JPH0420166B2 - - Google Patents

Info

Publication number
JPH0420166B2
JPH0420166B2 JP8041783A JP8041783A JPH0420166B2 JP H0420166 B2 JPH0420166 B2 JP H0420166B2 JP 8041783 A JP8041783 A JP 8041783A JP 8041783 A JP8041783 A JP 8041783A JP H0420166 B2 JPH0420166 B2 JP H0420166B2
Authority
JP
Japan
Prior art keywords
pattern
light
spatial filter
fourier transform
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8041783A
Other languages
Japanese (ja)
Other versions
JPS59204820A (en
Inventor
Kazuo Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8041783A priority Critical patent/JPS59204820A/en
Publication of JPS59204820A publication Critical patent/JPS59204820A/en
Publication of JPH0420166B2 publication Critical patent/JPH0420166B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95623Inspecting patterns on the surface of objects using a spatial filtering method

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

【発明の詳細な説明】 本発明は、メツシユのストライプ等の光透過性
単位パターンが規則的に繰り返し配列されたパタ
ーンのパターン欠陥検査方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a pattern defect inspection method for a pattern in which light-transmitting unit patterns such as mesh stripes are regularly and repeatedly arranged.

上記のような規則的な繰り返しパターンの欠陥
を検査する方法として光学的フーリエ変換空間フ
イルター法が知られている。第1図はその原理を
示すものであり、レーザーヘツド1より出たレー
ザー光を集光レンズ2、ピンホール板3、コリメ
ーターレンズ4により、コヒーレントな平行光と
して被検パターン5に照射する。パターンの透明
部を通過した光はフーリエ変換レンズ6によりそ
の後焦点の位置に被検パターン5の光学的フーリ
エ変換スペクトルを生ずる。空間フイルター7は
前記フーリエ変換スペクトルを写真記録する等の
方法によつて作成した遮光パターンをもち正常な
被検パターン5のスペクトルを遮光する。被検パ
ターン5の光照射部にパターン欠陥があるとその
部分からの光は空間フイルター7を通過し、逆フ
ーリエ変換レンズ8により、スクリーン又は検出
器9の位置に欠陥像を形成する。この欠陥像を目
視又は光検出装置で検出する事により容易にパタ
ーンの欠陥部のみを検知する事ができる。
An optical Fourier transform spatial filter method is known as a method for inspecting defects in regular repeating patterns as described above. FIG. 1 shows the principle. Laser light emitted from a laser head 1 is irradiated onto a test pattern 5 as coherent parallel light through a condenser lens 2, a pinhole plate 3, and a collimator lens 4. The light that has passed through the transparent portion of the pattern is then passed through the Fourier transform lens 6 to produce an optical Fourier transform spectrum of the pattern to be tested 5 at the focal point. The spatial filter 7 has a light shielding pattern created by photographically recording the Fourier transform spectrum, and shields the spectrum of the normal test pattern 5. If there is a pattern defect in the light irradiation part of the test pattern 5, the light from that part passes through the spatial filter 7 and forms a defect image at the position of the screen or detector 9 by the inverse Fourier transform lens 8. By visually detecting this defect image or using a photodetector, it is possible to easily detect only the defective portion of the pattern.

この検査方法は繰り返しパターンの欠陥部のみ
を光学的に抽出するため精密な機構、電気的な欠
陥抽出回路等が不要となり装置化が容易であり、
また、パターン検査で使われるビデオ信号処理に
よる方法と比較し高速検査も容易である。反面被
検パターンと空間フイルターのパターンが対応し
ている為、検査するパターンの種類毎に空間フイ
ルターを用意しなければならずまた被検パターン
の検査領域内で光透過性単位パターンの繰り返し
ピツチ、配列角度、光透過性単位パターンの形、
大きさ等が変化する様なパターンは検査できない
等制約があり実用化の障害となつていた。
This inspection method optically extracts only the defective parts of the repeating pattern, so it does not require a precise mechanism or electrical defect extraction circuit, and is easy to implement.
Also, compared to methods using video signal processing used in pattern inspection, high-speed inspection is easier. On the other hand, since the pattern to be inspected corresponds to the pattern of the spatial filter, it is necessary to prepare a spatial filter for each type of pattern to be inspected. Arrangement angle, shape of light transmitting unit pattern,
There are limitations such as the inability to inspect patterns that change in size, etc., and this has been an obstacle to practical application.

