JPH0425836A - Photosensitive material processing device - Google Patents

Abstract

PURPOSE:To maintain the compsn. gradient of washing water and to enhance washing efficiency by positioning the liquid levels of respective processing chambers lower than the transporting route of a photosensitive material at the time of non-processing of the photosensitive material. CONSTITUTION:The fresh washing water W is supplied from a liquid feed port 71 to a processing chamber 3d at the time of processing of the photosensitive material S. The water W existing in the processing chamber 3d flows into the processing chamber 3c by passing the spacings between blades 6 and in succession flows successively into the processing chambers 3b, 3a. The fatigued water W is discharged from the liquid feed port 72. The photosensitive material S advances into the spacings between the thin parts of the blades 6 and passes the passages 4a to 4e. The photosensitive material is thereby washed. Pistons 88a to 88d contract and bellows bodies 83a to 83d expand while the photosensitive material S is not processed over a long period of time. The liquid levels of the processing chambers 3a to 3d are then lowered from the passages 4a to 4e and the flow of the water W between the chambers is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a photosensitive material processing apparatus for wet-processing a silver halide photosensitive material (hereinafter referred to as a photosensitive material).

<Prior Art> In photosensitive material +4 processing apparatuses such as silver halide photocopiers and automatic processors, wet processing is performed on exposed photosensitive materials. In this process, the photosensitive material is normally immersed in the developer, bleach, fixer (or bleach/fixer), and wash water stored in each processing tank in sequence, and then dried.

In such processing, there is a demand for reducing the amount of processing liquid used to obtain a certain processing effect as much as possible in order to preserve the environment, save resources, and reduce costs.

For example, it is known that in order to save on the amount of washing water used, it is sufficient to increase the number of washing tanks installed. A method was adopted in which the photosensitive material was washed by passing it through each washing tank in sequence (the so-called multi-stage countercurrent method).

However, in this method, several washing tanks are arranged in parallel, which increases the size of the device and requires a large installation space, and the time required for washing becomes long.

Such drawbacks also apply to treatments other than water washing.

<Problems to be Solved by the Invention> The purpose of the present invention is to provide a device that is small in size and requires little installation space.
The amount of processing liquid used can be reduced, and the processing time is short (
The object of the present invention is to provide a photosensitive material processing apparatus that can obtain excellent photographic performance.

<Means for Solving the Problems> Such objects are achieved by the present invention described in (1) and (2) below.

(1) A processing tank having a plurality of processing chambers connected in a substantially horizontal direction via passages, and a substantially horizontal conveyance path installed within the processing tank to carry the photosensitive material within each of the processing chambers and each of the passages. a conveying means for conveying the photosensitive material along the conveying path; at least a pair of blades installed in each of the passages so as to shield the passages; 1. A photosensitive material processing apparatus comprising: a liquid level adjusting means that can be changed between a lower position and a lower position.

(2) The photosensitive material processing apparatus according to (1) above, comprising a processing liquid flow path connecting the adjacent processing chambers.

In a photosensitive material processing apparatus with such a configuration, a plurality of processing chambers are connected in a substantially horizontal direction and the photosensitive material is transported in the same direction, so the transport path length is short and the size of the apparatus is small.

In addition, a gradient in liquid composition (concentration) is formed in the processing solution in each processing chamber, which increases processing efficiency and reduces the amount of processing solution used (replenishment amount) required to obtain a certain processing effect. reduce

In this case, at least one pair of blades is installed in the passage connecting adjacent processing chambers, so that when the photosensitive material is transferred to the next processing chamber, the surface of the photosensitive material, especially both sides (the emulsion side and its back side) ), the amount of processing liquid carried into the next processing chamber is reduced. Moreover, since the passageway is substantially shielded by the blade, there is little or minimal flow of processing liquid through the passageway.

Therefore, the liquid composition gradient of the processing liquid in each of the processing chambers is maintained.

In addition, when the photosensitive material is not being processed, the liquid level adjustment means is activated to set the level of the processing liquid at a position below the conveyance path of the photosensitive material. The flow of the processing liquid is reliably prevented, and therefore the liquid composition gradient described above when the photosensitive material is not processed is also maintained.

Therefore, even if the treatment body remains stationary for a long time, the above liquid composition gradient is maintained when the next treatment starts, so there is no need to replace or replenish the treatment liquid, and it is equivalent to that during steady operation. Good and stable photographic performance can be obtained.

