JPH0428710Y2 - - Google Patents
Info
- Publication number
- JPH0428710Y2 JPH0428710Y2 JP1988011803U JP1180388U JPH0428710Y2 JP H0428710 Y2 JPH0428710 Y2 JP H0428710Y2 JP 1988011803 U JP1988011803 U JP 1988011803U JP 1180388 U JP1180388 U JP 1180388U JP H0428710 Y2 JPH0428710 Y2 JP H0428710Y2
- Authority
- JP
- Japan
- Prior art keywords
- microscope
- shape
- laser
- processing
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000004075 alteration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
Description
【考案の詳細な説明】
[産業上の利用分野]
この考案は、被加工物の加工箇所を顕微鏡で観
察しながらレーザ光による微細加工を行うことが
できるレーザ加工装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention relates to a laser processing device that can perform fine processing using a laser beam while observing the processing location of a workpiece with a microscope.
[従来の技術]
前記形式のレーザ加工装置は、半導体の製造工
程におけるホトマスクの修正(マスク・リペア)、
ハイブリツドICや抵抗モジユール中の抵抗体の
一部をカツトして抵抗値を設定値に調整する抵抗
値調整(抵抗トリミング)等の微細加工用として
開発されたもので、第4図はその従来例を示した
ものである。[Prior Art] The laser processing apparatus of the above type is used for photomask repair (mask repair) in the semiconductor manufacturing process;
It was developed for microfabrication purposes such as resistance value adjustment (resistance trimming), in which a part of the resistor in a hybrid IC or resistance module is cut to adjust the resistance value to a set value. Figure 4 shows a conventional example. This is what is shown.
この第4図において、符号1は顕微鏡部であ
り、この顕微鏡部1はいわゆる無限鏡筒式の顕微
鏡を構成しており、鏡筒1aの下端部に取り付け
られた対物レンズ1bの図中上方に該対物レンズ
1bの外側の焦点からの光を平行光にするレンズ
1cと、この平行光をふたたび集束光にするレン
ズ1dとが設けられたものである。また、この顕
微鏡部1は、前記レンズ1dの上方にこれらレン
ズの光軸とほぼ45°の角度なすように、ハーフミ
ラー1eが設けられ、さらに、このハーフミラー
1eの図中右方接眼部1gが設けられているもの
である。 In FIG. 4, reference numeral 1 denotes a microscope section, and this microscope section 1 constitutes a so-called infinite barrel type microscope, and the objective lens 1b attached to the lower end of the barrel 1a is located above the objective lens 1b in the figure. A lens 1c that converts light from a focal point outside the objective lens 1b into parallel light, and a lens 1d that converts the parallel light into convergent light again are provided. Further, this microscope section 1 is provided with a half mirror 1e above the lens 1d so as to form an angle of approximately 45 degrees with the optical axis of these lenses, and furthermore, a half mirror 1e is provided at the right eyepiece section of the half mirror 1e in the figure. 1g is provided.
また、前記鏡筒1aの上端部は開口されてお
り、この開口された上端部にはビーム断面成形器
2が結合されている。このビーム断面成形器2
は、前記鏡筒1aとほぼ同じ筒状をなして該鏡筒
1aの上端部に載置された本体部2aと、この本
体部2a内にあつて該本体部2aの中心軸に垂直
に配置された遮光板2bとからなつているととも
に、この遮光板2bはその中央部に開口部2cが
設けられている。なお、図示しないが、この開口
部2cはその開口形状を任意に変えることができ
るように構成されている。 Further, the upper end of the lens barrel 1a is open, and a beam section shaper 2 is coupled to this open upper end. This beam section shaper 2
The main body 2a has a substantially same cylindrical shape as the lens barrel 1a and is placed on the upper end of the lens barrel 1a, and the main body 2a is arranged perpendicularly to the central axis of the main body 2a within the main body 2a. The light shielding plate 2b has an opening 2c in its center. Although not shown, the opening 2c is configured so that its opening shape can be changed arbitrarily.
