JPH04206111A - Bonding sheet - Google Patents
Bonding sheetInfo
- Publication number
- JPH04206111A JPH04206111A JP33175890A JP33175890A JPH04206111A JP H04206111 A JPH04206111 A JP H04206111A JP 33175890 A JP33175890 A JP 33175890A JP 33175890 A JP33175890 A JP 33175890A JP H04206111 A JPH04206111 A JP H04206111A
- Authority
- JP
- Japan
- Prior art keywords
- film
- bonding sheet
- adhesive
- release
- temperature plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Non-Insulated Conductors (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はフレキシブル印刷回路用ボンディングシートに
関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a bonding sheet for flexible printed circuits.
(従来の技術)
近年電気製品の軽薄短小、高機能化に伴いプリント基板
の需要が増大し、なかでもフレキシブル基板の使用範囲
が拡大している。(Prior Art) In recent years, demand for printed circuit boards has increased as electrical products have become lighter, thinner, smaller, and more sophisticated, and the range of use of flexible circuit boards has expanded in particular.
特に高密度の実装化が進み、フレキシブル印刷回路基板
の多層板の需要が高まるにつれ、各層の張り合わせに使
用されるボンディングシートの需要も高くなり、接着性
・屈曲性等に一層の性能向上が望まれている。In particular, as high-density packaging advances and the demand for multilayer flexible printed circuit boards increases, the demand for bonding sheets used to bond each layer increases, and further improvements in performance such as adhesiveness and flexibility are desired. It is rare.
従来のボンディングシートは、半硬化状態の接着剤層単
独の一層構造であるため、多層板として積層される各々
のフレキシブル印刷回路基板には。Conventional bonding sheets have a single layer structure with only a semi-cured adhesive layer, so each flexible printed circuit board is laminated as a multilayer board.
カバーレイフィルムが必要不可欠となっていた。Coverlay film had become essential.
このような構成で作成されたフレキシブル印刷回路の多
層板は第2図に示すように、回路基板の厚みにカバーレ
イフィルムおよびボンディングシートの厚みが加わり、
フレキシブル印刷回路基板がもつ屈曲性を損ねたり、多
層板の屈曲性向上を困難にしていた。さらに、従来のボ
ンディングシートはカバーレイフィルムに使用されてい
る絶縁性フィルムとの接着性も十分ではなかった。As shown in Figure 2, the flexible printed circuit multilayer board created with this configuration has the thickness of the coverlay film and bonding sheet added to the thickness of the circuit board.
This impairs the flexibility of flexible printed circuit boards and makes it difficult to improve the flexibility of multilayer boards. Furthermore, conventional bonding sheets did not have sufficient adhesion to the insulating film used in the coverlay film.
(発明が解決しようとする課題)
本発明は前記諸欠点を解消してフレキシブル印刷回路の
多層板の屈曲性を向上させ、さらに接着性に優れたフレ
キシブル印刷回路用ボンディングシートを提供しようと
するものである。(Problems to be Solved by the Invention) The present invention aims to solve the above-mentioned drawbacks, improve the flexibility of a multilayer board for a flexible printed circuit, and provide a bonding sheet for a flexible printed circuit with excellent adhesive properties. It is.
(課題を解決するための手段)
本発明者らは、上記課題を解決するために鋭意研究を進
めてきた結果本発明に到達した。本発明の要旨とすると
ころは、低温プラズマ処理された絶縁性フィルムの両面
に半硬化状態の接着剤層を有し、該接着剤の外面に離型
性フィルムまたは離型紙を圧着してなるボンディングシ
ートにある。(Means for Solving the Problems) The present inventors have carried out extensive research in order to solve the above problems, and as a result, they have arrived at the present invention. The gist of the present invention is to provide a bonding method in which an insulating film treated with low temperature plasma has a semi-cured adhesive layer on both sides, and a release film or release paper is pressed onto the outer surface of the adhesive. It's on the sheet.
本発明で使用する絶縁性フィルムとしては、ポリイミド
、ポリエチレンテレフタレート、ポリフェニレンスルフ
ィド、ポリパラバン酸、ポリエーテル・エーテルケトン
等の各フィルムが挙げられるが、なかでもポリイミドフ
ィルムが好適に用いられる。本発明では、接着剤との接
着性を高めるため、前記絶縁性フィルムにあらかじめ無
機ガスによる低温プラズマ処理を施すことが必要である
。Examples of the insulating film used in the present invention include films of polyimide, polyethylene terephthalate, polyphenylene sulfide, polyparabanic acid, polyether/etherketone, etc. Among them, polyimide films are preferably used. In the present invention, in order to improve adhesion to the adhesive, it is necessary to subject the insulating film to low-temperature plasma treatment using an inorganic gas in advance.
