JPH0423413A - Soft magnetic thin film, its manufacturing method, and magnetic head - Google Patents

Soft magnetic thin film, its manufacturing method, and magnetic head

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Publication number
JPH0423413A
JPH0423413A JP2129616A JP12961690A JPH0423413A JP H0423413 A JPH0423413 A JP H0423413A JP 2129616 A JP2129616 A JP 2129616A JP 12961690 A JP12961690 A JP 12961690A JP H0423413 A JPH0423413 A JP H0423413A
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JP
Japan
Prior art keywords
soft magnetic
thin film
magnetic thin
elements
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2129616A
Other languages
Japanese (ja)
Inventor
Kumio Nako
久美男 名古
Hiroshi Sakakima
博 榊間
Keita Ihara
井原 慶太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2129616A priority Critical patent/JPH0423413A/en
Publication of JPH0423413A publication Critical patent/JPH0423413A/en
Pending legal-status Critical Current

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  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To provide an excellent soft magnetic characteristic, thermal stabilization and highly saturated flux density by specifying the composition of a soft magnetic alloy metal film which is Fe-based and contains N and one or more elements of groups IV to IIVa. CONSTITUTION:The title soft magnetic thin film is Fe-based and contains N by 1 to 20 atomic %. In is also provided with one or more elements of a group consisting of Ti, Zr and Hf of group IIVa elements. V, Nb and Ta of group Va elements, Cr, Mo, and W of group IVa elements, and Mn of group VIIa by 3 to 30 atomic %. This construction makes it possible to provide excellent abrasion resistance, and corrosion resistance and further supply a soft magnetic thin film made of an Fe-based single layer nitride alloy which is provided with excellent soft magnetic characteristics, their thermal stability and a highly saturated magnetic flux density.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、磁気録画再生装置(VTR)、磁気録音再生
装置等の磁気記録再生装置における磁気ヘッド等に用い
られる軟磁性薄膜とその製造方法並びに磁気ヘッドに関
するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a soft magnetic thin film used in a magnetic head, etc. in a magnetic recording and reproducing device such as a magnetic recording and reproducing device (VTR) and a magnetic recording and reproducing device, a method for manufacturing the same, and a method for manufacturing the soft magnetic thin film. It is related to the head.

従来の技術 近年の磁気記録分野における高密度記録化の要求に対し
て、高保磁力媒体に対応した高性能磁気ヘッドの開発が
進められている。磁気ヘッドの特性は、それに使用する
コア材料の材料特性に密接に関連しており、磁気ヘッド
の高性能化に向けて、高い飽和磁束密度を有し、熱的に
安定な優れた軟磁気特性を有すると共に、耐食性、及び
耐摩耗性に優れた高性能軟磁性薄膜が要求されている。
2. Description of the Related Art In response to the recent demand for higher density recording in the field of magnetic recording, development of high-performance magnetic heads compatible with high coercive force media is progressing. The characteristics of a magnetic head are closely related to the material characteristics of the core material used in it, and in order to improve the performance of the magnetic head, we have developed excellent soft magnetic properties that have high saturation magnetic flux density and are thermally stable. There is a demand for a high-performance soft magnetic thin film that has excellent corrosion resistance and wear resistance.

このような要求に対し、フェライトの飽和磁束密度は約
0.57.パーマロイ、センダスト、C。
In response to these requirements, the saturation magnetic flux density of ferrite is approximately 0.57. Permalloy, Sendust, C.

系非晶質材料でも約IT前後と低く、これら従来の材料
では飽和磁束密度に限界が有る。
Even amorphous materials have a low saturation magnetic flux density of around IT, and these conventional materials have a limit to their saturation magnetic flux density.

一方、Fe−3i/Ni−Fe、Fe−C/Ni−Fe
、Fe5in□、Fe−AI−N/5i−N等の様に数
十〜数百人の異種類の磁性膜、あるいは非磁性膜とを交
互に積層した多層膜は、高飽和磁束密度を有すると共に
、熱的に安定な良好な軟磁気特性を示すことが知られて
いる。そして、これら多層膜の高飽和磁束密度、優れた
軟磁気特性はFe主成分の微細結晶粒組織に起因してい
ると考えられている。
On the other hand, Fe-3i/Ni-Fe, Fe-C/Ni-Fe
, Fe5in□, Fe-AI-N/5i-N, etc., a multilayer film in which tens to hundreds of different types of magnetic films or non-magnetic films are alternately laminated has a high saturation magnetic flux density. It is also known to exhibit thermally stable and good soft magnetic properties. It is believed that the high saturation magnetic flux density and excellent soft magnetic properties of these multilayer films are due to the fine crystal grain structure mainly composed of Fe.

しかしながら、これら多層膜を磁気ヘッドコア材料とし
て用いる場合、数十〜数百人の異種類の極薄膜を交互に
積層し、総膜厚数μm〜数十μm形成する必要があるた
め、成膜プロセスが繁雑であり、また、各層が異種類の
極薄膜であるため膜厚制御が困難であり、成膜速度を速
くすることが出来ず、量産性に課題がある。
However, when using these multilayer films as magnetic head core materials, it is necessary to alternately laminate tens to hundreds of ultrathin films of different types to form a total film thickness of several micrometers to several tens of micrometers, so the film formation process Moreover, since each layer is an extremely thin film of a different type, it is difficult to control the film thickness, and the film formation rate cannot be increased, which poses problems in mass production.

最近、量産性に課題のある多層化によらず、単層膜の状
態で結晶粒の微細化を図り、高飽和磁束密度、及び熱的
安定性に優れた軟磁性を実現する目的で、種々の研究が
なされはじめた。その一つとして、Fe−N膜が研究さ
れている。しかし、このFe−N膜ば350°C以上の
熱処理で軟磁気特性が急激に劣化し、軟磁気特性の熱的
安定性に課題がある事が知られている。そこで、このF
e−N膜の熱安定性の向上を図る試みとして、微量のN
を添加したFe−N膜にZr、Tiを1原子%微量添加
した膜(第13回日本応用磁気学会学術講演概要集24
p F−2(1989) )の研究がなされている。
Recently, various efforts have been made to achieve soft magnetism with high saturation magnetic flux density and excellent thermal stability by refining crystal grains in a single-layer film, rather than using multilayers, which pose problems in mass production. Research has begun to be conducted. As one of them, Fe--N films are being researched. However, it is known that the soft magnetic properties of this Fe-N film are rapidly deteriorated by heat treatment at 350° C. or higher, and that there is a problem in the thermal stability of the soft magnetic properties. Therefore, this F
In an attempt to improve the thermal stability of the e-N film, a trace amount of N was added.
A film in which a trace amount of 1 atomic % of Zr and Ti is added to an Fe-N film (13th Japanese Society of Applied Magnetics, Abstracts of Academic Lectures 24)
pF-2 (1989)) has been studied.

