JPH04272183A - Method of forming insulating film on low temperature baked grain oriented electrical steel sheet excellent in iron-core workability - Google Patents
Method of forming insulating film on low temperature baked grain oriented electrical steel sheet excellent in iron-core workabilityInfo
- Publication number
- JPH04272183A JPH04272183A JP3483391A JP3483391A JPH04272183A JP H04272183 A JPH04272183 A JP H04272183A JP 3483391 A JP3483391 A JP 3483391A JP 3483391 A JP3483391 A JP 3483391A JP H04272183 A JPH04272183 A JP H04272183A
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- weight
- parts
- insulating film
- forming
- steel sheet
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- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は鉄心加工性および磁気特
性の優れた低温焼付け方向性電磁鋼板絶縁被膜形成方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an insulating coating on a grain-oriented electrical steel sheet by low temperature baking, which has excellent core workability and magnetic properties.
【0002】0002
【従来の技術】方向性電磁鋼板はSiを例えば2〜4%
含有する珪素鋼スラブを熱間圧延し、焼鈍した後1回或
いは中間焼鈍を挟む2回以上の冷間圧延を施して最終板
厚し、次いで脱炭焼鈍し、鋼板表面にSiO2 主体の
酸化膜を形成後、MgOを主成分とする焼鈍分離剤を塗
布し、仕上焼鈍を施してゴス方位を持つ2次再結晶を発
達させ、さらにS,N等の不純物を除去すると共にフォ
ルステライト(Mg2 SiO4 )主体のグラス皮膜
を形成し、次いで絶縁皮膜形成用コーティング剤を塗布
し、焼付け処理を行って製品とされる。[Prior art] Grain-oriented electrical steel sheets contain, for example, 2 to 4% Si.
After hot rolling and annealing the containing silicon steel slab, it is cold rolled once or twice or more with intermediate annealing to obtain the final thickness, and then decarburized and annealed to form an oxide film mainly composed of SiO2 on the surface of the steel sheet. After forming, an annealing separator mainly composed of MgO is applied, and final annealing is performed to develop secondary recrystallization with Goss orientation. Furthermore, impurities such as S and N are removed, and forsterite (Mg2 SiO4 ) A main glass film is formed, then a coating agent for forming an insulating film is applied, and a baking process is performed to produce a product.
【0003】また、鉄損をより改善することを目的とし
て、仕上焼鈍後あるいは前に、方向性電磁鋼板の表面に
微細な線状歪を間隔を置いて付与し、磁区細分化するこ
とが行われている(特開昭53−137016号公報、
特開昭56−51522号公報)。前記、線状歪が絶縁
皮膜形成後になされた場合、皮膜が局所的に損傷するこ
とがあるため、防錆、絶縁の目的で再度絶縁皮膜形成用
コーティング剤を塗布し、線状歪による鉄損改善効果が
消失しない程度の低温度で焼付け処理される。[0003] Furthermore, for the purpose of further improving iron loss, fine linear strain is applied to the surface of grain-oriented electrical steel sheets at intervals to refine the magnetic domains after or before final annealing. (Japanese Unexamined Patent Publication No. 137016/1983,
(Japanese Unexamined Patent Publication No. 56-51522). As mentioned above, if linear strain occurs after the insulation film is formed, the film may be locally damaged, so a coating agent for forming the insulation film is applied again for rust prevention and insulation purposes, and iron loss due to linear strain is avoided. Baking treatment is carried out at a low temperature that does not reduce the improvement effect.
【0004】ところで、方向性電磁鋼板は主としてトラ
ンス、電気機器の鉄心材料として用いられるが、鉄心製
造の際には所定幅にスリット、剪断或いは打ち抜き加工
した材料を連続的に巻加工したり、積層して巻鉄心や積
鉄心として使用される。巻鉄心の場合には巻加工、圧縮
成型、歪取り焼鈍を経てレーシングと呼ばれる巻線作業
の後、ケースに入れてトランスとされる。積鉄心の場合
には主に手作業により鉄心を組立て、巻線作業を行って
トランスとされる。Incidentally, grain-oriented electrical steel sheets are mainly used as core materials for transformers and electrical equipment, but when manufacturing the core, the material is slit, sheared, or punched to a predetermined width and then continuously wound or laminated. It is used as a wound core or stacked core. In the case of a wound core, it goes through winding, compression molding, strain relief annealing, and a winding process called lacing, which is then put into a case and used as a transformer. In the case of stacked cores, the cores are assembled by hand and then wound to form a transformer.
【0005】鉄心製造においては、例えば巻鉄心の場合
には皮膜の潤滑性が良く、巻加工、成型作業が円滑に行
え、且つ成型後の鋼板端面やラップ部に凹凸を生ぜず、
形状が優れていることが重要である。積鉄心の場合絶縁
性等の皮膜特性のほかに需要家での加工段階でのコイル
表面の絶縁皮膜が搬送ロール等の負荷荷重下での接触や
剪断時に剥離や発粉しない強度を有することが要求され
る。In the manufacture of iron cores, for example, in the case of wound iron cores, the coating has good lubricity, allowing smooth winding and forming operations, and does not cause unevenness on the end face or lap portion of the steel plate after forming.
It is important that the shape is good. In the case of stacked iron cores, in addition to film properties such as insulation, the insulation film on the surface of the coil during the processing stage at the customer has a strength that prevents it from peeling or pulverizing when it comes into contact with or shears under the load of transport rolls, etc. required.
【0006】特に従来の方向性電磁鋼板の絶縁皮膜形成
用コーティング剤としては皮膜張力、絶縁性、耐食性等
の問題からコロイダルシリカ−リン酸塩−クロム酸塩系
或いはリン酸塩単独系のものが主として使用されている
。この皮膜成分のクロム化合物、リン化合物のトランス
加工工程での発粉や皮膜剥離による作業環境への影響を
回避するため、皮膜特性を改善することによって絶縁皮
膜の発粉、剥離を防止すべく絶縁皮膜形成用コーティン
グ剤の開発や皮膜形成法の開発が望まれている。In particular, conventional coating agents for forming an insulating film on grain-oriented electrical steel sheets include colloidal silica-phosphate-chromate-based or phosphate-based coatings due to problems such as film tension, insulation, and corrosion resistance. Mainly used. In order to avoid the impact on the working environment due to powdering and film peeling during the transformer processing process of the chromium compounds and phosphorus compounds that are the components of this film, the insulation film is insulated to prevent powdering and peeling of the insulation film by improving the film properties. Development of coating agents for film formation and development of film formation methods are desired.