低温プラズマ処理の方法としては、減圧可能な低温プラ
ズマ処理装置内に前記絶縁フィルムを入れ、装置内を無
機ガスの雰囲気として、圧力を0.001〜lOトル好
ましくは0.01〜1トルに保持した状態で、電極間に
0.1〜10kV前後の直流あるいは交流を印加してグ
ロー放電させることにより無機ガスの低温プラズマを発
生させ、絶縁フィルムを順次移動させながら表面を連続
的にプラズマ処理するが、プラズマ処理時間はおおむね
0.1〜100秒とするのが良い。無機カスとしては、
ヘリウム、ネオン、アルコン等の不活性ガスおよび酸素
、窒素、−酸化炭素、二酸化炭素、アンモニア、空気等
か使用されるが、これらは一種に限らず、二種以上混合
して使用することも任意に行われる。The method of low-temperature plasma treatment includes placing the insulating film in a low-temperature plasma treatment device that can reduce pressure, creating an inorganic gas atmosphere inside the device, and maintaining the pressure at 0.001 to 10 torr, preferably 0.01 to 1 torr. In this state, a direct current or alternating current of around 0.1 to 10 kV is applied between the electrodes to generate a glow discharge, thereby generating low-temperature plasma of inorganic gas, and continuously plasma-treating the surface while moving the insulating film one after another. However, the plasma treatment time is preferably approximately 0.1 to 100 seconds. As inorganic waste,
Inert gases such as helium, neon, alcon, etc., and oxygen, nitrogen, carbon oxide, carbon dioxide, ammonia, air, etc. are used, but these are not limited to one type, and it is optional to use a mixture of two or more types. It will be held on.
本発明で用いられる接着剤としては、エポキシ・フェノ
ール/ポリエステル、N B R/フェノール。Adhesives used in the present invention include epoxy phenol/polyester and NBR/phenol.
エポキシ・フェノール/NBR,NBR/エポキシ、エ
ポキシ/ポリエステル、エポキシ/アクリル、アクリル
等の各剛性樹脂が挙げられる。Rigid resins include epoxy phenol/NBR, NBR/epoxy, epoxy/polyester, epoxy/acrylic, and acrylic.
本発明で用いられる離型性フィルムおよび離型紙として
は、ポリエチレンフィルム、ポリプロピレンフィルム、
TPXフィルム、シリコーン系離型剤付きポリエステル
フィルム、ポリエチレン、ポリプロピレン等のポリオレ
フィンのフィルムコート紙、塩化ビニリデンフィルムコ
ート紙等が挙げられる。The release film and release paper used in the present invention include polyethylene film, polypropylene film,
Examples include TPX film, polyester film with a silicone release agent, film-coated paper of polyolefin such as polyethylene and polypropylene, and vinylidene chloride film-coated paper.
本発明のボンディングシートは、まず離型フィルム(ま
たは離型紙)に前記接着剤を乾燥状態で20〜50μm
になるように塗布し、接着剤を半硬化状態にする。この
とき必要により80〜150℃程度で短時間加熱するこ
とができる。さらにこれに離型フィルム(または離型紙
)を貼り合わせロール状に巻き取る。あるいは離型フィ
ルム(または離型紙)を貼り合わせず、そのままロール
状に巻き取る。これをAロールとする。次に、前記絶縁
性フィルムの片面に前記接着剤を乾燥状態で20〜50
μmになるように塗布し、接着剤を半硬化状態にする。The bonding sheet of the present invention is prepared by first applying the adhesive onto a release film (or release paper) to a thickness of 20 to 50 μm in a dry state.
Apply the adhesive until it is semi-cured. At this time, heating can be performed for a short time at about 80 to 150°C if necessary. Further, a release film (or release paper) is attached to this and wound up into a roll. Alternatively, the product is simply wound into a roll without attaching a release film (or paper). This is called A-roll. Next, apply the adhesive on one side of the insulating film for 20 to 50 minutes in a dry state.
