JPH04208385A - Super purity nitrogen manufacture device - Google Patents
Super purity nitrogen manufacture deviceInfo
- Publication number
- JPH04208385A JPH04208385A JP2339660A JP33966090A JPH04208385A JP H04208385 A JPH04208385 A JP H04208385A JP 2339660 A JP2339660 A JP 2339660A JP 33966090 A JP33966090 A JP 33966090A JP H04208385 A JPH04208385 A JP H04208385A
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen
- rectification
- rectification column
- liquid nitrogen
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 257
- 229910052757 nitrogen Inorganic materials 0.000 title claims abstract description 106
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000007788 liquid Substances 0.000 claims abstract description 119
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 45
- 239000012535 impurity Substances 0.000 claims description 25
- 238000009835 boiling Methods 0.000 claims description 21
- 238000000605 extraction Methods 0.000 claims description 11
- 230000005856 abnormality Effects 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 230000009471 action Effects 0.000 abstract description 11
- 238000001816 cooling Methods 0.000 abstract description 11
- 238000010992 reflux Methods 0.000 abstract description 11
- 239000006200 vaporizer Substances 0.000 abstract 2
- 239000000047 product Substances 0.000 description 45
- 230000000694 effects Effects 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000004821 distillation Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004509 smoke generator Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04866—Construction and layout of air fractionation equipments, e.g. valves, machines
- F25J3/04951—Arrangements of multiple air fractionation units or multiple equipments fulfilling the same process step, e.g. multiple trains in a network
- F25J3/04963—Arrangements of multiple air fractionation units or multiple equipments fulfilling the same process step, e.g. multiple trains in a network and inter-connecting equipment within or downstream of the fractionation unit(s)
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
- F25J3/04254—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
- F25J3/04254—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
- F25J3/0426—The cryogenic component does not participate in the fractionation
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
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- F25J3/04406—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system
- F25J3/0443—A main column system not otherwise provided, e.g. a modified double column flowsheet
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
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- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04642—Recovering noble gases from air
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- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
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- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04781—Pressure changing devices, e.g. for compression, expansion, liquid pumping
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
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- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04812—Different modes, i.e. "runs" of operation
- F25J3/04824—Stopping of the process, e.g. defrosting or deriming; Back-up procedures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04812—Different modes, i.e. "runs" of operation
- F25J3/04836—Variable air feed, i.e. "load" or product demand during specified periods, e.g. during periods with high respectively low power costs
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/08—Separating gaseous impurities from gases or gaseous mixtures or from liquefied gases or liquefied gaseous mixtures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/50—Processes or apparatus using separation by rectification using multiple (re-)boiler-condensers at different heights of the column
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2210/00—Processes characterised by the type or other details of the feed stream
- F25J2210/40—Air or oxygen enriched air, i.e. generally less than 30mol% of O2
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- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2210/00—Processes characterised by the type or other details of the feed stream
- F25J2210/42—Nitrogen
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2250/00—Details related to the use of reboiler-condensers
- F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
- F25J2250/42—One fluid being nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2250/00—Details related to the use of reboiler-condensers
- F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
- F25J2250/52—One fluid being oxygen enriched compared to air, e.g. "crude oxygen"
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2290/00—Other details not covered by groups F25J2200/00 - F25J2280/00
- F25J2290/62—Details of storing a fluid in a tank
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、超高純度窒素製造装置に関するものである
。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an ultra-high purity nitrogen production apparatus.
従来の高純度窒素、例えば高純度窒素ガスの製造装置は
、原料空気を圧縮器で圧縮し、これを熱交換器を通して
冷却して精留塔内に送り込み、ここで原料空気を深冷液
化分離して窒素ガスをっくリ、これを精製器で高純度化
するようになってし・る。この種の窒素ガス製造装置で
は、精留塔内で副生ずる酸素リッチな排ガスを駆動源と
する膨脹タービンを用い、そこで発生する寒冷を原料圧
縮空気の冷却に利用している。上記膨張ターヒンは、高
速回転機器(数万回/分)であることから、回転数の速
やかな調節は困難であり、したがって、製品窒素ガスの
需要量の増大等の負荷変動に対する速やかな追従は困難
である。そのため、製品窒素ガスの需要量の大幅な増加
に対して、寒冷量を増加させることが遅れ、その間、不
純窒素ガスが製造されるという大きな問題を有している
。また、上記膨脹タービンは、先に述べたように、高速
回転するため、機械構造上高精度が要求されて高価であ
り、また、特別に養成した要員が必要という難点も有し
ている。すなわち、膨脹タービンは高速機器であること
から上記のような問題を生しるのであり、この膨脹ター
ビンの除去に対して強い要望があった。Conventional equipment for producing high-purity nitrogen, such as high-purity nitrogen gas, compresses raw air with a compressor, cools it through a heat exchanger, and sends it into a rectification column, where the raw air is cryogenically liquefied and separated. The nitrogen gas is then purified using a purifier. This type of nitrogen gas production equipment uses an expansion turbine whose driving source is oxygen-rich exhaust gas produced as a by-product in a rectification column, and uses the cold generated there to cool compressed air as a raw material. Since the expansion terchin is a high-speed rotating device (tens of thousands of times per minute), it is difficult to quickly adjust the rotation speed. Have difficulty. Therefore, in response to a significant increase in demand for product nitrogen gas, there is a delay in increasing the amount of refrigeration, resulting in a major problem in that impure nitrogen gas is produced during this time. Further, as mentioned above, since the expansion turbine rotates at high speed, it requires high precision in its mechanical structure and is expensive, and also has the disadvantage that specially trained personnel are required. That is, since the expansion turbine is a high-speed device, it causes the above-mentioned problems, and there has been a strong desire to eliminate the expansion turbine.
このため、未発明者らは、膨脹タービンを除去し、それ
に代えて液体窒素を寒冷として精留塔に供給し、空気を
深冷液化分離して窒素ガスを製造するという装置を開発
し、すでに出願(特願昭59−146332号)し公告
(特公昭61−46747号)を受けている。この装置
(以下「提案装置−、という)は、半導体製造工場等の
敷地内に、直接据え置かれ、液体窒素製造工場(大型の
深冷分離装置を有している)で製造され、タンクローリ
−輸送されたものを貯蔵タンクシこ貯蔵しておき、これ
を寒冷として使用するものである。この装置では重量比
で、ローリ−輸送された寒冷液体窒素1当り、10の高
純度製品窒素ガスを製造することができる。しかも得ら
れる製品は高純度であることから、従来のような精製器
も不要となる。そのうえ、9荷変動に対する追従運転に
関しては、液体窒素の供給量を制御することにより迅速
に対応できることから、負荷変動時の製品純度の低下も
招かない。For this reason, the non-inventors have developed a device that removes the expansion turbine and instead supplies liquid nitrogen as cold to a rectification column, and separates the air by cryogenic liquefaction to produce nitrogen gas. The application was filed (Japanese Patent Application No. 146332/1982) and the patent application was published (Japanese Patent Publication No. 46747/1982). This device (hereinafter referred to as the "proposed device") is installed directly on the premises of a semiconductor manufacturing factory, etc., is manufactured at a liquid nitrogen manufacturing factory (equipped with a large cryogenic separation device), and is transported by tank truck. The resulting product is stored in a storage tank and used for cooling.This equipment produces 10 parts of high-purity product nitrogen gas per 1 part of chilled liquid nitrogen transported by lorry. In addition, because the resulting product is of high purity, there is no need for a conventional purifier.Furthermore, the follow-up operation for load fluctuations can be quickly achieved by controlling the amount of liquid nitrogen supplied. Because it can handle this, it does not cause a drop in product purity when the load fluctuates.