発明が解決しようとする課題 ところが、上記のような1原子%程度の微量のZr、T
i、及び微量のNを添加したFe−N膜を磁気ヘッドコ
ア材料として用いた場合、前記膜中に耐食性、耐摩耗性
に効果のあるZr、Ti、N元素の含有量が極めて微量
であるため、この磁気ヘッドが磁気記録媒体との相対速
度の速い高品位VTR等の磁気ヘッドとして供され、か
つこのVTRに磁気ヘッドに対して研削性の強い磁気記
録媒体が使用される場合、前記軟磁性薄膜の耐摩耗性、
及び高湿下での使用における耐食性に課題を生じる。
However, the problem to be solved by the invention is that when a trace amount of Zr or T of about 1 atomic % as mentioned above
When a Fe-N film doped with i and a trace amount of N is used as a magnetic head core material, the content of Zr, Ti, and N elements, which are effective in corrosion resistance and wear resistance, is extremely small in the film. If this magnetic head is used as a magnetic head for a high-quality VTR or the like that has a high relative speed with a magnetic recording medium, and a magnetic recording medium that has strong abrasiveness with respect to the magnetic head is used in this VTR, the soft magnetic Abrasion resistance of thin films,
Also, problems arise in corrosion resistance when used under high humidity conditions.

また、最近の高密度記録化の著しい進展に伴って、磁気
ヘッドコア材料として、更に優れた軟磁気特性を有する
軟磁性薄膜が求められている。このような点から、上記
のようなl原子%程度の微量のZr、Ti、及び微量の
Nを添加したFe−N膜では、軟磁気特性上不十分であ
ると共に、熱的安定性に課題がある。
Furthermore, with the recent remarkable progress in high-density recording, there is a demand for soft magnetic thin films having even better soft magnetic properties as magnetic head core materials. From this point of view, the above-mentioned Fe-N film doped with trace amounts of Zr, Ti, and trace amounts of N on the order of 1 atomic % is insufficient in terms of soft magnetic properties and has problems with thermal stability. There is.

従って、更に一層、耐摩耗性、耐食性、及び軟磁気特性
に優れた高性能軟磁性薄膜の開発が求められている。ま
た、このような軟磁性薄膜を再現性良く、量産性良く、
生産性高く製造するための適切な製造方法、及び前記高
性能軟磁性薄膜を磁気ヘッドコア材料として使用した磁
気ヘッドが求められている。
Therefore, there is a demand for the development of high-performance soft magnetic thin films that are even more excellent in wear resistance, corrosion resistance, and soft magnetic properties. In addition, we can produce such soft magnetic thin films with good reproducibility and mass production.
There is a need for an appropriate manufacturing method for manufacturing with high productivity, and for a magnetic head using the above-mentioned high-performance soft magnetic thin film as a magnetic head core material.

本発明は上述の課題を解決するためになされたものであ
り、優れた耐摩耗性、耐食性を有すると共に、更に優れ
た軟磁気特性とその熱的安定性、及び高飽和磁束密度を
有する鉄系単層窒化合金から成る軟磁性薄膜とこのよう
な軟磁性薄膜を生産性高く製造するための適切な製造方
法、及び前記軟磁性薄膜を磁気ヘッドコア材料として用
いた磁気ヘッドを提供しようとするものである。
The present invention was made in order to solve the above-mentioned problems, and has an iron-based material that has excellent wear resistance and corrosion resistance, as well as excellent soft magnetic properties, thermal stability, and high saturation magnetic flux density. The present invention aims to provide a soft magnetic thin film made of a single-layer nitride alloy, an appropriate manufacturing method for manufacturing such a soft magnetic thin film with high productivity, and a magnetic head using the soft magnetic thin film as a magnetic head core material. be.

課題を解決するための手段 本発明者は、Feの高い飽和磁束密度と窒化物特有の優
れた耐摩耗性、耐食性に着目し、高飽和磁束密度を有し
、優れた軟磁気特性を有すると共にその熱的安定性に優
れ、耐食性、及び耐摩耗性に優れた高性能軟磁性薄膜を
開発するため、Feを主成分とし、Nを含むと共に、I
Va族元素のTi、Zr、Hf、Va族元素のV、Nb
、Ta、VIa族元素のCrXMo、、W、■a族元素
のMnの群における1種もしくは2種以上の元素を含む
系の合金薄膜について鋭意研究を行ったところ、前記合
金薄膜の組成が特定の範囲にあるとき優れた軟磁気特性
(低い保磁力、高い透磁率)を呈するという事実を見い
だし請求項(1)の発明に至った。特に、Feを主成分
とし、N、、Zrを含むと共に、Ti、Nb、Ta、C
r元素の少なくとも1種の元素を含む系の軟磁性合金薄
膜は、特定の組成範囲において、更に優れた軟磁気特性
とその熱的安定性、低い磁歪、及び高い飽和磁束密度を
有すると共に、更に優れた耐摩耗性、耐食性を併せ持つ
という事実を見いだし請求項(2)の発明に至った。
Means for Solving the Problem The present inventor focused on the high saturation magnetic flux density of Fe and the excellent wear resistance and corrosion resistance peculiar to nitrides, and created a material that has a high saturation magnetic flux density, excellent soft magnetic properties, and In order to develop a high-performance soft magnetic thin film with excellent thermal stability, corrosion resistance, and wear resistance, the main component is Fe, contains N, and I
Va group elements Ti, Zr, Hf, Va group elements V, Nb
, Ta, CrXMo of group VIa elements, , W, and ■ Mn of group A elements. As a result of extensive research on alloy thin films containing one or more elements in the group, the composition of the alloy thin film was identified. The inventors have discovered the fact that excellent soft magnetic properties (low coercive force, high magnetic permeability) are exhibited when the magnetic flux is within the range of . In particular, it mainly contains Fe, contains N, Zr, and also contains Ti, Nb, Ta, and C.
A soft magnetic alloy thin film containing at least one element of the r element has excellent soft magnetic properties, thermal stability, low magnetostriction, and high saturation magnetic flux density in a specific composition range, and also has The discovery of the fact that it has both excellent wear resistance and corrosion resistance led to the invention of claim (2).

