JPH0419781A - Counter electrode substrate for liquid crystal display device - Google Patents

Counter electrode substrate for liquid crystal display device

Info

Publication number
JPH0419781A
JPH0419781A JP2126033A JP12603390A JPH0419781A JP H0419781 A JPH0419781 A JP H0419781A JP 2126033 A JP2126033 A JP 2126033A JP 12603390 A JP12603390 A JP 12603390A JP H0419781 A JPH0419781 A JP H0419781A
Authority
JP
Japan
Prior art keywords
film
liquid crystal
crystal display
conductive film
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2126033A
Other languages
Japanese (ja)
Inventor
Etsuko Hirose
悦子 広瀬
Akira Kawamoto
川元 暁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2126033A priority Critical patent/JPH0419781A/en
Publication of JPH0419781A publication Critical patent/JPH0419781A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、例えばTPT駆動液晶平面デイスプレィ用
カラーフィルタ等に用いる液晶表示デバイス用対向電極
基板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a counter electrode substrate for a liquid crystal display device used for, for example, a color filter for a TPT-driven liquid crystal flat display.

[従来の技術] 第7図は、例えば特開昭59−10988号公報に示さ
れた従来の液晶表示デバイス用対向電極基板の断面図で
あり、図において、(1)はガラス等の基板、(2)は
着色層、(21)は遮光膜、(5)は透明導電膜、(8
1)は絶縁膜、(7)は配向処理膜である。
[Prior Art] FIG. 7 is a cross-sectional view of a conventional counter electrode substrate for a liquid crystal display device disclosed in, for example, Japanese Patent Laid-Open No. 59-10988. In the figure, (1) is a substrate made of glass or the like; (2) is a colored layer, (21) is a light shielding film, (5) is a transparent conductive film, (8
1) is an insulating film, and (7) is an alignment treated film.

即ち、ガラス基板(1)上に通常用いられるスクリーン
印刷法により着色層(2)が形成され、着色層(2)に
は、例えば顔料を分散したポリイミドなどが用いられる
6次に、この着色層(2)上に真空蒸着法などにより、
 ITO(Indium−Tin−Oxide)膜など
の透明導電膜(5)を形成し、この透明導電膜(5)上
にスパッタ法などにより、チン化シリコンなどの絶縁膜
(61)を形成し、さらに、この絶縁膜(61)上にア
クリル樹脂などの配向処理膜(7)を形成し液晶表示デ
バイス用対向電極基板を得る。
That is, a colored layer (2) is formed on a glass substrate (1) by a commonly used screen printing method, and the colored layer (2) is made of, for example, polyimide in which a pigment is dispersed. (2) By vacuum evaporation method etc.
A transparent conductive film (5) such as an ITO (Indium-Tin-Oxide) film is formed, and an insulating film (61) such as silicon chloride is formed on this transparent conductive film (5) by sputtering or the like. Then, an alignment film (7) made of acrylic resin or the like is formed on this insulating film (61) to obtain a counter electrode substrate for a liquid crystal display device.

[発明が解決しようとする課題] 従来の液晶表示デバイス用対向電極基板は、上記のよう
に構成されているので、液晶デイスプレィの電圧印加用
電極は透明導電膜(5)のみである、透明導電膜(5)
の導電率は低いため、液晶デイスプレィの大型化に伴い
1面内電圧の不均一化が生じる。又、透明導電膜(5)
は透明度が高いものが必要であるが、透明性の向上と導
電率の向上は相反する膜質となり、従って透明性の向上
が困難となるなどの課題があった。
[Problems to be Solved by the Invention] Since the conventional counter electrode substrate for a liquid crystal display device is configured as described above, the voltage application electrode of the liquid crystal display is only a transparent conductive film (5). Membrane (5)
Since the conductivity of the liquid crystal display is low, as the size of the liquid crystal display becomes larger, the voltage becomes non-uniform within one plane. Also, transparent conductive film (5)
Although it is necessary to have high transparency, there are problems in that improving transparency and improving conductivity are contradictory film qualities, making it difficult to improve transparency.

