JPH0429582Y2 - - Google Patents

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Publication number
JPH0429582Y2
JPH0429582Y2 JP3555788U JP3555788U JPH0429582Y2 JP H0429582 Y2 JPH0429582 Y2 JP H0429582Y2 JP 3555788 U JP3555788 U JP 3555788U JP 3555788 U JP3555788 U JP 3555788U JP H0429582 Y2 JPH0429582 Y2 JP H0429582Y2
Authority
JP
Japan
Prior art keywords
waveguide
waveguide member
light receiving
semiconductor laser
attenuation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3555788U
Other languages
Japanese (ja)
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JPH01139468U (en
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Priority to JP3555788U priority Critical patent/JPH0429582Y2/ja
Publication of JPH01139468U publication Critical patent/JPH01139468U/ja
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Publication of JPH0429582Y2 publication Critical patent/JPH0429582Y2/ja
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 (イ) 産業上の利用分野 本考案は、半導体レーザ装置に関し、例えば光
デイスク装置用の光源として有用である。
[Detailed Description of the Invention] (a) Industrial Application Field The present invention relates to a semiconductor laser device, and is useful as a light source for an optical disk device, for example.

(ロ) 従来の技術 光デイスク装置用光源として、消去用、読出
し、書込み用の各レーザビームを独立に放射でき
るようにした個々のビーム発生源を約100μm間
隔で並設せる3ビーム型の半導体レーザ装置が提
案されている(実開昭62−152474号公報)。
(b) Prior art A three-beam type semiconductor is used as a light source for optical disk devices, in which individual beam generation sources that can independently emit erasing, reading, and writing laser beams are arranged in parallel at intervals of approximately 100 μm. A laser device has been proposed (Utility Model Application Publication No. 152474/1983).

半導体レーザビーム発生源は2方向にビームを
放射するので通常、1方の放射ビームが出力強度
のモニタ用として用いられる。従つて3ビーム型
の場合、特開昭58−102590号公報に開示されてい
る如く、ビーム発生源の各々の1方側に近接して
モニタ用の各半導体受光部を配することとなる。
Since semiconductor laser beam sources emit beams in two directions, one of the emitted beams is typically used to monitor the output intensity. Therefore, in the case of a three-beam type, as disclosed in Japanese Patent Laid-Open No. 58-102590, semiconductor light receiving sections for monitoring are arranged close to one side of each of the beam generation sources.

然るに、半導体レーザビーム発生源から放射さ
れるビームの水平拡がり角θは少なくとも10°程
度あるため、ビーム発生源と受光素子との配置間
隔は500μm以下にしない限り正確にモニタでき
ない。即ち、第4図に示す如く、各ビームの光軸
4間距離を100μmとしてビーム発生源1〜3を
並設した半導体レーザ手段LDと、これに対向す
る半導体受光部5〜7とを配置し、更に、各ビー
ムの水平拡がり角θが10°、各ビーム発生源と受
光部との距離が500μm以上であるものとすると、
各ビーム1a〜3aは、受光部5〜7において重
なり、個々のビームのモニタが不可能となる。
However, since the horizontal spread angle θ of the beam emitted from the semiconductor laser beam source is at least about 10°, accurate monitoring cannot be performed unless the arrangement interval between the beam source and the light receiving element is set to 500 μm or less. That is, as shown in FIG. 4, a semiconductor laser means LD having beam generation sources 1 to 3 arranged side by side with the distance between the optical axes 4 of each beam being 100 μm, and semiconductor light receiving parts 5 to 7 facing this are arranged. Furthermore, assuming that the horizontal spread angle θ of each beam is 10°, and the distance between each beam source and the light receiving part is 500 μm or more,
Each of the beams 1a to 3a overlaps in the light receiving sections 5 to 7, making it impossible to monitor each individual beam.

各ビーム発生源と受光部との距離をより小さく
するとビームの重なりは解消するが、この様に両
者を近接させることはビーム発生源と受光部との
光軸合わせが困難になる等組立面での問題が生じ
る。
If the distance between each beam source and the light receiving section is made smaller, the overlap of the beams will be eliminated, but placing them close together in this way will cause problems in terms of assembly, such as making it difficult to align the optical axes between the beam generating source and the light receiving section. The problem arises.

