JPH04309536A - Radiation grafting process and grafted product - Google Patents

Radiation grafting process and grafted product

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Publication number
JPH04309536A
JPH04309536A JP10185091A JP10185091A JPH04309536A JP H04309536 A JPH04309536 A JP H04309536A JP 10185091 A JP10185091 A JP 10185091A JP 10185091 A JP10185091 A JP 10185091A JP H04309536 A JPH04309536 A JP H04309536A
Authority
JP
Japan
Prior art keywords
base material
polymer base
grafting
radiation
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10185091A
Other languages
Japanese (ja)
Inventor
Junji Harada
純二 原田
Rei Fujita
玲 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Priority to JP10185091A priority Critical patent/JPH04309536A/en
Publication of JPH04309536A publication Critical patent/JPH04309536A/en
Pending legal-status Critical Current

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  • Processes Of Treating Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

PURPOSE:To provide the title process useful for obtaining a grafted product excellent in metal adsorptivity, strengths, etc., by subjecting a polymer base to specified irradiation before grafting a specified monomer onto the base. CONSTITUTION:A polymer base (e.g. PE film) is irradiated with a radiation (e.g. accelerated electron beams) at a dose sufficient to crosslink the base, before vinyl monomer (e.g. acrylic acid) is grafted onto the base.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、たとえば金属イオン吸
着体に利用できる表面グラフト化高分子基材およびその
製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface-grafted polymer base material that can be used, for example, as a metal ion adsorbent, and a method for producing the same.

【0002】0002

【従来の技術】一般に迅速な金属吸着性を得るためにポ
リマー粒子や繊維状基材の表面積の広さを利用し、これ
らの樹脂表面に何らかの金属吸着体、例えばアクリル酸
、メタクリル酸やスチレンスルホン酸、2−アクリルア
ミド−2−メチルプロパンスルホン酸、アミドキシム基
などの活性層を設ける方法がとられていた。このような
金属吸着体を用いる条件はさまざまであり、排水処理や
海水からの金属回収などに用いる場合には高分子基材と
活性層の接着性が重要な問題となり、特にポリオレフィ
ン樹脂を基材とし活性層を加熱硬化などにより固定化し
た場合には基材の耐久性は充分であるが、活性層との接
着性が不十分で長期間の使用には不向きであった。この
ような欠点を解消する方法として、基材のポリオレフィ
ン樹脂と活性層を構成する物質との間を直接化学結合に
より結合させるグラフト化反応が検討されてきた。グラ
フト化反応そのものは電子線照射、γ線照射、光照射、
プラズマ処理、コロナ処理、フレーム処理など多くの手
段により開始することができるが実用的な見地からは電
子線、γ線などの放射線照射が好ましい。
[Prior Art] Generally, in order to obtain rapid metal adsorption properties, the large surface area of polymer particles or fibrous base materials is utilized, and some metal adsorbent such as acrylic acid, methacrylic acid or styrene sulfone is applied to the surface of these resins. A method of providing an active layer of acid, 2-acrylamido-2-methylpropanesulfonic acid, amidoxime group, etc. has been used. The conditions for using such metal adsorbents are various, and when used for wastewater treatment or metal recovery from seawater, the adhesion between the polymer base material and the active layer is an important issue. When the active layer is fixed by heat curing or the like, the durability of the base material is sufficient, but the adhesiveness with the active layer is insufficient, making it unsuitable for long-term use. As a method to overcome these drawbacks, studies have been conducted on a grafting reaction in which the polyolefin resin of the base material and the substance constituting the active layer are bonded directly through chemical bonds. The grafting reaction itself involves electron beam irradiation, γ-ray irradiation, light irradiation,
Although it can be initiated by many means such as plasma treatment, corona treatment, flame treatment, etc., radiation irradiation such as electron beams and gamma rays is preferred from a practical standpoint.