この発明はかかる課題を解消するためになされたもので
、容易に液晶デイスプレィ内の印加電圧を均一化出来る
とともに、透明導電膜の透明性が向上し、液晶表示デバ
イスの表示特性が向上する液晶表示デバイス用対向電極
基板を得ることを目的とする。
This invention was made to solve these problems, and it is possible to easily equalize the applied voltage within the liquid crystal display, improve the transparency of the transparent conductive film, and improve the display characteristics of the liquid crystal display device. The purpose is to obtain a counter electrode substrate for devices.

[課題を解決するための手段] この発明の液晶表示デバイス用対向電極基板は基板、こ
の基板に設けた透明導電膜、並びにこの透明導電膜の上
記基板側および反対側の内の少なくとも一方に、上記透
明導電膜の導電率より大きい導電率であり、上記透明導
電膜と電気的に接続して設けた導電膜を備えたものであ
る。
[Means for Solving the Problems] The counter electrode substrate for a liquid crystal display device of the present invention includes a substrate, a transparent conductive film provided on the substrate, and at least one of the substrate side and the opposite side of the transparent conductive film, The device includes a conductive film having a conductivity higher than that of the transparent conductive film and electrically connected to the transparent conductive film.

[作用] この発明において、上記位置に導電膜を形成することに
より、電圧印加用の電極の低抵抗化を可能にするととも
に、透明導電膜の透明性を向上出来、液晶表示デバイス
の表示特性を良好に出来る。
[Function] In this invention, by forming a conductive film at the above position, it is possible to lower the resistance of the electrode for voltage application, improve the transparency of the transparent conductive film, and improve the display characteristics of the liquid crystal display device. It can be done well.

[実施例コ 第1図はこの発明の一実施例の液晶表示デバイス用対向
電極基板の新面図であり、図において(1)はパイレッ
クスガラス等の基板、(2)は例えば印刷法などにより
形成された顔料を分散したポリイミドで形成された着色
層、(21)は遮光膜、(3)は例えば印刷法により形
成された高純度なアクリル樹脂膜で形成された有機絶縁
膜、(4)は例えば写真製版法を用いて所望のパターン
に加工されたCr膜で形成された導電膜、(5)は例え
ばスパッタ法により形成されたITO(Indium−
Tin−Oxide)膜で形成された透明導電膜、(6
)は例えばスパッタ法により形成された酸化シリコン膜
で形成された無機絶縁膜、(7)は例えば転写法により
形成されたポリイミド膜で形成された配向処理膜である
[Example 1] Figure 1 is a new view of a counter electrode substrate for a liquid crystal display device according to an embodiment of the present invention. (21) is a light-shielding film; (3) is an organic insulating film made of a high-purity acrylic resin film formed by a printing method; (4) (5) is a conductive film formed of a Cr film processed into a desired pattern using, for example, a photolithography method, and (5) is an ITO (Indium-
Transparent conductive film formed of (Tin-Oxide) film, (6
) is an inorganic insulating film made of, for example, a silicon oxide film formed by a sputtering method, and (7) is an alignment film made of a polyimide film formed by, for example, a transfer method.

