JPH04278902A - Color filter manufacturing method - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used in liquid crystal televisions, liquid crystal displays, etc.

0002

[Prior Art] Conventional color filters include color filters made by manufacturing methods such as color ink printing, dyeing, and pigment dispersion. That is, it is common that a protective layer is also provided at the terminal portion that is the contact point between the liquid crystal element and the liquid crystal driver. However, with these color filter manufacturing methods, it has not been possible to manufacture highly flat and inexpensive color filters. FIG. 1 shows, as an example, a cross-sectional view of a color filter in which the light-shielding portion between each picture element is created by overlapping colors. In FIG. 1, a red pixel 102, a blue pixel 103, and a green pixel 1 are arranged on a transparent substrate 101.
04 are formed in a stripe shape, and overlapping portions 105 of the respective picture elements also exist as a light shielding layer between the picture elements. The difference in level between these picture elements is at least 1μ.
m is 2 μm, and if the protective layer 106 is formed thickly, the step of the overlapped portion 105 can be filled, and at the same time, when the transparent electrode 108 for driving the liquid crystal is patterned, cutting of the electrode due to the step can be prevented. can.

0003

[Problems to be Solved by the Invention] However, when forming electrodes on such conventional color filters,
There were the following problems. That is, since the color filter itself is required to have flatness, it is necessary to apply a thick overcoat layer, resulting in poor productivity. Furthermore, the thickly applied overcoat layer is used in the subsequent electrode formation process and the liquid crystal driver 10 mounted on the flexible substrate.
It is damaged during the mounting process in step 7, and there are problems such as mounting defects are likely to occur. In FIG. 2, the protective layer 106 is formed thickly, and the protective layer 106 is formed at the connection point between the transparent substrate 101 and the liquid crystal driver 107 mounted on the flexible substrate.
This is the case when 06 is not available. In such a substrate, the difference in level between the substrate 101 and the protective layer 106 is large, which causes the transparent electrode for driving the liquid crystal to break. Thus, forming a thick protective layer in order to impart flatness to the color filter leads to an increase in the cost of the color filter.

[0004] In the present invention, the pattern edge of the protective layer 106 is positively tapered, and the protective layer 106 is provided at the terminal portion which is the contact point between the transparent substrate 101 of the color filter and the liquid crystal driver 107 mounted on the flexible substrate. The purpose is to provide a highly reliable color filter that does not have an organic layer such as a color filter at a low cost.

[0005]

[Means for Solving the Problems] The color filter of the present invention is characterized by the following points. Specifically, 1) a color filter having a red, blue, and green light-transmissive pixel pattern made of a negative pigment-dispersed color resist and an overcoat layer on a transparent substrate, the overcoat layer comprising red, blue, It is formed wider than the display area where the green light-transmissive pixel pattern is assembled, and the electrode terminal part has no overcoat layer formed, and the edge shape around the overcoat layer has a positive taper. 2) A method for producing a color filter having a red, blue, and green light-transmissive pixel pattern made of a negative pigment-dispersed color resist and an overcoat layer on a transparent substrate. a step of applying an overcoat layer;
The overcoat layer includes the steps of baking the substrate having the overcoat layer, exposing the substrate to light using a photomask, developing the substrate, and baking the substrate.
It is formed wider than the display area where red, blue, and green light-transmissive pixel patterns are assembled, and no overcoat layer is formed on the electrode terminal portion, and the edge shape around the overcoat has a positive taper. This is a method for manufacturing a color filter, characterized in that: Furthermore, 3) in the exposing step, a frame-shaped photomask is used so that the overcoat layer is formed wider than a display area where red, blue, and green light-transmitting pixel patterns are assembled; The distance between the surface and the film surface of the overcoat layer is in the range of 30 μm to 5 mm.
Desirably, the method for manufacturing a color filter is characterized in that exposure is performed with a distance between the mask and the overcoat layer in the range of 1 mm to 3 mm.

[0006] The details of the present invention will be explained below with reference to Examples.