請求項(3)の発明に係る軟磁性薄膜の製造方法は、成
膜速度は遅いが、装置が安価で膜の組成制御が容易であ
るという長所をもつスパッタ法によるものである。第5
図に示すように、磁路の大部分をフェライト17で構成
し、磁気的に飽和しやすいギヤツブ18近傍部にのみ軟
磁性薄膜19を設けた磁気ヘッド(M I Gヘッドと
呼ばれている)等のように比較的薄い膜厚(数μm以下
)の軟磁性薄膜を形成する場合に適している。前記スパ
ッタ法はArガス中にN2ガ1スを混入させた反応性ス
バ・フタ法、あるいは窒化物をターゲットに用いたスパ
ッタ法であり、直流または高周波による二極、三極、マ
グネトロン方式のスパッタ法、およびバイアススパッタ
法、イオンビームスパッタ法である。
The method for manufacturing a soft magnetic thin film according to the invention of claim (3) is based on a sputtering method which has the advantage that although the film formation rate is slow, the equipment is inexpensive and the composition of the film can be easily controlled. Fifth
As shown in the figure, a magnetic head (referred to as an M I G head) has a magnetic path mostly composed of ferrite 17 and a soft magnetic thin film 19 provided only in the vicinity of the gear knob 18, which is likely to be magnetically saturated. It is suitable for forming a soft magnetic thin film with a relatively thin film thickness (several micrometers or less), such as the following. The sputtering method is a reactive bath-lid method in which N2 gas is mixed into Ar gas, or a sputtering method using nitride as a target, and sputtering using two-pole, three-pole, or magnetron methods using direct current or high frequency. method, bias sputtering method, and ion beam sputtering method.

請求項(4)の発明に係る軟磁性薄膜の製造方法は、ス
パッタ法に比べ成膜速度が速く、バッチ処理量が大きく
採れる電子ビーム蒸着法によるものである。第6図に示
すように、非磁性基板20で軟磁性薄膜21が挟持され
、軟磁性薄膜21によって磁路が形成されるタイプのバ
ルク薄膜型の磁気ヘッド等のように、比較的厚い膜厚(
数μm〜数十μm)の軟磁性薄膜を大量に形成する場合
に適している。
The method for manufacturing a soft magnetic thin film according to the invention of claim (4) is based on an electron beam evaporation method which has a faster film formation rate and can handle a larger batch throughput than a sputtering method. As shown in FIG. 6, a soft magnetic thin film 21 is sandwiched between a nonmagnetic substrate 20 and a magnetic path is formed by the soft magnetic thin film 21, such as a bulk thin film type magnetic head. (
It is suitable for forming a large amount of soft magnetic thin films (several μm to several tens of μm).

請求項(5)の発明に係る磁気ヘッドは、信頼性高く、
高密度記録を達成するために、高い飽和磁束密度と優れ
た軟磁気特性を有すると共に耐食性、及び耐摩耗性に優
れた本発明の軟磁性薄膜を磁気ヘッドコア材料として用
いたものである。
The magnetic head according to the invention of claim (5) has high reliability,
In order to achieve high-density recording, the soft magnetic thin film of the present invention, which has a high saturation magnetic flux density, excellent soft magnetic properties, and excellent corrosion resistance and wear resistance, is used as a magnetic head core material.

作用 請求項(1)の発明の構成によれば、Feを主成分とし
、Nを含むと共に、IVaVa族元素i、Zr、Hf、
Va族元素のV、Nb、Ta、Via族元素のCr、M
o、W、■a族元素のMnの群における1種もしくは2
種以上の元素を含む系の軟磁性合金薄膜の組成が特定の
範囲にあるものであるから、前記軟磁性薄膜は、優れた
軟磁気特性とその熱的安定性、及び高飽和磁束密度を有
すると共に、優れた耐摩耗性、耐食性を併せ持つことが
出来る。
According to the structure of the invention of operation claim (1), the main component is Fe, contains N, and contains IVaVa group elements i, Zr, Hf,
Va group elements V, Nb, Ta, Via group elements Cr, M
o, W, ■ One or two types in the Mn group of group a elements
Since the composition of the soft magnetic alloy thin film containing more than one element is within a specific range, the soft magnetic thin film has excellent soft magnetic properties, thermal stability, and high saturation magnetic flux density. At the same time, it can also have excellent wear resistance and corrosion resistance.

特に、請求項(2)の発明の構成によれば、Feを主成
分とし、N、、Zrを含むと共に、Ti、Nb、Ta、
Cr元素の少なくとも1種の元素を含む系の特定の組成
範囲の軟磁性合金薄膜であるから、更に優れた軟磁気特
性、低い磁歪、高い飽和磁束密度を有すると共に、優れ
た耐摩耗性、耐食性を併せ持つことが出来る。
In particular, according to the structure of the invention of claim (2), the main component is Fe, and contains N, Zr, Ti, Nb, Ta,
Since it is a soft magnetic alloy thin film with a specific composition range containing at least one element of Cr, it has excellent soft magnetic properties, low magnetostriction, and high saturation magnetic flux density, as well as excellent wear resistance and corrosion resistance. It is possible to have both.

請求項(3)の発明の構成によれば、装置が安価で膜の
組成制御が容易であるスパッタ法によるものであるから
、比較的薄い膜厚(数μm以下)の軟磁性薄膜を少量生
産する場合に生産性を高める。
According to the structure of the invention of claim (3), since the apparatus is inexpensive and uses the sputtering method, which allows easy control of the film composition, it is possible to produce a soft magnetic thin film with a relatively thin film thickness (several μm or less) in small quantities. Increase productivity when

請求項(4)の発明の構成によれば、スバ・フタ法に比
べ成膜速度が速く、パッチ処理量が大きく採れる電子ビ
ーム蒸着法によるものであるから、比較的厚い膜厚(数
μm〜数十μm)の軟磁性薄膜を大量に形成する場合に
生産性を高める。
According to the structure of the invention of claim (4), since the film is formed by the electron beam evaporation method, which has a faster film formation speed than the sub-lid method and can achieve a larger patch throughput, the film can be formed with a relatively thick film thickness (several μm to Improves productivity when forming soft magnetic thin films in large quantities (several tens of μm).

請求項(5)の発明の構成によれば、高い飽和磁束密度
と優れた軟磁気特性とその熱的安定性を有すると共に、
優れた耐摩耗性、耐食性を併せ持つ前記軟磁性薄膜を磁
気ヘッドコア材料として使用した磁気ヘッドであるから
、信頼性の高い磁気ヘッドで高密度記録を達成すること
が出来る。
According to the structure of the invention of claim (5), it has a high saturation magnetic flux density, excellent soft magnetic properties and thermal stability, and
Since the magnetic head uses the soft magnetic thin film, which has both excellent wear resistance and corrosion resistance, as the magnetic head core material, high-density recording can be achieved with a highly reliable magnetic head.

