JPH04295704A - Apparatus for detecting central position of wafer - Google Patents

Apparatus for detecting central position of wafer

Info

Publication number
JPH04295704A
JPH04295704A JP3084686A JP8468691A JPH04295704A JP H04295704 A JPH04295704 A JP H04295704A JP 3084686 A JP3084686 A JP 3084686A JP 8468691 A JP8468691 A JP 8468691A JP H04295704 A JPH04295704 A JP H04295704A
Authority
JP
Japan
Prior art keywords
wafer
center position
image sensor
linear image
central position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3084686A
Other languages
Japanese (ja)
Inventor
Genichi Kanazawa
金沢 元一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Kokusai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Co Ltd filed Critical Kokusai Electric Co Ltd
Priority to JP3084686A priority Critical patent/JPH04295704A/en
Publication of JPH04295704A publication Critical patent/JPH04295704A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To shorten the time when the central position of a wafer is detected, to achieve the compact configuration of an apparatus and to eliminate the directivity in the detection. CONSTITUTION:A linear image sensor 15 is provided on the halfway of conveying path of a wafer 3 which is conveyed with a wafer conveying device 13. A wafer-center-position operator 16 obtains the maximum detecting length and the deviation from a reference position at the maximum detecting length based on the picked-up image from the linear image sensor and operates the central position of the wafer. There parts 15 and 16 are provided. The central position of the wafer can be immediately detected only by passing the wafer with respect to the linear image sensor.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は半導体製造装置、又は半
導体検査装置に設けられるウェーハの中心位置検出装置
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer center position detecting device provided in a semiconductor manufacturing device or a semiconductor testing device.

【0002】0002

【従来の技術】一般に、半導体製造装置、半導体検査装
置のうちウェーハ単位で処理を行う装置に於いては、ウ
ェーハ運搬時にウェーハキャリアと呼ばれるウェーハ収
納治具を用いることが多い。この場合、ウェーハのウェ
ーハキャリア内での姿勢は不確定である為、半導体製造
装置等のウェーハ搬送径路途中に、ウェーハの中心位置
を検出し、ウェーハの姿勢の矯正、位置出しを行ってい
る。
2. Description of the Related Art Generally, semiconductor manufacturing equipment and semiconductor inspection equipment that process wafers on a wafer basis often use a wafer storage jig called a wafer carrier when transporting wafers. In this case, since the posture of the wafer within the wafer carrier is uncertain, the center position of the wafer is detected during the wafer transport path of semiconductor manufacturing equipment, etc., and the posture of the wafer is corrected and positioned.

【0003】図3、図4に於いて、ウェーハの中心位置
検出を光学的センサを用いて行うウェーハ中心位置検出
装置の1例を説明する。
3 and 4, one example of a wafer center position detecting device that detects the wafer center position using an optical sensor will be described.

【0004】図3、図4中、1は光学センサユニット、
2はウェーハ搬送装置のアーム、3はウェーハである。
In FIGS. 3 and 4, 1 is an optical sensor unit;
2 is an arm of a wafer transfer device, and 3 is a wafer.

【0005】光学センサユニット1は、相対峙して設け
られたブロック4,5にそれぞれ設けられた投光素子6
、受光素子7から成る4対のセンサ8,9,10,11
を有し、該4対のセンサ8,9,10,11はウェーハ
3の半径と同じ半径の円周上に設けられており、これら
センサー8,9,10,11によってウェーハ3の周縁
を検出する。
The optical sensor unit 1 includes light projecting elements 6 provided on blocks 4 and 5, which are provided facing each other.
, four pairs of sensors 8, 9, 10, 11 each consisting of a light receiving element 7
The four pairs of sensors 8, 9, 10, and 11 are provided on the circumference having the same radius as the radius of the wafer 3, and the peripheral edge of the wafer 3 is detected by these sensors 8, 9, 10, and 11. do.

【0006】上記した従来のウェーハの中心位置検出装
置でウェーハ3の中心位置を検出するには、4対のセン
サー8,9,10,11を左側のグループ8,9、右側
のグループ10,11、先端側のグループ9,10のグ
ループに区分し、搬送装置の動きと前記センサ8,9,
10,11のウェーハ検出時期とによってウェーハ中心
位置を検出する。更に、図7によって詳述する。
In order to detect the center position of the wafer 3 using the conventional wafer center position detection device described above, four pairs of sensors 8, 9, 10, 11 are arranged in groups 8, 9 on the left side and groups 10, 11 on the right side. , into groups 9 and 10 on the tip side, and the movement of the conveying device and the sensors 8, 9,
The wafer center position is detected based on the wafer detection timings 10 and 11. Further, this will be explained in detail with reference to FIG.