〔発明が解決しようとする課題]
ところが、電子工業では、半導体製造技術が飛躍的に進
歩しでおり、それに使用する窒素ガスとしても極めて高
純度な窒素ガスか要求されている。例えば、上記提案装
置において、不純分である0□は0.O5ppm程度に
抑制することかでき、またCO□やCH,等の不純分も
0.01ppm程度に抑えることができる。しかしなが
ら、HzやHeに関しては抑制することができず、これ
は0゜2ppm程度残存している。ところが、このよう
なHz、He、なかでもHzの存在は、半導体製造技術
が飛躍的に進歩した今日では、半導体製造に多大な悪影
響を及ぼすようになっている。また、高度に自動化が進
んだ現状では、超高純度な窒素ガスを途絶えることなく
安定供給するという要求も強くなっている。すなわち、
超高純度な窒素ガスが安定供給されない場合には、半導
体の製造工程において不純分による不良品が多発するよ
うになる。[Problems to be Solved by the Invention] However, in the electronics industry, semiconductor manufacturing technology has progressed dramatically, and extremely high purity nitrogen gas is required as the nitrogen gas used therein. For example, in the proposed device, the impurity 0□ is 0. O can be suppressed to about 5 ppm, and impurities such as CO□ and CH can also be suppressed to about 0.01 ppm. However, Hz and He cannot be suppressed, and they remain at about 0.2 ppm. However, the presence of such Hz and He, especially Hz, has a great negative influence on semiconductor manufacturing in these days when semiconductor manufacturing technology has advanced dramatically. In addition, in the current state of highly automated systems, there is a growing demand for a continuous and stable supply of ultra-high purity nitrogen gas. That is,
If ultra-high purity nitrogen gas is not stably supplied, many defective products due to impurities will occur in the semiconductor manufacturing process.
この発明は、このような事情に鑑みなされたもので、0
□やCo2.C,H3のみならずHzやHe等の不純分
も極めて少ない超高純度な窒素を常時安定供給しうる超
高純度窒素製造装置の堤供をその目的とする。This invention was made in view of these circumstances, and
□ and Co2. The purpose is to provide an ultra-high purity nitrogen production device that can constantly and stably supply ultra-high purity nitrogen with extremely low impurities such as not only C and H3 but also Hz and He.
1課題を解決するための手段]
上記の目的を達成するため、この発明の超高純度窒素製
造装置は、深冷液化分離用の精留塔と。1. Means for Solving the Problem] In order to achieve the above object, the ultra-high purity nitrogen production apparatus of the present invention includes a rectification column for cryogenic liquefaction separation.
この精留塔の上部に設けられた凝縮器内蔵型の分縮器を
備えた第1および第2の精留装置を設けるとともに、当
該装置外から寒冷液体の供給を受けこれを貯蔵する貯蔵
タンクを設け、上記貯蔵タンクの寒冷液体を冷熱発生用
膨脹器の発生冷熱に代え上記両精密装置の分縮器に供給
するための第1および第2の供給パイプと、上記両パイ
プにそれぞれ設けられた制御弁と、沸点の差により低沸
点不純成分を気化して液体窒素中から分離除去する第3
の精留塔と、前記第1の精密装置の精留塔内の液体窒素
を上記第3の精留塔に導入する導入パイプと、上記第3
の精留塔内の低沸点不純成分除去済の液体窒素の大部分
を製品として取り出す製品取出パイプと、上記低沸点不
純成分除去済の液体窒素の残部を貯めるバックアップタ
ンクと、このバックアップタンクから製品窒素ガス取出
バ1′プに延びる薫発器付きのバックアップパイプと、
常時は第1の精留装置に異常時に第2の精留装置に寒冷
液体を供給するよう上記両制御弁を制御する制御手段を
設けたという構成をとる。なお、この発明において、寒
冷液体とは液体窒素または液体空気のことをいう。First and second rectification devices equipped with a demultiplexer with a built-in condenser are provided at the top of the rectification column, and a storage tank receives and stores a cold liquid from outside the device. are provided in the first and second supply pipes for replacing the cold liquid in the storage tank with the cold heat generated by the cold heat generating expander and supplying them to the demultiplexers of the two precision devices; and a third control valve that vaporizes low-boiling impurity components and separates and removes them from liquid nitrogen due to the difference in boiling points.
a rectification column; an introduction pipe for introducing liquid nitrogen in the rectification column of the first precision device into the third rectification column;
A product extraction pipe that takes out as a product most of the liquid nitrogen from which low-boiling impurity components have been removed in the rectification column, a backup tank that stores the remainder of the liquid nitrogen from which the low-boiling impurity components have been removed, and a product from this backup tank. A backup pipe with a smoke generator extending to the nitrogen gas extraction valve 1',
Normally, the first rectifier is provided with a control means for controlling both of the control valves so as to supply cold liquid to the second rectifier in the event of an abnormality. In addition, in this invention, the cryogenic liquid refers to liquid nitrogen or liquid air.
この発明の装置は、常時は、つぎのように作動する。す
なわち、第1.第2の精留装置のうち、第1の精留装置
系(第3の精留塔も含む)のみを作動させ、その精留塔
(以下「第1の精留塔」という)の底部に原料空気を導
入し、その一部を液化し第1の精留塔の底部に溜める。The device of this invention normally operates as follows. That is, 1st. Of the second rectifier, only the first rectifier system (including the third rectifier) is operated, and the bottom of the rectifier (hereinafter referred to as "first rectifier") is Feedstock air is introduced, and a portion of it is liquefied and stored at the bottom of the first rectification column.