【0007】絶縁皮膜形成用コーティング剤の改良によ
って皮膜の性状を改良する手段としては、例えば特開昭
61−4773号公報にはコーティング剤としてAl,
Mg等の第1リン酸塩に粒子径8nm以下の超微粒子コ
ロイダルシリカとクロム酸、クロム酸塩の1種或いは2
種以上を配合した混合液を仕上焼鈍後の鋼板に塗布し、
焼付け処理することによって絶縁皮膜のすべり性を改善
する技術が開示されている。As a means of improving the properties of the film by improving the coating agent for forming an insulating film, for example, Japanese Patent Application Laid-Open No. 61-4773 discloses that Al, Al,
Primary phosphate such as Mg, ultrafine colloidal silica with a particle size of 8 nm or less, chromic acid, or one or both of chromates.
A mixed solution containing more than 10% of the above ingredients is applied to the steel plate after finish annealing,
A technique has been disclosed for improving the slipperiness of an insulating film through baking treatment.
【0008】これらの絶縁皮膜の改善によって方向性電
磁鋼板の鉄損、磁気歪、絶縁特性と共に皮膜の潤滑性が
改良され、その結果、鉄心加工時の作業性や皮膜の発粉
、剥離現象を改善する効果が得られている。しかし、製
品にレーザー等で線状歪を付与し、低鉄損化し、低温度
で再度絶縁皮膜の焼付け処理を行う低鉄損方向性電磁鋼
板においては、線状歪による鉄損改善効果の保持のため
焼付け処理は500℃以下のような低温度で行わなけれ
ばならず、そのため前述の従来の絶縁皮膜形成用コーテ
ィング剤では皮膜形成が十分に完了していないので、絶
縁皮膜の強度(硬度)が十分ではない。[0008] These improvements in the insulation coating improve the iron loss, magnetostriction, and insulation properties of grain-oriented electrical steel sheets, as well as the lubricity of the coating.As a result, the workability during core processing and the phenomenon of powdering and peeling of the coating are improved. An improvement effect has been obtained. However, in low-core-loss grain-oriented electrical steel sheets, in which linear strain is applied to the product using a laser, etc. to reduce core loss, and the insulation film is baked again at a low temperature, the effect of improving core loss due to linear strain can be maintained. Therefore, the baking process must be performed at a low temperature of 500°C or less, and therefore, the film formation is not fully completed with the conventional coating agent for forming an insulating film, so the strength (hardness) of the insulating film is not enough.
【0009】この結果、後の加工工程で絶縁皮膜に疵が
生じ易く、発粉や剥離現象により作業環境汚染の問題を
生じたり、表面疵による特性劣化等の問題を生じる。こ
のため、本発明の対象である超低鉄損化された方向性電
磁鋼板の場合、製作されるトランスにおいて十分に特性
を発揮させるための一つの手段として、絶縁皮膜特性の
向上による鉄心加工性を一層の向上を図ることが重要で
ある。[0009] As a result, flaws are likely to occur in the insulating film in subsequent processing steps, causing problems such as contamination of the working environment due to powdering and peeling phenomena, and deterioration of characteristics due to surface flaws. For this reason, in the case of grain-oriented electrical steel sheets with ultra-low core loss, which is the subject of the present invention, one way to fully exhibit the characteristics in the manufactured transformer is to improve the core processability by improving the insulation coating characteristics. It is important to further improve this.
【0010】0010
【発明が解決しようとする課題】本発明は方向性電磁鋼
板にレーザー等によって線状歪を付与して鉄損を低下さ
せた鋼板において、歪付与の前または後に、或いは前後
両方で方向性電磁鋼板に絶縁皮膜を形成するにあたり、
すべり性が良く、鉄心加工性に優れ、かつ発粉、剥離等
のない絶縁皮膜を形成する方法を提供することを目的と
する。[Problems to be Solved by the Invention] The present invention relates to a steel sheet in which linear strain is applied to a grain-oriented electrical steel sheet using a laser or the like to reduce core loss, and the present invention is directed to a steel sheet in which linear strain is applied to the grain-oriented electrical steel sheet using a laser or the like to reduce iron loss. When forming an insulating film on a steel plate,
The purpose of the present invention is to provide a method for forming an insulating film that has good slip properties, excellent iron core workability, and is free from powdering, peeling, etc.
【0011】[0011]
【課題を解決するための手段】本発明の要旨とするとこ
ろは下記のとおりである。
(1) 珪素鋼スラブを熱間圧延し、そのまま或は熱
延板焼鈍を施した後、1回或は中間焼鈍を挟む2回以上
の冷間圧延を施して最終板厚とし、次いで脱炭焼鈍し、
焼鈍分離剤を塗布し、巻き取ってストリップコイルとし
た後、仕上焼鈍を施し、次いで絶縁皮膜形成用コーティ
ング剤を塗布し、焼付け処理した方向性電磁鋼板の表面
に、光学的、機械的、化学的或は熱的手段によって線状
歪を付与し、再度絶縁皮膜形成用コーティング剤を塗布
し、500℃以下の低温域で焼付け処理して絶縁皮膜を
形成する方法において、前記最終的になされる絶縁皮膜
形成のためのコーティング剤として、CrO3 :10
重量部に対し、H3 PO4 :30〜60重量部、M
gO、CaOおよびAl2 O3 の1種または2種以
上を6〜16重量部、H3 BO3 およびNa2 S
iO3 の一方または双方を0.5〜5.0重量部を配
合したものを用いることを特徴とする鉄心加工性に優れ
た低温焼付け方向性電磁鋼板絶縁皮膜形成方法。[Means for Solving the Problems] The gist of the present invention is as follows. (1) A silicon steel slab is hot-rolled, either as it is or after hot-rolled plate annealing, cold-rolled once or twice or more with intermediate annealing to give the final plate thickness, and then decarburized. Annealed,
After applying an annealing separation agent and winding it up to form a strip coil, it is subjected to final annealing, and then a coating agent for forming an insulating film is applied, and the surface of the baked grain-oriented electrical steel sheet is subjected to optical, mechanical, chemical, etc. In the method of applying linear strain by a target or thermal means, applying a coating agent for forming an insulating film again, and forming an insulating film by baking at a low temperature range of 500 ° C. or less, the final step is performed. CrO3:10 as a coating agent for forming an insulating film
H3 PO4: 30 to 60 parts by weight, M
6 to 16 parts by weight of one or more of gO, CaO and Al2O3, H3BO3 and Na2S
A method for forming an insulating film on a low-temperature baking grain-oriented electrical steel sheet having excellent core workability, the method comprising using a mixture of 0.5 to 5.0 parts by weight of one or both of iO3.
