JPH0423316A - Developing apparatus - Google Patents

Abstract

PURPOSE:To develop the photosensitive face of a wafer or a glass plate so as to make a developed face property uniform by a method wherein a plurality of developer liquid-temperature adjustment mechanisms are provided, one or a plurality of developer discharge ports are provided and a developer which is discharged from the individual discharge ports has a temperature grade. CONSTITUTION:A chamber 5 is installed in room-temperature surroundings whose room temperature is controlled strictly. Alternatively, the chamber itself is provided with a temperature adjustment mechanism, and the temperature of a developer is kept definite. The developer which is distributed to distribution pipes 6a to 6e is set at the same temperature and at the same concentration. The developer passes the distribution pipes 6a to 6e and enters temperature regulators 7a to 7e, and its liquid temperature is controlled. The temperature regulators 7a to 7e for liquid- temperature control use are respectively independent temperature regulators; and their temperature can independently be set. The developer whose liquid temperature is adjusted reaches a discharge port 4 through connecting pipes 8a to 8e; and it is dripped onto a glass raw plate 1 as a discharged developer 9. Since the developer 9 is mixed at the discharge port 4, the temperature distribution of developers (a) to (e) at a developing operation is made continuously gentle.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a developing device used in semiconductor manufacturing processes and optical memory mastering.

[Prior Art] Conventionally, in semiconductor manufacturing processes and optical memory mastering, a resist coated on a wafer or glass master is exposed to light such as a laser beam, and then a turntable is used as shown in Figure 8. A developing device has been used in which a wafer or a glass master is placed thereon, and a turntable is rotated to discharge a developer at a constant temperature onto the glass master.

[Problems to be Solved by the Invention] However, with conventional developing devices, when in-plane fluctuations occur in the laser power during the laser cutting process in optical memory mastering, the in-plane power fluctuations directly affect the characteristics of the finished development. This is reflected as intra-plane variation, and as a result, there is a problem in that in-plane uniformity cannot be maintained. Furthermore, under the premise that the development conditions are uniform within the plane, in laser cutting at a constant angular velocity (constant rotation speed), which is often used in laser cutting for optical memory mastering, it is possible to Since the linear velocity is higher on the outer circumferential side, there was a problem in that in order to keep the cutting conditions constant within the plane, the laser power had to be controlled to a value proportional to the linear velocity.

The present invention aims to solve these problems, and its purpose is to provide a developing device that can develop the photosensitive surface of a wafer or glass master so that the surface quality after development is uniform. It is available at a low price.

[Means for Solving the Problems] The developing device of the present invention is a developing device used in a semiconductor manufacturing process or optical memory mastering, and has a plurality of developer liquid temperature adjustment mechanisms, and has one or more developer discharge ports. It is characterized in that the developer discharged from each of the plurality of discharge ports has a temperature gradient.

[Function] According to the developing device of the present invention, the in-plane distribution of the developing ability can be controlled by controlling the temperature distribution of the developer at the developer discharge port. Developed to cancel out internal fluctuations,
It is possible to obtain a developed product with uniform properties within the surface.

[Example] Embodiments of the present invention will be described below based on the drawings.

In FIG. 1, a glass master disk 1 is fixed on a turntable 2, and rotates as the turntable 2 rotates. The developer 9 is dripped onto the glass master 1 from the developer discharge 804, and the resist layer 3 is developed. The developer passes from the chamber 5 through the distribution vibros a to 6e to the liquid temperature controller 7.
Distributed to a to 7e. The chamber 5 is installed in a room temperature environment with strict room temperature control, or the chamber itself has a temperature adjustment mechanism to keep the temperature of the developer constant. The developing solutions distributed to the distribution vibros a to 6e are all at the same temperature and have the same concentration. The developer that has passed through the distribution vibros a to 6e enters temperature regulators 7a to 7e, where the temperature of the developer is controlled. The liquid temperature control method generally uses a combination of a heater and a cooler;
A certain degree of control is possible even with only a cooler.

The temperature regulators 7a, 7b, 7c, 7d, and 7e are independent temperature regulators, and the temperature can be set independently. The developing solution whose liquid temperature has been adjusted reaches the discharge port 4 through the communication vibrators 8a to 8e, and is dripped onto the glass master 1 as a developing solution 9. The developer 9 is discharged from the discharge port 4.
Since they are mixed together, the temperature distribution of the developing solutions a to e during development becomes continuous and gradual.

