified 10J (manufactured by Konica) machine (equipped with a semiconductor laser light source), and the grid voltage was adjusted so that vM was -600±1O(V), and the potential of the exposed surface during irradiation with 0.711IW was V, development bias -500CV
), and the black spots on the white background of the image were evaluated.
又、5000回のプリントを行い、5000回のプリン
ト後のV、、■、をy、IoooSyLsoooとした
。Further, printing was performed 5,000 times, and V, , ■, after 5,000 times of printing was set to y, IoooSyLsooo.
そして、初期からのvM、vLの変位量をそれぞれA
V、””、AVL”00とした。Then, the displacement amounts of vM and vL from the initial stage are respectively A
V, “”, AVL”00.
従って、Δv M””−(v MSo”+ 600)、
hVL””= (v Lsa′o −y L)である。Therefore, Δv M””−(v MSo”+600),
hVL""= (v Lsa'o -y L).
なお、黒ぼち(黒斑点)の評価は、画像解析装置「オム
ニコン3000形」 (島津製作所社製)を用いて黒ぼ
ちの粒径と個数を測定し、−(径) 0.05mm以上
の黒ぼちがl cm”当たり何個あるかにより判定した
。黒ぼち評価の判定基準は、下記表に示す通りである。In addition, the evaluation of black spots (black spots) was performed by measuring the particle size and number of black spots using an image analysis device "Omnicon 3000" (manufactured by Shimadzu Corporation). Judgment was made based on the number of black spots per cm. The criteria for evaluating black spots are as shown in the table below.
なお、黒斑点判定の結果が@、○であれば実用になるが
、△は実用に適さないことがあり、×である場合は実用
jこ適さない。Note that if the result of black spot determination is @ or ○, it is suitable for practical use, but if it is △, it may not be suitable for practical use, and if it is ×, it is not suitable for practical use.
又、UCLの耐溶剤性をみるために、UCLの塗布、乾
燥後に、30秒間、メチルエチルケトンに浸漬し、この
後に電子顕微鏡(SEM)観察を行った。浸漬面のUC
Lが均質に残っているものを◎、不均質若しくは溶解や
剥がれのあるものを△又はXで示した。In addition, in order to examine the solvent resistance of UCL, after coating and drying UCL, it was immersed in methyl ethyl ketone for 30 seconds, and then observed using an electron microscope (SEM). UC of immersion surface
L indicates that the sample remains homogeneous, and ◎ indicates that the sample remains homogeneous, and △ or X indicates that the sample is heterogeneous or has dissolution or peeling.
UCLとPCLの接着性については、基盤目試験により
評価した。すなわち、隣り合う隙間どうしの間隔がl
11mのカンタガイドを用い、カッタで導電性支持体ま
で縦横に11本平行に傷をっけ、100個のます目(基
盤目)を形成する。その上に幅24mmのセロテープを
はりつけた後、一端から引剥がす。その時に剥離したま
す目の数をかぞえて、100個中で残ったまず目の数で
表示した。The adhesion between UCL and PCL was evaluated by a substrate test. In other words, the distance between adjacent gaps is l
Using an 11 m contour guide, make 11 parallel scratches in the vertical and horizontal directions up to the conductive support with a cutter to form 100 squares (base squares). After attaching cellophane tape with a width of 24 mm on top of it, peel it off from one end. The number of squares that were peeled off at that time was counted and expressed as the number of squares that remained out of 100.
接着性の目安として100/ 100であれば接着性良
好、O/ 100であれは不良とみなす。As a guideline for adhesion, 100/100 is considered good adhesion, and O/100 is considered poor.
表4に示す結果によれば、本発明による樹脂を用いれば
、繰返し使用時に、帯電能、感度を良好に維持でき、か
つ黒斑点のない良好な画像、又、接着性の優れた感光体
を提供できることがわかる。According to the results shown in Table 4, by using the resin of the present invention, it is possible to maintain good charging ability and sensitivity during repeated use, and to produce good images without black spots, as well as to produce a photoreceptor with excellent adhesion. I know that I can provide it.
逆に比較用のバインダ樹脂を用いた場合、CGL液塗布
後、UCLの一部が溶解するため、重層塗工性が悪く、
又、黒斑点も多く発生した。On the other hand, when a comparative binder resin was used, part of the UCL dissolved after the CGL solution was applied, resulting in poor multilayer coating properties.
In addition, many black spots also occurred.