[0007]

[Example] In the examples of the present invention, the material of the pigment-dispersed color resist was manufactured by Fuji Hunt Electronics Technology Co., Ltd. The product name of this color resist is Color Mosaic, and the blue one is CB.
V, the red one is called CRY, the green one is CGY, and the transparent one is called CT. This color resist is made of acrylic photosensitive resin and its curing is inhibited by oxygen in the air, so if necessary, it may be coated with an oxygen barrier film (product name: CP, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) before exposure. desirable. At that time, CBV, CRY, and CGY each exhibit high sensitivity.

In the embodiments of the present invention, it is preferable to use a pigment-dispersed color resist material manufactured by Fuji Hunt Electronics Technology Co., Ltd., but color pixels may be formed by other methods.

In the embodiments of the present invention, it is preferable to use CT manufactured by Fuji Hunt Electronics Technology Co., Ltd. as the material used for the transparent protective layer, but examples include photosensitive epoxy, urethane, polyamide, Other materials such as polyimide can also be used. Furthermore, thermofusible and thermoplastic materials can also be used. In the embodiments of the present invention, the material coating device may be a bar coater, a roll coater, or a spin coater. It can also be applied by a printing method.

In this example, an ultra-high pressure mercury lamp was used as the light source for exposure.

Although soda glass is preferably used for the transparent substrate of the present invention, other glasses such as quartz glass,
An alkali-free glass or an organic polymer substrate such as polycarbonate or polyacrylic resin can also be used. Further, there may be an inorganic thin film.

Although the pattern of the color filter of this embodiment is striped, the present invention is also applicable to a mosaic type in which pixels are divided between colors.

(Example 1) An example of the color filter of the present invention is shown in FIG. In FIG. 3, a transparent substrate 101
A red pixel 102, a blue pixel 103, and a green pixel 104 are formed on the top. Furthermore, a protective layer 1 is placed on each picture element.
06 is formed. This protective layer 106 is formed over a wider area than the display area where each pixel is assembled, and the thickness of the protective layer gradually decreases at the outer periphery of the pixel where the protective layer 106 is in direct contact with the transparent substrate 101. is decreasing. That is, at the connection point between the liquid crystal element using the transparent substrate 101 of this color filter and the liquid crystal driver 107 mounted on the flexible substrate, the transparent electrode 108 for driving the liquid crystal connects with the liquid crystal driver 107 mounted on the flexible substrate. It is in direct contact with the transparent substrate 101 of the liquid crystal element at the contact point and has very good adhesion.

(Embodiment 2) In FIG. 4, a transparent substrate 10
A green color resist CGY was applied onto the photoresist 104, and after drying, it was exposed to light using a glass mask at a desired exposure amount and developed, thereby forming striped green picture elements 104. After firing at a high temperature, a red color resist CRY is applied and CG
The red picture element 102 was formed in the same process as Y so that it did not overlap with CGY. Note that an alkaline developer (trade name: CD, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was used as the developer. Similarly, blue picture elements 103 were formed to obtain a color filter substrate 109. In FIG. 5, acrylic resin (
Manufactured by Fuji Hunt Electronics Technology Co., Ltd.
CT (trade name) was applied to the substrate, and after drying, exposure was performed using a photomask to form a protective layer 106 in order to form a protective film in an area larger than the picture element area. At this time, in order to create a state in which the thickness of the protective layer 106 at the outer periphery of the pixel where the protective layer 106 is in direct contact with the transparent substrate 101 is gradually reduced, that is, to create a structure having a positive taper, In the exposing step, a frame-shaped photomask 110 is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns.
Exposure was performed using a mask and the overcoat layer at a distance such that the distance 111 between the mask surface and the film surface of the overcoat layer was 3.1 mm. As a result, a color filter substrate 112 as shown in FIG. 5 was obtained. When a liquid crystal device was manufactured using the color filter substrate having the obtained protective layer, a highly reliable liquid crystal device was obtained.

