JPH04236367A - Apparatus for inspecting substrate - Google Patents

Apparatus for inspecting substrate

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Publication number
JPH04236367A
JPH04236367A JP3004934A JP493491A JPH04236367A JP H04236367 A JPH04236367 A JP H04236367A JP 3004934 A JP3004934 A JP 3004934A JP 493491 A JP493491 A JP 493491A JP H04236367 A JPH04236367 A JP H04236367A
Authority
JP
Japan
Prior art keywords
laser beam
substrate
pattern
electrode plate
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3004934A
Other languages
Japanese (ja)
Other versions
JP2730295B2 (en
Inventor
Akio Ukita
浮田明生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3004934A priority Critical patent/JP2730295B2/en
Publication of JPH04236367A publication Critical patent/JPH04236367A/en
Application granted granted Critical
Publication of JP2730295B2 publication Critical patent/JP2730295B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)

Abstract

PURPOSE:To inspect continuity and disconnection without damaging the metal wiring pattern on a substrate to be measured by the use of laser beam. CONSTITUTION:The terminal part of the pattern 11 on a substrate 3 is irradiated with laser beam. When a transparent electrode plate 1 is set to voltage V1 by a power supply 6, the part irradiated with laser beam of a sheet 2 composed of a photoconductive material becomes a continuity state and the pattern 11 becomes V1. After the laser beam is cut off, the power supply 6 is changed over to set the transparent electrode plate 1 to V2. Herein, when the separate terminal of the pattern 11 is irradiated with laser beam, the charge corresponding to (V1-V2) flows when a continuity state is obtained across the terminals and can be detected by an ammeter 5 but, at the time of disconnection, no current flows and the continuity and disconnection of the pattern are judged.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は基板検査装置、特に、絶
縁基板上に形成された金属配線パンーンの良否の検査に
使用する基板検査装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate inspection apparatus, and more particularly to a substrate inspection apparatus used for inspecting the quality of metal wiring panns formed on an insulating substrate.

【0002】0002

【従来の技術】図3は従来の第1の例を示すブロック図
である。図3に示す基板検査装置は、抵抗計13と、金
属配線パターン11(以下パターンとする)に接触する
2本のプローブ15と、前記プローブの位置ぎめ部14
と、前記抵抗計、プローブ、位置ぎめ部を制御する制御
部7とを含んで構成されている。
2. Description of the Related Art FIG. 3 is a block diagram showing a first conventional example. The board inspection apparatus shown in FIG.
and a control section 7 that controls the resistance meter, probe, and positioning section.

【0003】この装置は任意のパターンの2端子間の導
通、非導通の検査を行う。任意のパターンに対して、位
置ぎめ部14を用いて、プローブ15を位置ぎめし、2
端子にプローブを接触させて抵抗値を測定し、パターン
の2端子間の導通、被導通を判定している。予め制御部
17に記憶した順序で、位置ぎめ部により、プローブを
順次移動し、全てのパターンの検査を行う。
[0003] This device tests continuity and non-continuity between two terminals in an arbitrary pattern. Position the probe 15 using the positioning unit 14 for an arbitrary pattern, and
A probe is brought into contact with the terminal and the resistance value is measured to determine whether or not there is continuity between the two terminals of the pattern. The probes are sequentially moved by the positioning section in the order stored in the control section 17 in advance, and all patterns are inspected.

【0004】図4は従来の第2の例を示すブロック図で
ある。図4に示す基板検査装置は、静電容量計122と
、金属配線パターン115(以下パターンとする)に接
触するプローブ123と、前記プローブの位置ぎめ部1
21と、前記静電容量計、プローブ、位置ぎめ部を制御
する制御部117とを含んで構成されている。
FIG. 4 is a block diagram showing a second conventional example. The board inspection apparatus shown in FIG.
21, and a control section 117 that controls the capacitance meter, the probe, and the positioning section.

