JPH042792A - Method for recycling fecl3 solution - Google Patents
Method for recycling fecl3 solutionInfo
- Publication number
- JPH042792A JPH042792A JP10051190A JP10051190A JPH042792A JP H042792 A JPH042792 A JP H042792A JP 10051190 A JP10051190 A JP 10051190A JP 10051190 A JP10051190 A JP 10051190A JP H042792 A JPH042792 A JP H042792A
- Authority
- JP
- Japan
- Prior art keywords
- fecl
- hcl
- fecl3
- solution
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はニッケルあるいはニッケルを含有する鉄合金、
例えば不変鋼(インバー)をFeCl,を含む水溶液で
エツチングする際に生成する廃液の再生処理方法に関す
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to nickel or an iron alloy containing nickel,
For example, the present invention relates to a method for regenerating waste liquid generated when etching unchanged steel (Invar) with an aqueous solution containing FeCl.
近年、テレビジョンやOA機器、コンピューターの発達
に伴い、CRTが多用されるようになり、しかも高精度
、高品位のものの要求が高まってき・た。これにつれて
シャドウマスクもインバーのような高ニッケル合金が使
用されるようになった。In recent years, with the development of televisions, office automation equipment, and computers, CRTs have come into widespread use, and demands for high precision and high quality have also increased. Along with this, high nickel alloys such as invar have also been used for shadow masks.
このような合金膜又は純ニツケル膜のエツチングには作
用が温和かつ確実で、ガスの発生がないところから高濃
度のFeCl5の水溶液が蝕刻剤として用いられている
。エツチングに伴ってニッケルや鉄等の素材である金属
が部分的に溶解すると、FeCl5は還元されてFeC
l□となる。一方鉄及びニッケルはそれぞれFeCl*
及びNiC1□になって溶解する。For etching such alloy films or pure nickel films, a highly concentrated aqueous solution of FeCl5 is used as an etching agent because it has a mild and reliable effect and does not generate gas. When raw metals such as nickel and iron are partially dissolved during etching, FeCl5 is reduced and becomes FeC.
It becomes l□. On the other hand, iron and nickel are each FeCl*
and NiC1□ and dissolves.
生成したFeCltは塩素ガスあるいは塩酸の存在下H
20,を用いること等によって容易に元のFeCl5に
酸化されるが、このような方法のみによっては系内にN
iCl2が蓄積し、遂には反応速度や平衡の点からみて
使用不能に到る。従ってエツチング液を循環使用するた
めには、少なくともその一部をエツチング廃液として抜
き取ってニッケル成分を除去した後、系内に戻すことが
必要となる。このようなエツチング廃液からニッケルを
除去する方法として種々の手段が提案されている。すな
わち、(a>廃液を電解してカソード還元により金属ニ
ッケルを析出させる方法(特開昭59−31868)。The generated FeClt is treated with H in the presence of chlorine gas or hydrochloric acid.
20, etc., it is easily oxidized to the original FeCl5, but only by such a method, N is added to the system.
iCl2 accumulates and eventually becomes unusable in terms of reaction rate and equilibrium. Therefore, in order to recycle the etching solution, it is necessary to extract at least a portion of it as etching waste solution, remove the nickel component, and then return it to the system. Various methods have been proposed for removing nickel from such etching waste liquid. That is, (a) a method of electrolyzing waste liquid and depositing metallic nickel by cathodic reduction (Japanese Patent Laid-Open No. 59-31868).
