JPH04248122A - Substrate for magnetic disk - Google Patents
Substrate for magnetic diskInfo
- Publication number
- JPH04248122A JPH04248122A JP112391A JP112391A JPH04248122A JP H04248122 A JPH04248122 A JP H04248122A JP 112391 A JP112391 A JP 112391A JP 112391 A JP112391 A JP 112391A JP H04248122 A JPH04248122 A JP H04248122A
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- substrate
- layer
- magnetic
- magnetic disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 60
- 239000010936 titanium Substances 0.000 claims abstract description 37
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 37
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000002344 surface layer Substances 0.000 claims abstract description 25
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 14
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 13
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 abstract description 25
- 238000010438 heat treatment Methods 0.000 abstract description 14
- 230000003746 surface roughness Effects 0.000 abstract description 14
- 238000005498 polishing Methods 0.000 abstract description 12
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003608 titanium Chemical class 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】この発明は、磁気ディスク用基板
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a magnetic disk substrate.
【０００２】0002
【従来の技術】近年、情報量の増大に伴い、磁気ディス
クの高容量化及びその記録媒体（磁性膜）の高密度化が
図られている。記録密度向上のためには、磁気ヘッドの
浮上高さを極力小さくする必要があり、このため、磁気
ディスク用基板には、磁気ヘッドの低浮上化に対処し得
る表面粗度（表面平滑度）と、磁気ヘッドとの接触時に
その衝撃を担える表面硬さが求められている。例えば、
現在、磁気ヘッド浮上高さとしては ０．１μｍ以下を
実現することが要請されており、この場合、磁気ディス
ク用基板に要求される表面粗度は、この浮上高さの１／
１０以下にすることが必要であるとされている。2. Description of the Related Art In recent years, as the amount of information has increased, efforts have been made to increase the capacity of magnetic disks and the density of their recording media (magnetic films). In order to improve recording density, it is necessary to reduce the flying height of the magnetic head as much as possible. Therefore, the magnetic disk substrate has a surface roughness (surface smoothness) that can cope with the lower flying height of the magnetic head. Therefore, there is a need for a surface hardness that can bear the impact when it comes into contact with a magnetic head. for example,
Currently, it is required to achieve a magnetic head flying height of 0.1 μm or less, and in this case, the surface roughness required for the magnetic disk substrate is 1/1 of this flying height.
It is said that it is necessary to set the value to 10 or less.
【０００３】また、記録密度向上のためには記録媒体（
磁性膜）の厚みを薄くすることが必要であり、この点か
ら、媒体膜厚減少に限界がみられる、基板上にコーティ
ング記録媒体（塗布型記録媒体）を塗布した構造の塗布
型磁気ディスクに代わるものとして、基板上にめっき法
によって金属磁性膜を形成した構造のめっき型磁気ディ
スクと、基板上にスパッタ法によって金属磁性膜を形成
した構造の金属スパッタ型磁気ディスクが注目されてお
り、その一部は実用に供されている。そして、このよう
なめっき型あるいは金属スパッタ型磁気ディスクの磁気
ディスク用基板としては、表面を硬質にして表面粗度を
小さくするために、アルミニウム合金よりなる基体（ア
ルミニウム合金基板）の表面に厚み１０〜１５μｍ程度
の無電解ＮｉＰ めっき膜を施した、いわゆるＮｉＰ
めっき基板が用いられている。[0003] In addition, in order to improve the recording density, recording media (
It is necessary to reduce the thickness of the magnetic film (magnetic film), and from this point of view, it is necessary to reduce the thickness of the coated magnetic disk, which has a structure in which a coating recording medium (coating type recording medium) is applied on the substrate, where there is a limit to the reduction of the media film thickness. As alternatives, plated magnetic disks have a structure in which a metal magnetic film is formed on a substrate by plating, and metal sputtered magnetic disks have a structure in which a metal magnetic film is formed on a substrate by sputtering. Some of them are in practical use. As a magnetic disk substrate for such a plating type or metal sputtering type magnetic disk, in order to make the surface hard and reduce the surface roughness, the surface of the base body made of aluminum alloy (aluminum alloy substrate) is coated with a thickness of 10 mm. So-called NiP with electroless NiP plating film of ~15μm
A plated substrate is used.
【０００４】0004
【発明が解決しようとする課題】しかしながら、この従
来のＮｉＰ めっき基板では、加熱処理を行うことによ
り、その無電解ＮｉＰ めっき膜が磁性を帯びるととも
に基板の変形が生じ易いという高温加熱処理における耐
熱性の問題がある。例えば、スパッタ法により磁性膜を
成膜するに際し、一般的に基板温度を高めて成膜すると
磁性膜の磁気特性性能が向上することが知られている。
ところが、この場合、基板温度を ３００℃程度以上に
すると無電解ＮｉＰめっき膜が仕様限界値を超えて磁化
されるようになる。[Problems to be Solved by the Invention] However, in this conventional NiP-plated substrate, the electroless NiP-plated film becomes magnetic and the substrate is easily deformed due to heat treatment. There is a problem. For example, it is known that when forming a magnetic film by sputtering, the magnetic properties of the magnetic film are generally improved by increasing the substrate temperature. However, in this case, when the substrate temperature is increased to about 300° C. or higher, the electroless NiP plating film becomes magnetized beyond the specification limit value.