<Example> Hereinafter, the photosensitive material processing apparatus of the present invention will be described in detail based on a preferred example shown in the accompanying drawings.

FIG. 1 and FIG. 2 are cross-sectional side views each showing an example of the configuration of a photosensitive material processing apparatus of the present invention. As shown in these figures, the photosensitive material processing apparatus 1 includes a processing tank 2, a transport means 5 for transporting the photosensitive material S, and a passage 4a in the processing tank 2.
It is composed of blades 6, 6' installed at points 4e and 4e, and a liquid level adjusting means 8 for changing and adjusting the level of the processing liquid.

Inside the processing tank 2, there are formed four processing chambers 3a, 3b, 3C, and 3d that are connected in a horizontal direction, and passages 4b, 4c, and 4d that communicate between the adjacent processing chambers. Further, a passage 4a communicating the processing chamber 3a with the outside is formed on the left side of FIG. 1, and a passage 4e communicating the processing chamber 3d with the outside is formed on the right side of the figure.

Further, in each of the processing chambers 3a to 3d, a pair of rollers 51 and a guide 52 for guiding the photosensitive material between the rollers 51 and a blade 6 to be described later are installed.

These rollers 51 and guides 52 constitute a conveying means 5 for the photosensitive material S. This conveyance means 5 transports the photosensitive material S into each processing chamber 3a to 3d and into each passage 4.
The objects are transported along a transport path extending in a substantially horizontal direction within a to 4e, and processed during this time.

Such a processing tank 2 can be used for various processing such as developing processing, bleaching processing, fixing processing, bleaching/fixing processing, water washing processing, and stabilization processing, but in the present invention, it is particularly suitable for use in water washing processing. preferable.

Therefore, the water washing process will be representatively explained below.

The processing chamber 3d through which the photosensitive material S passes last is filled with washing water (
A liquid supply lower 1 for supplying the processing liquid (W) is installed, and a liquid draining lower 2 for discharging the cleaning liquid W is installed in the processing chamber 3a through which the photosensitive material S first passes.

As shown in FIG. 1, when processing the photosensitive material S, a small amount (for example, 100 to 500 mβ/m2) of fresh washing water W is replenished from the liquid supply lower 1 into the processing chamber 3d. Then,
The cleaning water W in the processing chamber 3d is transferred to the blade 6, which will be described later.
Adjacent processing chamber 3 through a small gap formed between
In the same manner, the exhausted cleaning water W that flows into the processing chambers 3b and 3a sequentially is discharged from the drain lower 2 by overflow.

In this way, the flow direction of the cleaning water W is opposite to the conveying direction of the photosensitive material S (counterflow), thereby increasing the cleaning efficiency.

In addition, when the processing liquid is a developer, a bleaching liquid, a fixing liquid, or a bleach/fixing liquid, it is preferable to prevent the processing liquid from flowing in order to improve the processing quality.

A gradient is formed in the composition of the wash water W in each processing chamber, that is, the degree of freshness of the wash water is as follows: processing chamber 3d>3c
>3b>3a. It is preferable that such a liquid composition gradient is formed because it contributes to improving cleaning efficiency.

Each of the passages 4a to 4e is narrow enough to allow the photosensitive material S to pass through (for example, about 5 to 30 mm in width), and has an elongated shape in the width direction of the photosensitive material S.

A pair of blades 6 are installed in each of these passages 4a to 4e to shield the passages 48 to 4e.

As shown in an enlarged view in FIG. 4, this blade 6 has a flange portion 61 which does not substantially deform, and a thin C part 62 whose thickness gradually decreases toward the tip and which can be easily deformed by the entry of the photosensitive material S. It consists of

The blades 6 are attached at their flange portions 61 to opposite edges of the passages 4a to 4e on the photosensitive material entrance side by means of fixing devices such as port 63, respectively.

Such a blade 6 is made of, for example, various rubbers such as natural comb, chloroprene rubber, nitrile rubber, butyl rubber, fluororubber, imprene rubber, butadiene rubber, styrene butadiene rubber, ethylene propylene rubber, silicone rubber, soft polyvinyl chloride, It is made of an elastic material (elastomer) such as a soft resin such as polyethylene, polypropylene, ionomer resin, fluororesin, or silicone resin, or a combination of two or more of these.