さらに、前記ビーム断面成形器2の上端部には
光結合器3が結合されている。この光結合器3
は、前記ビーム断面成形器2の本体部2aとほぼ
同じ筒状をなした本体部3aと、この本体部3a
内にあつて該本体部3aの中心軸と45°の角度を
なすように配置されたハーフミラー3bと、この
ハーフミラー3bの図中左方に設けられたコリメ
ータ部3cと、前記ハーフミラー3bの図中上方
に設けられた補正板3dとから構成されており、
前記本体部3aの図中上端部に結合されたレーザ
発振部4のレーザ装置4aから射出されたレーザ
光r1と、光源5から射出された光を光フアイバー
5aを通じて前記コリメータ部3cに導くことに
より平行光とされた参照光r2とを結合させて共通
の光路r上に導くものである。なお、前記光源5
は、ハロゲンランプと該ハロゲンランプから生ず
る白色光を識別可能な単色光にするフイルタとを
内蔵している。 Furthermore, an optical coupler 3 is coupled to the upper end of the beam section shaper 2. This optical coupler 3
A main body part 3a having a substantially same cylindrical shape as the main body part 2a of the beam cross-section shaper 2, and a main body part 3a.
A half mirror 3b located inside and arranged at an angle of 45° with the central axis of the main body portion 3a, a collimator portion 3c provided on the left side of the half mirror 3b in the figure, and the half mirror 3b. It is composed of a correction plate 3d provided above in the figure,
guiding the laser beam r1 emitted from the laser device 4a of the laser oscillation section 4 coupled to the upper end of the main body section 3a in the figure and the light emitted from the light source 5 to the collimator section 3c through the optical fiber 5a; The reference light r2 , which has been made into a parallel light by the above, is combined and guided onto a common optical path r. Note that the light source 5
contains a halogen lamp and a filter that converts the white light emitted by the halogen lamp into a distinguishable monochromatic light.
このような構成の装置によつてレーザ加工を行
うときは、まず、前記顕微鏡部1の対物レンズ1
bの近傍に被加工物6を配置し、前記接眼部1g
を通じて前記被加工物6の加工箇所6aのを拡大
して観察し、次に、前記参照光r2のスポツトを前
記加工箇所6aに形成し、このスポツト形状を前
記顕微鏡によつて観察しつつ前記ビーム断面成形
器2の開口部2cの形状を種々変えることにより
前記参照光のスポツト形状を加工予定形状にす
る。しかる後、前記レーザ発振器4のレーザ装置
からレーザ光r1を出射させる。これにより、前記
出射されたレーザ光r1は、前記対物レンズ1bに
よつて前記加工箇所6a上にほぼ前記参照光のス
ポツトと同じ形状のスポツト状に集束され、所望
の加工が行われる。 When laser processing is performed using an apparatus having such a configuration, first, the objective lens 1 of the microscope section 1 is
The workpiece 6 is placed near the eyepiece part 1g.
The machining location 6a of the workpiece 6 is magnified and observed through the lens, and then a spot of the reference light r2 is formed on the machining location 6a, and the shape of the spot is observed through the microscope. By variously changing the shape of the opening 2c of the beam cross-section shaper 2, the spot shape of the reference beam is made into the shape to be processed. Thereafter, a laser beam r1 is emitted from the laser device of the laser oscillator 4. As a result, the emitted laser beam r1 is focused by the objective lens 1b onto the processing location 6a into a spot having approximately the same shape as the spot of the reference light, and desired processing is performed.
[考案が解決しようとする課題]
ところで、前述の従来例のようなレーザ加工装
置において、前記顕微鏡部1として、市販のほぼ
規格化された顕微鏡を利用できれば、この顕微鏡
部1を新たに設計して制作する必要がなくなり、
装置全体の設計・制作が極めて容易になるととも
に、コストを著しく低減できる。[Problem to be solved by the invention] By the way, in a laser processing apparatus such as the conventional example described above, if a commercially available almost standardized microscope can be used as the microscope section 1, this microscope section 1 can be newly designed. There is no need to create
The design and production of the entire device becomes extremely easy, and costs can be significantly reduced.
ところが、一般に市販されている顕微鏡は、第
4図に点線R3で示されているように、対物レン
ズ1bの観察対称物側にある焦点p1が発した光が
前記鏡筒1a内であつて該鏡筒1aの上端部から
図中下方に位置する点P2に集束するように構成
されており、前記接眼部1gで観察したときにこ
のP1の位置にある物体にピントがあうようにな
つている。このため、このような市販の顕微鏡を
前記第4図の顕微鏡部1としてそのまま利用した
場合には、前記ビーム断面成形器2の開口部2c
を通過してきた光r4(図中実線で示される)は、
前記対物レンズ1bによつて集束されるが、その
集束点は前記P1と異なる点P3に位置することに
なる。 However , in general commercially available microscopes, as shown by the dotted line R3 in FIG. The lens barrel 1a is configured to focus from the upper end of the lens barrel 1a to a point P 2 located downward in the figure, and when observed with the eyepiece 1g, the object located at this position P 1 is in focus. It's becoming like that. Therefore, if such a commercially available microscope is used as it is as the microscope section 1 shown in FIG. 4, the opening 2c of the beam section shaper 2
The light r 4 (indicated by the solid line in the figure) that has passed through is
The light is focused by the objective lens 1b, but the focusing point is located at a point P3 different from the point P1 .
