JPH03250706A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03250706A JPH03250706A JP2048116A JP4811690A JPH03250706A JP H03250706 A JPH03250706 A JP H03250706A JP 2048116 A JP2048116 A JP 2048116A JP 4811690 A JP4811690 A JP 4811690A JP H03250706 A JPH03250706 A JP H03250706A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- magnetic alloy
- coercive force
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 32
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 6
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- 229910052702 rhenium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 abstract description 11
- 239000000956 alloy Substances 0.000 abstract description 11
- 230000004907 flux Effects 0.000 abstract description 10
- 229910052735 hafnium Inorganic materials 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 8
- 230000007797 corrosion Effects 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 5
- 230000035699 permeability Effects 0.000 abstract description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- -1 and Co. Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 201000010099 disease Diseases 0.000 description 2
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229940110728 nitrogen / oxygen Drugs 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- 229910002695 AgAu Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘットに適する磁性
合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術〉
近年、磁気記録の高密度化や広帯域化の必要性か高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。そして、この高い抗磁力をもつ
磁気記録媒体に記録再生するための磁気ヘッド材料とし
て、飽和磁束密度Ｂｓの高い磁性合金か必要とされてお
り、センダスト合金やＣｏ−Ｚｒ系非晶質合金等をコア
の一部または全部に使用した磁気ヘッドが提案されてい
る。(Conventional technology) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. A magnetic alloy with a high saturation magnetic flux density Bs is required as a magnetic head material for recording and reproducing on a magnetic recording medium with high coercive force, and Sendust alloy and Co-Zr 2. Description of the Related Art Magnetic heads have been proposed in which part or all of the core is made of an amorphous alloy or the like.
然しなから、磁気記録媒体の高抗磁力化が−段と進み、
磁気記録媒体の抗磁力が２００００ ｅ以上になるとセ
ンダスト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁気
ヘッドでは良好な磁気記録再生が困難になった。However, as the coercive force of magnetic recording media continues to increase,
When the coercive force of a magnetic recording medium exceeds 20,000 e, it becomes difficult to perform good magnetic recording and reproduction with a magnetic head using a Sendust alloy or a Co--Zr amorphous alloy.
又、磁気記録媒体の長手方向ではなく、厚さ方向に磁化
して記録する垂直磁化記録方式も提案されているが、こ
の垂直磁化記録方式を良好に行うには、磁気ヘッドの主
磁極の先端部の厚さを０．５μｍ以下にする必要があり
、比較的抗磁力の低い磁気記録媒体に記録するにも、高
い飽和磁束密度を持つ磁気ヘッド用磁性合金が必要にな
る。Also, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction, but in order to perform well with this perpendicular magnetization recording method, the tip of the main pole of the magnetic head must be The thickness of the magnetic head must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
５ｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 5i-based alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は保磁力Ｈｅが大きく、そのままでは磁気ヘッドの
材料としては不十分であるのでセンダスト合金やパーマ
ロイ等の保磁力の小さい磁性材料か、或いは８１０２等
の非磁性材料を中間層とした多層構造の磁気ヘッドが提
案されている。(Problem to be solved by the invention) However, these conventionally known high Bs magnetic alloys have a large coercive force He and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. A multilayer magnetic head has been proposed in which the intermediate layer is made of a magnetic material with a low coercive force or a non-magnetic material such as 8102.
然しなから、このように異なる系の物質を多層化するに
は工数やコストがかかり、信頼性を保つのも難しいとい
う問題点があった。特に数μｍ以上の膜厚にする為には
、場合によっては１００層以上の多層構造とする必要が
あり、使用範囲も限られていた。However, creating multiple layers of different types of materials in this way requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, in order to obtain a film thickness of several μm or more, it is necessary to have a multilayer structure of 100 or more layers depending on the case, and the range of use is also limited.
これらの問題点を解決するために、不発四人等はＦｅ−
Ｎ−０合金によって、多層構造にしない単層でも高飽和
磁束密度を有し、さらに低保磁力である磁性合金を提案
したか熱安定性の面からガラスモールド工程には適さな
いという問題点があった。そこで、本発明は多層構造に
しなくても高飽和磁束密度を持ち、保磁力か小さく、熱
安定性に優れた磁性合金を提供することを目的とする。In order to solve these problems, the four unexploded people etc.
