JPH04331161A - Manufacture of ion-flow electrostatic recording head - Google Patents

Abstract

PURPOSE:To prevent the oxidative deterioration and oxidative corrosion of each component such as a dielectric layer, a second electrode, an insulator layer at positions except the opening section of an ion generating section, and to manufacture an ion-flow electrostatic recording head having high durability as a most principle feature. CONSTITUTION:Inter-electrode opening sections 5b between adjacent second electrodes 5, 5 on a dielectric layer 6 are filled with first liquid insulators 9a and the insulator 9a is cured, and an insulator layer 9 unified by forming a filmy second insulator 9b on the first insulator 9a on the second electrodes 5 and the inter-electrode opening sections 5b between the second electrodes 5, 5 is formed.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an ion flow electrostatic recording head used, for example, in an electrostatic recording apparatus.

0002

[Prior Art] Generally, in technical fields such as electrostatic printing, ions with a high current density are generated, extracted and selectively applied to a member to be charged, thereby charging the member in an imagewise manner. Electrostatic recording devices are known.

FIGS. 2 and 3 schematically show the main parts of an ion flow electrostatic recording head 1 used in this electrostatic recording apparatus, where 2 is an ion generation section and 3 is an ion flow control section. In addition, the ion generating section 2 is provided with a plurality of first electrodes 4 and a plurality of second electrodes 5 for ion generation, and between these first electrodes 4 and second electrodes 5... A dielectric layer 6 made of a dielectric material is provided.

The electrostatic recording head 1 is provided with an insulating substrate 7, on which a plurality of first electrodes 4 extending in one direction are arranged substantially parallel to each other. Further, the dielectric layer 6 is provided on the side of the insulating substrate 7 on which the first electrodes 4 are disposed.

Furthermore, the plurality of second electrodes 5 are formed of a dielectric layer 6.
The first electrodes 4 are fixed to the surface opposite to the insulating substrate 7 in parallel in a direction crossing the first electrodes 4, and a matrix is formed by the first electrodes 4 and the second electrodes 5. There is. Openings 5a are formed in the second electrodes 5 at positions corresponding to the matrix.

[0006] The ion flow control unit 3 also includes a second electrode 5...
A strip-shaped third electrode 8 is provided on the opposite side of the first electrodes 4 . Openings 8a for ion flow passage are formed in the third electrode 8 at positions corresponding to the matrix of the first electrodes 4 and the second electrodes 5.

Furthermore, an insulating layer 9 is provided between the second electrodes 5 and the third electrodes 8. This insulator layer 9 has openings 5a..., 8a of the second electrodes 5... and third electrodes 8.
Openings 9a for ion flow passage are formed at portions corresponding to the openings 9a. Ion flow passage ports 11 are formed by the openings 5a, 9a, 8a, of the second electrodes 5, the insulator layer 9, and the third electrode 8.

Furthermore, during operation of the ion flow electrostatic recording head 1, the matrix between the first electrodes 4 and the second electrodes 5 is appropriately selected based on the print signal, and the matrix corresponding to the selected matrix portion is selected as appropriate. 1 electrode 4... and 2nd electrode 5
An alternating current voltage is applied between... As a result, positive and negative ions are generated in the vicinity of the openings 5a of the second electrodes 5 corresponding to the selected matrix portions. At this time, a bias voltage is applied between the second electrode 5 and the third electrode 8, and only the ions determined by the polarity are separated from the ions generated in the vicinity of the opening 5a of the second electrode 5. Extracted.

Here, the extracted ions pass through the opening 9a of the insulator layer 9 and the opening 8a of the third electrode 8,
A dielectric drum (not shown) is locally charged. Therefore, by selectively driving the first electrodes 4 and the second electrodes 5, a dot latent image can be formed on the dielectric drum.

By the way, the material forming the insulating layer 9 used here is required to not break down even under the high voltage applied for ion generation. Furthermore, if an air layer gets mixed into the ion generating section 2 during the manufacture of the ion flow electrostatic recording head 1, current leakage will occur between each opening and between each electrode, causing discharge breakdown. The layer 9 needs to have high adhesion with the dielectric layer 6 and the second electrode 5 . As this insulating layer 9, for example, JP-A-60-1
In 96364, a positive type photosensitive resin film is used.

