JPH04301552A - Heating furnace for thermal analysis equipment and temperature control method - Google Patents

Heating furnace for thermal analysis equipment and temperature control method

Info

Publication number
JPH04301552A
JPH04301552A JP9123791A JP9123791A JPH04301552A JP H04301552 A JPH04301552 A JP H04301552A JP 9123791 A JP9123791 A JP 9123791A JP 9123791 A JP9123791 A JP 9123791A JP H04301552 A JPH04301552 A JP H04301552A
Authority
JP
Japan
Prior art keywords
coolant
heater
refrigerant
liquid level
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9123791A
Other languages
Japanese (ja)
Other versions
JP2903754B2 (en
Inventor
Koji Kuwata
桑田 広治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP9123791A priority Critical patent/JP2903754B2/en
Publication of JPH04301552A publication Critical patent/JPH04301552A/en
Application granted granted Critical
Publication of JP2903754B2 publication Critical patent/JP2903754B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
  • Devices For Use In Laboratory Experiments (AREA)

Abstract

PURPOSE:To minimize a fluctuation according to each low temperature setting and stabilize temperature by supplying coolant to a coolant reservoir at specified time intervals via a controller for each temperature setting in controlling temperature of a heating furnace. CONSTITUTION:At the time of measurement, if a liquid level of coolant 4 is at a certain level or lower due to influence of ambient temperature of a coolant reservoir 3, its rate of change, etc., a liquid level sensor 5 activates to supply power to a heater 9a of a heater siphon 9 of a coolant storage tank 6. This heat vaporizes a part of the coolant 4 in the tank 6, and pressure is applied to inside the tank 6, so that the coolant 4 is fed to the coolant reservoir 3 by differential pressure from an atmospheric pressure. The coolant 4 in the coolant reservoir 3 reaches a set level of the liquid level sensor 5, whereby a controller 10 stops supplying power to the heater 9a and also opens a solenoid valve 8 to stop supplying the coolant 4. This is repeated to maintain the coolant 4 in the coolant reservoir 3 at a constant level. Therefore, in any low temperature set region with a speed of raising/lowering temperature differed, a stable liquid level can be secured.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、一定の温度条件下、
試料に適当な荷重を加えてその熱的変化に伴う効果を測
定する熱機械分析装置や試料を加熱し試料重量の変化に
伴う熱的効果を測定する熱重量測定装置等で用いられる
熱分析装置用の加熱炉とその温度制御方法に関する。
[Industrial Application Field] This invention is applicable to
Thermal analysis equipment used in thermomechanical analysis equipment that applies an appropriate load to a sample and measures the effects associated with thermal changes, and thermogravimetry equipment that heats the sample and measures the thermal effects associated with changes in sample weight. This invention relates to a heating furnace for use in heating and its temperature control method.

【0002】0002

【従来の技術】熱分析装置では加熱炉周囲を低温領域(
−100°C以下)まで冷却し、炉心管に設置した試料
をヒ−タで一定温度に保持しながら測定することがある
。従来このように加熱炉を冷却する場合、炉心管全体を
冷媒槽で覆い液体窒素(N2 )で冷却したり、気化し
た冷媒の低温気体を加熱炉に吹き付けて冷却するような
ものもあった。しかし近時は経済的コスト或いは冷却効
率を考慮して加熱炉本体の下部のみを冷却するような冷
媒を入れた冷媒槽を配置し、冷媒液面が一定レベルにな
るよう液面センサを設置して制御するようにしたものも
ある(平成2年特許願第259889号)。
[Prior art] In a thermal analyzer, the area around the heating furnace is a low-temperature area (
The sample is cooled down to -100°C or lower) and placed in the reactor core tube, and the sample is sometimes measured while being maintained at a constant temperature with a heater. Conventionally, when cooling a heating furnace in this way, the entire furnace core tube was covered with a refrigerant tank and cooled with liquid nitrogen (N2), or the heating furnace was cooled by blowing low-temperature gas of vaporized refrigerant. However, recently, considering economic cost or cooling efficiency, a refrigerant tank containing refrigerant that cools only the lower part of the heating furnace body is installed, and a liquid level sensor is installed to keep the refrigerant liquid level at a certain level. There is also a device in which the control is performed using the following methods (Patent Application No. 259889, 1990).