すなわち、前記接眼部1gによつて観察する際
にピントがあう位置P1と、前記参照光r2もしくは
レーザ光r1が集束される点P3とがずれることにな
る。その結果、正確なレーザ加工が困難になると
いう問題が生ずる。本考案の目的は、上述の欠点
を除去したレーザ加工装置を提供することにあ
る。 That is, the position P 1 that is in focus when observing with the eyepiece 1g and the point P 3 on which the reference light r 2 or laser light r 1 is focused are shifted from each other. As a result, a problem arises in that accurate laser processing becomes difficult. An object of the present invention is to provide a laser processing device that eliminates the above-mentioned drawbacks.
[課題を解決するための手段]
本考案に係るレーザ加工装置は、要するに、顕
微鏡の対物レンズとビーム断面成形器との間に、
該ビーム断面成形器の開口部を通過した光を、前
記対物レンズの被加工物と反対側に位置する焦点
の近傍で一旦集束させて前記対物レンズを通じて
最終的に前記被加工物の加工箇所に集束させるよ
うにした集束レンズ系を設けたもので、これによ
り、前記市販の顕微鏡を用いた場合でも、該顕微
鏡で観察したときにピントがあう加工箇所に前記
参照光及びレーザ光が集束されるようにしたもの
であつて、
具体的には、
被加工物の加工箇所を拡大して観察する顕微鏡
の対物レンズ系の光路に、互いに光路を共通にす
る参照光と加工用レーザ光とを導いて前記加工箇
所に集束させるようにし、前記レーザ光による加
工を行う前に前記参照光の加工箇所におけるスポ
ツト形状を前記顕微鏡によつて観察し、前記参照
光とレーザ光との共通光路中に設けられて開口部
を有した遮光手段によつてこれらの光の横断面形
状を前記開口部の形状に成形するビーム断面成形
器によつて前記参照光のスポツト形状を加工予定
形状にすることで、前記加工箇所の前記レーザ光
による加工形状を前記加工予定形状にするように
したレーザ加工装置において、
前記顕微鏡の対物レンズ系と前記ビーム断面成
形器との間に、該ビーム断面成形器の開口部を通
過した光を、前記対物レンズ系の前記被加工物と
反対側に位置する焦点の近傍で一旦集束させて前
記対物レンズを通じて最終的に前記被加工物の加
工箇所に集束させるようにした集束レンズ系を設
けたことを特徴とする構成を有する。[Means for Solving the Problems] In short, the laser processing device according to the present invention has a structure in which there is a
The light that has passed through the aperture of the beam cross-section shaper is once focused near a focal point of the objective lens located on the opposite side of the workpiece, and finally reaches the processing location of the workpiece through the objective lens. A focusing lens system is provided, so that even when the commercially available microscope is used, the reference beam and laser beam are focused on the processed area that is in focus when observed with the microscope. Specifically, a reference beam and a processing laser beam that share a common optical path are guided into the optical path of an objective lens system of a microscope that magnifies and observes the processing area of the workpiece. The spot shape of the reference light at the processing location is observed using the microscope before processing with the laser light, and the spot shape is set in the common optical path of the reference light and the laser light. By using a beam cross-section shaper that shapes the cross-sectional shape of these lights into the shape of the aperture using a light shielding means having an aperture, the spot shape of the reference light is made into the shape to be processed. In the laser processing apparatus, the shape to be processed by the laser beam at the processing location is the shape to be processed, wherein an opening of the beam section shaper is located between the objective lens system of the microscope and the beam section shaper. The light that has passed through is once focused in the vicinity of a focal point of the objective lens system located on the opposite side of the workpiece, and is finally focused on the processing location of the workpiece through the objective lens. It has a configuration characterized by providing a lens system.