【0005】プローブ123で任意のパターンを選択し
、プローブ123と基準電位面104(接地電位面)と
の間の静電容量を測定し、理論的に計算した値と比較し
てパターンの良否を判定している。被測定パターンと基
準電位面の間の等価回路は、図5のように表すことが出
来る。被測定パターンと基準電位面間の静電容量120
及び絶縁抵抗119のほかに、他のパターンの静電容量
118とパターン間の絶縁抵抗121との直列接続回路
が並列に接続されている。
Select an arbitrary pattern using the probe 123, measure the capacitance between the probe 123 and the reference potential surface 104 (ground potential surface), and compare it with a theoretically calculated value to determine whether the pattern is good or not. Judging. The equivalent circuit between the pattern to be measured and the reference potential plane can be expressed as shown in FIG. Capacitance between the pattern to be measured and the reference potential surface 120
In addition to the insulation resistance 119, a series connection circuit of the capacitance 118 of another pattern and the insulation resistance 121 between the patterns is connected in parallel.

【0006】被測定パターンが正常な場合、絶縁抵抗1
21及び絶縁抵抗119は共に充分大きいので、静電容
量計による測定値は静電容量115とほぼ等しいが、パ
ターンに不良がある場合は、測定値は静電容量120と
は違った値となる。例えば、パターンが途中で断線して
いる場合には、静電容量120より小さい測定値が得ら
れ、パターンが他のパターンと絶縁不良または短絡を起
こしている場合は、静電容量120より大きい測定値と
なる。そこで、理論的に計算した静電容量値が一定レベ
ル以上異なる場合には、パターンに不良があると判定す
ることが出来る。
When the pattern to be measured is normal, the insulation resistance 1
21 and insulation resistance 119 are both sufficiently large, the value measured by the capacitance meter is almost equal to the capacitance 115, but if there is a defect in the pattern, the measured value will be a value different from the capacitance 120. . For example, if a pattern is broken in the middle, a measurement value smaller than 120 will be obtained, and if the pattern has poor insulation or short circuit with another pattern, a measurement value larger than 120 will be obtained. value. Therefore, if the theoretically calculated capacitance values differ by more than a certain level, it can be determined that the pattern is defective.

【0007】[0007]

【発明が解決しようとする課題】上述した従来の基板検
査装置は、パターンに、プローブを接触させて抵抗値あ
るいは静電容量を測定している。プローブの先端は、尖
っているので、プローブを接触する際にパターンを損傷
するという欠点がある。
SUMMARY OF THE INVENTION The conventional board inspection apparatus described above measures the resistance value or capacitance by bringing a probe into contact with the pattern. Since the tip of the probe is sharp, there is a drawback that the pattern may be damaged when the probe is brought into contact.

【0008】[0008]

【課題を解決するための手段】第1の発明の基板検査装
置は、被測定基板上の金属配線パターンに照射されるレ
ーザビームを発生するレーザ装置と、前記被測定基板の
レーザビームが当たる面に密着させる光導電静材料のシ
ート、および透明電極板と、前記被検査基板のレーザビ
ームが当たらない面に密着される電極板と、前記電極板
で挟んだ被検査基板を縦横方向に送る手段またはレーザ
ビームを走査する手段と、前記透明電極板に接続される
電流計および電源と、前記レーザ装置、基板を縦横方向
に送る手段またはレーザビームを走査する手段、電流計
、および電源を制御する制御部とを含んで構成される。
[Means for Solving the Problems] A board inspection apparatus according to a first aspect of the invention includes a laser device that generates a laser beam that is irradiated onto a metal wiring pattern on a board to be measured, and a surface of the board to be measured that is hit by the laser beam. a sheet of photoconductive electrostatic material that is brought into close contact with the substrate, a transparent electrode plate, an electrode plate that is brought into close contact with a surface of the substrate to be inspected that is not irradiated with the laser beam, and means for vertically and horizontally transporting the substrate to be inspected sandwiched between the electrode plates. or a means for scanning a laser beam, an ammeter and a power source connected to the transparent electrode plate, and a means for sending the laser device and the substrate in the vertical and horizontal directions, or a means for scanning the laser beam, an ammeter, and a power source. The control unit is configured to include a control unit.

