JPH04292803A - Anisotropic conductive film - Google Patents
Anisotropic conductive filmInfo
- Publication number
- JPH04292803A JPH04292803A JP3056312A JP5631291A JPH04292803A JP H04292803 A JPH04292803 A JP H04292803A JP 3056312 A JP3056312 A JP 3056312A JP 5631291 A JP5631291 A JP 5631291A JP H04292803 A JPH04292803 A JP H04292803A
- Authority
- JP
- Japan
- Prior art keywords
- conductive particles
- insulating film
- conductive
- resin
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/321—Structures or relative sizes of die-attach connectors
- H10W72/325—Die-attach connectors having a filler embedded in a matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
Landscapes
- Combinations Of Printed Boards (AREA)
- Wire Bonding (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、端子間の電気絶縁性の
信頼性を向上した異方導電性フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anisotropic conductive film with improved reliability of electrical insulation between terminals.
【0002】0002
【従来の技術】従来、異方導電性フィルムは、樹脂内に
導電粒子を均一分散させたり、樹脂内に導電粒子を接続
ピッチに合わせて局在化させたり、シリコーンゴムに導
電繊維を埋め込むものが適用されてきた。隣接電極間の
短絡を防ぐために、導電粒子又は複数の導電粒子からな
る個体の最大長さを電極間間隔より小さくするなどの管
理が必要であった。また、特開平1−52303号公報
に記載されているように、導電物質として、繊維上の強
磁性体を用い、磁場中で膜厚方向に配行させることによ
り、細かいピッチでも電極間の短絡を起こさないように
している。[Prior Art] Conventionally, anisotropic conductive films have been produced by uniformly dispersing conductive particles in a resin, localizing conductive particles in a resin according to the connection pitch, or embedding conductive fibers in silicone rubber. has been applied. In order to prevent short circuits between adjacent electrodes, it is necessary to manage the maximum length of a conductive particle or an individual made of a plurality of conductive particles to be smaller than the inter-electrode spacing. In addition, as described in Japanese Patent Application Laid-open No. 1-52303, by using a ferromagnetic material on fibers as a conductive material and arranging it in the film thickness direction in a magnetic field, shorts can occur between electrodes even at a fine pitch. I try not to wake up.
【0003】0003
【発明が解決しようとする課題】近年、液晶ディスプレ
イの実用化に伴い、電極間接続に異方導電性接着剤、ま
たは、フィルムが多く用いられるようになってきた。そ
して、高密度の電極を経済的に接続できるため、パーソ
ナルコンピュータやテレビ等の実装分野で今後ますます
重要性が増してきている。そして、このような電子機器
の発達に伴って、今後、接続端子数が増大し、接続電極
のピッチが小さくなる傾向にある。従来の一般に用いら
れてきた異方導電性フィルムの接続最小ピッチは、約2
00μm程度であった。しかし、電極のピッチが小さく
なるにつれ、隣接電極間の間隔が小さくなるため、隣接
間電極で導電粒子同士が接触し短絡する可能性が増大し
、隣接電極間距離が制限されるとともに、隣接電極間の
電気的絶縁性の信頼性が問題となって来ている。従来の
異方導電性フィルムでは、導電粒子及び複数の導電粒子
からなる個体の分散管理が必要であった。このため、分
散制御に高度な技術が必要であり、また、導電粒子及び
複数の導電粒子からなる個体の大きさから、隣接電極間
隔などに自ずと制限があった。導電粒子を局在化させる
ため、特開平1−52303 号公報に示すように磁場
を利用して導電物質を配行させるには、磁場を形成する
ための装置が新たに必要となる。接続工程では、従来の
加圧や加熱のみで隣接間の電極の電気絶縁性が確保され
ることが好ましい。また、特開平1−33808 号公
報に示されるように、導電粒子径の分布を極めて狭い範
囲に制御することは、導電粒子の作製および選別上、高
度な技術を要する。導電粒子径の分布が広い範囲の場合
でも、接続電極間の電気的導通を確保できることが好ま
しい。本発明の目的は、電気接続端子間の接続に関し、
接続電極間の電気的導通を確保し、且つ、隣接電極間の
電気絶縁性を確保出来る異方導電性フィルムを提供する
ことにある。[Problems to be Solved by the Invention] In recent years, with the practical use of liquid crystal displays, anisotropically conductive adhesives or films have come to be widely used for connection between electrodes. Since high-density electrodes can be connected economically, it will become increasingly important in the field of mounting personal computers, televisions, etc. With the development of such electronic devices, the number of connection terminals will increase in the future, and the pitch of connection electrodes will tend to become smaller. The minimum connection pitch of conventionally commonly used anisotropic conductive films is approximately 2
