JPH0426122A - Method and apparatus for drying high integration work after washing - Google Patents
Method and apparatus for drying high integration work after washingInfo
- Publication number
- JPH0426122A JPH0426122A JP13157090A JP13157090A JPH0426122A JP H0426122 A JPH0426122 A JP H0426122A JP 13157090 A JP13157090 A JP 13157090A JP 13157090 A JP13157090 A JP 13157090A JP H0426122 A JPH0426122 A JP H0426122A
- Authority
- JP
- Japan
- Prior art keywords
- dry air
- washing
- dew point
- highly integrated
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 title claims abstract description 43
- 238000005406 washing Methods 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims description 7
- 230000010354 integration Effects 0.000 title abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 51
- 238000004140 cleaning Methods 0.000 claims description 2
- 230000008016 vaporization Effects 0.000 claims description 2
- 238000009834 vaporization Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は水洗浄後の高集積度ワークの乾燥方法及び装置
に係わり、更に詳しくは低い露点を持つ乾燥空気を利用
することによって、その乾燥速度をより早くすることが
できる水洗浄後の高集積度ワークの乾燥方法及び装置に
関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method and apparatus for drying highly integrated workpieces after washing with water, and more particularly, the present invention relates to a drying method and apparatus for highly integrated workpieces after washing with water, and more specifically, the present invention relates to a drying method and apparatus for drying highly integrated workpieces after washing with water. The present invention relates to a method and apparatus for drying highly integrated workpieces after water washing, which can speed up the drying process.
周知の通り1表面に他の部材が搭載又は実装されていて
、その単位面積当りの密度が高い高集積度ワークは、そ
の性質上汚れやほこり等の付着を嫌う為、しばしば水洗
浄が行われている。そして上記水洗浄後の高集積度ワー
クの各部材の密着部分には水分が残留しており、そのま
ま放置しておくと、腐食等の不具合が生じるので、それ
を防止する為に高集積度ワークを水洗浄した後、密着部
分に残留している水分を除去し、乾燥させる必要がある
。そしてその為に従来は水洗浄後の高集積度ワークを熱
風にさらすことにより、密着部分に残留している水分を
加熱し、蒸発させることによって除去し、水洗浄後の高
集積度ワークを乾燥させるものであった・
〔発明が解決しようとする課題〕
上記従来の技術は、水洗浄後の高集積度ワークの密着部
分に残留している水分を熱風によって加熱し、蒸発させ
るものであるが、高集積度ワーク自体及び密着部分に残
留している水分がある程度の湿度に達しないと水分が蒸
発しないので、乾燥に長時間を要してしまうという不具
合が生じており、またそれを補う為に熱風の温度を高く
することは、高集積度ワークの耐熱性の面を考慮すると
必ずしも好ましいものではなく、よって水洗浄後の高集
積度ワークの乾燥時間を短くすることは困難であった。As is well known, highly integrated workpieces that have other components mounted or mounted on one surface and have a high density per unit area are often washed with water because they do not like dirt or dust to adhere to them due to their nature. ing. Moisture remains in the close contact parts of each component of the highly integrated workpiece after water washing, and if left as is, problems such as corrosion will occur, so in order to prevent this, the highly integrated workpiece After washing with water, it is necessary to remove any remaining moisture from the contact area and dry it. For this purpose, conventionally, the highly integrated workpiece after water washing is exposed to hot air to heat and evaporate the moisture remaining in the adhering parts, and then the highly integrated workpiece after water washing is dried. [Problem to be solved by the invention] The above-mentioned conventional technology uses hot air to heat and evaporate the moisture remaining in the close contact parts of highly integrated workpieces after washing with water. , the moisture remaining in the highly integrated workpiece itself and the parts that are in close contact with each other does not evaporate unless it reaches a certain level of humidity, resulting in the problem that it takes a long time to dry. Increasing the temperature of the hot air is not necessarily preferable in consideration of the heat resistance of highly integrated workpieces, and therefore it has been difficult to shorten the drying time of highly integrated workpieces after washing with water.