Apply to a thickness of μm and bring the adhesive to a semi-cured state.
このとき必要により80〜150℃程度で短時間加熱
することができる。At this time, heating can be performed for a short time at about 80 to 150°C if necessary.
さらに、これに離型フィルム(または離型紙)を貼り合
わせロール状に巻き取る。これをBロールとする。最後
に、前記へロールの両面に離型フィルム(または離型紙
)を貼り合わせた場合は、片面の離型フィルム(または
離型紙)を剥ぎ取り、露出した接着剤面を、また、Aロ
ールの片面だけに離型フィルム(または離型紙)が貼り
合わせである場合は、離型フィルム(または離型紙)が
貼り合わせていない露出接着剤面をBロールの絶縁フィ
ルムの接着剤が塗布されていない片面に貼り合わせロー
ル状に巻き取ることにより、本発明のボンディングシー
トが製造される。この場合、前記AロールとBロールの
製造順序は前と逆の順序であってもよい。Furthermore, a release film (or release paper) is attached to this and wound up into a roll. This is called B-roll. Finally, if release film (or release paper) is pasted on both sides of the A roll, peel off the release film (or release paper) on one side and use the exposed adhesive side of the A roll. If the release film (or release paper) is attached to only one side, the exposed adhesive side where the release film (or release paper) is not attached is not coated with the adhesive of the B-roll insulation film. The bonding sheet of the present invention is manufactured by laminating it on one side and winding it up into a roll. In this case, the manufacturing order of the A roll and B roll may be reversed.
つぎに、実施例を挙げて本発明を具体的に説明するが、
そのまえに本発明の出発材料となる低温プラズマ処理さ
れた絶縁フィルムの製造例について述べる。Next, the present invention will be specifically explained with reference to Examples.
First, an example of manufacturing an insulating film treated with low temperature plasma, which is the starting material of the present invention, will be described.
低温プラズマ処理装置内に25an角、厚み25μmの
カプトンフィルム(Dupont社製ポリイミドフィル
ム商品名)を入れ、真空度0.2トルで酸素を導入し、
110kHz、 1 、5kvの交流電圧を電極に印加
してグロー放電を生じさせ20秒間低温プラズマ処理を
行った。カプトンフィルムは上下対向電極の下方電極上
に置き、電極間は10aaとした。これを低温プラズマ
A処理とした。A 25 an square, 25 μm thick Kapton film (trade name of polyimide film manufactured by Dupont) was placed in a low-temperature plasma processing apparatus, and oxygen was introduced at a vacuum degree of 0.2 torr.
An AC voltage of 110 kHz, 1.5 kV was applied to the electrodes to generate glow discharge, and low-temperature plasma treatment was performed for 20 seconds. The Kapton film was placed on the lower electrode of the upper and lower opposing electrodes, and the gap between the electrodes was 10 aa. This was called low temperature plasma A treatment.
同様に0.2トル圧のアルゴンおよびアルゴン−酸素の
混合ガスによる低温プラズマ処理を行った。Similarly, low-temperature plasma treatment was performed using argon and argon-oxygen mixed gas at a pressure of 0.2 Torr.
この前者を低温プラズマB処理とし、後者を低温プラズ
マC処理とした3
以下に述べる実施例は、もちろん本発明の範囲を限定す
るものではない。The former was treated as a low temperature plasma B treatment, and the latter was treated as a low temperature plasma C treatment.3 The examples described below are of course not intended to limit the scope of the present invention.
実施例1
片面をシリコーン離型処理した厚さ25μmのポリエチ
レンテレフタレートフィルムに耐熱性エポキシ系接着剤
(固形分30%MEK溶液)を乾燥後の塗布厚さが30
μmになるように塗布し、80″’CX2分、120℃
×5分の2段階に加熱乾燥し、溶剤を除去して接着剤を
半硬化状態とした。Example 1 A heat-resistant epoxy adhesive (MEK solution with a solid content of 30%) was applied to a polyethylene terephthalate film with a thickness of 25 μm, one side of which was treated with silicone mold release, so that the coating thickness after drying was 30 μm.
Apply to a thickness of μm, 80''CX 2 minutes, 120℃
The adhesive was heated and dried in two stages of x5 minutes to remove the solvent and bring the adhesive into a semi-cured state.