It was about 00 μm. However, as the electrode pitch becomes smaller, the spacing between adjacent electrodes becomes smaller, increasing the possibility that conductive particles in adjacent electrodes will come into contact with each other and cause a short circuit, limiting the distance between adjacent electrodes, and The reliability of the electrical insulation between them has become a problem. In conventional anisotropic conductive films, it is necessary to manage the dispersion of conductive particles and a plurality of conductive particles. For this reason, advanced technology is required for dispersion control, and there is a natural limit to the distance between adjacent electrodes due to the size of the conductive particles and the individual particles made up of a plurality of conductive particles. In order to localize conductive particles by using a magnetic field to arrange a conductive substance as shown in Japanese Patent Laid-Open No. 1-52303, a new device for forming a magnetic field is required. In the connection step, it is preferable that the electrical insulation between adjacent electrodes be ensured only by conventional pressurization or heating. Further, as shown in Japanese Patent Application Laid-Open No. 1-33808, controlling the distribution of conductive particle diameters within an extremely narrow range requires advanced technology in the production and selection of conductive particles. Even when the conductive particle size distribution is wide, it is preferable that electrical continuity between the connecting electrodes can be ensured. The object of the present invention is related to the connection between electrical connection terminals,
An object of the present invention is to provide an anisotropically conductive film that can ensure electrical continuity between connecting electrodes and electrical insulation between adjacent electrodes.
【0004】0004
【課題を解決するための手段】上記目的を達成するため
には、本発明は導電粒子からなる個体同士の電気絶縁性
が確保されることによって隣接電極間の電気絶縁性が確
保され、且つ、接続電極間では導電性が確保される必要
がある。本発明は、異方導電性フィルムに用いる複数の
導電粒子からなる個体に、加圧などの接続工程で取り除
かれる絶縁性膜を形成されたものを用いる点に特徴があ
る。絶縁性膜は前記個体を内包したカプセル状のもので
も、個体を絶縁性樹脂でコ−ティングした状態であって
もよい。この絶縁性膜により、個体同士が接触しても、
電気絶縁性が確保される。また、前記個体を被っている
絶縁性膜は、加圧などの機械的接続工程を経ることで、
接続電極間の個体を形成している導電粒子が動き、移動
することによって、導電粒子からなる個体を被っている
絶縁性膜を破壊し、導電粒子の表面が露出することによ
って、接続電極間の電気導通が確保される。また、加熱
,通電などによって、個体の絶縁性膜を軟化し、塑性流
動し、電極面に接している導電粒子表面を露呈させるこ
とによって、接続端子間の電気導通が確保される。[Means for Solving the Problems] In order to achieve the above object, the present invention ensures electrical insulation between adjacent electrodes by ensuring electrical insulation between solid conductive particles, and Conductivity must be ensured between the connecting electrodes. The present invention is characterized in that an insulating film that is removed during a connection process such as pressurization is formed on a solid body made of a plurality of conductive particles used for an anisotropic conductive film. The insulating film may be in the form of a capsule containing the individual, or may be in a state in which the individual is coated with an insulating resin. Due to this insulating film, even if individuals come into contact with each other,
Electrical insulation is ensured. In addition, the insulating film covering the individual can be formed through a mechanical connection process such as pressurization.
The conductive particles that form the solid body between the connecting electrodes move and move, breaking the insulating film covering the solid body made of conductive particles and exposing the surface of the conductive particles, causing the solid body between the connecting electrodes to move. Electrical continuity is ensured. In addition, by heating, energizing, etc., the solid insulating film is softened and plastically flows to expose the surface of the conductive particles in contact with the electrode surface, thereby ensuring electrical continuity between the connection terminals.