以下、この発明の一実施例の液晶表示デバイス用対向電
極基板を製造する一例を上記図に基づき説明する。即ち
、パイレックスガラス基板(1)上に例えば印刷法によ
り厚さ0.5〜3μmとなる様に黒色顔料を分散したポ
リイミド膜の遮光膜(2丁)を形成し、その後、赤、青
または緑色顔料を分散したポリイミド膜で形成された画
素表示部である着色層(2)を形成する。その後、着色
層(2)上に例えば、印刷法により厚さ0.5〜5μm
となる様高純度アクリル樹脂膜の有機絶縁膜(3)を形
成する。このアクリル樹脂膜(3)は着色層(2)中の
不純物抑制効果を高め、透明導電膜(5)のカバレージ
性を向上するため、厚膜化する方が望ましい、アクリル
樹脂膜(3)上に例えばスパッタ法により、厚さ0.0
5〜0.3μIとなる様、Cr膜の導電膜(4)を形成
し、このCr膜(4)を例えば写真製版法を用いて所望
のパターンに加工する。このパターンは、導電率向上に
はパターン中が広い方が良好であるが、液晶デイスプレ
ィの開口率の低下防止のため、遮光膜と同一パターンに
するのが望ましい。
Hereinafter, an example of manufacturing a counter electrode substrate for a liquid crystal display device according to an embodiment of the present invention will be described based on the above drawings. That is, on a Pyrex glass substrate (1), for example, a light-shielding film (two films) of a polyimide film in which black pigment is dispersed is formed to a thickness of 0.5 to 3 μm by a printing method, and then a red, blue or green film is formed. A colored layer (2), which is a pixel display portion, is formed of a polyimide film in which pigment is dispersed. After that, a layer of 0.5 to 5 μm in thickness is printed on the colored layer (2), for example, by a printing method.
An organic insulating film (3) of a high purity acrylic resin film is formed so as to have the following properties. This acrylic resin film (3) is preferably thickened in order to enhance the effect of suppressing impurities in the colored layer (2) and improve the coverage of the transparent conductive film (5). For example, by sputtering, a thickness of 0.0
A conductive film (4) of Cr film is formed to have a thickness of 5 to 0.3 μI, and this Cr film (4) is processed into a desired pattern using, for example, photolithography. Although it is better for this pattern to be wider in order to improve conductivity, it is preferable to use the same pattern as the light-shielding film in order to prevent a decrease in the aperture ratio of the liquid crystal display.

次に、パターン加工されたCr膜の導電膜(4)上に例
えばスパッタ法などにより厚さ0.03〜0.3μ■と
なる様に透明導電膜であるITO(Indium−Ti
n−Oxide)膜(5)を形成し、このITO膜(5
)上に例えばスパッタ法により厚さ0.01〜1μmと
なる様酸化シリコン膜の無機絶縁膜(6)を形成し、こ
の酸化シリコン膜(6)上に例えば転写法により厚さ0
.03〜0.1μIとなる様配向処理膜であるポリイミ
ド膜(7)を形成して液晶表示デバイス用対向電極基板
を得る。
Next, a transparent conductive film of ITO (Indium-Ti) is deposited on the patterned conductive film (4) of the Cr film to a thickness of 0.03 to 0.3 μm by sputtering or the like.
n-Oxide) film (5) is formed, and this ITO film (5) is formed.
), an inorganic insulating film (6) of a silicon oxide film is formed to a thickness of 0.01 to 1 μm by, for example, a sputtering method, and an inorganic insulating film (6) of a silicon oxide film (6) is formed by a transfer method, for example, to a thickness of 0.01 to 1 μm.
.. A polyimide film (7), which is an alignment-treated film, is formed so as to have a thickness of 0.03 to 0.1 μI to obtain a counter electrode substrate for a liquid crystal display device.

なお、上記実施例では、y!明明室電膜下に所望のパタ
ーンに加工された導電膜(4)を形成しているが、第2
図のこの発明の他の実施例の液晶表示デバイス用対向電
極基板の断面図のように透明導電膜(5)の上に導電膜
(4)を形成しても、また第3図のこの発明の他の実施
例の液晶表示デバイス用対向電極基板の断面図のように
透明導電膜(5)の上下に導電膜(4)を形成しても良
い。
In addition, in the above embodiment, y! A conductive film (4) processed into a desired pattern is formed under the electrical film in the Meimei chamber, but the second
Even if a conductive film (4) is formed on a transparent conductive film (5) as shown in the cross-sectional view of a counter electrode substrate for a liquid crystal display device according to another embodiment of the present invention, the present invention shown in FIG. A conductive film (4) may be formed above and below a transparent conductive film (5) as shown in the cross-sectional view of a counter electrode substrate for a liquid crystal display device in another embodiment.

