JPH04195060A - Photosensitive body - Google Patents
Photosensitive bodyInfo
- Publication number
- JPH04195060A JPH04195060A JP32722290A JP32722290A JPH04195060A JP H04195060 A JPH04195060 A JP H04195060A JP 32722290 A JP32722290 A JP 32722290A JP 32722290 A JP32722290 A JP 32722290A JP H04195060 A JPH04195060 A JP H04195060A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- general formula
- photoreceptor
- ucl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 239000011347 resin Substances 0.000 claims abstract description 24
- 229920002647 polyamide Polymers 0.000 claims abstract description 10
- 108091008695 photoreceptors Proteins 0.000 claims description 46
- 125000003118 aryl group Chemical group 0.000 abstract description 30
- -1 acrylic compound Chemical class 0.000 abstract description 27
- 150000001875 compounds Chemical class 0.000 abstract description 22
- 230000035945 sensitivity Effects 0.000 abstract description 14
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- 239000007924 injection Substances 0.000 abstract description 9
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- 125000001931 aliphatic group Chemical group 0.000 abstract description 4
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- 239000011248 coating agent Substances 0.000 description 24
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- 239000000126 substance Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 125000003277 amino group Chemical group 0.000 description 10
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- 125000005843 halogen group Chemical group 0.000 description 10
- 125000003710 aryl alkyl group Chemical group 0.000 description 9
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 9
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- 238000010894 electron beam technology Methods 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
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- 125000000623 heterocyclic group Chemical group 0.000 description 5
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- 125000003342 alkenyl group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
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- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 3
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- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 101100189554 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) PCL8 gene Proteins 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 231100000987 absorbed dose Toxicity 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
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- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
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- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
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- 125000001624 naphthyl group Chemical group 0.000 description 2
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- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
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- QLUXVUVEVXYICG-UHFFFAOYSA-N 1,1-dichloroethene;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C QLUXVUVEVXYICG-UHFFFAOYSA-N 0.000 description 1
- ZXBSSAFKXWFUMF-UHFFFAOYSA-N 1,2,3-trinitrofluoren-9-one Chemical compound C12=CC=CC=C2C(=O)C2=C1C=C([N+](=O)[O-])C([N+]([O-])=O)=C2[N+]([O-])=O ZXBSSAFKXWFUMF-UHFFFAOYSA-N 0.000 description 1
- NMNSBFYYVHREEE-UHFFFAOYSA-N 1,2-dinitroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C([N+]([O-])=O)C([N+](=O)[O-])=CC=C3C(=O)C2=C1 NMNSBFYYVHREEE-UHFFFAOYSA-N 0.000 description 1
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- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
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- SLAMLWHELXOEJZ-UHFFFAOYSA-N 2-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1[N+]([O-])=O SLAMLWHELXOEJZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052786 argon Inorganic materials 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
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- 125000004429 atom Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
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- 125000003785 benzimidazolyl group Chemical class N1=C(NC2=C1C=CC=C2)* 0.000 description 1
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- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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- 239000001913 cellulose Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
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- 125000000332 coumarinyl group Chemical class O1C(=O)C(=CC2=CC=CC=C12)* 0.000 description 1
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- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
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- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
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- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000007970 homogeneous dispersion Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 150000002461 imidazolidines Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- NNYHMCFMPHPHOQ-UHFFFAOYSA-N mellitic anhydride Chemical compound O=C1OC(=O)C2=C1C(C(OC1=O)=O)=C1C1=C2C(=O)OC1=O NNYHMCFMPHPHOQ-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229960001974 morinamide Drugs 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- IMACFCSSMIZSPP-UHFFFAOYSA-N phenacyl chloride Chemical compound ClCC(=O)C1=CC=CC=C1 IMACFCSSMIZSPP-UHFFFAOYSA-N 0.000 description 1
- 125000001791 phenazinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001855 polyketal Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 125000002294 quinazolinyl group Chemical class N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
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- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は感光体、特に電子写真感光体に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a photoreceptor, particularly an electrophotographic photoreceptor.
カールソン法の電子写真複写方法においては、感光体表
面に帯電させた後、露光によって静電潜像を形成すると
共に、その静電潜像をトナーによ−て現像し、ついでそ
の可視像を紙等に転写、定着させる。同時に、感光体は
付着トナーの除去や除電、表面の清浄化が施され、長期
にわたって反復使用される。In the Carlson electrophotographic copying method, after the surface of the photoreceptor is charged, an electrostatic latent image is formed by exposure, the electrostatic latent image is developed with toner, and then the visible image is formed. Transfer and fix onto paper, etc. At the same time, the photoreceptor is subjected to removal of adhering toner, neutralization of static electricity, and surface cleaning, and is used repeatedly over a long period of time.
従って、電子写真感光体としては、帯電特性及び感度が
良好で暗減衰が小さい等の電子写真特性は勿論であるが
、加えて繰返し使用での耐刷性、耐摩耗性、耐湿性など
の物理的性質や、コロナ放電時に発生するオゾン、露光
時の紫外線等への耐性(耐環境性)においても良好であ
ることが要求される。Therefore, as an electrophotographic photoreceptor, it is important to not only have electrophotographic properties such as good charging characteristics and sensitivity, and low dark decay, but also physical properties such as printing durability, abrasion resistance, and moisture resistance after repeated use. It is also required to have good physical properties and resistance to ozone generated during corona discharge, ultraviolet rays during exposure, etc. (environmental resistance).
従来、電子写真感光体としては、セレン、酸化亜鉛、硫
化カドミウム等の無機光導電性物質を主成分とする感光
体層を有する無機感光体が広く用いられている。Conventionally, inorganic photoreceptors having a photoreceptor layer containing an inorganic photoconductive substance such as selenium, zinc oxide, or cadmium sulfide as a main component have been widely used as electrophotographic photoreceptors.
一方、種々の有機光導電性物質を電子写真感光体の感光
体層の材料として利用することが近年活発に研究、開発
されている。On the other hand, the use of various organic photoconductive substances as materials for photoreceptor layers of electrophotographic photoreceptors has been actively researched and developed in recent years.
しかしながら、感度及び耐久性において必ずしも満足で
きるものではない。However, sensitivity and durability are not necessarily satisfactory.
このために、感光層において、キャリア発生機能とキャ
リア輸送機能とを異なる物質に個別に分担させることに
より、感度が高くて耐久性の大きい所謂機能分離型更に
夫々の機能層を積層した有機態光体を開発する試みがな
されている。For this purpose, in the photosensitive layer, the carrier generation function and the carrier transport function are assigned to different substances, thereby creating a so-called functionally separated type of organic light with high sensitivity and durability, and in which each functional layer is laminated. Attempts are being made to develop the body.
このような機能分離型の電子写真感光体においては5、
各機能を発揮する物質を広い範囲のものから選択するこ
とができるので、任意の特性を有する電子写真感光体を
比較的容易に作製することが可能である。そのため、感
度が高く、耐久性の大きいを機態光体が得られることが
期待される。In such a functionally separated electrophotographic photoreceptor, 5.
Since substances that exhibit each function can be selected from a wide range of materials, it is possible to relatively easily produce an electrophotographic photoreceptor having arbitrary characteristics. Therefore, it is expected that a mechanical light body with high sensitivity and great durability will be obtained.
第2図及び第4図は、こうした有機光導電性物質を用い
る機能分離型の積層電子写真感光体を示すものである。FIGS. 2 and 4 show a function-separated type laminated electrophotographic photoreceptor using such an organic photoconductive substance.
又、第3図は機能分離型単層電子写真感光体である。FIG. 3 shows a functionally separated single-layer electrophotographic photoreceptor.
この第2図の電子写真感光体は、導電性支持体1の上に
下引層(ucL)7、キャリア発生層(CGL)6、キ
ャリア輸送層(CTL)4を順次積層して構成されてお
り、負帯電用として使用されているものである。即ち、
感光層(PCL)8はCGL6とCTL 4から構成さ
れている。The electrophotographic photoreceptor shown in FIG. 2 is constructed by sequentially laminating an undercoat layer (ucL) 7, a carrier generation layer (CGL) 6, and a carrier transport layer (CTL) 4 on a conductive support 1. It is used for negative charging. That is,
The photosensitive layer (PCL) 8 is composed of CGL 6 and CTL 4.
このような層構成を有する電子写真感光体においては、
負帯電性の場合に電子よりもホールの移動度が大きいこ
とから、良好な特性を有するホール輸送性の光導電材料
を使用でき、光感度等の点で有利である。In an electrophotographic photoreceptor having such a layer structure,
In the case of negative chargeability, the mobility of holes is greater than that of electrons, so a hole transporting photoconductive material with good properties can be used, which is advantageous in terms of photosensitivity and the like.
次に第4図に正帯電用の感光体を示す。こうした積層型
感光体、特に有機光導電性物質を用いる感光体において
は、負帯電時に導電性支持体又は下層側からの不均一な
キャリア(ホール)注入が生じ易く、このために表面電
荷が微視的にみて消失し、あるいは減少してしまう。こ
れは特に、反転現像法において黒い斑点状の画像欠陥と
なり〔黒斑点〕、画像の品質を著しく低下させる。Next, FIG. 4 shows a photoreceptor for positive charging. In such laminated photoreceptors, especially photoreceptors using organic photoconductive materials, non-uniform carrier (hole) injection from the conductive support or lower layer side tends to occur when negatively charged, resulting in slight surface charge. It visually disappears or decreases. Especially in the reversal development method, this causes image defects in the form of black spots [black spots], which significantly deteriorates the quality of the image.
こうした黒斑点の問題は、ホール移動度の大きい有機系
光導電性物質を用いる感光体での特をの現象であり、こ
の原因は、上記したキャリア注入が不均一に生じたこと
が考えられる。This problem of black spots is a particular phenomenon in photoreceptors using organic photoconductive materials with high hole mobility, and the cause of this problem is thought to be the non-uniform carrier injection described above.
そこで、導電性支持体lとPCLとの間にUCLを設け
、キャリア注入をブロッキングすることが提案されてい
る。Therefore, it has been proposed to provide a UCL between the conductive support l and the PCL to block carrier injection.