FIG. 2 shows an example in which the laser power fluctuates within the plane of the object to be cut during laser cutting. In this case, the laser power is varying as the radial position changes. Cutting starts from the inner circumference A, and the laser power decreases toward the outer circumference until it passes B.
It shows a minimum at C, begins to increase after C, and increases toward the outer periphery. If points A-E correspond to points a-e in resist layer 3 of FIG. 1, respectively, then point C receives the smallest laser power in resist layer 3 of FIG. With a conventional developing device, the second
When a resist-coated glass master disc that has been cut as shown in the figure is developed, the entire surface is developed under the same development conditions, so the surface quality after development becomes non-uniform. A phenomenon occurs in which the grooves and bits near point C in the second figure become thinner than the grooves and bits near points A and E. Especially when cutting the laser power is lower than usual,
When forming grooves or bits that are shallower than the thickness of the resist layer, slight fluctuations in laser power have a large effect on the shape of the grooves or bits, so laser cutting is required to form the desired groove or bit shape. Managing laser power during this time was a major issue. When such a variation in laser power occurs, a stand bar with uniform surface quality can be obtained by varying the developing ability of the developer according to the radial position as shown in FIG. In general, the general rule is to use the developer at the optimum temperature for development.
If the liquid temperature deviates from the optimum temperature, the developing ability will decrease. Therefore, in order to obtain the distribution of developing ability as shown in Fig. 3, as shown in Fig. 4, point C should be the optimum developing temperature A, and points where the laser power is high should deviate from the optimum developing temperature. All you have to do is control the temperature of the developer. By controlling the temperature distribution of the developer according to the distribution of laser power during cutting in this manner, it becomes possible to precisely control the width, shape, and depth of the bits and groups.

Furthermore, methods for controlling the rotational speed during cutting include a method of keeping the linear velocity constant and a method of keeping the angular velocity constant (rotational speed - constant). The method of cutting at a constant linear velocity requires a complicated technique for synchronization when cutting signals such as sector marks, but has the advantage that the cutting laser power can be kept constant. Compact discs for music are cut using this method. On the other hand, with the method of cutting at a constant angular velocity, synchronization can be easily achieved when cutting signals such as sector marks, but since the linear velocity is higher on the outer circumference side than on the inner circumference side, As shown in the figure, it is necessary to control the cutting laser power to a value proportional to the linear velocity. In order to control the cutting laser power to be gradually increased in this way, a complicated control system is required. Therefore, when cutting at a constant angular velocity, it is preferable to use a developing method as shown in FIG. 6 in order to obtain uniform surface texture within the surface while keeping the laser power constant. That is, the developing ability of the developer is increased toward the outer periphery. For a resist-coated glass master disc that has been laser cut at a constant angular velocity while keeping the laser power constant, the effective laser power irradiated becomes smaller toward the outer periphery, so the developing method shown in Figure 6 should be used. By,
A developed glass master having in-plane uniformity can be obtained.

FIG. 7 shows another embodiment of the developing device of the present invention.

The developing solution is distributed from the chamber 5 through the vibrator 10 to the solution temperature regulators 11a to 11le. Liquid temperature regulator 11a-1
1e is installed just before the discharge port 4 to shorten the path of the developer to be discharged. This makes it difficult for the temperature of the developer whose temperature is adjusted by the liquid temperature regulator to fluctuate. This method is particularly suitable when the environmental temperature for development tends to change.

[Effects of the Invention] According to the developing device of the present invention described above, it is possible to eliminate in-plane non-uniformity caused by laser power fluctuations during laser cutting, and when laser cutting is performed at a constant angular velocity, the linear velocity can be reduced. Since there is no need to perform laser power control according to the laser power, the laser power control device of the laser cutting device can be simplified. The cost of laser cutting equipment for optical memory mastering is extremely large, and if the laser power control equipment can be simplified, the cost of laser cutting equipment can be kept low, which can significantly reduce the cost of mastering. This makes it possible to reduce the amount to

[Brief explanation of drawings]

FIG. 1 is a configuration diagram of a developing device of the present invention. FIG. 2 is a schematic diagram showing fluctuations in cutting laser power during cutting. FIG. 3 is a schematic diagram showing the distribution of the developing ability of the developer with respect to the radial position. FIG. 4 is a schematic diagram showing the distribution of the temperature of the developer with respect to the radial position. FIG. 5 is a schematic diagram showing the relationship between cutting laser power and radial position when the angular velocity is constant. FIG. 6 is a schematic diagram showing the relationship between the developing ability of the developer and the radial position when the angular velocity is constant. FIG. 7 is a schematic diagram of the developing device of the present invention when the liquid temperature regulator is placed near the discharge port. FIG. 8 is a schematic diagram showing a conventional developing device. Glass master 4 a~4 e -----------6a~6
e --------7a~7 e -------
-1-- 8a~8 e ---------- 9a~9 e ----------11a~ 1
1 e --- Turntable resist layer developer discharge outlet chamber distribution vibrator liquid temperature regulator communication vibrator discharge developing solution vibrator liquid temperature regulator developer discharge outlet applicant Seiko Epson Corporation agent Patent attorney Kizobe Suzuki ( 1 other person) v411!1 Radial position Fig. 2 required @ police C required Nuisetsu F To required 过 紲 紩 Post B Radial position Fig. 5 Radial position Fig. 7

Claims (1)

[Claims] A developing device used in a semiconductor manufacturing process or optical memory mastering has a plurality of developer liquid temperature adjustment mechanisms, one or more developer discharge ports, and a developer discharged from each of the developer discharge ports. A developing device characterized in that a liquid has a temperature gradient.