【0012】(2) 珪素鋼スラブを熱間圧延し、そ
のまま或は熱延板焼鈍を施した後、1回或は中間焼鈍を
挟む2回以上の冷間圧延を施して最終板厚とし、次いで
脱炭焼鈍し、焼鈍分離剤を塗布し、巻き取ってストリッ
プコイルとした後、仕上焼鈍を施し、次いで絶縁皮膜形
成用コーティング剤を塗布し、焼付け処理した方向性電
磁鋼板の表面に、光学的、機械的、化学的或は熱的手段
によって線状歪を付与し、再度絶縁皮膜形成用コーティ
ング剤を塗布し、500℃以下の低温域で焼付け処理し
て絶縁皮膜を形成する方法において、前記最終的になさ
れる絶縁皮膜形成のためのコーティング剤として、Cr
O3 :10重量部に対し、H3 PO4 :30〜6
0重量部、MgO、CaOおよびAl2 O3 の1種
または2種以上を6〜16重量部、H3 BO3 およ
びNa2 SiO3 の一方または双方を0.5〜5.
0重量部、さらにグリセリン、アジピン酸およびコハク
酸の何れか1種または2種以上を0.5〜5.0重量部
配合したものを用いることを特徴とする鉄心加工性に優
れた低温焼付け方向性電磁鋼板絶縁皮膜形成方法。(2) A silicon steel slab is hot-rolled, either as it is or after being subjected to hot-rolled plate annealing, and then cold-rolled once or twice or more with intermediate annealing in between to obtain the final plate thickness; Next, the surface of the grain-oriented electrical steel sheet was subjected to decarburization annealing, coated with an annealing separator, wound to form a strip coil, subjected to final annealing, coated with a coating agent for forming an insulating film, and coated with an optical fiber. In a method of applying linear strain by physical, mechanical, chemical or thermal means, applying a coating agent for forming an insulating film again, and baking at a low temperature of 500°C or less to form an insulating film, As a coating agent for forming the final insulation film, Cr
O3: 10 parts by weight, H3 PO4: 30-6
0 parts by weight, 6 to 16 parts by weight of one or more of MgO, CaO and Al2 O3, and 0.5 to 5 parts of one or both of H3 BO3 and Na2 SiO3.
0 parts by weight, and further contains 0.5 to 5.0 parts by weight of one or more of glycerin, adipic acid, and succinic acid.A low-temperature baking direction with excellent iron core workability. A method for forming an insulation film on a magnetic steel sheet.
【0013】(3) 珪素鋼スラブを熱間圧延し、そ
のまま或は熱延板焼鈍を施した後、1回或は中間焼鈍を
挟む2回以上の冷間圧延を施して最終板厚とし、次いで
脱炭焼鈍し、焼鈍分離剤を塗布し、巻き取ってストリッ
プコイルとした後、仕上焼鈍を施し、次いで絶縁皮膜形
成用コーティング剤を塗布し、焼付け処理した方向性電
磁鋼板の表面に、光学的、機械的、化学的或は熱的手段
によって線状歪を付与し、再度絶縁皮膜形成用コーティ
ング剤を塗布し、500℃以下の低温域で焼付け処理し
て絶縁皮膜を形成する方法において、前記最終的になさ
れる絶縁皮膜形成のためのコーティング剤として、Cr
O3 :10重量部に対し、H3 PO4 :30〜6
0重量部、MgO、CaOおよびAl2 O3 の1種
または2種以上を6〜16重量部、H3 BO3 およ
びNa2 SiO3 の一方または双方を0.5〜5.
0重量部、さらにグリセリン、アジピン酸およびコハク
酸の何れか1種または2種以上を0.5〜5.0重量部
ならびに粒子径:80〜500nmのコロイダルシリカ
溶液をSiO2 として1〜10重量部配合したものを
用いることを特徴とする鉄心加工性に優れた低温焼付け
方向性電磁鋼板絶縁皮膜形成方法。(3) A silicon steel slab is hot-rolled, either as it is or after hot-rolled plate annealing, cold-rolled once or twice or more with intermediate annealing in between to obtain the final plate thickness; Next, the surface of the grain-oriented electrical steel sheet was subjected to decarburization annealing, coated with an annealing separator, wound to form a strip coil, subjected to final annealing, coated with a coating agent for forming an insulating film, and coated with an optical fiber. In a method of applying linear strain by physical, mechanical, chemical or thermal means, applying a coating agent for forming an insulating film again, and baking at a low temperature of 500°C or less to form an insulating film, As a coating agent for forming the final insulation film, Cr
O3: 10 parts by weight, H3 PO4: 30-6
0 parts by weight, 6 to 16 parts by weight of one or more of MgO, CaO and Al2 O3, and 0.5 to 5 parts of one or both of H3 BO3 and Na2 SiO3.
0 parts by weight, and 0.5 to 5.0 parts by weight of one or more of glycerin, adipic acid, and succinic acid, and 1 to 10 parts by weight of colloidal silica solution with a particle size of 80 to 500 nm as SiO2. A method for forming an insulation film on a grain-oriented electrical steel sheet by low temperature baking and having excellent iron core workability, characterized by using a blended material.
【0014】以下、本発明について詳細に説明する。本
発明者らは鋼板表面にレーザー等により線状歪を間隔を
置いて付与し、また線状歪付与前後に絶縁皮膜形成用コ
ーティング剤を施し、低温度で焼付け処理する工程にお
ける前記従来の問題点解決のため検討を行った。この結
果、このような低温焼付け皮膜においては、従来のリン
酸塩−コロイダルシリカ−クロム化合物系コーティング
或いはリン酸塩単独系のコーティング剤では皮膜形成が
十分に進行せず、皮膜の強度、潤滑性が得られないこと
が分かった。この対策を検討した結果、クロム酸−Al
、Ca、Mg等の酸化物−リン酸系組成をベースとして
、グリセリン等の還元剤と粗粒子コロイドを添加した組
成で、低温焼付けにも拘らず潤滑性が著しく良好で、硬
度が著しく高められることが判明した。このコーティン
グ剤により、絶縁皮膜の潤滑性、耐食性、密着性等が著
しく向上し、加工工程で発粉、皮膜剥離等による作業環
境問題のない絶縁皮膜の形成ができることを見出した。The present invention will be explained in detail below. The present inventors have solved the above-mentioned conventional problems in the process of applying linear strain to the surface of a steel plate at intervals using a laser or the like, applying a coating agent for forming an insulating film before and after applying the linear strain, and baking at a low temperature. We conducted an investigation to resolve the issue. As a result, in such low-temperature baking films, film formation does not proceed sufficiently with conventional phosphate-colloidal silica-chromium compound-based coatings or phosphate-based coating agents, and film strength and lubricity are affected. It turned out that I couldn't get it. As a result of considering this countermeasure, we found that chromic acid-Al
Based on an oxide-phosphoric acid composition such as Ca, Mg, etc., with the addition of a reducing agent such as glycerin and coarse particle colloid, the lubricity is extremely good and the hardness is significantly increased despite low temperature baking. It has been found. It has been found that this coating agent significantly improves the lubricity, corrosion resistance, adhesion, etc. of the insulating film, and allows the formation of an insulating film that does not cause problems in the working environment due to powdering, film peeling, etc. during the processing process.