【０００５】そこで、本願発明は、上記の点に鑑みてな
されたものであって、磁性膜成膜時などにおける高温加
熱処理が可能であり、かつ表面が硬く表面粗度が小さい
表面性状に優れた、記録密度向上の要請に応えることの
できる、磁気ディスク用基板の提供を目的とする。The present invention has been made in view of the above points, and is capable of high-temperature heat treatment during the formation of a magnetic film, and has an excellent surface quality with a hard surface and low surface roughness. Another object of the present invention is to provide a magnetic disk substrate that can meet the demand for increased recording density.
【０００６】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本願の請求項１の発明による磁気ディスク用基板
は、チタン基体の表層が酸化チタン層化されていること
を特徴とするものである。[Means for Solving the Problems] In order to achieve the above object, a magnetic disk substrate according to the invention of claim 1 of the present application is characterized in that the surface layer of the titanium base is layered with titanium oxide. It is.
【０００７】請求項２の発明による磁気ディスク用基板
は、チタン基体の表層が窒化チタン層化されていること
を特徴とするものである。The magnetic disk substrate according to the second aspect of the invention is characterized in that the surface layer of the titanium substrate is layered with titanium nitride.
【０００８】また、請求項３の発明による磁気ディスク
用基板は、チタン基体の表層が炭化チタン層化されてい
ることを特徴とするものである。Further, the magnetic disk substrate according to the third aspect of the present invention is characterized in that the surface layer of the titanium substrate is made of a titanium carbide layer.
【０００９】[0009]
【作用】本願の請求項１、２及び３の発明による磁気デ
ィスク用基板においては、チタン基体の表層が、それぞ
れ、酸化チタン層化、窒化チタン層化、炭化チタン層化
されたものであるから、チタン基体そのものに比べて表
面が硬く研磨性が向上し、表面研磨を施すことにより表
面粗度を小さくすることができる。また、チタン基体そ
のものが高温加熱されても極めて変形し難く、このチタ
ン基体に形成された表層としての、酸化チタン層、窒化
チタン層及び炭化チタン層は、磁性膜を成膜するなどに
際して高温加熱処理されても磁化されることはない。[Operation] In the magnetic disk substrate according to the inventions of claims 1, 2, and 3 of the present application, the surface layer of the titanium substrate is layered with titanium oxide, titanium nitride, and titanium carbide, respectively. Compared to the titanium substrate itself, the surface is harder and has improved polishability, and surface roughness can be reduced by surface polishing. In addition, the titanium substrate itself is extremely difficult to deform even when heated to high temperatures, and the surface layers formed on this titanium substrate, such as titanium oxide layers, titanium nitride layers, and titanium carbide layers, are heated at high temperatures when forming magnetic films. Even if it is processed, it will not become magnetized.
【００１０】この場合、表面が研削加工されたチタン基
体を大気雰囲気中にて所定の条件で加熱処理することに
より、チタン基体の表層をＴｉＯ２，ＴｉＯ でなる酸
化チタン層化することができる。また、表面が研削加工
されたチタン基体を窒素ガス雰囲気中にて所定の条件で
加熱処理することにより、チタン基体の表層をＴｉＮ
でなる窒化チタン層化することができる。さらに、表面
が研削加工されたチタン基体をメタンガス雰囲気中にて
所定の条件で加熱処理することにより、チタン基体の表
層をＴｉＣ でなる炭化チタン層化することができる。
チタン基体としては、エラーの原因となる晶出物などの
欠陥の発生が少ない高純度チタンよりなるものが最適で
ある。In this case, by heat-treating the titanium substrate whose surface has been ground under predetermined conditions in the air, the surface layer of the titanium substrate can be formed into a titanium oxide layer consisting of TiO2 and TiO. In addition, by heat-treating a titanium substrate whose surface has been ground under predetermined conditions in a nitrogen gas atmosphere, the surface layer of the titanium substrate can be changed to TiN.
It can be layered with titanium nitride. Further, by heat-treating the titanium substrate whose surface has been ground under predetermined conditions in a methane gas atmosphere, the surface layer of the titanium substrate can be formed into a titanium carbide layer made of TiC. The optimal titanium substrate is one made of high-purity titanium, which has fewer defects such as crystallized substances that cause errors.