【0003】これらの放射線照射によるグラフト化反応
は簡便に行えるばかりでなく、高線量率であるために反
応が速く、照射は低温で行え、かつグラフト量が大きい
という長所がある。放射線照射によるグラフト化反応で
は高分子基材とグラフト化されるべきモノマーを共存さ
せて同時に放射線照射する方法(同時照射法)が効率的
であるが、この方法はモノマーと高分子基材の組合せが
限定され(例えばモノマーは比較的低G値、高分子基材
は高G値が必要)、さらにモノマー単独の重合が避けら
れないばかりでなく、このモノマー重合物はグラフト化
反応後水洗や抽出により分離しにくく実用上の問題があ
った。
[0003] These grafting reactions by irradiation with radiation are not only easy to perform, but also have the advantage that the reaction is fast due to the high dose rate, the irradiation can be carried out at low temperatures, and the amount of grafting is large. In the grafting reaction by radiation irradiation, it is efficient to make the polymer base material and the monomer to be grafted coexist and irradiate them at the same time (simultaneous irradiation method). (For example, the monomer requires a relatively low G value, and the polymer base material requires a high G value). Furthermore, not only is the polymerization of the monomer alone unavoidable, but this monomer polymer must be washed with water or extracted after the grafting reaction. Therefore, it is difficult to separate, which poses a practical problem.

【0004】放射線照射によるグラフト化方法としてあ
らかじめ高分子基材のみに放射線を照射し、しかるのち
にモノマーと反応させる方法(前照射法)では上記のモ
ノマーの単独重合を抑制することができるが、しかしな
がらこの放射線照射による反応では活性エネルギー線の
透過力が大きすぎるために高分子基材の粒子や繊維、フ
ィルムではその内部までも活性化してしまい、グラフト
化反応の段階でモノマーが高分子基材の内部に拡散して
しまうという欠点があった。特にこの欠点は、グラフト
化反応速度を上げるために高温で反応を行ったり、反応
を均一に行うために溶媒を用いたりするとより高分子基
材内部への拡散を促進してしまうというジレンマがあっ
た。このようなモノマーの高分子基材内部への拡散は、
金属吸着効率を低下させるのみならず、使用時に膨潤に
より高分子基材としての機械的強度を低下させるもので
あり、かつフィルムの内部のグラフト化合物は金属吸着
および脱着が遅いため処理速度が遅いなど実用上重大な
問題であった。
[0004] As a grafting method by radiation irradiation, a method in which only the polymer base material is irradiated with radiation in advance and then reacted with the monomer (pre-irradiation method) can suppress the homopolymerization of the monomers mentioned above; However, in this radiation irradiation reaction, the penetrating power of the active energy rays is too large, which activates even the inside of the particles, fibers, and films of the polymer base material. It has the disadvantage that it can be diffused inside. In particular, this drawback poses the dilemma that if the reaction is carried out at a high temperature to increase the grafting reaction rate or if a solvent is used to make the reaction uniform, diffusion into the interior of the polymer base material will be further promoted. Ta. Diffusion of such monomers into the polymer base material is
This not only reduces metal adsorption efficiency, but also reduces the mechanical strength of the polymer base material due to swelling during use, and the graft compound inside the film slows metal adsorption and desorption, resulting in slow processing speed. This was a serious problem in practical terms.