従来、UCL7を構成する材料としては、ポリエステル
系、ポリウレタン系、ポリアミド系、エポキシ樹脂系、
ポリカーボネート系、ビニルポリマー系例えばポリビニ
ルピリジンアクリル樹脂等、セルロース系、ポリケター
ル系、縮合重合系例えはフェノール樹脂、メラミン樹脂
等が知られている。Conventionally, materials constituting UCL7 include polyester, polyurethane, polyamide, epoxy resin,
Known materials include polycarbonate, vinyl polymer, such as polyvinylpyridine acrylic resin, cellulose, polyketal, and condensation polymer, such as phenol resin and melamine resin.
しかしながら、上記の公知の下引層では、十分に黒斑点
抑制効果がない。しかも、ブロッキング性と感光体とし
ての感度を双方とも良好にすることは実現されていない
。即ち、従来採用されている樹脂においては、ブロッキ
ング性が有効で黒斑点抑制効果があると思われるものは
感度が悪く、逆に、感度を良好にしようとすると、ブロ
ッキング性が不十分となり黒斑点を十分に抑制すること
ができない。However, the above-mentioned known undercoat layer does not have a sufficient effect of suppressing black spots. Moreover, it has not been achieved to improve both the blocking property and the sensitivity as a photoreceptor. In other words, among the resins conventionally used, those that have effective blocking properties and are thought to have the effect of suppressing black spots have poor sensitivity, and conversely, when trying to improve sensitivity, the blocking properties are insufficient and black spots appear. cannot be suppressed sufficiently.
さらjこ、重層塗布過程で問題が生じる。上層、下層の
ポリマーの溶解性が類似していれば、上層塗布時、下層
の一部が溶出し、上層と下層界面が乱れ塗布できなくな
ったり、ディッピング塗布で塗布した場合、上層塗布槽
が一部下層構成成分で汚染されてしまい高価な上層塗布
液の寿命が短くなる他、感光体の電位特性も悪化させる
。これらのことは、上層、下層のポリマーや溶媒に対し
て厳しい処方制限を加えることになる。However, problems arise during the multilayer coating process. If the solubility of the polymers in the upper and lower layers is similar, part of the lower layer will dissolve when the upper layer is applied, and the interface between the upper and lower layers will be disturbed and coating will not be possible, or if coating is done by dipping, the upper layer coating tank will be This not only shortens the life of the expensive upper layer coating solution but also deteriorates the potential characteristics of the photoreceptor due to contamination with the constituent components of the lower layer. These factors impose strict prescription restrictions on the polymers and solvents in the upper and lower layers.
熱硬化性樹脂をUCLに適用した例もあるが、高い硬化
温度(少なくともllO′C以上)と比較的長い時間(
30分以上)が必要であるので生産性が悪化する。又、
硬化剤が混入した塗布液の安定性は本質的に悪くなる。There are examples of thermosetting resins being applied to UCL, but they require high curing temperatures (at least 11O'C or higher) and relatively long times (
30 minutes or more), which reduces productivity. or,
The stability of a coating solution mixed with a curing agent is essentially impaired.
更に接着性についても未だ充分でなく、支持体とUCL
との接着性以外に、UCL−上層間の接着性が悪いのが
現状である。Furthermore, the adhesion is still insufficient, and the support and UCL
At present, the adhesion between the UCL and the upper layer is poor in addition to the adhesion between the UCL and the upper layer.
又、近年、電子写真複写方法において、安価、小型で直
接変調できるなどの特徴を有する半導体レーザ光源が用
いられている。現在、半導体レーザとして広範にもちい
られているガリウム−アルミニウムー砒素(Ga−AI
−As)系発光素子は、発振波長が750nm程度以上
である。Furthermore, in recent years, semiconductor laser light sources have been used in electrophotographic copying methods, which are inexpensive, compact, and capable of direct modulation. Currently, gallium-aluminum-arsenide (Ga-AI) is widely used in semiconductor lasers.
-As) type light emitting element has an oscillation wavelength of about 750 nm or more.
こうしたレーザビーム等を用いる技術体系はプリンタへ
の応用が期待されているか、長波長光に高感度を有する
感光体が未だ開発されていないのが現状である。The technical system using such a laser beam or the like is expected to be applied to printers, but the current situation is that a photoreceptor having high sensitivity to long wavelength light has not yet been developed.
本発明の目的は、黒斑点等の画像欠陥を抑止でき、しか
も半導体レーザ等の比較的長波長の光に十分な感度を有
する感光体を提供することである。An object of the present invention is to provide a photoreceptor that can suppress image defects such as black spots and has sufficient sensitivity to relatively long wavelength light from semiconductor lasers and the like.
本発明の他の目的は、耐刷性、電位安定性、残留電位特
性に優れた感光体を提供することである。Another object of the present invention is to provide a photoreceptor with excellent printing durability, potential stability, and residual potential characteristics.
更に本発明の他の目的は導電性支持体上に、少なくとも
UCL、PCLとが設けされている感光体に於て、塗工
性、接着性のよい感光体を提供することである。Another object of the present invention is to provide a photoreceptor having good coating properties and adhesion properties, in which at least UCL and PCL are provided on a conductive support.
本発明は;
(1)導電性支持体上に少なくともUCLとPCLとが
設けられている感光体に於て、前記UCLがポリアミド
系放射線硬化型樹脂によって形成されていることを特徴
として構成される。The present invention provides: (1) A photoreceptor in which at least a UCL and a PCL are provided on a conductive support, wherein the UCL is formed of a polyamide radiation-curable resin. .
本発明の構成を採ることによって、
1、塗布重層性が良いこと、
2、他の塗布液の汚染がないこと、
3、他の塗布液により溶解させられないことから、処方
上の選択の幅が捩ること、
4、ブロッキング性が良好であ一す、黒ぼちが出現しな
いこと、
56下層との接着性が良いこと、
等の利点が得られる。By adopting the structure of the present invention, 1. good multilayer coating properties, 2. no contamination of other coating solutions, and 3. not being dissolved by other coating solutions, giving a wide range of formulation options. The following advantages can be obtained: 4. good blocking properties, no black spots, and 56. good adhesion to the lower layer.
と
この重合体は、既述したごeく、ホール移動度の大きい
有機光導電性物質をPCLに用いたときに生じ易い支持
体からの不均一なホールの注入を効果的に防止するブロ
ッキング機能を有している。As mentioned above, this polymer has a blocking function that effectively prevents uneven injection of holes from the support, which tends to occur when organic photoconductive substances with high hole mobility are used in PCL. have.
従って、この下引層の存在によって、支持体側からの局
所的なキャリア注入に対する障壁を設けることができ、
局所的なキャリア注入による表面電荷の消失、減少を阻
止できると考えられる。従って、特に反転現像を行った
場合に画像上に黒斑点が生ずることはなく、白斑点や画
面肌荒れ、ピンホールの発生もなく、画像欠陥のない高
品質の画像を得るという顕著な作用効果を奏することが
できる。Therefore, the presence of this undercoat layer can provide a barrier to local carrier injection from the support side.
It is thought that it is possible to prevent the surface charge from disappearing or decreasing due to local carrier injection. Therefore, especially when reversal development is performed, there are no black spots on the image, no white spots, no rough edges, no pinholes, and a remarkable effect of obtaining a high-quality image without image defects. can play.
使用するポリアミドは脂肪族もしくは芳香族の多価アミ
ノ化合物と脂肪族もしくは芳香族の多価カルボン酸化合
物との反応によって得られるポリアミドもしくは環状ラ
クタムの開環反応によるポリアミド化合物に(メタ)ア
クリル化合物を反応させて得られる化合物が使用できる
。The polyamide used is a polyamide obtained by the reaction of an aliphatic or aromatic polyvalent amino compound with an aliphatic or aromatic polyvalent carboxylic acid compound, or a polyamide compound obtained by a ring-opening reaction of a cyclic lactam and a (meth)acrylic compound added thereto. Compounds obtained by reaction can be used.
ポリアミド合成時のアミノ基に(メタ)アクリル基等の
放射線官能基を湯売る七ツマ−を混合便用して合成して
もよい。Synthesis may also be carried out by mixing a methacrylate group with a radioactive functional group such as a (meth)acrylic group in the amino group during polyamide synthesis.
前記ポリアミド化合物の例としては、次のものが挙げら
れる。Examples of the polyamide compounds include the following.
1゜
2゜
HxC−CHCO(NH(CHz)s−NHCO(CH
z)*C03iNH(CH2)sNHcOcH−CHz
I11#20
3゜
HzC−CHCO(NH(CH2)4NHCO−1l−
CHz)acOh「−(NHCHzCHx N−ネ
O
CH。1゜2゜HxC-CHCO(NH(CHz)s-NHCO(CH
z) *C03iNH(CH2)sNHcOcH-CHz
I11#20 3゜HzC-CHCO(NH(CH2)4NHCO-1l-
CHz) acOh “-(NHCHzCHx N-neO CH.
本(CH2CH2hNHCO−(CH2)、C0)NH
(−CH,hNH−Co−CH=CH。Book (CH2CH2hNHCO-(CH2),C0)NH
(-CH, hNH-Co-CH=CH.
本発明の化合物を用いるに当り、UV吸収率、硬化速度
を速める為、光重合開始剤を添加してもよい。この例と
しては、例えばベンゾインエーテル系、ベンジルケター
ル系、a−ヒドロキシアセトフェノン系、クロルアセト
フェノン系、α−アミノアセトフェノン系、アシルホス
フィンオキサイド系、σ−ジカルボニル系、a−アシル
オキシムエステル等がある。When using the compound of the present invention, a photopolymerization initiator may be added to increase UV absorption and curing speed. Examples include benzoin ether type, benzyl ketal type, a-hydroxyacetophenone type, chloracetophenone type, α-aminoacetophenone type, acylphosphine oxide type, σ-dicarbonyl type, a-acyl oxime ester, and the like.