(b)グリオキシムのようなニッケルに選択的な錯化剤
を用いて錯体として沈澱分離する方法(特開昭59−1
90367)、(c)金属鉄を用いてニッケルを置換析
出させ、次いで塩素を用いてFe”+をFe3+に酸化
する方法(特公昭6l−44814)、(d)エツチン
グ廃液を加熱濃縮してから冷却し、先ずFeClx・4
H20の結晶を除き、母液を5〜−10℃に冷却しつつ
HClガスを導入してニッケルのみをNiCl2結晶と
して析出させて回収する一方、被処理液より HClを
ストリップすることにより、被処理液をFeClgの濃
厚液として回収すると共に、ストリップし回収したHC
lを前記の冷却晶析工程にリサイクルする方法(特公昭
63−10097)、(e)エツチング廃液にHClガ
スを吸収させNiCl2と同時にFeClzの結晶も晶
出させ、固液分離した分離液を加熱蒸留してHClガス
と水分の一部を除いた残液に水と鉄片を加えて中和後C
1,で酸化する方法(特開昭62−222088)等が
提案されている。(b) A method of precipitating and separating nickel as a complex using a selective complexing agent for nickel such as glyoxime (Japanese Unexamined Patent Publication No. 59-1
90367), (c) a method in which nickel is precipitated by displacement using metallic iron, and then Fe"+ is oxidized to Fe3+ using chlorine (Japanese Patent Publication No. 61-44814), (d) after heating and concentrating the etching waste liquid. After cooling, first FeClx・4
After removing H20 crystals, HCl gas is introduced while cooling the mother liquor to 5 to -10°C to precipitate and recover only nickel as NiCl2 crystals, while stripping HCl from the liquid to be treated. is recovered as a concentrated liquid of FeClg, and the stripped and recovered HC
(Japanese Patent Publication No. 63-10097), (e) absorbing HCl gas into the etching waste liquid to crystallize FeClz crystals at the same time as NiCl2, and heating the solid-liquid separated liquid. After distilling and removing some of the HCl gas and water, water and iron pieces are added to the residual liquid to neutralize it.
1 (Japanese Patent Laid-Open No. 62-222088) has been proposed.
上記従来法の(a)はFe t +とNi2+がそれぞ
れ金属となる標準電極電位が近い上、ニッケルは過電圧
゛を生じ易く、ニッケルのみを選択的に還元析出させる
ことが困難であり、Fe3′″も還元されるので経済的
でない。(b)は脱ニツケル率は高くできるが、錯化剤
が高価であり、一般にニッケルを完全に除去する必要は
ないのでメリットが少ない。(c)はFe 3 ′″が
すべてFe”+に還元された後ニッケルが析出するため
多量のFeCl□が生成するのでFeCl3を回収する
ためには必ずしも良い方法ではない。(d)は最も望ま
しい方法の一つであるが、5〜−10℃の低温に冷却す
る必要があり、電力費が嵩む上、FeCl5を水溶液と
して回収している関係上再生循環するエツチング用液中
の塩化水素を充分に除去することが困難である。エツチ
ング用液が遊離の塩化水素を一定限度以上含むときはエ
ツチングに際して水素が発生する等精密かつ安定な操作
が妨げられる恐れが大きい上、安全上も問題がある。In conventional method (a), Fe t + and Ni2+ have similar standard electrode potentials at which they become metals, and nickel tends to generate overvoltage, making it difficult to selectively reduce and precipitate only nickel. '' is also reduced, so it is not economical. (b) can achieve a high nickel removal rate, but the complexing agent is expensive, and it is generally not necessary to completely remove nickel, so it is not economical. (c) has few advantages. After all 3''' is reduced to Fe''+, nickel precipitates and a large amount of FeCl□ is generated, so this is not necessarily a good method for recovering FeCl3. (d) is one of the most desirable methods. However, it requires cooling to a low temperature of 5 to -10°C, which increases electricity costs, and because FeCl5 is recovered as an aqueous solution, hydrogen chloride in the recirculated etching solution cannot be sufficiently removed. If the etching solution contains free hydrogen chloride above a certain limit, there is a great possibility that hydrogen will be generated during etching, which will hinder precise and stable operation, and there will also be safety problems.
従ってCRTのシャドウマスクのような精度の高いエツ
チングを必要とする場合は、(e)の例のように回収塩
化鉄溶液に多量の金属鉄や酸化鉄を投入して遊離の塩酸
を中和する必要を生ずる。しかしながらここで加えた鉄
分によって多量のFe■が増加し、Fe”+とじてエツ
チング用に回収するためには、酸化剤の消費がふえる。Therefore, when highly accurate etching is required, such as for CRT shadow masks, a large amount of metallic iron or iron oxide is added to the recovered iron chloride solution to neutralize the free hydrochloric acid, as shown in example (e). create a need. However, the added iron increases a large amount of Fe2, and in order to recover it as Fe''+ for etching, the consumption of oxidizing agent increases.