When the photosensitive material S is not passing through the blade 6, the tips of the thin portions 62 of the blade 6 are in close contact with each other to substantially liquid-tightly shield the first passages 4a to 4e.

When the photosensitive material S passes through, as shown in FIG. It can be expanded.

In this state, the photosensitive material S advances in the direction of the arrow in the figure while both surfaces thereof are in contact with the inner surface of the thin portion 62 and passes through the passages 48 to 4e. At this time, the cleaning water W adhering to the surface of the photosensitive material S (the emulsion surface and its back surface) is wiped off by the thin portion 62 of the blade 6. This significantly reduces the amount of dirty wash water carried into cleaner wash water (upstream processing chamber), contributing to maintaining the liquid composition gradient.

Further, when the photosensitive material S passes through the blades 6 of the passages 4b to 4d, the thin portions 6
A slight gap corresponding to the thickness of the photosensitive material S is created between the two, and the cleaning water W flows through this gap in the order of the processing chamber 3d, the processing chamber 3c, the processing chamber 3b, and the processing chamber 3a.

The flow rate of this cleaning water W is approximately equal to the amount of replenishment of the cleaning water W.

After the photosensitive material S has passed through the passages 4a to 4e, the blade 6 returns to its original state, and the thin parts 62 are brought into close contact with each other.
The passages 4a to 4e are covered again.

In addition, in the illustrated example, the passages 4b, 4c, and 4d include
A pair of blades are installed respectively in the passages 4a and 4.
Two pairs of blades are installed in each of the blades e.
In the passages 4a and 4e, since it is necessary to prevent the cleaning water W from leaking out of the processing tank, two pairs of plates, that is, the pair of blades 6 described above, are fixed to the opposing surfaces in the passages. A pair of similar blades 6' are installed to enhance the sealing effect.

It goes without saying that the number of installed blades is not limited to the illustrated example.

The contact surface pressure between the thin parts 62 of the blade 6.6° is 0.
,005~0,about 1 kg/cm2, especially 0,0
It is preferable to set it as about 5-0.02 kg/cm2.

Further, the length of the contact surfaces between the thin portions 62 in the direction in which the photosensitive material advances when the photosensitive material S does not pass through is preferably about 1 to 20 mm, particularly about 2 to 10 mm.

Thin portion 62 of blade 6.6 relative to the surface of photosensitive material S
The average inclination angle is about 20 to 70', especially 30 to 45'
It is preferable to set it to about .

By setting the contact surface pressure, the contact surface length, and the average inclination angle as described above, the wiping effect of the cleaning water W and the sealing effect of the passages 4a to 4e become higher. In particular, even if the thin wall portion 62 is deformed (for example, wavy deformation),
The elasticity maintains the close contact between the thin-walled portions, so that the wiping effect of the cleaning water W and the sealing effect of the passages 48 to 4e are maintained.

Normally, the adhesion between the thin-walled portions 62 is given by the elastic force of the thin-walled portions, but if a magnetic material is mixed in the thin-walled portions 62 (for example, a rubber magnet), it is possible to It is also possible to provide or increase adhesion by suctioning.

Furthermore, even if the photosensitive material S slides on the thin-walled portion 62, there will hardly be any adverse effects such as scratches on the emulsion surface, but if this cannot be ignored, or if the sliding resistance is to be reduced, This may be achieved by performing a surface treatment such as smoothing the inner surface of the portion 62 or coating the inner surface with a lubricant such as silicone or Teflon.

If the plate 6.6' becomes soiled or deteriorated, it can be easily cleaned or replaced by removing and attaching the fixture.

Note that the shape and attachment position of the blade 6.6° are not limited to the illustrated configuration, and the blade may be attached, for example, to the inner surfaces of the passages 48 to 4e or near the photosensitive material exits of the passages 4a to 4e.

Such a photosensitive material processing apparatus l includes processing chambers 3a to 3.
A liquid level adjusting means 8 is provided which can set the liquid level of the cleaning water W in the cleaning water W at a predetermined position. This will be explained below.

As shown in FIGS. 1 and 2, each processing chamber 38 to 3d
There are holes 81a and 81a through which the cleaning water W flows, respectively, in the lower part of the .
81b, 81c and 81d are formed. Further, air vent holes 82a, 82b, 82c and 82d are provided at the upper part of each processing chamber 3a to 3d, respectively, through which air enters and exits.
is formed.