用いられる放射線としては紫外線、電子線、X線、γ線
などがあるが紫外線及び電子線が好ましい。Examples of the radiation that can be used include ultraviolet rays, electron beams, X-rays, and gamma rays, with ultraviolet rays and electron beams being preferred.
紫外線照射による硬化は、波長約2000〜4000
Aの紫外線を照射することによって行なわれる。又、紫
外線発生装置には、約50= 100W /am出カの
水銀灯が好適である。電子線照射は加速電圧100〜7
50KV、好ましくは150〜300KVの電子線加速
器を用いて吸収線量が2〜20Mradになるように行
なわれる。Curing by ultraviolet irradiation has a wavelength of approximately 2000 to 4000
This is done by irradiating ultraviolet A. Furthermore, a mercury lamp with an output of about 50=100 W/am is suitable for the ultraviolet generator. Electron beam irradiation is performed at an accelerating voltage of 100 to 7
It is carried out using an electron beam accelerator of 50 KV, preferably 150 to 300 KV, so that the absorbed dose is 2 to 20 Mrad.
紫外線を用いる場合と、電子線を用いる場合′との処方
上の差は、紫外線を用いる場合、光重合開始剤が必要な
ことがある以外大きな差はない。There is no major difference in prescription between the use of ultraviolet rays and the case of electron beams, except that when ultraviolet rays are used, a photopolymerization initiator may be required.
本発明におけるUCLは、2μm以下の薄い膜厚ヲ有シ
ていることが、ブロッキング性能を十分に発揮しつつ、
残留電位の抑制等の感光体性能を良好に保持する点で望
ましい。更に好ましくは0.2〜1.0μmである。The UCL in the present invention has a thin film thickness of 2 μm or less, which allows it to sufficiently exhibit blocking performance.
This is desirable in terms of maintaining good photoreceptor performance such as suppression of residual potential. More preferably, it is 0.2 to 1.0 μm.
本発明の感光体は例えば第2図に示す構成からなってい
る。The photoreceptor of the present invention has the structure shown in FIG. 2, for example.
この感光体においては、導電性支持体(基体)l上に、
上記したUCL7を介してCCl2が設けられ、このC
Cl6上にCTL 4が設けられている。8はPCLを
示す。従って、CCl2と支持体lとの間にUCL 7
が設けられているので、第8図に示す支持体側からの不
均一なホールの注入を効果的に阻止する一方、光照射時
には支持体側へ光キャリアである電子を効率良く輸送す
ることができる。In this photoreceptor, on a conductive support (substrate) l,
CCl2 is provided via the above-mentioned UCL7, and this CCl2 is provided via the above-described UCL7.
CTL 4 is provided on Cl6. 8 indicates PCL. Therefore, there is a UCL 7 between CCl2 and support l.
Since this is provided, it is possible to effectively prevent non-uniform injection of holes from the support side as shown in FIG. 8, and at the same time, it is possible to efficiently transport electrons, which are photocarriers, to the support side during light irradiation.
なお、本発明の感光体は、上記した構成(即ち、CGL
上にCTLを積層)以外にも、第3図のように、キャリ
ア発生物質(CGM)とキャリア輸送物質(CTM)を
混合した単一層のPCL8からなっていてもよ1,1o
又、第4図のように、CCl2とCTL 4とを上下逆
にした層構成(正帯電用)としてもよい。又、本発明の
感光体において、耐刷性向上等のため感光体表面に保護
層(保護層:○CL)を形成しても良く、例えば合成樹
脂被膜をコーティングして良い。Note that the photoreceptor of the present invention has the above-described structure (i.e., CGL
In addition to stacking CTL on top), as shown in Fig. 3, it may be made of a single layer of PCL8 in which a carrier generating material (CGM) and a carrier transporting material (CTM) are mixed.
Alternatively, as shown in FIG. 4, a layer structure in which CCl2 and CTL 4 are turned upside down (for positive charging) may be used. Further, in the photoreceptor of the present invention, a protective layer (protective layer: ◯CL) may be formed on the surface of the photoreceptor in order to improve printing durability, etc., and for example, a synthetic resin film may be coated.
次に、本発明の感光体に使用するCGMを一般式で示す
。Next, CGM used in the photoreceptor of the present invention is shown by a general formula.
■、多環キノン顔料
(1)アントアントロン顔料
一般式〔G1〕 :
(2) ジベンズピレンキノン顔料
一般式(c2):
(3)ビラシトロン顔料
一般式(G3):
上記において、
X:ハロゲン原子、ニド四基、シアノ基、アシル基、又
はカルボキシル基。■, Polycyclic quinone pigment (1) Anthoanthrone pigment general formula [G1]: (2) Dibenzpyrenequinone pigment general formula (c2): (3) Bilacitron pigment general formula (G3): In the above, X: halogen atom , nido tetragroup, cyano group, acyl group, or carboxyl group.
n=o〜4
m=o〜6
2、アズレニウム化合物
アズレニウム化合物は例えば下記公報記載の化金物であ
る。n=o~4 m=o~6 2, Azulenium Compound The azulenium compound is, for example, a metal compound described in the following publication.
(イ)特開昭61−1547
(ロ) 同 61− 1548
(ハ) 同 6l−15147
(ニ) 同 6l−15150
(ホ) 同 61−15151
アズレニウム化合物の具体例としては、例えば下北一般
式のものが挙げられる。(a) JP 61-1547 (b) JP 61-1548 (c) JP 61-15147 (d) JP 61-15150 (e) JP 61-15151 Specific examples of azulenium compounds include, for example, the Shimokita general formula Things can be mentioned.
一般式1:G4):
但し、上記一般式中、
R11,R12、R13、R14、R15、R16、R
I7=水素原子、ノ・ロゲン原子、又は有機残基を表す
。又、R11とRI2、R12とRI3、R目とRI4
、R”とRIS、R”とRli、R1″とR17の組合
せのうち、いずれか1つの組合せで置換又は無置換の縮
合環を形成しても良い。General formula 1: G4): However, in the above general formula, R11, R12, R13, R14, R15, R16, R
I7=represents a hydrogen atom, a hydrogen atom, or an organic residue. Also, R11 and RI2, R12 and RI3, R eye and RI4
, R'' and RIS, R'' and Rli, and R1'' and R17, any one combination may form a substituted or unsubstituted condensed ring.
Ar’、Ar”ニアリール基を表す。Ar', Ar'' represents a nialyl group.
R18、R19:置換若しくは無置換の統記3種の基;
アルキル基、アリール基、アラルキル基を表す。又、R
”とR19とで窒素原子と共に環を形成しても良い。R18, R19: substituted or unsubstituted three types of groups;
Represents an alkyl group, an aryl group, or an aralkyl group. Also, R
” and R19 may form a ring together with the nitrogen atom.
Lθ:アニオン残基を表す。Lθ: represents an anion residue.
かかるアズレニウム塩の代表的具体例として(ま、次の
ものが挙げられる。Typical examples of such azulenium salts include the following.
3、ンアニン色素
シアニン色素は公知であり、例えば特開昭58−118
650号、同58−224354号、同59−1460
6号記載の化合物がある。3. Cyanine dye Cyanine dye is known, for example, disclosed in Japanese Patent Application Laid-open No. 58-118.
No. 650, No. 58-224354, No. 59-1460
There is a compound described in No. 6.
4、フタロシアニン化合物
有機系光導電材料の一つであるフタロシアニン系化合物
は、他のものに比べ感光域が長波長域に拡大しているこ
とが知られている。そしてβ型のフタロシアニン化合物
が結晶形の安定なβ型のフタロンアニン化合物に変わる
過程で各種結晶形のフタロシアニン化合物が見出されて
いる。これらの光導電性を示すフタロシアニン系化合物
としては、例えば特公昭49−4338号記載のX型無
金属フタロンアニン化合物、特開昭58−182639
号、同6〇−19151号に記載されているで、τ′、
1%V′型無金属フタロシアニン化合物、特開昭63−
1482.69号に記載されているフタロシアニン化合
物等の他、各種の金属フタロシアニン化合物が例示され
る。4. Phthalocyanine compounds It is known that phthalocyanine compounds, which are one type of organic photoconductive materials, have a photosensitive range extending to a longer wavelength range than other compounds. Various crystalline forms of phthalocyanine compounds have been discovered in the process of converting β-type phthalocyanine compounds into stable crystalline β-type phthalonanine compounds. Examples of these phthalocyanine compounds exhibiting photoconductivity include X-type metal-free phthalonanine compounds described in Japanese Patent Publication No. 49-4338, Japanese Patent Application Laid-open No. 182639-1980,
No. 60-19151, τ′,
1% V' type metal-free phthalocyanine compound, JP-A-63-
In addition to the phthalocyanine compounds described in No. 1482.69, various metal phthalocyanine compounds are exemplified.
例えばチタル7タロシアニン化合物J二ついて特願昭6
2−241938号に記載されているものがある。この
他、特に半導体レーザに好適なフタロシアニン化合物を
例示する。For example, there are two tital 7 talocyanine compounds J, and the patent application was made in 1986.
There is one described in No. 2-241938. In addition, phthalocyanine compounds particularly suitable for semiconductor lasers are exemplified.
フタロシアニン例示化合物
5、アゾ化合物
ジスアゾ化合物として、下記一般式に示すものが例示さ
れる。Phthalocyanine Exemplary Compound 5, Azo Compound Examples of the disazo compound include those shown in the general formula below.
一般式(G6): %式% 等がある。General formula (G6): %formula% etc.
又、その他のアゾ化合物として、下記各一般式%式%
一般式CG7):
Cp−N=N−Ar3−N=N−Ar’−N=N−Cp
Ar’
N=N−cp
一般式〔G8〕 :
Cp−N=N−AS−N=N−Ar’−N=N−Cp一
般式〔G9〕 :
Cp−N = N−Ar5−N = N−Ar’−N
= N−Ar’−N = N −Cp但し、Ar3、A
r’、Ar’は、それぞれ置換若しくは無置換の次記2
種の基:炭素環式芳香族環基、複素環式芳香族環基を表
す。In addition, as other azo compounds, each of the following general formulas (% formula %) General formula CG7): Cp-N=N-Ar3-N=N-Ar'-N=N-Cp
Ar' N=N-cp General formula [G8]: Cp-N=N-AS-N=N-Ar'-N=N-Cp General formula [G9]: Cp-N=N-Ar5-N=N -Ar'-N
= N-Ar'-N = N-Cp However, Ar3, A
r' and Ar' are each substituted or unsubstituted following 2
Species group: represents a carbocyclic aromatic ring group or a heterocyclic aromatic ring group.