この液体空気は、分縮器に送られ分縮器内の凝縮器の冷
却用に用いられる。この分縮器内には、他の深冷分離装
置でつくられタンクローリ−等で運ばれ当該装置のタン
クに貯蔵されている液体窒素等の寒冷液体が同時に供給
され、凝縮器冷却作用をする。上記凝縮器には、第1の
精留塔の精留作用により第1の精留塔の上部に溜まる窒
素ガスが導入され、上記寒冷液体の冷却作用を受けて液
化される。そして、その液化成分は第1の精留塔内に還
流液として戻される。この戻された液体窒素(精留塔内
で生成した液体窒素も含む)は、高純度品になっている
か、さらに第3の精留塔に送られ、そこで窒素よりも低
沸点の水素、ヘリウムが気化除去された超高純度品とな
り取り出される。前記桿案装置によれば、窒素よりも低
沸点のHe等の除去が困難であったところ、この発明の
装置では、第3の精留塔でこれを除去することから極め
て高純度、例えば、0□が0.001 p pm、 C
oが0.01ppm、COxが0.00 I P pm
、 CHzが0.0005 p p m 、 H2が0
. OO5p p m以下という超高純度窒素を製造す
ることができる。この場合、第1の精留装置系において
、原料空気供給系の故障、停電または第1の精留装置系
では製品窒素の需要に追いつかないような時には、弁を
開いてバックアップタンクから蒸発器に超高純度液体窒
素を流して蒸発器で気化させ、これを製品窒素ガス取出
パイプ乙こ供給する。したかって、上記のような場合↓
こ充分対応することができる。つぎに、旧記第1の精留
装置系において、定期点検または異常、例えば精留塔内
のパイプ等が詰まったりして短時間で修理不可能な事態
が生じた時には、第1の精留装置系を停止させ、第2の
精留装置系を作動させる。すなわち、上記貯蔵タンクに
貯蔵されている寒冷液体窒素(不純分が必ず混入してい
る)を第2の精留装置の精留塔(以下「第2の精留塔」
と略す)に送り、この第2の精留塔内において不純分を
深冷分離し上記窒素を超高純度品にする。これによって
、超高純度製品窒素の供給の途絶えが防止される。This liquid air is sent to the demultiplexer and used for cooling the condenser within the demultiplexer. A cold liquid such as liquid nitrogen produced in another cryogenic separation device, transported by a tank truck, etc., and stored in the tank of the device is simultaneously supplied into the dephlegmator to cool the condenser. Nitrogen gas accumulated in the upper part of the first rectification column by the rectification action of the first rectification tower is introduced into the condenser, and is liquefied by the cooling action of the cold liquid. The liquefied component is then returned to the first rectification column as a reflux liquid. This returned liquid nitrogen (including the liquid nitrogen produced in the rectification column) is either made into a high-purity product or is sent to the third rectification column, where hydrogen, helium, etc., which have a lower boiling point than nitrogen, is vaporized and removed as an ultra-high purity product. According to the rod device, it was difficult to remove He, which has a boiling point lower than that of nitrogen, but in the device of the present invention, since this is removed in the third rectification column, extremely high purity, e.g. 0□ is 0.001 p pm, C
o is 0.01 ppm, COx is 0.00 I P pm
, Hz is 0.0005 p p m, H2 is 0
.. It is possible to produce ultra-high purity nitrogen of OO5ppm or less. In this case, in the first rectifier system, if there is a failure in the feed air supply system, a power outage, or the first rectifier system cannot keep up with the demand for product nitrogen, the valve is opened to supply air from the backup tank to the evaporator. Ultra-high purity liquid nitrogen is flowed and vaporized in an evaporator, which is then supplied to the product nitrogen gas extraction pipe. If you want to do something like the above↓
This can be fully addressed. Next, in the first rectifier system of the old record, when a periodic inspection or an abnormality occurs, such as a clogged pipe in the rectifier, which cannot be repaired in a short time, the first rectifier The system is shut down and the second rectifier system is turned on. That is, the cold liquid nitrogen (which always contains impurities) stored in the storage tank is transferred to the rectification column of the second rectification device (hereinafter referred to as the "second rectification column").
In this second rectification column, impurities are separated by cryogenic cooling, and the nitrogen is made into an ultra-high purity product. This prevents interruption of the supply of ultra-high purity product nitrogen.
つぎに、実施例について説明する。Next, examples will be described.
第1図はこの発明の一実施例を示している。図において
1は空気圧縮機、2はドレン分離器、3はフロン冷却器
、4は2個一組の吸着塔である。FIG. 1 shows an embodiment of the invention. In the figure, 1 is an air compressor, 2 is a drain separator, 3 is a freon cooler, and 4 is a set of two adsorption towers.
吸着塔4内↓こは内部にモレキュラーシーブが充填され
ており、空気圧縮11i1こより圧縮された空気中のH
2OおよびCO□を吸着除去する。5はH2O,CO2
が吸着除去された圧縮空気を送る圧縮空気供給パイプで
ある。6は主熱交換器であり吸着塔4によりH,0およ
びCO□が吸着除去された圧縮空気が送り込まれる。7
は圧縮空気送出パイプであり、主熱交換器6で超低温に
冷却された圧縮空気が送られる。Aは第1の精留装置、
8はその精留塔(第1の精留塔)であり、主熱交換器6
により超低温に冷却された圧縮空気が底部に送り込まれ
る。この第1の精留塔8内で上記圧縮空気の一部が液化
して液体空気9として底部に溜められ、窒素がガス状態
で上部に溜められる。この上部に溜められる窒素ガスは
、第1の精留塔8内の多数の精留棚(図示せず)を通過
上昇する過程で精留され高純度品になる。10は第1の
精留塔8の上部に設けられた分縮器であり、内部の凝縮
器11の上部に上記第1の精留塔8の上部から第1の還
流液パイプ12が延びている。この第1の還流液バイブ
12を通して精留塔8の上部の窒素ガスが凝縮器11内
に導入され液化される。13は第2の還流液パイプであ
り、上記凝縮器ll内で液化生成された液体窒素を還流
液として第1の精留塔8の上部の還流液溜め14に導入
する。13aは凝縮器11に導入された窒素ガス中の、
H。Inside the adsorption tower 4 ↓ This is filled with molecular sieve, and the H in the air compressed by the air compressor 11i1 is
2O and CO□ are adsorbed and removed. 5 is H2O, CO2
This is the compressed air supply pipe that sends the compressed air that has been adsorbed and removed. 6 is a main heat exchanger, into which compressed air from which H, 0 and CO□ have been adsorbed and removed by the adsorption tower 4 is sent. 7
is a compressed air delivery pipe, through which compressed air cooled to an ultra-low temperature by the main heat exchanger 6 is sent. A is the first rectifier,
8 is the rectification column (first rectification column), and the main heat exchanger 6
Compressed air cooled to ultra-low temperatures is sent to the bottom. A portion of the compressed air is liquefied in the first rectification column 8 and stored at the bottom as liquid air 9, and nitrogen is stored at the top in a gaseous state. The nitrogen gas stored in the upper part is rectified into a high-purity product as it passes through a large number of rectification shelves (not shown) in the first rectification column 8 and ascends. Reference numeral 10 denotes a dephlegmator provided at the top of the first rectification column 8, and a first reflux liquid pipe 12 extends from the top of the first rectification column 8 to the top of the internal condenser 11. There is. The nitrogen gas at the upper part of the rectification column 8 is introduced into the condenser 11 through this first reflux liquid vibe 12 and is liquefied. Reference numeral 13 denotes a second reflux liquid pipe, which introduces the liquid nitrogen produced by liquefaction in the condenser 11 as a reflux liquid into the reflux liquid reservoir 14 at the upper part of the first rectification column 8. 13a is in the nitrogen gas introduced into the condenser 11,
H.