実施例 実施例l FeZrのターゲ゛ットを用い、Arガス中にN2ガス
を導入し、N2分圧2.5%で反応性スパッタ法により
、第1表のN081〜No、4の膜組成を有する膜厚2
μmの軟磁性薄膜を形成し、これらの軟磁性薄膜を真空
中、回転磁場中で、200〜550°Cの範囲で1時間
の熱処理を行った。500°Cの熱処理後のこれらの軟
磁性薄膜の保磁力Hc、及び飽和磁束密度Bsを測定し
、膜中のZr含有量に対してプロットしたところ第1図
に示すように、保磁力HeはZr含有量の増加と共に減
少し、Zr含有量約9〜12原子%の範囲で0.20Q
以下(I M Hzにおける実効透磁率4000以上)
の優れた軟磁気特性を示し、Zr含有量約7原子%でも
0.80.の低い保磁力を示す。飽和磁束密度Bsは、
Zr含有量約9原子%まで1.7T以上の高い値を示し
、Zr含有量約12原子%でも約1.6Tの値を示すが
、Zr含有量約30原子%以上ではFe含有量が減少し
、飽和磁束密度が低下するので好ましくながった。
Examples Example 1 Using a FeZr target, introducing N2 gas into Ar gas and reactive sputtering at a N2 partial pressure of 2.5%, film compositions of Nos. 4 to 4 in Table 1 were prepared. Film thickness 2 with
Soft magnetic thin films with a thickness of μm were formed, and these soft magnetic thin films were heat-treated in a rotating magnetic field in a vacuum at a temperature of 200 to 550° C. for 1 hour. The coercive force Hc and saturation magnetic flux density Bs of these soft magnetic thin films after heat treatment at 500°C were measured and plotted against the Zr content in the film. As shown in Figure 1, the coercive force He was It decreases as the Zr content increases and reaches 0.20Q in the range of about 9 to 12 at% Zr content.
Below (effective magnetic permeability 4000 or more at I MHz)
It shows excellent soft magnetic properties of 0.80% even with a Zr content of about 7 at%. It shows a low coercive force. The saturation magnetic flux density Bs is
It shows a high value of 1.7T or more up to a Zr content of about 9 at%, and shows a value of about 1.6T even at a Zr content of about 12 at%, but the Fe content decreases when the Zr content is about 30 at% or higher. However, the saturation magnetic flux density decreased, making it less desirable.

第1表 前記第1表のNo、1(膜組成Fe88原子%、Zr7
原子%、N5原子%、以下FeaeZ r7Zsのよう
に示す) 、NO,2(F esbz rq Zs )
及びNo、 3(Fee+Zrl□Z5)の軟磁性薄膜
の熱処理温度に対する保磁力Hcの変化を第2図に示す
。図より、いずれの軟磁性薄膜も400°C以上の熱処
理温度に対して保磁力Hcは一定の値を示し、膜の軟磁
気特性は熱的安定性に優れていることが分かった。
Table 1 No. 1 in Table 1 above (film composition Fe88 at%, Zr7
atomic%, N5 atomic%, hereinafter referred to as FeaeZ r7Zs), NO,2 (F esbz rq Zs)
FIG. 2 shows the change in the coercive force Hc with respect to the heat treatment temperature of the soft magnetic thin films No. 3 (Fee+Zrl□Z5). From the figure, it was found that all soft magnetic thin films showed a constant coercive force Hc at a heat treatment temperature of 400° C. or higher, indicating that the soft magnetic properties of the films were excellent in thermal stability.

次に、同様の反応性スパッタ法により、N2分圧0.5
〜10%の範囲で膜厚2μmのFe−Zr−N膜を形成
した。これらの軟磁性薄膜の膜組成と真空中、回転磁場
中での熱処理後の保磁力Hcの測定結果を第2表に示す
。第2表に示ずように、膜中のN含有量1〜20原子%
、Zr含有量3原子%以上の範囲において、良好な保磁
力Hcを示すことを確認した。
Next, by the same reactive sputtering method, N2 partial pressure 0.5
A Fe-Zr-N film with a thickness of 2 μm was formed in the range of 10%. Table 2 shows the film compositions of these soft magnetic thin films and the measurement results of the coercive force Hc after heat treatment in vacuum and in a rotating magnetic field. As shown in Table 2, the N content in the film is 1 to 20 atomic%.
, it was confirmed that good coercive force Hc was exhibited in the range of Zr content of 3 atomic % or more.

第2表 なお、本実施例ではFe−Zr−N膜について説明した
が、前記以外のFeを主成分としNを1〜2゜原子%含
むと共に、Na族元素のTi、 Zr、 Hf。
Table 2 Although the Fe-Zr-N film has been described in this embodiment, other films containing Fe as the main component and 1 to 2 at % of N, as well as Na group elements Ti, Zr, and Hf.

Va族元素のV、Nb、Ta、VIa族元素のCr、M
o、W、■a族元素のMnの群における1種もしくは2
種以上の元素を3〜30原子%含む組成を有する鉄系単
層窒化合金から成る軟磁性薄膜でも同様の効果を有する
Va group elements V, Nb, Ta, VIa group elements Cr, M
o, W, ■ One or two types in the Mn group of group a elements
A soft magnetic thin film made of an iron-based single-layer nitride alloy having a composition containing 3 to 30 at.

