JPH04326548A - Quantitatively wafer contaminating jig - Google Patents

Abstract

PURPOSE:To provide the titled jig with which even beginners can easily contaminate a wafer and various solutions can be dealt with using a few wafers, little affected by atmosphere in a dry condition. CONSTITUTION:The stage 10 to hold a wafer at a predefined position and a box 20 which houses the stage 10 are provided, and the cap structure 21 of the above stated box 20 has an opening 211 where the tip 31 of pipet 30 for dripping contaminated solution is inserted.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a jig for intentionally contaminating a wafer used in an integrated circuit device in order to evaluate the degree of contamination on the surface of the wafer.

0002

2. Description of the Related Art One method of inspecting wafers is to intentionally contaminate the wafer and analyze the degree of contamination using total internal reflection fluorescent X-ray analysis. Intentional contamination of a wafer as a sample for total internal reflection fluorescence X-ray analysis can be achieved by dropping a solution containing an element at a predetermined concentration approximately at the center of the wafer 60, as shown in FIG. The solution is applied uniformly over the entire surface of the wafer by rotating the wafer, and then dried.

0003

However, the above-described conventional method has the following problems. That is, in order to uniformly contaminate the entire surface of the wafer, conditions such as the rotational speed of the spinner and the amount of solution dropped are very strict, and uniform contamination is difficult to achieve unless one is an expert. Furthermore, a plurality of wafers must be contaminated depending on the concentration of the solution and the elements contained in the solution. Furthermore, it is easily influenced by the surrounding atmosphere during drying.

The present invention was devised in view of the above circumstances, and allows even beginners to easily contaminate wafers, and moreover, can handle many types of solutions with a small number of wafers. The purpose of this invention is to provide a wafer quantitative contamination jig that is not affected by the atmosphere.

[0005]

[Means for Solving the Problems] A wafer quantitative contamination jig according to the present invention includes a stage for fixing a wafer in a fixed position, and a box for housing the stage, and a lid for the box. An opening is provided in which a dripping jig for dripping the contaminated solution is inserted.

[0006]

[Embodiment] FIG. 1 is a schematic plan view of a wafer quantitative contamination jig according to an embodiment of the present invention, FIG. 2 is a schematic sectional view of the wafer quantitative contamination jig, and FIG. 3 is a perspective view of the stage. 4 is a sectional view showing the opening of the lid, and FIG. 5 is an explanatory view showing means for making the distance between the lid and the wafer constant.

The wafer quantitative contamination jig according to this embodiment has a stage 10 for fixing a wafer in a fixed position, and a box 20 for housing this stage 10.
The lid 21 has an opening 211 into which a tip 31 of a pipette 30, which is a dropping jig for dropping a contaminated solution, is inserted.

As shown in FIG. 3, the stage 10 has four steps on which four types of wafers, ie, 4-inch, 5-inch, 6-inch, and 8-inch wafers are fixed.
The inch level difference 11, the 5 inch level difference 12, the 6 inch level difference 13, and the 8 inch level difference 14 are formed approximately in a mortar shape and concentrically from the inside to the outside. Furthermore, in order to fix the wafer in a fixed position, a notch 15 is cut into the stage 10 from the outer edge toward the center into which tweezers or the like holding the facets can be inserted. Note that the stage 10 is made of Teflon.

The box body 20 includes a main body 22 in which the stage 10 is housed, and a lid body 21 attached to this main body 22.
It has The lid body 21 has a U-shaped groove 21 in plan view.
3 (indicated by broken lines in FIG. 1) is formed on the back surface, and by fitting the groove 213 into the vertical wall 221 of the main body 22, the lid body 21 is always kept at a constant position with respect to the main body 22. It is now positioned.

Further, the lid body 21 has a plurality of openings 211 (14 in the drawing). This opening 211 is the part into which the tip 31 of the pipette 30 is inserted, and as shown in FIG. It has a corresponding tapered shape. The opening 211 is set to always be at a constant position relative to the wafer fixed to the stage 10. Note that between the openings 211 there are adjacent openings 21
1. In order to avoid being affected by the solution dripped from 1, it is assumed that they are spaced apart from each other by, for example, 20 mm. Further, the opening 211 is set to coincide with the analysis position of a total internal reflection fluorescent X-ray analyzer that analyzes the degree of contamination of the wafer.