【0003】0003

【発明が解決しようとする課題】加熱炉の下部に冷媒槽
を設置し液面センサにより液面レベルを制御するように
したものは効率的で且つ経済的であるが、液面センサに
より液面レベルを制御するだけでは、分析時の温度、昇
降温度等のパラメ−タによって液面レベルのゆらぎが異
なり、この「ゆらぎ」に起因するベ−スラインノイズが
高感度分析時の障害となっているという問題がある。こ
の発明はかかる課題に鑑みてなされたものであり、その
目的とする所は色々な低温領域に設定しても、また昇降
温度の速度等が異なっても安定した液面レベルを確保す
ることの出来る熱分析装置用加熱炉とその温度制御方法
を提供することにある。
[Problems to be Solved by the Invention] A system in which a refrigerant tank is installed at the bottom of a heating furnace and the liquid level is controlled by a liquid level sensor is efficient and economical. If only the level is controlled, fluctuations in the liquid level will vary depending on parameters such as the temperature during analysis and temperature rise and fall, and the baseline noise caused by this fluctuation will become an obstacle during high-sensitivity analysis. There is a problem that there is. This invention was made in view of the above problem, and its purpose is to ensure a stable liquid level even when the temperature is set in various low temperature ranges, and even when the rate of rise and fall of temperature is different. An object of the present invention is to provide a heating furnace for a thermal analyzer and a temperature control method thereof.

【0004】0004

【課題を解決するための手段】即ち、この考案は上記す
る課題を解決するために、■熱分析装置用加熱炉が、試
料を設置する炉心管と、該炉心管下部に設置され液面セ
ンサを配置した冷媒槽と、ヒ−タ付サイフォンを配置し
前記冷媒槽への管路と電磁バルブとを配管した冷媒入タ
ンクと、前記液面センサとヒ−タ付サイフォンと電磁バ
ルブを制御するコントロ−ラとより成ることを特徴とす
る。また、■上記構成から成る熱分析装置用加熱炉の温
度制御方法が、前記冷媒槽へ供給する冷媒の割合を各設
定温度において、前記コントロ−ラを介して時間的に一
定間隔とすることを特徴とする。
[Means for Solving the Problems] In other words, in order to solve the above-mentioned problems, this invention has the following features: (1) A heating furnace for a thermal analyzer includes a core tube in which a sample is placed, and a liquid level sensor installed at the bottom of the core tube. A refrigerant tank in which a siphon with a heater is arranged, a refrigerant tank in which a siphon with a heater is arranged and a conduit to the refrigerant tank and an electromagnetic valve are arranged, and the liquid level sensor, the siphon with a heater, and the electromagnetic valve are controlled. It is characterized by consisting of a controller. In addition, (1) the method for controlling the temperature of a heating furnace for a thermal analyzer having the above configuration includes controlling the proportion of refrigerant supplied to the refrigerant tank at regular intervals via the controller at each set temperature; Features.

【0005】[0005]

【作用】上記手段としたこの発明にかかる熱分析装置用
加熱炉の作用を添付図の符号を用いて説明する。
[Operation] The operation of the heating furnace for a thermal analyzer according to the present invention as the above means will be explained using the reference numerals in the accompanying drawings.

【0006】熱分析測定の際、冷媒槽3の周囲温度、加
熱或いは冷却速度等の影響で冷媒4の液面が一定レベル
以下になると液面センサ5が作動してコントロ−ラ10
を介して冷媒貯蔵タンクのヒ−タ付サイフォン9のヒ−
タ9aに通電する。すると、該ヒ−タ付サイフォンのヒ
−タ9aの加熱により貯蔵タンク6内の液体窒素の一部
が蒸発しタンク内が加圧され大気圧との差圧により液体
窒素が冷媒槽3に送られる。また、冷媒槽3の冷媒が液
面センサ5の設置されているレベルに達するとコントロ
−ラ10はヒ−タサイフォン9のヒ−タ9aへの通電を
停止し、同時に前記電磁弁8を作動させ「開」として冷
媒4を冷媒槽3へ供給するのを停止する。このように冷
媒の送液と送液停止との繰り返しにより冷媒槽3の冷媒
は一定レベルに保たれる。また、ヒ−タ付サイフォン9
のヒ−タ9aに通電する時間を長くし、通電停止時間を
短くすることにより液体窒素の流量を増やし図2の冷媒
送液時間と送液停止との周期を短くして「ゆらぎ」を小
さくすることが出来る。
During thermal analysis measurement, when the liquid level of the refrigerant 4 falls below a certain level due to the influence of the ambient temperature, heating or cooling rate of the refrigerant tank 3, the liquid level sensor 5 is activated and the controller 10 is activated.
The heater of the heater siphon 9 of the refrigerant storage tank is
9a is energized. Then, a part of the liquid nitrogen in the storage tank 6 evaporates due to the heating of the heater 9a of the heater-equipped siphon, and the inside of the tank is pressurized, and the liquid nitrogen is sent to the refrigerant tank 3 due to the pressure difference with atmospheric pressure. It will be done. Further, when the refrigerant in the refrigerant tank 3 reaches the level at which the liquid level sensor 5 is installed, the controller 10 stops energizing the heater 9a of the heater siphon 9, and at the same time operates the solenoid valve 8. The supply of the refrigerant 4 to the refrigerant tank 3 is stopped by setting it to "open". In this way, the refrigerant in the refrigerant tank 3 is maintained at a constant level by repeating the feeding and stopping of the refrigerant. In addition, the siphon 9 with heater
By increasing the time during which the heater 9a is energized and shortening the time during which the energization is stopped, the flow rate of liquid nitrogen is increased, and the period between the refrigerant feeding time and the stopping of the liquid nitrogen shown in Fig. 2 is shortened to reduce "fluctuation". You can.