この点に鑑み、第5図に示す如く、導波部材8
を半導体レーザ手段LDとモニタ用受光手段PDと
の間に配置する構成が提案された(電子材料
Vol.26,No..6,1987,P107)即ち、導波部材
8は、半導体レーザ手段LDから一方向へ放射さ
れた各レーザビームを互いに離散する方向へ指向
する複数の導波溝9〜11を備えるものであり、
従つて半導体レーザLDから100μm間隔で放射さ
れた3本のビーム1a〜3aは、導波部材8を経
ることにより、重なり合うことなく適当間隔に拡
げられ、対応の受光部5〜7に入る。
In view of this point, as shown in FIG.
A configuration was proposed in which the semiconductor laser means LD and the monitor light receiving means PD were arranged (electronic material).
Vol.26, No.. 6, 1987, P107) That is, the waveguide member 8 is provided with a plurality of waveguide grooves 9 to 11 that direct the laser beams emitted in one direction from the semiconductor laser means LD in mutually discrete directions,
Therefore, the three beams 1a to 3a emitted from the semiconductor laser LD at intervals of 100 μm pass through the waveguide member 8, are spread out at appropriate intervals without overlapping, and enter the corresponding light receiving sections 5 to 7.

(ハ) 考案が解決しようとする課題 上記導波部材8において、その中央の導波溝1
0の配設方向はビーム発生源2の光軸4に一致し
ており、このため導波溝10内を進ビームはほゞ
直進し、導波溝内でのビーム減衰はほとんどな
い。これに対し、両側の導波溝9,11の配設方
向はビーム発生源1,3の光軸4に対して傾いて
いるため、これら導波溝内を進むビームは導波溝
内面での反射をくり返し、導波溝内でのビーム減
衰が認められる。
(c) Problems to be solved by the invention In the waveguide member 8, the waveguide groove 1 in the center of the waveguide member 8 is
0 coincides with the optical axis 4 of the beam generation source 2, and therefore the beam traveling in the waveguide groove 10 travels almost straight, with almost no beam attenuation within the waveguide groove. On the other hand, since the arrangement direction of the waveguide grooves 9 and 11 on both sides is inclined with respect to the optical axis 4 of the beam generation sources 1 and 3, the beam traveling inside these waveguide grooves is After repeated reflections, beam attenuation within the waveguide groove is observed.

この結果、各ビーム発生源1〜3がたとえ、同
一強度のビームを放射しているとしても、各受光
部5〜7では均等な出力が得られず、モニタ精度
が低下する。
As a result, even if each of the beam generation sources 1 to 3 emits a beam of the same intensity, each of the light receiving sections 5 to 7 cannot obtain an equal output, resulting in a decrease in monitoring accuracy.

本考案は従つて、上記導波部材を使つた場合
の、各導波溝内での減衰の問題を解決しようとす
るものである。
The present invention therefore attempts to solve the problem of attenuation within each waveguide groove when using the above-mentioned waveguide member.

(ニ) 課題を解決するための手段 本考案の半導体レーザ装置の特徴は、導波部材
内での各ビームの減衰度に応じて、各受光部の出
力を補正する電気的補正回路を設けたことにあ
る。
(d) Means for solving the problem The feature of the semiconductor laser device of the present invention is that it is equipped with an electrical correction circuit that corrects the output of each light receiving section according to the degree of attenuation of each beam within the waveguide member. There is a particular thing.

本考案の半導体レーザ装置の他の特徴は、導波
部材内での各ビームの減衰度に応じて各受光部の
受光面積が決められていることにある。
Another feature of the semiconductor laser device of the present invention is that the light receiving area of each light receiving portion is determined depending on the degree of attenuation of each beam within the waveguide member.

(ホ) 作用 本考案によれば、導波部材内での減衰度の大き
いビームに対しては、対応の受光部出力を電気的
に増大し、あるいは対応の受光部面積を大にし、
結果的に導波部材内での減衰度の相違が補償され
る。
(E) Effect According to the present invention, for a beam with a large degree of attenuation within the waveguide member, the output of the corresponding light receiving part is electrically increased or the area of the corresponding light receiving part is increased,
As a result, differences in the degree of attenuation within the waveguide member are compensated for.