[0011]

[Problems to be Solved by the Invention] During operation of the ion flow electrostatic recording head 1, a high voltage is applied between the first electrode 4 and the second electrode 5 corresponding to a selected matrix portion. The second electrode 5 is connected to the opening on the dielectric layer 6.
Ions are generated in the vicinity of the openings 5a of the second electrodes 5 through the dielectric layer 6 and the air layer on the dielectric layer 6 within the openings 5a of the second electrodes 5.

[0012] Here, if an air layer exists in each laminated portion of the first electrode 4..., dielectric layer 6, second electrode 5..., and insulator layer 9 other than the opening 5a that generates ions, In this case, discharge occurs also in areas other than the opening 5a where ions are generated. Therefore, there is a problem of electrical leakage at locations other than the opening 5a where ions are generated, and the active oxygen generated by this discharge damages materials such as the dielectric layer 6, the second electrode 5..., and the insulator layer 9 over time. There is a risk of oxidation and deterioration. In particular, the dielectric layer 6 and the insulator layer 9 are organic and are easily corroded by oxidation, which impairs the insulation properties of the ion flow electrostatic recording head 1 and significantly shortens the life of the ion generating section 2.

Furthermore, as the material for the dielectric layer 6 and the insulator layer 9, organic materials are usually used because of the flexibility of the processing surface and structure. In particular, since the insulator layer 9 also serves as a spacer to maintain a constant distance between the second electrodes 5 and the third electrode 8, it is usually formed into a film having a constant thickness.

When laminating this on the second electrode 5, a vacuum laminator is used to prevent air bubbles from entering between the insulator layer 9 and the second electrode 5, and to ensure that the second electrode 5 and the dielectric It is also necessary to sufficiently follow the level difference with layer 6 so that no air layer remains.

However, since the ion flow electrostatic recording head 1 has hundreds of steps formed between the second electrodes 5 and the dielectric layer 6, it is impossible to completely fill all of these many steps. It was difficult to avoid leaving an air layer while following the flow.

Furthermore, an adhesive 10 is interposed between the second electrodes 5 and the surface of the dielectric layer 6 to bond them together, and depending on the flatness and wettability of the surface of this adhesive 10, In this case, an air layer remains at the interface between the second electrodes 5 and the insulator layer 9. Even in this residual air layer, the insulator layer 9 is oxidized and eroded over time, which poses a problem of reducing the durability of the ion flow electrostatic recording head 1.

Note that even when a positive photosensitive resin film is used as an insulator as in JP-A-60-196364, an air layer remains at the interface between the second electrode 5 and the insulator layer 9. In this state, the insulator layer 9 is exposed to the risk of oxidative deterioration as described above, and there is a risk that the insulating layer 9 will be oxidized and deteriorated, and that its durability will also be reduced.

The present invention was made in view of the above-mentioned circumstances, and its purpose is to prevent the oxidation of constituent materials such as the dielectric layer, the second electrode, and the insulating layer at locations other than the opening of the ion generating section. An object of the present invention is to provide a method for manufacturing an ion flow electrostatic recording head that can prevent deterioration and oxidative erosion and that can manufacture a highly durable ion flow electrostatic recording head.

[0019]

[Means for Solving the Problems] The present invention provides a plurality of first electrodes extending substantially linearly in the same direction on an insulating substrate and arranged in parallel in parallel, and a plurality of second electrodes extending in a direction different from the first electrode, forming a matrix together with the first electrode, and having an opening formed in a portion corresponding to the matrix; a third electrode disposed on the opposite side of the matrix and having an opening for ion flow passage formed in a portion corresponding to the matrix; and a dielectric layer disposed between the first electrode and the second electrode. , an ion flow electrostatic device comprising: an insulator disposed between the second electrode and the third electrode; an opening for ion flow is formed in a portion of the insulator corresponding to the matrix; In the method for manufacturing a recording head, a first stacked body forming step of sequentially stacking the first electrode, the dielectric layer, and the second electrode on the insulating substrate, and a step of forming the second electrode adjacent to the first electrode on the dielectric layer; A first insulator filling step of filling and curing a liquid first insulator into an interelectrode opening between the electrodes, and a film-like second insulator having a predetermined thickness and a predetermined opening. an insulator layer forming step of laminating the above on the first insulator and the second electrode to form a laminate of insulators, and forming a head main body by laminating the third electrode on the insulator layer. This includes a main body forming step.