次に、FeZrNb、およびFeZrTaのターゲット
を用い、同様の反応性スパッタ法により、N2分圧2.
5%で膜厚2μmのFe−Zr−Nb−N膜、及びFe
−Zr−Ta−N膜を形成した。これらの軟磁性薄膜を
真空中、回転磁場中で、200〜550°Cの範囲で1
時間の熱処理を行った。550°C熱処理後のこれらの
軟磁性薄膜の保磁力Hc、IMHzにおける実効透磁率
μ8、及び飽和磁束密度Bsを測定した結果を第3表に
示す。第3表に示す様に、Fe−Zr−Nb−N膜、及
びF’e−Zr−Ta−N膜は優れた軟磁気特性(低い
保磁力、高い透磁率)、及び高い飽和磁束密度を有する
ことが分かった。また、これらの軟磁性薄膜の飽和磁歪
λ、を測定した結果、F e eo、 s Z r I
oNq、 s膜と比較して、飽和磁歪λ3の値が172
以下に低下しており、Fe−ZrNb−N膜、及びFe
−Zr−Ta−N膜の飽和磁歪は、Fe−Zr−N膜に
比べて小さな値を示すことが分かった。このことは、F
e−Zr−Nb−N膜、及びFeZr−Ta−N膜が、
磁気ヘッドへの加工やギャップ形成時の応力に対して軟
磁気特性の劣化が小さく、磁気ヘッドコア材料として好
ましいことを示している。
Next, using FeZrNb and FeZrTa targets, a similar reactive sputtering method was applied to reduce the N2 partial pressure to 2.
Fe-Zr-Nb-N film with a film thickness of 2 μm at 5%, and Fe
-A Zr-Ta-N film was formed. These soft magnetic thin films were heated in a rotating magnetic field in a vacuum at a temperature of 200 to 550°C.
Heat treatment was performed for an hour. Table 3 shows the results of measuring the coercive force Hc, effective magnetic permeability μ8 at IMHz, and saturation magnetic flux density Bs of these soft magnetic thin films after heat treatment at 550°C. As shown in Table 3, the Fe-Zr-Nb-N film and the F'e-Zr-Ta-N film have excellent soft magnetic properties (low coercive force, high magnetic permeability) and high saturation magnetic flux density. It was found that it has. In addition, as a result of measuring the saturation magnetostriction λ of these soft magnetic thin films, F e eo, s Z r I
oNq, the value of saturation magnetostriction λ3 is 172 compared to the s film.
Fe-ZrNb-N film and Fe
It was found that the saturation magnetostriction of the -Zr-Ta-N film exhibits a smaller value than that of the Fe-Zr-N film. This means that F
The e-Zr-Nb-N film and the FeZr-Ta-N film are
This shows that the deterioration of soft magnetic properties is small due to stress during processing into a magnetic head and gap formation, making it preferable as a magnetic head core material.

第3表 第3表の軟磁性薄膜の熱処理温度に対する保磁力Hcの
変化を調べた結果、いずれの軟磁性薄膜も400°C以
上の熱処理温度に対して保磁力Hcは一定の値を示し、
膜の軟磁気特性は熱的安定性に優れていることが分かっ
た。
Table 3 As a result of examining the change in coercive force Hc with respect to heat treatment temperature of the soft magnetic thin films shown in Table 3, the coercive force Hc of all soft magnetic thin films showed a constant value at heat treatment temperature of 400°C or higher.
The soft magnetic properties of the film were found to have excellent thermal stability.

なお、本実施例ではFe−Zr−Nb−N膜、及びFe
−Zr−Ta−N膜について説明したが、前記以外のF
eを主成分としNを1〜20原子%、Zrを3〜20原
子%含むと共に、Nb、Tj、Ta、、Cr元素の少な
くとも1種の元素を0.5〜10原子%含む組成を有す
る鉄系単層窒化合金から成る軟磁性薄膜でも同様の効果
を有する。
Note that in this example, Fe-Zr-Nb-N film and Fe
- Although the Zr-Ta-N film was explained, other F films other than the above
It has a composition containing e as a main component, 1 to 20 at% of N, 3 to 20 at% of Zr, and 0.5 to 10 at% of at least one of the elements Nb, Tj, Ta, and Cr. A soft magnetic thin film made of an iron-based single-layer nitride alloy has a similar effect.

また、前記スパッタ法はArガス中にN2ガスを混入さ
せた反応性スパッタ法に限るものではなく、窒化物をタ
ーゲットに用いたスパッタ法、直流または高周波による
二極、三極、マグネトロン方式のスパッタ法、およびバ
イアススパッタ法、イオンビームスパッタ法においても
同様な効果を有する。
Furthermore, the sputtering method is not limited to the reactive sputtering method in which N2 gas is mixed into Ar gas, but also the sputtering method using nitride as a target, bipolar sputtering, triode sputtering, and magnetron sputtering using direct current or high frequency. Similar effects can be obtained in the method, bias sputtering method, and ion beam sputtering method.

次に、上記の鉄系単層窒化合金から成る軟磁性薄膜につ
いて、耐摩耗性試験を行った。その結果を第4表に示す
。この試験では、微量のZr、及びNを添加したFe−
N膜(FeqsZrrNz )との摩耗量を相対比較し
た。試験に際しては、第4図に示すように、基板140
曲面14aに前記鉄系窒化合金から成る軟磁性薄膜15
を形成し、ダミーヘッド16を作製した。そして、鉄系
単層窒化合金膜15の表面にメタルテープを摺接させ、
鉄系単層窒化合金膜15の摩耗量を測定した。摩耗量は
、前記鉄系単層窒化合金膜15の表面、つまりメタルテ
ープとの摺接面につけたマイクロビッカースの圧痕の対
角線の長さを読み取ることにより求めた。
Next, a wear resistance test was conducted on the soft magnetic thin film made of the above-mentioned iron-based single-layer nitride alloy. The results are shown in Table 4. In this test, Fe-
A relative comparison was made of the amount of wear with the N film (FeqsZrrNz). During the test, as shown in FIG.
A soft magnetic thin film 15 made of the iron-based nitride alloy is formed on the curved surface 14a.
was formed to produce a dummy head 16. Then, a metal tape is slid onto the surface of the iron-based single-layer nitride alloy film 15,
The wear amount of the iron-based single-layer nitride alloy film 15 was measured. The amount of wear was determined by reading the length of the diagonal line of the micro Vickers indentation made on the surface of the iron-based single-layer nitride alloy film 15, that is, the sliding contact surface with the metal tape.

第4表 第4表の結果より、NあるいはZr含有量の増加と共に
耐摩耗性は向上している。また、Nb、Ti、Ta、C
r元素の少なくとも1種の元素を含有することにより、
更に、耐摩耗性は向上している。
From the results shown in Table 4, the wear resistance improves as the N or Zr content increases. Also, Nb, Ti, Ta, C
By containing at least one element of the r element,
Furthermore, wear resistance is improved.

上記の例では、Nb、Ti、Ta、Cr元素を単独に使
用した場合を示しているが、上記の元素を複数種類同時
に0.5〜10原子%含有する場合であっても同様に耐
摩耗性を向上することができる。
The above example shows the case where Nb, Ti, Ta, and Cr elements are used alone, but even if multiple types of the above elements are contained at 0.5 to 10 atomic % at the same time, the wear resistance will be the same. can improve sexual performance.

次に、上記の鉄系単層窒化合金から成る軟磁性薄膜につ
いて、耐食性試験を行った結果を以下に示す。この試験
では、室温にて、5%のNaC1水溶液に24時間浸漬
し、腐食状態を調べた。 Fe7.。
Next, the results of a corrosion resistance test performed on the soft magnetic thin film made of the above-mentioned iron-based single-layer nitride alloy are shown below. In this test, the specimen was immersed in a 5% NaCl aqueous solution for 24 hours at room temperature, and the state of corrosion was examined. Fe7. .