On the other hand, a mounting table 40 on which the stage 10 is mounted is provided on the bottom surface of the main body 22 so as to be replaceable. This mounting table 40 can be mounted on the lid body 21 regardless of the size of the wafer.
The distance between the wafer and the wafer is kept constant. In other words, if the distance between the lid 21 and the wafer differs depending on the size of the wafer, the size of the dropped solution will not be constant, which may have a negative effect on analysis. This is to keep the value constant. Therefore, if the stage 10 having the four steps 11 to 14 is also used as described above, the mounting table 40 must be prepared with four different heights.

Although not shown in the drawings, a level may be provided at an appropriate location on the box 20 so that the box 20 can be set horizontally.

Next, an example of the use of such a wafer quantitative contamination jig will be explained. A mounting table 40 corresponding to the size of the wafer to be contaminated is set on the bottom surface of the main body 22, and the stage 10 is placed on the mounting table 40.

The lid 21 of the box 20 is opened and the wafer is fixed on the step of the stage 10. Then, the lid body 21 is accurately closed. The tip 31 of the pipette 30 is inserted into the opening 211 of the lid 21, and a predetermined amount of solution is dropped onto the wafer. After dropping the solutions of different concentrations and elements, about 6
Leave it for a while and let it dry naturally. Note that if you want to dry faster, you can use an infrared lamp.

The dried wafer is placed in a total internal reflection fluorescent X-ray analyzer for analysis.

In the above-described embodiment, by replacing the mounting table 40, the lid 2 can be replaced regardless of the size of the wafer.
Although the distance between No. 1 and the wafer is set constant, the present invention is not limited thereto. For example, instead of the mounting table 40, an elevating body that can be raised and lowered is provided on the bottom surface of the main body 22 of the box 20, and by raising and lowering this elevating body, the distance between the lid body 21 and the wafer can be made constant. Good too. Furthermore, by replacing the lid body 21, the lid body 2
The distance between 1 and the wafer may be constant. That is, as shown in FIG.
If the dimensions of the recessed portion 212 are made different depending on the size of the wafer, the distance between the lid 21 and the wafer can be made constant.

[0017]

Effects of the Invention The wafer quantitative contamination jig according to the present invention has a stage for fixing a wafer in a fixed position and a box body for housing this stage, and a lid of the box body is provided with a contamination solution. Since there is an opening for inserting a dripping jig to drip the element, even beginners can precisely apply a fixed amount of solution containing the element at a predetermined concentration to the wafer by inserting the tip of the dripping jig into the opening. Can be dripped. Furthermore, since the wafer is closed with a lid, it is not adversely affected by the surrounding atmosphere during drying.

Furthermore, since the opening is opened at a location that coincides with the analysis position of the analyzer, measurements can be easily performed at multiple locations even on a single wafer.

[Brief explanation of the drawing]

FIG. 1 is a schematic plan view of a wafer quantitative contamination jig according to an embodiment of the present invention.

FIG. 2 is a schematic cross-sectional view of this wafer quantitative contamination jig.

FIG. 3 is a perspective view of the stage.

FIG. 4 is a sectional view showing an opening of the lid.

FIG. 5 is an explanatory diagram showing means for keeping the distance between the lid and the wafer constant.

FIG. 6 is an explanatory diagram of a conventional method for uniformly contaminating a wafer.

[Explanation of symbols]

10 Stage 20 Box body 21 Lid body 211 (Lid body) Opening 30 Pipette (dropping jig)

Claims (4)

[Claims] [Claim 1] A stage for fixing a wafer in a fixed position, and a box for housing the stage, and a lid of the box has an opening into which a dripping jig for dripping a contaminated solution is inserted. A wafer quantitative contamination jig characterized by the fact that it has been established. 2. The wafer quantitative contamination jig according to claim 1, wherein the opening corresponds to an analysis position of a measuring device. 3. The wafer quantitative contamination jig according to claim 1, wherein the stage is formed in a mortar shape with a plurality of steps corresponding to wafers of a plurality of sizes. 4. The wafer quantitative contamination jig according to claim 1, wherein the distance between the lid and the wafer is constant regardless of the size of the wafer.