Further, in the lower part of the processing tank 2 in the figure, there are four extendable bellows bodies 83a, 83b, 83 in which cleaning liquid W is stocked.
c and 83d are installed. These bellows bodies 8
A tube body 84 communicating with the inside of the bellows body is formed projecting from the upper part of each of the bellows 3a to 83d, and the tip of each tube body 84 is connected to the hole 81a to 81d, respectively. As a result, the inside of the processing chambers 38 to 3d and the bellows body 83a are
The inside of d communicates with each other.

Each bellows body 83a to 83d has a stand 85a and 85b, respectively.
, 85c and 85d, and each bellows body 83
The upper end surfaces of a to 83d are held by a holding plate 86.

At the bottom of the numbers 85a to 85d, there are bellows bodies 83a, respectively.
Cylinders 87a, 87b, 87c and 87d operated by hydraulic pressure or the like as a driving source for expanding and contracting the cylinders 87a to 83d are installed, and the pistons 8 of these cylinders 87a to 87c
The tips of 8a, 88b, 88c and 88d are fixed to the lower surfaces of the stands 85a to 85d, respectively.

As shown in FIG. 1, when processing the photosensitive material S, each cylinder 87a to 87d is actuated and each piston 88a to 888 is operated.
d is extended, and each bellows body 83a to 83d is contracted.
As a result, the cleaning water W in each bellows body 83a to 83d is
The liquid is injected into the corresponding processing chambers 3a to 3d through the tubes 84 and holes 81a to 81d, and the liquid level is set at a position above the transport path of the photosensitive material S. In this state, the photosensitive material S is submerged below the liquid surface and can be processed.

Note that as the liquid level in each of the processing chambers 3a to 3d rises, the air that was in each of the processing chambers is removed from the air vent holes 82a to 3d.
It is discharged to the outside of the processing tank from 82d.

As shown in FIG. 2, when the photosensitive material S is not processed, especially when it is not processed for a long time, each cylinder 87a to 87
d to contract each piston 88a to 88d and extend each bellows body 83a to 83d. As a result, the cleaning water W in each processing chamber 38 to 3d is returned to the corresponding bellows body 83a to 83d via the hole 81a to 81d and the pipe body 84, and the liquid level in each processing chamber 3a to 3d is returned to the corresponding bellows body 83a to 83d. The level is set at a position below the transport path of the photosensitive material S.

In addition, as the liquid level in each processing chamber 38 to 3d decreases, outside air flows through each processing chamber 3 through the air vent holes 82a to 82d.
Introduced into 8-3d.

With such a configuration, each processing chamber 3a to 3d
The cleaning water W inside is maintained in an independent state, and no mutual flow of liquid occurs. Therefore, even if the processing body of the photosensitive material remains stationary for a long time, when processing is restarted, the liquid composition gradient between the processing chambers 3a to 3d is maintained, resulting in high cleaning efficiency.

In such a liquid level adjustment means 8, each cylinder 87a-87d may operate|move mutually independently, or may operate|move in conjunction with each other. In this case, the liquid level set above and/or below the conveyance path of the photosensitive material S may be different or equal for each of the processing tanks 3a to 3d.

Moreover, unlike shown in the figure, each bellows body 83a~
83d may be configured to expand and contract.

Further, each of the air vent holes 82a to 82d may be provided with a valve (not shown), and the valve may be opened only when changing the liquid level.

In addition, in the present invention, it goes without saying that the liquid level adjusting means is not limited to the configuration shown in the drawings. For example, the liquid level adjustment means includes a stock tank that stores cleaning water, a pipe that connects the stock tank and the processing chamber, and a liquid pump installed in the middle of this pipe. A pump may be installed in each of the processing chambers 3a to 3d so that the cleaning water in the stock tank can be injected into the processing chamber and drained from the processing chamber by operating a pump.

FIG. 3 is a cross-sectional side view showing another example of the structure of the photosensitive material processing apparatus of the present invention. Photosensitive material processing apparatus 1 shown in the figure
1 is provided with a flow path for washing water that connects adjacent processing chambers, and the other configuration is the same as that of the photosensitive material processing apparatus 1 described above.

That is, the processing chamber 3 is located near the upper part of the processing tank 2 in FIG.
A flow path 9a communicating between a and 3b, a flow path 9b communicating between processing chambers 3b and 30, and a flow path 9C communicating between processing chambers 3C and 3d are formed.