更に、Ar’、Ar’、Ar5の具体例を例示すると、
又、Cp(カプラー)としては、例えば次のようなもの
がある。Further, specific examples of Ar', Ar', and Ar5 are as follows:
Furthermore, examples of Cp (coupler) include the following.
但し、Aとしては、
CGLにおいて、CGMのバインダ物質に対する含有量
比は5/1−1/10とするのが好ましく 、3/1〜
1/3とすると更に好ましい。However, as for A, in CGL, the content ratio of CGM to binder substance is preferably 5/1 to 1/10, and 3/1 to 1/10.
It is more preferable to set it to 1/3.
CGMの含有量比が上記範囲より大きいと黒斑点等が現
れ易くなる。但し、CGMの割合があまり小さいと却っ
て光感度等が低下してしまう。When the content ratio of CGM is larger than the above range, black spots etc. tend to appear. However, if the proportion of CGM is too small, the photosensitivity etc. will actually decrease.
CGLの膜厚は0.1〜lOum以上とすることが好ま
しく、0.2〜5μmの範囲内とすることがより好まし
い。CT−Lの膜厚は10μm以上であることが好まし
い。The thickness of the CGL is preferably 0.1 to 1 Oum or more, more preferably 0.2 to 5 μm. The film thickness of CT-L is preferably 10 μm or more.
感光層全体の膜厚は10〜40μmの範囲内とするのが
好ましく、15〜30μmの範囲内とすると更に好まし
い。この膜厚が上記範囲内よりも小さいと、薄いために
帯電電位が小さくなり、耐刷性も低下する傾向がある。The thickness of the entire photosensitive layer is preferably within the range of 10 to 40 μm, and more preferably within the range of 15 to 30 μm. If the film thickness is smaller than the above range, the charging potential will be low due to the thinness, and the printing durability will also tend to decrease.
又、膜厚が上記範囲よりも大きいと、却って残留電位は
上昇する上に、上記したCGLが厚すぎる場合と同様に
キャリア移動途中でトラップサイトにつかまり、十分な
輸送能が得がたくなる傾向が現れ、このため繰返し使用
時には残留電位の上昇が起こり易くなる。Furthermore, if the film thickness is larger than the above range, the residual potential will increase on the contrary, and as in the case where the CGL is too thick, carriers will be caught at trap sites during movement, making it difficult to obtain sufficient transport performance. Therefore, the residual potential tends to increase during repeated use.
CGL中にCTMをも含有せしめることも可能である。It is also possible to include CTM in CGL.
粒状のCC,Mを分散せしめてPCLを形成する場合に
おいては、該CGMは2μm以下、好ましくは1μm以
下、更に好ましくは0.5μm以下の平均粒径の粉粒体
とされるのが好ましい。When PCL is formed by dispersing granular CC, M, the CGM is preferably in the form of powder having an average particle size of 2 μm or less, preferably 1 μm or less, and more preferably 0.5 μm or less.
又、キャリア輸送層において、キャリア輸送物質は、バ
インダ物質との相溶性に優れたものが好ましい。Further, in the carrier transport layer, the carrier transport substance preferably has excellent compatibility with the binder substance.
これにより、バインダ物質に対する量を多くしても濁り
及び不透明化を生ずることがないので、バインダ物質と
の混合割合を非常に広くとることができ、又、相溶性が
優れていることから電荷発生層が均一、かつ安定であり
、結果的に感度、帯電特性がより良好となり、更に高感
度で鮮明な画像を形成できる感光体をうろことができる
。As a result, turbidity and opacity do not occur even if the amount of the binder substance is increased, so the mixing ratio with the binder substance can be set at a very wide range. The layer is uniform and stable, resulting in better sensitivity and charging characteristics, and a photoreceptor that can form clear images with higher sensitivity can be used.
更に、特に反復転写式電子写真に用いたとき、疲労劣化
を生ずることが少ないという作用効果を奏することがで
きる。Furthermore, especially when used in repeated transfer type electrophotography, it is possible to achieve the effect that fatigue deterioration is less likely to occur.
本発明で使用可能なCTMは、カルバゾール誘導体、オ
キサゾール誘導体、オキサジアゾール誘導体、チアゾー
ル誘導体、チアジアゾール誘導体、トリアゾール誘導体
、イミダゾール誘導体、イミダシロン誘導体、イミダゾ
リジン誘導体、ビスイミダゾリジン誘導体、スチリル化
合物、ヒドラゾン化合物、ピラゾリン誘導体、オキサシ
ロン誘導体、ベンゾチアゾール誘導体、ベンズイミダゾ
ール誘導体、キナゾリン誘導体、ベンゾフラン誘導体、
アクリジン誘導体、フェナジン誘導体、アミノスチルベ
ン誘導体、トリアリールアミン誘導体、フェニレンジア
ミン誘導体、スチルベン誘導体、ポリ−N−ビニルカル
バゾール、ポリ−1−ビニルピレン、ポリ−9−ビニル
アントラセン等から選ばれた1種又は2種以上であって
よい。CTMs that can be used in the present invention include carbazole derivatives, oxazole derivatives, oxadiazole derivatives, thiazole derivatives, thiadiazole derivatives, triazole derivatives, imidazole derivatives, imidasilone derivatives, imidazolidine derivatives, bisimidazolidine derivatives, styryl compounds, hydrazone compounds, Pyrazoline derivatives, oxacilone derivatives, benzothiazole derivatives, benzimidazole derivatives, quinazoline derivatives, benzofuran derivatives,
One or two selected from acridine derivatives, phenazine derivatives, aminostilbene derivatives, triarylamine derivatives, phenylenediamine derivatives, stilbene derivatives, poly-N-vinylcarbazole, poly-1-vinylpyrene, poly-9-vinylanthracene, etc. It may be more than one species.
かかるキャリア輸送物質の具体的化合物例は特開昭63
−50851号に記載されている。Specific examples of such carrier transport substances are disclosed in JP-A-63
-50851.
以下lこその一般式を掲げる。The general formula is listed below.
キャリア輸送物質として次の一般式(Tl)又は〔T2
〕のスチリル化合物が使用可能である。The following general formula (Tl) or [T2
] styryl compounds can be used.
一般式(Tl):
但し、この一般式中、
R21、R22:置換若しくは無置換ま2種の基;アル
キル基、アリール基を表し、
置換基としてはアルキル基、アル
コキシ基、置換アミノ基、水酸基、
ハロゲン原子、アリール基を用い
る。General formula (Tl): However, in this general formula, R21, R22: substituted or unsubstituted or two types of groups; represent an alkyl group, an aryl group, and the substituents include an alkyl group, an alkoxy group, a substituted amino group, a hydroxyl group , a halogen atom, and an aryl group are used.
A rls、 A r” :置換若しくは無置換のアリ
ール基を表し、置換基としてアルキル
基、アルコキシ基、置換アミノ基、
水酸基、ハロゲン原子、アリール
基を用いる。Arls, Ar”: represents a substituted or unsubstituted aryl group, and an alkyl group, an alkoxy group, a substituted amino group, a hydroxyl group, a halogen atom, or an aryl group is used as a substituent.
R23、R24、置換若しくは無置換のアリール基、水
素原子を表し、置換基としては
アルキル基、アルコキシ基、置換
アミノ基、水酸基、ハロゲン原子、
アリール基を用いる。R23 and R24 represent a substituted or unsubstituted aryl group or a hydrogen atom, and as a substituent, an alkyl group, an alkoxy group, a substituted amino group, a hydroxyl group, a halogen atom, or an aryl group is used.
一般式(T2):
但し、この一般式中、
R25:置換若しくは無置換のアリール基、R2′:水
素原子、ハロゲン原子、置換若しくは無置換の3種の基
:アルキ
ル基、アルコキシ基、アミノ基及
び水酸基、
R27:置換若しくは無置換の2種の基;アルキル基、
複素環基を表す。General formula (T2): However, in this general formula, R25: substituted or unsubstituted aryl group, R2': hydrogen atom, halogen atom, three types of substituted or unsubstituted groups: alkyl group, alkoxy group, amino group and hydroxyl group, R27: two types of substituted or unsubstituted groups; alkyl group,
Represents a heterocyclic group.
又、CTMとして次の一般式〔T3〕、〔T4〕、(T
4a)、(T4b)又は〔T5〕のヒドラゾン化合物も
使用可能である。In addition, the following general formulas [T3], [T4], (T
The hydrazone compounds of 4a), (T4b) or [T5] can also be used.
一般式[T3):
但し、この一般式中、
R”及びRnコそれぞれ水素原子又はハロゲン原子、
R3G及びR31=それぞれ置換若しくは無置換のアリ
ール基、
Ar”:置換若しくは無置換のアリール基を表す。General formula [T3): However, in this general formula, R'' and Rn are each a hydrogen atom or a halogen atom, R3G and R31 are each a substituted or unsubstituted aryl group, Ar'': a substituted or unsubstituted aryl group .
一般式(T4):
但し、この一般式中、
RXX:@換若しくは無置換の3種の基、カルバゾリル
基、複素環基を表し、
R33、R34及びR35:水素原子、アルキル基;ア
リール基、置換若しくは無置換
の2種の基;アリール基、アラル
キル基を表す。General formula (T4): However, in this general formula, RXX: represents three types of @substituted or unsubstituted groups, a carbazolyl group, and a heterocyclic group, R33, R34, and R35: hydrogen atom, alkyl group; aryl group, Two types of substituted or unsubstituted groups: an aryl group and an aralkyl group.