【0005】一般に放射線照射によって高分子基材内部
に生成するラジカル種は放射線照射量に比例すると考え
て良い。高分子基材の架橋が無視できるほどの低い放射
線照射量においては一定反応時間におけるグラフト率は
ほとんど放射線照射量に比例する。反応時間が増加する
に従ってグラフト率も増加し、グラフト層は高分子基材
の表面から内部に向かって進行する。グラフト率の増加
と未反応高分子基材の厚みの減少はほぼ比例すると見て
良いが、グラフト層が高分子基材の厚み全体に広がった
場合、すなわち未反応高分子基材層が消失した時点でこ
のグラフト化高分子基材は急速に膨潤、膨張を開始し、
かつ元来高分子基材が有する機械的強度は極度に低下す
る。高分子基材の機械的強度を維持したままグラフト化
物を得るには基材を溶解、膨潤しない溶媒を使用し、反
応時間を短くしてグラフト層の高分子基材内部への進行
を途中で止めるしかないが、この場合高分子基材表面に
グラフトするモノマーの量が少なく、グラフト率が小さ
くなり、金属吸着能が低下するというジレンマがある。 このようなジレンマは金属吸着のみならずグラフト反応
の技術を高分子基材にイオン交換、酵素や菌体の固定化
、接着性改良、帯電防止性、防曇性を持たせたりリソグ
ラフィなどに応用する場合にも当然問題となるものであ
る。
[0005] In general, it can be considered that the radical species generated inside a polymer base material by radiation irradiation is proportional to the radiation dose. At a low radiation dose where crosslinking of the polymer base material is negligible, the grafting rate at a given reaction time is almost proportional to the radiation dose. As the reaction time increases, the grafting rate also increases, and the graft layer progresses from the surface of the polymeric substrate toward the inside. It can be seen that the increase in the grafting rate and the decrease in the thickness of the unreacted polymer base material are almost proportional, but if the graft layer spreads over the entire thickness of the polymer base material, that is, the unreacted polymer base layer disappears. At this point, this grafted polymeric substrate begins to rapidly swell and expand.
Moreover, the mechanical strength originally possessed by the polymer base material is extremely reduced. In order to obtain a grafted product while maintaining the mechanical strength of the polymer base material, use a solvent that does not dissolve or swell the base material, and shorten the reaction time to prevent the graft layer from advancing inside the polymer base material. There is no choice but to stop it, but in this case there is a dilemma in that the amount of monomer grafted onto the surface of the polymer base material is small, the grafting ratio becomes small, and the metal adsorption ability decreases. This dilemma can be solved not only by metal adsorption, but also by applying graft reaction technology to polymer substrates for ion exchange, immobilization of enzymes and bacteria, improved adhesion, antistatic properties, antifogging properties, and lithography. Naturally, this also poses a problem.

【0006】[0006]

【発明が解決しようとする課題】よって本発明は、高分
子基材の表面のみに接着性、耐久性の高い活性層を高濃
度にグラフト化反応により作成し、実用的な強度のある
グラフト化処理高分子基材を作成するものである。
[Problems to be Solved by the Invention] Therefore, the present invention aims to create a highly adhesive and durable active layer only on the surface of a polymeric base material by a grafting reaction at a high concentration, thereby achieving a grafting structure with practical strength. A treated polymer base material is created.

【0007】[0007]

【課題を解決するための手段】本発明者は、上記のよう
な問題点を解決する手段を鋭意研究した結果以下のよう
な方法を見いだすに至った。すなわち、高分子基材にあ
らかじめ該高分子基材を架橋させるにたる放射線照射を
行い、しかるのちにビニル基を有するモノマーとグラフ
ト反応を行わせることにより、グラフト層を高分子基材
の表面のみに限定させて作成することのできる放射線照
射グラフト化方法及び放射線照射により架橋した高分子
基材の表面のみにグラフト層を有するグラフト化物の発
明である。本発明において「高分子基材を架橋させるに
たる放射線照射」とは高分子基材をゲル分率が40%以
上になるように架橋させるにたる放射線照射を行うこと
を目安とする。ここでゲル分率で40%以上になるのに
必要な放射線照射量は高分子の種類により異なるが、代
表的には低密度ポリエチレンで8Mrad以上、高密度
ポリエチレンで12Mrad以上の電子線照射で足りる
。尚、128Mradを越える放射線照射は経済的にも
非効率であるし、高分子基材の機械的強度も低下するこ
とがあるので好ましくない。
[Means for Solving the Problems] As a result of intensive research into means for solving the above-mentioned problems, the inventors have discovered the following method. That is, by first irradiating the polymer base material with radiation to crosslink the polymer base material, and then performing a graft reaction with a monomer having a vinyl group, the graft layer is formed only on the surface of the polymer base material. This is the invention of a radiation irradiation grafting method that can be created by limiting the method, and a grafted product having a graft layer only on the surface of a polymer base material crosslinked by radiation irradiation. In the present invention, "irradiation sufficient to crosslink the polymeric base material" refers to radiation irradiation sufficient to crosslink the polymeric base material such that the gel fraction becomes 40% or more. The amount of radiation required to achieve a gel fraction of 40% or more differs depending on the type of polymer, but typically electron beam irradiation of 8 Mrad or more is sufficient for low-density polyethylene and 12 Mrad or more for high-density polyethylene. . Incidentally, irradiation with radiation exceeding 128 Mrad is not preferable since it is economically inefficient and may also reduce the mechanical strength of the polymer base material.