又場合によってはバランス上過剰の鉄分を抜き出す必要
があり、これは無駄な消費であり合理的な方法とは言え
ない。Also, in some cases, it is necessary to extract excess iron for balance purposes, which is wasteful consumption and cannot be said to be a rational method.
本発明は上記のような課題を解決しようとするものであ
って、その方法は、FeCl5の水溶液を用いるニッケ
ル又はニッケル合金のエツチング工程がら排出されるN
iCl2、FeCl3あるいはさらにFeClzを含む
廃液にHClガスを吸収させ、溶解度の差により Ni
Cl2を晶折分離し、FeCl,とHClを回収して再
使用することを含むエツチングIil液の再生処理方法
において、(a)該エツチング廃液をそのまま、あるい
は濃縮し、HCl含有ガスと接触させてHClを吸収さ
せ、NiC1tの大部分とFeClzおよび/又はFe
Cl,の一部を15〜35℃において同時に晶出分離し
、FeCl3の大部分は塩酸溶液として回収する工程と
、(b)上記FeCl3の塩酸溶液を濃縮器で循環Fe
Cl5溶液と混合しながら加熱もしくは減圧加熱して濃
縮し、HClと水分の少なくとも一部を留去すると共に
、濃縮液の一部を抜き出し、晶出装置においてFeCl
5・2.5H−0を主とする結晶と、FeCl5溶液と
に析離せしめてそれぞれ分離し、母液は前記循環FeC
l3溶液として濃縮器に循環し、FeClz結晶は必要
に応じて水又は系内の遊離HClを殆ど含まない溶液で
洗浄した後、エツチング工程へ戻す工程と、(C)前工
程で留去されたHClと水の混合物から水分を分離して
HClを濃縮し、(a)工程に戻す工程の少なくとも三
工程の組合わせからなる。The present invention is an attempt to solve the above-mentioned problems, and the method uses N discharged from the etching process of nickel or nickel alloy using an aqueous solution of FeCl5.
HCl gas is absorbed into waste liquid containing iCl2, FeCl3 or even FeClz, and due to the difference in solubility Ni
In a method for regenerating an etching Iil liquid, which includes crystallizing Cl2 and recovering and reusing FeCl and HCl, (a) the etching waste liquid is brought into contact with an HCl-containing gas, either as is or after being concentrated; HCl is absorbed and most of NiClt and FeClz and/or Fe
A step of simultaneously crystallizing and separating a part of FeCl3 at 15 to 35°C and recovering most of FeCl3 as a hydrochloric acid solution, and (b) recycling the FeCl3 hydrochloric acid solution in a concentrator.
Concentrate by heating or heating under reduced pressure while mixing with Cl5 solution, distill off at least a part of HCl and water, and extract a part of the concentrated liquid.
Crystals mainly composed of 5.2.5H-0 and FeCl5 solution are precipitated and separated, and the mother liquor is collected from the circulating FeC
The FeClz crystals are circulated to the concentrator as a solution, and the FeClz crystals are washed as necessary with water or a solution containing almost no free HCl in the system, and then returned to the etching step, and (C) the FeClz crystals distilled off in the previous step It consists of a combination of at least three steps: separating water from a mixture of HCl and water, concentrating HCl, and returning it to step (a).
以下に本発明を図示のフローチャートに基いて説明する
。The present invention will be explained below based on the illustrated flowchart.