、He等の窒素よりも低沸点不純成分をガス状態で放出
する第1の放出パイプで、凝縮器11の上部から主熱交
換器6を通って外へ延び、Hz、Heを外部に放出する
。15は液空パイプで、精留塔底部の液体空気9を分縮
器10内に導入して凝7 縮器11を冷却し、凝縮器1
1内を通る窒素ガスを液化する作用を奏する。16は寒
冷となる液体窒素を収容する液体窒素貯蔵タンク(以下
「貯蔵タンク」と略す)であり、他の深冷分離装置で製
造されタンクローリ−等で運ばれた液体窒素を貯蔵する
。図示の都合上、上記貯蔵タユノク16を図面の上部に
描いているか、貯蔵タンク16は地上に設置される。I
7はこの貯蔵タンク16から分縮器10に延びる供給パ
イプであり、液体窒素の冷熱で凝縮器11を冷却させる
。27はその制御弁である。分縮器10内ではこの液体
窒素と精留塔8の底部から供給された液体空気とが混合
状態で存在している。18は分縮器10の上部から主熱
交換器6を通って延びる放出パイプであり、分縮器10
内において冷却作用を発揮しそれ自身は気化した、液体
空気と液体窒素の混合ガスを、主熱交換器6を経由させ
排ガスとして外部に放出する。18aは廃液パイプであ
り蒸発器18bを通って外部へ延びていて、分縮器lO
の最底部に溜まる混合液(凝縮の繰返しによりCH4等
がfi縮されて混入している)をガス化して放出するよ
うになっている。上記蒸発器18bには、圧縮空気供給
パイプ5から分岐した分岐パイプ5aが延びており、圧
縮空気の一部を上記著発器18bで熱交換させて冷却す
る。19゛は第3の精留塔である。20は第1の精留塔
8の上部の液体窒素溜め20aから第3の精留塔19に
延びる導入パイプであり、第1の精留塔8の上部に溜ま
る液体窒素(還流液+精留塔8の精留作用で生成した液
体窒素)を第3の精留塔19内に導く。第3の精留塔1
9は上記導入パイプ20で送り込まれた液体窒素中より
、窒素よりも低沸点のHz、Heのような不純成分を、
蒸溜により除去する。21は第3の精留塔19の上部か
ら延びる第2の放出パイプで、気化した[(e等の低沸
点不純成分を凝縮器2Iaに送り、上記低沸点不純成分
に帯同する窒素ガスを液化させる。21bはその液化窒
素を第3の精留塔19に戻す戻しパイプである。21g
は凝縮器21aの上部から主熱交換器6を通って延びる
パイプで、上記低沸点不純成分を、熱交換により常温に
して外部へ放出する。21cは上記凝縮器21aを内蔵
する第20分縮器で、この分縮器21cには、第1の精
留塔8の中央部から延びるパイプ21eにより、第1の
精留塔8の中央部の液溜めの液体窒素(不純分が充分除
去されていない)が供給される。この液体窒素は、凝縮
器21aの寒冷用に利用される。21fは廃窒素パイプ
で、上記凝縮器21aで熱交換し気化した廃液体窒素を
主熱交換器6を経由させて外部に放出する。上記第3の
精留塔19において、その底部には、Hz、He等の低
沸点不純成分が除去され超高純度化された液体窒素が貯
溜される。この第3の精留塔19の底部から、超高純度
な製品液体窒素を取り出すための製品液体窒素取出パイ
プ24が延び、このパイプ24によって超高純廣液体窒
素が需要に供される。25は、上記パイプ24から分岐
した分岐パイプで、凝縮器IIの底部から上部に通り抜
けて第3の精留塔19に延びており、製品液体窒素の冷
熱で凝縮器■1を冷却し、その過程で気化した液体窒素
を製品液体窒素貯溜タンク23の上部に戻す作用をする
。26は製品窒素ガス取出パイプで、第3の精留塔19
の中段から主熱交換器6を遣って延びており、第3の精
留塔19の底部において、貯溜液体窒素の気化により生
した窒素ガスおよび上記凝縮器11で生した窒素ガスを
常温の超高純度窒素ガスとして需要に供する。30は加
圧タンク、31はバックアップタンク、32は蒸発器で
ある。33は液体窒素取出パイプ24から分岐し加圧タ
ンク30に延びるバックアップパイプで、超高純度な液
体窒素を加圧タンク30に供給する。34は加圧タンク
30からバックアップタンク31へ延びるバックアップ
パイプであり、加圧タンク30に設けられた蒸発器30
aの作用によって加圧された高純度液体窒素をバックア
ップタンク31に送り込む。35はバックアップタンク
31から製品窒素ガス取出パイプ26に延びるバックア
ップパイプであり、バックアップタンク31から導出さ
れた超高純度液体窒素を蒸発器32で気化させ、略常温
の超高純度製品窒素ガスとして製品窒素ガス取出パイプ
26に供給する。このバックアップパイプ33,34.
35、加圧タンク30、バックアップタンク31、蒸発
器32でバックアップラインが形成される。36はバッ
クアップパイプ33に設けられた開閉弁、38は圧力制
御弁である。A′は第2の精留装置であり、第1の精留
装置Aと実質的に同じ構造を有しているから第1の精留
装置Aに対応する部分に第1の精留装[Aと同一の符号
を付している。この第2の精留装置A′の第2の精留塔
8′の略中央部には、貯蔵タンク16からパイプ41が
延びて液体窒素を供給するとともに、第2の精留塔8′
の底部の上側に、第2の精留塔8′の底部から延びる蒸
発器42a付きのパイプ42を介して液体窒素が気液混
合状態で供給される。, He is a first discharge pipe that discharges impurity components with a lower boiling point than nitrogen, such as He, in a gaseous state, and extends from the upper part of the condenser 11 to the outside through the main heat exchanger 6, and discharges He, Hz, and He to the outside. . 15 is a liquid air pipe which introduces the liquid air 9 at the bottom of the rectification column into the dephlegmator 10 to cool the condenser 7 and condenser 11;
1 has the effect of liquefying the nitrogen gas passing through it. 16 is a liquid nitrogen storage tank (hereinafter abbreviated as "storage tank") that stores liquid nitrogen that becomes cold, and stores liquid nitrogen produced in another cryogenic separation device and transported by a tank truck or the like. For convenience of illustration, the storage tank 16 is depicted at the top of the drawing, or the storage tank 16 is installed on the ground. I
A supply pipe 7 extends from the storage tank 16 to the demultiplexer 10, and cools the condenser 11 with the cold heat of liquid nitrogen. 27 is its control valve. In the dephlegmator 10, this liquid nitrogen and liquid air supplied from the bottom of the rectification column 8 exist in a mixed state. 18 is a discharge pipe extending from the upper part of the dephlegmator 10 through the main heat exchanger 6;
A mixed gas of liquid air and liquid nitrogen, which exerts a cooling effect inside and is itself vaporized, is discharged to the outside as exhaust gas via the main heat exchanger 6. 18a is a waste liquid pipe which extends to the outside through the evaporator 18b and connects to the dephlegmator lO.