よって本発明の目的とする所は上述の如き従来の技術の
有する問題点を解決するものであって、水洗浄後の高集
積度ワークの密着部分に残留している水分を短時間で除
去でき、よって水洗浄後の高集積度ワークの乾燥が短時
間で行える水洗浄後の高集積度ワークの乾燥方法及び装
置を提供することにある。Therefore, an object of the present invention is to solve the problems of the conventional techniques as described above, and to remove moisture remaining in the close contact areas of highly integrated workpieces after washing with water in a short period of time. Therefore, it is an object of the present invention to provide a method and apparatus for drying a highly integrated work after washing with water, which can dry the highly integrated work after washing with water in a short time.
上記目的を達成する為に本発明は次の技術的手段を有す
る。即ち実施例に対応する添付図面に使用した符号を用
いて説明すると、水洗浄後の高集積度ワークを密閉した
部屋に閉じ込め、その状態で上記密閉した部屋内に低い
露点を持つ乾燥空気を通し、上記水洗浄後の高集積度ワ
ークの密着部分に残留している水分を上記低い露点を持
つ乾燥空気中に水蒸気化させて除去し、水洗浄後の高集
積度ワークを乾燥させることを特徴とする水洗浄後の高
集積度ワークの乾燥方法であり、順次送られてくる水洗
浄後の高集積度ワーク1の1つ又は複数を開いた状態で
入れることができ、その1つ又は複数を1つの単位ごと
に閉じ込める様に構成された乾燥装置本体2より成り、
上記乾燥装置本体2の中に低い露点を持つ乾燥空気を供
給、排気できる手段を持つことを特徴とする水洗浄後の
高集積度ワークの乾燥装置である。In order to achieve the above object, the present invention has the following technical means. That is, to explain using the reference numerals used in the attached drawings corresponding to the embodiments, a highly integrated workpiece after washing with water is confined in a sealed room, and in that state, dry air with a low dew point is passed through the sealed room. , the moisture remaining in the close contact portion of the highly integrated workpiece after water washing is removed by vaporizing it in the dry air having a low dew point, and the highly integrated workpiece after water washing is dried. This is a drying method for highly integrated workpieces after water washing, in which one or more of the highly integrated workpieces 1 after water washing that are sent sequentially can be placed in an open state, and one or more of them can be placed in an open state. It consists of a drying device main body 2 configured to confine each unit of
This drying apparatus for highly integrated workpieces after washing with water is characterized by having means for supplying and exhausting dry air having a low dew point into the drying apparatus main body 2.
本発明は上記技術的手段より成るので、水洗浄後の高集
積度ワークは、密閉された部屋に閉じ込められた後、低
い露点を持つ乾燥空気にさらされる。このとき密着部分
に残留している水分は、上記低い露点を持つ乾燥空気に
接触することにより水蒸気化していくので残留している
水分の表面から次々と水蒸気化して蒸発していくことと
なり、よって低い露点を持つ乾燥空気を密閉した部屋内
に通した瞬間から水洗浄後の高集積度ワークの密着部分
に残留している水分の除去が行われるので、水洗浄後の
高集積度ワークの乾燥が速やかに行われ、乾燥時間を短
縮することができるものである。そして、順次送られて
くる1つ又は複数の水洗浄後の高集積度ワーク1を1つ
又は複数の1単位ごとに収容できる様構成した乾燥装置
本体2に低い露点を持つ乾燥空気を供給、排気できる手
段を設けることにより、上述の如き水洗浄後の高集積度
ワークlの乾燥を行うことができる水洗浄後の高集積度
ワークの乾燥装置を提供できるものであり、しかも上記
水洗浄後の高集積度ワークの乾燥は短時間で行えるので
、順次送られてくる水洗浄後の高集積度ワークlを効率
よく乾燥させることができるものである。Since the present invention comprises the above-mentioned technical means, the highly integrated work after water cleaning is confined in a closed room and then exposed to dry air with a low dew point. At this time, the moisture remaining in the adhering area becomes water vapor when it comes into contact with the dry air with the low dew point mentioned above, so the remaining moisture gradually turns into water vapor and evaporates from the surface. As soon as dry air with a low dew point is passed through the closed room, moisture remaining in the close contact areas of highly integrated workpieces after washing with water is removed, making it possible to dry highly integrated workpieces after washing with water. This can be done quickly and the drying time can be shortened. Then, dry air with a low dew point is supplied to the drying device main body 2, which is configured to accommodate one or more highly integrated works 1 that have been sequentially sent after being washed with water, one or more units at a time, By providing a means for evacuation, it is possible to provide a drying apparatus for highly integrated workpieces after water washing, which is capable of drying the highly integrated workpiece l after water washing as described above. Since it is possible to dry the highly integrated work pieces 1 in a short time, it is possible to efficiently dry the highly integrated works l that are sequentially sent after being washed with water.