次に、D C−8010(コニカ社製)用のドラムサイ
ズで前述した実施例と同様の各感光体を作成した。そし
て、これらの各感光体についてDC−8010で下記に
示す各現像条件で画像出しを行ったところ、各現像条件
について、いずれの感光体を用いた場合も、黒斑点のな
い良好な画像が得られた。Next, photoreceptors similar to those in the above-mentioned example were prepared with a drum size for DC-8010 (manufactured by Konica). When images were produced on each of these photoreceptors using the DC-8010 under the following development conditions, good images without black spots were obtained under each development condition, regardless of which photoreceptor was used. It was done.
現像は、いわゆる2成分非接触ジャンピング現像を行っ
t;。The development was carried out using so-called two-component non-contact jumping development.
現像条件
平均粒径0.1μmのマグネタイト粉末70wt%、バ
インダ樹脂としてポリエステル樹脂3Qvt%を配合、
混練し、破砕造粒して後粒径20〜30μmに分級して
キャリアとしt;。このキャリアの比重は約3.5以下
であった。このキャリアに、U−Bir1800 (コ
ニカ社製)複写機用トナー(ポリエステル樹脂にカーボ
ンを含有させたトナー)をトナー濃度が2Qwt%にな
るように配合し、次の条件下で複写を行った。Development conditions: 70 wt% magnetite powder with an average particle size of 0.1 μm, 3 Qvt% polyester resin as a binder resin,
The mixture is kneaded, crushed, granulated, and then classified to a particle size of 20 to 30 μm to form a carrier. The specific gravity of this carrier was about 3.5 or less. To this carrier, U-Bir 1800 (manufactured by Konica) toner for copying machine (toner containing carbon in polyester resin) was blended so that the toner concentration was 2Qwt%, and copying was performed under the following conditions.
像担持体の周速を60mm/sec、像担持体と現像ス
リーブとの間隙を0−3mm、現像剤層厚を0.05m
m、現像スリーブの直径を24++++a、その回転数
を20Orpmとした。The peripheral speed of the image carrier was 60 mm/sec, the gap between the image carrier and the developing sleeve was 0-3 mm, and the developer layer thickness was 0.05 m.
m, the diameter of the developing sleeve was 24++++a, and the rotation speed was 20 Orpm.
現像バイアス等については以下の3種類の条件とした。Regarding the developing bias and the like, the following three types of conditions were used.
第1図〜第7図は実施例を説明するためのものであって
、第1図(A)、第1図CB)はそれぞれハンドモデル
を用いてキャリアの移動を模式的に示す模式図、
第2図、第3図、第4図は本発明に使用する各感光体の
一部分の断面図、
第5図は像形成装置の概略図、
第6図は像形成の過程を示すフローチャート、第7図は
従来の感光体を示す一部断面図である。
第8図は従来の他の感光体の一部を拡大して示す断面図
である。
なお、図面に示す符号において、
■・・・・・・・・・導電性基体
4・・・・・・・・・キャリア輸送層(CT L)6・
・・・・・・・・キャリア発生層(CGL)7・・・・
・・・・・下引層(UCL)8・・・・・・・・・感光
層(P CL)である。1 to 7 are for explaining the embodiment, and FIG. 1(A) and FIG. 1 CB) are schematic diagrams schematically showing the movement of the carrier using a hand model, respectively; 2, 3, and 4 are cross-sectional views of a portion of each photoreceptor used in the present invention, FIG. 5 is a schematic diagram of an image forming apparatus, and FIG. 6 is a flowchart showing the process of image formation. FIG. 7 is a partial sectional view showing a conventional photoreceptor. FIG. 8 is an enlarged cross-sectional view of a part of another conventional photoreceptor. In addition, in the symbols shown in the drawings, ■... Conductive substrate 4... Carrier transport layer (CTL) 6.
...Carrier generation layer (CGL) 7...
. . . Undercoat layer (UCL) 8 . . . Photosensitive layer (PCL).
Claims (2)
けられている感光体において、前記下引層をエポキシ系
放射線硬化型樹脂によって形成することを特徴とする感
光体。(1) A photoreceptor comprising at least a subbing layer and a photosensitive layer on a conductive support, wherein the subbing layer is formed of an epoxy radiation-curable resin.
不飽和二重結合のアクリル系二重結合、アリル系二重結
合、マレイン酸系二重結合の少なくとも一種を含有する
請求項1に記載の感光体。(2) The epoxy radiation-curable resin contains at least one of radiation-sensitive unsaturated double bonds such as acrylic double bonds, allylic double bonds, and maleic acid double bonds. Photoreceptor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32722890A JPH04195058A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32722890A JPH04195058A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04195058A true JPH04195058A (en) | 1992-07-15 |
Family
ID=18196751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32722890A Pending JPH04195058A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04195058A (en) |
-
1990
- 1990-11-28 JP JP32722890A patent/JPH04195058A/en active Pending
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