【0008】本発明のごとく高分子基材を架橋させるに
たる放射線照射を事前に行い、しかる後モノマーとグラ
フト反応を行わせた場合は従来知られていた前照射グラ
フト反応と全く異なることが明らかとなった。すなわち
、第1に一定時間におけるグラフト率は前照射線量が増
加するに従って減少する。これはモノマーの高分子基材
内部への拡散速度が、高分子基材の架橋による効果で抑
制されるためと考えられる。このためグラフト層の位置
が比較的表面に限られる。第2に反応時間とともにグラ
フト率は増加するが、グラフト層は比較的高分子基材の
表面にとどまったままで、未反応高分子基材の厚みはご
くわずかしか減少しない。これは充分な量のラジカルが
高分子基材表面およびグラフト層内に存在するため、モ
ノマーはグラフト層内部を拡散して未反応の高分子基材
に到達する以前にグラフト層内のラジカルに補足され反
応するためと考えられる。このため未反応の高分子基材
が多量に残り、高い機械的強度を維持したままグラフト
率は高い値に達する。以下、本発明について詳細に説明
する。
[0008] It is clear that when the polymer base material is irradiated with radiation to crosslink it in advance and then the graft reaction with the monomer is carried out as in the present invention, it is completely different from the previously known pre-irradiation graft reaction. It became. That is, firstly, the grafting rate over a certain period of time decreases as the pre-irradiation dose increases. This is thought to be because the diffusion rate of the monomer into the polymer base material is suppressed by the effect of crosslinking of the polymer base material. Therefore, the position of the graft layer is relatively limited to the surface. Second, although the grafting rate increases with reaction time, the graft layer remains relatively on the surface of the polymeric substrate, and the thickness of the unreacted polymeric substrate decreases only slightly. This is because a sufficient amount of radicals exist on the surface of the polymer base material and within the graft layer, so the monomer diffuses inside the graft layer and captures the radicals within the graft layer before reaching the unreacted polymer base material. This is thought to be due to a reaction. Therefore, a large amount of unreacted polymer base material remains, and the grafting ratio reaches a high value while maintaining high mechanical strength. The present invention will be explained in detail below.

【0009】ここでいう高分子基材とはポリエチレン、
ポリプロピレン、ポリスチレン、ポリメチルペンテン−
1、ポリスルホン、ポリアクリレート、ポリアクリルア
ミド、ポリビニルクロリド、ポリアクリロニトリル、ポ
リ酢酸ビニル、ポリビニルアルコール、ポリビニルピロ
リドンなどの放射線架橋型樹脂または共重合樹脂であり
、同様なビニル型モノマーでもポリイソブチレン、ポリ
ビニリデンクロライドなどの放射線崩壊型ポリマーの場
合には適用できない。これらの区別は放射線照射時の条
件(温度、雰囲気)に影響されるため、条件しだいで放
射線照射により架橋する樹脂であればポリオレフィン樹
脂に限らずナイロン、ポリジメチルシロキサン、テフロ
ンなどでも利用できる。これらの高分子基材の形態は、
板状、棒状、シート状、フィルム状、繊維状、ビーズ状
、粉末状、中空糸状などいかなる形状であっても基本的
に差し支えない。
[0009] The polymer base material referred to here is polyethylene,
Polypropylene, polystyrene, polymethylpentene
1. Radiation crosslinked resins or copolymer resins such as polysulfone, polyacrylate, polyacrylamide, polyvinyl chloride, polyacrylonitrile, polyvinyl acetate, polyvinyl alcohol, polyvinylpyrrolidone, and similar vinyl monomers such as polyisobutylene and polyvinylidene chloride. It cannot be applied to radiation-degradable polymers such as. These distinctions are influenced by the conditions during radiation irradiation (temperature, atmosphere), so depending on the conditions, not only polyolefin resins but also nylon, polydimethylsiloxane, Teflon, etc. can be used as long as the resins crosslink by radiation irradiation. The morphology of these polymeric substrates is
Basically, it can be of any shape such as plate, rod, sheet, film, fiber, bead, powder, hollow fiber, etc.