【0015】以下、実験データに基づき詳細に説明する
。公知の方法で製造した板厚0.23mmの高磁束密度
方向性電磁鋼板の仕上焼鈍後のコイルからサンプルを切
り出し、850℃×4Hrの歪取り焼鈍を行い、コイル
セットと歪を除去した。次いで2%H2 SO4 で8
0℃×20秒の軽酸洗の後、粒子径10nmの20%コ
ロイダルシリカ100ml、50%第1リン酸Al55
ml、無水クロム酸7gからなる組成のコーティング剤
を焼付け後の重量で4.5g/m2 になるように塗布
し、N2 雰囲気中で800℃×20秒の焼付け処理を
行った。次いでレーザー処理により製品板表面に圧延直
交方向に間隔5mmで線状歪付与処理を行い、鉄損特性
の改善処理を行った。[0015] A detailed explanation will be given below based on experimental data. A sample was cut from a coil after final annealing of a high magnetic flux density grain-oriented electrical steel sheet with a plate thickness of 0.23 mm manufactured by a known method, and strain relief annealing was performed at 850° C. for 4 hours to remove the coil set and strain. Then 8 with 2% H2SO4
After light pickling at 0°C for 20 seconds, 100 ml of 20% colloidal silica with a particle size of 10 nm, 50% monophosphoric acid Al55
A coating agent having a composition of 7 g of chromic acid anhydride was applied so that the weight after baking was 4.5 g/m 2 , and a baking treatment was performed at 800° C. for 20 seconds in a N 2 atmosphere. Next, laser treatment was applied to the surface of the product sheet to impart linear strain at intervals of 5 mm in the direction perpendicular to the rolling direction, thereby improving iron loss characteristics.
【0016】この鋼板に表1に示す組成の絶縁皮膜形成
用コーティング剤を焼付け後の重量で2.5g/m2
になるように塗布し、350℃×20秒間、大気中で低
温焼付け処理を行った。得られた製品板から試料を切り
出し、図1、図2に示す方法により絶縁皮膜潤滑性(A
法,B法)を測定した。また、別に切り出した試料によ
り、図3、図4の方法で歪取り焼鈍後の皮膜の焼付状況
を測定した。さらに皮膜の耐食性、磁気特性への影響等
についても調査を行った。結果を表2に示す。この結果
、本発明のように微粒子のコロイダルシリカを主成分に
使用しない絶縁皮膜形成用コーティング剤においては皮
膜特性が優れ、潤滑性等の著しい向上が見られ、特に粗
粒子のコロイダルシリカを併用したものは潤滑特性の著
しい改善効果が得られた。A coating agent for forming an insulating film having the composition shown in Table 1 was applied to this steel plate at a weight of 2.5 g/m2 after baking.
It was coated so as to have the following properties, and then subjected to low-temperature baking treatment at 350° C. for 20 seconds in the air. A sample was cut out from the obtained product board, and the insulation film lubricity (A
method, B method). In addition, using a separately cut sample, the baking state of the film after strain relief annealing was measured using the method shown in FIGS. 3 and 4. Furthermore, we investigated the corrosion resistance of the coating and its effect on magnetic properties. The results are shown in Table 2. As a result, coating agents for forming insulating films that do not use fine-particle colloidal silica as a main component, as in the present invention, have excellent film properties and remarkable improvements in lubricity, etc., especially when coarse-particle colloidal silica is used in combination A significant improvement in the lubrication properties was obtained.
【0017】次に、本発明の絶縁皮膜の形成方法につい
て述べる。本発明における絶縁皮膜形成用コーティング
剤は、クロム酸10重量部に対し、リン酸30〜60重
量部、Al、Ca,Mgの酸化物の1種または2種以上
6〜16重量部、必要に応じてグリセリン、コハク酸、
アジピン酸の1種または2種以上、および/または粒子
径80〜500nmの粗粒子コロイダルシリカ溶液をS
iO2として1〜10重量部からなる組成を有する。Next, a method for forming an insulating film according to the present invention will be described. The coating agent for forming an insulating film in the present invention includes 10 parts by weight of chromic acid, 30 to 60 parts by weight of phosphoric acid, 6 to 16 parts by weight of one or more oxides of Al, Ca, and Mg, as necessary. Glycerin, succinic acid, depending on
S
It has a composition of 1 to 10 parts by weight as iO2.
【0018】CrO3 は皮膜を緻密化して硬さをもた
らすためと、フリーリン酸およびリン酸塩との反応によ
り、リン酸、リン酸塩の吸湿を抑えるために重要である
。クロム酸は多すぎるとフリーのクロム酸のためにベタ
ツキが生じたり、皮膜の緻密性を損なう。逆に少なすぎ
るとフリーのリン酸が皮膜焼付け後に残存するため吸湿
して、ベタツキや錆を発生する。CrO3 is important because it densifies the film and provides hardness, and because it reacts with free phosphoric acid and phosphates to suppress moisture absorption of phosphoric acid and phosphates. If there is too much chromic acid, the free chromic acid may cause stickiness or impair the density of the film. On the other hand, if the amount is too low, free phosphoric acid will remain after baking the film and will absorb moisture, causing stickiness and rust.
【0019】Al、Ca、Mgの酸化物はリン酸、クロ
ム酸と反応して安定な化合物を形成する。これにより皮
膜を緻密化し、絶縁性、皮膜張力を向上し、密着性の良
い皮膜を形成する。CrO3 10重量部に対し6重量
部より少ないとフリーのCrが増加しベタツキ発生の領
域が広がる。また、絶縁性、耐食性等の皮膜特性が劣化
する。一方、16重量部より多い場合、酸化物の不溶解
分が生じて、外観、密着性を損なうため好ましくない。Oxides of Al, Ca, and Mg react with phosphoric acid and chromic acid to form stable compounds. This densifies the film, improves insulation and film tension, and forms a film with good adhesion. When the amount is less than 6 parts by weight per 10 parts by weight of CrO3, free Cr increases and the area where stickiness occurs expands. Furthermore, film properties such as insulation and corrosion resistance deteriorate. On the other hand, if the amount is more than 16 parts by weight, undissolved oxide content will occur, impairing the appearance and adhesion, which is not preferable.