【0007】従って、上記手段を用いる方法によれば、
液面センサ5からの信号により常に一定周期となるよう
コントロ−ラ10を介してヒ−タ付サイフォン9のヒ−
タ9aへの通電と通電停止時間の比(デュ−ティ比)を
制御すれば液面レベルの「ゆらぎ」を最小となるように
することが出来る。
[0007] Therefore, according to the method using the above means,
The heater of the siphon 9 is controlled via the controller 10 so that the signal from the liquid level sensor 5 always has a constant cycle.
By controlling the ratio (duty ratio) between the energization time and the energization stop time to the tank 9a, "fluctuations" in the liquid level can be minimized.

【0008】[0008]

【実施例】以下、この発明の具体的実施例について図面
を参照して説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments of the present invention will be described below with reference to the drawings.

【0009】図1はこの発明にかかる熱分析装置用加熱
炉の構成を示す図である。1は試料を置くための炉心管
であり周囲にはヒ−タ2が配置され所定温度に設定出来
るようにしてある。該炉心管1の下部には液体窒素等の
冷媒4を入れた冷媒槽3が設けられ、該冷媒槽3には一
定レベル位置に液面センサ5が設置されている。即ち、
炉心管内の試料部温度は冷媒槽3の冷媒により炉心管1
を冷却すると共にヒ−タ2で加熱することにより所定の
冷却温度に設定することが出来るようになっている。
FIG. 1 is a diagram showing the configuration of a heating furnace for a thermal analyzer according to the present invention. Reference numeral 1 denotes a furnace tube for placing a sample, and a heater 2 is arranged around the tube so that a predetermined temperature can be set. A refrigerant tank 3 containing a refrigerant 4 such as liquid nitrogen is provided below the core tube 1, and a liquid level sensor 5 is installed in the refrigerant tank 3 at a fixed level position. That is,
The temperature of the sample inside the core tube is controlled by the coolant in the coolant tank 3.
A predetermined cooling temperature can be set by cooling and heating with the heater 2.

【0010】6は冷媒貯蔵タンクであって内部には液体
窒素等の冷媒4が入れてある。該冷媒貯蔵タンク6には
管路7が前記冷媒槽3へ配管され冷媒を供給するように
すると共に、他方に電磁弁8が設置されている。また、
該貯蔵タンク6にはヒ−タ付サイフォン9が配置されて
おり、前記冷媒槽3の冷媒4が蒸発等により少なくなる
と後述するように液面センサ5により電源が入るような
仕組みになっている。次に、10はコントロ−ラであっ
て前記液面センサ5とヒ−タ付サイフォン9のヒ−タ9
aと電磁弁8に接続されている。
A refrigerant storage tank 6 contains a refrigerant 4 such as liquid nitrogen. A conduit 7 is connected to the refrigerant tank 3 to supply refrigerant to the refrigerant storage tank 6, and a solenoid valve 8 is installed on the other side. Also,
A siphon 9 with a heater is disposed in the storage tank 6, and when the refrigerant 4 in the refrigerant tank 3 decreases due to evaporation or the like, the liquid level sensor 5 turns on the power, as will be described later. . Next, 10 is a controller which controls the liquid level sensor 5 and the heater 9 of the heater-equipped siphon 9.
a and the solenoid valve 8.