インバー等のニッケル合金板がFeCl1水溶液でエツ
チングされるとNiC1を及びFeCltが生成してエ
ツチング液中に溶解する。通常エツチング液はFeCl
5濃度を一定に保つため、酸化槽Oに循環され、C1,
等でFeClxがFeCl5に酸化され濃度が恢復した
ものを別途送られるメークアップ用FeCl3と必要に
応じて混合して使用する。NiC1*濃度がある程度、
例えば5%以上になるとエツチングに不適となるので、
エツチング液の一部は配管2あるいは1から抜き取られ
てエツチング廃液として再生処理にかけられる。この廃
液は通常FeCl5を約40−50wt%、FeClz
を約0−10wt%、NiCl2を2〜5wt%含有す
る。酸化後の液を酸化槽Oから配管2を通して抜き取れ
ば、FeClzを殆ど含まないので後の操作でFe”+
を殆ど含まないNIC12が得られる。酸化される前に
配管1を通して抜き取られた液を処理するときはl’1
ic1zと同時にFeCl 2も晶出し易いので、Ni
C1□の純度は下がる。しかしその分酸化のための負荷
は下がる。When a nickel alloy plate such as Invar is etched with an aqueous FeCl1 solution, NiCl and FeClt are generated and dissolved in the etching solution. Usually the etching solution is FeCl
In order to keep the concentration constant, C1,
FeClx is oxidized to FeCl5 and the concentration is recovered, and the mixture is used by mixing it with FeCl3 for makeup, which is sent separately, as necessary. NiC1* concentration to a certain extent,
For example, if it exceeds 5%, it will be unsuitable for etching.
A portion of the etching solution is extracted from the pipe 2 or 1 and subjected to regeneration treatment as etching waste solution. This waste liquid usually contains about 40-50 wt% FeCl5, FeClz
It contains approximately 0-10 wt% of NiCl2 and 2-5 wt% of NiCl2. If the oxidized liquid is extracted from the oxidation tank O through the pipe 2, it will contain almost no FeClz, so it will be removed in a later operation.
NIC12 containing almost no . l'1 when processing the liquid extracted through pipe 1 before being oxidized
Since FeCl2 also tends to crystallize at the same time as ic1z, Ni
The purity of C1□ decreases. However, the load for oxidation is reduced accordingly.
次にエツチング槽Eあるいは酸化槽Oから抜き取られた
廃液は配管3を経てNiCl2晶析器5へ送られるが、
場合によってはその前に予備濃縮器(図示せず)でFe
Cl,60〜’rowt%程度にまで濃縮してもよい。Next, the waste liquid extracted from the etching tank E or the oxidation tank O is sent to the NiCl2 crystallizer 5 via the pipe 3.
In some cases, Fe may be added in a pre-concentrator (not shown) before
Cl may be concentrated to about 60 to 100% by weight.
濃縮によって吸収させるべきHClの量が節約できる。Concentration saves the amount of HCl that has to be absorbed.
特にFeclを含有量の少ない廃液の場合に好ましい。This is particularly preferred in the case of waste liquid containing a small amount of Fecl.
晶析器5には配管6を通ってMCIが送られて被処理液
である廃液と接触する。MCI is sent to the crystallizer 5 through a pipe 6 and comes into contact with the waste liquid that is the liquid to be treated.
被処理液はポンプp−1,冷却器4により冷却循環され
つつ濡れ壁等適宜の手段によってHClと接触し、平均
的温度は15〜35℃の常温付近の温度が保たれるよう
にする。HClを加圧で吸収させてもよい。15℃未満
では冷却用動力費が増大し、35℃を超えればHClや
NiCl2の溶解度の関係で好ましくない。ここでNi
C1tは共通イオンであるCFの増大によって溶解度が
極めて小さくなり晶析する。The liquid to be treated is cooled and circulated by the pump p-1 and the cooler 4, and is brought into contact with HCl by suitable means such as a wetted wall, so that the average temperature is maintained at about room temperature of 15 to 35°C. HCl may be absorbed under pressure. If it is less than 15°C, the power cost for cooling increases, and if it exceeds 35°C, it is not preferable due to the solubility of HCl and NiCl2. Here Ni
The solubility of C1t becomes extremely low due to an increase in the common ion CF, and C1t crystallizes.
FeClxも同様の傾向を有する。FeClx also has a similar tendency.
一方FeCl sはクロロ鉄酸錯体HFeCl,となっ
て溶解度が上るので沈澱しにくくなる。FeCl1はH
Clの吸収方法によってはクロロ鉄酸錯体とする前に溶
解度の関係で沈澱させることもできるが、この場合はN
iC1*を恐らく共晶として巻き込んで行くので、残存
母液中のNiC1*濃度を大幅に下げることもできる。On the other hand, FeCl s becomes a chloroferric acid complex HFeCl, and its solubility increases, making it difficult to precipitate. FeCl1 is H
Depending on the absorption method of Cl, it may be possible to precipitate it before making it into a chloroferric acid complex due to solubility, but in this case, N
Since iC1* is probably involved as a eutectic, the NiC1* concentration in the remaining mother liquor can also be significantly lowered.