As a result, as shown by the arrow in FIG.
The wash water W that was in the chamber flows into the adjacent processing chamber 3c through the flow path 9C due to overflow, and similarly flows into the processing chambers 3b and 3a sequentially through the flow paths 9b and 9a,
The exhausted wash water W is discharged from the drain lower 2.

In the photosensitive material processing apparatus 1, the cleaning water W is replenished only when the photosensitive material S is processed, that is, when a slight gap is created between the blades 6 due to the passage of the photosensitive material S, and the cleaning water W can flow. However, the third
In the photosensitive material processing apparatus 1 shown in the figure, by providing flow channels 9a to 9C, cleaning liquid W can be replenished regardless of whether the photosensitive material S is being processed or not.

Note that each of the channels 9a to 9c is preferably installed at a height approximately equal to the liquid level set when the photosensitive material S is processed. In this case, in order to maintain the liquid composition gradient in each of the processing chambers 3a to 3d, it is not preferable that flows in the direction opposite to the arrows in the figure be formed in the channels 9a to 9C. Therefore, the flow paths 9a to 9c may be slightly inclined, or the liquid level during processing of the photosensitive material S may be adjusted.
It is preferable to set the height of each processing chamber 3d, 3c, 3b, and 3a in the order of height.

In the present invention, the type of photosensitive material S to be processed is not particularly limited, and examples thereof include color negative film, color reversal film, color photographic paper, color positive film, color reversal photographic paper, photographic material for plate making, and X-ray photographic photosensitive material. Examples include various photosensitive materials such as black and white negative film, black and white photographic paper, and microphotosensitive materials.

Further, the form of the photosensitive material S is not particularly limited, and may be sheet-like,
It may be in the form of a long strip.

Further, the present invention can be applied to, for example, an automatic developing machine, a wet type copying machine,
It can be applied to various photosensitive material processing devices such as printer processors, video printer processors, coin machines for making photo prints, and color paper processing machines for plate inspection.

<Effects of the Invention> According to the photosensitive material processing apparatus of the present invention, the liquid composition gradient of the processing liquid in each processing chamber is well maintained both during processing and during non-processing, so processing efficiency is high, and therefore processing time is reduced. The process can be shortened, the equipment can be made smaller, and the amount of processing liquid refilled can be reduced.
Moreover, the photographic properties of the obtained images are also good.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional side view showing the photosensitive material processing apparatus of the present invention in a processing state, and FIG. 2 is a cross-sectional side view showing the same apparatus in a non-processing state. FIG. 3 is a cross-sectional side view showing another example of the structure of the photosensitive material processing apparatus of the present invention. FIG. 4 is an enlarged cross-sectional side view showing an example of the configuration of the blade in the present invention. Explanation of symbols 1.1''...Photosensitive material processing device 2...Processing tanks 3a, 3b, 3c, 34a, 4b, 4C14 5...Transporting means 51...Rollers 52...Guides 6. 6゛...Blade 61...Flange part 62...Thin wall part 63...Bolt 71...Liquid supply port d...Processing chamber d, 4e...Passage 72...Drain port 8... Liquid level adjustment means 81a, 81b, 81c, 82a, 82b, 82c, 83a, 83b, 83c, 84... Pipe body 85a, 85b, 85c, 86... Pressing plate 87a, 87b, 87c , 88a, 88b, 88c, 9a, 9b, 9c --- Channel S... Photosensitive material W... Washing water 81d... Hole 2d... Air vent hole 83d... Bellows body 85d...・Base 87d...Cylinder 88d...Piston Patent Attorney Osamu Hitofuji Photo Film Co., Ltd.

Claims (2)

[Claims] (1) A processing tank having a plurality of processing chambers connected in a substantially horizontal direction via passages, and a substantially horizontal conveyance path installed within the processing tank to carry the photosensitive material within each of the processing chambers and each of the passages. a conveying means for conveying the photosensitive material along the conveying path; at least a pair of blades installed in each of the passages so as to shield the passages; 1. A photosensitive material processing apparatus comprising: a liquid level adjusting means that can be changed between a lower position and a lower position. (2) The photosensitive material processing according to claim 1, further comprising a processing liquid flow path connecting the adjacent processing chambers.