【0011】この発明にかかる熱分析装置用加熱炉は以
上のような構成から成り、通常、或る低温領域での熱分
析の際は冷媒槽3の冷媒により炉心管1を冷却しつつ回
りのヒ−タ2により測定試料を所定の一定温度として熱
分析測定を行う。
The heating furnace for a thermal analysis device according to the present invention has the above-described configuration, and normally, during thermal analysis in a certain low temperature region, the furnace core tube 1 is cooled by the refrigerant in the refrigerant tank 3 while the surroundings are cooled. Thermal analysis measurement is performed by keeping the measurement sample at a predetermined constant temperature using the heater 2.

【0012】次に、熱分析測定の際には冷媒槽3の周囲
温度、加熱或いは冷却速度等の影響で冷媒4の液面が一
定レベル以下になると液面センサ5が作動してコントロ
−ラ10を介して冷媒貯蔵タンクのヒ−タ付サイフォン
9のヒ−タ9aに通電する。すると、該ヒ−タ付サイフ
ォン9のヒ−タ9aの加熱により貯蔵タンク6内の液体
窒素の一部が蒸発しタンク内が加圧され大気圧との差圧
により液体窒素が冷媒槽3に送られる。また、冷媒槽3
の冷媒が液面センサ5の設置されているレベルに達する
とコントロ−ラ10はヒ−タサイフォン9のヒ−タ9a
への通電を停止し、同時に前記電磁弁8を作動させ「開
」として冷媒4を冷媒槽3へ供給するのを停止する。こ
のように冷媒の送液と送液停止との繰り返しにより冷媒
槽3の冷媒は一定レベルに保たれる。
Next, during thermal analysis measurement, when the liquid level of the refrigerant 4 falls below a certain level due to the influence of the ambient temperature, heating or cooling rate of the refrigerant tank 3, the liquid level sensor 5 is activated and the controller is activated. 10, the heater 9a of the heater-equipped siphon 9 of the refrigerant storage tank is energized. Then, a part of the liquid nitrogen in the storage tank 6 evaporates due to the heating of the heater 9a of the heater-equipped siphon 9, and the inside of the tank is pressurized, and liquid nitrogen flows into the refrigerant tank 3 due to the pressure difference with atmospheric pressure. Sent. In addition, refrigerant tank 3
When the refrigerant reaches the level at which the liquid level sensor 5 is installed, the controller 10 activates the heater 9a of the heater siphon 9.
At the same time, the electromagnetic valve 8 is operated and opened to stop supplying the refrigerant 4 to the refrigerant tank 3. In this way, the refrigerant in the refrigerant tank 3 is maintained at a constant level by repeating the feeding and stopping of the refrigerant.

【0013】図2は上記構成からなる前記コントロ−ラ
10による送液の停止と供給の時間関係を示した図であ
るが、この場合の周期は熱分析装置の測定温度、加熱・
冷却速度等により変化する。図3は図2のP部に示す冷
媒供給時間帯におけるヒ−タ付サイフォン9のヒ−タ9
aに通電(通常は交流電源)する時間と通電停止時間の
関係を示した図である。この図3からも分かるように、
液体窒素を供給する時にはコントロ−ラ10は間欠的に
ヒ−タに通電して冷媒の流量を制御している。
FIG. 2 is a diagram showing the time relationship between stopping and supplying liquid by the controller 10 having the above-mentioned configuration, and the period in this case depends on the temperature measured by the thermal analyzer, the heating and
It changes depending on the cooling rate, etc. FIG. 3 shows the heater 9 of the heater-equipped siphon 9 during the refrigerant supply period shown in section P of FIG.
FIG. 3 is a diagram showing the relationship between the time when electricity is applied (usually an AC power supply) to a and the time when electricity is stopped. As can be seen from this Figure 3,
When supplying liquid nitrogen, the controller 10 intermittently energizes the heater to control the flow rate of the refrigerant.