By using N-0 alloy, we proposed a magnetic alloy that has a high saturation magnetic flux density even in a single layer without a multilayer structure, and also has a low coercive force.However, there was a problem that it was not suitable for the glass molding process from the aspect of thermal stability. there were. Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものてあ
り、Ｆ ｅｖ Ｎｗ Ｏｘ Ｍｙなる組成式で表され、
ｖ、ｗ、ｘ、ｙで示される原子％がＩ ≦ｗ≦２０
０．１≦ Ｘ ≦１００．５ ≦ ｙ ≦６
ｖ ＋ ｗ ＋ ｘ ＋ ｙ ■１００なる
関係を有する磁性合金（但しＭはＴ ｉ ｓ Ｚ ｒ
＋Ｈｆ、Ｖ、Ｃｒ、Ｍｏ、Ｗからなる群の中から選ばれ
た少なくとも１種類以上の元素）または、Ｆ ｅｖ Ｎ
Ｗ ＯＸ ＭＹ ＬＺなる組成式で表され、ｖ、ｗ、ｘ
、ｙ、ｚで示される原子％が１≦ｗ≦２０ ０．１≦
ｘ≦１０
０．５≦ｙ≦６０．３≦２≦６
ｖ ＋ ｗ ＋ ｘ ＋ ｙ ＋ ｚ鱈１００なる関係
を有する磁性合金（但しＭはＴｉ、ＺｒＨｆ、Ｖ、Ｃｒ
、Ｍｏ、Ｗからなる群の中から選ばれた少なくとも１種
類以上の元素であり、ＬはＹ、Ｒｅ、Ｒｕ、Ｏｓ、Ｃｏ
、Ｒｈ、Ｉｒ、Ｎｉ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula F ev Nw Ox My,
Atomic % indicated by v, w, x, y is I≦w≦20
0.1≦X≦100.5≦y≦6 v + w + x + y ■Magnetic alloy with the relationship of 100 (where M is
+ at least one element selected from the group consisting of Hf, V, Cr, Mo, and W) or F ev N
It is represented by the composition formula W OX MY LZ, and v, w, x
, y, z are 1≦w≦20 0.1≦
x≦10 0.5≦y≦60.3≦2≦6 v + w + x + y +
, Mo, and W, and L is Y, Re, Ru, Os, and Co.
, Rh, Ir, Ni.
Ｐｄ、Ｐｔ、Ｃｕ、Ａｇ、Ａｕ、Ｓｎ、Ｐｂ。Pd, Pt, Cu, Ag, Au, Sn, Pb.
ｓｂからなる群の中から選ばれた少なくとも１種類以上
の元素）をそれぞれ提供するものである。At least one element selected from the group consisting of sb).
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とＴｉ。A pair of targets 5.5 are iron (Fe) and Ti.
Ｚｒ、Ｈｆ等の添加元素の合金ターゲットか、或いは適
当な凹部を設けた純鉄のターゲットの四部にチップ状の
Ｔｉ、Ｚｒ、Ｈｆ等をはめ込んだ複合ターゲットである
。このターゲット５．５はターゲットホルダ９によって
支えられており、このターゲット５とターゲットホルダ
９には、直流電源１３よりマイナス電位が印加され、更
にこのターゲットホルダ９の周囲にはシールド４が取り
付けである。This target is either an alloy target with added elements such as Zr or Hf, or a composite target in which chips of Ti, Zr, Hf, etc. are inserted into four parts of a pure iron target with appropriate recesses. This target 5.5 is supported by a target holder 9, a negative potential is applied to the target 5 and the target holder 9 from a DC power supply 13, and a shield 4 is attached around the target holder 9. .
又、このターゲットホルダ９の内部には、両ターゲット
５．５間にプラズマ１４を集束するだめの磁石６．６が
挿入され、かつターゲット５の表面の加熱を防ぐために
冷却水８が流入している。Further, inside this target holder 9, a magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and cooling water 8 flows in to prevent the surface of the target 5 from being heated. There is.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダ９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空槽１５の上部より、窒素（Ｎ２）酸素（０
２）アルゴン（Ａｒ）がそれぞれ流量計１〜３により、
所定の流量に調節されて導入されている。Also, from the upper part of this vacuum chamber 15, nitrogen (N2) and oxygen (0
2) Argon (Ar) is supplied by flowmeters 1 to 3, respectively.
It is introduced at a predetermined flow rate.
なお、アルゴンはターゲット５をスパッタすると同時に
成膜する磁性合金膜中の酸素と窒素の量を調節するため
のものである。Note that argon is used to adjust the amount of oxygen and nitrogen in the magnetic alloy film formed at the same time as sputtering the target 5.