この際析出させる鉄分の量はニッケル合金の場合沈澱結
晶中のNi/Feの比が合金中のNi/Feに等しいか
、若干大きくしておけばFeCl5の系内への補給は不
要となり、等しいときは全系内ツバランスが成立する。In the case of a nickel alloy, the amount of iron to be precipitated is equal if the Ni/Fe ratio in the precipitated crystals is equal to or slightly larger than the Ni/Fe in the alloy, eliminating the need to replenish FeCl5 into the system. When, the total intra-system balance is established.
晶析器5内で生じたNiC1,FeCl,場合によって
はFeCl1を含む結晶スラリーはポンプp−2によっ
てNtC1z濾過器7へ送られ、そこで固液の分離が行
われる。濾過は任意の装置で行い得るが、温度は晶析温
度付近が好ましい。装置としては遠心分離器や加圧濾過
器等が好適に用いられる。この際発生する恐れのあるH
Clガスは適宜塩酸蒸気ライン8を通して処理される。A crystal slurry containing NiCl, FeCl, and possibly FeCl1 produced in the crystallizer 5 is sent by a pump p-2 to the NtC1z filter 7, where solid-liquid separation is performed. Filtration can be carried out using any device, but the temperature is preferably around the crystallization temperature. As the device, a centrifugal separator, a pressure filter, etc. are suitably used. H that may occur at this time
The Cl gas is optionally processed through a hydrochloric acid vapor line 8.
濾過@&7で分離された母液は濃厚なFeCl,(およ
び/又はHFeCl、)とHClを主体とする溶液であ
る。これはポンプ蝙
p−3によって脱HCl兼FeCl,濃縮l510へ供
給され蒸気11によって加熱されMCIの大部分と水分
が蒸発する。この際減圧蒸発の手段を用いてもよい。The mother liquor separated by filtration@&7 is a solution mainly consisting of concentrated FeCl (and/or HFeCl) and HCl. This is supplied to a de-HCl/FeCl/concentrator 1510 by a pump p-3, and heated by steam 11 to evaporate most of the MCI and water. At this time, reduced pressure evaporation may be used.
このHClと水の混合物は必要に応じてHCl濃縮装置
9において、例えばCaC1zを用いる抽出蒸留、加圧
蒸留、冷却分縮等適宜の手段を用いて90〜100%付
近まで濃度を高めて用いることにより、晶析器5におけ
る吸収効率があがる。一方濃縮器10内では後述する循
環FeCl5母液と混合され、FeClzは約75%前
後の濃度に濃縮される。濃縮温度は常圧で180℃程度
、減圧では60−120℃程度の温度が使用される。濃
縮液は配管15を経てFeCl5晶析器12へ送られる
が、図ではポンプp−4によって循環され、FeCl,
晶析用冷却器13によって冷却されるFeClxスラリ
ーの通る配管14に供給混合される。晶析器12の温度
は約30〜35℃に保たれ、主としてFeCl5・2.
5H,0の結晶が晶出し、スラリーとなってポンプp−
sを経てFeCl3分離器17に供給され30℃以上の
温度で固液分離される。結晶部分は配管16から送られ
る少量の水又は系内で発生する遊離のHClを殆ど含有
しない液、例えばMCIを吸収させる前の廃液の少量を
用いて洗浄し、遊離のHClを結晶から除去する。この
際後者の方法ではFeCl5結晶が多少Ni’C1gで
汚染されるが、量的に少ないので特に問題は生じない。This mixture of HCl and water may be used in the HCl concentrator 9 by increasing the concentration to around 90 to 100% using appropriate means such as extractive distillation using CaC1z, pressurized distillation, cooling decomposition, etc., as necessary. This increases the absorption efficiency in the crystallizer 5. Meanwhile, in the concentrator 10, FeClz is mixed with circulating FeCl5 mother liquor, which will be described later, and concentrated to a concentration of about 75%. The concentration temperature used is about 180°C under normal pressure, and about 60-120°C under reduced pressure. The concentrated liquid is sent to the FeCl5 crystallizer 12 through the pipe 15, but in the figure, it is circulated by the pump p-4, and FeCl,
The FeClx slurry is supplied and mixed into a pipe 14 through which the FeClx slurry is cooled by a crystallization cooler 13. The temperature of the crystallizer 12 is maintained at about 30-35°C, and mainly FeCl5.2.