(Embodiment 3) In FIG. 6, a transparent substrate 10
1, a green color resist CGY is applied, and after drying, it is exposed to a desired amount of light using a glass mask and developed.
Striped green picture elements 104 were formed. After baking at high temperature, apply red color resist CRY,
The red picture element 102 was formed so as to overlap with CGY in the same process as GY. Note that the developer is an alkaline developer (
Manufactured by Fuji Hunt Electronics Technology Co., Ltd.
(trade name: CD) was used. Similarly, blue picture elements 103 were formed to obtain a color filter substrate 112. In FIG. 7, an acrylic resin (product name CT, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) is applied as a protective film to the color filter substrate 113, and after drying, a protective film is formed in an area larger than the picture element area. Therefore, a protective layer 106 was formed by exposure using a photomask 110. At this time, the outer periphery of the pixel where the protective layer 106 is in direct contact with the transparent substrate 101 is in a state where the thickness of the protective layer 106 gradually decreases, that is, in order to create a structure with a positive taper. In the exposing step, a frame-shaped photomask 110 is used so that the overcoat layer is formed wider than the display area where the red, blue, and green light-transmitting pixel patterns are assembled, and the overcoat layer is formed so that the overcoat layer overlaps the mask surface. Exposure was performed while separating the mask and the overcoat layer so that the distance 111 from the film surface of the coat layer was 1.1 mm. As a result, a color filter substrate 114 as shown in FIG. 7 was obtained. When a liquid crystal device was manufactured using the obtained color filter substrate, a highly reliable liquid crystal device was obtained.

(Embodiment 4) In FIG. 4, a transparent substrate 10
1, a green color resist CGY is applied, and after drying, it is exposed to a desired amount of light using a glass mask and developed.
Striped green picture elements 104 were formed. After baking at high temperature, apply red color resist CRY,
The red picture elements 102 were formed in the same process as GY so as not to overlap with CGY. Note that an alkaline developer (trade name: CD, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was used as the developer. Similarly, blue picture element 103
A color filter substrate 109 was obtained. In FIG. 6, an acrylic resin (product name CT, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) is applied as a protective film to the substrate 109, and after drying, in order to form a protective film in a larger area than the pixel area. A protective layer 106 was formed by exposure using a photomask. At this time, in order to create a state in which the thickness of the protective layer 106 at the outer periphery of the pixel where the protective layer 106 is in direct contact with the transparent substrate 101 is gradually reduced, that is, to create a structure having a positive taper, In the exposing step, a frame-shaped photomask 11 is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns.
0, and the distance between the mask and the overcoat layer was set so that the distance 111 between the mask surface and the film surface of the overcoat layer was 2.4 mm. As a result, Figure 5
A color filter substrate 112 as shown in 1 was obtained. When a liquid crystal device was manufactured using the color filter substrate having the obtained protective layer, a highly reliable liquid crystal device was obtained.

(Example 5) In FIG. 8, an acrylic resin (product name CT, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was applied as a protective film to the color filter substrate 109 obtained in Example 2, and dried. After that, in order to form a protective film in a larger area than the picture element area, a protective layer 106 was formed by exposure using a photomask. At this time, the protective layer 10 in direct contact with the transparent substrate 101
In order to create a state in which the thickness of the protective layer 106 at the outer periphery of the pixel where 6 is present gradually decreases, that is, a structure having a positive taper, in the exposure step, a photo film is applied as shown in FIG. A protective layer was formed by exposing the mask to light with the opposite side of the mask in contact with the protective layer 106, which is a photosensitive material. This photomask uses a 2.8 mm glass substrate. A frame-shaped photomask 110 is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns, and the distance 111 between the mask surface and the film surface of the overcoat layer is 2. ．．
Exposure was performed with a distance between the mask and the overcoat layer so that the distance was 4 mm. As a result, a color filter substrate 112 as shown in FIG. 8 was obtained. When a liquid crystal element was manufactured using the obtained color filter substrate 112, a highly reliable liquid crystal element was obtained.