【0009】第2の発明の基板検査装置は、被測定基板
上の金属配線パターンに照射されるレーザビームと、前
記被測定基板のレーザビームが当たる面に密着させる光
導電性材料のシート、および透明電極板と、前記被検査
基板のレーザビームが当たらない面に密着される電極板
と、前記電極板で挟んだ被検査基板を縦横方向に送る手
段または前記レーザビームを被測定基板上で走査する手
段と、前記透明電極板に接続される電流計および電源と
、前記レーザビームを被測定基板上に収束する光学系と
、前記レーザビームを継続するシャッタと、前記基板を
縦横方向に送る手段またはレーザビームを走査する手段
、電流計、電源、およびシャッタを制御する制御部とを
含んで構成される。
The board inspection device of the second invention includes a laser beam irradiated onto a metal wiring pattern on a substrate to be measured, a sheet of photoconductive material that is brought into close contact with a surface of the substrate to be measured that is hit by the laser beam, and A transparent electrode plate, an electrode plate that is closely attached to a surface of the substrate to be inspected that is not hit by the laser beam, and means for vertically and horizontally feeding the substrate to be inspected sandwiched between the electrode plates, or scanning the laser beam on the substrate to be measured. an ammeter and a power source connected to the transparent electrode plate; an optical system that focuses the laser beam onto the substrate to be measured; a shutter that continues the laser beam; and a means for sending the substrate in the vertical and horizontal directions. Alternatively, it is configured to include means for scanning a laser beam, an ammeter, a power supply, and a control section for controlling a shutter.

【0010】0010

【実施例】次に本発明について、図面を参照して詳細に
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained in detail with reference to the drawings.

【0011】図1は本発明の第1の実施例を示すブロッ
ク図である。図1に示す基板検査装置は、基板3上に密
着される、光導電性材料のシート2と、シート2に重ね
られる、透明電極板1と、基板3の裏側に密着される電
極板4と、基板3を電極1、4で挟んだものをセットす
るX−Yステージ9と、前記電極版で挟まれた被検査基
板をX−Yステージ上に保持する保持具10と、前記X
−Yステージを制御するシテージ制御部8と、基板3上
に照射されるレーザビームを発生するレーザ装置12と
、電極板1に流れる電流を測定する電流計5と、電極板
1に電圧を印加する電源6とこれらを制御する制御部7
とを備えて構成されている。
FIG. 1 is a block diagram showing a first embodiment of the present invention. The substrate inspection apparatus shown in FIG. 1 includes a sheet 2 of photoconductive material that is closely attached to a substrate 3, a transparent electrode plate 1 that is overlapped with the sheet 2, and an electrode plate 4 that is closely attached to the back side of the substrate 3. , an X-Y stage 9 for setting the substrate 3 sandwiched between the electrodes 1 and 4, a holder 10 for holding the substrate to be inspected sandwiched between the electrode plates on the X-Y stage, and the
- A stage control unit 8 that controls the Y stage, a laser device 12 that generates a laser beam that is irradiated onto the substrate 3, an ammeter 5 that measures the current flowing through the electrode plate 1, and a voltage that is applied to the electrode plate 1. A power source 6 to control the power source 6 and a control unit 7 to control the power source 6 and the control unit 7 to control the power source 6
It is composed of:

【0012】このうち光導電性材料のシートは、たとえ
ば、電子写真技術を応用した複写機で用いられているも
のを使用する。電極板4は電気的に接地され、基準電位
面として働く。
Among these, the sheet of photoconductive material used is, for example, one used in a copying machine to which electrophotographic technology is applied. The electrode plate 4 is electrically grounded and serves as a reference potential surface.

【0013】つぎにパターンを検査する時の手順につい
て説明する。先ずX−Yステージを制御してレーザビー
ムが検査対象のパターン11の端子部の片方に選択的に
照射されるようにする。すると光導電材料のシートのう
ち、レーザビームの当たった部分の電気抵抗が低くなる
ので、電極板1とパターン15の導通がとれる。この状
態で、電源6の電圧を一定の電圧V1に設定し、電極板
1の電圧をV1とする。パターン15は電極板1と導通
しているので、パターン15は電圧V1に帯電される。 この時のパターン15の帯電量は、基準電位面として働
く電極板4とパターン11の間の静電容量(以下パター
ン11の静電容量とする)と電圧V1の積である。
Next, the procedure for inspecting a pattern will be explained. First, the X-Y stage is controlled so that the laser beam is selectively irradiated onto one side of the terminal portion of the pattern 11 to be inspected. Then, the electrical resistance of the portion of the photoconductive material sheet that is hit by the laser beam decreases, so that the electrode plate 1 and the pattern 15 can be electrically connected. In this state, the voltage of the power source 6 is set to a constant voltage V1, and the voltage of the electrode plate 1 is set to V1. Since the pattern 15 is electrically connected to the electrode plate 1, the pattern 15 is charged to the voltage V1. The amount of charge on the pattern 15 at this time is the product of the capacitance between the electrode plate 4 and the pattern 11 (hereinafter referred to as capacitance of the pattern 11) serving as a reference potential surface and the voltage V1.