以下、本発明の実施例を添付図面に基づき詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
第1図、第2図に示した様に、水洗浄後の高集積度ワー
クlの乾燥装置は、乾燥装置本体2とコンベア部15よ
り成り、上記乾燥装置本体2は−Eブタ3と下受皿4よ
り構成されており、上記上ブタ3にはスリット5が設け
られており、低い露点を持つ乾燥空気を供給、排気する
為の乾燥空気供給口8及び乾燥空気排気口9と連接して
いることにより、乾燥空気の供給、排気状態を良好なも
のとしている。さらに上記Lブタ3の」一方にはスライ
ド軸6が設けられており、スライド軸6をシリンダー等
によって上下動させることにより乾燥装置本体2の開閉
を行うものである。そして、上記コンベア部15は、コ
ンベア架台14と上記コンベア架台14に設けられた軸
受11に支持され搬送用コロ10を配設した軸12より
成り、上記軸12の一方端に設けられたスプロケット1
3をチェーンを介して回転させることにより水洗浄後の
高集積度ワークlを搬送するものである。As shown in FIGS. 1 and 2, the drying device for highly integrated work l after washing with water consists of a drying device main body 2 and a conveyor section 15. The upper lid 3 is provided with a slit 5, which is connected to a dry air supply port 8 and a dry air exhaust port 9 for supplying and exhausting dry air with a low dew point. This ensures good dry air supply and exhaust conditions. Further, a slide shaft 6 is provided on one side of the L lid 3, and the drying apparatus body 2 is opened and closed by moving the slide shaft 6 up and down using a cylinder or the like. The conveyor section 15 is made up of a conveyor pedestal 14 and a shaft 12 supported by a bearing 11 provided on the conveyor pedestal 14 and provided with conveying rollers 10, and a sprocket 1 provided at one end of the shaft 12.
3 is rotated via a chain to transport highly integrated workpieces l after being washed with water.
次にその使用例を説明する。Next, an example of its use will be explained.
コンベア部15によって搬送されてきた水洗浄後の高集
積度ワークlは乾燥装置本体2内に収容される位置で一
旦停止させられ、上ブタ3が下降してくることによって
第3図に示した様に乾燥装置本体2内に閉じ込められる
。このとき、」1記乾燥装置本体2は下受皿4及びコン
ベア架台14に設けられたOリング7によって完全に密
閉される。そして低い露点を持つ乾燥空気を乾燥空気供
給口8から供給し、乾燥空気排気口9から排気すること
によって水洗浄後の高集積度ワークlを低い露点を持つ
乾燥空気にさらし、密着部分に残留している水分を除去
するものである。そして、上記低い露点を持つ乾燥空気
は、密着部分に残留している水分に接触した際、その接
触面から次々に水分を水蒸気化させて除去していくので
短時間で残留水分の除去ができ乾燥を終了させることが
できるものである。更に、このとき、上記低い露点を持
つ乾燥空気はスリット5を介して供給、排気されるので
、乾燥装置本体2内を充分に循環、対流することができ
、より効率よく残留水分の除去が行われるものである。The highly concentrated work l after being washed with water and conveyed by the conveyor section 15 is temporarily stopped at a position where it is accommodated in the drying device body 2, and the upper lid 3 descends to form the work l shown in FIG. 3. It is trapped inside the drying device main body 2 in the same way. At this time, the main body 2 of the drying device 1 is completely sealed by the O-ring 7 provided on the lower tray 4 and the conveyor frame 14. Then, by supplying dry air with a low dew point from the dry air supply port 8 and exhausting the air from the dry air exhaust port 9, the highly integrated work l after water washing is exposed to the dry air with a low dew point, which remains in the contact area. This removes the moisture that is present. When the dry air with the low dew point mentioned above comes into contact with moisture remaining in the close contact area, it gradually vaporizes and removes the moisture from the contact surface, so the residual moisture can be removed in a short time. It is possible to finish drying. Furthermore, at this time, the dry air having the low dew point is supplied and exhausted through the slit 5, so that it can be sufficiently circulated and convected within the drying device main body 2, and residual moisture can be removed more efficiently. It is something that can be done.
そして、上記低い露点を持つ乾燥空気として、露点が一
30℃の乾燥空気を用いることにより、水洗浄後の高集
積度ワーク1の乾燥が短時間で行えることに加えて、比
較的容易に乾燥空気を得ることができるものである。By using dry air with a dew point of 130°C as the dry air with a low dew point, the highly integrated workpiece 1 can be dried in a short time after being washed with water, and can be dried relatively easily. It is something that allows you to get some air.
そして、水洗浄後の高集積度ワーク1の乾燥が終了後−
Lブタ3を上方へ移動させ、乾燥装置本体2を開放し、
高集積度ワークlを図中矢印り方向へ移動させ、水洗浄
後の高集積度ワーク1の乾燥作業が終了する。そしてL
記動作を繰り返すことによってj順次送られてくる水洗
浄後の高集積度ワークlの乾燥を行うものである。尚、
本実施例では高集積度ワーク1として電気・電子部品を
実装したプリント基板の場合を示したがこれに限らず、
その搬送方法もコンベア方式の場合を示したがこれに限
られるものではない。After the drying of the highly integrated workpiece 1 after washing with water is completed, -
Move the L pig 3 upwards, open the drying device main body 2,
The highly integrated workpiece 1 is moved in the direction indicated by the arrow in the figure, and the drying work of the highly integrated workpiece 1 after washing with water is completed. And L
By repeating the above-mentioned operations, the highly integrated workpieces 1 that have been washed with water and are sent successively are dried. still,
In this embodiment, a printed circuit board with electrical/electronic components mounted thereon is shown as the highly integrated work 1, but the invention is not limited to this.
The conveyance method is also shown as a conveyor system, but it is not limited to this.
以上詳述した如く、本発明によると次の様な効果を奏す
る。As detailed above, the present invention provides the following effects.
即ち請求項第1項によると、水洗浄後の高集積度ワーク
を密閉した部屋に閉じ込めると共に、低い露点を持つ乾
燥空気にさらし、低い露点を持つ乾燥空気が水分と接触
した際、その水分を接触部位すなわち表面から水蒸気と
して次々と除去して行く性質を利用することによって熱
風では短時間に除去し得なかった水洗浄後の高集積度ワ
ークの密着部分の残留水分を短時間で除去することがで
きるものである。そして請求項第2項によると。That is, according to claim 1, a highly integrated workpiece after washing with water is confined in a closed room and exposed to dry air with a low dew point, and when the dry air with a low dew point comes into contact with moisture, the moisture is removed. By taking advantage of the property of water vapor being removed one after another from the contact area, that is, from the surface, residual moisture that could not be removed in a short time with hot air can be removed in a short time from the close contact areas of highly integrated workpieces after washing with water. It is something that can be done. And according to claim 2.
上記低い露点を持つ乾燥空気の霜点を一30℃とするこ
とによって水洗浄後の高集積度ワークの乾燥が短時間で
行えると共に、比較的容易に乾燥空気を?’)ることが
できるものである、さらに請求項第3項によると、順次
送られてくる1つ又は複数の水洗浄後の高集積度ワーク
を1つ又は複数の1単位ごとに収容できる様、構成した
乾燥装置本体2に低い露点を持つ乾燥空気を供給、排気
できる手段を設けることによって短時間に、しかも効率
良く水洗浄後の高集積度ワークの乾燥を行える水洗浄後
の高集積度ワークの乾燥装置を提供できる。By setting the frost point of the dry air with the low dew point to -30°C, highly integrated workpieces can be dried in a short time after washing with water, and the dry air can be relatively easily dried. Further, according to claim 3, it is possible to accommodate one or more highly integrated workpieces that have been sequentially sent after being washed with water, one or more units. By providing a means for supplying and exhausting dry air with a low dew point to the drying device main body 2 configured as above, it is possible to quickly and efficiently dry high-density workpieces after washing with water. We can provide workpiece drying equipment.
加えて請求項第4項によると低い霜点を持つ乾燥空気の
露点を一30℃とすることによって、水洗浄後の高集積
度ワークの乾燥が短時間で行えると共に比較的容易に乾
燥空気を得ることができるものである。In addition, according to claim 4, by setting the dew point of the dry air having a low frost point to -30°C, highly integrated workpieces can be dried in a short time after being washed with water, and the dry air can be relatively easily dried. It is something that can be obtained.
添付図面は本発明の実施例を示しており、第1図は乾燥
装置の構成を示す全体断面図、第2図は第1図に於ける
A−A ′線に沿う断面図を示しており、第3図は、第
2r!!Jに於て、乾燥装置本体を密閉した状態を示す
断面図を示している。
尚、図中符号は、
1 、、、、高集積度ワーク 2 、、、、乾燥装置
本体3 、、、、上ブタ 4 、、、、下受
皿5 、、、、スリット 6 、、、、スラ
イド軸7、、、.0リング
8 、、、、乾燥空気供給口
9 、、、、乾燥空気排気口 10.、、、搬送用コ
ロ11、、、、軸受 12.、、、軸13
・・・・スプロケット 14.、、、コンベア架台
15、、、、コンベア部
をそれぞれ示す。
代理人 弁理士 池 1) 宏男
図The attached drawings show an embodiment of the present invention, and FIG. 1 is an overall sectional view showing the structure of the drying device, and FIG. 2 is a sectional view taken along line A-A' in FIG. 1. , Figure 3 shows the 2nd r! ! J shows a sectional view showing the drying device main body in a sealed state. The symbols in the figure are: 1, Highly integrated workpiece 2, Drying device main body 3, Upper lid 4, Lower tray 5, Slit 6, Slide Axis 7... 0 ring 8, dry air supply port 9, dry air exhaust port 10. ,,,conveying roller 11,,,,bearing 12. ,,,axis 13
...Sprocket 14. , , conveyor pedestal 15 , . . . conveyor sections are shown, respectively. Agent Patent Attorney Ike 1) Hiroozu
Claims (4)
込め、その状態で上記密閉した部屋内に低い露点を持つ
乾燥空気を通し、上記水洗浄後の高集積度ワークの密着
部分に残留している水分を上記低い露点を持つ乾燥空気
中に水蒸気化させて除去し、水洗浄後の高集積度ワーク
を乾燥させることを特徴とする水洗浄後の高集積度ワー
クの乾燥方法。(1) Confining the highly integrated workpiece after washing with water in a sealed room, and passing dry air with a low dew point through the sealed room, the residue remains on the close contact parts of the highly integrated workpiece after washing with water. A method for drying a highly integrated workpiece after being washed with water, characterized in that the moisture contained in the workpiece is removed by vaporization in dry air having a low dew point, and the highly integrated workpiece after being washed with water is dried.