なお、上記実施例では基板(1)にパイレックスガラス
基板を用いたが、低アルカリガラス基板等信のガラス基
板でも良く、着色層(2)に顔料分散したポリイミド膜
を用いたが、染色されたゼラチン膜等他の着色層でも良
く、特に4光部(21)は酒肴法やその他の方法により
形成し、写真製版法などによりパターン加工されたC「
膜などの金属膜などでも良い。
In the above example, a Pyrex glass substrate was used as the substrate (1), but a thin glass substrate such as a low-alkali glass substrate may also be used.Although a polyimide film with pigment dispersed therein was used as the colored layer (2), it was not possible to dye it. Other colored layers such as a gelatin film may also be used. In particular, the four-light part (21) is formed by the Sakae method or other method, and is patterned by a photolithography method.
A metal film such as a film may also be used.

また、導電膜(4)のパターンが遮光膜(21)と同一
パターンに形成されている時には、第4図および第5図
のこの発明の他の実施例の液晶表示デバイス用対向電極
基板の断面図の様に5遮光膜(21)は、形成しなくて
も良い。
Further, when the pattern of the conductive film (4) is formed in the same pattern as the light shielding film (21), the cross section of the counter electrode substrate for a liquid crystal display device according to another embodiment of the present invention shown in FIGS. 4 and 5. As shown in the figure, it is not necessary to form the 5 light shielding film (21).

また、着色層(2)の形成方法に印刷法を用いたが、写
真製版法等の他の方法で形成しても良い、有機絶縁膜(
3)の形成方法に印刷法を用いたが、スピン塗布法など
でも良い、パターン加工された導電膜(4)にCr膜を
用いたが、透明導電膜(5)であるITOよりも導電率
が大きければ、特にその材質を問わない、また、その形
成方法もスパッタ法を用いたが、真空蒸着法等、他の方
法でも良い、透明導電膜(5)にITO(Indium
−Tin−Oxide)膜を用いたが、 5n02、I
n2O3等の他の透明導電膜などでも良く、その形成方
法にスパッタ法を用いたが、真空蒸着法等の他の方法で
も良い、無機絶縁膜(6)に酸化シリコンを用いたが、
千フ化シリコン等でも良く、その形成方法にスパッタ法
を用いたが、CVD法など他の方法でも良く又、この絶
縁膜(6)は形成しなくても良い、配向処理膜(7)に
ポリイミド膜を用いたが、ポリビニールアルコール等の
膜でも良く、その形成方法に転写法を用いたが、通常の
写真製版等でも良い、又、配向処理膜(7)は真空蒸着
のうちの斜め蒸着を行なった酸化シリコン膜などでも良
い。
In addition, although a printing method was used to form the colored layer (2), it is also possible to form the organic insulating film (
Although a printing method was used to form 3), a spin coating method may also be used.Although a Cr film was used as the patterned conductive film (4), it has a higher conductivity than ITO, which is the transparent conductive film (5). As long as the transparent conductive film (5) is large, it does not matter what material it is made of.Although the sputtering method was used for its formation, other methods such as vacuum evaporation may also be used.
-Tin-Oxide) film was used, but 5n02, I
Other transparent conductive films such as n2O3 may be used, and sputtering was used as the formation method, but other methods such as vacuum evaporation may also be used. Silicon oxide was used as the inorganic insulating film (6); however,
It may be made of silicon perfluoride, etc., and although the sputtering method was used to form it, other methods such as CVD may also be used.Also, this insulating film (6) does not need to be formed, and the alignment treatment film (7) may be used. Although a polyimide film was used, a film of polyvinyl alcohol or the like may also be used.Although a transfer method was used for the formation method, ordinary photolithography etc. may also be used.Also, the alignment film (7) may be formed using an oblique method of vacuum evaporation. A silicon oxide film formed by vapor deposition may also be used.