【0005】[0005]
【作用】異方導電性フィルムに用いる導電粒子からなる
個体に、加圧などの接続工程で取り除かれる絶縁性膜を
形成されたものを用いることにより、個体同士が単に接
触しても、電気絶縁性が確保されることにより、隣接電
極間隔が小さくすることが可能となり、且つ、個体を被
っている絶縁性膜は、加圧などの機械的接続工程を経る
ことで、接続電極間の個体を形成している導電粒子が動
き、移動することによって、導電粒子からなる個体を被
っている絶縁性膜を破壊し、導電粒子の表面が露出する
ことによって、接続電極間の電気導通が確保される。ま
た、加熱,通電などによって、個体の絶縁性膜を軟化し
、塑性流動し、電極面に接している導電粒子表面を露呈
させることによって、接続端子間の電気導通が確保され
る。[Operation] By using an insulating film formed on the solid conductive particles used in the anisotropic conductive film, which is removed during the connection process such as applying pressure, electrical insulation can be achieved even if the solids simply come into contact with each other. By ensuring this property, it is possible to reduce the distance between adjacent electrodes, and the insulating film covering the individual can be used to connect the individual between the connected electrodes through a mechanical connection process such as applying pressure. The movement of the formed conductive particles destroys the insulating film covering the individual conductive particles, exposing the surface of the conductive particles, ensuring electrical continuity between the connected electrodes. . In addition, by heating, energizing, etc., the solid insulating film is softened and plastically flows to expose the surface of the conductive particles in contact with the electrode surface, thereby ensuring electrical continuity between the connection terminals.
【0006】[0006]
【実施例】以下、本発明を実施例に従って説明する。[Examples] The present invention will be explained below with reference to Examples.
【0007】〈実施例1〉図1は本発明の異方導電性フ
ィルムを用いた一実施例を示す断面図である。半導体素
子1は、異方導電性フィルム2を介して絶縁性ベース基
板3に固着されている。半導体素子1の電極4は、異方
導電性フィルム2内の複数の導電粒子5からなる個体6
を介して絶縁性ベース基板3の電極11と電気導通が確
保されている。導電粒子5には、ニッケル金属材料を用
いている。導電粒子5は、ニッケル材料以外でも、銅,
アルミニウム,銀などの電気を通す材料であれば良い。
本実施例では、平均粒径5μmの導電粒子を用いた。隣
接電極間隔は30μmである。複数の導電粒子5からな
る個体6は、熱可塑性エポキシ樹脂からなる絶縁性膜7
がコーティングされている。異方導電性フィルムの主体
となる樹脂8は熱硬化性ポリイミド樹脂からなっている
。絶縁性膜7を形成している樹脂は、熱可塑性エポキシ
樹脂以外でも、シリコン,ポリスチロール,ポリプロピ
レン,ポリ塩化ビニル,ポリエチレン,ポリアミド,ポ
リウレタン,ポリエステルなど異方導電性フィルムの主
体となる樹脂8より軟化温度が低い樹脂であれば良い。<Example 1> FIG. 1 is a sectional view showing an example using the anisotropically conductive film of the present invention. The semiconductor element 1 is fixed to an insulating base substrate 3 via an anisotropic conductive film 2. The electrode 4 of the semiconductor element 1 is an individual 6 made up of a plurality of conductive particles 5 within the anisotropic conductive film 2.
Electrical continuity with the electrode 11 of the insulating base substrate 3 is ensured via the insulating base substrate 3. The conductive particles 5 are made of nickel metal material. The conductive particles 5 may be made of copper, other than nickel material.
Any material that conducts electricity, such as aluminum or silver, may be used. In this example, conductive particles with an average particle size of 5 μm were used. The spacing between adjacent electrodes is 30 μm. An individual 6 made of a plurality of conductive particles 5 is an insulating film 7 made of a thermoplastic epoxy resin.
is coated. The resin 8, which is the main component of the anisotropically conductive film, is made of thermosetting polyimide resin. In addition to thermoplastic epoxy resin, the resin forming the insulating film 7 may also be selected from the resin 8 that is the main component of the anisotropically conductive film, such as silicone, polystyrene, polypropylene, polyvinyl chloride, polyethylene, polyamide, polyurethane, and polyester. Any resin with a low softening temperature may be used.