本発明は空間フイルターの改良によりこれらの
欠点を除きフーリエ変換空間フイルター法による
欠陥検査法の検査可能パターンの種類を拡大し能
率を向上させるべく研究の結果、空間フイルター
として検査領域内で光透過性単位パターンの繰り
返しピツチ等の異なつた複数種のパターン部分の
透過光の光学的フーリエ変換スペクトルの像を複
合させて形成した、前記光学的フーリエ変換スペ
クトルの全てを遮光する遮光部を有する空間フイ
ルターを用いることにより所期の目的を達成し得
ることを見出だし、かかる知見にもとづいて本発
明を完成したものである。
The present invention aims to eliminate these drawbacks by improving the spatial filter, expand the types of patterns that can be inspected in the defect inspection method using the Fourier transform spatial filter method, and improve the efficiency. A spatial filter is formed by combining images of optical Fourier transform spectra of transmitted light from a plurality of different pattern parts such as repeating pitches of unit patterns, and has a light shielding part that blocks all of the optical Fourier transform spectra. It was discovered that the intended purpose could be achieved by using the present invention, and the present invention was completed based on this knowledge.

即ち、本発明の要旨は、光透過性単位パターン
が規則的に繰り返し配列されたパターンに平行光
を照射し、欠陥のない繰り返しパターンによつて
生ずる回折光を遮光し、パターン欠陥部からの光
を通過させる空間フイルターを備え、通過した光
を目視又は光検出装置で検出するパターン欠陥検
出方法において、空間フイルターとして、検査領
域内で光透過性単位パターンの繰り返しピツチ等
が異なつた複数種のパターン部分の透過光の光学
的フーリエ変換スペクトルの像を複合させて形成
した、前記光学的フーリエ変換スペクトルの全て
を遮光する遮光部を有する空間フイルターを用い
ることを特徴とするパターン欠陥検出方法であ
る。
That is, the gist of the present invention is to irradiate a pattern in which light-transmitting unit patterns are regularly and repeatedly arranged with parallel light, to block the diffracted light generated by the defect-free repeating pattern, and to block the light from the defective portions of the pattern. In a pattern defect detection method that includes a spatial filter that allows light to pass through and detects the transmitted light visually or with a photodetector, the spatial filter may be a plurality of patterns in which the repeating pitch, etc. of light-transmitting unit patterns differs within the inspection area. This pattern defect detection method is characterized by using a spatial filter that is formed by combining images of optical Fourier transform spectra of partially transmitted light and has a light shielding part that blocks all of the optical Fourier transform spectra.

以下、本発明につき詳細に説明する。 Hereinafter, the present invention will be explained in detail.

本発明について説明する前に検査すべきパター
ンと従来の撮影型空間フイルターのパターンの関
係について説明する。
Before explaining the present invention, the relationship between the pattern to be inspected and the pattern of a conventional photographic spatial filter will be explained.

第2図は等ピツチ、等開口巾のストライプ状の
光透過性単位パターンを有する繰り返しパターン
の例を示す。図においてpはパターンの繰り返し
ピツチ、aは開口巾、10は光透過性単位パター
ンを示す。次に第3図は第1図示の繰り返しパタ
ーンのパターン欠陥部検出用の撮影型空間フイル
ターの遮光部パターンを示す。
FIG. 2 shows an example of a repeating pattern having a striped light transmitting unit pattern of equal pitch and equal opening width. In the figure, p indicates the repeating pitch of the pattern, a indicates the opening width, and 10 indicates the light transmitting unit pattern. Next, FIG. 3 shows a light-shielding pattern of a photographic spatial filter for detecting pattern defects in the repetitive pattern shown in FIG.