(ヘ) 実施例 第1図は本考案の第1の実施例の構造を、又第
2図は同電気回路図を示す。第1図を参照する
に、ヒートシンク20はシリコン等の半導体もし
くは金属等の良放熱体からなり、その表面にイン
ジウム半田層を介して半導体レーザ手段LD及び
導波部材8が固着されている。斯るヒートシンク
20はL型銅ブロツク21の水平面に固着され、
一方、モニタ用受光手段PDが銅ブロツク21の
垂直面に固定配置される。
(F) Embodiment FIG. 1 shows the structure of a first embodiment of the present invention, and FIG. 2 shows an electric circuit diagram thereof. Referring to FIG. 1, the heat sink 20 is made of a semiconductor such as silicon or a good heat dissipator such as metal, and the semiconductor laser means LD and the waveguide member 8 are fixed to the surface thereof via an indium solder layer. Such a heat sink 20 is fixed to the horizontal surface of an L-shaped copper block 21,
On the other hand, a monitoring light receiving means PD is fixedly arranged on the vertical surface of the copper block 21.

半導体レーザ手段LDは、第1〜第3のレーザ
ビーム発生源1〜3を含み、これら各発生源は、
100μm間隔の光軸4間距離にて、夫々2方向に
平行なレーザビームを放射可能である。各発生源
1〜3は、夫々独立に駆動されるが、夫々個別の
レーザダイオードチツプで構成されるか、あるい
はモノリシツク形式で一体に構成される。
The semiconductor laser means LD includes first to third laser beam generation sources 1 to 3, and each of these sources includes:
Parallel laser beams can be emitted in two directions with distances between the optical axes 4 at intervals of 100 μm. Each of the sources 1 to 3 is independently driven and is either constructed from a separate laser diode chip or is constructed integrally in monolithic form.

導波部材8は上記の各ビームに対応して第1〜
第3の導波溝9〜11を備える。第2の導波溝1
0は第2の発生源2の光軸4と整合関係にあり、
その光軸方向に延びる。第1、第3の導波溝9,
11は、夫々その入口側において対応の第1、第
3の発生源1,3の各光軸4と整合関係にある
が、出口側は外側に偏る。これにより、半導体レ
ーザ手段LDから放射される一方向の各ビームは、
互いに離散する方向へ指向される。斯る導波部材
8は、シリコンからなり、エツチングにより各溝
9〜11を形成すると共に、溝内壁面に金等の光
反射材を蒸着することにより作成される。又各溝
9〜11の幅は60μmが適当である。
The waveguide member 8 has first to second beams corresponding to each of the above beams.
It includes third waveguide grooves 9 to 11. Second waveguide groove 1
0 is aligned with the optical axis 4 of the second source 2,
It extends in the direction of its optical axis. first and third waveguide grooves 9,
11 are aligned with the respective optical axes 4 of the corresponding first and third sources 1 and 3 on their entrance sides, but their exit sides are biased outward. As a result, each beam in one direction emitted from the semiconductor laser means LD is
oriented in mutually discrete directions. The waveguide member 8 is made of silicon, and is created by forming grooves 9 to 11 by etching and depositing a light reflecting material such as gold on the inner wall surface of the grooves. The appropriate width of each groove 9 to 11 is 60 μm.

受光部5〜7は共通のシリコン基板に拡散によ
り形成され、通常のフオトダイオードを構成す
る。受光部5〜7の受光面積は、導波部材8の各
導波溝の幅程度に一致される。
The light receiving sections 5 to 7 are formed on a common silicon substrate by diffusion, and constitute a normal photodiode. The light-receiving area of the light-receiving sections 5 to 7 is approximately equal to the width of each waveguide groove of the waveguide member 8.