【0008】図2に接続工程を示す。図2の(a)に示
すように、異方導電性フィルムは加熱加圧による接続工
程を経る前は、個体6の周囲は、絶縁性膜7で完全に被
われている。このため、個体同士が接触しても電気導通
はおこらない。個体6は、複数の導電粒子からなってい
る。そして、個体6は隣接電極の間隔より狭く分散して
いる。個体6の大きさは、接続後の半導体素子1の電極
4と電気絶縁性基板3の電極8との距離より、長くても
短くても良い。異方導電性フィルムを半導体素子1と絶
縁性ベース基板3の間に配置し、加熱加圧する。本発明
に用いられる異方導電性フィルムは、シート状でも、ペ
ースト状でも電極面表面を被覆できる形態であればよい
。図2の(b)に加熱加圧後の接続状態の断面図を示す
。加熱方式は、加圧時の治具をつたわる熱伝導加熱,赤
外線加熱,高周波加熱,超音波加熱,レーザ加熱などが
可能である。160℃,30秒の加圧加熱により、半導
体素子1の電極4と絶縁性ベース基板の電極11の間に
存在する個体6同士は移動して互いに接し、個体6を被
っていた絶縁性膜7は、軟化し塑性流動して、接してい
る導電粒子間及び電極と導電粒子間より取り除かれ、電
気導通を得ることができた。異方導電性フィルムの厚さ
は、隣接電極間に存在している個体に過度の圧力が加わ
らないように決められる。これにより、隣接電極間に存
在する個体は、加熱加圧接続後も、接続工程前の形態を
保ち存在している。個体は、絶縁性膜で被われているた
め、隣接電極間で接しても、隣接電極間の電気絶縁性は
保たれていた。FIG. 2 shows the connection process. As shown in FIG. 2A, before the anisotropic conductive film undergoes a connection process by heating and pressurizing, the periphery of the individual 6 is completely covered with an insulating film 7. Therefore, electrical conduction does not occur even if the individuals come into contact with each other. The individual 6 consists of a plurality of conductive particles. The individuals 6 are dispersed narrower than the spacing between adjacent electrodes. The size of the individual 6 may be longer or shorter than the distance between the electrode 4 of the semiconductor element 1 and the electrode 8 of the electrically insulating substrate 3 after connection. An anisotropic conductive film is placed between the semiconductor element 1 and the insulating base substrate 3, and heated and pressed. The anisotropic conductive film used in the present invention may be in the form of a sheet or paste as long as it can cover the electrode surface. FIG. 2(b) shows a cross-sectional view of the connected state after heating and pressurizing. Possible heating methods include thermal conduction heating through a jig during pressurization, infrared heating, high frequency heating, ultrasonic heating, and laser heating. By pressurizing and heating at 160° C. for 30 seconds, the solids 6 existing between the electrodes 4 of the semiconductor element 1 and the electrodes 11 of the insulating base substrate move and come into contact with each other, and the insulating film 7 covering the solids 6 is removed. was softened and plastically flowed, and was removed from between the contacting conductive particles and between the electrode and the conductive particles, and electrical continuity could be obtained. The thickness of the anisotropic conductive film is determined so as not to apply excessive pressure to the solids existing between adjacent electrodes. As a result, the solids existing between adjacent electrodes remain in the same shape as before the connection process even after the heating and pressurizing connection. Since the individual was covered with an insulating film, electrical insulation between adjacent electrodes was maintained even if they were in contact with each other.