The mixed liquid that accumulates at the bottom of the tank (in which CH4, etc. are condensed and mixed due to repeated condensation) is gasified and released. A branch pipe 5a branched from the compressed air supply pipe 5 extends to the evaporator 18b, and a part of the compressed air is cooled by heat exchange with the evaporator 18b. 19゛ is the third rectification column. 20 is an introduction pipe extending from the liquid nitrogen reservoir 20a at the upper part of the first rectification column 8 to the third rectification column 19. The liquid nitrogen produced by the rectification action of the column 8 is led into the third rectification column 19. Third rectification column 1
9 contains impurity components such as Hz and He, which have a boiling point lower than that of nitrogen, from the liquid nitrogen sent in through the introduction pipe 20.
Remove by distillation. 21 is a second discharge pipe extending from the upper part of the third rectification column 19, which sends vaporized low-boiling point impurity components such as 21b is a return pipe that returns the liquefied nitrogen to the third rectification column 19.21g
is a pipe extending from the upper part of the condenser 21a through the main heat exchanger 6, through which the low-boiling impurity components are brought to room temperature by heat exchange and discharged to the outside. 21c is a 20th fractionator that incorporates the condenser 21a, and a pipe 21e extending from the center of the first fractionator 8 connects the central portion of the first fractionator 8 to the fractionator 21c. A reservoir of liquid nitrogen (impurities have not been sufficiently removed) is supplied. This liquid nitrogen is used for cooling the condenser 21a. Reference numeral 21f denotes a waste nitrogen pipe which discharges waste liquid nitrogen, which has been heat exchanged and vaporized in the condenser 21a, to the outside via the main heat exchanger 6. In the third rectifying column 19, ultra-highly purified liquid nitrogen from which low-boiling point impurity components such as Hz and He have been removed is stored at the bottom. A product liquid nitrogen extraction pipe 24 for taking out ultra-high purity product liquid nitrogen extends from the bottom of the third rectification column 19, and the ultra-high purity liquid nitrogen is provided for demand through this pipe 24. 25 is a branch pipe branched from the pipe 24, which passes from the bottom to the top of the condenser II and extends to the third rectification column 19, which cools the condenser 1 with the cold heat of the product liquid nitrogen, and It functions to return the liquid nitrogen vaporized during the process to the upper part of the product liquid nitrogen storage tank 23. 26 is a product nitrogen gas take-off pipe, and the third rectification column 19
It extends from the middle stage using the main heat exchanger 6, and at the bottom of the third rectification column 19, the nitrogen gas produced by vaporizing the stored liquid nitrogen and the nitrogen gas produced in the condenser 11 are heated to a temperature exceeding room temperature. It will be provided to demand as high-purity nitrogen gas. 30 is a pressurized tank, 31 is a backup tank, and 32 is an evaporator. 33 is a backup pipe that branches from the liquid nitrogen extraction pipe 24 and extends to the pressurized tank 30, which supplies ultra-high purity liquid nitrogen to the pressurized tank 30. 34 is a backup pipe extending from the pressurized tank 30 to the backup tank 31, and the evaporator 30 provided in the pressurized tank 30
High purity liquid nitrogen pressurized by the action of a is sent to the backup tank 31. 35 is a backup pipe extending from the backup tank 31 to the product nitrogen gas extraction pipe 26, in which the ultra-high purity liquid nitrogen drawn out from the backup tank 31 is vaporized in the evaporator 32, and the product is produced as ultra-high purity product nitrogen gas at approximately room temperature. The nitrogen gas is supplied to the nitrogen gas extraction pipe 26. These backup pipes 33, 34.
35, a pressurized tank 30, a backup tank 31, and an evaporator 32 form a backup line. 36 is an on-off valve provided in the backup pipe 33, and 38 is a pressure control valve. A' is a second rectification apparatus, which has substantially the same structure as the first rectification apparatus A, so that the part corresponding to the first rectification apparatus A is provided with the first rectification apparatus [ The same reference numerals as A are given. A pipe 41 extends from the storage tank 16 to approximately the center of the second rectification column 8' of the second rectification apparatus A', and supplies liquid nitrogen to the second rectification column 8'.
Liquid nitrogen is supplied in a gas-liquid mixed state to the upper side of the bottom of the second rectification column 8' through a pipe 42 with an evaporator 42a extending from the bottom of the second rectification column 8'.
上記第2の精留塔A′についてより詳しく述べると、第
2の精留塔8′は、第1の精留塔8に供給される原料空
気に代えて、貯蔵タンク16から供給される液体窒素を
用い、これを気液混合状態で底部に導入している。この
液体窒素は、第2の精留塔8′の精留作用を受けて上部
の液体窒素溜めに超高純度液体窒素となって溜まり、パ
イプ20′、蒸発器44を経由し略常温の超高純度製品
窒素ガスとなって製品窒素ガス取出パイプ26に送出さ
れる。なお、45.46はそれぞれパイプ13a’、1
8’に設けられた加温器で、それぞれ、廃ガスおよびH
e等の低沸点不純成分ガスを常温近傍まで昇温させる。To describe the second rectification column A' in more detail, the second rectification column 8' is equipped with liquid supplied from the storage tank 16 instead of the raw air supplied to the first rectification column 8. Nitrogen is used and introduced into the bottom in a gas-liquid state. This liquid nitrogen is subjected to the rectifying action of the second rectifying column 8' and accumulates in the upper liquid nitrogen reservoir as ultra-high-purity liquid nitrogen, and then passes through the pipe 20' and the evaporator 44 to an ultra-high-purity liquid nitrogen at approximately room temperature. The product becomes high-purity nitrogen gas and is sent to the product nitrogen gas extraction pipe 26. In addition, 45 and 46 are pipes 13a' and 1, respectively.
8', the waste gas and H
A low boiling point impurity component gas such as e is heated to around room temperature.