【００１１】[0011]
【実施例】以下、実施例に基づいて本願発明を説明する
。まず、基体用チタン材（神戸製鋼所製，ＫＳ−４０，
純チタン材，ＪＩＳ１種）を厚み１．２７ｍｍ，直径
３．５インチに成形し、これに所定の内外周端面加工及
び表面研削を施してチタン基体とした。[Examples] The present invention will be explained below based on Examples. First, titanium material for the base (manufactured by Kobe Steel, KS-40,
Pure titanium material (JIS Class 1) with a thickness of 1.27 mm and a diameter
It was molded into a 3.5-inch piece, and subjected to predetermined inner and outer circumferential end face processing and surface grinding to obtain a titanium base.
【００１２】このチタン基体に、加熱炉を用いて、大気
雰囲気中にて ８５０℃で２時間、 ８５０℃で４時間
および ８５０℃で６時間の加熱処理条件で加熱処理を
施して、チタン基体の両面の表層をＴｉＯ２，ＴｉＯ
でなる酸化チタン層化したものを得た。また、窒素ガス
雰囲気中、メタンガス雰囲気中それぞれにおいて上記と
同じ加熱処理条件で加熱処理を行って、チタン基体の両
面の表層をＴｉＮ でなる窒化チタン層化したものと、
チタン基体の両面の表層をＴｉＣ でなる炭化チタン層
化したものを得た。[0012] This titanium substrate was heat-treated in an air atmosphere under the following conditions: 850°C for 2 hours, 850°C for 4 hours, and 850°C for 6 hours. The surface layer on both sides is TiO2, TiO
A layered layer of titanium oxide was obtained. In addition, heat treatment is performed under the same heat treatment conditions as above in a nitrogen gas atmosphere and a methane gas atmosphere, respectively, to form titanium nitride layers made of TiN on both surfaces of the titanium substrate,
A titanium carbide layer made of TiC was obtained on both surfaces of a titanium substrate.
【００１３】このようにして加熱処理によりチタン基体
に硬質表層を形成したもの、つまり、チタン基体の表層
を酸化チタン層化したもの、窒化チタン層化したもの、
および炭化チタン層化したものを得たのち、これらの表
面を下記の条件で研磨して磁気ディスク用基板を作製し
た。[0013] In this way, a hard surface layer is formed on a titanium base by heat treatment, that is, a titanium base with a titanium oxide layer, a titanium nitride layer on the surface layer,
After obtaining a titanium carbide layer, the surfaces thereof were polished under the following conditions to prepare a magnetic disk substrate.
【００１４】
研磨機 両面ラッピング機 ＤＳＬ−９Ｂ
（スピードファム製） 研磨液 スノーテック
スＺＬ（日産化学製）：水＝１：９ （有機酸により
ＰＨ＝２．５ に調整）
研磨布 サーフィン０１８−３（不二見研磨材製
） 面 圧 １００ｇ／ｃｍ２ で３０秒
間、次いで １５０ｇ／ｃｍ２ で１０分間Polishing machine Double-sided lapping machine DSL-9B
(Manufactured by Speed Fam) Polishing liquid Snowtex ZL (manufactured by Nissan Chemical): Water = 1:9 (Adjusted to PH = 2.5 with organic acid)
Polishing cloth Surfing 018-3 (manufactured by Fujimi Abrasive Materials) Surface pressure: 100g/cm2 for 30 seconds, then 150g/cm2 for 10 minutes
【００１５
】表面研磨後、洗浄、乾燥してから、表面粗度Ｒａを測
定した。なお、比較のため、加熱処理による硬質表層を
有しないチタン基体に上記研磨条件で表面研磨を施して
得られた基板（比較例Ａ）、及びＡｌ−Ｍｇ系アルミニ
ウム合金基体の表面に厚み１５μｍ程度の無電解ＮｉＰ
めっき膜を有し、上記研磨条件で表面研磨が施された
ＮｉＰ めっき基板（比較例Ｂ）についても、表面粗度
Ｒａを測定した。これらの実施例、比較例における表面
粗度Ｒａの測定結果を表１に示す。
（以下、余白）0015
] After surface polishing, washing and drying, surface roughness Ra was measured. For comparison, a substrate (Comparative Example A) obtained by subjecting a titanium substrate that does not have a hard surface layer due to heat treatment to surface polishing under the above polishing conditions, and a substrate with a thickness of about 15 μm on the surface of an Al-Mg-based aluminum alloy substrate. Electroless NiP
The surface roughness Ra was also measured for a NiP plated substrate (Comparative Example B) that had a plated film and was surface polished under the above polishing conditions. Table 1 shows the measurement results of surface roughness Ra in these Examples and Comparative Examples. (Hereafter, margin)
【００１６】[0016]
【表１】[Table 1]
【００１７】加熱処理による硬質表層を有しないチタン
基体に表面研磨を施した基板（比較例Ａ）は、表面硬度
が十分でなく研磨性が劣るため表面粗度が劣っている。
これに対して、この出願に係る磁気ディスク用基板では
、チタン基体の表層が、それぞれ、酸化チタン層化、窒
化チタン層化、炭化チタン層化されたものであるから、
表面が硬く研磨性が向上してＮｉＰ めっき基板（比較
例Ｂ）に比べて同等以上に小さい表面粗度（Ｒａ＝１０
〜２０Å程度）が得られる。しかも、硬質表層としての
、酸化チタン層、窒化チタン層及び炭化チタン層は、磁
性膜を成膜するに際して高温加熱処理されても磁化され
ることはない。なお、実施例におけるこれらの硬質表層
の厚みは ５〜１５μｍ程度のものである。The substrate (Comparative Example A) obtained by surface polishing a titanium substrate without a hard surface layer by heat treatment has insufficient surface hardness and poor polishability, resulting in poor surface roughness. In contrast, in the magnetic disk substrate according to this application, the surface layer of the titanium base is layered with titanium oxide, titanium nitride, and titanium carbide, respectively.