(Example 6) In FIG. 9, an acrylic resin (trade name CT, manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was applied as a protective film to the color filter substrate 113 obtained in Example 3, and dried. After that, in order to form a protective film in a larger area than the picture element area, a protective layer 106 was formed by exposure using a photomask. At this time, the protective layer 10 in direct contact with the transparent substrate 101
In order to create a state in which the thickness of the protective layer 106 at the outer periphery of the pixel where 6 is present gradually decreases, that is, a structure having a positive taper, in the exposure step, a photo film is applied as shown in FIG. A protective layer was formed by exposing the mask to light with the opposite side of the mask in contact with the protective layer 106, which is a photosensitive material. This photomask uses a 2.8 mm glass substrate. A frame-shaped photomask 110 is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns, and the distance 111 between the mask surface and the film surface of the overcoat layer is 2. ．．
Exposure was performed with a distance between the mask and the overcoat layer so that the distance was 4 mm. As a result, a color filter substrate 114 as shown in FIG. 9 was obtained. When a liquid crystal element was manufactured using the obtained color filter substrate 114, a highly reliable liquid crystal element was obtained.

[0019]

As described above, according to the present invention, a highly reliable color filter can be provided at low cost.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional view of a conventional color filter in which the light-shielding portion between picture elements is made by overlapping colors.

FIG. 2 is a cross-sectional view of a color filter with a thick protective layer.

FIG. 3 is a cross-sectional view of the color filter of the present invention.

FIG. 4 is a diagram showing an example of the method for manufacturing a color filter of the present invention.

FIG. 5 is a diagram showing an example of the method for manufacturing a color filter of the present invention.

FIG. 6 is a diagram showing an example of the method for manufacturing a color filter of the present invention.

FIG. 7 is a diagram showing an example of a method for manufacturing a color filter of the present invention.

FIG. 8 is a diagram showing an example of a method for manufacturing a color filter of the present invention.

FIG. 9 is a diagram showing an example of a method for manufacturing a color filter of the present invention.

[Explanation of symbols]

101: Transparent substrate 102: Red pixel 103: Blue pixel 104: Green pixel 105: Overlapping area of picture elements 106: Protective layer 107: Liquid crystal driver mounted on flexible substrate 108: Transparent electrode for driving liquid crystal 109 : Color filter substrate 110 of the present invention: Photomask

Claims (7)

[Claims] 1. A color filter having a red, blue, and green light-transmitting pixel pattern made of a negative pigment-dispersed color resist and an overcoat layer on a transparent substrate, the overcoat layer comprising red, blue,
It is formed wider than the green light-transmissive pixel pattern, and no overcoat layer is formed on the electrode terminal part.
A color filter characterized by a positive tapered edge shape around the overcoat. 2. A method for producing a color filter having a red, blue, and green light-transmissive pixel pattern made of a negative pigment-dispersed color resist and an overcoat layer on a transparent substrate, the method comprising applying an overcoat layer. baking the substrate having the overcoat layer, exposing it to light using a photomask, developing it, and baking it, and the overcoat layer has red, blue, green It is formed wider than the display area where the light-transmissive pixel patterns are assembled, and the electrode terminal portion has no overcoat layer, and the edge shape around the overcoat has a positive taper. A method for manufacturing a color filter. 3. The color filter according to claim 1, wherein the overcoat layer is a negative photoresist. 4. The method for manufacturing a color filter according to claim 2, wherein the overcoat layer is a negative photoresist. 5. In the exposing step, a frame-shaped photomask is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns, and the mask surface and the overcoat layer are 5. The method of manufacturing a color filter according to claim 2, wherein the exposure is performed with a distance between the mask and the overcoat layer such that the distance from the film surface of the layer is 1 μm or more. 6. In the exposing step, a frame-shaped photomask is used so that the overcoat layer is formed wider than a display area where red, blue, and green light-transmissive pixel patterns are assembled, and 4. The color filter according to claim 2, wherein the color filter is exposed with a distance between the mask and the overcoat layer such that the distance between the mask surface and the film surface of the overcoat layer is in the range of 30 μm to 5 mm. manufacturing method. 7. In the exposing step, a frame-shaped photomask is used so that the overcoat layer is formed wider than the red, blue, and green light-transmissive pixel patterns, and the mask surface and the overcoat layer are 5. The method of manufacturing a color filter according to claim 2, wherein the exposure is performed with a distance between the mask and the overcoat layer so that the distance from the film surface of the layer is in the range of 1 mm to 3 mm.