JPH0425705Y2 - - Google Patents
Info
- Publication number
- JPH0425705Y2 JPH0425705Y2 JP1988170209U JP17020988U JPH0425705Y2 JP H0425705 Y2 JPH0425705 Y2 JP H0425705Y2 JP 1988170209 U JP1988170209 U JP 1988170209U JP 17020988 U JP17020988 U JP 17020988U JP H0425705 Y2 JPH0425705 Y2 JP H0425705Y2
- Authority
- JP
- Japan
- Prior art keywords
- cup
- developed
- spindle chuck
- cleaning
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Description
【考案の詳細な説明】
（産業上の利用分野）
本考案はデイツプ現像用装置は第１図Ａ（斜視
図）、Ｂ（同Ｘ−Ｘ断面図）に示す通りであつて、
カツプ１の内底面２の周側壁近くに適当間隔で複
数の薬液供給口３が設けてあり、これから現像用
薬液４を流入させカツプ１内にセツトされたマス
ク又はウエハ（以下、被現像物と言う）５の現像
処理を行わせしめ、処理後は第２図に示す如く廃
液バルブ６を開放すると共に、カツプ内底面２の
中央部及びカツプ周壁上面部の適当間隔位置に設
けたノズル７，８から洗浄液を噴出させてカツプ
内底面２の洗浄を行うことが行われている。な
お、図面で９はバキユームチヤツク、１０はスピ
ンドルチヤツクである。[Detailed Description of the Invention] (Industrial Application Field) The dip developing apparatus of the present invention is as shown in FIGS. 1A (perspective view) and B (XX sectional view),
A plurality of chemical solution supply ports 3 are provided at appropriate intervals near the circumferential side wall of the inner bottom surface 2 of the cup 1, through which a developing chemical solution 4 flows into the mask or wafer (hereinafter referred to as the object to be developed) set in the cup 1. After the processing, the waste liquid valve 6 is opened as shown in FIG. The inner bottom surface 2 of the cup is cleaned by jetting a cleaning liquid from the cup. In the drawings, numeral 9 represents a vacuum chuck, and numeral 10 represents a spindle chuck.
（考案が解決しようとする課題）
上記、従来のものに於いて現像処理後、カツプ
内面の全体を洗浄するには、ノズル７及び８が固
定されていることから極めて困難である。このた
め、カツプ内底面に付着した現像残留物が次回の
洗浄のため新たに流入してくる現像液の純度を低
下させる問題があつた。(Problems to be Solved by the Invention) In the conventional device described above, it is extremely difficult to clean the entire inner surface of the cup after the development process because the nozzles 7 and 8 are fixed. For this reason, there was a problem in that the development residue adhering to the inner bottom surface of the cup lowered the purity of the developer newly flowing in for the next cleaning.
（課題を解決するための手段）
本考案は上記課題を解決せんとするものであつ
て、その特徴とするところはスピンドルチヤツク
の被現像物を把持した状態で回転を与え、その裏
面に洗浄液を噴出させると共に、スピンドルチヤ
ツクを上下動させて被現像物の裏面を利用した洗
滌液の跳ね返りでカツプ内面を効果的に洗浄する
ようになさしめたことにある。(Means for Solving the Problems) The present invention is intended to solve the above problems, and its feature is that the spindle chuck rotates while gripping the object to be developed, and the cleaning liquid is applied to the back surface of the spindle chuck. At the same time, by moving the spindle chuck up and down, the cleaning liquid bounces off the back surface of the object to be developed, thereby effectively cleaning the inner surface of the cup.
本考案は以下の実施例によつて具体的に説明さ
れる。 The invention is illustrated by the following examples.
（実施例）
第３図は本考案装置の部分断面図であつて１が
現像カツプ、６が廃液バルブ、９がパキユームチ
ヤツク、１０がスピンドルチヤツクであることは
従来装置と変りがないが、本考案装置ではカツプ
内底面２の上流側となるバキユームチヤツク９の
位置する反対面箇所に上向きに洗浄ノズル１１を
配設してなる。なお、５は被現像物である。(Example) Fig. 3 is a partial sectional view of the device of the present invention, which is the same as the conventional device in that 1 is a developing cup, 6 is a waste liquid valve, 9 is a pack chuck, and 10 is a spindle chuck. However, in the device of the present invention, a cleaning nozzle 11 is disposed upward on the upstream side of the inner bottom surface 2 of the cup, opposite to where the vacuum chuck 9 is located. Note that 5 is an object to be developed.