【0010】ここでいう放射線とは特に加速電子線とγ
線が好ましく、特に電子線特性として、透過力、活性化
効率の面から加速電圧が少なくとも10Kv以上であり
、電子線加速器としては例えば、エレクトロカーテンシ
ステム、スキャンニングタイプ、ダブルスキャンニング
タイプ、バンデグラフ、コールドカソード等の何れでも
良い。ここでいう高分子基材の架橋とは簡便には該高分
子基材を溶解しうる溶媒を用いたゲル分率で測定するこ
とができ、本発明の効果はゲル分率40%以上において
顕著に現われる。なお、放射線照射に際しては酸素濃度
が高いとグラフト活性種(主にフリーラジカル)の失活
を招いたり、酸化反応によるポリマーの崩壊を招いたり
するため窒素、ヘリウム等の不活性ガスによる置換を行
い酸素濃度低下をはかることが好ましい。ただし過酸化
物をグラフト活性種として用いる場合にはこの限りでは
ない。
[0010] The radiation referred to here particularly refers to accelerated electron beams and γ
A beam is preferable, and in particular, as an electron beam characteristic, the accelerating voltage is at least 10 Kv or more in terms of penetrating power and activation efficiency. Examples of electron beam accelerators include electrocurtain system, scanning type, double scanning type, Van de Graaff, Any cold cathode or the like may be used. The crosslinking of the polymer base material referred to here can be simply measured by the gel fraction using a solvent that can dissolve the polymer base material, and the effect of the present invention is significant when the gel fraction is 40% or more. appears in Note that when irradiating radiation, high oxygen concentrations may lead to deactivation of grafted active species (mainly free radicals) or collapse of polymers due to oxidation reactions, so replacement with an inert gas such as nitrogen or helium is necessary. It is preferable to reduce the oxygen concentration. However, this is not the case when peroxide is used as the grafting active species.