Crystals of 5H,0 crystallize and become slurry, which is pumped p-
It is supplied to the FeCl3 separator 17 through s and subjected to solid-liquid separation at a temperature of 30° C. or higher. The crystal part is washed with a small amount of water sent from the pipe 16 or a liquid containing almost no free HCl generated in the system, for example, a small amount of the waste liquid before absorbing MCI, and free HCl is removed from the crystal. . At this time, in the latter method, the FeCl5 crystal is contaminated to some extent with 1 g of Ni'C, but since the quantity is small, no particular problem occurs.
FeCl1・2.5H10を主とする結晶を分離した母
液はFeCl5濃縮器循環液としてポンプp−6を経て
濃縮器10に戻される。The mother liquor from which the crystals mainly composed of FeCl1.2.5H10 have been separated is returned to the concentrator 10 via pump p-6 as the FeCl5 concentrator circulating fluid.
本発明で得られるFeCl、の結晶は粘着性が少なく、
母液の分離性も良いので遊離HClの分離は極めて良好
に行われ、化学的な除去操作は殆ど不用で、必要な場合
でもそのための鉄あるいは酸化鉄等の所要量は極く僅か
である。The crystals of FeCl obtained in the present invention have low stickiness,
Since the separation of the mother liquor is good, free HCl can be separated very well, almost no chemical removal operation is required, and even if necessary, the amount of iron or iron oxide required for this purpose is extremely small.
このようにして得られたFeCl,・2.5H,Oを主
とする結晶は溶解槽Sへ送られてFeCl,溶液として
エツチング槽に供給再使用される。The crystals mainly composed of FeCl, .2.5H and O thus obtained are sent to the dissolution tank S and supplied as a FeCl solution to the etching tank for reuse.
図のフローチャートに従って操業を行った結果を以下の
表1に示す。なおここで用いたエツチング廃液は図示し
てない濃縮器で約606/’ FeCl+濃度まで濃縮
したものである。表中の位置番号は図中のそれに対応す
る。The results of the operation according to the flow chart shown in the figure are shown in Table 1 below. The etching waste liquid used here was concentrated to a concentration of about 606/' FeCl+ using a concentrator (not shown). Position numbers in the table correspond to those in the figure.
(以下余白)
〔発明の効果〕
本発明は特に今後盤々増加する傾向にある高細精度のC
RTのシャドウマスク用のニッケル合金のエツチング廃
液の再生回収に有効であって、各種結晶の晶出温度が高
いので、エネルギー的に有利であり、回収FeCl s
中の遊離HClの除去も容易であるから産業上極めて優
れた方法である。(The following is a blank space) [Effects of the invention] The present invention is particularly useful for high-precision C
It is effective for recycling and recovering nickel alloy etching waste liquid for RT shadow masks, and since the crystallization temperature of various crystals is high, it is advantageous in terms of energy, and recovered FeCl s
This is an extremely excellent method industrially because it is easy to remove free HCl therein.
第1図は本発明の実施態様の一つを示すフローチャート
である。
1.2.3・・・・・配管 4・・・・・冷却器5
・・・・・NiC11晶析器 6・・・・・配管7・
・・・・NiCl2濾過58・・・・・塩酸蒸気ライン
9・・・・・HCl濃縮装置 10・・・・・脱HCl
兼FeCl5濃縮器11・・・・・スチーム 12
・・・・・FeCl,晶析器13・・・・・FeCl5
晶析用冷却器14、15.16・・・・・配管 17
・・・・・FeCl,分離器p−1,2,3,4,5,
6・・・・・ポンプE・・・・・エツチング槽 O・・
・・・酸化槽S・・・・・溶解槽FIG. 1 is a flowchart showing one embodiment of the present invention. 1.2.3...Piping 4...Cooler 5
...NiC11 crystallizer 6...Piping 7.