なお、図において、LICはバルブと組になった液面計
であり、取付場所の液面によりバルブの開度ないし開閉
を制御し、常時取付場所の液面を一定に制御する。また
、−点鎖線は真空保冷函であり、函の内部を真空保冷す
る。In the figure, LIC is a liquid level gauge combined with a valve, which controls the opening or opening/closing of the valve depending on the liquid level at the installation location, thereby constantly controlling the liquid level at the installation location. Moreover, the dashed line indicates a vacuum cooling box, and the inside of the box is kept vacuum cold.
この構成において、常時は、原料空気は、空気圧縮機1
により圧縮され、ドレン冷却器2により水分が除去され
、フロン冷却器3によりさらに冷却され、その状態で吸
着塔4に送り込まれ、H2OおよびCO□を吸着除去さ
れる。ついで、主熱交換器6に送り込まれて超低温に冷
却され、気液混合状態となって第1の精留塔8の底部に
導入される。原料空気は、この第1の精留塔8の底部で
、さらに冷却されて液化され、一部が第1の精留塔8の
底部に液体空気として溜まる。残部は、第1の精留塔8
内を上昇し、その過程で精留され、沸点の差により酸素
等の高沸点成分が液化分離される。これにより、第1の
精留塔8の略中央部に酸素を不純分として含む液体窒素
(この一部は廃液体窒素としてパイプ21eにより廃液
体窒素タンク21cに導入される)が溜まり、上部に高
純度窒素ガスが溜まる。第1の精留塔8の底部に溜まっ
た液体空気は、パイプ15を経由して分縮器10に導入
され、そこで凝縮器11を冷却する。In this configuration, raw air is normally supplied to the air compressor 1.
water is removed by a drain cooler 2, further cooled by a fluorocarbon cooler 3, and sent in that state to an adsorption tower 4, where H2O and CO□ are adsorbed and removed. Then, it is sent to the main heat exchanger 6 and cooled to an ultra-low temperature, and is introduced into the bottom of the first rectification column 8 in a gas-liquid mixed state. The raw air is further cooled and liquefied at the bottom of the first rectification column 8, and a portion of the feed air is collected at the bottom of the first rectification column 8 as liquid air. The remainder goes to the first rectification column 8.
In the process, it is rectified, and high-boiling components such as oxygen are liquefied and separated due to the difference in boiling points. As a result, liquid nitrogen containing oxygen as an impurity accumulates approximately in the center of the first rectification column 8 (a portion of which is introduced into the waste liquid nitrogen tank 21c as waste liquid nitrogen through the pipe 21e), and High purity nitrogen gas accumulates. The liquid air accumulated at the bottom of the first rectification column 8 is introduced into the dephlegmator 10 via the pipe 15 and cools the condenser 11 there.
この凝縮器11には、第1の精留塔8の上部に溜まった
窒素ガスが導入され、上記液体空気の冷熱により冷却さ
れ液化して第1の精留塔8の上部に還流液として流下す
る。また、上記分縮器11には、貯蔵タンク16から液
体窒素が供給され、上記液体空気とともに凝縮器11を
冷却する。この凝縮器11に対する冷却により気化した
液体空気および液体窒素は、分縮器の上部から廃ガスと
してパイプ18で取り出され、主熱交換器6で原料空気
を冷却したのち外部へ放出される。一方、第1の精留塔
8の上部に、上記還流液として流下した液体窒素(これ
には還流液だけでなく、第1の精留塔8自体の精留作用
で生成した液体窒素も合わされる)は、パイプ20を通
って第3の精留塔I9に送られ、そこで低沸点不純成分
(He、H2)が蒸溜により除去される。これにより、
上記液体窒素は、超高純度化されて、上記第3の精留塔
19の底部に溜まる。上記溜められた超高純度液体窒素
は、一部がパイプ24を通って需要に供され、残部が分
岐パイプ25を通って凝縮器11に送られ、そこで気化
し超高純度製品窒素ガスとして上記第3の精留塔I9に
戻る。この超高純度製品窒素ガスは、取り出しパイプ2
6を経由して主熱交換器6に送られ、そこで原料空気と
熱交換してそれ自身は常温となり需要に供される。また
、第3の精留塔19において気化除去されたHe等の低
沸点不純成分ガスは、凝縮器21aに送られ、そこで第
1の精留塔8の中央部から導入された廃液体窒素の冷却
作用を受は帯同窒素ガスを液化除去されたのち、主熱交
換器6を経て外部に放出される。Nitrogen gas accumulated in the upper part of the first rectification column 8 is introduced into this condenser 11, is cooled by the cold heat of the liquid air, liquefies, and flows down to the upper part of the first rectification column 8 as a reflux liquid. do. Furthermore, liquid nitrogen is supplied to the demultiplexer 11 from a storage tank 16, and cools the condenser 11 together with the liquid air. Liquid air and liquid nitrogen vaporized by cooling the condenser 11 are taken out from the upper part of the decentralizer as waste gas through a pipe 18, cooled by the main heat exchanger 6, and then discharged to the outside. On the other hand, the liquid nitrogen that has flowed down as the reflux liquid into the upper part of the first rectification column 8 (this includes not only the reflux liquid but also the liquid nitrogen generated by the rectification action of the first rectification column 8 itself). ) is sent through pipe 20 to a third rectification column I9, where low-boiling impurities (He, H2) are removed by distillation. This results in
The liquid nitrogen is ultra-purified and collected at the bottom of the third rectification column 19. A part of the stored ultra-high purity liquid nitrogen is provided for demand through the pipe 24, and the remainder is sent to the condenser 11 through the branch pipe 25, where it is vaporized and becomes the ultra-high purity product nitrogen gas. Return to the third rectification column I9. This ultra-high purity product nitrogen gas is taken out from pipe 2.
6 to the main heat exchanger 6, where it exchanges heat with raw material air and becomes room temperature and is used for demand. In addition, the low-boiling point impurity component gas such as He that has been vaporized and removed in the third rectification column 19 is sent to the condenser 21a, where the waste liquid nitrogen introduced from the center of the first rectification column 8 is collected. After the nitrogen gas is liquefied and removed by the cooling agent, it is discharged to the outside through the main heat exchanger 6.
また、第1の精留装置A系の定期点検時や製品窒素の量
が需要に追いつかない時には、弁38の作用により、バ
ックアップタンク31の超高純度液体窒素が蒸発器32
で気化され、超高純度製品窒素ガスとして製品窒素取出
パイプ26ムこ供給される。In addition, during periodic inspections of the first rectifier A system or when the amount of product nitrogen cannot keep up with demand, the action of the valve 38 allows the ultra-high purity liquid nitrogen in the backup tank 31 to be transferred to the evaporator 32.
The product is vaporized and supplied to 26 product nitrogen extraction pipes as ultra-high purity product nitrogen gas.