第3図示の撮影型空間フイルターのパターンに
おいて、被検パターンの透過光のフーリエ変換ス
ペクトルに対応するドツト列のピツチPfは被検
パターンの繰り返しピツチpで決定されるもので
あり、又ドツト径dの変化は単位パターン(スリ
ツト状)の開口巾aにより決定される。したがつ
て被検パターンの繰り返しピツチ又は開口巾が異
なれば正常パターンのフーリエ変換スペクトルと
空間フイルターパターンが一致せず正常パターン
からの光が空間フイルターを通過し検出部に達す
る為、欠陥識別のS/N比が低下し高精度な検出
ができない事となる。
In the pattern of the imaging spatial filter shown in Figure 3, the pitch Pf of the dot row corresponding to the Fourier transform spectrum of the transmitted light of the test pattern is determined by the repetition pitch p of the test pattern, and the dot diameter d The change in is determined by the aperture width a of the unit pattern (slit shape). Therefore, if the repetition pitch or aperture width of the test pattern is different, the Fourier transform spectrum of the normal pattern and the spatial filter pattern will not match, and the light from the normal pattern will pass through the spatial filter and reach the detection part, resulting in a problem with S for defect identification. /N ratio decreases, making it impossible to perform highly accurate detection.

本発明においては第3図示のような空間フイル
ターを改良した第4図示のような改良型空間フイ
ルターを用いるものである。
In the present invention, an improved spatial filter as shown in the fourth figure, which is an improved spatial filter as shown in the third figure, is used.

この改良型空間フイルターにおいては繰り返し
ピツチp1のストライプ状の光透過性単位パターン
(図示せず)に対応するドツトがピツチpf1のとこ
ろに表示されており、且つ繰り返しピツチp2のス
トライプ状の光透過性単位パターン(図示せず)
に対応するドツトがピツチpf2のところに表示さ
れており、両ドツト間が連続している。更に前記
のドツトより高次のドツトは相互に連続して棒状
に表示されている。即ち、この改良型空間フイル
ターにおいてはp1≦p≦p2の範囲で徐々に変化す
る配列ピツチで配列された光透過性単位パターン
からなる複数種のパターン部分の透過光の光学的
フーリエ変換スペクトルの像に対応するドツトの
列が複合せしめられて表示されているものであ
る。従つて、この改良型空間フイルターにより、
被検パターンの繰り返しピツチpがp1〜p2の間に
あり、口巾がo<a<pであるストライプ状の正
常パターンからの光で遮光し同時に欠陥部からの
光を通過させ得るものである。この改良型空間フ
イルターによれば等ピツチ等開口巾のストライプ
状パターンで繰り返しピツチpがp1≦p≦p2、開
口巾aがo<a<pの種々のパターンが検査可能
であり、さらに繰り返しピツチpの変化する範囲
がp1≦p≦p2の範囲であれば検査領域内で徐々に
ピツチp及び開口巾aが変化するパターンの検査
が可能である。
In this improved spatial filter, dots corresponding to a striped light transmittance unit pattern (not shown) with a repeating pitch p1 are displayed at the pitch pf1 , and dots corresponding to a striped light transmittance unit pattern (not shown) with a repeating pitch p1 are displayed at the pitch pf1 . Light transmitting unit pattern (not shown)
A dot corresponding to is displayed at pitch p f2 , and the dots are continuous. Further, dots of a higher order than the above-mentioned dots are displayed in a continuous bar shape. That is, in this improved spatial filter, the optical Fourier transform spectrum of the transmitted light of multiple types of pattern portions consisting of light transmittance unit patterns arranged with an arrangement pitch that gradually changes in the range p 1 ≦ p ≦ p 2 This is a composite display of rows of dots corresponding to the image. Therefore, with this improved spatial filter,
The repeating pitch p of the test pattern is between p 1 and p 2 , and the width of the stripe is such that o<a<p.It is possible to block light from the normal striped pattern and at the same time allow light from the defective part to pass through. It is. According to this improved spatial filter, it is possible to repeatedly inspect various striped patterns of equal pitch and equal aperture width, where the pitch p is p 1 ≦p≦p 2 and the aperture width a is o<a<p. If the range in which the repeated pitch p changes is within the range p 1 ≦p≦p 2 , it is possible to inspect a pattern in which the pitch p and the aperture width a gradually change within the inspection area.