一般式〔T4a〕 :
但し、この一般式中、
R36:メチル基、エチル基、2〜ヒドロキシエチル基
又は2−クロルエチル
基、
R37:メチル基、エチル基、ベンジル基又はフェニル
基、
R311=メチル基、エチル基、ベンジル基又はフェニ
ル基を示す。General formula [T4a]: However, in this general formula, R36: methyl group, ethyl group, 2-hydroxyethyl group, or 2-chloroethyl group, R37: methyl group, ethyl group, benzyl group, or phenyl group, R311 = methyl group , represents an ethyl group, a benzyl group or a phenyl group.
但し、この一般式中、R3′は置換若しくは無置換のす
7チル基;R40は置換若しくは無置換のアルキル基、
アラルキル基、アリール基:R41は水素原子、アルキ
ル基又はアリール基;R42及び2口は置換若しくは無
置換のアルキル基、アラルキル基又はアリール基からな
る互いに同一の若しくは異なる基を示す。However, in this general formula, R3' is a substituted or unsubstituted 7-tyl group; R40 is a substituted or unsubstituted alkyl group,
Aralkyl group, aryl group: R41 is a hydrogen atom, an alkyl group, or an aryl group; R42 and two groups each represent a substituted or unsubstituted alkyl group, an aralkyl group, or an aryl group, which may be the same or different from each other.
一般式(T5):
但し、この一般式中、
R41:置換若しくは無置換の2種の基;アリール基、
複素環基、
R45:水素原子、置換若しくは無置換の2種の基;ア
ルキル基、アリール
基、
Q:水素原子、ハロゲン原子、アルキ
ル基、置換アミノ基、アルコキシ
基又はシアノ基、
S:O又は1の整数を表す。General formula (T5): However, in this general formula, R41: two types of substituted or unsubstituted groups; aryl group,
Heterocyclic group, R45: hydrogen atom, two types of substituted or unsubstituted groups; alkyl group, aryl group, Q: hydrogen atom, halogen atom, alkyl group, substituted amino group, alkoxy group or cyano group, S: O or Represents an integer of 1.
又、CTMとして、次の一般式〔T6〕のピアゾリン化
合物も使用可能である。Furthermore, a piazoline compound represented by the following general formula [T6] can also be used as the CTM.
一般式(T6):
但し、この一般式中、
1:0又はl、
R”及びR67:置換若しくは無置換のアリール基、R
4a、置換若しくは無置換のアリール基若しくは複素環
基、
R1%及びR50:水素原子、炭素原子数1〜4のアル
キル基、又は置換若しくは無量
換のアリール基若しくはアラルキ
ル基(但し、R”及びR50は共に
水素原子であることはなく、又前
記lが0のときはR4′は水素原子
ではない。)
更に、次の一般式〔T7〕のアミン誘導体もCTMとし
て使用できる。General formula (T6): However, in this general formula, 1:0 or l, R'' and R67: substituted or unsubstituted aryl group, R
4a, substituted or unsubstituted aryl group or heterocyclic group, R1% and R50: hydrogen atom, alkyl group having 1 to 4 carbon atoms, or substituted or unsubstituted aryl group or aralkyl group (however, R'' and R50 are not both hydrogen atoms, and when 1 is 0, R4' is not a hydrogen atom.) Furthermore, an amine derivative of the following general formula [T7] can also be used as a CTM.
一般式[:T7):
但し、この一般式中、
Ar”、Ar”:置換若しくは無置換のフェニル基を表
し、置換基としてはノーロゲン
原子、アルキル基、ニトロ基、ア
ルコキシ基を用いる。General formula [:T7): However, in this general formula, Ar'', Ar'' represents a substituted or unsubstituted phenyl group, and a norogen atom, an alkyl group, a nitro group, or an alkoxy group is used as a substituent.
A r” :置換若しくは無置換のフェニル基、ナフチ
ル基、アントリル基、フル
オレニル基、複素環基を表し、置
換基としてはアルキル基、アルコ
キシ基、ハロゲン原子、水酸基、
アリールオキシ基、アリール基、
アミン基、ニトロ基、ピペリジノ
基、モルホリノ基、ナフチル基、
アンスリル基及び置換アミノ基を
用いる。A r”: Represents a substituted or unsubstituted phenyl group, naphthyl group, anthryl group, fluorenyl group, or heterocyclic group, and substituents include an alkyl group, an alkoxy group, a halogen atom, a hydroxyl group, an aryloxy group, an aryl group, and an amine. group, nitro group, piperidino group, morpholino group, naphthyl group, anthryl group and substituted amino group.
但し、置換アミノ基の置換基と してアシル基、アルキル基、アリ ール基を用いる。However, the substituent of the substituted amino group acyl group, alkyl group, ali Uses a metal group.
更に、次の一般式〔T8〕の化合物もCTMとして使用
できる。Furthermore, a compound of the following general formula [T8] can also be used as a CTM.
一般式〔T8〕 :
但し、この一般式中、
A r 21 :置換又は無置換のアリーレン基を表し
、
R51、RS2、H53及びH64
:置換若しくは無置換の3種の基:
アルキル基、アリール基、アラル
キル基を表す。General formula [T8]: However, in this general formula, A r 21 represents a substituted or unsubstituted arylene group, R51, RS2, H53 and H64: three substituted or unsubstituted groups: alkyl group, aryl group , represents an aralkyl group.
更に、次に一般式〔T9〕の化合物もCTMとして使用
できる。Furthermore, the compound of general formula [T9] can also be used as a CTM.
一般式(T9] :
但し、この一般式中、R55,R5M、RS7及びH5
ffiは、それぞれ水素原子、置換若しくは無置換のア
ルキル基、シクロアルキル基、アルケニル基、アリール
基、ベンジル基又はアラルキル基、R59及びRaoは
、それぞれ水素原子、置換若しくは無置換の炭素原子数
1〜40のアルキル基、ンクロアルキル基、アルケニル
基、シクロアルケニル基、アリール基又はアラルキル基
(但し、RS9とR”とか共同して炭素原子数3〜lO
の飽和若しくは無飽和の炭化水素環を形成してもよい。General formula (T9): However, in this general formula, R55, R5M, RS7 and H5
ffi is a hydrogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, a benzyl group, or an aralkyl group; R59 and Rao are each a hydrogen atom, a substituted or unsubstituted group having 1 to 1 carbon atoms; 40 alkyl groups, cycloalkyl groups, alkenyl groups, cycloalkenyl groups, aryl groups, or aralkyl groups (however, RS9 and R'' jointly have 3 to 10 carbon atoms)
may form a saturated or unsaturated hydrocarbon ring.
)
R”、R”、R63及びR64は、それぞれ水素原子、
ハロゲン原子、ヒドロキシル基、置換若しくは無置換の
アルキル基、シクロアルキル基、アルケニル基、アリー
ル基、アラルキル基、アルコキン基、アミノ基、アルキ
ルアミノ基又はアリールアミノ基である。) R", R", R63 and R64 are each a hydrogen atom,
These include a halogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkyne group, an amino group, an alkylamino group, or an arylamino group.
CTL、CGL中に酸化防止剤を含有せしめることがで
きる。An antioxidant can be contained in CTL and CGL.
これにより放電で発生するオゾンの影響を抑制でき、繰
返し使用時の残留電位上昇や帯電電位の低下を防止でき
る。This can suppress the influence of ozone generated during discharge, and can prevent an increase in residual potential and a decrease in charged potential during repeated use.
酸化防止剤としては、ヒンダードフェノール、ヒンダー
ドアミン、パラフェニレンジアミン、アリールアルカン
、ハイドロキノン、スピロクロマン、スピロインダノン
及びそれらの誘導体、有機硫黄化合物、有機燐化合物等
が挙げられる。Examples of the antioxidant include hindered phenol, hindered amine, paraphenylene diamine, aryl alkane, hydroquinone, spirochroman, spiroindanone and derivatives thereof, organic sulfur compounds, organic phosphorus compounds, and the like.
これらの具体的化合物としては、特開昭63−4466
2号、同63−14153号、同63−50849号、
同63−18355号、同63−58455号、同13
3−71856号、同63−71855号及び同66−
146046号に記載がある。These specific compounds are disclosed in Japanese Patent Application Laid-Open No. 63-4466.
No. 2, No. 63-14153, No. 63-50849,
No. 63-18355, No. 63-58455, No. 13
No. 3-71856, No. 63-71855 and No. 66-
It is described in No. 146046.
感光層中に高分子半導体を含有せしめることもできる。A polymer semiconductor can also be included in the photosensitive layer.
こうした高分子有機半導体のうちポリ−N−ビニルカル
バゾール又はその半導体が効果が大であり、好ましく用
いられる。かかるポリ−N−ビニルカルバゾール誘導体
とは、その繰返し単位における全部又は一部のカルバゾ
ール環が種々の置換基、例えばアルキル基、ニトロ基、
アミノ基、ヒドロキシ基又はハロゲン原子によって置換
されたものである。Among these polymeric organic semiconductors, poly-N-vinylcarbazole or its semiconductor is highly effective and is preferably used. Such poly-N-vinylcarbazole derivatives mean that all or part of the carbazole ring in the repeating unit has various substituents, such as an alkyl group, a nitro group,
It is substituted with an amino group, a hydroxy group, or a halogen atom.
又、感光層内に感度の向上、残留電位ないし反復使用時
の疲労低減等を目的として、少なくとも1種の電子受容
性物質を含有せしめることができる。Further, at least one electron-accepting substance may be contained in the photosensitive layer for the purpose of improving sensitivity, reducing residual potential or fatigue during repeated use, and the like.