【0009】〈実施例2〉図3は本発明の第二の実施例
を示す断面図である。図3の(a)に示す異方導電性フ
ィルム2は、絶縁性樹脂からなるカプセル9を複数個含
んでいる。カプセル9内には、導電粒子として、はんだ
金属粒子5が含まれている。はんだ材料は、ビスマスを
18%含有した低融点はんだを用いた。はんだ材料の融
点は約165℃である。カプセル9は、はんだ材料より
、軟化点の高いポリイミド樹脂を用いた。異方導電性フ
ィルム2の主体となす樹脂には、カプセル9に用いたポ
リイミド樹脂よりも軟化点の低い熱可塑性エポキシ樹脂
を用いた。接合工程のおける加熱加圧条件は、導電粒子
の融点,カプセルの絶縁膜及び異方導電性フィルムの主
体となす樹脂の軟化点に関する温度特性を考慮して決定
される。図3の(b),(c)に本発明の異方導電性フ
ィルムを用いた接続工程を示す。図3の(b)は、異方
導電性フィルムを接続電極間に配置後、加圧した状態の
断面図を示している。半導体素子1の電極4と絶縁性ベ
ース基板3の電極11の間に挾まれたカプセル9は、圧
力により、カプセルの外壁を形成している絶縁性膜に亀
裂が入り破壊される。隣接電極間に存在しているカプセ
ルは半導体素子1と絶縁性ベース基板3の間の距離は、
半導体素子1の電極4と絶縁性ベース基板3の電極11
の間より、電極部の高さの分だけ広く、また、カプセル
の周囲は、弾性係数の低い熱可塑性樹脂であるため、カ
プセルに受ける圧力が小さく、カプセルには亀裂が入ら
ない。
図3(c)は、図3(b)の加圧後、加熱した状態を示
す断面図である。加熱温度は、はんだの融点である16
5℃より高く、カプセルの外壁を形成しているポリイミ
ド樹脂の軟化点250℃よりも低い180℃で接合した
。接続電極間のはんだ粒子は互いに結合し、一つの大き
な粒子を形成し、接続電極間の電気導通が可能になった
。隣接電極間に存在しているカプセルは、カプセル周囲
は熱伝導率の低い樹脂で囲まれているため、内包してい
るはんだ粒子は溶融しにくく、また、溶融しても、カプ
セルの外壁を形成するポリイミド樹脂の軟化温度より低
い加熱条件のため、カプセル外壁の溶解,流動等は起こ
らず、外壁外との絶縁性を保っている。カプセル内に、
電気導通を目的とした導電粒子の他に、電極面の酸化膜
を除去し、はんだ接合を補助するフラックスを混入する
と一層はんだ固着性が高まる。また、負荷により発色す
る物質をカプセル内に入れておくと、接合工程の監視や
接合状態の検査に役立つ。また、ベンゾイルパーオキサ
イドやジクミルパーオキサイドなど、負荷により熱を発
生する物質をカプセル内に入れておくと、接合時に外部
から加える熱を低下させることが可能である。<Embodiment 2> FIG. 3 is a sectional view showing a second embodiment of the present invention. The anisotropic conductive film 2 shown in FIG. 3(a) includes a plurality of capsules 9 made of insulating resin. The capsule 9 contains solder metal particles 5 as conductive particles. As the solder material, a low melting point solder containing 18% bismuth was used. The melting point of the solder material is approximately 165°C. For the capsule 9, polyimide resin having a higher softening point than the solder material was used. As the main resin for the anisotropically conductive film 2, a thermoplastic epoxy resin having a lower softening point than the polyimide resin used for the capsule 9 was used. The heating and pressurizing conditions in the bonding step are determined in consideration of the melting point of the conductive particles and the temperature characteristics regarding the softening point of the resin that is the main component of the insulating film of the capsule and the anisotropically conductive film. FIGS. 3(b) and 3(c) show a connection process using the anisotropic conductive film of the present invention. FIG. 3B shows a cross-sectional view of the anisotropic conductive film placed between the connection electrodes and then pressurized. The capsule 9 sandwiched between the electrode 4 of the semiconductor element 1 and the electrode 11 of the insulating base substrate 3 is destroyed by cracks in the insulating film forming the outer wall of the capsule due to the pressure. The distance between the semiconductor element 1 and the insulating base substrate 3 is as follows:
Electrode 4 of semiconductor element 1 and electrode 11 of insulating base substrate 3
The capsule is wider by the height of the electrode part, and the capsule is surrounded by a thermoplastic resin with a low elastic modulus, so the pressure applied to the capsule is small and the capsule does not crack. FIG. 3(c) is a cross-sectional view showing a heated state after pressurization in FIG. 3(b). The heating temperature is the melting point of the solder16
Bonding was carried out at 180°C, which is higher than 5°C and lower than the softening point of 250°C of the polyimide resin forming the outer wall of the capsule. The solder particles between the connecting electrodes bonded to each other to form one large particle, allowing electrical continuity between the connecting electrodes. The capsule that exists between adjacent electrodes is surrounded by a resin with low thermal conductivity, so the solder particles inside are difficult to melt, and even if they melt, they will not form the outer wall of the capsule. Because the heating conditions are lower than the softening temperature of the polyimide resin, the outer wall of the capsule does not melt or flow, maintaining insulation from the outside of the outer wall. Inside the capsule,
In addition to conductive particles for the purpose of electrical conduction, removing the oxide film on the electrode surface and adding flux to assist solder bonding further improves solder adhesion. In addition, if a substance that develops color depending on the load is placed inside the capsule, it will be useful for monitoring the bonding process and inspecting the bonding state. Furthermore, if a substance that generates heat due to load, such as benzoyl peroxide or dicumyl peroxide, is placed in the capsule, it is possible to reduce the amount of heat applied from the outside during bonding.