そして、真空槽１５の下部には基板ホルダ１２上に基板
１１が置かれ、不純物を防ぐためのシャッタ１０が基板
１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ”）がターゲッット５に衝突し、ターゲッ
ト５の鉄原子及びＴｉ、Ｚｒ、Ｈｆ等の原子が飛び出す
。In such a sputtering apparatus, the target 5 supported by the left and right target holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since is at a negative potential, argon ions (Ar'') in the plasma 14 collide with the target 5, and iron atoms and atoms of Ti, Zr, Hf, etc. of the target 5 fly out.
そして、ターゲット５から飛び出した鉄とＴｌＺｒ、Ｈ
ｆ等の原子とプラズマ中の窒素および酸素の原子または
分子が結合して基板１１の上に成長していく。Then, the iron, TlZr, and H that jumped out from target 5
Atoms such as f combine with atoms or molecules of nitrogen and oxygen in the plasma and grow on the substrate 11.
なお、スパッタ開始後の数分間は、シャッタ１０を閉じ
て基板１１を覆うことにより、ターゲット５の表面の不
純物か基板１１の上に付かないようにし、その後でシャ
ッタ１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１〜３にて窒素、酸素、アルゴンの導入
量を調整することにより、所望の窒素及び酸素を含んだ
ＦｅｖＮＷＯｘＭＹ合金を得ることができる。Then, by adjusting the amounts of nitrogen, oxygen, and argon introduced using the flowmeters 1 to 3, a FevNWOxMY alloy containing desired nitrogen and oxygen can be obtained.
このようにして得たＦ ｅ ｖ Ｎｗ ＯＸ ＭＹ金合
金窒素・酸素及びＴｉ、Ｚｒ、Ｈｆ等の含有量と飽和磁
束密度Ｂｓ、保磁力Ｈｃの関係を表１に示す。Table 1 shows the relationship between the content of nitrogen/oxygen, Ti, Zr, Hf, etc. in the thus obtained F e v Nw OX MY gold alloy, the saturation magnetic flux density Bs, and the coercive force Hc.
（以下余白）
表
表１は窒素・酸素及びＴｉ、Ｚｒ、Ｈｆ等の含有量と飽
和磁束密度（Ｂｓ）、保磁力（Ｈｃ）との関係を示す表
であり、含有量はＥＳＣＡ（Ｘ線光電子分光分析法）
、ＥＰＭＡ （Ｘ線マイクロアナライザ法）等による定
量分析で原子％て表しているが、±２０％程度の誤差が
見込まれる。保磁力は真空中での熱処理を行った時の値
であり、熱処理温度はここでは４００° Ｃである。こ
の内、試料番号１はＦｅに窒素のみを含有させた時の結
果である。試料番号２〜１２は本発明の磁性合金である
。(Left below) Table 1 is a table showing the relationship between the content of nitrogen/oxygen, Ti, Zr, Hf, etc., saturation magnetic flux density (Bs), and coercive force (Hc). photoelectron spectroscopy)
Although expressed in atomic % by quantitative analysis using EPMA (X-ray microanalyzer method) or the like, an error of about ±20% is expected. The coercive force is the value obtained when heat treatment is performed in vacuum, and the heat treatment temperature here is 400°C. Among these, sample number 1 is the result when only nitrogen is contained in Fe. Sample numbers 2 to 12 are magnetic alloys of the present invention.
窒素の含有量が１原子９６未満であると、顕著な窒素の
効果が見られずＨｃはほとんど低下しない。When the nitrogen content is less than 1 atom, 96 atoms, no significant effect of nitrogen is observed and Hc hardly decreases.
また第４図に示したように、窒素の含有量が２０原子％
以下であるとＢｓが１．ＯｋＧ以上の磁性合金が得られ
る。従って、窒素の含有量が１〜２０原子％さらに好ま
しくは１〜１０原子％である時、高ＢＳで低Ｈｅの磁性
合金が得られる。窒素含有量が１〜１０原子％の時はＢ
ｓが１５ｋＧ以上の磁性合金が得られる。In addition, as shown in Figure 4, the nitrogen content is 20 at%
If it is below, Bs is 1. A magnetic alloy of OkG or higher can be obtained. Therefore, when the nitrogen content is 1 to 20 atomic %, more preferably 1 to 10 atomic %, a high BS and low He magnetic alloy can be obtained. B when the nitrogen content is 1 to 10 at%
A magnetic alloy with s of 15 kG or more can be obtained.
酸素の含有量が０．１原子％未満であると、顕著な酸素
の効果が見られず磁気特性の改善がほとんど見られない
。また、酸素の含有量が１０原子％を越えるとＨｃか増
大する。従って、酸素の含有量が０．１〜１０原子％で
ある時、高Ｂｓで低Ｈｃの磁性合金が得られる。When the oxygen content is less than 0.1 atomic %, no significant oxygen effect is observed and almost no improvement in magnetic properties is observed. Furthermore, when the oxygen content exceeds 10 atomic %, Hc increases. Therefore, when the oxygen content is 0.1 to 10 atomic %, a magnetic alloy with high Bs and low Hc can be obtained.