[作用]
上述の構成において、前記顕微鏡の対物レンズ
と前記ビーム断面成形器との間に、該ビーム断面
成形器の開口部を通過した光を、前記対物レンズ
の前記被加工物と反対側に位置する焦点の近傍で
一旦集束させて前記対物レンズを通じて最終的に
前記被加工物の加工箇所に集束させるようにした
集束レンズ系を設けたことにより、前記顕微鏡と
して前述のような市販の顕微鏡を用いた場合で
も、該顕微鏡で観察したときにピントがあう加工
箇所に前記参照光及びレーザ光が集束されること
になる。[Function] In the above configuration, between the objective lens of the microscope and the beam cross-section shaper, the light that has passed through the opening of the beam cross-section shaper is directed to the opposite side of the objective lens from the workpiece. By providing a focusing lens system that once focuses near a focal point and finally focuses it on the processing location of the workpiece through the objective lens, it is possible to use a commercially available microscope as described above as the microscope. Even when used, the reference light and the laser light will be focused on the processing location that will be in focus when observed with the microscope.
[実施例]
第1図は、この考案に係るレーザ加工装置の一
実施例を示したものである。[Example] FIG. 1 shows an example of a laser processing apparatus according to this invention.
このレーザ加工装置は、第4図に示した従来装
置において、前記顕微鏡部1として前述の市販の
顕微鏡を用い、また、前記ビーム断面成形器2と
顕微鏡部1との間に、集光レンズ系7を設けたも
のである。この集光レンズ系7以外の構成は、前
記第4図に示したものと同様であるから、第4図
と同一の部分には同一の符号を付すことによつて
重複した説明は省略する。 This laser processing apparatus uses the above-mentioned commercially available microscope as the microscope section 1 in the conventional apparatus shown in FIG. 7. The configuration other than the condenser lens system 7 is the same as that shown in FIG. 4, so the same parts as in FIG. 4 are given the same reference numerals and redundant explanation will be omitted.
さて、この実施例では、前記集光レンズ系7
は、筒状本体部7aと、この筒状本体部7a内に
支持された2つの平凸レンズ7b及び7cとから
構成されている。 Now, in this embodiment, the condenser lens system 7
is composed of a cylindrical main body 7a and two plano-convex lenses 7b and 7c supported within the cylindrical main body 7a.
第2図は前記集光レンズ系7の近傍を拡大して
示した部分拡大断面図であり、前記2つの平凸レ
ンズ7b及び7cは互いに光軸を共通にし、か
つ、その平面部が相対向するように、支持部材7
d及び7eによつて支持されている。この場合、
これら平凸レンズ7b及び7dの焦点距離はとも
に15mmとされ、また、各々の主点ObとOcとの間
の距離L1が6mmとされている。そして、前記平
凸レンズ7bの主点Obと前記ビーム断面成形器
2の遮光板2bとの距離L2と、前記平凸レンズ
7cの主点Ocと前記顕微鏡部1の光の集束点P2
との距離L3とが、ともに30mmとなつている。な
お、上述の構成において、前記対物レンズ1bを
はじめとする他のレンズ系及びハーフミラー1
e,3b等の主要な光学系には、色収差による誤
差を防止するために色収差防止用コーテイングが
施されている。 FIG. 2 is a partially enlarged sectional view showing the vicinity of the condensing lens system 7, in which the two plano-convex lenses 7b and 7c have a common optical axis and their flat parts face each other. As shown, the support member 7
d and 7e. in this case,
The focal lengths of these plano-convex lenses 7b and 7d are both 15 mm, and the distance L 1 between their respective principal points O b and O c is 6 mm. The distance L 2 between the principal point O b of the plano-convex lens 7 b and the light shielding plate 2 b of the beam section shaper 2, and the principal point O c of the plano-convex lens 7 c and the light convergence point P 2 of the microscope section 1.
The distance L 3 and the distance L 3 are both 30 mm. Note that in the above configuration, other lens systems including the objective lens 1b and the half mirror 1
Main optical systems such as e and 3b are coated with anti-chromatic aberration coating to prevent errors due to chromatic aberration.