【0014】パターン15が充分に帯電したら、レーザ
ビームの照射を止める。すると、パターン15と電極板
1の導通が取れなくなる。この状態で、電源6の電圧を
V1とは違うV2に設定する。するとV1に帯電してい
た電極板1が充放電し、V2の電位になる。
When the pattern 15 is sufficiently charged, the laser beam irradiation is stopped. Then, the pattern 15 and the electrode plate 1 cannot be electrically connected. In this state, the voltage of the power supply 6 is set to V2, which is different from V1. Then, the electrode plate 1, which had been charged to V1, is charged and discharged and reaches a potential of V2.

【0015】次に、X−Yステージを制御して、レーザ
ビームがパターン11の他方の端子に当たる位置まで基
板を移動して、レーザビームを再び照射する。もしパタ
ーン11の二つの端子間が導通していたら、今回レーザ
ビームを当てている端子もV1に帯電しているので、レ
ーザビームの照射により、V2の電位になるまで充放電
する。この時流れる電流は、電流計5を通して、電源6
に流れ込むので、電流計5をよむことにより、パターン
11の放電が判る。一方パターン11のふたつの端子間
が断線を起こしている場合は、今回レーザビームを当て
ている端子はV1に帯電していないので、電流が流れな
い。このことにより、パターン11の導通、非導通を判
定することが出来る。
Next, by controlling the X-Y stage, the substrate is moved to a position where the laser beam hits the other terminal of the pattern 11, and the laser beam is irradiated again. If there is continuity between the two terminals of the pattern 11, the terminal to which the laser beam is irradiated will also be charged to V1, and will be charged and discharged to a potential of V2 by the laser beam irradiation. The current flowing at this time is passed through the ammeter 5 to the power source 6.
Therefore, by reading the ammeter 5, the discharge of the pattern 11 can be determined. On the other hand, if there is a disconnection between the two terminals of the pattern 11, the terminal to which the laser beam is applied this time is not charged to V1, so no current flows. By this, it is possible to determine whether the pattern 11 is conductive or non-conductive.

【0016】なお基板中のパターンを次々に検査してい
くためには、レーザビームを次々に、検査するパターン
に位置決めする必要がある。本実施例では、基板をX−
Yステージにより縦横方向に移動してこれを行っている
。本実施例では示していないが、このほか基板は固定し
てレーザビームを縦横方向に走査する方法でも構わない
。また本実施例では、電流計5を電極1と電極6の間に
接続しているが、これを電極4の接地線に挿入しても、
上記手順により検査を行うことが出来る。
[0016] In order to inspect the patterns on the substrate one after another, it is necessary to position the laser beams one after another on the patterns to be inspected. In this example, the substrate is
This is done by moving vertically and horizontally using a Y stage. Although not shown in this embodiment, another method may be used in which the substrate is fixed and the laser beam is scanned in the vertical and horizontal directions. Furthermore, in this embodiment, the ammeter 5 is connected between the electrodes 1 and 6, but even if it is inserted into the ground wire of the electrode 4,
Inspection can be performed by the above procedure.

【0017】図2は本発明の第2の実施例を示すブロッ
ク図である。
FIG. 2 is a block diagram showing a second embodiment of the present invention.

