JPH04335593A - Manufacture of flexible double-sided wiring board - Google Patents

Manufacture of flexible double-sided wiring board

Info

Publication number
JPH04335593A
JPH04335593A JP13329491A JP13329491A JPH04335593A JP H04335593 A JPH04335593 A JP H04335593A JP 13329491 A JP13329491 A JP 13329491A JP 13329491 A JP13329491 A JP 13329491A JP H04335593 A JPH04335593 A JP H04335593A
Authority
JP
Japan
Prior art keywords
film
conductive thin
thin film
photoresist
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13329491A
Other languages
Japanese (ja)
Inventor
Kunpei Kobayashi
君平 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Priority to JP13329491A priority Critical patent/JPH04335593A/en
Publication of JPH04335593A publication Critical patent/JPH04335593A/en
Pending legal-status Critical Current

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Landscapes

  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To obtain a manufacturing method which can form a fine circuit pattern by using a liquid photoresist and an organic film. CONSTITUTION:Photoresist films 8 by a negative-circuit pattern are formed on both faces of a conductive thin-film clad film 3 in which conductive thin films have been applied to both faces of a resin film 1 and which is provided with a through hole 4 and double-sided conductive thin films 5; after that, organic films 9 by a positive-circuit pattern including the through hole 4 are formed by an organic aqueous solution bath; and an etching operation is performed by making use of the organic films 9 as etching masks. Thereby, wiring patterns are formed.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、フレキシブルプリン
ト両面配線基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a flexible printed double-sided wiring board.

【0002】0002

【従来の技術】フレキシブルプリント両面配線基板は、
樹脂フィルムの両面に銅等の導電薄膜を被着させた厚み
が100μm程度の導電薄膜張りフィルムの所定位置に
スルーホールを形成した後、その導電薄膜の上面及びス
ルーホールの内周面に銅等よりなる両面導電薄膜を設け
、その後フォトリングラフィーにより導電薄膜と両面導
電薄膜とからなる配線パターンを形成することにより製
造されている。このフォトリングラフィーにおいて、フ
ォトレジストを使用し、回路パターンに相当する両面導
電薄膜及びスルーホールをフォトレジスト膜によって覆
う必要があった。ところが、スルーホールが形成された
導電薄膜張りフィルムの場合、液状のフォトレジストを
使用すると、フォトレジスト液の表面張力や、粘性等の
影響で、導電薄膜張りフィルムの両面のスルーホールの
開口部の周縁、及びスルーホールの内周面をフォトレジ
ストで完全に覆うことができず、この部分がエッチング
されてしまった。
[Prior art] Flexible printed double-sided wiring board is
After forming a through hole in a predetermined position of a conductive thin film coated with a conductive thin film such as copper on both sides of the resin film and having a thickness of about 100 μm, copper etc. are applied to the upper surface of the conductive thin film and the inner peripheral surface of the through hole. It is manufactured by providing a double-sided conductive thin film made of the following, and then forming a wiring pattern made of the conductive thin film and the double-sided conductive thin film by photolithography. In this photolithography, it was necessary to use a photoresist and cover the double-sided conductive thin film and through holes corresponding to the circuit pattern with the photoresist film. However, if a liquid photoresist is used for a conductive thin film with through holes formed, the openings of the through holes on both sides of the conductive thin film will be affected by the surface tension and viscosity of the photoresist liquid. The periphery and the inner peripheral surface of the through hole could not be completely covered with photoresist, and this portion was etched.