Zr1N3、Feq7Ti+Nz膜は、点状に腐食が生
じたが、Feを主成分としNを1〜20原子%、Zrを
3〜20原子%含むと共に、Nb、Ti、Ta、Cr元
素の少なくとも1種の元素を0.5〜10原子%含む組
成を有する鉄系単層窒化合金膜においてはいずれの膜も
腐食は生じなかった。この結果より、前記鉄系単層窒化
合金膜は耐食性が向上していることが分かった。
The Zr1N3 and Feq7Ti+Nz films had dot-like corrosion, but they were mainly composed of Fe, containing 1 to 20 at% of N, 3 to 20 at% of Zr, and at least one of the elements Nb, Ti, Ta, and Cr. Corrosion did not occur in any of the iron-based single-layer nitride alloy films having a composition containing 0.5 to 10 at% of the elements. From this result, it was found that the iron-based single-layer nitride alloy film had improved corrosion resistance.

なお、前記以外のjeを主成分としNを1〜20原子%
含むと共に、IVaVa族元素i、、Z r、 Hf、
Va族元素のV、Nb、Ta、VIa族元素のCr。
In addition, je other than the above is the main component, and N is 1 to 20 atomic%.
Contains IVaVa group elements i, Zr, Hf,
V, Nb, Ta, which is a Va group element, and Cr, which is a VIa group element.

Mo、W、■a族元素のMnの群における1種もしくは
2種以上の元素を3〜30原子%含む組成を有する鉄系
単層窒化合金から成る軟磁性薄膜でも同様、耐食性及び
耐摩耗性向上の効果を有する。
Similarly, a soft magnetic thin film made of an iron-based single-layer nitride alloy having a composition containing 3 to 30 atomic percent of one or more elements in the Mn group of group A elements such as Mo, W, and ■Mn of Group A elements also exhibits corrosion resistance and wear resistance. It has an improving effect.

実施例2 本発明に関する軟磁性薄膜はFeを主成分としNを1〜
20原子%含むと共に、rVaVa族元素i、Zr、H
f、Va族元素のV、Nb、Ta、VIa族元素のCr
、Mo、W、■a族元素のMnの群における1種もしく
は2種以上の元素を3〜30原子%含む組成を有してい
る。
Example 2 A soft magnetic thin film according to the present invention contains Fe as a main component and N as a main component.
Contains 20 atom% and rVaVa group elements i, Zr, H
f, V of the Va group element, Nb, Ta, Cr of the VIa group element
, Mo, W, and 3 to 30 atomic % of one or more elements in the group of Mn of group a elements.

特に、Feを主成分としNを1〜20原子%、Zrを3
〜20原子%含むと共に、Nb、Ti、Ta、Cr元素
の少なくとも1種の元素を0.5〜10原子%含む組成
を有する鉄系単層窒化合金から成る軟磁性薄膜である。
In particular, Fe is the main component, N is 1 to 20 atomic %, and Zr is 3 atomic %.
It is a soft magnetic thin film made of an iron-based single-layer nitride alloy having a composition containing ~20 at% and at least 0.5 to 10 at% of at least one of the elements Nb, Ti, Ta, and Cr.

上記の軟磁性薄膜を第3図に示すイオンガン併用の電子
ビーム蒸着装置により膜厚2μmに作成した。以下、第
3図に基づいて説明する。
The above soft magnetic thin film was formed to a thickness of 2 μm using an electron beam evaporation apparatus combined with an ion gun as shown in FIG. This will be explained below based on FIG.

真空容器としての真空ベルジャ1内の上部に、結晶化ガ
ラスあるいはセラミックス等から成り、蒸着膜の形成さ
れる複数の基板2が蒸着面を下方に向けて曲面状の基板
ホルダー3に並設されている。また、前記基板ホルダー
3には基板ホルダー3を回転する為のモーターに連動し
たシャフト4が設けられており、基板ホルダー3はシャ
フト4を中心として回転している。真空ベルジャ1内の
下部には電子銃としての電子ビーム発生用フィラメント
5,6が左右の対称位置に配されており、各電子ビーム
発生用フィラメント5.6から発生される電子ビーム5
a、6aの照射位置、即ち両電子ビーム発生用フィラメ
ント5,6間に、各フィラメント5.6と対応するるつ
ぼ7,8が左右対称に配されている。一方のるつぼ7内
には、蒸発源材料としての鉄9が配され、他方のるつぼ
8内には鉄以外の蒸発源材料10が配されている。前記
蒸発源材料10はIVaVa族元素i、Zr、、Hf。
In the upper part of a vacuum belljar 1 serving as a vacuum container, a plurality of substrates 2 made of crystallized glass or ceramics, on which vapor deposition films are formed, are arranged in parallel on a curved substrate holder 3 with the vapor deposition surfaces facing downward. There is. Further, the substrate holder 3 is provided with a shaft 4 linked to a motor for rotating the substrate holder 3, and the substrate holder 3 rotates around the shaft 4. In the lower part of the vacuum belljar 1, electron beam generating filaments 5 and 6 as electron guns are arranged in symmetrical positions on the left and right, and the electron beam 5 generated from each electron beam generating filament 5 and 6 is
Crucibles 7 and 8 corresponding to each filament 5 and 6 are arranged symmetrically between the irradiation positions a and 6a, that is, between the electron beam generating filaments 5 and 6. Iron 9 as an evaporation source material is placed in one crucible 7, and evaporation source material 10 other than iron is placed in the other crucible 8. The evaporation source material 10 includes IVaVa group elements i, Zr, Hf.

Va族元素のV、Nb、Ta、Vla族元素のCr、M
OlW、■a族元素のMnの群における1種もしくは2
種以上の元素を高周波溶解炉等にて溶融することにより
作製した合金インゴットから成る。
Va group elements V, Nb, Ta, Vla group elements Cr, M
OlW, ■ 1 or 2 in the Mn group of group a elements
It consists of an alloy ingot made by melting more than one element in a high-frequency melting furnace.

また、真空ベルジャ1内における基板ホルダー3とるつ
ぼ7,8との間には、開閉可能であり、閉成動作時に上
記の蒸発源材料9,10の蒸気が基板2へ達するのを阻
止するシャッタ11が設けられている。また、真空ベル
ジヤ1内側面には、イオンガン12が併設されており、
窒素ガスを導入し、窒素イオンビーム13を作り出す。
Further, a shutter which can be opened and closed between the substrate holder 3 and the crucibles 7 and 8 in the vacuum belljar 1 prevents the vapor of the evaporation source materials 9 and 10 from reaching the substrate 2 during the closing operation. 11 are provided. In addition, an ion gun 12 is installed on the inside surface of the vacuum bell gear 1.
Nitrogen gas is introduced to create a nitrogen ion beam 13.

