JPH0422735U - - Google Patents
Info
- Publication number
- JPH0422735U JPH0422735U JP6330290U JP6330290U JPH0422735U JP H0422735 U JPH0422735 U JP H0422735U JP 6330290 U JP6330290 U JP 6330290U JP 6330290 U JP6330290 U JP 6330290U JP H0422735 U JPH0422735 U JP H0422735U
- Authority
- JP
- Japan
- Prior art keywords
- mask
- item
- photolithography
- sliders
- air intake
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
第１図ないし第９図は本考案の実施例に係り、
第１図は凸状の曲面をもつ対象物とマスクの斜視
図、第２図は断面図、第３図は密着状態を示す断
面図、第４図は段差をもつ対象物とマスクの斜視
図、第５図は断面図、第６図は密着状態を示す断
面図、第７図は凹状の曲面をもつ対象物とマスク
の斜視図、第８図は正面図、第９図は密着状態を
示す断面図、第１０図ないし第１３図は従来例に
係り、第１０図は曲面をもつ対象物とマスクの斜
視図、第１１図は断面図、第１２図は段差をもつ
対象物とマスクの斜視図、第１３図は断面図であ
る。
１……マスク、２……ホルダ、３……切込み、
４……吸気孔、５……開口、６……真空装置、７
……スライダ、８……ガイド、９……長孔、１０
……対象物。
1 to 9 relate to embodiments of the present invention,
Fig. 1 is a perspective view of an object with a convex curved surface and a mask, Fig. 2 is a sectional view, Fig. 3 is a sectional view showing a close contact state, and Fig. 4 is a perspective view of an object with a step and a mask. , Fig. 5 is a cross-sectional view, Fig. 6 is a cross-sectional view showing a state of close contact, Fig. 7 is a perspective view of an object with a concave curved surface and a mask, Fig. 8 is a front view, and Fig. 9 is a state of close contact. The cross-sectional views shown in FIGS. 10 to 13 relate to the conventional example, FIG. 10 is a perspective view of an object with a curved surface and a mask, FIG. 11 is a sectional view, and FIG. 12 is an object with a step and a mask. 13 is a perspective view, and FIG. 13 is a sectional view. 1...Mask, 2...Holder, 3...Notch,
4...Intake hole, 5...Opening, 6...Vacuum device, 7
...Slider, 8...Guide, 9...Elongated hole, 10
……Object.
Claims (1)
るフオトリソグラフイ用マスク。 ２ 前記マスクの周縁にホルダを取り付けたこと
を特徴とする第１項記載のフオトリソグラフイ用
マスク。 ３ 前記マスクの表面に所要の切込みを形成した
ことを特徴とする第１項または第２項記載のフオ
トリソグラフイ用マスク。 ４ 前記マスクの肉厚内に吸気孔を形成し、前記
吸気孔の先端を前記マスクの表面に開口させたこ
とを特徴とする第１項記載のフオトリソグラフイ
用マスク。 ５ 第４項に記載したマスクの対向辺部に１対の
スライダを取り付け、前記スライダをガイドの長
孔にスライド自在および回転自在に係合したこと
を特徴とする第４項記載のフオトリソグラフイ用
マスク。[Claims for Utility Model Registration] 1. A mask for photolithography that is made of a highly transparent elastic material and has a flat plate shape. 2. The photolithography mask according to item 1, characterized in that a holder is attached to the periphery of the mask. 3. The photolithography mask according to item 1 or 2, characterized in that a required incision is formed on the surface of the mask. 4. The photolithography mask according to item 1, wherein an air intake hole is formed within the thickness of the mask, and a tip of the air intake hole is opened at the surface of the mask. 5. The photolithography device according to item 4, characterized in that a pair of sliders are attached to opposite sides of the mask described in item 4, and the sliders are slidably and rotatably engaged with the elongated holes of the guide. mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6330290U JPH0422735U (en) | 1990-06-15 | 1990-06-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6330290U JPH0422735U (en) | 1990-06-15 | 1990-06-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0422735U true JPH0422735U (en) | 1992-02-25 |
Family
ID=31593229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6330290U Pending JPH0422735U (en) | 1990-06-15 | 1990-06-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0422735U (en) |
-
1990
- 1990-06-15 JP JP6330290U patent/JPH0422735U/ja active Pending