（作用）
本考案装置は上記構成であつて被現像物５のカ
ツプ内でのデイツプ現像が終了し、次に洗浄せん
とする場合には第４図に示す如く廃液バルブ６を
開放するが、このさいスピンドルチヤツク１０で
被現像物５を吸着し、スピンドルチヤツク１０を
回転させながらカツプ内で上下動を開始する。(Function) The apparatus of the present invention has the above-mentioned configuration, and when the dip development of the object to be developed 5 in the cup is completed and the object is to be washed next, the waste liquid valve 6 is opened as shown in FIG. At this time, the object to be developed 5 is attracted by the spindle chuck 10, and while the spindle chuck 10 is rotated, it starts to move up and down within the cup.
しかして、該動作と同時に上記洗浄ズル１１よ
り洗浄液を噴出させるようになすのであり、この
さい洗浄ノズル１１は上向きに取付けられている
ことから被現像物５の裏面に向けて噴出し、噴出
された洗浄液はその粘性と遠心力により被現像物
５の裏面全周に広がりながら外周方向に流出する
と共に、カツプ内面全体に飛散しこれにより該面
の洗浄が行われる。 At the same time as this operation, the cleaning nozzle 11 jets out the cleaning liquid. At this time, since the cleaning nozzle 11 is mounted upward, the cleaning liquid is jetted toward the back surface of the object to be developed 5. Due to its viscosity and centrifugal force, the cleaning liquid spreads over the entire circumference of the back surface of the object to be developed 5 and flows out toward the outer circumference, and is scattered over the entire inner surface of the cup, thereby cleaning that surface.
（考案の効果）
本考案によれば簡単な構成で、デイツプ現像時
のカツプの側壁洗浄を迅速且つ確実に行うことが
できるものとなるのであり、連続デイツプ現像に
於ける不純物の現像液への混入を押さえ、純度の
安定した現像液の供給が行われるものとなつて被
現像物の品質向上に寄与せしめること大ならしめ
るものである。なお、被現像物の裏面洗浄も効果
的に行われるものとなる。(Effects of the invention) According to the invention, with a simple configuration, it is possible to quickly and reliably clean the side wall of the cup during deep development, and to prevent impurities from entering the developing solution during continuous deep development. This prevents contamination and supplies a developer with stable purity, greatly contributing to improving the quality of the object to be developed. Note that the back side of the object to be developed can also be effectively cleaned.
第１図は従来装置を示すものでＡは斜視図、Ｂ
はＸ−Ｘ線断面図、第２図はその洗浄作用説明
図、第３図は本考案装置の物分断面図、第４図は
その作用説明図である。
１……カツプ、２……内底面、３……薬液供給
口、４……現像用薬液、５……被現像物、６……
廃液バルブ、９……バキユームチヤツク、１０…
…スピンドルチヤツク、１１……洗浄ノズル。
Figure 1 shows a conventional device, where A is a perspective view and B is a perspective view.
2 is a cross-sectional view taken along the line X--X, FIG. 2 is an explanatory diagram of the cleaning action, FIG. 3 is a physical cross-sectional view of the device of the present invention, and FIG. 4 is an explanatory diagram of the action. 1... Cup, 2... Inner bottom surface, 3... Chemical solution supply port, 4... Chemical solution for development, 5... Object to be developed, 6...
Waste liquid valve, 9...Vacuum chuck, 10...
...Spindle chuck, 11...Cleaning nozzle.
Claims (1)
で回転を与え、その裏面に洗浄液を噴出させると
共に、スピンドルチヤツクを上下動させて被現像
体の裏面を利用した洗浄液の跳ね返りでカツプ内
面を洗浄するようになさしめたことを特徴とする
デイツプ現像用装置のカツプ内面洗浄装置。 The spindle chuck is rotated while holding the object to be developed, and the cleaning liquid is jetted onto the back surface of the spindle chuck.The spindle chuck is also moved up and down, and the cleaning liquid bounces off the back surface of the object to clean the inside of the cup. A cup inner surface cleaning device for a dip developing device, characterized in that the device is configured to do the following:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988170209U JPH0425705Y2 (en) | 1988-12-30 | 1988-12-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988170209U JPH0425705Y2 (en) | 1988-12-30 | 1988-12-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0290845U JPH0290845U (en) | 1990-07-18 |
| JPH0425705Y2 true JPH0425705Y2 (en) | 1992-06-19 |
Family
ID=31460956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988170209U Expired JPH0425705Y2 (en) | 1988-12-30 | 1988-12-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0425705Y2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS639130U (en) * | 1986-07-02 | 1988-01-21 |
-
1988
- 1988-12-30 JP JP1988170209U patent/JPH0425705Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0290845U (en) | 1990-07-18 |
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