【0010】〈実施例3〉図4(a)(b)は本発明の
第三の実施例を示す断面図である。図4(a)の異方導
電性フィルム2の中には、絶縁性膜7をもつ導電粒子5
からなる個体6が接するぐらいの高密度で配合されてい
る。絶縁性基板3上の電極11と半導体素子1上の電極
4の表面には、絶縁性膜7を溶かす溶剤12が塗布され
ている。絶縁性膜7はエポキシ樹脂でできている。溶剤
12はエチレングリコール系の溶剤であり、エポキシ樹
脂を膨潤して溶かす働きがある。異方導電性フィルムの
主体となす樹脂8は、光硬化性樹脂である。図4(b)
は、本発明の接合状態を示している。加熱は行わず、光
を照射させて、光硬化性樹脂の収縮力で電極間のコンタ
クトを保っている。接続電極間の導電粒子5を覆ってい
る絶縁性膜7は、電極表面に塗布されていた溶剤12に
より膨潤溶解し、導電粒子5の表面を露呈し、電極表面
と電気的導通を得ている。隣接電極間にある絶縁性膜を
もつ導電粒子は、溶剤12と接しないため、絶縁性膜は
溶けず、導電粒子間の電気絶縁性は確保されている。Embodiment 3 FIGS. 4(a) and 4(b) are cross-sectional views showing a third embodiment of the present invention. In the anisotropic conductive film 2 of FIG. 4(a), there are conductive particles 5 having an insulating film 7.
It is blended at such a high density that the individuals 6 consisting of are in contact with each other. A solvent 12 that dissolves the insulating film 7 is applied to the surfaces of the electrode 11 on the insulating substrate 3 and the electrode 4 on the semiconductor element 1 . The insulating film 7 is made of epoxy resin. The solvent 12 is an ethylene glycol-based solvent, and has the function of swelling and dissolving the epoxy resin. The resin 8 that is the main component of the anisotropically conductive film is a photocurable resin. Figure 4(b)
shows the bonded state of the present invention. Without heating, light is irradiated to maintain contact between the electrodes using the contractile force of the photocurable resin. The insulating film 7 covering the conductive particles 5 between the connecting electrodes is swollen and dissolved by the solvent 12 applied to the electrode surface, exposing the surface of the conductive particle 5 and establishing electrical continuity with the electrode surface. . Since the conductive particles having an insulating film between adjacent electrodes do not come into contact with the solvent 12, the insulating film does not melt, and electrical insulation between the conductive particles is ensured.
【0011】[0011]
【発明の効果】本発明によれば、導電粒子又は導電粒子
からなる個体の大きさで制限されていた隣接電極間の距
離をさらに小さくすることができる。よって、より高密
度の実装が可能となる。According to the present invention, it is possible to further reduce the distance between adjacent electrodes, which was limited by the size of conductive particles or solid particles made of conductive particles. Therefore, higher density packaging is possible.
【図1】本発明の異方導電性フィルムを用いた一実施例
の断面図。FIG. 1 is a sectional view of an example using the anisotropically conductive film of the present invention.
【図2】図1の実施例の接続工程を示す説明図。FIG. 2 is an explanatory diagram showing a connection process in the embodiment of FIG. 1;
【図3】本発明の第二の実施例を示す断面図。FIG. 3 is a sectional view showing a second embodiment of the invention.
【図4】本発明の第三の実施例を示す断面図。FIG. 4 is a sectional view showing a third embodiment of the present invention.