これに離型紙をロールラミネータにより温度50℃、線
圧5kg/■、速度2 m /分で圧着積層した。A release paper was laminated onto this by pressure bonding using a roll laminator at a temperature of 50°C, a linear pressure of 5 kg/cm, and a speed of 2 m/min.
これをへ積層品とする。This is made into a laminated product.
つぎに、両面を低温プラズマA処理した厚さ25μmの
ポリイミドフィルムに耐熱性エポキシ系接着剤(固形分
30%MEK溶液)を乾燥後の塗布厚さが30μmにな
るように塗布し、前記へ積層品と同様の工程を経てB積
層品を作成した。Next, a heat-resistant epoxy adhesive (MEK solution with a solid content of 30%) is applied to a 25 μm thick polyimide film that has been treated with low-temperature plasma A on both sides so that the coating thickness after drying is 30 μm, and laminated onto the above. A B laminate product was created through the same process as the product.
さらに、A積層品の離型紙を剥がしA積層品の接着剤面
とB積層品の接着剤が塗布されていないポリイミド面を
重ね合わせロールラミネータにより温度50℃、線圧5
kg / rxr、速度2m/分で圧着積層しボンデ
ィングシートを作成した。Furthermore, the release paper of the A laminate was peeled off, and the adhesive side of the A laminate and the non-adhesive polyimide side of the B laminate were stacked together using a roll laminator at a temperature of 50°C and a linear pressure of 5.
kg/rxr and a speed of 2 m/min to create a bonding sheet.
このボンデインクシートの特性を測定するために、離型
紙および離型フィルムをこのシートから取り除き、厚さ
35μm電解銅箔の光沢面に積層し、プレス条件160
℃、50 kg / ci、30分でプレス加工し、積
層品を作成した。このようにして得たフレキシブル積層
品の特性を表1に示す。In order to measure the properties of this bonde ink sheet, the release paper and release film were removed from this sheet, and it was laminated on the glossy side of 35 μm thick electrolytic copper foil, and pressed under 160
A laminated product was produced by pressing at 50 kg/ci for 30 minutes at ℃. Table 1 shows the properties of the flexible laminate thus obtained.
また、このボンディングシートの屈曲性を調へるために
1両面フレキシブル銅張り積層板(構成:厚さ35μm
圧延fR箔、厚さ25μmポリイミドフィルム、接着剤
厚さ20μm)とカバーレイフィルム(構成:厚さ25
μmポリイミドフィルム、接着剤厚さ30μm)と、こ
のボンディングシートの離型紙および離型フィルムを取
り除いたものを用いて、プレス条件160℃、50kg
/a&、30分でプレス加工し、第1図に示すフレキシ
ブル印刷回路基板の4層板に相当する積層板を作成し、
これの屈曲性を調入た。結果は表1に示すとおりである
。In addition, in order to adjust the flexibility of this bonding sheet, a single-sided flexible copper-clad laminate (composition: 35 μm thick) was used.
Rolled fR foil, 25 μm thick polyimide film, adhesive thickness 20 μm) and coverlay film (composition: 25 μm thick)
(μm polyimide film, adhesive thickness 30 μm) and this bonding sheet with release paper and release film removed, press condition 160℃, 50kg
/a&, Pressed in 30 minutes to create a laminate corresponding to the 4-layer board of the flexible printed circuit board shown in Figure 1,
I adjusted the flexibility of this. The results are shown in Table 1.
実施例2
ポリイミドフィルムの低温プラズマB処理品を用い、そ
の他は実施例1と同様にしてボンディングシートおよび
積層板を作成した。Example 2 A bonding sheet and a laminate were produced in the same manner as in Example 1 except that a polyimide film treated with low-temperature plasma B was used.
実施例3
ポリイミドフィルムの低温プラズマC処理品を用い、そ
の他は実施例1と同様にしてボンディングシートおよび
積層板を作成した。Example 3 A bonding sheet and a laminate were produced in the same manner as in Example 1 except that a polyimide film treated with low-temperature plasma C was used.
比較例1
未処理のポリイミドフィルムを用い、その他は実施例1
と同様にボンディングシートおよび積層板を作成した。Comparative Example 1 Using an untreated polyimide film, the rest was the same as Example 1.
A bonding sheet and a laminate were prepared in the same manner as above.
この場合の4層板は第2図に示す構造であった。The four-layer board in this case had the structure shown in FIG.