...NiCl2 filtration 58 ... Hydrochloric acid vapor line 9 ... HCl concentrator 10 ... HCl removal
Also FeCl5 concentrator 11...Steam 12
...FeCl, crystallizer 13 ...FeCl5
Crystallization cooler 14, 15.16...Piping 17
...FeCl, separator p-1, 2, 3, 4, 5,
6... Pump E... Etching tank O...
...Oxidation tank S...Dissolution tank
Claims (1)
ッケル合金のエッチング工程から排出されるNiCl_
2,FeCl_3,あるいはさらにFeCl_2を含む
廃液にHClガスを吸収させ、溶解度の差によりNiC
l_2を晶析分離し、FeCl_3とHClを回収して
再使用することを含むエッチング廃液の再生処理方法に
おいて、 (a)該エッチング廃液をそのまま、あるいは濃縮し、
HCl含有ガスと接触させてHClを吸収させ、NiC
l_2の大部分とFeCl_2および/又はFeCl_
3の一部を15〜35℃において同時に晶出分離し、F
eCl_3の大部分は塩酸溶液として回収する工程と、 (b)上記FeCl_3の塩酸溶液を濃縮器で循環Fe
Cl_3溶液と混合しながら加熱もしくは減圧加熱して
濃縮し、HClと水分の少なくとも一部を留去すると共
に、濃縮液の一部を抜出し、晶出装置においてFeCl
_3・2.5H_2Oを主とする結晶と、FeCl_3
溶液とに折離せしめてそれぞれ分離し、母液は前記循環
FeCl_3溶液として濃縮器に循環し、FeCl_3
結晶は必要に応じて水又は系内の遊離HClを殆ど含ま
ない溶液で洗浄した後、エッチング工程へ戻す工程と、 (c)前工程で留去されたHClと水の混合物から水分
を分離してHClを濃縮し、(a)工程に戻す工程の少
なくとも三工程を含むFeCl_3液の再生方法(1) NiCl_ discharged from the etching process of nickel or nickel alloy using an aqueous solution of FeCl_3,
2. HCl gas is absorbed into the waste liquid containing FeCl_3 or even FeCl_2, and NiC
In a method for recycling an etching waste liquid, which includes crystallizing and separating FeCl_2 and recovering and reusing FeCl_3 and HCl, (a) the etching waste liquid is used as it is or is concentrated;
Contact with HCl-containing gas to absorb HCl, NiC
l_2 and FeCl_2 and/or FeCl_
A part of 3 was simultaneously crystallized and separated at 15 to 35°C, and F
Most of the eCl_3 is recovered as a hydrochloric acid solution, and (b) the FeCl_3 hydrochloric acid solution is recycled in a concentrator.
Concentrate by heating or heating under reduced pressure while mixing with Cl_3 solution, distill off at least part of HCl and water, extract a part of the concentrated liquid, and convert it into FeCl in a crystallizer.