[0020]

[Operation] In the above method, when manufacturing an ion flow electrostatic recording head, a first electrode, a dielectric layer, and a second electrode are sequentially laminated on an insulating substrate to form a first laminate, and then a liquid laminate is formed. The first insulator is filled into the interelectrode opening between adjacent second electrodes, and the air layer that is likely to be formed at the joint site between the first insulator and the first laminate is filled with the liquid first insulator. This first insulator is cured in a state in which it is replaced with a body. If a second film-like insulator is laminated on top of this,
The insulating layer can be formed without being affected by the difference in level between the dielectric layer and the second electrode or the interface with the adhesive interposed between the dielectric layer and the second electrode.

[0021]

[Embodiment] The first embodiment of the present invention will be described below in FIG.
This will be explained with reference to A) to (D). In addition, Fig. 1(A) ~
In (D), the same parts as in FIGS. 2 and 3 are given the same reference numerals, and the explanation thereof will be omitted.

When manufacturing the ion flow electrostatic recording head 1, first, as shown in FIG.
The next first laminate forming step is performed in which the electrodes 4..., the dielectric layer 6, and the second electrodes 5... are sequentially laminated. In this case, the insulating substrate 7 is, for example, a flexible printed wiring board (FP) made of a resin material such as polyimide.
C) is used. Then, a copper foil is pasted on this insulating substrate 7, and this copper foil is patterned by etching.
Electrodes 4... are formed.

Next, a dielectric paste using, for example, titanium oxide as a filler and silicone-modified alkyd resin as a binder is applied between the patterns of the first electrodes 4 and on the first electrodes 4. Furthermore, after the applied dielectric paste is dried, it is cured to form a dielectric layer 6 having a thickness of, for example, about 33 μm on the first electrodes 4 .

On this dielectric layer 6, for example, a layer with a thickness of 30 μm is formed.
A second electrode 5, which has been patterned in advance by etching or the like, is bonded to a stainless steel foil having a thickness of approximately 100 m, using an adhesive 10. As the adhesive 10, for example, a silicone adhesive is used, but other adhesives such as acrylic adhesive, epoxy adhesive,
In addition to thermosetting adhesives such as acrylic, urethane, and imide adhesives, thermoplastic adhesives such as heat-resistant hot melt adhesives and vinyl acetate adhesives can also be used.

[0025] After the first laminate forming step is completed, next, in the inter-electrode opening 5b between the adjacent second electrodes 5, 5 where the ion flow passage port 11 on the dielectric layer 6 is not formed, A first insulator filling step is performed in which a liquid first insulator 9A is applied. For example, an ultraviolet curing acrylic resin is used as the first insulator 9A, but an ultraviolet curing epoxy resin, enethiol resin, or polyimide resin may also be used.

Furthermore, since the interval between the interelectrode openings 5b between adjacent second electrodes 5, 5 is a minute gap, a resin having a viscosity of 500 cps or less is preferably used as the first insulator 9A. If you use something with a slightly higher viscosity,
It is better to lower the viscosity by heating.

[0027] Also, the interelectrode opening 5 between the second electrodes 5, 5
In order to infiltrate the liquid first insulator 9A without leaking into the minute gap b, it is preferable to utilize capillary phenomenon. This is a state in which a masking film is placed on the second electrode 5 so as to cover the area with a gap where the liquid first insulator 9A is applied, and the opening 5a of the second electrode 5 is closed. The interelectrode opening 5 between the mask sheet and the dielectric layer 6
Liquid first insulator 9 is applied from the non-masking part to the gap b.
A is injected.

Furthermore, after implanting the first insulator 9A, the first insulator 9A is implanted.
The insulator 9A is exposed to ultraviolet light and cured. After the first insulator 9A is cured, the masking film is removed to ensure filling in the inter-electrode opening 5b between the adjacent second electrodes 5, 5, as shown in FIG. 1(A). can.