第２図には、本発明になる磁性合金と従来例である窒化
鉄（ＦｅＮ）合金の、熱処理温度による保磁力（Ｈｃ）
の変化を示す。窒化鉄は熱処理温度３００ ’ ｃの時
は比較的Ｈｃは低いが３００°Ｃ以上にすると急激にＨ
ｃが増大する。これに対し本発明になる磁性合金は、Ｈ
ｃが小さく熱安定性にも優れていることが解る。ここて
Ｔｉ、Ｚｒ、Ｈｆ等の元素の合計の含有量が０．５原子
％未満であると、熱安定性の向上に対する顕著な効果は
見られず、６原子％を越えるとＢｓの低下とＨｃの増大
が生じる。従って、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｃｒ、Ｍｏ
、Ｗからなる群の中から選ばれた少なくとも１種類以上
の元素の合計の含有量か０．５〜８原子％の時、高Ｂｓ
・低Ｈｅて熱安定性にも優れた磁性合金を得ることがで
きる。また第３図には膜厚を２μｍとした時の本発明に
なる磁性合金の透磁率μと周波数の関係を示す。本発明
になる磁性合金は透磁率が３０００〜５０００と高く、
磁気ヘットとして十分な再生効率が得られる。Figure 2 shows the coercivity (Hc) of the magnetic alloy according to the present invention and the conventional iron nitride (FeN) alloy depending on the heat treatment temperature.
shows the change in Iron nitride has a relatively low Hc at a heat treatment temperature of 300'C, but Hc rapidly increases at temperatures above 300'C.
c increases. On the other hand, the magnetic alloy of the present invention has H
It can be seen that c is small and thermal stability is excellent. Here, if the total content of elements such as Ti, Zr, Hf, etc. is less than 0.5 at%, no significant effect on improving thermal stability is observed, and if it exceeds 6 at%, Bs decreases. An increase in Hc occurs. Therefore, Ti, Zr, Hf, V, Cr, Mo
, when the total content of at least one element selected from the group consisting of W is 0.5 to 8 at%, high Bs
- A magnetic alloy with low He and excellent thermal stability can be obtained. Further, FIG. 3 shows the relationship between the magnetic permeability μ and frequency of the magnetic alloy according to the present invention when the film thickness is 2 μm. The magnetic alloy of the present invention has a high magnetic permeability of 3000 to 5000,
Sufficient reproduction efficiency can be obtained as a magnetic head.
（以下余白）
表
表２はＲｅ、Ｒｕ等の元素か耐蝕性の向上に寄与するこ
とを示したものである。実験は試料を６０°ｃ−９０％
の高温高湿中に放置し、１０００時間経過後に腐蝕病が
見られないものを○腐蝕病か生したものを×として耐蝕
性を示した。試料番号２１は比較例であるＦｅＮ合金、
試料番号２２〜３７はＦｅＮ−０−Ｚｒ合金にＲｅ、Ｒ
ｕ等の元素を添加した合金てあり、試料番号２２〜３７
か本発明になる磁性合金である。(Left below) Table 2 shows that elements such as Re and Ru contribute to improving corrosion resistance. In the experiment, the sample was heated to 60°C - 90%
The samples were left in a high temperature and high humidity environment for 1,000 hours, and after 1000 hours, those with no corrosion disease were rated as ○, and those with corrosion disease were evaluated as x, indicating corrosion resistance. Sample number 21 is a comparative example of FeN alloy,
Sample numbers 22 to 37 are FeN-0-Zr alloys containing Re and R.
Alloys with added elements such as u, sample numbers 22 to 37
This is a magnetic alloy according to the present invention.
ここで、Ｒｅ Ｒｕ等の合計の含有量か０．３原子％
未満であると、耐蝕性に対する顕著な効果か見られず、
６原子％を越えると磁気特性の劣化か生しる。従って、
Ｙ、Ｒｅ、Ｒｕ、Ｏｓ、Ｃｏ。Here, the total content of Re Ru, etc. is 0.3 at%
If it is less than that, there will be no noticeable effect on corrosion resistance,
If it exceeds 6 atomic %, the magnetic properties may deteriorate. Therefore,
Y, Re, Ru, Os, Co.