【0020】リン酸は他の成分と反応してリン酸化合物
を形成し、皮膜を緻密なガラス皮膜にする作用が強く、
潤滑性、皮膜張力等に大きい影響力を持つ。クロム酸1
0重量部に対し、30重量部未満では潤滑性の向上効果
が弱く、Al等の酸化物の不溶解分が生じて皮膜特性を
損なう。逆に、60重量部超の添加では、フリーのリン
酸分の増加により、吸湿性によるベタツキ等の問題を生
じる。[0020] Phosphoric acid reacts with other components to form a phosphoric acid compound, which has a strong effect of forming a dense glass film.
It has a large influence on lubricity, film tension, etc. Chromic acid 1
If it is less than 30 parts by weight compared to 0 parts by weight, the effect of improving lubricity will be weak, and insoluble portions of oxides such as Al will occur, impairing the film properties. On the other hand, when more than 60 parts by weight is added, problems such as stickiness due to hygroscopicity occur due to the increase in free phosphoric acid content.
【0021】本発明のように低温焼付け皮膜においては
、クロム酸、Al、Ca、Mg等の酸化物、リン酸の配
合割合はこのように緻密にコントロールされる。H3
BO3 および/またはNa2 SiO3の添加はクロ
ム酸10重量部に対し、0.5〜5.0重量部の割合で
添加される。これらの添加は皮膜のガラス化、緻密化に
有効で、同時に焼付け皮膜形成温度を低下するのにも効
果的である。添加量がクロム酸10重量部に対し0.5
重量部未満では、このようなガラス化作用が弱く、添加
量5.0重量部超では皮膜の硬さが低下したり、Na2
SiO3 ではベタツキ現象が生じるため好ましくな
い。[0021] In the low-temperature baking film as in the present invention, the blending ratios of chromic acid, oxides such as Al, Ca, Mg, etc., and phosphoric acid are precisely controlled as described above. H3
BO3 and/or Na2 SiO3 are added at a ratio of 0.5 to 5.0 parts by weight per 10 parts by weight of chromic acid. These additions are effective in vitrifying and densifying the film, and are also effective in lowering the baking film forming temperature at the same time. The amount added is 0.5 per 10 parts by weight of chromic acid.
If the addition amount is less than 5.0 parts by weight, such vitrification effect will be weak, and if the addition amount exceeds 5.0 parts by weight, the hardness of the film may decrease or Na2
SiO3 is not preferred because it causes a sticky phenomenon.
【0022】必要に応じて配合されるグリセリン、アジ
ピン酸、コハク酸は皮膜焼付け温度の低温化に有効であ
る。本発明のようにレーザー等による線状歪を付与して
磁区制御して鉄損を改善する工程においては、線状歪の
保持のためには焼付け温度は500℃以下の低温度で行
うことが重要である。グリセリン等の還元剤はCrO3
10重量部に対し0.5〜5.0重量部の範囲で添加
される。0.5重量部より少ないとこの効果が少ない。
一方、5.0重量部より多いと溶液の安定性が低下する
ため好ましくなく、またこの場合、有機成分の増加によ
り焼付け時に圧縮応力が生じるため磁性劣化の問題も生
じる。Glycerin, adipic acid, and succinic acid, which are added as necessary, are effective in lowering the baking temperature of the film. In the process of applying linear strain using a laser or the like to control magnetic domains and improve iron loss as in the present invention, the baking temperature should be as low as 500°C or less in order to maintain the linear strain. is important. Reducing agents such as glycerin are CrO3
It is added in an amount of 0.5 to 5.0 parts by weight per 10 parts by weight. If the amount is less than 0.5 parts by weight, this effect will be small. On the other hand, if the amount is more than 5.0 parts by weight, it is not preferable because the stability of the solution decreases, and in this case, the increase in organic components causes compressive stress during baking, resulting in the problem of magnetic deterioration.
【0023】粗粒子のコロイダルシリカの添加は粒子径
80〜500nm、添加量はクロム酸10重量部に対し
、SiO2 として1〜10重量部である。粗粒子コロ
イダルシリカはその粒子の球面形状によって皮膜に微細
な球面突起を形成する。この形状効果及び粒子によって
皮膜の潤滑性と硬さを向上し、鉄心加工性を向上する。
粗粒子のコロイダルシリカの粒径は80〜500nmで
ある。粒子径が80nmより小さいと潤滑性の改善効果
が小さい。粒子径が500nm超だと本発明のように塗
布量の比較的少ないコーティングでは、占積率を劣化さ
せたり、コーティング溶液の安定性に問題がある。最も
好ましいのは100〜300nmの粒径である。Coarse particles of colloidal silica are added with a particle diameter of 80 to 500 nm, and the amount added is 1 to 10 parts by weight as SiO2 per 10 parts by weight of chromic acid. Coarse particle colloidal silica forms fine spherical protrusions on the coating due to the spherical shape of its particles. This shape effect and particles improve the lubricity and hardness of the coating, improving core workability. The particle size of the coarse colloidal silica particles is 80 to 500 nm. When the particle size is smaller than 80 nm, the effect of improving lubricity is small. If the particle size exceeds 500 nm, in a coating with a relatively small coating amount as in the present invention, the space factor may deteriorate or there may be problems with the stability of the coating solution. Most preferred is a particle size of 100-300 nm.
【0024】粗粒子のコロイダルシリカの添加量をクロ
ム酸10重量部当たりSiO2 換算で1〜10重量部
とする理由は、1重量部より少ないと潤滑性等の改善効
果が小さく、10重量部より多いと粒子径が大きいとき
と同様に占積率の低下をもたらすため好ましくない。こ
れらの組成からなる絶縁皮膜形成用コーティング剤は水
溶液とされてコーティングロール等によって鋼板に塗布
され、焼付け処理される。この際の乾燥条件は鋼板温度
500℃以下で焼付け処理される。この場合の雰囲気条
件はN2 等の雰囲気ガス中或いは大気中等のいずれで
も構わない。The reason why the amount of coarse particle colloidal silica added is 1 to 10 parts by weight in terms of SiO2 per 10 parts by weight of chromic acid is that if it is less than 1 part by weight, the effect of improving lubricity etc. will be small; If the amount is too large, the space factor will decrease as in the case where the particle size is large, which is not preferable. A coating agent for forming an insulating film having these compositions is made into an aqueous solution, applied to a steel plate using a coating roll or the like, and subjected to a baking treatment. The drying conditions at this time are baking treatment at a steel plate temperature of 500°C or less. The atmospheric condition in this case may be either an atmospheric gas such as N2 or the atmosphere.