The surface is hard and has improved polishability, resulting in a surface roughness (Ra = 10
~20 Å) is obtained. Moreover, the titanium oxide layer, titanium nitride layer, and titanium carbide layer, which serve as hard surface layers, are not magnetized even if they are subjected to high-temperature heat treatment when forming a magnetic film. In addition, the thickness of these hard surface layers in the examples is about 5 to 15 μm.
【００１８】[0018]
【発明の効果】このように請求項１の発明による磁気デ
ィスク用基板は、チタン基体の表層が酸化チタン層化さ
れた構成とされている。請求項２の発明による磁気ディ
スク用基板は、チタン基体の表層が窒化チタン層化され
た構成とされており、また、請求項３の発明による磁気
ディスク用基板は、チタン基体の表層が炭化チタン層化
された構成とされている。As described above, the magnetic disk substrate according to the first aspect of the invention has a structure in which the surface layer of the titanium base is made of titanium oxide. The magnetic disk substrate according to the invention of claim 2 has a structure in which the surface layer of the titanium base is layered with titanium nitride, and the magnetic disk substrate according to the invention of claim 3 has a structure in which the surface layer of the titanium base is made of titanium carbide. It has a layered structure.
【００１９】したがって、本願発明の磁気ディスク用基
板においては、表面が硬く研磨性が良好であるとともに
、チタン基体そのものが耐熱性に優れ、このチタン基体
に形成された表層としての、酸化チタン層、窒化チタン
層および炭化チタン層は、磁性膜を成膜するに際して磁
性膜の磁気特性を向上させるための高温加熱処理されて
も磁化されることはない。すなわち、本願発明によれば
、磁性膜の磁気特性を向上させるための高温加熱処理が
可能で表面粗度が小さい磁気ディスク用基板を提供する
ことができる。Therefore, in the magnetic disk substrate of the present invention, the surface is hard and has good polishability, and the titanium base itself has excellent heat resistance. The titanium nitride layer and the titanium carbide layer are not magnetized even if they are subjected to high-temperature heat treatment to improve the magnetic properties of the magnetic film when forming the magnetic film. That is, according to the present invention, it is possible to provide a magnetic disk substrate that can be subjected to high temperature heat treatment to improve the magnetic properties of a magnetic film and has a small surface roughness.
Claims (3)
れていることを特徴とする磁気ディスク用基板。1. A magnetic disk substrate, characterized in that the surface layer of a titanium base is layered with titanium oxide.
れていることを特徴とする磁気ディスク用基板。2. A magnetic disk substrate, characterized in that the surface layer of the titanium base is layered with titanium nitride.
れていることを特徴とする磁気ディスク用基板。3. A magnetic disk substrate, characterized in that the surface layer of the titanium base is layered with titanium carbide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP112391A JPH04248122A (en) | 1991-01-09 | 1991-01-09 | Substrate for magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP112391A JPH04248122A (en) | 1991-01-09 | 1991-01-09 | Substrate for magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04248122A true JPH04248122A (en) | 1992-09-03 |
Family
ID=11492677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP112391A Withdrawn JPH04248122A (en) | 1991-01-09 | 1991-01-09 | Substrate for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04248122A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015181077A (en) * | 2014-03-07 | 2015-10-15 | 株式会社神戸製鋼所 | Magnetic disk titanium plate and manufacturing method of the same and magnetic disk |
-
1991
- 1991-01-09 JP JP112391A patent/JPH04248122A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015181077A (en) * | 2014-03-07 | 2015-10-15 | 株式会社神戸製鋼所 | Magnetic disk titanium plate and manufacturing method of the same and magnetic disk |
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