上述の構成によれば、前記ビーム断面成形器2
の開口部2cを通過した光r4は、前記点P2に一旦
集束され、しかる後、前記対物レンズ1bを通じ
て最終的に前記点P1、すなわち、前記被加工物
6の加工箇所6aに集束される。これにより、前
記接眼部1gで観察したときにピントがあう加工
箇所6aに前記参照光及びレーザ光が集束される
ことになり、したがつて、参照光のスポツト形状
を所望の加工形状に調節してレーザ光を照射する
ことで、前記参照光のスポツト形状とほぼ同じ形
状をなした所望のレーザ加工を正確に行うことが
できる。 According to the above configuration, the beam section shaper 2
The light r 4 that has passed through the aperture 2c is once focused on the point P 2 and then finally focused on the point P 1 , that is, the processing location 6a of the workpiece 6, through the objective lens 1b. be done. As a result, the reference light and the laser beam are focused on the processing area 6a that is in focus when observed with the eyepiece 1g, and therefore the spot shape of the reference light is adjusted to the desired processing shape. By irradiating the spot with a laser beam, it is possible to accurately perform desired laser processing in a spot shape that is approximately the same as the spot shape of the reference beam.
この実施例によれば、前記顕微鏡部1として、
市販のほぼ規格化された顕微鏡を用いているの
で、この顕微鏡部1を新たに設計して制作する必
要がなく、装置全体の設計・制作が極めて容易に
なるとともに、コストを著しく低減できるという
利点を有する。 According to this embodiment, the microscope section 1 includes:
Since a commercially available almost standardized microscope is used, there is no need to newly design and manufacture the microscope section 1, which makes the design and manufacture of the entire device extremely easy, and has the advantage of significantly reducing costs. has.
なお、前記実施例では、顕微鏡部1として、い
わゆる無限鏡筒式の顕微鏡を用いた例を示した
が、第3図に示すように、いわゆる有限鏡筒式の
市販の顕微鏡を用いてもよいことは勿論である。
この場合、他の構成は前記実施例と全く同一であ
り、このように構成しても前記実施例と同様の利
点を有する。 In the above embodiment, an example was shown in which a so-called infinite tube type microscope was used as the microscope section 1, but as shown in FIG. 3, a commercially available so-called finite tube type microscope may also be used. Of course.
In this case, the other configurations are exactly the same as in the previous embodiment, and even with this configuration, the same advantages as in the previous embodiment are obtained.
[考案の効果]
以上詳述したように、本考案は、顕微鏡の対物
レンズ系とビーム断面成形器との間に、該ビーム
断面成形器の開口部を通過した光を、前記対物レ
ンズの被加工物と反対側に位置する焦点の近傍で
一旦集束させて前記対物レンズ系を通じて最終的
に前記被加工物の加工箇所に集束させるようにし
た集束レンズ系を設けたもので、これにより、一
般の市販の顕微鏡を用いた場合でも、該顕微鏡で
観察したときにピントがあう加工箇所に前記参照
光及びレーザ光が集束されるようにして正確なレ
ーザ加工を可能にしたものであつて、この種のレ
ーザ加工装置の設計・制作を容易にするととも
に、コストを著しく低減できるという効果を得て
いるものである。[Effects of the invention] As described in detail above, the present invention provides a system between the objective lens system of the microscope and the beam section shaper, in which the light that has passed through the aperture of the beam section shaper is transferred to the beam section of the objective lens. This system is equipped with a focusing lens system that once focuses near a focal point located on the opposite side of the workpiece, and finally focuses it on the processing location of the workpiece through the objective lens system. Even when a commercially available microscope is used, the reference beam and laser beam are focused on the processing location that is in focus when observed with the microscope, making accurate laser processing possible. This has the effect of making it easier to design and manufacture a laser processing device, as well as significantly reducing costs.
第1図は、この考案に係るレーザ加工装置の一
実施例を示した図、第2図は前記第1図における
集光レンズ系7の近傍を拡大して示した部分拡大
断面図、第3図は本考案の他の実施例を示す図、
第4図は従来例を示す図である。
1……顕微鏡部、1b……対物レンズ、2……
ビーム断面成形器、3……参照光とレーザ光とを
共通の光路に導くための光結合器、4……加工用
レーザ光を射出するレーザ発振部、5……参照光
を発生する光源、6……被加工物、6a……加工
箇所、7……集束レンズ系。
FIG. 1 is a diagram showing an embodiment of the laser processing apparatus according to the invention, FIG. 2 is a partially enlarged sectional view showing the vicinity of the condenser lens system 7 in FIG. 1, and FIG. The figure shows another embodiment of the present invention;
FIG. 4 is a diagram showing a conventional example. 1... Microscope section, 1b... Objective lens, 2...
Beam cross section shaper, 3... Optical coupler for guiding the reference light and laser light to a common optical path, 4... Laser oscillation unit that emits processing laser light, 5... Light source that generates reference light, 6... Workpiece, 6a... Processing location, 7... Focusing lens system.