1…半導体素子、2…異方導電性フィルム、3…絶縁性
ベース基板、4…半導体素子上の電極、5…導電粒子、
6…個体、7…絶縁性膜、8…異方導電性フィルムの主
体となす樹脂、11…絶縁性ベース基板状の電極。DESCRIPTION OF SYMBOLS 1... Semiconductor element, 2... Anisotropically conductive film, 3... Insulating base substrate, 4... Electrode on semiconductor element, 5... Conductive particles,
6... Solid, 7... Insulating film, 8... Resin forming the main body of the anisotropically conductive film, 11... Insulating base substrate-shaped electrode.
Claims (7)
電極間に用いられる接続材料において、前記接続材料の
主体となる樹脂中に、前記接続材料の主体となる樹脂成
分とは異なる成分からなる絶縁性膜を外壁とする個体が
分散配合され、前記個体内には、導電粒子を内包してい
ることを特徴とする異方導電性フィルム。1. A connecting material used between opposing electrodes disposed to establish an electrical connection, wherein a resin that is the main component of the connection material contains a component different from a resin component that is the main component of the connection material. 1. An anisotropically conductive film characterized in that a solid having an insulating film as an outer wall is dispersed therein, and the solid has conductive particles encapsulated therein.
電極間に用いられる接続材料において、前記接続材料の
主体となる樹脂中に、前記接続材料の主体となる樹脂と
は異なる軟化温度を有する絶縁性膜を外壁とする個体が
分散配合され、前記個体内には、導電粒子を内包してい
ることを特徴とする異方導電性フィルム。2. In a connecting material used between opposing electrodes disposed to establish an electrical connection, a resin that is the main component of the connection material has a softening temperature different from that of the resin that is the main component of the connection material. An anisotropically conductive film characterized in that a solid having an insulating film as an outer wall is dispersed and blended, and the solid contains conductive particles.
包されている最大導電粒子の大きさが、接続電極間距離
よりも小さい異方導電性フィルム。3. The anisotropic conductive film according to claim 1 or 2, wherein the size of the largest conductive particle contained in the individual is smaller than the distance between connected electrodes.
がカプセル形状をしている異方導電性フィルム。4. The anisotropic conductive film according to claim 1, wherein the insulating film has a capsule shape.
の中に複数の導電粒子が内包されている個体の内に、前
記導電粒子のほかに負荷を受けて発色する感圧粒子が含
まれている異方導電性フィルム。5. According to claim 1 or 2, the individual in which a plurality of conductive particles are included in the insulating film includes pressure-sensitive particles that develop color under load in addition to the conductive particles. Anisotropic conductive film.
の中に複数の導電粒子が内包されている個体の内に、前
記導電粒子のほかに加熱時の接合を補助するフラックス
が含まれている異方導電性フィルム。6. According to claim 1 or 2, the insulating film contains a plurality of conductive particles, and in addition to the conductive particles, a flux is included to assist bonding during heating. Anisotropic conductive film.
の中に複数の導電粒子が内包されている個体の内に、導
電粒子のほかに自ら熱を発生する物質が含まれている異
方導電性フィルム。7. According to claim 1 or 2, the individual body in which a plurality of conductive particles are included in the insulating film contains a substance that generates heat by itself in addition to the conductive particles. directional conductive film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3056312A JPH04292803A (en) | 1991-03-20 | 1991-03-20 | Anisotropic conductive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3056312A JPH04292803A (en) | 1991-03-20 | 1991-03-20 | Anisotropic conductive film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04292803A true JPH04292803A (en) | 1992-10-16 |
Family
ID=13023637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3056312A Pending JPH04292803A (en) | 1991-03-20 | 1991-03-20 | Anisotropic conductive film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04292803A (en) |
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| WO1999034436A1 (en) * | 1997-12-24 | 1999-07-08 | Shinko Electric Industries Co., Ltd. | Semiconductor device |
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-
1991
- 1991-03-20 JP JP3056312A patent/JPH04292803A/en active Pending
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| KR100392498B1 (en) * | 1999-08-30 | 2003-07-22 | 한국과학기술원 | Method for Formation of Bump for conductive polymer flip chip interconnects using electroless plating |
| KR100361640B1 (en) * | 1999-08-30 | 2002-11-18 | 한국과학기술원 | Fabrication method of wafer-level flip chip packages using pre-coated Anisotropic Conductive Adhesives |
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