上記の構成において、電子ビーム蒸着装置が作動すると
、電子ビーム発生用フィラメント5.6から電子ビーム
5a、6aが発生し、これら電子ビーム5a、6aはる
つぼ7.8に配された蒸発源材料9,10に照射される
。このときシャッタ11は開成されている。電子ビーム
5a、6aが照射されると、蒸発源材料9,10は蒸気
となる。この蒸気は蒸気流となり基板2に達し、基板2
の表面に付着する。この時、同時にイオンガン12で放
出された窒素イオンビーム13も基板2に達し、鉄系単
層窒化合金から成る軟磁性薄膜が形成される。
In the above configuration, when the electron beam evaporation apparatus operates, electron beams 5a and 6a are generated from the electron beam generating filament 5.6, and these electron beams 5a and 6a are transmitted to the evaporation source material 9 disposed in the crucible 7.8. , 10. At this time, the shutter 11 is open. When irradiated with the electron beams 5a and 6a, the evaporation source materials 9 and 10 turn into vapor. This vapor becomes a vapor flow and reaches the substrate 2.
adheres to the surface of At this time, the nitrogen ion beam 13 emitted by the ion gun 12 also reaches the substrate 2, forming a soft magnetic thin film made of an iron-based single-layer nitride alloy.

本実施例において作成した前記軟磁性薄膜は、実施例1
と同様の効果を有していることを確認出来た。
The soft magnetic thin film produced in this example is as follows: Example 1
It was confirmed that it had the same effect.

なお、本実施例においては、蒸発源材料9,10に個々
に対応する電子ビーム発生用フィラメント5.6の設け
られた構成となっているが、この電子ビーム発生用フィ
ラメント5,6を1個とし、この1個のフィラメントか
ら発生される電子ビームを蒸発源材料9,10に対して
微小時間間隔にて交互に照射させる方式とすることも可
能である。
In this embodiment, the electron beam generating filaments 5 and 6 are provided individually corresponding to the evaporation source materials 9 and 10, but only one electron beam generating filament 5 and 6 is provided. It is also possible to adopt a method in which the evaporation source materials 9 and 10 are alternately irradiated with electron beams generated from this one filament at minute time intervals.

実施例3 第5図に示した構造の磁気ヘッド(MIGへ・ンド)の
軟磁性薄膜19部分に実施例1あるいは実施例2で作成
した飽和磁束密度1.5Tの鉄系単層窒化合金から成る
軟磁性薄膜を用いてMIGヘッドを作製した。前記鉄系
単層窒化合金から成る軟磁性薄膜の膜厚(第5図中り、
M)は各々5μmとし、ギャップ長0.15μm、トラ
ック幅5μm、ギャップデプス20μm、コイルの巻き
数は22ターンとした。また、比較として、飽和磁束密
度1.1Tのセンダスト膜を軟磁性薄膜19部分に用い
て前記同様の構造のMIGヘッドを作製し、Co−Cr
単層媒体(厚み0.2μm、Hc (±) −1300
0e、Hk=5KOe)での記録再生特性を調べた。周
速3 m/secで自己録再で行った。その結果、本発
明の鉄系単層窒化合金から成る軟磁性薄膜を磁気ヘッド
コア材料として用いた磁気ヘッドは、センダスト膜を磁
気ヘッドコア材料として用いた磁気ヘッドに比べて約3
dBの再生出力の増加が得られた。
Example 3 The soft magnetic thin film 19 portion of the magnetic head (MIG head) having the structure shown in FIG. A MIG head was fabricated using the soft magnetic thin film. The thickness of the soft magnetic thin film made of the iron-based single-layer nitride alloy (see Figure 5)
M) were each 5 μm, the gap length was 0.15 μm, the track width was 5 μm, the gap depth was 20 μm, and the number of turns of the coil was 22 turns. For comparison, an MIG head with the same structure as described above was fabricated using a Sendust film with a saturation magnetic flux density of 1.1T for the soft magnetic thin film 19 portion, and a Co-Cr
Single layer media (thickness 0.2 μm, Hc (±) -1300
0e, Hk=5KOe), the recording and reproducing characteristics were investigated. This was done by self-recording and replaying at a circumferential speed of 3 m/sec. As a result, the magnetic head using the soft magnetic thin film made of the iron-based single-layer nitride alloy of the present invention as the magnetic head core material has a magnetic head that uses Sendust film as the magnetic head core material, about 3
An increase in playback output of dB was obtained.

発明の効果 請求項(1)の発明によれば、熱的に安定な優れた軟磁
気特性と高飽和磁束密度を有すると共に、優れた耐摩耗
性、耐食性を併せ持つ軟磁性薄膜を提供することが出来
、本発明の軟磁性薄膜を使用する磁気ヘッドは、例えば
、磁気記録媒体と速い相対速度で摺動する高品位VTR
等に好適である。
Effects of the Invention According to the invention of claim (1), it is possible to provide a soft magnetic thin film that has excellent thermally stable soft magnetic properties and high saturation magnetic flux density, as well as excellent wear resistance and corrosion resistance. A magnetic head using the soft magnetic thin film of the present invention can be used, for example, in a high-quality VTR that slides at a high relative speed with a magnetic recording medium.
It is suitable for

請求項(2)の発明によれば、請求項(1)の発明によ
る軟磁性薄膜よりも、更に優れた軟磁気特性、低い磁歪
、高い飽和磁束密度を有すると共に、優れた耐摩耗性、
耐食性を併せ持つ軟磁性薄膜を提供することが出来る。
According to the invention of claim (2), it has better soft magnetic properties, lower magnetostriction, and higher saturation magnetic flux density than the soft magnetic thin film according to the invention of claim (1), and also has excellent wear resistance.
A soft magnetic thin film that also has corrosion resistance can be provided.

請求項(3)の発明によれば、比較的薄い膜厚(数μm
以下)の軟磁性薄膜を少量生産する場合に生産性を高め
ることができる。
According to the invention of claim (3), the film thickness is relatively thin (several μm).
Productivity can be increased when producing small quantities of soft magnetic thin films as described below.

請求項(4)の発明によれば、比較的厚い膜厚(数71
 m〜数十μm)の軟磁性薄膜を大量に形成する場合に
生産性を高めることができる。
According to the invention of claim (4), the film thickness is relatively thick (several 71
Productivity can be increased when forming a large number of soft magnetic thin films with a thickness of 100 μm to several tens of μm.

