JPH04235531A - electro-optical device - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to electro-optical devices such as liquid crystal display devices. More specifically, the present invention relates to an electro-optical device in which pixel electrodes and nonlinear elements for driving the pixel electrodes are arranged, for example, in a matrix on one of a pair of substrates sandwiching a liquid crystal layer therebetween.

0002

2. Description of the Related Art A conventional electro-optical device equipped with a nonlinear element as described above will be explained using a liquid crystal display device as an example.

FIG. 19 is a plan view of a part of a substrate on the side having a nonlinear element (hereinafter referred to as an element substrate) in a conventional liquid crystal display device of this type, and FIG. 20 is an enlarged cross-sectional view taken along line c-c in FIG. be. In the figure, 1 is a substrate, 2 is a first conductor made of Ta (tantalum) etc. provided on the substrate 1, 3 is an insulator made of TaOx (tantalum oxide) etc.
4 is a second conductor made of Cr (chromium) or the like, and 5 is a pixel electrode. The first conductor 2, the insulator 3 and the second
The conductor 4 constitutes a metal insulator metal (hereinafter abbreviated as MIM) as a nonlinear element 10 for driving a pixel (pixel electrode).

In particular, the illustrated MIM uses a so-called lateral MIM structure in which only the side surface of the first conductor 2 is used as the nonlinear element 10. That is, this lateral M
In the IM, as shown in FIG. 20, by covering the surface of the first conductor 2 constituting the nonlinear element other than the side surface with a thick insulator (hereinafter also referred to as a barrier layer) 3b, an insulator covering the side surface of the conductor is formed. It has a higher electrical resistance than 3a so that it does not function as a nonlinear element. By adopting such a structure, the area of the nonlinear element can be made extremely small, and this is an extremely effective technique for increasing the density and definition of a liquid crystal display device using MIM as a nonlinear element for pixels.

Next, an example of a manufacturing process for the above element substrate will be explained based on FIG. 21. A) First, the first conductor 2 is deposited on the transparent substrate 1 (
Figure 21(a)). B) The conductive film is formed by photoetching to form the first conductor 2 (FIG. 2(b)). C) An insulator 3 is deposited on the upper surface of the transparent substrate 1 including the first conductor 2 (FIG. 3(c)). D) Photoetching is performed to leave the insulator 3 on the surface of the first conductor 2 except for the side surfaces thereof to form a barrier layer 3b (FIG. 2(d)). E) An insulator 3a that will serve as an insulator for the nonlinear element is deposited on the side surface of the first conductor 2 (FIG. 3(e)). F) Next, the second conductor 4 and the pixel electrode 5 are respectively formed into films and formed by photo-etching (FIG. 1(f)).
).

First conductor 2 formed as described above
The overlapping portion of the insulator 3a and the second conductor 4 on the side surface constitutes the MIM as the nonlinear element 10. Note that the photoetching of the insulator 3 in the step D) above is performed as follows. In other words, (
In the state c), the first conductor 2 is an opaque film, and the insulator 3 is a transparent film. A positive resist (
If the transparent substrate is exposed to light from the back side and developed, only the resist on the first conductor 2 will remain. Thereafter, by etching the insulator 3, the shape shown in FIG. 2(d) is obtained.

In the case of a conventional liquid crystal display device, the number of photoetching processes is as follows. Once when forming the first conductor in step B), once when forming the insulator in step D), and forming the second conductor and pixel electrode in step F). Photo-etching is performed five times in total: twice at the time of photo-etching, and once when forming a contact hole by partially drilling the first insulator in step E). Four types of photomasks are required in this case. In addition, in the above-mentioned process, there is also a process in which after the first conductor 2 is deposited, the insulator 3 is successively deposited and photo-etched at the same time to obtain the shape shown in FIG. 20(d). In this case, the number of processes is four times of photoetching and three types of photomasks.