【0018】図2に示す基板検査装置は、基板103上
に密着される光導電性材料のシート102と、シート1
02に重ねられる透明電極板101と、基板103の裏
側に密着される電極板104と、基板104を電極10
1,104で挟んだものを横方向に送るローラー108
,109と、基板103上に照射されるレーザビームを
発生する光源112とレーザビームを収束する光学系1
16と、レーザビームを継続するシャッタ113と、レ
ーザビームを基板103上で走査するための反射鏡11
0およびこれを回転するモータ111と、電極板101
に流れる電流を測定する電流計105と、電極板101
に電圧を印加する電源106とこれらを制御する制御部
107とを備えて構成されている。
The substrate inspection apparatus shown in FIG.
02, an electrode plate 104 that is closely attached to the back side of the substrate 103, and the substrate 104 is
Roller 108 that sends the object sandwiched between 1 and 104 in the horizontal direction
, 109, a light source 112 that generates a laser beam to be irradiated onto the substrate 103, and an optical system 1 that focuses the laser beam.
16, a shutter 113 for continuing the laser beam, and a reflecting mirror 11 for scanning the laser beam on the substrate 103.
0, a motor 111 that rotates it, and an electrode plate 101
an ammeter 105 that measures the current flowing through the electrode plate 101;
The power source 106 applies a voltage to the power source 106, and the control section 107 controls the power source 106 and the control section 107.

【0019】このうち光導電性材料のシートは、たとえ
ば、電子写真技術を応用した複写機で用いられているも
のを使用する。電極板104は電気的に接地され、基準
電位面として働く。電極板101,104への配線は、
直接半田づけ等により接続してもかまわないが、ローラ
ー108,109の回転により、電極板自身が移動し、
配線を引きずるので、本実施例では、配線をローラー1
08,109に施し、ローラーを金属等の導電性材質で
構成することにより、電極板への電気的接地を行ってい
る。
Among these, the sheet of photoconductive material used is, for example, one used in a copying machine to which electrophotographic technology is applied. Electrode plate 104 is electrically grounded and serves as a reference potential surface. The wiring to the electrode plates 101 and 104 is as follows:
Although the connection may be made by direct soldering, etc., the electrode plate itself moves due to the rotation of the rollers 108 and 109.
Since the wiring is dragged, in this example, the wiring is
08 and 109, and the roller is made of a conductive material such as metal, thereby electrically grounding the electrode plate.

【0020】つぎにパターンを検査する時の手順につい
て説明する。先ず反射鏡110の角度を制御してレーザ
ビームを検査対象のパターン115に選択的に照射する
。すると光導電材料のシートのうち、レーザビームの当
たった部分の電気抵抗が低くなるので、電極板101と
パターン115の導通がとれる。この状態で、電源10
6の電圧を一定の電圧V1に設定し、電極板101の電
圧をV1とする。パターン115は電極板101と導通
しているので、パターン115は電圧V1に帯電される
Next, the procedure for inspecting a pattern will be explained. First, the angle of the reflecting mirror 110 is controlled to selectively irradiate the pattern 115 to be inspected with a laser beam. Then, the electrical resistance of the portion of the photoconductive material sheet that is hit by the laser beam decreases, so that the electrode plate 101 and the pattern 115 can be electrically connected. In this state, power supply 10
6 is set to a constant voltage V1, and the voltage of the electrode plate 101 is set to V1. Since the pattern 115 is electrically connected to the electrode plate 101, the pattern 115 is charged to a voltage V1.

【0021】この時のパターン115の帯電量は、基準
電位面として働く電極板104とパターン115の間の
静電容量(以下パターン115の静電容量とする)と電
圧V1の積である。パターン115が充分に帯電したら
、レーザビームの照射を止める。すると、パターン11
5と電極板101の導通が取れなくなる。この状態で、
電源106の電圧をV1とは違うV2に設定する。 するとV1に帯電していた電極板101が充放電し、V
2の電位になる。
The amount of charge on the pattern 115 at this time is the product of the capacitance between the electrode plate 104 serving as a reference potential surface and the pattern 115 (hereinafter referred to as the capacitance of the pattern 115) and the voltage V1. When the pattern 115 is sufficiently charged, the laser beam irradiation is stopped. Then pattern 11
5 and the electrode plate 101 cannot be electrically connected. In this state,
The voltage of the power supply 106 is set to V2, which is different from V1. Then, the electrode plate 101 that was charged to V1 is charged and discharged, and V
The potential becomes 2.