【0025】焼付け温度は500℃以下である。500
℃より高いとレーザー等による線状歪による鉄損改善効
果が歪の解放により減少する。好ましくは250〜45
0℃である。これらの乾燥・焼付け条件の最適点はコー
ティング剤の組成により変化する。以下、実施例につい
て述べる。[0025] The baking temperature is 500°C or less. 500
When the temperature is higher than ℃, the iron loss improvement effect due to linear strain caused by laser etc. is reduced due to the release of strain. Preferably 250-45
It is 0°C. The optimal points of these drying and baking conditions vary depending on the composition of the coating agent. Examples will be described below.
【0026】[0026]
【実施例】実施例1
重量%でC;0.0082%,Si;3.35%,Mn
;0.067%,S;0.024%,Al;0.032
%、残部が鉄及び不可避の不純物からなる珪素鋼スラブ
を公知の方法で熱延、焼鈍、冷延して最終板厚0.23
mmとした。次いでN2 +H2 湿潤雰囲気中で脱炭
焼鈍した後、焼鈍分離剤を塗布し、1200℃×20H
rの仕上焼鈍を行い、グラス皮膜を形成した。次いで余
剰のMgOを水洗で除去し、軽酸洗の後、粒子径10n
mの20%コロイダルシリカ100ml、50%第1リ
ン酸Al 55ml、無水クロム酸4gからなる公知
の絶縁皮膜形成用コーティング剤を焼付け処理後の重量
で4.0g/m2 になるように塗布し、810℃×2
0秒、N2 中で焼付け処理を行った。その後、レーザ
ー照射により鋼板の圧延直交方向に5mm間隔で線状歪
を付与し、鉄損改善処理を行った。次いで表3に示す組
成の絶縁皮膜形成用コーティング剤を焼付け後の皮膜重
量で2.0g/m2 になるように塗布し、450℃で
60秒間、大気中で焼付け処理を行った。この鋼板から
サンプルを切り出し、皮膜特性の調査を行った。結果を
表4に示す。[Example] Example 1 C: 0.0082%, Si: 3.35%, Mn in weight%
;0.067%,S;0.024%,Al;0.032
%, the balance being iron and unavoidable impurities, is hot rolled, annealed, and cold rolled by known methods to obtain a final plate thickness of 0.23.
mm. Next, after decarburizing annealing in a N2 + H2 humid atmosphere, an annealing separator was applied, and annealing was performed at 1200°C x 20H.
Finish annealing was performed to form a glass film. Next, excess MgO was removed by water washing, and after light pickling, the particle size was reduced to 10 nm.
A known coating agent for forming an insulating film consisting of 100 ml of 20% colloidal silica, 55 ml of 50% monophosphoric acid, and 4 g of chromic acid anhydride was applied so that the weight after baking was 4.0 g/m2, 810℃×2
A baking process was performed in N2 for 0 seconds. Thereafter, linear strain was applied to the steel plate at intervals of 5 mm in the direction orthogonal to the rolling direction by laser irradiation to perform iron loss improvement treatment. Next, a coating agent for forming an insulating film having the composition shown in Table 3 was applied so that the film weight after baking was 2.0 g/m 2 , and baking treatment was performed at 450° C. for 60 seconds in the air. Samples were cut from this steel plate and the film properties were investigated. The results are shown in Table 4.
【0027】本発明の絶縁皮膜形成用コーティング剤に
よる皮膜は、潤滑性、耐食性等の特性で、いずれも従来
の微粒子コロイダルシリカ−クロム酸−リン酸塩系皮膜
に比較して、同等以上の特性が得られた。
実施例2
実施例1と同様にして得たレーザー処理後の鋼板を出発
材として、この鋼板に表5に示す組成の粗粒子のコロイ
ダルシリカを添加した絶縁皮膜形成用コーティング剤を
実施例1と同様にして塗布し、350℃で30秒間、大
気中で焼付け処理を行った。[0027] The film formed by the coating agent for forming an insulating film of the present invention has properties such as lubricity and corrosion resistance, which are all equivalent or better than the conventional particulate colloidal silica-chromic acid-phosphate film. was gotten. Example 2 Using a laser-treated steel plate obtained in the same manner as in Example 1 as a starting material, a coating agent for forming an insulating film was added to this steel plate with coarse particle colloidal silica having the composition shown in Table 5 as in Example 1. It was applied in the same manner and baked at 350° C. for 30 seconds in the air.
【0028】この焼付け処理後の鋼板からサンプルを切
り出し、皮膜特性の調査を行った。結果を表6に示す。
本発明の絶縁皮膜形成用コーティング剤によるものは実
施例1と同様に低温度焼付けにも拘らず、潤滑性、耐食
性等いずれも良好な結果が得られた。[0028] Samples were cut out from the steel plate after the baking treatment, and the film properties were investigated. The results are shown in Table 6. Similar to Example 1, the coating agent for forming an insulating film of the present invention gave good results in terms of lubricity, corrosion resistance, etc. despite being baked at a low temperature.
【0029】[0029]
【表1】[Table 1]
【0030】[0030]
【表2】[Table 2]
【0031】[0031]
【表3】[Table 3]
【0032】[0032]
【表4】[Table 4]
【0033】[0033]
【表5】[Table 5]
【0034】[0034]
【表6】[Table 6]
【0035】[0035]
【発明の効果】本発明によれば、低温焼付け処理にも拘
らず、鋼板の潤滑性が著しく良好で、需要家におけるト
ランス加工時の皮膜成分の発粉、剥離等による作業環境
汚染の問題のない絶縁皮膜形成法が提供できる。また、
絶縁皮膜の耐食性が良好で、レーザー等による線状歪付
与による磁性の改善効果を劣化させない絶縁皮膜を形成
でき、低温で吸湿性のない緻密な絶縁皮膜を形成するこ
とができる。Effects of the Invention According to the present invention, the lubricity of the steel sheet is extremely good despite the low-temperature baking treatment, and the problem of contamination of the working environment due to powdering, peeling, etc. of the coating components during transformer processing at customers is avoided. It is possible to provide a method for forming an insulating film that is not previously available. Also,
The insulating film has good corrosion resistance, can form an insulating film that does not deteriorate the magnetic improvement effect caused by applying linear strain using a laser, etc., and can form a dense insulating film that does not absorb moisture at low temperatures.