また、第1の精留装置への第1の精留塔8等の内部でパ
イプが詰まってその補修に長時間を要するような異常時
には、空気圧縮機lを止めるとともに、バルブ27を閉
じて第1の精留装置A系を停止させる。ついで、貯蔵タ
ンク16から、パイプ41を介して第2の精留装置A′
に液体窒素(不純分が微量混入している)を供給する。In addition, in the event of an abnormality such as when a pipe is clogged inside the first rectification column 8 or the like leading to the first rectification device and it takes a long time to repair, the air compressor l is stopped and the valve 27 is closed. Stop the first rectifier A system. Then, from the storage tank 16, the second rectifier A' is connected via the pipe 41.
Supply liquid nitrogen (containing trace amounts of impurities) to the
この液体窒素は、一部が精留塔8′の中央部に送り込ま
れて還流液となり、残部が蒸発器42aを通って気液混
合状態となり第2の精留塔8′の底部に原料として供給
される。この第2の精留塔8′内において、上記のよう
にして供給された原料液体窒素が精留作用を受け、超高
純度液体窒素となって上部に溜まる。これが、パイプ2
0から取り出され、蒸発器44で気化され、略常温の超
高純度製品窒素ガスとなって取出パイプ26に供給され
需要に供される。A part of this liquid nitrogen is sent to the center of the rectification column 8' and becomes a reflux liquid, and the remainder passes through the evaporator 42a and becomes a gas-liquid mixture and is sent to the bottom of the second rectification column 8' as a raw material. Supplied. In this second rectification column 8', the raw material liquid nitrogen supplied as described above undergoes a rectification action, becomes ultra-high purity liquid nitrogen, and accumulates in the upper part. This is pipe 2
It is taken out from 0, vaporized in the evaporator 44, becomes ultra-high purity product nitrogen gas at approximately room temperature, and is supplied to the take-out pipe 26 for demand.
このようにして、第1の精留装置Aの正常時はもとより
、異常時においても、超高純度の製品が供給される。し
たがって、超高純度の製品窒素の供給が途絶えることが
ない。In this way, an ultra-high purity product is supplied not only when the first rectification apparatus A is normal but also when it is abnormal. Therefore, the supply of ultra-high purity product nitrogen is never interrupted.
第2図は他の実施例を示している。この実施例は、貯蔵
タンク16から第1の精留塔8の中央部に対しても液体
窒素供給パイプ30を延ばしている。それ以外の部分は
第1図々同様である。このようにすることにより、前記
と同様の作用効果が得られるほか、装置全体に対する寒
冷供給量が増大することから、装置を停止し再起動させ
る際等の所要時間の大幅な短縮を実現できるという効果
が得られるようになる。FIG. 2 shows another embodiment. In this embodiment, the liquid nitrogen supply pipe 30 also extends from the storage tank 16 to the center of the first rectification column 8. The other parts are the same as those in FIG. By doing this, in addition to obtaining the same effects as mentioned above, the amount of cold supplied to the entire device is increased, so it is possible to significantly shorten the time required to stop and restart the device. effect will be obtained.
なお、以上の説明では、第2の精留塔8′がら超高純度
の液体窒素を取り出しているが、精留塔8′の最上部に
溜まる超高純度の窒素ガスを製品窒素ガスとして直接取
り出すようにしでもよい。In the above explanation, ultra-high purity liquid nitrogen is taken out from the second rectification column 8', but the ultra-high purity nitrogen gas accumulated at the top of the rectification column 8' is directly used as product nitrogen gas. You can also take it out.
また、貯蔵タンク16に、液体窒素を貯蔵しているが、
それに代えて液体空気を貯蔵し、これを各精密装置A、
A’に供給するようにしてもよい。In addition, liquid nitrogen is stored in the storage tank 16,
Instead, liquid air is stored and used for each precision device A,
It may also be supplied to A'.
また、第1図の一点鎖線で囲んだ部分Xを第3図に示す
ように変更してもよい。Further, the portion X surrounded by the dashed line in FIG. 1 may be changed as shown in FIG. 3.
以上のように、この発明の超高純度窒素ガス製造装置は
、膨脹タービンを用いず、それに代えて寒冷貯槽を用い
、この寒冷貯槽の寒冷を、精留塔ではなく分縮器に供給
しこれを装置全体の寒冷としている。したがって、上記
寒冷が、製品窒素中に混じり込むことがないことから、
仮りに寒冷中に不純分が混入していても、その混入不純
分にもとづく製品窒素の純度低下が生しない。しかも、
高速回転機器である膨張ターヒンを用いないことから、
膨脹タービンの運転要員が不要Sこなるうえ、負荷変動
(製品窒素の取り出し量の変化)に対するきめ細かな追
従運転が可能となり、常時高純度の製品を安定供給する
ことができる。そのうえ、この発明の装置は、第3の精
留塔を備え、そこに第1の精留装置で得られた液体窒素
を導入し、窒素よりも低沸点のHe等を除去するため、
前記提案装置では分離不可能なHe等も除去することが
でき、前記提案装置では得られない超高純度の製品窒素
を製造することができるようになる。特に、この発明の
装置では、上記のようにして作られた超高純度液体窒素
の一部をバックアップタンクに貯溜し、第1の精留装置
系の定期点検時や製品窒素ガスの需要量の大幅増加時等
に、これを気化させ、超高純度製品窒素ガスにして需要
に供することができる。さらに、この発明の装置は、第
1の精留装置とともに第2の精留装置を設け、第1の精
留装置の異常時には、第2の精留装置に寒冷貯槽から寒
冷液体を供給し、超高純度製品窒素を製造することがで
きる。したがって、常時超高純度の製品窒素を安定供給
することができる。As described above, the ultra-high purity nitrogen gas production apparatus of the present invention does not use an expansion turbine, but instead uses a cold storage tank, and supplies the cold water from the cold storage tank to the demultiplexer instead of the rectifier. The entire device is kept cold. Therefore, since the above-mentioned cold does not mix into the product nitrogen,
Even if impurities are mixed into the cold temperature, the purity of the product nitrogen will not decrease due to the mixed impurities. Moreover,
Because it does not use an expansion tachin, which is a high-speed rotating device,
In addition to eliminating the need for personnel to operate the expansion turbine, it also enables detailed follow-up operation to load fluctuations (changes in the amount of product nitrogen taken out), making it possible to constantly and stably supply high-purity products. Moreover, the apparatus of the present invention is equipped with a third rectification column, into which the liquid nitrogen obtained in the first rectification apparatus is introduced, and in order to remove He etc. having a lower boiling point than nitrogen,
The proposed device can also remove He, etc., which cannot be separated, and it becomes possible to produce product nitrogen with ultra-high purity, which cannot be obtained with the proposed device. In particular, in the apparatus of the present invention, a part of the ultra-high purity liquid nitrogen produced as described above is stored in a backup tank, and is used during periodic inspections of the first rectifier system and when the demand for product nitrogen gas is checked. When there is a significant increase in demand, this can be vaporized and made into ultra-high purity product nitrogen gas to meet demand. Furthermore, the apparatus of the present invention is provided with a second rectification apparatus together with the first rectification apparatus, and when an abnormality occurs in the first rectification apparatus, the cold liquid is supplied from the cold storage tank to the second rectification apparatus, It is possible to produce ultra-high purity product nitrogen. Therefore, ultra-high purity product nitrogen can be stably supplied at all times.