比較例2
ボンディングシートとして実施例1のへ積層品と同様の
シートを作成し、これを用い実施例1と同様にして積層
板を作成した。Comparative Example 2 A sheet similar to the laminated product of Example 1 was prepared as a bonding sheet, and a laminate was made in the same manner as in Example 1 using this sheet.
表1
(試験方法)
l)剥離強度
JISのC6481に準じて行う。]、 Om m幅の
サンプルを90度方向に50nn/分の速度で銅箔を引
き剥がす。Table 1 (Test method) l) Peel strength Tested according to JIS C6481. ], The copper foil is peeled off from a sample with a width of 0 mm in a 90 degree direction at a speed of 50 nn/min.
■)半田耐熱性
260℃の半田浴上に30秒間サンプルをフロートした
後、ふくれ等を観察する。(2) Soldering heat resistance Float the sample on a solder bath at 260°C for 30 seconds and observe any blisters.
1ij)屈曲性
曲率半径2c!11の円筒に五回巻きつけ、巻いたもの
の外観、巻きをほどいたときの積層板の外観を観察する
。1ij) Flexibility radius of curvature 2c! Wrap it around the cylinder No. 11 five times, and observe the appearance of the wrapped material and the appearance of the laminate when unwound.
(発明の効果)
本発明により、接着性に優れたボンディングシートの提
供が可能となった。本発明のボンディングシートを用い
てフレキシブル印刷回路の多層板を製造した場合、従来
のボンディングシートを用いて多層板を製造する場合に
比べて、カバーレイフィルムが削減できるため、多層板
全体の厚みがこのフィルムの厚み分だけ薄くなって屈曲
性が向上するほか、カバーレイフィルムの貼りあわせ工
程が省略され、ひいてはそれが原材料のコストダウンに
つながるため、本発明は産業上の利用価値はきわめて高
い。(Effects of the Invention) The present invention has made it possible to provide a bonding sheet with excellent adhesive properties. When manufacturing a flexible printed circuit multilayer board using the bonding sheet of the present invention, the coverlay film can be reduced compared to when manufacturing a multilayer board using a conventional bonding sheet, so the overall thickness of the multilayer board can be reduced. The present invention has extremely high industrial utility value because it is thinner by the thickness of the film and improves flexibility, and the step of bonding the coverlay film is omitted, which in turn leads to a reduction in raw material costs.
第1図は、本発明のボンディングシート使用の4層積層
品の構造を示す縦断面図。第2図は従来のボンディング
シート使用の4層積層品の構造を示す縦断面図である。
第1図
第2図FIG. 1 is a longitudinal sectional view showing the structure of a four-layer laminate product using the bonding sheet of the present invention. FIG. 2 is a longitudinal sectional view showing the structure of a four-layer laminate product using a conventional bonding sheet. Figure 1 Figure 2
Claims (1)
状態の接着剤層を有し、該接着剤の外面に離型性フィル
ムまたは離型紙を圧着してなるボンディングシート。A bonding sheet comprising a semi-cured adhesive layer on both sides of an insulating film treated with low-temperature plasma, and a release film or release paper pressure-bonded to the outer surface of the adhesive.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33175890A JPH04206111A (en) | 1990-11-29 | 1990-11-29 | Bonding sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33175890A JPH04206111A (en) | 1990-11-29 | 1990-11-29 | Bonding sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04206111A true JPH04206111A (en) | 1992-07-28 |
Family
ID=18247292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33175890A Pending JPH04206111A (en) | 1990-11-29 | 1990-11-29 | Bonding sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04206111A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002309218A (en) * | 2001-04-11 | 2002-10-23 | Kanegafuchi Chem Ind Co Ltd | Adhesive laminated film for coating the accelerator beam tube |
| WO2005033238A1 (en) * | 2003-10-08 | 2005-04-14 | Kolon Industries Inc. | High-temperature resistance adhesive tape and fabrication method thereof |
-
1990
- 1990-11-29 JP JP33175890A patent/JPH04206111A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002309218A (en) * | 2001-04-11 | 2002-10-23 | Kanegafuchi Chem Ind Co Ltd | Adhesive laminated film for coating the accelerator beam tube |
| WO2005033238A1 (en) * | 2003-10-08 | 2005-04-14 | Kolon Industries Inc. | High-temperature resistance adhesive tape and fabrication method thereof |
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