【0007】先ず、光学センサユニット1に向ってウェ
ーハ3を直進させる(A)。この時ウェーハ3の周縁を
センサ11が感知したとすると、この時のウェーハ3の
位置を記憶する。次に、ウェーハ3を左方に移動させ(
B)、センサ8が感知した位置で停止させ、更に左方へ
の移動量の半分だけ右方へ移動させる(C)。更に、ウ
ェーハ3を前進させセンサ8,9,10,11が同時に
ウェーハ3の周縁を検出するか否を確認する(D)。 センサ8,9,10,11間で検出時期のずれがあると
、更に今迄の手順を繰返して、センサ8,9,10,1
1が同時にウェーハ3の周縁を検出する状態に収斂させ
る。収斂した状態でのウェーハ3の位置を記憶させ、ウ
ェーハ3の中心位置検出を完了する。
First, the wafer 3 is moved straight toward the optical sensor unit 1 (A). If the sensor 11 senses the periphery of the wafer 3 at this time, the position of the wafer 3 at this time is stored. Next, move wafer 3 to the left (
B), it is stopped at the position detected by the sensor 8, and further moved to the right by half the amount of movement to the left (C). Further, the wafer 3 is advanced and it is confirmed whether the sensors 8, 9, 10, and 11 simultaneously detect the peripheral edge of the wafer 3 (D). If there is a difference in detection timing between sensors 8, 9, 10, and 11, the steps up to now are repeated and sensors 8, 9, 10, and 1
1 converges to a state where the peripheral edge of the wafer 3 is detected at the same time. The position of the wafer 3 in the converged state is stored, and detection of the center position of the wafer 3 is completed.

【0008】[0008]

【発明が解決しようとする課題】上述した様に、従来の
装置では、ウェーハの中心位置検出をウェーハの左右の
移動、前進、後退を交互に繰返して行う為、検出に時間
が掛る。中心位置検出に方向性があるので、中心位置検
出装置の設置場所の制限を受ける。又、センサを円弧状
に設けるので光学センサユニット1を小型化できない、
等の問題があった。
As described above, in the conventional apparatus, the center position of the wafer is detected by repeatedly moving the wafer left and right, moving it forward, and moving it backward alternately, which takes time. Since the center position detection has directionality, there are restrictions on the installation location of the center position detection device. In addition, since the sensor is provided in an arc shape, the optical sensor unit 1 cannot be miniaturized.
There were other problems.

【0009】本発明は斯かる実情に鑑み、ウェーハの中
心位置検出の時間を短縮し、且検出装置のウェーハ中心
位置検出の方向性を解消しようとするものである。
In view of the above circumstances, the present invention aims to shorten the time required to detect the center position of a wafer, and to eliminate the directivity of the detection device in detecting the center position of the wafer.

【0010】0010

【課題を解決するための手段】本発明は、ウェーハ搬送
装置によって搬送されるウェーハの搬送路途中に設けた
リニアイメージセンサと、該リニアイメージセンサから
の撮像出力より、最大検出長と最大検出長時に於ける基
準位置からのずれを求めてウェーハ中心位置を演算する
ウェーハ中心位置演算器とを具備することを特徴とする
ものである。
[Means for Solving the Problems] The present invention provides a linear image sensor provided in the middle of a wafer transport path to be transported by a wafer transport device, and a maximum detection length and a maximum detection length based on the imaging output from the linear image sensor. The present invention is characterized by comprising a wafer center position calculator that calculates the wafer center position by determining the deviation from the reference position at any time.

【0011】[0011]

【作用】イメージセンサーが検出した最大長はウェーハ
の直径に他ならず、この時の検出長の中点はウェーハの
中心となる。従って、検出最大長の中点の位置と基準位
置とのずれを求めればウェーハの中心位置を検出するこ
とができる。
[Operation] The maximum length detected by the image sensor is nothing but the diameter of the wafer, and the midpoint of the detected length at this time is the center of the wafer. Therefore, the center position of the wafer can be detected by finding the deviation between the midpoint position of the maximum detection length and the reference position.