At this time, instead of using a masking film, a water-soluble resin such as n-methyl-2-pyrrolidone is filled and hardened in the opening 5a of the second electrode 5, and the dielectric layer 6 is after filling and curing the first insulator 9A into the inter-electrode opening 5b between adjacent second electrodes 5, 5, or during lamination, exposure, and development of the second insulator 9B in the next step. By removing this water-soluble resin with water, a liquid first insulator 9 is formed by a method such as screen printing.
A can be easily filled.

Furthermore, after the first insulator filling step is completed, the next insulator layer forming step is performed. In this step, the cured first insulator 9A, the second electrodes 5, and the dielectric layer 6 in the openings 5a are vacuum laminated with a film-like second insulator 9B. Insulator 9
An insulator layer 9 is formed in which A and a second insulator 9B are integrated as shown in FIG. 1(B). Thereafter, photo-etching processes such as exposure and development are carried out in the same manner as with ordinary photosensitive films, and openings 9a for ion flow passage ports 11 are formed in this insulating layer 9 as shown in FIG. 1(C). let

Further, after the insulating layer forming step is completed, a main body forming step is performed in which the third electrode 8 is laminated on the insulating layer 9 to form the main body of the head 1. In this step, the third electrode 8 is superimposed on the insulator layer 9 so that the opening 9a of the insulator layer 9 corresponds to the opening 8a of the third electrode 8, and the third electrode 8 is insulated from the third electrode 8. The main body of the ion flow electrostatic recording head 1 is manufactured as shown in FIG. 1(D) by bonding the main body layer 9 to the body layer 9 by, for example, pasting with an adhesive or double-sided tape. In addition, the third
The third electrode 8 and the insulating layer 9 may be bonded by pasting the electrode 8 onto the insulating layer 9 side with a single-sided tape.

Therefore, according to the above method, when manufacturing the ion flow electrostatic recording head 1, the first electrodes 4...
, the dielectric layer 6 and the second electrode 5... are sequentially laminated to form the first
After forming a laminate, filling the interelectrode opening 5b between the adjacent second electrodes 5, 5 with a liquid first insulator 9A,
The first insulator 9A is cured with the liquid first insulator 9A replacing the air layer that is likely to be formed at the bonding site between the first insulator 9A and the first laminate. By laminating the film-like second insulator 9B on top of this, the difference in level between the dielectric layer 6 and the second electrode 5 and the difference between the dielectric layer 6 and the second electrode 5 are eliminated. The insulator layer 9 can be formed without being affected by the interface with the adhesive 10 interposed therebetween.

Therefore, in the inter-electrode opening 5b between the adjacent second electrodes 5, 5, there is no air layer in the laminated portion of the dielectric layer 6, the second electrodes 5, . . . and the insulator layer 9, so that this state When a high voltage is applied between each electrode to generate a discharge in the ion generating section 2, the discharge at each ion flow passage port 11 can be made uniform. Therefore, when discharging from the ion generating part 2, discharge occurs in the inter-electrode opening 5b between the adjacent second electrodes 5, 5 as in the conventional case, and it is possible to prevent current leakage. Oxidation deterioration of the second electrodes 5 and the insulator layer 9 can be prevented.

In this case, in particular, the dielectric layer 6 is made of an organic material.
ion flow and the insulator layer 9 are not oxidized or eroded.
The insulation properties of the electrostatic recording head 1 can be easily maintained, and the life of the ion generating section 2 can be extended.

Next, a second embodiment of the present invention will be described. This is done by filling and curing a thermosetting resin such as epoxy resin, imide resin, urethane resin, or acrylic resin as the liquid first insulator 9A in the first embodiment. The ion flow electrostatic recording head 1 was manufactured by laminating layers in the same manner as in the example.

In the ion flow electrostatic recording head 1 manufactured in this way, as in the first embodiment, the adjacent second
Since there is no air layer in the inter-electrode opening 5b between the electrodes 5, 5, discharge can be uniformly obtained at each ion flow passage port 11, and the inter-electrode opening 5b between the adjacent second electrodes 5, 5 can be uniformly discharged. Electrical leakage at 5b and oxidation/erosion of the dielectric layer 6 and insulator layer 9 do not occur, and the durability of the ion flow electrostatic recording head 1 can be improved.