【0036】この結果、図3に示すように、従来の絶縁
皮膜形成用コーティング剤に比較して低温度焼付けでの
潤滑性、耐食性が著しく改善される。As a result, as shown in FIG. 3, the lubricity and corrosion resistance at low temperature baking are significantly improved compared to conventional coating agents for forming insulating films.
【図1】図1はA法の説明図で、挟み板1−1,1−2
間に試料2を置き重錘3にて荷重Nを加え、試料2を引
き出す力Aをバネ計りで測定し、すべり摩擦係数μをμ
(FF)=A/Nにより求める。[Figure 1] Figure 1 is an explanatory diagram of method A, with sandwich plates 1-1, 1-2
Place the sample 2 between them, apply a load N using a weight 3, measure the force A that pulls out the sample 2 with a spring scale, and calculate the sliding friction coefficient μ.
Determine from (FF)=A/N.
【図2】図2はB法の説明図で、絶縁皮膜上に一定加重
を加えた鋼球を置き、その鋼球を往復運動させて、鋼球
が絶縁皮膜から受ける抵抗値を歪ゲージにより連続的に
測定する。[Figure 2] Figure 2 is an explanatory diagram of method B, in which a steel ball with a constant load is placed on the insulation coating, the steel ball is moved back and forth, and the resistance value that the steel ball receives from the insulation coating is measured using a strain gauge. Measure continuously.
【図3】図3は鋼板の積層方法の説明図で、長さ3×4
cmに剪断した鋼板を図に示す如く交互に積層する。[Figure 3] Figure 3 is an explanatory diagram of the method of laminating steel plates, with a length of 3 x 4
Steel plates sheared to cm are laminated alternately as shown in the figure.
【図4】図4は鋼板の焼付き状態の評価方法の説明図で
、図3に示すように鋼板を積層した後、圧力60kg/
cm2 でボルト締めし、次いで850℃×4Hr
N2 、DP10℃中で焼鈍後、図に示す如くバネ計り
で剥離荷重を測定し、焼付き状態を評価する。[Fig. 4] Fig. 4 is an explanatory diagram of a method for evaluating the seizure state of steel plates. After laminating steel plates as shown in Fig. 3, a pressure of 60 kg/
Tighten the bolts at cm2, then 850℃×4Hr
After annealing in N2 and DP 10°C, the peeling load was measured using a spring scale as shown in the figure to evaluate the seizure state.
【図5】図5は絶縁皮膜の焼付け温度と皮膜の耐食性(
吸湿性)を示す図である。☆の本発明材は実施例2の絶
縁皮膜成分No.4を塗布・焼付けした材料、★は実施
例2のNo.6の比較例の特公昭53−28375号公
報による皮膜剤を塗布・焼付けした材料を大気中、50
℃×48Hr、湿度98%で放置した後、表面の状態を
調査した結果を示す。[Figure 5] Figure 5 shows the baking temperature of the insulation coating and the corrosion resistance of the coating (
It is a figure showing hygroscopicity). The inventive material marked with ☆ is the insulating film component No. of Example 2. 4 is the material coated and baked, ★ is the material No. 4 of Example 2. A material coated and baked with a coating agent according to Japanese Patent Publication No. 53-28375 as a comparative example of No. 6 was exposed to air for 50 minutes.
The results of investigating the surface condition after being left at 98% humidity at 48° C. are shown.
【図6】図6は絶縁皮膜の組成と焼付け後の皮膜の潤滑
性(図4に示す方法による潤滑性)を示す図である。本
発明の組成の皮膜ではいずれも良好な潤滑性を示す。FIG. 6 is a diagram showing the composition of an insulating film and the lubricity of the film after baking (lubricity according to the method shown in FIG. 4). All films having the composition of the present invention exhibit good lubricity.
Claims (3)
或は熱延板焼鈍を施した後、1回或は中間焼鈍を挟む2
回以上の冷間圧延を施して最終板厚とし、次いで脱炭焼
鈍し、焼鈍分離剤を塗布し、巻き取ってストリップコイ
ルとした後、仕上焼鈍を施し、次いで絶縁皮膜形成用コ
ーティング剤を塗布し、焼付け処理した方向性電磁鋼板
の表面に、光学的、機械的、化学的或は熱的手段によっ
て線状歪を付与し、再度絶縁皮膜形成用コーティング剤
を塗布し、500℃以下の低温域で焼付け処理して絶縁
皮膜を形成する方法において、前記最終的になされる絶
縁皮膜形成のためのコーティング剤として、CrO3
:10重量部に対し、H3 PO4 :30〜60重量
部、MgO、CaOおよびAl2 O3 の1種または
2種以上を6〜16重量部、H3 BO3 およびNa
2 SiO3 の一方または双方を0.5〜5.0重量
部を配合したものを用いることを特徴とする鉄心加工性
に優れた低温焼付け方向性電磁鋼板絶縁皮膜形成方法。[Claim 1] A silicon steel slab is hot-rolled, either as it is or after hot-rolled sheet annealing, either once or twice with intermediate annealing in between.
The plate is cold rolled several times to achieve the final thickness, then decarburized and annealed, coated with an annealing separator, wound to form a strip coil, finished annealed, and then coated with a coating agent for forming an insulating film. Then, a linear strain is applied to the surface of the baked grain-oriented electrical steel sheet by optical, mechanical, chemical, or thermal means, and a coating agent for forming an insulating film is applied again, and then the surface is heated at a low temperature of 500°C or less. In the method of forming an insulating film by baking in a
: 10 parts by weight, H3 PO4 : 30 to 60 parts by weight, 6 to 16 parts by weight of one or more of MgO, CaO and Al2 O3, H3 BO3 and Na
2. A method for forming an insulating film on a grain-oriented electrical steel sheet by low-temperature baking and having excellent core workability, the method comprising using one or both of 0.5 to 5.0 parts by weight of SiO3.