【0012】0012

【実施例】以下、図面を参照しつつ本発明の一実施例を
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0013】図1、図2中13はウェーハ搬送装置、1
4はウェーハロード部を示し、該ウェーハ搬送装置13
、ウェーハロード部14との間にウェーハ直径より充分
長い検出範囲を有するリニアイメージセンサ15を設け
る。該リニアイメージセンサ15からの検出結果はウェ
ーハ中心位置演算器16へ入力する。
1 and 2, reference numeral 13 indicates a wafer transfer device;
4 indicates a wafer loading section, and the wafer transport device 13
A linear image sensor 15 having a detection range sufficiently longer than the wafer diameter is provided between the wafer loading section 14 and the wafer loading section 14 . The detection results from the linear image sensor 15 are input to a wafer center position calculator 16 .

【0014】該中心位置演算器16からの出力は、半導
体製造装置の制御部17へ入力され、又検出位置は表示
器18へ表示される。
The output from the center position calculator 16 is input to a control section 17 of the semiconductor manufacturing apparatus, and the detected position is displayed on a display 18.

【0015】前記ウェーハ搬送装置13は、駆動部19
に設けた回転自在の第1アーム20、該第1アーム20
に回転自在に設けた第2アーム21、該第2アーム21
に回転自在に設けた第3アーム22を有し、第1、第2
、第3アーム20,21,22の協働によって第3アー
ム先端に載置したウェーハ3を直進、回転等所望の状態
に移動させる様になっている。
The wafer transfer device 13 includes a drive section 19
a rotatable first arm 20 provided in the first arm 20;
a second arm 21 rotatably provided in the second arm 21;
It has a third arm 22 rotatably provided in the first and second arms.
By the cooperation of the third arms 20, 21, and 22, the wafer 3 placed on the tip of the third arm is moved to a desired state, such as straight forward movement or rotation.

【0016】前記ウェーハロード部14は、ウェーハ3
が多段に装填されたウェーハキャリア23を、乗載し且
ウェーハのロード状態に合わせてウェーハキャリア23
を昇降させる様になっている。
The wafer loading section 14 is configured to load the wafer 3
The wafer carrier 23 loaded in multiple stages is mounted on the wafer carrier 23, and the wafer carrier 23 is
It is designed to raise and lower.

【0017】次に、作動を説明する。Next, the operation will be explained.

【0018】ウェーハ搬送装置13によりウェーハキャ
リア23からウェーハ3を取出し、該ウェーハ3を前記
第3アーム22に載置させた状態で、リニアイメージセ
ンサ15の下方を通過させる。該リニアイメージセンサ
15は通過時にウェーハ3の該リニアイメージセンサ1
5に相当する位置の弦の長さを刻々と検出し、該検出結
果は前記ウェーハ中心位置演算器16へ出力される。
The wafer 3 is taken out from the wafer carrier 23 by the wafer transfer device 13, and is passed below the linear image sensor 15 while being placed on the third arm 22. The linear image sensor 15 detects the linear image sensor 1 of the wafer 3 during passing.
The length of the chord at the position corresponding to 5 is detected every moment, and the detection result is output to the wafer center position calculator 16.

【0019】前記ウェーハ中心位置演算器16では、弦
の最大値、即ちウェーハ3の直径を求めると共に、弦最
大値での装置の中心(基準位置)から弦端、図1中でC
,Dを求める。
The wafer center position calculator 16 calculates the maximum value of the chord, that is, the diameter of the wafer 3, and calculates the distance from the center of the apparatus (reference position) at the maximum chord value to the chord end, C in FIG.
, D.

【0020】而して、(C−D)/2で基準位置からの
ウェーハ中心位置のずれ、即ちウェーハ3の中心位置を
求めることができる。求められたウェーハ3の中心位置
は、以下ウェーハのハンドリング、搬送のデータとして
利用され、更に必要とあらば表示器18に表示する。
Thus, the deviation of the wafer center position from the reference position, that is, the center position of the wafer 3 can be determined by (C-D)/2. The determined center position of the wafer 3 will be used as data for handling and transporting the wafer, and will be displayed on the display 18 if necessary.