請求項(5)の発明によれば、熱的に安定な優れた軟磁
気特性と高い飽和磁束密度を有すると共に、優れた耐摩
耗性、耐食性を併せ持つ軟磁性薄膜を磁気ヘッドコア材
料として使用した磁気ヘッドであるから、信頼性の高い
磁気ヘッドで高密度記録を達成することが出来る。
According to the invention of claim (5), a magnetic head using a soft magnetic thin film having excellent thermally stable soft magnetic properties and high saturation magnetic flux density as well as excellent wear resistance and corrosion resistance is used as the magnetic head core material. Since it is a magnetic head, it is possible to achieve high-density recording with a highly reliable magnetic head.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例で作成した軟磁性薄膜の膜中
Zr含有量に対する保磁力Hc、及び飽和磁束密度Bs
の変化を示す図、第2図は本発明の実施例で作成した軟
磁性薄膜の熱処理温度に対する保磁力Hcの変化i示す
図、第3図は本発明の一実施例の説明に供する電子ビー
ム蒸着装置の模式構成図、第4図は耐摩耗性測定用のダ
ミーヘッドを示す斜視図、第5図及び第6図は従来提供
されている磁気ヘッドの概略図である。 ■・・・・・・真空ベルジャ、2・・・・・・基板、3
・・・・・・基板ボルダ−14・・・・・・シャフト、
5,6・・・・・・電子ビーム発生用フィラメント(電
子銃)、7.8・・・・・・るつぼ、9・・・・・・蒸
発源材料としての鉄、10・・・・・・鉄以外の蒸発源
材料、11・・・・・・シャッタ、12・・・・・・イ
オンガン、13・・・・・・窒素イオンビーム、14・
・・・・・基板、15・・・・・・軟磁性薄膜、16・
・・・・・ダミーヘッド、17・・・・・・フェライト
、18・・・・・・ギャップ、19・・・・・・軟磁性
薄膜、20・・・・・・非磁性基板、21・・・・・・
軟磁性薄膜、22.23・・・・・・ガラス。 代理人の氏名 弁理士 粟野重孝 はか1名第 図 第 図 第 図
Figure 1 shows the coercive force Hc and saturation magnetic flux density Bs with respect to the Zr content in the soft magnetic thin film prepared in one embodiment of the present invention.
FIG. 2 is a diagram showing the change in coercive force Hc with respect to the heat treatment temperature of the soft magnetic thin film prepared in the example of the present invention, and FIG. FIG. 4 is a perspective view showing a dummy head for measuring wear resistance, and FIGS. 5 and 6 are schematic diagrams of conventionally provided magnetic heads. ■...Vacuum bell jar, 2...Substrate, 3
......Substrate boulder-14...Shaft,
5, 6... Filament for electron beam generation (electron gun), 7.8... Crucible, 9... Iron as evaporation source material, 10... - Evaporation source material other than iron, 11... Shutter, 12... Ion gun, 13... Nitrogen ion beam, 14.
... Substrate, 15 ... Soft magnetic thin film, 16.
... Dummy head, 17 ... Ferrite, 18 ... Gap, 19 ... Soft magnetic thin film, 20 ... Nonmagnetic substrate, 21 ...・・・・・・
Soft magnetic thin film, 22.23...Glass. Name of agent: Patent attorney Shigetaka Awano

Claims (5)

【特許請求の範囲】[Claims] (1)Feを主成分としNを1〜20原子%含むと共に
、IVa族元素のTi、Zr、Hf、Va族元素のV、
Nb、Ta、VIa族元素のCr、Mo、W、VIIa
族元素のMnの群における1種もしくは2種以上の元素
を3〜30原子%含む組成を有することを特徴とする鉄
系単層窒化合金から成る軟磁性薄膜。
(1) Contains Fe as the main component and 1 to 20 atomic% of N, as well as IVa group elements Ti, Zr, Hf, Va group elements V,
Nb, Ta, group VIa elements Cr, Mo, W, VIIa
1. A soft magnetic thin film made of an iron-based single-layer nitride alloy, characterized in that it has a composition containing 3 to 30 atomic % of one or more elements in the Mn group.
(2)Feを主成分としNを1〜20原子%、Zrを3
〜20原子%含むと共に、Ti、Nb、Ta、Cr元素
の少なくとも1種の元素を0.5〜10原子%含む組成
を有することを特徴とする鉄系単層窒化合金から成る軟
磁性薄膜。
(2) Fe is the main component, N is 1 to 20 atomic%, and Zr is 3
1. A soft magnetic thin film made of an iron-based single-layer nitride alloy, characterized by having a composition containing ~20 at.% and at least 0.5-10 at.% of at least one of Ti, Nb, Ta, and Cr elements.
(3)請求項(1)または(2)のいずれかに記載の軟
磁性薄膜をスパッタ法により形成することを特徴とする
鉄系単層窒化合金から成る軟磁性薄膜の製造方法。
(3) A method for manufacturing a soft magnetic thin film made of an iron-based single-layer nitride alloy, characterized in that the soft magnetic thin film according to any one of claims (1) or (2) is formed by a sputtering method.
(4)請求項(1)または(2)のいずれかに記載の軟
磁性薄膜を電子ビーム蒸着法により形成することを特徴
とする鉄系単層窒化合金から成る軟磁性薄膜の製造方法
(4) A method for manufacturing a soft magnetic thin film made of an iron-based single-layer nitride alloy, characterized in that the soft magnetic thin film according to any one of claims (1) or (2) is formed by an electron beam evaporation method.
(5)請求項(1)または(2)のいずれかに記載の軟
磁性薄膜を磁気ヘッドコア材料として用いたことを特徴
とする磁気ヘッド。
(5) A magnetic head characterized in that the soft magnetic thin film according to claim 1 or 2 is used as a magnetic head core material.
JP2129616A 1990-05-18 1990-05-18 Soft magnetic thin film, its manufacturing method, and magnetic head Pending JPH0423413A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2129616A JPH0423413A (en) 1990-05-18 1990-05-18 Soft magnetic thin film, its manufacturing method, and magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2129616A JPH0423413A (en) 1990-05-18 1990-05-18 Soft magnetic thin film, its manufacturing method, and magnetic head

Publications (1)

Publication Number Publication Date
JPH0423413A true JPH0423413A (en) 1992-01-27

Family

ID=15013874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2129616A Pending JPH0423413A (en) 1990-05-18 1990-05-18 Soft magnetic thin film, its manufacturing method, and magnetic head

Country Status (1)

Country Link
JP (1) JPH0423413A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673527A (en) * 1992-08-28 1994-03-15 Nec Kansai Ltd Metallic magnetic film and its production

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673527A (en) * 1992-08-28 1994-03-15 Nec Kansai Ltd Metallic magnetic film and its production

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