JPH0420965A - Photomask cleaning device - Google Patents

Abstract

PURPOSE:To eliminate the remaining of stained dirt due to the residual liquid of a cleaning solution by rotating a photomask while holding it and supplying the cleaning solution on the photomask. CONSTITUTION:In a treating chamber 3, a purified water supplying nozzle 1, a cleaning solution supplying nozzle 2, a photomask holder 5 and a rotary rod 6 transmitting a rotating force are provided and the rod 6 is linked to a motor 7. The photomask 4 held on a photomask holder 5 is transmitted a revolving force with the rotary rod 6 and rotated and by a process that the cleaning solution or the purified water is jetted on the photomask from the cleaning solution supplying nozzle 2 or the purified water supplying nozzle 1, then cleaning of the photomask is performed and as soon as the cleaning is finished, the supply of the cleaning solution and purified water is stopped and by rotating the photomask, the removal of the solution and drying can be performed quickly.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photomask cleaning apparatus used in the manufacturing process of semiconductor devices.

[Conventional technology]

Conventionally, photomask cleaning equipment for removing dust and dirt adhering to photomasks immerses the photomask in a cleaning solution stored in a cleaning tank, or supplies the cleaning solution onto the photomask and uses a brush to clean the surface of the photomask. The photomask was scrubbed to remove dust and dirt, and then the photomask was moved into a drying chamber for steam drying.

[Problem to be solved by the invention]

With this conventional photomask cleaning equipment, it is not possible to quickly and completely remove residual liquid adhering to the photomask between cleaning and drying. This caused defects in the photomask that partially reduced the light transmittance.

For this reason, when this photomask is used in a pattern forming process in the manufacture of semiconductor devices, abnormalities in pattern formation occur, resulting in a decline in the yield and quality of the semiconductor devices.

SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art and provide a photomask cleaning apparatus that does not cause stains due to residual liquid.

[Means to solve the problem]

The photomask cleaning apparatus of the present invention includes means for holding and rotating a photomask, and means for supplying a cleaning liquid onto the photomask.

The photomask cleaning device of the present invention can quickly remove dust and dirt, drain liquid, and dry the photomask by rotating the photomask and using its centrifugal force. It can eliminate remaining dirt.

〔Example〕

Next, the present invention will be explained using the drawings.

FIG. 1 is a sectional view of a first embodiment of the invention.

In FIG. 1, the photomask cleaning apparatus includes a pure water supply nozzle 1. It has a rotating shaft 6 that transmits rotational force to the cleaning liquid supply nozzle 2, the photomask holding stand 5, and the photomask supporting stand 5, and a motor 7 is connected to this rotating shaft 6. The photomask 4 held on the photomask holding table 5 is rotated by the rotational force from the motor 7 being transmitted from the rotating shaft 6, and the cleaning liquid or pure water is applied to the photomask from the cleaning liquid supply nozzle 2 or the pure water supply nozzle 1. It has the function of cleaning the photomask by spraying it, stopping the supply of cleaning liquid and pure water immediately after cleaning is completed, and quickly draining and drying the photomask by rotating it.

FIG. 2 is a sectional view of a second embodiment of the invention.

In the second embodiment, a brush 8 is added to the photomask cleaning apparatus described in FIG.
It has the function of brushing the surface. Therefore, there is an advantage that the photomask 4 can be cleaned more effectively.

〔Effect of the invention〕

As explained above, according to the present invention, dust and dirt can be quickly removed, drained, and dried by rotating the photomask and using its centrifugal force, thereby removing stains caused by residual cleaning solution. It has the effect of eliminating the occurrence.

[Brief explanation of the drawing]

1 and 2 are cross-sectional views of first and second embodiments of the present invention.

Claims (1)

[Claims] A photomask cleaning apparatus comprising: means for holding and rotating a photomask; and means for supplying a cleaning liquid onto the photomask.