【0011】本発明に用いられるグラフト化により金属
吸着性活性層を形成するモノマーとしてはラジカル重合
に必要なビニル基と金属吸着(イオン結合、キレート生
成)に必要なカルボキシル基、スルホン基、フェノール
性水酸基、水酸基、チオール、アミノ基、リン酸基、シ
アノ基、アミノ基、アミドキシム基などを直接有するか
、あるいはグラフト化後にこれらの金属吸着性官能基を
導入できるビニルモノマーを用いることができる。たと
えば、アクリル酸、メタクリル酸、アクリルアミド、ア
クリロニトリル、スチレンスルホン酸、2−アクリルア
ミド−2−メチルプロパンスルホン酸、ビニル酢酸、ス
チレンリン酸、ジビニルベンゼン、スチレン、ビニルア
ニリン、ビニルピロリドン、グリシジルメタクリレート
、グリシジルアクリレートなどが挙げられる。グラフト
化反応は放射線照射後、モノマーと直接、あるいは溶媒
を用いて反応させるか、あるいは気化させたモノマーと
反応させることにより達成できる。一般にモノマー単独
では反応速度が遅いことが多いので溶媒を用いた溶液系
での反応が有利である。モノマー単独でのホモ重合を防
ぐ目的でモール塩のようなラジカル重合抑制剤、金属銅
や第1塩化銅のようなレドックス系添加剤、ハイドロキ
ノンモノメチルエーテルのような重合禁止剤を併用して
もよい。
The monomers used in the present invention to form the metal-adsorbing active layer by grafting include vinyl groups necessary for radical polymerization, and carboxyl groups, sulfonic groups, and phenolic groups necessary for metal adsorption (ionic bonding, chelate formation). A vinyl monomer that directly has a hydroxyl group, a thiol, an amino group, a phosphoric acid group, a cyano group, an amino group, an amidoxime group, etc., or into which these metal-adsorbing functional groups can be introduced after grafting can be used. For example, acrylic acid, methacrylic acid, acrylamide, acrylonitrile, styrene sulfonic acid, 2-acrylamido-2-methylpropanesulfonic acid, vinyl acetic acid, styrene phosphoric acid, divinylbenzene, styrene, vinylaniline, vinylpyrrolidone, glycidyl methacrylate, glycidyl acrylate. Examples include. The grafting reaction can be achieved by reacting with the monomer directly, using a solvent, or reacting with a vaporized monomer after irradiation. Generally, the reaction rate is often slow when a monomer is used alone, so it is advantageous to react in a solution system using a solvent. In order to prevent homopolymerization of the monomer alone, a radical polymerization inhibitor such as Mohr's salt, a redox additive such as metallic copper or cuprous chloride, or a polymerization inhibitor such as hydroquinone monomethyl ether may be used in combination. .

【0012】0012

【作用】本発明は、放射線照射グラフト化反応において
放射線照射による高分子基材の架橋構造により、グラフ
ト化反応時のビニル基を有するモノマーの高分子基材内
部への拡散を制限し、グラフト化位置を高分子基材の表
面のみに限定させ、高効率、高強度のグラフト化基材を
得ることができるものである。
[Function] In the radiation irradiation grafting reaction, the crosslinking structure of the polymer base material due to radiation irradiation restricts the diffusion of monomers having vinyl groups into the interior of the polymer base material during the grafting reaction, resulting in grafting. By limiting the position to only the surface of the polymer base material, it is possible to obtain a grafted base material with high efficiency and high strength.

【0013】[0013]

【実施例】以下、実施例により本発明を詳しく説明する
が、本発明の内容は実施例に限られるものではない。 実施例 厚さ95μmの高密度ポリエチレンフィルム(密度0.
963g/cm3)を窒素ガスで置換した電子線照射装
置(ESI製、175/15/20、酸素濃度50pp
m以下、加速電圧175kv)により12Mrad、1
6Mrad、32Mrad、64Mrad、および12
8Mradの各吸収線量になるように電子線照射した。 照射したポリエチレンフィルムは、あらかじめ窒素ガス
置換により脱気し50%アクリル酸水溶液内において7
0℃で反応を行った。 グラフト率を一定にするため反応時間はおのおのの照射
線量によって異なる。グラフト化したポリエチレンフィ
ルムはすばやく大過剰のメタノール中に投入し反応を停
止し、引き続きメタノール中で1日還流することにより
グラフト層の洗浄を行った。真空乾燥後、重量測定によ
りグラフト率を計算した後、5%水酸化カリウム溶液で
グラフト層の中和を行い、水洗、真空乾燥後、走査型電
子顕微鏡によりアクリル酸のポリエチレンフィルム内部
への拡散状態を測定した。グラフト反応とは別に同様の
条件で電子線照射したポリエチレンサンプルをガラスフ
ィルターに入れて重量測定後、トルエン中で48時間還
流した後に回収して再度重量測定を行い、ゲル分率を求
めた。
[Examples] The present invention will be explained in detail below with reference to Examples, but the content of the present invention is not limited to the Examples. Example High-density polyethylene film with a thickness of 95 μm (density 0.
963g/cm3) with nitrogen gas (manufactured by ESI, 175/15/20, oxygen concentration 50pp)
m or less, acceleration voltage 175 kv) 12 Mrad, 1
6Mrad, 32Mrad, 64Mrad, and 12
Electron beam irradiation was performed to give each absorbed dose of 8 Mrad. The irradiated polyethylene film was degassed in advance by nitrogen gas replacement and placed in a 50% acrylic acid aqueous solution for 7 days.
The reaction was carried out at 0°C. In order to maintain a constant grafting rate, the reaction time varies depending on each irradiation dose. The grafted polyethylene film was quickly poured into a large excess of methanol to stop the reaction, and then the grafted layer was washed by refluxing in methanol for one day. After vacuum drying, the graft ratio was calculated by weight measurement, the graft layer was neutralized with 5% potassium hydroxide solution, washed with water, vacuum dried, and the diffusion state of acrylic acid inside the polyethylene film was measured using a scanning electron microscope. was measured. A polyethylene sample that had been irradiated with an electron beam under the same conditions apart from the graft reaction was placed in a glass filter and weighed, then refluxed in toluene for 48 hours, recovered, and weighed again to determine the gel fraction.