Claims (1)
の対物レンズ系の光路に、互いに光路を共通にす
る参照光と加工用レーザ光とを導いて前記加工箇
所に集束させるようにし、前記レーザ光による加
工を行う前に前記参照光の加工箇所におけるスポ
ツト形状を前記顕微鏡によつて観察し、前記参照
光とレーザ光との共通光路中に設けられて開口部
を有した遮光手段によつてこれらの光の横断面形
状を前記開口部の形状に成形するビーム断面成形
器によつて前記参照光のスポツト形状を加工予定
形状にすることで、前記加工箇所の前記レーザ光
による加工形状を前記加工予定形状にするように
したレーザ加工装置において、 前記顕微鏡の対物レンズ系と前記ビーム断面成
形器との間に、該ビーム断面成形器の開口部を通
過した光を、前記対物レンズ系の前記被加工物と
反対側に位置する焦点の近傍で一旦集束させて前
記対物レンズ系を通じて最終的に前記被加工物の
加工箇所に集束させるようにした集束レンズ系を
設けたことを特徴とするレーザ加工装置。[Scope of Claim for Utility Model Registration] A reference beam and a processing laser beam having a common optical path are guided into the optical path of an objective lens system of a microscope for magnifying and observing a processing location of a workpiece, and the processing location is guided to the processing location. Before performing processing using the laser beam, the spot shape of the reference beam at the processing location is observed using the microscope, and an aperture is provided in the common optical path of the reference beam and the laser beam. The spot shape of the reference beam is shaped into the shape to be machined by a beam cross-section shaper that shapes the cross-sectional shape of these lights into the shape of the aperture using the light shielding means, which has a light shielding means. In the laser processing apparatus, the shape to be machined by the laser beam is set to the shape to be machined, and the light passing through the opening of the beam cross-section shaper is placed between the objective lens system of the microscope and the beam cross-section shaper. , a focusing lens system is provided, which is configured to once focus near a focal point of the objective lens system located on the opposite side of the workpiece, and finally focus it on a processing location of the workpiece through the objective lens system. A laser processing device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988011803U JPH0428710Y2 (en) | 1988-01-30 | 1988-01-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988011803U JPH0428710Y2 (en) | 1988-01-30 | 1988-01-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01118892U JPH01118892U (en) | 1989-08-11 |
| JPH0428710Y2 true JPH0428710Y2 (en) | 1992-07-13 |
Family
ID=31220676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988011803U Expired JPH0428710Y2 (en) | 1988-01-30 | 1988-01-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0428710Y2 (en) |
-
1988
- 1988-01-30 JP JP1988011803U patent/JPH0428710Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01118892U (en) | 1989-08-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR960005214B1 (en) | Laser processing device and laser processing method | |
| US20080029497A1 (en) | Laser processing device | |
| JPS63293510A (en) | Laser radiating device | |
| CN106597632B (en) | Ellipsoidal mirror perifocus high-precision positioner and method | |
| US6888680B2 (en) | Optical arrangement for obtaining information from a sample or an observed object | |
| CN220188814U (en) | Bessel beam generation device and flying optical path cutting system | |
| JP2009042519A (en) | Objective lens | |
| JP2699282B2 (en) | Dual focus detection device using chromatic aberration | |
| JP2001079679A (en) | Laser processing machine | |
| JP4681821B2 (en) | Laser focusing optical system and laser processing apparatus | |
| JP2003255256A (en) | Optical scanning device | |
| JPH09159572A (en) | Optical device | |
| JP4690132B2 (en) | Focus detection device | |
| JP2001009580A (en) | Laser light focusing device | |
| JPH08220432A (en) | Projection optical system and exposure apparatus including the optical system | |
| JPH0370497B2 (en) | ||
| CN113369679A (en) | Laser processing device and optical system of laser processing device | |
| JP3177775B2 (en) | Photosynthesis method and synthetic emission optical system | |
| JPS63108318A (en) | Laser working device | |
| JP4723842B2 (en) | Scanning optical microscope | |
| CN106707479A (en) | High-precision positioning device and method for far focus of ellipsoidal reflector | |
| JPS6265327A (en) | Alignment device | |
| JPH10135571A (en) | Optical condensing system of semiconductor laser | |
| JPS6043236B2 (en) | Laser processing method | |
| JPH06186493A (en) | Forming device for film-like luminous flux |