Well-known conductors 2 and 4 used in MIM elements include Ta, Al, Au, ITO, NiCr+Au, and ITO+Cr. Also, insulator 3
(3a) includes TaOx, SiOx, SiNx, S
iOxNy, TaNx, ZnOx, etc. are well known. These insulators (insulating films) are generally formed by thermal oxidation, anodic oxidation, sputtering, or the like. Furthermore, as the barrier layer 3b, in addition to the inorganic materials used for the above-mentioned insulators, it is also known to use an organic film such as polyimide. The most well-known structure of MIM elements is
Ta (tantalum) for the first conductor 2, TaO for the insulator 3
x (tantalum oxide), Cr (chromium) in the second conductor 4
It uses

[0009]

However, in the structure of the conventional liquid crystal display device shown in FIGS. 19 and 20, the liquid crystal deteriorates due to the DC component caused by the polarity difference of the MIM elements, making it difficult to use the liquid crystal display device. This had the problem that good image quality could not be obtained. Another major problem was that the reliability of the liquid crystal display device was low due to the deterioration of the liquid crystal. In particular, the polarity difference of the MIM element changes depending on the temperature, so there is a big problem that it cannot be controlled during driving. The present invention has been proposed in view of the above-mentioned problems, and an object of the present invention is to provide an electro-optical device with good image quality and high reliability by eliminating polarity differences between MIM elements.

0010

Means for Solving the Problems In order to achieve the above object, an electro-optical device according to the present invention has the following configuration.

That is, a plurality of pixel electrodes and nonlinear elements for driving each pixel electrode are arranged in a matrix on one of a pair of substrates sandwiching a liquid crystal layer. has a first conductor, an insulator formed on at least a side surface of the first conductor, and a second conductor, the first conductor, the insulator, and the second conductor. In an electro-optical device such as a liquid crystal display device in which the overlapping portion of the conductor has nonlinear current-voltage characteristics, each pixel electrode has at least two nonlinear elements connected thereto, and the first nonlinear element is connected to the pixel electrode. The path of the signal that passes through and is input to the pixel electrode includes at least the first conductor, the insulator,
The path of the signal that reaches the pixel electrode via the second conductor and is input to the pixel electrode via the second nonlinear element is at least the second conductor, the insulator, and the first conductor. It is characterized by being configured so as to reach the electrode.

0012

[Operation] As described above, each pixel electrode is provided with at least two nonlinear elements, and the path of the signal input to the pixel electrode through the first nonlinear element is formed by the first conductor, the insulator, and the first nonlinear element. The path of the signal that is input to the pixel electrode via the second conductor, passes through the second nonlinear element, and reaches the pixel electrode via the second conductor, the insulator, and the first conductor. By doing so, it becomes possible to eliminate the polarity difference.

Note that the insulator constituting each of the above-mentioned nonlinear elements may be a so-called lateral MIM that utilizes an insulator formed on the side surface of the first conductor, or something else. More preferably, the area of the first nonlinear element and the area of the second nonlinear element are made equal. Furthermore, the second conductor and the pixel electrode may be made of the same conductor. In addition, the path of the signal input to the pixel electrode through the first nonlinear element includes a portion that reaches the pixel electrode via the first conductor, an insulator, and a second conductor, and a portion that passes through the first conductor, an insulator, and a second conductor. , an insulator, a second conductor, an insulator,
It branches into a portion that passes through the first conductor and reaches the pixel electrode. Alternatively, the path of the signal input to the pixel electrode through the first nonlinear element includes a portion that passes through the first conductor, an insulator, and a second conductor to the pixel electrode, and a portion that passes through the first conductor, the insulator, and the pixel electrode. body,
The same effect as described above can be obtained even if the structure is branched into a portion reaching the pixel electrode via the second conductor and the first conductor. Further, the path of the signal input to the pixel electrode through the first nonlinear element includes a first conductor, an insulator, a second conductor, and the first conductor and the second conductor. The path of the signal that reaches the pixel electrode via the contact hole between and the first conductor, passes through the second nonlinear element, and is input to the pixel electrode is as follows:
The pixel electrode may be reached through a first conductor, a contact hole between the first conductor and the second conductor, the second conductor, an insulator, and the first conductor. good. Furthermore, it is also possible to connect the first nonlinear element and the second nonlinear element in series.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The electro-optical device according to the present invention will be specifically explained below based on the illustrated embodiment in which it is applied to a liquid crystal display device. In addition, in the following examples, FIG. 19 and FIG.
Components having the same functions as those in the conventional example will be described with the same reference numerals.

In the following embodiments, Ta is used as the first conductor 2, Cr is used as the second conductor 4, and insulators including the insulator 3a and barrier layer 3b constituting the nonlinear element are used. TaOx is used for the pixel electrode 3, and ITO is used for the pixel electrode 5, but the present invention is not limited thereto, and various conventionally known materials mentioned above can be used. Further, the insulator 3a and barrier layer 3b constituting the above-mentioned nonlinear element may be formed of different materials.