第2図を参照するに、第1〜第3の受光部5〜
7の各出力は検出部30で検出された後、共通の
基準電圧Vcと比較部31で比較され、この比較
結果に基いて、駆動部32が対応の発生源1〜3
を駆動せしめる。尚検出部30は固定抵抗器40
と可変抵抗器41を含み、比較部31は演算増幅
器42を主体とし、又駆動部32はトランジスタ
43を主体とする等、それら自体は周知の構成で
ある。
Referring to FIG. 2, the first to third light receiving sections 5 to
After each output of 7 is detected by the detection unit 30, it is compared with the common reference voltage Vc by the comparison unit 31, and based on the comparison result, the drive unit 32 selects the corresponding generation source 1 to 3.
drive. Note that the detection unit 30 is a fixed resistor 40.
and a variable resistor 41, the comparing section 31 mainly includes an operational amplifier 42, and the driving section 32 mainly includes a transistor 43, which are themselves of well-known configuration.

第1図に示した導波部材8の各導波溝9〜11
より導出されるビーム強度は、既述の理由により
第2導波溝10よりのものが最も大きく、それ以
外のビーム強度は、導波溝内での減衰により小さ
い。従つて、斯る減衰度に応じて、各検出部30
の可変抵抗器41が調整される。即ち、各ビーム
発生源1〜3が同一強度のビームを発生する状態
にて、各検出部30の出力端50に同一出力が得
られるべく、可変抵抗器41の抵抗値が調節され
るのである。この結果、各導波溝9〜11内での
減衰度の相違が補償され、正確なモニタ動作が可
能となる。
Each waveguide groove 9 to 11 of the waveguide member 8 shown in FIG.
The beam intensity derived from the second waveguide groove 10 is the highest for the reason described above, and the beam intensity derived from other areas is small due to attenuation within the waveguide groove. Therefore, depending on the degree of attenuation, each detection unit 30
variable resistor 41 is adjusted. That is, the resistance value of the variable resistor 41 is adjusted so that the same output is obtained at the output terminal 50 of each detection section 30 in a state where each of the beam generation sources 1 to 3 generates a beam of the same intensity. . As a result, differences in attenuation within each waveguide groove 9 to 11 are compensated for, allowing accurate monitoring operation.

尚、検出部30の構成は、その他、トランジス
タや演算増幅器等を使い、増幅度の調整可能な回
路にすることもできる。
In addition, the configuration of the detection unit 30 can also be a circuit whose amplification degree can be adjusted by using a transistor, an operational amplifier, or the like.

第3図は、本考案の第2の実施例の特徴部分を
示す。この場合、各受光部5〜7の受光面積が各
導波溝9〜11内での減衰度に応じて設定され
る。即ち、最も減衰の少ない第2導波溝10に対
応する第2受光部6の受光面積を最も小さくし
て、それへの入射光量を少なくし、各ビーム発生
源1〜3が同一強度ビームを発生する状態にて、
各受光部5〜7が同一出力値を与える様になす。
この場合、第2図で説明した可変抵抗器41によ
る出力合わせは不要となる。
FIG. 3 shows the characteristic parts of the second embodiment of the present invention. In this case, the light receiving area of each light receiving section 5-7 is set according to the degree of attenuation within each waveguide groove 9-11. That is, the light-receiving area of the second light-receiving section 6 corresponding to the second waveguide groove 10 with the least attenuation is made the smallest to reduce the amount of light incident thereon, and each of the beam generation sources 1 to 3 emits the same intensity beam. In the situation that occurs,
Each of the light receiving sections 5 to 7 is made to give the same output value.
In this case, the output adjustment using the variable resistor 41 described in FIG. 2 is not necessary.

(ト) 考案の効果 本考案によれば、夫々2方向にレーザビームを
放射する複数のレーザビーム発生源を含む半導体
レーザ手段と、一方向に放射された上記各レーザ
ビームを互いに離散する方向へ指向する複数の導
波溝を備える導波部材と、この導波部材から導出
される各レーザビームを個別に受光する複数のモ
ニタ用受光部とを備えた半導体レーザ装置におい
て、各導波溝内でのビーム強度の減衰が補償さ
れ、正確なモニタ動作が行える。
(g) Effects of the invention According to the invention, there is provided a semiconductor laser means including a plurality of laser beam generation sources that emit laser beams in two directions, and a semiconductor laser means that directs each of the laser beams emitted in one direction to directions that are discrete from each other. In a semiconductor laser device including a waveguide member having a plurality of oriented waveguide grooves and a plurality of monitoring light receiving sections that individually receive each laser beam emitted from the waveguide member, This compensates for the attenuation of the beam intensity at