【0022】次に、レーザビームを再び先と同一箇所に
照射する。すると再び電極板101とパターン115の
導通が取れるので、パターン115が充放電してV2と
なる。このときパターン115には(パターン115の
静電容量)×(V1−V2)で表される量の電荷が充放
電される。この電荷は、電源106から電流計105を
通して供給されるので、電流計105の測定値を積分す
ることにより、測定することが出来る。この測定値をも
とにパターン115の静電容量を計算し、パターンの良
否判定を行う。
Next, the laser beam is again irradiated onto the same location. Then, conduction between the electrode plate 101 and the pattern 115 is established again, so that the pattern 115 is charged and discharged and becomes V2. At this time, the pattern 115 is charged and discharged with an amount of charge represented by (capacitance of the pattern 115)×(V1-V2). Since this charge is supplied from the power supply 106 through the ammeter 105, it can be measured by integrating the measured value of the ammeter 105. The capacitance of the pattern 115 is calculated based on this measured value, and the quality of the pattern is determined.

【0023】なお基板中のパターンを次々に検査してい
くためには、レーザビームを次々に、検査するパターン
に位置決めする必要がある。第2の実施例では、レーザ
ビームは横方向にのみ走査し、基板をレーザビームの走
査方向と直交する向きに送って、これをおこなう。パタ
ーンを検査する順番は予め制御部に記憶しておき、基板
の端にあるものから順に行い、レーザビームの位置決め
時間が出来るだけ少なくなるようにする。レーザビーム
をパターンに位置決めする方法は、このほか基板は固定
してレーザビームを縦横方向に走査する、あるいはレー
ザビームは固定して、基板を縦横方向に移動する等があ
るが、いずれの方法を構わない。また、電流計105を
電極101と電源106の間に接続しているが、これを
電極104の接地線に挿入しても、上記手順により検査
を行うことが出来る。
[0023] In order to inspect the patterns on the substrate one after another, it is necessary to position the laser beams one after another on the patterns to be inspected. In a second embodiment, this is accomplished by scanning the laser beam only laterally and directing the substrate in a direction perpendicular to the scanning direction of the laser beam. The order in which the patterns are inspected is stored in advance in the control unit, and the patterns are inspected in order starting from the edges of the substrate, so that the laser beam positioning time is minimized. Other methods for positioning the laser beam in a pattern include fixing the substrate and scanning the laser beam in the vertical and horizontal directions, or fixing the laser beam and moving the substrate in the vertical and horizontal directions. I do not care. Further, although the ammeter 105 is connected between the electrode 101 and the power source 106, the test can be performed by the above procedure even if it is inserted into the ground wire of the electrode 104.

【0024】[0024]

【発明の効果】本発明の基板検査装置は、微細なパター
ンも損傷することなく検査できるという効果がある。
Effects of the Invention The substrate inspection apparatus of the present invention has the advantage that even minute patterns can be inspected without damage.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の第1の実施例を示すブロック図である
FIG. 1 is a block diagram showing a first embodiment of the present invention.

【図2】本発明の第2の実施例を示すブロック図である
FIG. 2 is a block diagram showing a second embodiment of the invention.

【図3】従来の第1の例を示すブロック図である。FIG. 3 is a block diagram showing a first conventional example.

【図4】従来の第2の例を示すブロック図である。FIG. 4 is a block diagram showing a second conventional example.

【図5】図4に示す従来例の動作を説明するための回路
図である。
FIG. 5 is a circuit diagram for explaining the operation of the conventional example shown in FIG. 4;

【符号の説明】[Explanation of symbols]

1    透明電極板 2    光導電材料のシート 3    被検査基板 4    電極板 5    電流計 6    電源 7    制御部 8    ステージ制御部 10    保持具 11    パターン 12    レーザー装置 13    抵抗計 14    位置ぎめ部 15    プローブ 1 Transparent electrode plate 2 Sheet of photoconductive material 3. Board to be inspected 4 Electrode plate 5 Ammeter 6 Power supply 7 Control section 8 Stage control section 10 Holder 11 Pattern 12 Laser device 13 Resistance meter 14 Positioning section 15 Probe

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  被測定基板上の金属配線パターンに照
射されるレーザビームを発生するレーザ装置と、前記被
測定基板のレーザビームが当たる面に密着させる光導電
性材料のシート、および透明電極板と、前記被検査基板
のレーザビームが当たらない面に密着される電極板と、
前記電極板で挟んだ被検査基板を縦横方向に送る手段ま
たはレーザビームを走査する手段と、前記透明電極板に
接続される電流計および電源と、前記レーザ装置、基板
を縦横方向に送る手段またはレーザビームを走査する手
段、電流計、および電源を制御する制御部とを含む事を
特徴とする基板検査装置。
1. A laser device that generates a laser beam that irradiates a metal wiring pattern on a substrate to be measured, a sheet of photoconductive material that is brought into close contact with a surface of the substrate to be measured that is hit by the laser beam, and a transparent electrode plate. and an electrode plate that is closely attached to a surface of the substrate to be inspected that is not hit by the laser beam;
A means for vertically and horizontally feeding the substrate to be inspected sandwiched between the electrode plates, or a means for scanning a laser beam, an ammeter and a power source connected to the transparent electrode plate, and a means for feeding the laser device and the substrate in the vertical and horizontal directions, or 1. A board inspection device comprising means for scanning a laser beam, an ammeter, and a control section for controlling a power source.
【請求項2】  被測定基板上の金属配線パターンに照
射されるレーザビームを供給するレーザ装置と、前記被
測定基板のレーザビームが当たる面に密着させる光導電
性材料のシート、および透明電極板と、前記被検査基板
のレーザビームが当たらない面に密着される電極板と、
前記電極板で挟んだ被検査基板を縦横方向に送る手段ま
たは前記レーザビームを被測定基板上で操作する手段と
、前記透明電極板に接続される電流計および電源と、前
記レーザビームを被測定基板上に収束する光学系と、前
記レーザビームを継続するシャッタと、前記基板を縦横
方向に送る手段またはレーザビームを走査する手段、電
流計、電源、およびシャッタを制御する制御部とを含む
事を特徴とする基板検査装置。
2. A laser device that supplies a laser beam to a metal wiring pattern on a substrate to be measured, a sheet of photoconductive material that is brought into close contact with a surface of the substrate to be measured that is hit by the laser beam, and a transparent electrode plate. and an electrode plate that is closely attached to a surface of the substrate to be inspected that is not hit by the laser beam;
means for vertically and horizontally feeding the substrate to be inspected sandwiched between the electrode plates; or means for operating the laser beam on the substrate to be measured; an ammeter and a power source connected to the transparent electrode plate; The method includes an optical system that focuses on the substrate, a shutter that continues the laser beam, a means for sending the substrate in vertical and horizontal directions or a means for scanning the laser beam, an ammeter, a power source, and a control unit that controls the shutter. A board inspection device featuring:
JP3004934A 1991-01-21 1991-01-21 Board inspection equipment Expired - Fee Related JP2730295B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3004934A JP2730295B2 (en) 1991-01-21 1991-01-21 Board inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3004934A JP2730295B2 (en) 1991-01-21 1991-01-21 Board inspection equipment

Publications (2)

Publication Number Publication Date
JPH04236367A true JPH04236367A (en) 1992-08-25
JP2730295B2 JP2730295B2 (en) 1998-03-25

Family

ID=11597410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3004934A Expired - Fee Related JP2730295B2 (en) 1991-01-21 1991-01-21 Board inspection equipment

Country Status (1)

Country Link
JP (1) JP2730295B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0949867A (en) * 1995-08-08 1997-02-18 Okano Hightech Kk Method and apparatus for inspecting substrate
JP2004506205A (en) * 2000-08-05 2004-02-26 ボテスト ジュステムス ゲーエムベーハー Method and apparatus for testing printed circuit board functionality
JP2005156399A (en) * 2003-11-27 2005-06-16 Nidec-Read Corp Substrate inspection apparatus and substrate inspection method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0949867A (en) * 1995-08-08 1997-02-18 Okano Hightech Kk Method and apparatus for inspecting substrate
JP2004506205A (en) * 2000-08-05 2004-02-26 ボテスト ジュステムス ゲーエムベーハー Method and apparatus for testing printed circuit board functionality
JP2005156399A (en) * 2003-11-27 2005-06-16 Nidec-Read Corp Substrate inspection apparatus and substrate inspection method

Also Published As

Publication number Publication date
JP2730295B2 (en) 1998-03-25

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