そのほか第5図のこの発明の他の実施例の液晶表示デバ
イス用対向電極基板の断面図のように遮光膜(21)を
導電膜のCr膜(4)で形成しても良い、但しこの場合
Cr膜(4)と透明導電膜(5)を接触させるために有
機絶縁膜(3)をパターニングする必要がある。
In addition, the light-shielding film (21) may be formed of a conductive Cr film (4) as shown in FIG. 5, which is a cross-sectional view of a counter electrode substrate for a liquid crystal display device according to another embodiment of the present invention; however, in this case, It is necessary to pattern the organic insulating film (3) in order to bring the Cr film (4) and the transparent conductive film (5) into contact.

[発明の効果] 以上説明した通り、この発明は基板、この基板に設けた
透明導電膜、並びにこの透明導電膜の上記基板側および
反対側の内の少なくとも一方に、上記透明導電膜の導電
率より大きい導電率であり、上記透明導電膜と電気的に
接続して設けた導電膜を備えたものを用いることにより
、容易に液晶デイスプレィ内の印加電圧を均一化出来る
とともに、透明導電膜の透明性が向上し、液晶表示デバ
イスの表示特性が向上する液晶表示デバイス用対向電極
基板を得ることができる。
[Effects of the Invention] As explained above, the present invention provides a substrate, a transparent conductive film provided on the substrate, and a conductivity of the transparent conductive film on at least one of the substrate side and the opposite side of the transparent conductive film. By using a conductive film that has a higher conductivity and is electrically connected to the transparent conductive film described above, it is possible to easily equalize the voltage applied within the liquid crystal display, and also to increase the transparency of the transparent conductive film. It is possible to obtain a counter electrode substrate for a liquid crystal display device, which has improved properties and display characteristics of the liquid crystal display device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例の液晶表示デバイス用対向
電極基板の断面図、第2図〜第6図はこの発明の他の実
施例の液晶表示デバイス用対向電極基板の断面図、第7
図は従来の液晶表示デバイス用対向電極基板の断面図で
ある。 図において、(1)は基板、(4)は導電膜、(5)は
透明導電膜である。 なお、各図中同一符号は同一または相当部分を示す。
FIG. 1 is a sectional view of a counter electrode substrate for a liquid crystal display device according to an embodiment of the present invention, and FIGS. 2 to 6 are sectional views of a counter electrode substrate for a liquid crystal display device according to other embodiments of the invention. 7
The figure is a sectional view of a conventional counter electrode substrate for a liquid crystal display device. In the figure, (1) is a substrate, (4) is a conductive film, and (5) is a transparent conductive film. Note that the same reference numerals in each figure indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】[Claims] 基板、この基板に設けた透明導電膜、並びにこの透明導
電膜の上記基板側および反対側の内の少なくとも一方に
、上記透明導電膜の導電率より大きい導電率であり、上
記透明導電膜と電気的に接続して設けた導電膜を備えた
液晶表示デバイス用対向電極基板。
A substrate, a transparent conductive film provided on this substrate, and at least one of the substrate side and the opposite side of this transparent conductive film have a conductivity higher than that of the transparent conductive film, and have an electrical conductivity that is higher than the conductivity of the transparent conductive film. A counter electrode substrate for a liquid crystal display device, which is provided with a conductive film that is electrically connected.
JP2126033A 1990-05-15 1990-05-15 Counter electrode substrate for liquid crystal display device Pending JPH0419781A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2126033A JPH0419781A (en) 1990-05-15 1990-05-15 Counter electrode substrate for liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2126033A JPH0419781A (en) 1990-05-15 1990-05-15 Counter electrode substrate for liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH0419781A true JPH0419781A (en) 1992-01-23

Family

ID=14925024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2126033A Pending JPH0419781A (en) 1990-05-15 1990-05-15 Counter electrode substrate for liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH0419781A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6215077B1 (en) 1997-03-28 2001-04-10 Fuji Electric Co., Ltd. Thin-film laminate type conductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6215077B1 (en) 1997-03-28 2001-04-10 Fuji Electric Co., Ltd. Thin-film laminate type conductor

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