【0014】また、図4は、図3において示す冷媒供給
中の「通電」と「通電停止」との間隔を変えた場合を示
す図であって通電時間を長くした場合の図であり、図5
は通電時間を短くした場合の図である。前記加熱炉を構
成する炉心管1に設置した冷媒槽3の液面のレベルの「
ゆらぎ」は炉心管1内にある試料部温度の「ゆらぎ」の
原因となり、図2に示す送液時間と送液停止時間の周期
が短いほどこの「ゆらぎ」は小さく、周期が長くなった
場合は「ゆらぎ」も大きくなる。故に、図3の通電時間
と通電停止の時間間隔を図4で示すように、ヒ−タ付サ
イフォン9のヒ−タ9aに通電する時間を長くし、通電
停止時間を短くすることにより液体窒素の流量を増やし
図2の冷媒送液時間と送液停止との周期を短くして「ゆ
らぎ」を小さくすることが出来る。従って、液面センサ
5からの信号により、その時の測定温度を考慮して、常
に一定周期となるようコントロ−ラ10を介してヒ−タ
付サイフォン9のヒ−タ9aへの通電と通電停止時間の
比(デュ−ティ比)を制御すれば液面レベルの「ゆらぎ
」を最小となるようにすることが出来るのである。
Furthermore, FIG. 4 is a diagram showing a case where the interval between "energization" and "energization stop" during refrigerant supply shown in FIG. 5
is a diagram when the energization time is shortened. The liquid level of the refrigerant tank 3 installed in the core tube 1 constituting the heating furnace.
"Fluctuations" cause "fluctuations" in the temperature of the sample part in the reactor core tube 1, and the shorter the period of liquid feeding time and liquid feeding stop time shown in Figure 2, the smaller this "fluctuation" becomes. The ``fluctuation'' also increases. Therefore, as shown in FIG. 4, the time interval between the energization time and the energization stop time shown in FIG. It is possible to reduce the "fluctuation" by increasing the flow rate and shortening the period between the refrigerant feeding time and the stopping of the liquid feeding shown in FIG. Therefore, depending on the signal from the liquid level sensor 5, the heater 9a of the heater-equipped siphon 9 is energized and de-energized via the controller 10 at a constant cycle, taking into account the measured temperature at that time. By controlling the time ratio (duty ratio), "fluctuations" in the liquid level can be minimized.

【0015】尚、上記実施例ではヒ−タ付サイフォンの
ヒ−タは交流電源により通電する時間間隔を制御するこ
とにより送液を制御したが、交流電圧値を変化させて制
御するようにしても良い。
[0015] In the above embodiment, the heater of the heater-equipped siphon was controlled by controlling the time interval at which it was energized by the AC power supply, but it was also possible to control the liquid supply by changing the AC voltage value. Also good.

【0016】[0016]

【発明の効果】この発明にかかる熱分析装置用加熱炉及
び温度制御方法は以上詳述したような構成としたので、
炉心管に設置する試料温度を所定の低温に設定する場合
、精密な液面レベルの制御を行いどの設定温度でも「ゆ
らぎ」を最小にして温度を安定させることが出来る。従
って極めて低い温度での熱分析を正確に行うことが出来
る。
[Effects of the Invention] Since the heating furnace for a thermal analyzer and the temperature control method according to the present invention are configured as detailed above,
When setting the temperature of the sample installed in the reactor core tube to a predetermined low temperature, it is possible to precisely control the liquid level and stabilize the temperature by minimizing fluctuations at any set temperature. Therefore, thermal analysis can be performed accurately at extremely low temperatures.

【0017】[0017]

【図面の簡単な説明】[Brief explanation of drawings]

【図1】  この発明にかかる熱分析装置用加熱炉の構
成を示す図である。
FIG. 1 is a diagram showing the configuration of a heating furnace for a thermal analyzer according to the present invention.

【図2】  この発明にかかる熱分析装置用加熱炉のコ
ントロ−ラによる送液の停止と供給の時間関係を示した
図である。
FIG. 2 is a diagram showing the time relationship between stopping and supplying liquid by the controller of the heating furnace for a thermal analyzer according to the present invention.

【図3】  図2のP部に示す冷媒供給中にヒ−タ付サ
イフォンのヒ−タに通電する時間と通電停止時間の関係
を示した図である。
3 is a diagram showing the relationship between the time when the heater of the heater-equipped siphon is energized and the time when the energization is stopped during refrigerant supply shown in section P of FIG. 2; FIG.

【図4】  図3において示す冷媒供給中の「通電」と
「通電停止」との間隔を変えた場合を示す図であって通
電時間を長くした場合の図である。
FIG. 4 is a diagram showing a case where the interval between "energization" and "stopping of energization" during refrigerant supply shown in FIG. 3 is changed, and is a diagram when the energization time is lengthened.