Crystals mainly composed of _3・2.5H_2O and FeCl_3
The mother liquor is circulated as the circulating FeCl_3 solution to the concentrator, and the FeCl_3
The crystals are washed with water or a solution containing almost no free HCl in the system as necessary, and then returned to the etching process; and (c) water is separated from the mixture of HCl and water distilled off in the previous process. A method for regenerating FeCl_3 liquid, comprising at least three steps of concentrating HCl and returning it to step (a).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2100511A JP2714594B2 (en) | 1990-04-18 | 1990-04-18 | Regeneration method of FeCl 3 solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2100511A JP2714594B2 (en) | 1990-04-18 | 1990-04-18 | Regeneration method of FeCl 3 solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH042792A true JPH042792A (en) | 1992-01-07 |
| JP2714594B2 JP2714594B2 (en) | 1998-02-16 |
Family
ID=14275977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2100511A Expired - Fee Related JP2714594B2 (en) | 1990-04-18 | 1990-04-18 | Regeneration method of FeCl 3 solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2714594B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5718874A (en) * | 1996-12-19 | 1998-02-17 | Thomson Consumer Electronics, Inc. | Solvent extraction method of separating ferric chloride from nickel chloride |
| WO2006028303A1 (en) * | 2004-09-08 | 2006-03-16 | Sam Do Chemical Co., Ltd | Method for recovery of nikel and regeneration of etching solution from a spent fecl3 etching solution |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62222087A (en) * | 1986-03-20 | 1987-09-30 | Osaka Soda Co Ltd | Method for regenerating spent etching solution |
| JPH01108999A (en) * | 1987-10-23 | 1989-04-26 | Tosoh Corp | Method for detecting mutation in the nucleic acid base sequence |
| JPH01317128A (en) * | 1988-04-29 | 1989-12-21 | Soc Atochem | Production of ferric chloride from dilute hydrochloric acid |
| JPH03291388A (en) * | 1990-04-10 | 1991-12-20 | Nittetsu Kakoki Kk | Treatment of used etching solution |
-
1990
- 1990-04-18 JP JP2100511A patent/JP2714594B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62222087A (en) * | 1986-03-20 | 1987-09-30 | Osaka Soda Co Ltd | Method for regenerating spent etching solution |
| JPH01108999A (en) * | 1987-10-23 | 1989-04-26 | Tosoh Corp | Method for detecting mutation in the nucleic acid base sequence |
| JPH01317128A (en) * | 1988-04-29 | 1989-12-21 | Soc Atochem | Production of ferric chloride from dilute hydrochloric acid |
| JPH03291388A (en) * | 1990-04-10 | 1991-12-20 | Nittetsu Kakoki Kk | Treatment of used etching solution |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5718874A (en) * | 1996-12-19 | 1998-02-17 | Thomson Consumer Electronics, Inc. | Solvent extraction method of separating ferric chloride from nickel chloride |
| WO2006028303A1 (en) * | 2004-09-08 | 2006-03-16 | Sam Do Chemical Co., Ltd | Method for recovery of nikel and regeneration of etching solution from a spent fecl3 etching solution |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2714594B2 (en) | 1998-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU1813111C (en) | Process for extracting gallium from industrial solution of sodium aluminate in bayer process | |
| JPH1154159A (en) | Method for recovering and regenerating cobalt, nickel or manganese and lithium from waste battery cathode material and battery cathode material | |
| CN108336426A (en) | The preparation method and its oxygen vanadium sulfate crystals obtained of a kind of vanadic sulfate | |
| CN110330143B (en) | Method for treating acidic wastewater containing fluorine, ammonia nitrogen and nickel | |
| CN112813268B (en) | PCB (printed circuit board) copper electroplating and acid etching copper resource recycling method | |
| CN112813267B (en) | Method for cooperatively performing PCB (printed circuit board) copper electroplating and acid etching | |
| CN110387474A (en) | The processing method of the electrolytic slag generated during aluminum production by fused-salt electrolysis scandium alloy | |
| CN106958021A (en) | A kind of regeneration treating method of highly acidity Ni from waste etching FeCl 3 solution containing | |
| EP0508187B1 (en) | Method of treating nickel-containing etching waste fluid | |
| CN113789547B (en) | Purification method of copper electrolysis waste liquid | |
| CN121202151A (en) | Methods for recovering fluorine from fluorine-containing tantalum-niobium tailings | |
| JPH042792A (en) | Method for recycling fecl3 solution | |
| EP0189831B1 (en) | Cobalt recovery method | |
| JP3492067B2 (en) | Recycling treatment of etching waste liquid | |
| JPH1150167A (en) | Method for producing high purity cobalt solution | |
| CN112813489B (en) | A kind of preparation method of reagent grade copper chloride dihydrate crystal | |
| JP2006176353A (en) | Method for recovering hydrochloric acid and copper from copper etching wastewater | |
| JPS6111891B2 (en) | ||
| JP2739072B2 (en) | Etching waste liquid treatment method | |
| JP4619955B2 (en) | Uranium waste treatment method | |
| JPH05139707A (en) | Sulfuric acid recovery | |
| JP2965457B2 (en) | Regeneration method of iron chloride waste liquid containing nickel | |
| WO1999043408A1 (en) | Solvent extraction of ferric chloride | |
| JP3589708B2 (en) | Production method of high purity copper | |
| JPH0558078B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |