JPH0426342U - - Google Patents

Info

Publication number
JPH0426342U
JPH0426342U JP6671490U JP6671490U JPH0426342U JP H0426342 U JPH0426342 U JP H0426342U JP 6671490 U JP6671490 U JP 6671490U JP 6671490 U JP6671490 U JP 6671490U JP H0426342 U JPH0426342 U JP H0426342U
Authority
JP
Japan
Prior art keywords
sample
sample plate
surrounds
airtight
case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6671490U
Other languages
English (en)
Other versions
JP2559622Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990066714U priority Critical patent/JP2559622Y2/ja
Publication of JPH0426342U publication Critical patent/JPH0426342U/ja
Application granted granted Critical
Publication of JP2559622Y2 publication Critical patent/JP2559622Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【図面の簡単な説明】
第１図は本考案の一実施例の試料低温装置の縦
断面図、第２図は第１図における−線に沿う
断面図である。 Ｓ……試料、１……試料板、２……冷却手段、
３……ラジエーシヨンシールド、４……気密ケー
ス、１３……シールド本体、１３ｂ……開口部、
１４……窓部材、１７……ケース本体、１７ａ…
…開口部、１８……窓部材、Ｗ……Ｘ線照射窓。

Claims (1)

  1. 【実用新案登録請求の範囲】 試料を支持する試料板と、該試料板上の試料を
    冷却する冷却手段と、前記試料板の周囲を囲つて
    冷却効果を高めるラジエーシヨンシールドと、該
    ラジエーシヨンシールドの周囲を囲つて内部を気
    密に保持する気密ケースとを具備し、前記気密ケ
    ース上には前記試料板に支持された試料にＸ線を
    照射するためのＸ線照射窓が装備された構成をな
    して、低温での試料のＸ線回折線の変化の測定に
    使用される試料低温装置であつて、 前記気密ケースは、略筒状をなすとともにその
    周壁の前記Ｘ線照射窓を設けるべき位置を開口部
    としたケース本体と、前記開口部を覆つて前記Ｘ
    線照射窓を提供する窓部材とを備えた構成とし、 前記窓部材は、前記ケース本体の開口部を開閉
    可能に、該ケース本体の周壁に摺動可能に取り付
    けたことを特徴とした試料低温装置。
JP1990066714U 1990-06-22 1990-06-22 試料低温装置 Expired - Fee Related JP2559622Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990066714U JP2559622Y2 (ja) 1990-06-22 1990-06-22 試料低温装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990066714U JP2559622Y2 (ja) 1990-06-22 1990-06-22 試料低温装置

Publications (2)

Publication Number Publication Date
JPH0426342U true JPH0426342U (ja) 1992-03-02
JP2559622Y2 JP2559622Y2 (ja) 1998-01-19

Family

ID=31599657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990066714U Expired - Fee Related JP2559622Y2 (ja) 1990-06-22 1990-06-22 試料低温装置

Country Status (1)

Country Link
JP (1) JP2559622Y2 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136149A (en) * 1981-02-18 1982-08-23 Rigaku Denki Kk Device for supporting low temperature sample in x ray diffraction device
JPS58167439U (ja) * 1982-04-30 1983-11-08 株式会社島津製作所 試料導入装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136149A (en) * 1981-02-18 1982-08-23 Rigaku Denki Kk Device for supporting low temperature sample in x ray diffraction device
JPS58167439U (ja) * 1982-04-30 1983-11-08 株式会社島津製作所 試料導入装置

Also Published As

Publication number Publication date
JP2559622Y2 (ja) 1998-01-19

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