FIG. 1 is a plan view of an element substrate showing an embodiment of a liquid crystal display device according to the present invention, and FIGS. 2(a) and 2(b) are enlarged sectional views taken along lines aa and bb in FIG. 1, respectively. It is. In this embodiment, the part indicated by 101 in FIG. 2(a) and the part indicated by 102 in FIG. 2(b) are:
They are first and second nonlinear elements (MIM elements), respectively, and the signal paths passing through each of the nonlinear elements 101 and 102 are as follows. In the case of the first nonlinear element 101, a signal input to the second conductor 4 enters the first conductor 2 through the contact hole 11, and the signal is transmitted to the first conductor 2 and the insulator 3a on the side thereof. and the second
The voltage is applied to the pixel electrode 5 through the first nonlinear element 101 composed of the conductor 4 and the conductor 4 . Second nonlinear element 102
In this case, the signal input to the second conductor 4 is non-linear, which is composed of the second conductor 4, the insulator 3a, and the first conductor 21 independent of the first conductor 2. It is applied to the pixel electrode 5 through the element 102.

With the above structure, the nonlinear element 1
01 and 102 are connected to the pixel electrode 5 in directions that cancel out their polarity differences. In this case, if the areas of the first nonlinear element 101 and the second nonlinear element 102 are set to be the same, it is possible to completely eliminate the polarity difference.

The manufacturing process of the element substrate constructed as described above is almost the same as that of the conventional example shown in FIG. In this case, after the first conductor 2 is deposited, the insulator 3 is successively deposited and photo-etched at the same time to obtain a predetermined shape as shown in FIG. 20(d). This is the same as in the conventional case. In the conventional case, the barrier layer 3b is partially etched to form a contact hole to the first conductor 2 in a photo-etching step, and the first conductor 2 is etched away. In the case of the present invention, the first conductor 2 is completely removed by etching in a similar process. In this case, (b
), the contact between the first conductor 2 and the second conductor 4 is made using the side surface of the first conductor 2. At this time, a contact surface 12 with the pixel electrode 5 of the first conductor 21, which is an independent part of the first conductor 2 forming the second nonlinear element 102 in FIG. 2(b), is formed at the same time. . Similar to the contact hole 11, the first conductor 21
Contact with the pixel electrode 5 is made on the side surface of the pixel electrode 5. The specific manufacturing process of the contact structure as described above is almost the same as that of the embodiments shown in FIGS. 3 and 5, which will be described later, and the details will be described later.

FIG. 3 is a plan view of an element substrate showing a modification of the above embodiment, and FIGS. 4(a) and 4(b) are enlarged sectional views taken along lines aa and bb in FIG. 3, respectively. The side surface of the first conductor 2 of the portion constituting the first nonlinear element 101 and the second
The first conductor 21 of the part constituting the nonlinear element 102 of
In order to make the condition of the side surface of the first conductor 2 the same for the etching of the first conductor 2 and the etching of the barrier layer 3b, and to make it easier to control the shape (tapered shape) of each side surface, the first conductor 2 Also, a first conductor 22 independent of the first conductor 21 is provided.

The path of the signal passing through the first nonlinear element 101 is such that the signal input to the second conductor 4 enters the first conductor 2 through the contact hole 11, and
and an insulator 3a and a second conductor 4 formed on the side surfaces thereof.
After passing through the first nonlinear element 101 composed of
The signal is branched at a branch point 13 into a path where the voltage is directly applied to the pixel electrode 5 and a path where the voltage is applied to the pixel electrode 5 via the first conductor 22 . Second nonlinear element 102
A signal input to the second conductor 4 passes through the second conductor 4, the insulator 3a, and the first conductor 2.
1 and is applied to the pixel electrode 5 through the second nonlinear element 102 . The manufacturing process of the above element substrate is the same as that of the previous embodiment, and the process load is the same as in the prior art.

FIG. 5 is a plan view of an element substrate showing another modification, and FIGS. 6(a) and 6(b) are a-a in FIG. 5, respectively.
- It is an enlarged sectional view taken along the line bb. In this example, instead of separately providing the independent first conductor 22 in FIG. 3, the first conductor 21 on the second nonlinear element 102 side is extended and used as the conductor 22. There are advantages such as being able to increase the area of the contact surface 12 between the conductor 21 of 1 and the pixel electrode 5.