【0014】比較例 電子線照射による吸収線量を1Mrad、2Mrad、
4Mrad、8Mradとなるようにした以外は実施例
と同様の操作によりポリエチレンフィルムにアクリル酸
のグラフト化反応を行った。 結果 実施例および比較例の結果を表1にまとめて記載する。 尚、ゲル分率、グラフト率、モノマー拡散度の計算はそ
れぞれ以下に示す計算式により、強度、金属吸着性は以
下に示す方法により求めた。 ゲル分率=100×(溶媒抽出後の重量)/(溶媒抽出
前の重量) グラフト率=100×(グラフト後の重量ーグラフト前
の重量)/(グラフト前の重量) モノマー拡散度=100ー100×(グラフト後のグラ
フト層以外のフィルム厚み)/(グラフト前のフィルム
厚み) 強度:同量の電子線照射を行った未グラフトの高分子基
材に対するグラフト化高分子基材の最大引っ張り強度の
相対値。1Mradから64Mradに電子線照射量が
増大するにつれて未グラフト高分子基材の引っ張り強度
は約10%増大する。グラフト化高分子基材は湿潤状態
において測定した。 金属吸着性:0.1M濃度の銅イオン溶液に15分間浸
漬した場合、比較例の1Mrad照射サンプルが単位ポ
リアクリル酸重量あたり吸着した銅イオンの量を100
%として、それぞれ同条件で換算した値。
Comparative Example The absorbed dose due to electron beam irradiation was 1 Mrad, 2 Mrad,
A grafting reaction of acrylic acid was carried out on a polyethylene film in the same manner as in the example except that the amounts were changed to 4 Mrad and 8 Mrad. Results The results of Examples and Comparative Examples are summarized in Table 1. The gel fraction, graft ratio, and monomer diffusivity were calculated using the formulas shown below, and the strength and metal adsorption properties were calculated using the methods shown below. Gel fraction = 100 x (weight after solvent extraction) / (weight before solvent extraction) Grafting rate = 100 x (weight after grafting - weight before grafting) / (weight before grafting) Monomer diffusivity = 100 - 100 × (Thickness of the film other than the graft layer after grafting) / (Thickness of the film before grafting) Strength: The maximum tensile strength of the grafted polymer base material compared to the ungrafted polymer base material that has been irradiated with the same amount of electron beams. Relative value. As the electron beam irradiation dose increases from 1 Mrad to 64 Mrad, the tensile strength of the ungrafted polymeric substrate increases by approximately 10%. The grafted polymeric substrate was measured in a wet state. Metal adsorption: When immersed in a copper ion solution with a concentration of 0.1M for 15 minutes, the amount of copper ions adsorbed per unit weight of polyacrylic acid by the 1Mrad irradiated sample of the comparative example was 100%.
Values converted as % under the same conditions.