以上のように第4図示のような検査領域内で光
透過性単位パターンの繰り返しピツチ、配列角
度、及び各単位パターンの形、大きさ等が徐々に
変化した複数種のパターン部分の透過光の光学的
フーリエ変換スペクトルの像を複合させて形成し
た、前記光学的フーリエ変換スペクトルの全てを
遮光する遮光部を有する空間フイルターを用い、
場所により光透過性単位パターンの繰り返しピツ
チ、配列角度、及び各単位パターンの形、大きさ
等が徐々に変化したパターンの欠陥部を検出する
ことができる。
As described above, the transmitted light of multiple types of pattern portions in which the repeating pitch, arrangement angle, shape, size, etc. of each unit pattern, etc. of the light-transmitting unit patterns gradually change in the inspection area as shown in the fourth figure. Using a spatial filter that is formed by combining images of the optical Fourier transform spectrum and has a light shielding part that shields all of the optical Fourier transform spectrum,
It is possible to detect defective portions of patterns in which the repeating pitch, arrangement angle, shape, size, etc. of each unit pattern gradually change depending on the location.

次に第5図は本発明において用いる別の改良型
空間フイルターを示す。
FIG. 5 now shows another improved spatial filter for use in the present invention.

第5図示の改良型空間フイルターにおいては繰
り返しピツチp=p11の繰り返しパターンの透過
光の光学的フーリエ変換スペクトルの像と繰り返
しピツチp=p12の繰り返しパターンの透過光の
光学的フーリエ変換スペクトルの像とを複合させ
てなる遮光部を有するものである。それであるか
らこの空間フイルター1つでp=p11の繰り返し
パターンとp=p12の繰り返しパターンの両者の
欠陥部の検出を行なうことができるものである。
In the improved spatial filter shown in Fig. 5, the image of the optical Fourier transform spectrum of the transmitted light of a repeating pattern with a repeating pitch p = p 11 and the optical Fourier transform spectrum of the transmitted light of a repeating pattern with a repeating pitch p = p 12 are obtained. It has a light-shielding part formed by combining it with an image. Therefore, this single spatial filter can detect defects in both the p=p 11 repeating pattern and the p=p 12 repeating pattern.

以上のように第5図示のような検査すべき複数
種類の規則的繰り返しパターンの透過光の光学的
フーリエ変換スペクトルの像を複合させて形成し
た、前記光学的フーリエ変換スペクトルの全てを
遮光する遮光部を有する空間フイルターを用い、
複数種類の規則的繰り返しパターンの欠陥部の検
出を行なうことができる。
As described above, the light shielding system which blocks all of the optical Fourier transform spectra formed by combining the images of the optical Fourier transform spectra of the transmitted light of the plurality of regularly repeated patterns to be inspected as shown in FIG. using a spatial filter with a
It is possible to detect defects in a plurality of types of regularly repeated patterns.

尚、以上のべた例は一次元的な繰り返しパター
ンの例であるが2次元の繰り返しパターン例えば
網目状パターンに対しても同様な効果が奏せられ
るものである。
Although the above examples are examples of one-dimensional repeating patterns, the same effect can be achieved with two-dimensional repeating patterns, such as mesh patterns.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は光学的フーリエ変換空間フイルター法
の原理の説明図、第2図は繰り返しパターンの平
面図、第3図は第2図示のパターンの欠陥検出用
の撮影型空間フイルターパターンの平面図、第4
図は本発明において用いる改良型空間フイルター
の例の平面図、第5図は本発明において用いる改
良型空間フイルターの他の例の平面図である。 p……被検パターンの繰り返しピツチ、a……
開口巾、pf……繰り返しピツチpに対応する空間
フイルターのパターンのピツチ、d……ドツト
径、pf1……p=p1のときのフーリエ変換スペク
トルのピツチ、pfd……p=p2のときのフーリエ
変換スペクトルのピツチ。
Fig. 1 is an explanatory diagram of the principle of the optical Fourier transform spatial filter method, Fig. 2 is a plan view of a repeating pattern, Fig. 3 is a plan view of a photographic spatial filter pattern for detecting defects in the pattern shown in Fig. 2, Fourth
The figure is a plan view of an example of the improved spatial filter used in the present invention, and FIG. 5 is a plan view of another example of the improved spatial filter used in the present invention. p...Repetition pitch of the test pattern, a...
Aperture width, p f ... Pitch of spatial filter pattern corresponding to repetition pitch p, d ... Dot diameter, p f1 ... Pitch of Fourier transform spectrum when p = p 1 , p fd ... p = p Pitch of Fourier transform spectrum when 2 .