The path of the signal passing through the first nonlinear element 101 is such that the signal input to the second conductor 4 enters the first conductor 2 through the contact hole 11, and
The first conductor 4 is composed of an insulator 3a and a second conductor 4.
After passing through the nonlinear element 101, it is applied to the pixel electrode 5 via a path where it is applied directly to the pixel electrode 5, an insulator 3a used for the second nonlinear element 102, and the first conductor 21. The route branches at branch point 13. The signal path passing through the second nonlinear element 102 is such that the signal input to the second conductor 4 passes through the second conductor 4 and the insulator 3a.
and the first conductor 2, and is applied to the pixel electrode 5 through the second nonlinear element 102.

In this example as well, the manufacturing process of the element substrate is the same as that in the example shown in FIG. 1, and the process load is the same as in the prior art.

Here, a specific manufacturing process will be explained in order based on FIGS. 7 to 10 using the element substrate having the structure shown in FIG. 5 as an example. FIG. 7 shows a state in which the first conductor 2 is formed. After forming the insulator 3 (barrier layer 3b) in FIG. 8, the insulator 3a constituting the nonlinear element is transferred to the first conductor 2
form on the side. The insulator 3a is formed by anodic oxidation, thermal oxidation, or the like, but when performing anodic oxidation, the portion of the first conductor 2 where the insulator 3a is formed needs to be electrically connected. The portion indicated by the broken line in FIG. 8 is extracted by photoetching to form the contact hole 11 and the contact surface 12 of the second nonlinear element 102. FIG. 9 shows the state after the above etching. Here, the first conductor 21 of the second nonlinear element 102 is formed. FIG. 10 shows a state in which the second conductor 4 and the pixel electrode 5 are formed.

As described above, even if the structure according to each of the above embodiments is used, the load of the manufacturing process is the same as in the case of the conventional structure, with 5 photoetching steps and 4 types of photomasks.

FIG. 11 is a plan view of an element substrate showing a modification of FIG. 5, and FIGS. 12(a) and 12(b) are enlarged sectional views taken along lines aa and bb in FIG. 11, respectively. This example uses the first non-wire diameter element 101 and the conductor 2 in the embodiment shown in FIG.
The second conductor 4 between the pixel electrode 1 and the pixel electrode 5, and the second conductor 4 on the conductor 2 if necessary, are made of the same conductor as the pixel electrode 5. Especially in liquid crystal display devices, pixel electrodes are required to be transparent films, so
In this embodiment, like the pixel electrode 5 in the previous embodiment, I
It is formed by TO. For example, in a reflective liquid crystal display device, a metal with high reflectivity such as Cr, Al, Ta, or Au may be used. Also, a second conductor 4 between the first non-wire diameter element 101 and the conductor 21
and the second conductor 4 on the conductor 2 may be formed of different materials.

Normally, the nonlinear element (MIM element) as described above uses Ta, TaOx, and Cr as the first conductor and insulator, and the second conductor, respectively, and Ta, TaOx, When compared with a nonlinear element using ITO, the latter nonlinear element has a larger polarity difference than the former and is not practical. However, if the structure is as in the above embodiment, the polarity difference can be canceled out. Furthermore, by using the pixel electrode as the second conductor as described above, the load on the manufacturing process can be reduced compared to the conventional structure. In fact, in this embodiment, photoetching is performed four times and the number of photomasks is three.

FIG. 13 is a plan view of an element substrate showing another embodiment of the present invention, and FIGS. 14(a) and 14(b) are enlarged sectional views taken along lines c-a and c-b in FIG. 13, respectively. Figure 14 (a
) and the portion 102 in FIG. 14(b) are the first nonlinear element and the second nonlinear element, respectively. Respective nonlinear elements 101 and 10
The signal path passing through 2 is as follows. In the case of the first nonlinear element 101, the signal input to the first conductor 2 is transmitted to the first nonlinear element composed of the first conductor 2, the insulator 3a, and the second conductor 4. Pass through 101,
The light enters the first conductor 21 through the contact hole 11 and is input to the pixel electrode 5 through the contact surface 12 . In the case of the second nonlinear element 102, a signal input to the first conductor 2 enters the second conductor 4 through the contact hole 11, and the signal is input to the second conductor 4, the insulator 3a, and the first conductor 4. It passes through the second nonlinear element 102 composed of a conductor 21 and is inputted to the pixel electrode 5 via the contact surface 12.