或は熱延板焼鈍を施した後、1回或は中間焼鈍を挟む2
回以上の冷間圧延を施して最終板厚とし、次いで脱炭焼
鈍し、焼鈍分離剤を塗布し、巻き取ってストリップコイ
ルとした後、仕上焼鈍を施し、次いで絶縁皮膜形成用コ
ーティング剤を塗布し、焼付け処理した方向性電磁鋼板
の表面に、光学的、機械的、化学的或は熱的手段によっ
て線状歪を付与し、再度絶縁皮膜形成用コーティング剤
を塗布し、500℃以下の低温域で焼付け処理して絶縁
皮膜を形成する方法において、前記最終的になされる絶
縁皮膜形成のためのコーティング剤として、CrO3
:10重量部に対し、H3 PO4 :30〜60重量
部、MgO、CaOおよびAl2 O3 の1種または
2種以上を6〜16重量部、H3 BO3 およびNa
2 SiO3 の一方または双方を0.5〜5.0重量
部、さらにグリセリン、アジピン酸およびコハク酸の何
れか1種または2種以上を0.5〜5.0重量部配合し
たものを用いることを特徴とする鉄心加工性に優れた低
温焼付け方向性電磁鋼板絶縁皮膜形成方法。[Claim 2] A silicon steel slab is hot-rolled, either as it is or after hot-rolled plate annealing, either once or twice with intermediate annealing.
The plate is cold-rolled several times to obtain the final thickness, then decarburized and annealed, coated with an annealing separator, wound to form a strip coil, finished annealed, and then coated with a coating agent for forming an insulating film. Then, a linear strain is applied to the surface of the baked grain-oriented electrical steel sheet by optical, mechanical, chemical, or thermal means, and a coating agent for forming an insulating film is applied again, and then the surface is heated at a low temperature of 500°C or less. In the method of forming an insulating film by baking in a
: 10 parts by weight, H3 PO4 : 30 to 60 parts by weight, 6 to 16 parts by weight of one or more of MgO, CaO and Al2 O3, H3 BO3 and Na
2. Use a mixture containing 0.5 to 5.0 parts by weight of one or both of SiO3 and 0.5 to 5.0 parts by weight of one or more of glycerin, adipic acid, and succinic acid. A method for forming an insulation film on a low-temperature baking grain-oriented electrical steel sheet with excellent core workability.
或は熱延板焼鈍を施した後、1回或は中間焼鈍を挟む2
回以上の冷間圧延を施して最終板厚とし、次いで脱炭焼
鈍し、焼鈍分離剤を塗布し、巻き取ってストリップコイ
ルとした後、仕上焼鈍を施し、次いで絶縁皮膜形成用コ
ーティング剤を塗布し、焼付け処理した方向性電磁鋼板
の表面に、光学的、機械的、化学的或は熱的手段によっ
て線状歪を付与し、再度絶縁皮膜形成用コーティング剤
を塗布し、500℃以下の低温域で焼付け処理して絶縁
皮膜を形成する方法において、前記最終的になされる絶
縁皮膜形成のためのコーティング剤として、CrO3
:10重量部に対し、H3 PO4 :30〜60重量
部、MgO、CaOおよびAl2 O3 の1種または
2種以上を6〜16重量部、H3 BO3 およびNa
2 SiO3 の一方または双方を0.5〜5.0重量
部、さらにグリセリン、アジピン酸およびコハク酸の何
れか1種または2種以上を0.5〜5.0重量部ならび
に粒子径:80〜500nmのコロイダルシリカ溶液を
SiO2 として1〜10重量部配合したものを用いる
ことを特徴とする鉄心加工性に優れた低温焼付け方向性
電磁鋼板絶縁皮膜形成方法。[Claim 3] A silicon steel slab is hot-rolled, either as it is or after hot-rolled sheet annealing, either once or twice with intermediate annealing.
The plate is cold-rolled several times to obtain the final thickness, then decarburized and annealed, coated with an annealing separator, wound to form a strip coil, finished annealed, and then coated with a coating agent for forming an insulating film. Then, a linear strain is applied to the surface of the baked grain-oriented electrical steel sheet by optical, mechanical, chemical, or thermal means, and a coating agent for forming an insulating film is applied again, and then the surface is heated at a low temperature of 500°C or less. In the method of forming an insulating film by baking in a
: 10 parts by weight, H3 PO4 : 30 to 60 parts by weight, 6 to 16 parts by weight of one or more of MgO, CaO and Al2 O3, H3 BO3 and Na
0.5 to 5.0 parts by weight of one or both of 2 SiO3, and 0.5 to 5.0 parts by weight of one or more of glycerin, adipic acid, and succinic acid, and particle size: 80 to 5.0 parts by weight. A method for forming an insulation film on a low-temperature baking grain-oriented electrical steel sheet having excellent core workability, the method comprising using a 500 nm colloidal silica solution containing 1 to 10 parts by weight of SiO2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03034833A JP3103941B2 (en) | 1991-02-28 | 1991-02-28 | Low-temperature baking grain-oriented electrical steel sheet with excellent core workability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03034833A JP3103941B2 (en) | 1991-02-28 | 1991-02-28 | Low-temperature baking grain-oriented electrical steel sheet with excellent core workability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04272183A true JPH04272183A (en) | 1992-09-28 |
| JP3103941B2 JP3103941B2 (en) | 2000-10-30 |
Family
ID=12425206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03034833A Expired - Lifetime JP3103941B2 (en) | 1991-02-28 | 1991-02-28 | Low-temperature baking grain-oriented electrical steel sheet with excellent core workability |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3103941B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04337079A (en) * | 1991-05-15 | 1992-11-25 | Nippon Steel Corp | Formation of insulated film on grain oriented silicon steel sheet excellent in workability of iron core by low temperature baking |
| JP2018508647A (en) * | 2014-12-24 | 2018-03-29 | ポスコPosco | Oriented electrical steel sheet and manufacturing method thereof |
| WO2024214822A1 (en) * | 2023-04-12 | 2024-10-17 | 日本製鉄株式会社 | Grain-oriented electrical steel sheet and method for forming insulating coating film |
-
1991
- 1991-02-28 JP JP03034833A patent/JP3103941B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04337079A (en) * | 1991-05-15 | 1992-11-25 | Nippon Steel Corp | Formation of insulated film on grain oriented silicon steel sheet excellent in workability of iron core by low temperature baking |
| JP2018508647A (en) * | 2014-12-24 | 2018-03-29 | ポスコPosco | Oriented electrical steel sheet and manufacturing method thereof |
| US11180819B2 (en) | 2014-12-24 | 2021-11-23 | Posco | Grain-oriented electrical steel plate and production method therefor |
| WO2024214822A1 (en) * | 2023-04-12 | 2024-10-17 | 日本製鉄株式会社 | Grain-oriented electrical steel sheet and method for forming insulating coating film |
| JPWO2024214822A1 (en) * | 2023-04-12 | 2024-10-17 | ||
| EP4696813A4 (en) * | 2023-04-12 | 2026-08-05 | Nippon Steel Corp | GRAIN-ORIENTED ELECTROSTEAL SHEET AND METHOD FOR PRODUCING AN INSULATING COATING FILM |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3103941B2 (en) | 2000-10-30 |
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