【0015】[0015]

【表1】[Table 1]

【0016】[0016]

【発明の効果】表1のモノマー拡散度の結果からも明ら
かなように原料フィルムを架橋するに足る充分な電子線
照射をグラフト反応前に行うことにより、グラフトの反
応位置をフィルム表面に限定できた。本発明の方法によ
り高濃度の表面処理が可能となるばかりでなく、強度的
にも本来のフィルムの機械的強度を反映した高強度の表
面処理フィルムを得ることが出来る。このような表面に
グラフト位置を限定したグラフト化高分子基材の金属吸
着性は、グラフト位置が高分子基材全体に広がったもの
よりも高効率であった。
[Effects of the Invention] As is clear from the monomer diffusion results in Table 1, by irradiating the raw material film with sufficient electron beam to crosslink it before the grafting reaction, the grafting reaction position can be limited to the film surface. Ta. The method of the present invention not only enables high-density surface treatment, but also makes it possible to obtain a high-strength surface-treated film that reflects the mechanical strength of the original film. The metal adsorption of such a grafted polymer base material in which the grafting positions were limited to the surface was higher than that in a grafted polymer base material in which the grafting positions were spread over the entire polymer base material.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  高分子基材にあらかじめ該高分子基材
を架橋させるにたる放射線照射を行い、しかるのちに該
高分子基材とビニル基を有するモノマーをグラフト反応
を行わせる放射線照射グラフト化方法。
Claim 1: Radiation irradiation grafting in which a polymer base material is irradiated with radiation to crosslink the polymer base material in advance, and then a graft reaction is performed between the polymer base material and a monomer having a vinyl group. Method.
【請求項2】  放射線照射により架橋した高分子基材
の表面のみにグラフト層を有するグラフト化物。
2. A grafted product having a graft layer only on the surface of a polymer base material crosslinked by radiation irradiation.
JP10185091A 1991-04-05 1991-04-05 Radiation grafting process and grafted product Pending JPH04309536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10185091A JPH04309536A (en) 1991-04-05 1991-04-05 Radiation grafting process and grafted product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10185091A JPH04309536A (en) 1991-04-05 1991-04-05 Radiation grafting process and grafted product

Publications (1)

Publication Number Publication Date
JPH04309536A true JPH04309536A (en) 1992-11-02

Family

ID=14311524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10185091A Pending JPH04309536A (en) 1991-04-05 1991-04-05 Radiation grafting process and grafted product

Country Status (1)

Country Link
JP (1) JPH04309536A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1328306C (en) * 2004-06-11 2007-07-25 中国科学院上海应用物理研究所 Composite material of polymer film and inorganic crystal coating and its prepn process
JP2007313391A (en) * 2006-05-23 2007-12-06 Inoac Corp Capturing material, method for producing the same, and cartridge for solid phase extraction
JP2009100673A (en) * 2007-10-23 2009-05-14 Inoac Corp Enzyme fixing material, cartridge for enzyme reaction, and production method
JP2010006867A (en) * 2008-06-24 2010-01-14 Kureha Corp Method for producing molded article with gas barrier property and molded article with gas barrier property obtained from the same
WO2017138581A1 (en) * 2016-02-10 2017-08-17 株式会社クラレ Powder comprising graft copolymer, and method for producing said powder

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1328306C (en) * 2004-06-11 2007-07-25 中国科学院上海应用物理研究所 Composite material of polymer film and inorganic crystal coating and its prepn process
JP2007313391A (en) * 2006-05-23 2007-12-06 Inoac Corp Capturing material, method for producing the same, and cartridge for solid phase extraction
JP2009100673A (en) * 2007-10-23 2009-05-14 Inoac Corp Enzyme fixing material, cartridge for enzyme reaction, and production method
JP2010006867A (en) * 2008-06-24 2010-01-14 Kureha Corp Method for producing molded article with gas barrier property and molded article with gas barrier property obtained from the same
WO2017138581A1 (en) * 2016-02-10 2017-08-17 株式会社クラレ Powder comprising graft copolymer, and method for producing said powder

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