By configuring this embodiment as described above, the signal paths in the portion excluding the nonlinear element are also made to be the same between the first nonlinear element 101 and the second nonlinear element 102. be. Therefore, it is possible to eliminate the polarity difference of the nonlinear element including the resistance of the contact hole 11 and the contact surface 12. This is particularly effective when each contact resistance has a nonignorably large resistance value compared to the nonlinear element. Note that in this example as well,
The pixel electrode 5 and the second conductor 4 may be formed of the same conductive material, such as ITO or an extremely thin film of metal.

FIG. 15 shows a modification of the above embodiment, whose planar shape is approximately the same as that of FIG.
(a) and (b) respectively show enlarged cross-sectional views taken along lines c-a and c-b in FIG. 13, similar to (a) and (b) in FIG. In this example, the contact hole 11 and the contact portion of the contact surface 12 in FIGS. 13 and 14 are not made on the side surface of the first conductor 21, but are made on the upper surface of the first conductor 21. Although this method increases the number of photomasks for photoetching, it is effective in reducing contact resistance.

Furthermore, as a process that does not increase the number of photomasks, the contact and the first conductor 2 shown by the broken line in FIG. 8 may be removed simultaneously by utilizing the difference in etching rate depending on the resist density. It is possible. The contact hole 11 has a smaller area than the broken line portion. This means that the peripheral resist density is high relative to the area of the etched portion. When the above-mentioned etching is performed by dry etching in which the resist is etched at the same time, the etching rate is particularly influenced by the resist density. For a contact hole or the like where the resist density is relatively high, the etching rate can be made relatively slower than the area shown by the broken line. It is also possible to perform etching at the same time and completely remove the broken line portion while leaving the first conductor in the contact hole portion. In this case, the contact resistance of the contact hole can be reduced without increasing the number of photomasks.

FIG. 16 shows an embodiment for increasing the area of the pixel electrode 5 in FIG. 13. In the case of the embodiment shown in FIG. 13, four contact holes 11 are required for two pixels, but by making the contact holes on the first conductor 2 of adjacent pixels common, The number of contact holes 11 is three. With the above configuration, the total number of contact holes can be reduced to three-fourths, so defects caused by contact holes can also be reduced. In this case, it is desirable that adjacent pixels sharing a common contact hole do not receive selection signals at the same time. That is, when one pixel is selected, it is desirable that the other pixel be in a non-selected state.

Although the nonlinear elements were connected in parallel in the above embodiments, they may also be connected in series. FIG. 17 is a plan view of an element substrate showing an embodiment in which two types of nonlinear elements are connected in series. 18 is an enlarged sectional view taken along the line c-c in FIG. 17. The signal path in this embodiment starts from the second conductor 4 on the left side in FIG. 101, and is input to the pixel electrode 5 via the second nonlinear element 102, which is composed of the first conductor 21, the insulator 3a, and the second conductor 4. The same effect can be obtained even if the second conductor and the first conductor are exchanged.

Note that each of the above embodiments is a so-called lateral M.
Although IM is illustrated, the present invention is not limited to this, and can be applied not only to liquid crystal display devices but also to various other liquid crystal devices and other electro-optical devices.

[0035]

As described above, the electro-optical device according to the present invention includes at least two nonlinear elements connected to each pixel electrode, and the first nonlinear element is configured to handle signals input to the pixel electrode. The path of the signal that is input to the pixel electrode reaches the pixel electrode via the first conductor, the insulator, and the second conductor. Since the pixel electrode is reached through the conductor, insulator, and first conductor, it is possible to eliminate polarity differences in nonlinear elements, which improves image quality and reliability in electro-optical devices such as liquid crystal displays. It is possible to significantly improve the performance. Further, the manufacturing process is simplified and manufacturing costs can be reduced.

[Brief explanation of the drawing]

FIG. 1 is a plan view of an element substrate showing an embodiment of an electro-optical device according to the present invention.

FIG. 2(a) is an enlarged sectional view taken along line a-a in FIG. 1; (b) is an enlarged sectional view taken along line bb in FIG. 1.

FIG. 3 is a plan view of an element substrate showing a modification of the embodiment in FIG. 1;

FIG. 4(a) is an enlarged sectional view taken along line a-a in FIG. 3; (b) is an enlarged sectional view taken along the line bb in FIG. 3.

FIG. 5 is a plan view of an element substrate showing a modification of the embodiment shown in FIG. 3;

FIG. 6(a) is an enlarged sectional view taken along line a-a in FIG. 5; (b) is an enlarged sectional view taken along line bb in FIG. 5.