【図5】  図3において示す冷媒供給中の「通電」と
「通電停止」との間隔を変えた場合を示す図であって通
電時間を短くした場合の図である。
5 is a diagram illustrating a case where the interval between “energization” and “energization stop” during refrigerant supply shown in FIG. 3 is changed, and is a diagram when the energization time is shortened; FIG.

【符号の説明】[Explanation of symbols]

1  炉心管          2  ヒ−タ   
       3  冷媒槽          4 
 冷媒 5  液面センサ      6  冷媒貯蔵タンク 
       8  電磁弁 9  ヒ−タ付サイフォン          9a 
 ヒ−タ        10  コントロ−ラ
1 Furnace core tube 2 Heater
3 Refrigerant tank 4
Refrigerant 5 Liquid level sensor 6 Refrigerant storage tank
8 Solenoid valve 9 Siphon with heater 9a
Heater 10 Controller

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】試料を設置する炉心管と、該炉心管下部に
設置され液面センサを配置した冷媒槽と、ヒ−タ付サイ
フォンを配置し前記冷媒槽への管路と電磁バルブとを配
管した冷媒入タンクと、前記液面センサとヒ−タ付サイ
フォンと電磁バルブを制御するコントロ−ラとより成る
ことを特徴とする熱分析装置用加熱炉。
Claim 1: A reactor core tube in which a sample is placed, a refrigerant tank installed at the bottom of the reactor core tube in which a liquid level sensor is arranged, a siphon with a heater arranged, and a conduit to the refrigerant tank and a solenoid valve. 1. A heating furnace for a thermal analysis apparatus, comprising a piped refrigerant tank, and a controller for controlling the liquid level sensor, a siphon with a heater, and an electromagnetic valve.
【請求項2】試料を設置する炉心管と、炉心管下部に設
置され液面センサを配置した冷媒槽と、ヒ−タ付サイフ
ォンを配置し前記冷媒槽への管路と電磁バルブとを配管
した冷媒入タンクと、前記液面センサとヒ−タ付サイフ
ォンと電磁バルブを制御するコントロ−ラとより成る熱
分析装置用加熱炉において、前記冷媒槽へ供給する冷媒
の割合を、各設定温度において、前記コントロ−ラを介
して時間的に一定間隔とすることを特徴とする温度制御
方法。
[Claim 2] A reactor core tube in which a sample is placed, a refrigerant tank installed at the bottom of the reactor core tube and in which a liquid level sensor is arranged, a siphon with a heater arranged, and a conduit and an electromagnetic valve connected to the refrigerant tank. In a heating furnace for a thermal analyzer, which consists of a tank containing refrigerant, the liquid level sensor, a siphon with a heater, and a controller that controls an electromagnetic valve, the proportion of refrigerant supplied to the refrigerant tank is controlled at each set temperature. A temperature control method characterized in that the temperature is controlled at regular intervals via the controller.
JP9123791A 1991-03-28 1991-03-28 Heating furnace for thermal analyzer and temperature control method Expired - Fee Related JP2903754B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9123791A JP2903754B2 (en) 1991-03-28 1991-03-28 Heating furnace for thermal analyzer and temperature control method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9123791A JP2903754B2 (en) 1991-03-28 1991-03-28 Heating furnace for thermal analyzer and temperature control method

Publications (2)

Publication Number Publication Date
JPH04301552A true JPH04301552A (en) 1992-10-26
JP2903754B2 JP2903754B2 (en) 1999-06-14

Family

ID=14020815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9123791A Expired - Fee Related JP2903754B2 (en) 1991-03-28 1991-03-28 Heating furnace for thermal analyzer and temperature control method

Country Status (1)

Country Link
JP (1) JP2903754B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110763855A (en) * 2019-12-03 2020-02-07 贝士德仪器科技(北京)有限公司 Full-automatic physical adsorption instrument
WO2024201614A1 (en) * 2023-03-24 2024-10-03 株式会社日立ハイテク Ion milling device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110763855A (en) * 2019-12-03 2020-02-07 贝士德仪器科技(北京)有限公司 Full-automatic physical adsorption instrument
WO2024201614A1 (en) * 2023-03-24 2024-10-03 株式会社日立ハイテク Ion milling device

Also Published As

Publication number Publication date
JP2903754B2 (en) 1999-06-14

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