Claims (1)

【特許請求の範囲】 1 光透過性単位パターンが規則的に繰り返し配
列されたパターンに平行光を照射し、欠陥のない
繰り返しパターンによつて生ずる回折光を遮光し
パターン欠陥部からの光を通過させる空間フイル
ターを備え、通過した光を目視又は光検出装置で
検出するパターン欠陥検出方法において、空間フ
イルターとして、検査領域内で光透過性単位パタ
ーンの繰り返しピツチ等が異なつた複数種のパタ
ーン部分の透過光の光学的フーリエ変換スペクト
ルの像を複合させて形成した、前記光学的フーリ
エ変換スペクトルの全てを遮光する遮光部を有す
る空間フイルターを用いることを特徴とするパタ
ーン欠陥検出方法。 2 前記空間フイルターとして検査領域内で光透
過性単位パターンの繰り返しピツチ、配列角度、
及び各単位パターンの形、大きさ等が徐々に変化
した複数種のパターン部分の透過光の光学的フー
リエ変換スペクトルの像を複合させて形成した、
前記光学的フーリエ変換スペクトルの全てを遮光
する遮光部を有する空間フイルターを用い、光透
過性単位パターンの繰り返しピツチ、配列角度、
及び各単位パターンの形、大きさ等が徐々に変化
したパターンの欠陥部の検出を行なうことを特徴
とする特許請求の範囲第1項記載のパターン欠陥
検出方法。 3 前記空間フイルターとして検査すべき複数種
類の規則的な繰り返しパターンの透過光の光学的
フーリエ変換スペクトルの像を複合させて形成し
た、前記光学的フーリエ変換スペクトルの全てを
遮光する遮光部を有する空間フイルターを用い、
複数種類の規則的繰り返しパターンの欠陥部の検
出を共通の空間フイルターで行なうことを特徴と
する特許請求の範囲第1項記載のパターン欠陥検
出方法。
[Scope of Claims] 1. A pattern in which light-transmitting unit patterns are regularly and repeatedly arranged is irradiated with parallel light to block the diffracted light generated by the defect-free repeating pattern and to pass the light from the defective part of the pattern. In a pattern defect detection method in which a spatial filter is provided and the transmitted light is detected visually or with a photodetection device, the spatial filter is used to detect multiple types of pattern portions in which the repeating pitch etc. of light transmitting unit patterns are different within the inspection area. A pattern defect detection method comprising using a spatial filter formed by combining images of optical Fourier transform spectra of transmitted light and having a light shielding portion that blocks all of the optical Fourier transform spectra. 2 The repeating pitch and arrangement angle of the light transmitting unit pattern within the inspection area as the spatial filter;
and formed by combining images of optical Fourier transform spectra of transmitted light of multiple types of pattern portions in which the shape, size, etc. of each unit pattern gradually changed.
Using a spatial filter having a light shielding part that blocks all of the optical Fourier transform spectrum, the repetition pitch, arrangement angle, and
2. The pattern defect detection method according to claim 1, wherein defective portions of patterns in which the shape, size, etc. of each unit pattern gradually change are detected. 3 A space having a light-shielding portion that blocks all of the optical Fourier-transformed spectra formed by combining images of optical Fourier-transformed spectra of transmitted light of multiple types of regular repeating patterns to be inspected as the spatial filter. using a filter,
2. The pattern defect detection method according to claim 1, wherein defect portions of a plurality of types of regularly repeated patterns are detected using a common spatial filter.
JP8041783A 1983-05-09 1983-05-09 Pattern defect detection method Granted JPS59204820A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8041783A JPS59204820A (en) 1983-05-09 1983-05-09 Pattern defect detection method

Applications Claiming Priority (1)

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JP8041783A JPS59204820A (en) 1983-05-09 1983-05-09 Pattern defect detection method

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JPS59204820A JPS59204820A (en) 1984-11-20
JPH0420166B2 true JPH0420166B2 (en) 1992-03-31

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JP2004177377A (en) 2002-11-29 2004-06-24 Hitachi Ltd Inspection method and inspection device

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