本発明の感光体に使用可能な電子受容性物質としては、
例えば無水琥珀峻厳、無水マレイン酸、ジブロム無水マ
レイン酸、無水7タル酸、テトラクロル無水フタル酸、
テトラブロム無水フタル酸、3−ニトロ無水フタル酸、
4−ニトロ無水フタル酸、無水ピロメリット酸、無水メ
リット酸、テトラ/アノエチレン、テトランアノキノジ
メタン、0−ジニトロベンゼン、m−ジニトロベンゼン
、1,3.5−1リニトロベンゼン、バラニトロベンゾ
ニトリル、ビクリルクロライド、キノンクロルイミド、
クロラニル、ブルマニル、2−メチルナフトキノン、ジ
クロルジシアノバラベンゾキノン、アントラキノン、ジ
ニトロアントラキノン、トリニトロフルオレノン、9−
フルオレニリデンー〔ジシアノメチレンマロノジニトリ
ル〕、ポリニトロ−9−フルオレニリデンー〔ジシアノ
メチリンマロノジニトリル〕、ピクリン酸、O−ニトロ
安息香酸、p−ニトロ安息香酸、3,5−ジニトロ安息
香酸、ペンタフルオル安息香酸、5−ニトロサリチル酸
、3.5−ジニトロサリチル酸、7タル酸、メリット酸
、その他の電子親和力の大きい化合物の一種又は二種以
上を挙げることができる。これらのうち、フルオレノン
系、キノン系やCI、 CN、 No□等の電子吸引性
の置換基のあるベンゼン誘導体が特によい。Electron-accepting substances that can be used in the photoreceptor of the present invention include:
For example, amber anhydride, maleic anhydride, dibromaleic anhydride, heptatalic anhydride, tetrachlorophthalic anhydride,
Tetrabromo phthalic anhydride, 3-nitro phthalic anhydride,
4-nitrophthalic anhydride, pyromellitic anhydride, mellitic anhydride, tetra/anoethylene, tetraanoquinodimethane, 0-dinitrobenzene, m-dinitrobenzene, 1,3.5-1 linitrobenzene, varanitrobenzonitrile , vicryl chloride, quinone chlorimide,
Chloranil, brumanil, 2-methylnaphthoquinone, dichlordicyanobarabenzoquinone, anthraquinone, dinitroanthraquinone, trinitrofluorenone, 9-
Fluorenylidene [dicyanomethylene malonodinitrile], polynitro-9-fluorenylidene [dicyanomethylene malonodinitrile], picric acid, O-nitrobenzoic acid, p-nitrobenzoic acid, 3,5-dinitrobenzoic acid Examples include one or more compounds having a large electron affinity, such as pentafluorobenzoic acid, 5-nitrosalicylic acid, 3,5-dinitrosalicylic acid, heptatalic acid, mellitic acid, and other compounds. Among these, fluorenone series, quinone series, and benzene derivatives having electron-withdrawing substituents such as CI, CN, and No□ are particularly preferred.
又、更に表面改質剤としてシリコーンオイル、弗素系界
面活性剤を存在させてもよい。又、耐久性向上剤として
アンモニウム化合物が含有されていてもよい。Furthermore, silicone oil or fluorine-based surfactant may be present as a surface modifier. Further, an ammonium compound may be contained as a durability improver.
更に紫外線吸収剤用いてもよい。Furthermore, an ultraviolet absorber may be used.
好ましい紫外線吸収剤としては、安息香酸、スチルベン
化合物等及びその誘導体、トリアゾール化合物、イミダ
ゾール化合物、トリアジン化合物、クマリン化合物、オ
キサジアゾール化合物、チアゾール化合物及びその誘導
体等の含窒素化合物類が用いられる。Preferred ultraviolet absorbers include nitrogen-containing compounds such as benzoic acid, stilbene compounds and derivatives thereof, triazole compounds, imidazole compounds, triazine compounds, coumarin compounds, oxadiazole compounds, thiazole compounds and derivatives thereof.
感光体の構成層に使用可能なバインダ樹脂としては、例
えばポリエチレン、ポリプロピレン、アクリル樹脂、メ
タクリル樹脂、塩化ビニル樹脂、酢酸ビニル樹脂、エポ
キシ樹脂、ポリウレタン樹脂、ポリエステル樹脂、アル
キッド樹脂、ポリカーボネート樹脂、メラミン樹脂、メ
タクリル樹脂、アクリル樹脂、ポリ塩化ビリニデン、ポ
リスチレン等の付加重合型樹脂、重付加型樹脂、重縮合
型樹脂並びにこれらの繰返し本位のうち2つ以上を含む
共重合体樹脂、塩化ビニル−酢酸ビニル共重合体樹脂等
の絶縁性樹脂、スチレン−ブタジェン共重合体樹脂、塩
化ビニリデン−アクリロニトリル共重合体樹脂等、更に
はN−ビニルカンバゾール等の高分子有機半導体、変性
ンリコーン樹脂等を挙げることができる。Examples of binder resins that can be used for the constituent layers of the photoreceptor include polyethylene, polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, vinyl acetate resin, epoxy resin, polyurethane resin, polyester resin, alkyd resin, polycarbonate resin, and melamine resin. , addition polymer resins such as methacrylic resins, acrylic resins, polyvinidene chloride, polystyrene, polyaddition resins, polycondensation resins, copolymer resins containing two or more of these repeating groups, vinyl chloride-vinyl acetate Examples include insulating resins such as copolymer resins, styrene-butadiene copolymer resins, vinylidene chloride-acrylonitrile copolymer resins, polymeric organic semiconductors such as N-vinylcambazole, modified linicone resins, etc. can.
上記のバインダは、単独であるいは2種以上の混合物と
して用いることができる。The above binders can be used alone or as a mixture of two or more.
必要に応じて設けられる保護層のバインダとしては、体
積抵抗10”Ω・cm以上、好ましくは1010Ω・c
m以上、より好ましくは10”Ω・cm以上の透明樹脂
が用いられる。The binder for the protective layer provided as necessary has a volume resistivity of 10"Ω・cm or more, preferably 1010Ω・c
A transparent resin having a resistance of 10"Ω·cm or more is used, more preferably 10"Ω·cm or more.
又前記のバインダは熱により硬化する樹脂を用いてもよ
く、かかる熱により硬化する樹脂としては、例えば熱硬
化性アクリル樹脂、エポキシ樹脂、ウレタン樹脂、尿素
樹脂、ポリエステル樹脂、アルキッド樹脂、メラミン樹
脂、又はこれらの共重合若しくは縮合樹脂があり、その
他電子写真材料に供される熱硬化性樹脂の全てが利用さ
れる。Further, the binder may be a resin that is cured by heat, and examples of the resin that is cured by heat include thermosetting acrylic resin, epoxy resin, urethane resin, urea resin, polyester resin, alkyd resin, melamine resin, Alternatively, there are copolymerized or condensed resins thereof, and all other thermosetting resins used in electrophotographic materials can be used.
又、前記保護層中には加工性及び物性の改良(亀裂防止
、柔軟性付与等)を目的として必要により熱可塑性樹脂
を50wt%未満含有せしめることができる。かかる熱
可塑性樹脂としては、例えばポリプロピレン、アクリル
樹脂、メタクリル樹脂、塩化ビニル樹脂、エポキシ樹脂
、ポリカーボネート樹脂又はこれらの共重合体樹脂、ポ
リ−N−ビニルカルバゾール等の高分子有機半導体、そ
の他電子写真材料に供される熱可塑性樹脂の全てが利用
される。Further, if necessary, the protective layer may contain less than 50 wt % of a thermoplastic resin for the purpose of improving processability and physical properties (preventing cracks, imparting flexibility, etc.). Examples of such thermoplastic resins include polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, epoxy resin, polycarbonate resin, or copolymer resins thereof, polymeric organic semiconductors such as poly-N-vinylcarbazole, and other electrophotographic materials. All of the thermoplastic resins that are available are utilized.
CGLは、次のような方法によって設けることができる
。CGL can be provided by the following method.
(イ)CGM等にバインダ、溶媒を加えて混合溶解した
溶液を塗布する方法。(a) A method in which a binder and a solvent are added to CGM, etc., and a mixed solution is applied.
(ロ)CGM等をボールミル、ホモミキサ、サンドミル
、超音波分散機、アトライタ等によって分散媒中で微細
粒子とし、バインダを加えて混合分散して得られる分散
液を塗布する方法。(b) A method in which CGM, etc. is made into fine particles in a dispersion medium using a ball mill, homomixer, sand mill, ultrasonic disperser, attritor, etc., and a binder is added, mixed and dispersed, and the resulting dispersion is applied.
これらの方法において超音波の作用下に粒子を分散させ
ると、均一分散が可能になる。Dispersing the particles under the action of ultrasound in these methods allows for homogeneous dispersion.
又、CTLは、既述のCTMを単独であるいは既述した
バインダ樹脂と共に溶解、分散せしめたものを塗布、乾
燥して形成する二とができる。Further, CTL can be formed by applying and drying the CTM described above alone or dissolved and dispersed together with the binder resin described above.
この場合、CGL中にCTMを含有せしめる場合には、
上記(イ)の溶液、(ロ)の分散液中に予めCTMを溶
解又は分散せしめる方法、即ちCGL中にCTMを添加
する方法がある。この場合は、CTMの添加量をバイン
ダ100重量部に対してl−100重量部の範囲内とす
るのが好ましい。In this case, when CTM is contained in CGL,
There is a method of dissolving or dispersing CTM in advance in the solution of (a) or the dispersion of (b), ie, a method of adding CTM to CGL. In this case, the amount of CTM added is preferably within the range of 1-100 parts by weight per 100 parts by weight of the binder.
又、CTMを含有する溶液をCGL上に塗布し、CGL
を膨潤あるいは一部溶解せしめてCTMをCGL内に拡
散せしめる方法がある。この方法を採用した場合には、
上述のようにCGL中にCTMを添加しておく必要はな
いが、上述の二方法を同時に行うことも差し支えない。In addition, a solution containing CTM is applied onto the CGL, and the CGL
There is a method of diffusing CTM into CGL by swelling or partially dissolving CTM. If you adopt this method,
Although it is not necessary to add CTM to CGL as described above, it is also possible to carry out the two methods described above at the same time.