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は本考案の第1の実施例を示
し、第1図Aは水平面で切つた断面図、第1図B
は同1B−1B線断面図、第2図は電気回路図、
第3図は本考案の第2の実施例を示す断面図、第
4図は従来例を示す平面図、第5図は他の従来例
を示す断面図である。 LD……半導体レーザ手段、1〜3……レーザ
ビーム発生源、PD……受光手段、5〜7……受
光部、8……導波部材、9〜11……導波溝。
Figures 1 and 2 show a first embodiment of the present invention, Figure 1A is a sectional view taken on a horizontal plane, Figure 1B
1B-1B line sectional view, Figure 2 is an electric circuit diagram,
FIG. 3 is a sectional view showing a second embodiment of the present invention, FIG. 4 is a plan view showing a conventional example, and FIG. 5 is a sectional view showing another conventional example. LD... Semiconductor laser means, 1-3... Laser beam generation source, PD... Light receiving means, 5-7... Light receiving section, 8... Wave guide member, 9-11... Wave guide groove.

Claims (1)

【実用新案登録請求の範囲】 (1) 夫々2方向にレーザビームを放射する複数の
レーザビーム発生源を含む半導体レーザ手段
と、一方向に放射された上記各レーザビームを
互いに離散する方向へ指向する複数の導波溝を
備える導波部材と、この導波部材から導出され
る各レーザビームを個別に受光する複数のモニ
タ用受光部と、これら各受光部の出力を、上記
導波部材内での対応のビームの減衰度に応じて
補正する電気的補正回路とを具備せる半導体レ
ーザ装置。 (2) 夫々2方向にレーザビームを放射する複数の
レーザビーム発生源を含む半導体レーザ手段
と、一方向に放射された上記各レーザビームを
互いに離散する方向へ指向する複数の導波溝を
備える導波部材と、この導波部材から導出され
る各レーザビームを個別に受光する複数のモニ
タ用受光部とを備え、これら各受光部の受光面
積は、上記導波部材内での対応のビームの減衰
度に応じて決められていることを特徴とする半
導体レーザ装置。
[Claims for Utility Model Registration] (1) Semiconductor laser means including a plurality of laser beam generation sources that emit laser beams in two directions, and directing each of the laser beams emitted in one direction in discrete directions. A waveguide member including a plurality of waveguide grooves, a plurality of monitoring light receiving sections that individually receive each laser beam derived from the waveguide member, and an output of each of these light receiving sections is transmitted into the waveguide member. A semiconductor laser device comprising an electrical correction circuit that corrects according to the degree of attenuation of a corresponding beam. (2) Semiconductor laser means including a plurality of laser beam generation sources that emit laser beams in two directions, and a plurality of waveguide grooves that direct the laser beams emitted in one direction in discrete directions. It is equipped with a waveguide member and a plurality of monitoring light-receiving parts that individually receive each laser beam derived from the waveguide member, and the light-receiving area of each of these light-receiving parts is the same as that of the corresponding beam within the waveguide member. A semiconductor laser device characterized in that the degree of attenuation is determined according to the degree of attenuation.
JP3555788U 1988-03-17 1988-03-17 Expired JPH0429582Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3555788U JPH0429582Y2 (en) 1988-03-17 1988-03-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3555788U JPH0429582Y2 (en) 1988-03-17 1988-03-17

Publications (2)

Publication Number Publication Date
JPH01139468U JPH01139468U (en) 1989-09-22
JPH0429582Y2 true JPH0429582Y2 (en) 1992-07-17

Family

ID=31262202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3555788U Expired JPH0429582Y2 (en) 1988-03-17 1988-03-17

Country Status (1)

Country Link
JP (1) JPH0429582Y2 (en)

Also Published As

Publication number Publication date
JPH01139468U (en) 1989-09-22

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