FIG. 7 is an explanatory diagram showing the manufacturing process of an element substrate in the electro-optical device of the present invention.

FIG. 8 is an explanatory diagram showing the manufacturing process of an element substrate in the electro-optical device of the present invention.

FIG. 9 is an explanatory diagram showing the manufacturing process of the element substrate in the electro-optical device of the present invention.

FIG. 10 is an explanatory diagram showing the manufacturing process of an element substrate in the electro-optical device of the present invention.

FIG. 11 is a plan view of an element substrate showing a modification of the embodiment shown in FIG. 5;

12(a) is an enlarged sectional view taken along line a-a in FIG. 11. FIG. (b) is an enlarged sectional view taken along line bb in FIG. 11.

FIG. 13 is a plan view of an element substrate showing another embodiment of the electro-optical device according to the present invention.

14(a) is an enlarged cross-sectional view taken along line c-a in FIG. 13. FIG. (b) is an enlarged sectional view taken along line c-b in FIG. 13.

15(a) is an enlarged sectional view taken along the line c-a in FIG. 13 showing a modification of FIG. 14; (b) is an enlarged sectional view taken along line c-b in FIG. 13 showing a modification of FIG. 14.

FIG. 16 is a plan view of an element substrate showing another embodiment of the electro-optical device according to the present invention.

FIG. 17 is a plan view of an element substrate showing still another embodiment of the electro-optical device according to the present invention.

FIG. 18 is an enlarged sectional view taken along line c-c in FIG. 17;

FIG. 19 is a plan view of an element substrate in a conventional electro-optical device.

FIG. 20 is an enlarged sectional view taken along line c-c in FIG. 19;

FIG. 21 is an explanatory diagram showing a manufacturing process of an element substrate in a conventional electro-optical device.

[Explanation of symbols]

1 Board 2, 21, 22 First conductor 3 Insulator 4 Second conductor 5 Pixel electrode 11 Contact hole 12 Contact surface 13 Branching point 101 First nonlinear element 102 Second nonlinear element

Claims (8)

[Claims] 1. A plurality of pixel electrodes and a nonlinear element for driving each pixel electrode are arranged on one substrate of a pair of substrates sandwiching a liquid crystal layer, and the nonlinear element
a conductor, an insulator, and a second conductor,
In an electro-optical device such as a liquid crystal display device in which the overlapping portion of the first conductor, insulator, and second conductor has nonlinear current-voltage characteristics, each pixel electrode is a nonlinear element connected thereto. The path of the signal input to the pixel electrode through the first nonlinear element is at least the first conductor, the insulator, the second conductor, and the pixel electrode. The path of the signal input to the pixel electrode through the second nonlinear element is configured to reach the pixel electrode via at least the second conductor, the insulator, and the first conductor. electro-optical device. 2. The electro-optical device according to claim 1, wherein the insulator is formed on at least a side surface of the first conductor, and the insulator formed on the side surface of the conductor constitutes a nonlinear element. 3. The area of the first nonlinear element, and the area of the second nonlinear element.
Claim 1 characterized in that the areas of the nonlinear elements are equal.
The electro-optical device described. 4. The electro-optical device according to claim 1, wherein the second conductor and the pixel electrode are the same conductor. 5. The path of the signal input to the pixel electrode through the first nonlinear element includes a first conductor, an insulator,
It branches into a part that goes through the second conductor to the pixel electrode, and a part that goes through the first conductor, insulator, second conductor, insulator, and first conductor to the pixel electrode. The electro-optical device according to claim 1, characterized in that: 6. The path of the signal input to the pixel electrode through the first nonlinear element includes a first conductor, an insulator,
It is characterized by branching into a part that goes through the second conductor to the pixel electrode, and a part that goes through the first conductor, insulator, second conductor, and first conductor to the pixel electrode. Claim 1
The electro-optical device described. 7. The path of the signal input to the pixel electrode through the first nonlinear element includes a first conductor, an insulator,
A second conductor, a contact hole between the first conductor and the second conductor, a signal that passes through the first conductor to the pixel electrode, passes through the second nonlinear element, and is input to the pixel electrode. The path is configured to reach the pixel electrode via the first conductor, the contact hole between the first conductor and the second conductor, the second conductor, the insulator, and the first conductor. The electro-optical device according to claim 1, characterized in that: 8. Claim 1, wherein the first nonlinear element and the second nonlinear element are connected in series.
The electro-optical device described.