層の形成に使用される溶剤あるいは分散媒としては、ブ
チルアミン、ジエチルアミン、エチレンジアミン、イン
プロパツールアミン、トリエタノールアミン、トリエチ
レンジアミン、N、N−ジメチルホルムアミド、アセト
ン、メチルエチルケトン、/クロヘキサノン、ベンゼン
、トルエン、キシレン、クロロホルム、1.2−ジクロ
ルエタン、ジクロルメタン、テトラヒドロフラン、ジオ
キサン、メタノール、エタノール、インプロパツール、
酢酸エチル、酢酸ブチル、ジメチルスルホキシド等を挙
げることができる。Solvents or dispersion media used to form the layer include butylamine, diethylamine, ethylenediamine, impropaturamine, triethanolamine, triethylenediamine, N,N-dimethylformamide, acetone, methyl ethyl ketone, /chlorhexanone, benzene, toluene. , xylene, chloroform, 1,2-dichloroethane, dichloromethane, tetrahydrofuran, dioxane, methanol, ethanol, improper tool,
Examples include ethyl acetate, butyl acetate, dimethyl sulfoxide, and the like.
上記PCL1UCL、OCL等は、例えばブレード塗布
、デイツプ塗布、スプレー塗布、ロール塗布、スパイラ
ル塗布等により設けることができる。The above PCL1UCL, OCL, etc. can be provided by, for example, blade coating, dip coating, spray coating, roll coating, spiral coating, etc.
なお、導電性支持体は金属板、金属ドラム又は導電性ポ
リマー、酸化インジウム等の導電性化合物若しくはアル
ミニウム、パラジウム、金等の金属より成る導電性薄層
を塗布、蒸着、ラミネート等の手段j二より、紙、プラ
スチックフィルム等の基体に設けて成るものが用いられ
る。The conductive support may be a metal plate, a metal drum, or a conductive thin layer made of a conductive polymer, a conductive compound such as indium oxide, or a metal such as aluminum, palladium, or gold, by coating, vapor deposition, lamination, or other means. Therefore, those provided on a substrate such as paper or plastic film are used.
次に、本発明の感光体を用いる記録装置の一例を第5図
に示す。Next, FIG. 5 shows an example of a recording apparatus using the photoreceptor of the present invention.
第6図は電子写真法における反転現像法の70−チャー
トである。FIG. 6 is a 70-chart of reversal development in electrophotography.
第5図の装置において、23は上述した有機光導電性物
質のPCL8とUCL7を有し、矢印方向に回転するド
ラム状の像担持体、22は像担持体、23の表面を一様
帯電する帯電器、24は像露光、15は現像器である。In the apparatus shown in FIG. 5, 23 is a drum-shaped image carrier which has the above-mentioned organic photoconductive substances PCL8 and UCL7 and rotates in the direction of the arrow; 22 is an image carrier; the surface of 23 is uniformly charged; A charger, 24 is an image exposure device, and 15 is a developer.
20は像担持体23上にトナー像が形成された画像を記
録体Pに転写し易くするために必要に応じて設けられる
転写前露光ランプ、21は転写器、19は分離用コロナ
放電器、12は記録体Pに転写されたトナー像を定着さ
せる定着器である。20 is a pre-transfer exposure lamp provided as necessary to facilitate the transfer of the toner image formed on the image carrier 23 onto the recording medium P; 21 is a transfer device; 19 is a separation corona discharger; A fixing device 12 fixes the toner image transferred to the recording medium P.
13は除電ランプと除電用コロナ放電器の一方又は両者
の組合せからなる除電器、14は像担持体23の画像を
転写した後の表面の残留トナーを除去するためのクリー
ニングブレードやファーブラシを有するクリーニング装
置である。Reference numeral 13 has a static eliminator consisting of one or a combination of a static eliminator lamp and a corona discharger for static elimination, and 14 has a cleaning blade or a fur brush for removing residual toner on the surface of the image carrier 23 after the image has been transferred. It is a cleaning device.
像露光を半導体レーザで行う場合、第2図の記録装置の
ようにドラム状の像担持体23を用いるものにあっては
、像露光24は、レーザビームスキャナによるものが好
ましい。When the image exposure is performed using a semiconductor laser, it is preferable that the image exposure 24 be performed using a laser beam scanner in a recording apparatus that uses a drum-shaped image carrier 23 like the recording apparatus shown in FIG.
又、像担持体がベルト状のように平面状態をとり得る記
録装置にあっては、像露光を7う77ユ露光とすること
もできる。In addition, in a recording apparatus in which the image bearing member can take a flat state such as a belt shape, the image exposure can be set to 7 to 77 exposures.
以上のような記録装置によって、第6図に示したような
方法を実施することができる。The method shown in FIG. 6 can be carried out using the recording apparatus as described above.
第6図は、像露光部が背景部よりも低電位の静電像とな
る静電像形成法によって静電像が形成され、現像が静電
後に背景部電位と同極性に帯電するトナーが付着するこ
とによって行われる、反転現像の例を示している。Figure 6 shows that an electrostatic image is formed by an electrostatic image forming method in which the image exposure area has a lower potential than the background area, and after development, the toner charged to the same polarity as the background area potential is used. An example of reversal development performed by adhesion is shown.
即ち、最初に、除電器13で除電され、クリーニング装
置14でクリーニングされて、電位が0となっている初
期状態の像担持体23の表面に、帯電器22によって一
様に帯電を施し、その帯電面に像露光24を投影して静
電像部の電位が略0となる像露光を行い、得られた静電
像を現像器I5(トナーT)によって現像する。That is, first, the surface of the image carrier 23 in the initial state, which has been neutralized by the static eliminator 13 and cleaned by the cleaning device 14 and has a potential of 0, is uniformly charged by the charger 22. Image exposure 24 is projected onto the charged surface to perform image exposure such that the potential of the electrostatic image portion becomes approximately 0, and the obtained electrostatic image is developed by a developer I5 (toner T).
なお、この画像形成方法は、ハロゲンランプ、タングス
テンランプ、LED (発光ダイオード)、ヘリウム−
ネオン、アルゴン、ヘリウム−カドミウム等の気体レー
ザ、半導体レーザ等の各種光源に対し適用できる。Note that this image forming method uses halogen lamps, tungsten lamps, LEDs (light emitting diodes), and helium lamps.
It can be applied to various light sources such as gas lasers such as neon, argon, and helium-cadmium, and semiconductor lasers.
本発明の画像形成方法は、電子写真複写機、プリンタ等
の多種多様の用途を有するものである。The image forming method of the present invention has a wide variety of applications such as electrophotographic copying machines and printers.
以下、本発明を実施例について更に詳細に説明するが、
これにより本発明は限定されるものではなく、種々の変
形した他の実施例も勿論含むものである。Hereinafter, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited thereby, and of course includes other embodiments with various modifications.
まず、表1に記したように、UCLNo、UCL−1M
〜5Mの計5個の塗布液を調製し、各々0.6μmのフ
ィルタに濾過し、UCL用塗布液とした。First, as shown in Table 1, UCL No., UCL-1M
A total of 5 coating solutions of ~5M were prepared and each was filtered through a 0.6 μm filter to obtain a UCL coating solution.
これらUCL塗布液にアルミニウムドラム(コニカL’
P−3010レーザプリンタ用)を浸漬し、4mg/d
m2になるように引き上げ速度を調節し、UCLを形成
した。These UCL coating liquids were applied to an aluminum drum (Konica L').
(for P-3010 laser printer), 4mg/d
The pulling speed was adjusted so that the UCL was formed.
UCL−IM−UCL−2Mは通常のポリアミド樹脂で
ありブランクである。UCL-IM-UCL-2M is a normal polyamide resin and is a blank.
UCL−3M−UCL−4Mについては、浸漬塗布後、
ドラムをゆっくり回転させなから80W/cm出力の集
光型中圧水銀灯に約50cmの距離から紫外線照射を6
0秒間行ない、付量4 mg/dm2になるようUCL
を形成せしめた。For UCL-3M-UCL-4M, after dip coating,
While rotating the drum slowly, apply ultraviolet rays from a distance of about 50 cm using a concentrating medium pressure mercury lamp with an output of 80 W/cm.
Perform for 0 seconds and apply UCL so that the coating amount is 4 mg/dm2.
was formed.
UCL−5Mについては、浸漬塗布後、ドラムを回転さ
せながら、加速電圧300KV、 ビーム電流10=1
5mAのESI (カーテンタイプ方式)の電子線加速
器を用いて吸収線量が3〜lOMradの範囲で電子線
照射を行ない、4 mg/d+11”になるようUCL
を形成せしめた。For UCL-5M, after dip coating, while rotating the drum, the acceleration voltage was 300 KV and the beam current was 10 = 1.
Electron beam irradiation was performed using a 5 mA ESI (curtain type) electron beam accelerator with an absorbed dose in the range of 3 to 1 O Mrad, and the UCL was adjusted to 4 mg/d + 11".
was formed.
これらUCLie+布済みドラムは各々2本塗布し、1
本は次のCGL重層塗布を行い、他の1本は、後述する
接着性テスト(基盤目テスト)及び耐溶表1
(註)ネ日本化薬製
次に表2に示す各CGM40gを各バインダ40gと各
溶媒200m1のポリマー溶液に加えて、サンドグライ
ンダにて12時間分散させ、CGL用分散液を調製した
。Two coats of each of these UCLie + cloth drums were applied, and one
This book was coated with the following CGL multilayer coating, and the other one was subjected to the adhesion test (substrate test) and melt resistance Table 1 (Note) made by Nippon Kayaku. Next, 40 g of each CGM shown in Table 2 was applied to each binder. In addition to 200 ml of a polymer solution of each solvent, the mixture was dispersed for 12 hours using a sand grinder to prepare a CGL dispersion liquid.
この分散液に上記UCLを有するシリンダを浸漬し、C
GL付量5mg/dm”になるよう塗布速度を更に表3
に示したC T M 200gと表3に記載の樹脂45
0gとを1.2−ジクロルエタン1500mlに溶解し
、得られた溶液に、前記CGLまで塗布した各々のドラ
ムを浸漬し、200μmの膜厚になるよう塗布速度を調
節して塗布し、100℃で1時間乾燥してCTLを形成
せしめ、積層型感光体を作成した。The cylinder having the above UCL is immersed in this dispersion, and C
The coating speed was further adjusted to obtain a GL coating amount of 5 mg/dm in Table 3.