Further, in the third embodiment, the same resin as the second insulator 9B is diluted with a solvent and made into a liquid state as the liquid first insulator 9A in the first embodiment. - Evaporate the solvent, expose and cure, and otherwise stack the layers in the same manner as in the first embodiment to manufacture the ion flow electrostatic recording head 1. In this case, the first insulator 9A is diluted using ethanol, acetone, or the like, preferably at a dilution rate of 2 times or less.

In the ion flow electrostatic recording head 1 manufactured in this way, no air layer exists in the interelectrode opening 5b between the adjacent second electrodes 5, as in the first embodiment. Therefore, uniform discharge can be obtained at each ion flow passage port 11, and leakage at the inter-electrode opening 5b between the adjacent second electrodes 5, 5 and oxidation/erosion of the dielectric layer 6 and the insulator layer 9 can be prevented. Therefore, the durability of the ion flow electrostatic recording head 1 can be improved. It should be noted that the present invention is not limited to the above-mentioned embodiments, and it goes without saying that various modifications can be made without departing from the gist of the present invention.

[0039]

According to the present invention, when manufacturing an ion flow electrostatic recording head, a liquid first insulator is injected into an interelectrode opening between adjacent second electrodes on a dielectric layer, and then filled. , a liquid first insulator is filled into the inter-electrode opening between adjacent second electrodes, and an air layer that is likely to be formed at the joint site between the first insulator and the first laminate is also filled with the liquid first insulator. After being replaced with the first insulator, this first insulator was cured, and a film-like second insulator was laminated thereon, so that the interelectrode opening between adjacent second electrodes was The presence of an air layer can be prevented. Therefore, it is possible to prevent oxidative deterioration and oxidative erosion of the constituent materials of the dielectric layer, second electrode, insulator layer, etc. in locations other than the opening of the ion generating section, and to maintain highly durable ion flow A recording head can be manufactured.

[Brief explanation of drawings]

FIG. 1 illustrates the manufacturing process of an ion flow electrostatic recording head according to a first embodiment of the present invention, and (A) shows a first electrode in an interelectrode opening between second electrodes on a dielectric layer. (B) is a vertical cross-sectional view showing a state in which an insulator is injected and filled; (B) is a vertical cross-sectional view showing a state in which a second insulator is vacuum laminated on the first insulator, the second electrode, and the dielectric layer in the opening; Front view, (C
) is a longitudinal cross-sectional view showing a state in which openings for ion flow are formed in the second insulator by photo-etching, and (
D) is a vertical cross-sectional view showing a state in which the third electrode is laminated on the insulator layer.

FIG. 2 is a cross-sectional perspective view of an ion flow electrostatic recording head.

FIG. 3 is a vertical cross-sectional view showing a schematic configuration of the main parts of the ion flow electrostatic recording head.

[Explanation of symbols]

4...first electrode, 5...second electrode, 5a...opening, 5b...interelectrode opening, 6...dielectric layer, 7...insulating substrate, 8...third electrode, 9...insulator layer, 9A...th 1 insulator, 9B... second insulator, 11... ion flow passage port.

Claims (1)

[Claims] 1. A plurality of first electrodes extending substantially linearly in the same direction and arranged in parallel on an insulating substrate, and a plurality of first electrodes extending in a direction different from the extending direction of the first electrodes. , said first
a plurality of second electrodes forming a matrix together with the electrodes and having openings formed in portions corresponding to the matrix; a third electrode having an opening for ion flow passage formed in a corresponding portion, a dielectric layer disposed between the first electrode and the second electrode, and the second electrode and the third electrode. In the method for manufacturing an ion flow electrostatic recording head having an insulator disposed between the insulating substrate and an opening for ion flow passage formed in a portion of the insulator corresponding to the matrix, a first stacked body forming step of sequentially stacking the first electrode, the dielectric layer, and the second electrode; and a step of forming a liquid in an interelectrode opening between adjacent second electrodes on the dielectric layer. a first insulator filling step in which a first insulator is filled and cured, and a second insulator in the form of a film having a predetermined thickness and a predetermined opening is placed on the first insulator and the second insulator. The third electrode is laminated on the electrode to form a laminate of insulators, and the third electrode is laminated on the insulator layer to form a head body. A method for manufacturing an ion flow electrostatic recording head.