Ｒｈ、Ｉ ｒ、Ｎｉ、Ｐｄ、Ｐｔ、Ｃｕ、ＡｇＡｕ、Ｓ
ｎ、Ｐｂ、Ｓｂからなる群の中から選ばれた少なくとも
１種類以上の元素の合計の含有量が０．３〜６原子％で
ある時、磁気特性と耐蝕性に優れた磁性合金が得られる
。Rh, Ir, Ni, Pd, Pt, Cu, AgAu, S
When the total content of at least one element selected from the group consisting of n, Pb, and Sb is 0.3 to 6 at%, a magnetic alloy with excellent magnetic properties and corrosion resistance can be obtained. .
また、磁歪制御等を目的としてＴａ、Ｎｂを合計で６原
子％以下含有させることかできる。Further, for the purpose of controlling magnetostriction, etc., Ta and Nb can be contained in a total of 6 atomic % or less.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用磁性合金が得られる。従って、本発明の
磁性合金を用いれば、高保磁力媒体への良好な記録再生
が行える他、高性能の薄膜磁気ヘッド等を作成すること
ができ、高密度な磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金膜を製造する装置の一
実施例であるスパッタ装置の概略図、第２図は、熱処理
温度によるＨｃの変化を表わす図、第３図は透磁率μと
周波数の関係を示す図、第４図は窒素含有量と飽和磁束
密度（Ｂｓ）の関係を示す図である。FIG. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing a magnetic alloy film according to the present invention, FIG. 2 is a diagram showing changes in Hc depending on heat treatment temperature, and FIG. 3 is a diagram showing magnetic permeability μ FIG. 4 is a diagram showing the relationship between nitrogen content and saturation magnetic flux density (Bs).
Claims (1)
ｖ，ｗ，ｘ，ｙで示される原子％が １≦ｗ≦２０ ０．１≦ｘ≦１０ ０．５≦ｙ≦６ ｖ＋ｗ＋ｘ＋ｙ＝１００ なる関係を有する磁性合金。（但しＭはＴｉ、Ｚｒ，Ｈ
ｆ，Ｖ，Ｃｒ，Ｍｏ，Ｗからなる群の中から選ばれた少
なくとも１種類以上の元素） （２）Ｆｅ＿ｖＮ＿ｗＯ＿ｘＭ＿ｙＬ＿ｚなる組成式で
表され、ｖ，ｗ，ｘ，ｙ，ｚで示される原子％が１≦ｗ
≦２００．１≦ｘ≦１０ ０．５≦ｙ≦６０．３≦ｚ≦６ ｖ＋ｗ＋ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但しＭはＴｉ，Ｚｒ，Ｈ
ｆ，Ｖ，Ｃｒ，Ｍｏ，Ｗからなる群の中から選ばれた少
なくとも１種類以上の元素であり、ＬはＹ，Ｒｅ，Ｒｕ
，Ｏｓ，Ｃｏ，Ｒｈ，Ｉｒ，Ｎｉ，Ｐｄ，Ｐｔ，Ｃｕ，
Ａｇ，Ａｕ，Ｓｎ，Ｐｂ，Ｓｂからなる群の中から選ば
れた少なくとも１種類以上の元素）[Claims] (1) It is expressed by the compositional formula Fe_vN_wO_xM_y, and the atomic % represented by v, w, x, and y is 1≦w≦20 0.1≦x≦10 0.5≦y≦6 v+w+x+y= A magnetic alloy having a relationship of 100. (However, M is Ti, Zr, H
At least one element selected from the group consisting of f, V, Cr, Mo, and W) (2) Represented by the compositional formula Fe_vN_wO_xM_yL_z, and atomic percent represented by v, w, x, y, and z. is 1≦w
A magnetic alloy having the following relationships: ≦200.1≦x≦10 0.5≦y≦60.3≦z≦6 v+w+x+y+z=100. (However, M is Ti, Zr, H
At least one element selected from the group consisting of f, V, Cr, Mo, and W, and L is Y, Re, Ru
, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu,
At least one element selected from the group consisting of Ag, Au, Sn, Pb, and Sb)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2048116A JPH07116564B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2048116A JPH07116564B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03250706A true JPH03250706A (en) | 1991-11-08 |
| JPH07116564B2 JPH07116564B2 (en) | 1995-12-13 |
Family
ID=12794349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2048116A Expired - Fee Related JPH07116564B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07116564B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0590027A (en) * | 1991-04-25 | 1993-04-09 | Alps Electric Co Ltd | Soft magnetic film of high saturation flux density |
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
-
1990
- 1990-02-28 JP JP2048116A patent/JPH07116564B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0590027A (en) * | 1991-04-25 | 1993-04-09 | Alps Electric Co Ltd | Soft magnetic film of high saturation flux density |
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07116564B2 (en) | 1995-12-13 |
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