200 g of CTM shown in Table 3 and resin 45 shown in Table 3
0g and 1,2-dichloroethane were dissolved in 1,500ml of 1,2-dichloroethane, each drum coated up to the CGL was immersed in the resulting solution, the coating speed was adjusted to give a film thickness of 200μm, and the coating was carried out at 100°C. It was dried for 1 hour to form a CTL, thereby producing a laminated photoreceptor.
壽 3
最終的な感光体の積層形態は表4に記載し、併せて、下
記に述べる。3 The final laminated form of the photoreceptor is shown in Table 4, and will also be described below.
測定法により、測定した電子写真特性及び、物性も一緒
に示した。The electrophotographic properties and physical properties measured by the measurement method are also shown.
実施例及び比較例の各感光体のそれぞれをrLP−30
10J (コニカ社製)改造機(半導体レーザ光源搭
載)に搭載し、VMが一600±10 (V ) 1m
するようにグリッド電圧を調節し、0.7+Wの照射
時の露光面の電位をVLとし、現像バイアス−500(
V )で反転現像を行い、画像の白地部分の黒ぼちを評
価した。Each of the photoconductors of Examples and Comparative Examples was rLP-30.
Installed on a 10J (manufactured by Konica) modified machine (equipped with a semiconductor laser light source), with a VM of 1600±10 (V) 1m
Adjust the grid voltage so that
V), and the black spots on the white background of the image were evaluated.
又、5000回のプリントを行い、5000回のプリン
ト後のV、、V tヲV 、10110、■L′。o0
トシタ。Also, 5000 times of printing was performed, and after 5000 times of printing, V, , V twoV , 10110, ■L'. o0
Toshita.
そして、初期からのv&11vLの変位量をそれぞれA
VM””、Δ■Ls000トシタ。Then, the displacement amount of v & 11vL from the initial stage is A
VM"", Δ■Ls000 Toshita.
従ッテ、Δy M′aoo= (y &l5oon+6
6g)、AVL”0O−(VL”” VL) である
。Δy M′aoo= (y &l5oon+6
6g), AVL"0O-(VL""VL).
なお、黒ぼち(黒斑点)の評価は、画像解析装置「オム
ニコン3000形」 (高滓製作所社製)を用いて黒ぼ
ちの粒径と個数を測定し、−(径’) 0.05111
m以上の黒ぼちがIClm2当たり何個あるかにより判
定した。黒ぼち評価の判定基準は、下記表に示す通りで
ある。In addition, the evaluation of black spots (black spots) was performed by measuring the particle size and number of black spots using an image analysis device "Omnicon 3000" (manufactured by Takasu Seisakusho Co., Ltd.).
Judgment was made based on the number of black spots of m or more per IClm2. The criteria for evaluating black spots are as shown in the table below.
なお、黒斑点判定の結果が◎、○であれば実用になるが
、△は実用に適さないことがあり、×である場合は実用
に適さない。Note that if the result of black spot determination is ◎ or ○, it is practical, but if it is △, it may not be suitable for practical use, and if it is ×, it is not suitable for practical use.
又、UCLの耐溶剤性をみるために、UCLの塗布、乾
燥後に、30秒間、メチルエチルケトンに浸漬し、この
後に電子顕微鏡(SEM)観察を行った。浸漬面のUC
Lが均質に残っているものを@、不均質若しくは溶解や
剥がれのあるものを△又はXで示した。In addition, in order to examine the solvent resistance of UCL, after coating and drying UCL, it was immersed in methyl ethyl ketone for 30 seconds, and then observed using an electron microscope (SEM). UC of immersion surface
Those with L remaining homogeneous are indicated with @, and those with heterogeneity, dissolution, or peeling are indicated with △ or X.
UCLとPCLの接着性については、基盤目試験により
評価した。すなわち、隣り合う隙間どうしの間隔がl+
m−のカッタガイドを用い、カッタで導電性支持体まで
縦横に11本平行に傷をつけ、100個のます目(基盤
目)を形成する。その上に輻24mmのセロテープをは
りつけた後、一端から引剥がす。その時に剥離したます
目の数をかぞえて、100個中で残ったまず目の数で表
示した。The adhesion between UCL and PCL was evaluated by a substrate test. In other words, the distance between adjacent gaps is l+
Using an m- cutter guide, make 11 parallel scratches in the vertical and horizontal directions with a cutter to form 100 squares (base squares). After pasting cellophane tape with a diameter of 24 mm on top of it, peel it off from one end. The number of squares that were peeled off at that time was counted and expressed as the number of squares that remained out of 100.
接着性の目安として100/ 100であれば接着性良
好、0/ 100であれば不良とみなす。As a guideline for adhesion, 100/100 is considered good adhesion, and 0/100 is considered poor.
表4に示す結果によれば、本発明による樹脂を用いれば
、繰返し使用時に、帯電能、感度を良好に維持でき、か
つ黒斑点のない良好な画像、又、接着性の優れた感光体
を提供できることがわかる。According to the results shown in Table 4, by using the resin of the present invention, it is possible to maintain good charging ability and sensitivity during repeated use, and to produce good images without black spots, as well as to produce a photoreceptor with excellent adhesion. I know that I can provide it.
逆に比較用のバインダ樹脂を用いた場合、CGL液塗布
後、UCLの一部が溶解するため、重層塗工性が悪く、
又、黒斑点も多く発生した。On the other hand, when a comparative binder resin was used, part of the UCL dissolved after the CGL solution was applied, resulting in poor multilayer coating properties.
In addition, many black spots also occurred.
次に、DC−8010(コニカ社製)用のドラムサイズ
で前述した実施例と同様の各感光体を作成した。そして
、これらの各感光体についてpc−8010で下記に示
す各現像条件で画像出しを行ったところ、各現像条件に
ついて、いずれの感光体を用いた場合も、黒斑点のない
良好な画像が得られた。Next, photoreceptors similar to those in the above-mentioned example were prepared with a drum size for DC-8010 (manufactured by Konica). When images were produced on each of these photoconductors using PC-8010 under the following development conditions, good images without black spots were obtained under each development condition, regardless of which photoconductor was used. It was done.
現像は、いわゆる2成分非接触ジャンピング現像を行っ
た。The development was carried out by so-called two-component non-contact jumping development.
現像条件
平均粒径0.111mのマグネタイト粉末7Qwt%、
バインダ樹脂としてポリエステル樹脂3Qw t%を配
合、混練し、破砕造粒して後粒径20〜30μmに分級
してキャリアとした。このキャリアの比重は約3.5以
下であった。このキャリアに、IF−Bix1800
(コニカ社製)複写機用トナー(ポリエステル樹脂にカ
ーボンを含有させたトナー)をトナー濃度が20wt%
になるように配合し、次の条件下で複写を行った。Development conditions: 7 Qwt% magnetite powder with an average particle size of 0.111 m,
3Qwt% of polyester resin was blended and kneaded as a binder resin, crushed and granulated, and then classified into particle sizes of 20 to 30 μm to obtain a carrier. The specific gravity of this carrier was about 3.5 or less. For this carrier, IF-Bix1800
(manufactured by Konica) Toner for copying machines (toner containing carbon in polyester resin) has a toner concentration of 20 wt%.
Copying was carried out under the following conditions.
像担持体の周速を60mm/sec、像担持体と現像ス
リーブとの間隙をQ、3mm、現像剤層厚を0.05m
++n。The peripheral speed of the image carrier was 60 mm/sec, the gap between the image carrier and the developing sleeve was Q, 3 mm, and the developer layer thickness was 0.05 m.
++n.
現像スリーブの直径を24mm、その回転数を200r
pmとした。The diameter of the developing sleeve is 24 mm, and the rotation speed is 200 r.
It was set as pm.
現像バイアス等については以下の3種類の条件とした。Regarding the developing bias and the like, the following three types of conditions were used.
第1図〜第7図は実施例を説明するためのものであって
、第1図(A)、第1図(B)はそれぞれハンドモデル
を用いてキャリアの移動を模式的に示す模式図、
第2図、第3図、第4図は本発明に使用する各感光体の
一部分の断面図、
第5図は像形成装置の概略図、
第6図は像形成の過程を示すフローチャート、第7図は
従来の感光体を示す一部断面図である。
第8図は従来の他の感光体の一部を拡大して示す断面図
である。
なお、図面に示す符号において、
l・・・・・・・・・導電性基体
4・・・・・・・・・キャリア輸送層(CTL)6・・
・・・・・・・キャリア発生層(CGL)7・・・・・
・・・・下引層(UCL)8・・・・・・・・・感光層
(P CL)である。1 to 7 are for explaining the embodiment, and FIG. 1(A) and FIG. 1(B) are schematic diagrams each schematically showing the movement of the carrier using a hand model. , FIG. 2, FIG. 3, and FIG. 4 are sectional views of a portion of each photoreceptor used in the present invention, FIG. 5 is a schematic diagram of an image forming apparatus, and FIG. 6 is a flow chart showing the process of image formation. FIG. 7 is a partial sectional view showing a conventional photoreceptor. FIG. 8 is an enlarged cross-sectional view of a part of another conventional photoreceptor. In addition, in the symbols shown in the drawings, l... Conductive substrate 4... Carrier transport layer (CTL) 6...
...Carrier generation layer (CGL) 7...
. . . Undercoat layer (UCL) 8 . . . Photosensitive layer (PCL).
Claims (1)
けられている感光体において、前記下引層がポリアミド
系放射線硬化型樹脂によって形成されていることを特徴
とする感光体。(1) A photoreceptor in which at least an undercoat layer and a photosensitive layer are provided on a conductive support, wherein the undercoat layer is formed of a polyamide-based radiation-curable resin. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32722290A JPH04195060A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32722290A JPH04195060A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04195060A true JPH04195060A (en) | 1992-07-15 |
Family
ID=18196681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32722290A Pending JPH04195060A (en) | 1990-11-28 | 1990-11-28 | Photosensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04195060A (en) |
-
1990
- 1990-11-28 JP JP32722290A patent/JPH04195060A/en active Pending
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