【0021】[0021]

【発明の効果】以上述べた如く本発明によれば、特にウ
ェーハの検出位置の為の動作を必要とせず、通常の搬送
動作中にウェーハの中心位置を検出することができ、処
理時間の短縮を図れる。又、ウェーハがリニアイメージ
センサの検出範囲を通過するだけでよいので方向性がな
く、リニアイメージセンサ設置の制約が少ない。リニア
イメージセンサを設けるだけでよいのでセンサがコンパ
クトになり装置を小型化することができる。
Effects of the Invention As described above, according to the present invention, the center position of the wafer can be detected during the normal transport operation without requiring any special operation for detecting the wafer position, thereby reducing processing time. can be achieved. Furthermore, since the wafer only needs to pass through the detection range of the linear image sensor, there is no directionality, and there are fewer restrictions on the installation of the linear image sensor. Since it is only necessary to provide a linear image sensor, the sensor can be made compact and the device can be downsized.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の一実施例を示す平面図である。FIG. 1 is a plan view showing one embodiment of the present invention.

【図2】該実施例の側面図である。FIG. 2 is a side view of the embodiment.

【図3】従来例の説明図であるFIG. 3 is an explanatory diagram of a conventional example.

【図4】図3のA矢視図である。FIG. 4 is a view taken along arrow A in FIG. 3;

【図5】該従来例に於けるセンサのグループ分けを示す
説明図である。
FIG. 5 is an explanatory diagram showing grouping of sensors in the conventional example.

【図6】該従来例に於けるセンサのグループ分けを示す
説明図である。
FIG. 6 is an explanatory diagram showing grouping of sensors in the conventional example.

【図7】該従来例に於けるウェーハの中心位置検出作動
を示す説明図である。
FIG. 7 is an explanatory diagram showing a wafer center position detection operation in the conventional example.

【符号の説明】[Explanation of symbols]

3      ウェーハ 13    ウェーハ搬送装置 15    リニアイメージセンサ 16    ウェーハ中心位置演算器 3 Wafer 13 Wafer transport device 15 Linear image sensor 16 Wafer center position calculator

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  ウェーハ搬送装置によって搬送される
ウェーハの搬送路途中に設けたリニアイメージセンサと
、該リニアイメージセンサからの撮像出力より、最大検
出長と最大検出長時に於ける基準位置からのずれを求め
てウェーハ中心位置を演算するウェーハ中心位置演算器
とを具備することを特徴とするウェーハの中心位置検出
装置。
Claim 1: The maximum detection length and the deviation from the reference position at the time of the maximum detection length are determined from a linear image sensor installed in the middle of the wafer transport path carried by the wafer transport device and the imaging output from the linear image sensor. 1. A wafer center position detecting device, comprising: a wafer center position calculator that calculates the wafer center position by determining the wafer center position.
JP3084686A 1991-03-25 1991-03-25 Apparatus for detecting central position of wafer Pending JPH04295704A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3084686A JPH04295704A (en) 1991-03-25 1991-03-25 Apparatus for detecting central position of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3084686A JPH04295704A (en) 1991-03-25 1991-03-25 Apparatus for detecting central position of wafer

Publications (1)

Publication Number Publication Date
JPH04295704A true JPH04295704A (en) 1992-10-20

Family

ID=13837567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3084686A Pending JPH04295704A (en) 1991-03-25 1991-03-25 Apparatus for detecting central position of wafer

Country Status (1)

Country Link
JP (1) JPH04295704A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5917601A (en) * 1996-12-02 1999-06-29 Kabushiki Kaisha Toyoda Jidoshokki Seisakusho Position difference detecting device and method thereof
JP2006521704A (en) * 2003-03-24 2006-09-21 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Method and apparatus for handling objects at high speed
JP2009072909A (en) * 1996-03-22 2009-04-09 Genmark Automation Inc Method for controlling robot arm structure, robot arm mechanism, robot arm structure and product manufacturing method
KR101037724B1 (en) * 2009-03-04 2011-05-30 (주)한국시스톰 Wafer Damage Prevention System and Method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009072909A (en) * 1996-03-22 2009-04-09 Genmark Automation Inc Method for controlling robot arm structure, robot arm mechanism, robot arm structure and product manufacturing method
JP2012223880A (en) * 1996-03-22 2012-11-15 Genmark Automation Inc Method for controlling robot arm structure, robot arm mechanism, robot arm structure, workpiece processing system, and product manufacturing method
US5917601A (en) * 1996-12-02 1999-06-29 Kabushiki Kaisha Toyoda Jidoshokki Seisakusho Position difference detecting device and method thereof
JP2006521704A (en) * 2003-03-24 2006-09-21 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Method and apparatus for handling objects at high speed
KR101037724B1 (en) * 2009-03-04 2011-05-30 (주)한국시스톰 Wafer Damage Prevention System and Method

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