あることを特徴とする請求項第1項記載の水洗浄後の高
集積度ワークの乾燥方法。(2) The method for drying highly integrated workpieces after washing with water according to claim 1, wherein the drying air having a low dew point has a dew point of -30°C.
1つ又は複数を開いた状態で入れることができ、その1
つ又は複数を1つの単位ごとに閉じ込める様に構成され
た乾燥装置本体2より成り、上記乾燥装置本体2の中に
低い露点を持つ乾燥空気を供給、排気できる手段を持つ
ことを特徴とする水洗浄後の高集積度ワークの乾燥装置
。(3) One or more of the high-integration workpieces 1 that have been sequentially sent after water washing can be placed in an open state, and that 1
The drying device main body 2 is configured to confine one or a plurality of dry air in one unit, and the drying device main body 2 is provided with means for supplying and exhausting dry air having a low dew point. Drying device for highly integrated workpieces after cleaning.
点を持つ乾燥空気の露点が−30℃であることを特徴と
する請求項第3項記載の水洗浄後の高集積度ワークの乾
燥装置。(4) The highly integrated workpiece after water washing according to claim 3, characterized in that the drying air with a low dew point supplied and exhausted into the drying device main body 2 has a dew point of -30°C. drying equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13157090A JPH0426122A (en) | 1990-05-22 | 1990-05-22 | Method and apparatus for drying high integration work after washing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13157090A JPH0426122A (en) | 1990-05-22 | 1990-05-22 | Method and apparatus for drying high integration work after washing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0426122A true JPH0426122A (en) | 1992-01-29 |
Family
ID=15061152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13157090A Pending JPH0426122A (en) | 1990-05-22 | 1990-05-22 | Method and apparatus for drying high integration work after washing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0426122A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60164329A (en) * | 1984-02-06 | 1985-08-27 | Nec Corp | Drying method for semiconductor substrate |
| JPS63102234A (en) * | 1986-10-17 | 1988-05-07 | Mitsubishi Electric Corp | Method of drying wafer |
| JPS63222433A (en) * | 1987-03-11 | 1988-09-16 | Mitsubishi Electric Corp | Freeze vacuum drying method |
| JPH0227972A (en) * | 1988-07-14 | 1990-01-30 | Nippon Hiryo Kk | Low-temperature quick drying of food |
| JPH02104535A (en) * | 1988-10-13 | 1990-04-17 | Dai Ichi Kogyo Seiyaku Co Ltd | Dehydration and drying of reactive monomers |
| JPH04277236A (en) * | 1991-03-05 | 1992-10-02 | Tokyu Constr Co Ltd | Joint structure of multiple tube type steel pipe concrete pillar and beam |
-
1990
- 1990-05-22 JP JP13157090A patent/JPH0426122A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60164329A (en) * | 1984-02-06 | 1985-08-27 | Nec Corp | Drying method for semiconductor substrate |
| JPS63102234A (en) * | 1986-10-17 | 1988-05-07 | Mitsubishi Electric Corp | Method of drying wafer |
| JPS63222433A (en) * | 1987-03-11 | 1988-09-16 | Mitsubishi Electric Corp | Freeze vacuum drying method |
| JPH0227972A (en) * | 1988-07-14 | 1990-01-30 | Nippon Hiryo Kk | Low-temperature quick drying of food |
| JPH02104535A (en) * | 1988-10-13 | 1990-04-17 | Dai Ichi Kogyo Seiyaku Co Ltd | Dehydration and drying of reactive monomers |
| JPH04277236A (en) * | 1991-03-05 | 1992-10-02 | Tokyu Constr Co Ltd | Joint structure of multiple tube type steel pipe concrete pillar and beam |
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