JPH0421972U - - Google Patents

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Publication number
JPH0421972U
JPH0421972U JP6265290U JP6265290U JPH0421972U JP H0421972 U JPH0421972 U JP H0421972U JP 6265290 U JP6265290 U JP 6265290U JP 6265290 U JP6265290 U JP 6265290U JP H0421972 U JPH0421972 U JP H0421972U
Authority
JP
Japan
Prior art keywords
measuring
evaluation probe
ground electrode
fet
signal line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6265290U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6265290U priority Critical patent/JPH0421972U/ja
Publication of JPH0421972U publication Critical patent/JPH0421972U/ja
Pending legal-status Critical Current

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  • Measuring Leads Or Probes (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aはこの考案の一実施例によるRF評価
用プローブを適用しようとするFETパターンを
示す図、第1図bは上記実施例のRF測定装置の
裏面を示す裏面図、第2図は上記実施例の測定装
置を用いてFETのRF特性を測定する方法を示
す図、第3図は上記と同様に測定する方法を示す
斜視図、第4図はセラミツク基板とウエハ上の信
号線の断面図、第5図は従来のFETの測定装置
および方法を説明する平面図である。 図において、1はFET、2,3は信号線路、
4は接地電極、5はRFプローバの信号線路、6
はRFプローバの接地電極、7はウエハである。
なお図中同一符号は同一又は相当部分を示す。
FIG. 1a is a diagram showing an FET pattern to which an RF evaluation probe according to an embodiment of the present invention is applied, FIG. A diagram showing a method of measuring the RF characteristics of an FET using the measuring device of the above embodiment, FIG. 3 is a perspective view showing a method of measuring in the same manner as above, and FIG. The cross-sectional view and FIG. 5 are plan views illustrating a conventional FET measuring device and method. In the figure, 1 is an FET, 2 and 3 are signal lines,
4 is the ground electrode, 5 is the signal line of the RF prober, 6
is a ground electrode of the RF prober, and 7 is a wafer.
Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【実用新案登録請求の範囲】 素子のRF特性を測定するRF評価用プローブ
において、 セラミツク基板上に形成された、先端がL字形
に曲がつている信号線と、接地電極とを有し、ウ
エハ上で素子のRF特性を測定することを特徴と
するRF評価用プローブ。
[Claims for Utility Model Registration] An RF evaluation probe for measuring the RF characteristics of an element, which has a signal line formed on a ceramic substrate, the tip of which is bent into an L-shape, and a ground electrode. An RF evaluation probe characterized in that it measures the RF characteristics of an element.
JP6265290U 1990-06-12 1990-06-12 Pending JPH0421972U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6265290U JPH0421972U (en) 1990-06-12 1990-06-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6265290U JPH0421972U (en) 1990-06-12 1990-06-12

Publications (1)

Publication Number Publication Date
JPH0421972U true JPH0421972U (en) 1992-02-24

Family

ID=31591999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6265290U Pending JPH0421972U (en) 1990-06-12 1990-06-12

Country Status (1)

Country Link
JP (1) JPH0421972U (en)

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