第1図はこの発明の一実施例の構成図、第2図は他の実
施例の構成図、第3回は第1図の一点鎖線Xで囲われた
部分の変形例の説明図である。Fig. 1 is a block diagram of one embodiment of the present invention, Fig. 2 is a block diagram of another embodiment, and the third is an explanatory diagram of a modification of the portion surrounded by the dashed line X in Fig. 1. .
Claims (2)
設けられた凝縮器内蔵型の分縮器を備えた第1および第
2の精留装置を設けるとともに、当該装置外から寒冷液
体の供給を受けこれを貯蔵する貯蔵タンクを設け、上記
貯蔵タンクの寒冷液体を冷熱発生用膨脹器の発生冷熱に
代え上記両精留装置に供給するための第1および第2の
供給パイプと、上記両パイプにそれぞれ設けられた制御
弁と、沸点の差により低沸点不純成分を気化して液体窒
素中から分離除去する第3の精留塔と、前記第1の精留
装置の精留塔内の液体窒素を上記第3の精留塔に導入す
る導入パイプと、上記第3の精留塔内の低沸点不純成分
除去済の液体窒素の大部分を製品として取り出す製品取
出パイプと、上記低沸点不純成分除去済の液体窒素の残
部を取り出して貯めるバックアップタンクと、このバッ
クアップタンクから製品窒素ガス取出パイプに延びる蒸
発器付きのバックアップパイプと、常時は第1の精留装
置に異常時に第2の精留装置に寒冷液体を供給するよう
上記両制御弁を制御する制御手段を設けたことを特徴と
する超高純度窒素製造装置。(1) A rectification column for cryogenic liquefaction separation, and a first and second rectification device equipped with a dephlegmator with a built-in condenser installed in the upper part of the rectification column, and the device A storage tank is provided for receiving and storing a cold liquid supplied from the outside, and first and second first and second rectifiers are provided for supplying the cold liquid in the storage tank to the cold heat generated by the cold heat generating expander and supplying the cold liquid to the two rectifiers. a supply pipe, a control valve provided on each of the above-mentioned pipes, a third rectification column that vaporizes low-boiling impurity components and separates and removes them from liquid nitrogen due to the difference in boiling points, and the first rectification device. An introduction pipe for introducing the liquid nitrogen in the rectification column into the third rectification column, and a product extraction pipe for taking out as a product most of the liquid nitrogen from which low-boiling impurity components have been removed in the third rectification column. A pipe, a backup tank for extracting and storing the remainder of the liquid nitrogen from which the low boiling point impurity components have been removed, a backup pipe with an evaporator extending from the backup tank to the product nitrogen gas extraction pipe, and a first rectification device that is normally used. An apparatus for producing ultra-high purity nitrogen, characterized in that a control means is provided for controlling both of the control valves so as to supply cold liquid to the second rectification apparatus in the event of an abnormality.
て取り出す製品取出パイプから分岐パイプが分縮器の凝
縮器に延び、その凝縮器内を通り抜けることにより、上
記製品液体窒素を凝縮器内の流通成分と熱交換させて気
化させ窒素ガス化する請求項(1)記載の超高純度窒素
製造装置。(2) In the third rectification column, a branch pipe extends from the product take-out pipe for taking out the liquid nitrogen as a product to the condenser of the demultiplexer, and by passing through the condenser, the product liquid nitrogen is transferred to the condenser. The ultra-high purity nitrogen production apparatus according to claim 1, wherein the nitrogen gas is vaporized by heat exchange with a circulating component in the nitrogen gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2339660A JP2721591B2 (en) | 1990-11-30 | 1990-11-30 | Ultra high purity nitrogen production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2339660A JP2721591B2 (en) | 1990-11-30 | 1990-11-30 | Ultra high purity nitrogen production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04208385A true JPH04208385A (en) | 1992-07-30 |
| JP2721591B2 JP2721591B2 (en) | 1998-03-04 |
Family
ID=18329599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2339660A Expired - Fee Related JP2721591B2 (en) | 1990-11-30 | 1990-11-30 | Ultra high purity nitrogen production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2721591B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0592323A1 (en) * | 1992-10-09 | 1994-04-13 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and apparatus for the production of ultra-pure nitrogen under pressure |
| EP1316768A1 (en) * | 2001-11-28 | 2003-06-04 | Linde Aktiengesellschaft | Process and device for the production of an ultra high purity liquid from a cryogenic liquid feed with lower purity |
| EP1316769A1 (en) * | 2001-11-28 | 2003-06-04 | Linde Aktiengesellschaft | Process and device for the production of ultra high purity Nitrogen from Nitrogen with lower purity |
| WO2018219685A1 (en) * | 2017-05-31 | 2018-12-06 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas production system |
| CN109779693A (en) * | 2017-11-10 | 2019-05-21 | 广州鲜之源生态冷链技术有限公司 | A kind of method and its equipment to generate electricity using liquid gas |
-
1990
- 1990-11-30 JP JP2339660A patent/JP2721591B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0592323A1 (en) * | 1992-10-09 | 1994-04-13 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and apparatus for the production of ultra-pure nitrogen under pressure |
| EP1316768A1 (en) * | 2001-11-28 | 2003-06-04 | Linde Aktiengesellschaft | Process and device for the production of an ultra high purity liquid from a cryogenic liquid feed with lower purity |
| EP1316769A1 (en) * | 2001-11-28 | 2003-06-04 | Linde Aktiengesellschaft | Process and device for the production of ultra high purity Nitrogen from Nitrogen with lower purity |
| WO2018219685A1 (en) * | 2017-05-31 | 2018-12-06 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas production system |
| JP2018204825A (en) * | 2017-05-31 | 2018-12-27 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Gas production system |
| CN110662935A (en) * | 2017-05-31 | 2020-01-07 | 乔治洛德方法研究和开发液化空气有限公司 | Gas production system |
| US11346603B2 (en) | 2017-05-31 | 2022-05-31 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas production system |
| TWI821181B (en) * | 2017-05-31 | 2023-11-11 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | Gas production system |
| CN109779693A (en) * | 2017-11-10 | 2019-05-21 | 广州鲜之源生态冷链技术有限公司 | A kind of method and its equipment to generate electricity using liquid gas |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2721591B2 (en) | 1998-03-04 |
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