【0003】そこで採用されたのがドライフィルムフォ
トレジストを用いたテンティング法と呼ばれる方法であ
る。この方法を図5及び図6を用いて説明する。まず、
樹脂フィルム1の両面に銅等の導電薄膜2が被着された
導電薄膜張りフィルム3を用意する。この導電薄膜張り
フィルム3の所定箇所にスルーホール4を形成し、スル
ーホール4の内周面と、導電薄膜2の上面(導電薄膜張
りフィルムの両面)に電解めっき、あるいは無電解めっ
きにより銅等よりなる両面導電薄膜5を形成する。次に
、厚さ50μm程度のドライフィルムフォトレジスト6
を導電薄膜張りフィルム3の両面にラミネートし、所定
のマスクを介して露光を行なう。つづいて現像を行ない
、回路パターンに対応したドライフィルムフォトレジス
ト6を残す。この状態を図5に示す。続いて、塩化第二
銅等を含んだ酸性エッチング液で両面導電薄膜5及び導
電薄膜2のエッチングを行ない、図6に示すように両面
導通配線を形成する。このような方法を採用すると、ス
ルーホール4内、及びその開口部の周縁の導電薄膜5は
エッチングされずに確実に残る。
[0003] Therefore, a method called a tenting method using a dry film photoresist was adopted. This method will be explained using FIGS. 5 and 6. first,
A conductive thin film 3 having a conductive thin film 2 of copper or the like adhered to both sides of a resin film 1 is prepared. A through hole 4 is formed at a predetermined location on the conductive thin film 3, and the inner peripheral surface of the through hole 4 and the upper surface of the conductive thin film 2 (both sides of the conductive thin film) are plated with copper or the like by electrolytic plating or electroless plating. A double-sided conductive thin film 5 is formed. Next, a dry film photoresist 6 with a thickness of about 50 μm is applied.
is laminated on both sides of the conductive thin film 3, and exposed through a predetermined mask. Subsequently, development is performed to leave a dry film photoresist 6 corresponding to the circuit pattern. This state is shown in FIG. Subsequently, the double-sided conductive thin film 5 and the conductive thin film 2 are etched using an acidic etching solution containing cupric chloride or the like to form double-sided conductive wiring as shown in FIG. If such a method is adopted, the conductive thin film 5 inside the through hole 4 and around the opening thereof will surely remain without being etched.

【0004】0004

【発明が解決しようとする課題】しかしながら、上述し
た従来の製造方法では、ドライフィルムフォトレジスト
の膜厚が50μm程度であるため、パターン形成時の解
像度が同様に50μm程度となってしまう。この結果、
50μm以下の高解像度を得ることができず、微細な回
路パターンを形成することができないと言う問題点があ
った。この発明は上述した事情に鑑みなされたもので、
その目的とするところは微細な回路パターンを形成でき
るフレキシブルプリント両面配線基板の製造方法を提供
することにある。
However, in the conventional manufacturing method described above, since the thickness of the dry film photoresist is about 50 μm, the resolution during pattern formation is also about 50 μm. As a result,
There is a problem in that a high resolution of 50 μm or less cannot be obtained and a fine circuit pattern cannot be formed. This invention was made in view of the above-mentioned circumstances,
The purpose is to provide a method for manufacturing a flexible printed double-sided wiring board that can form fine circuit patterns.

【0005】[0005]

【課題を解決するための手段】この発明においては、上
述した目的を達成するために、フレキシブルプリント両
面配線基板製造方法として、両面を貫通するスルーホー
ルを有し、内面及び該スルーホールに導電薄膜が備えら
れた導電薄膜張りフィルムの該導電薄膜の上面にネガ回
路パターンのフォトレジスト膜を形成する工程と、前記
導電薄膜における前記スルーホールを含む前記フォトレ
ジスト膜が存在していない部分に有機系水溶液浴により
有機皮膜を形成する工程と、前記フォトレジスト膜を剥
離するとともに前記有機皮膜をエッチングマスクとして
前記フォトレジスト膜の下に位置する前記導電薄膜をエ
ッチングする工程と、前記有機皮膜を除去する工程と、
を含むことを要点とする。
[Means for Solving the Problems] In order to achieve the above-mentioned object, the present invention provides a method for manufacturing a flexible printed double-sided wiring board, which includes a through hole penetrating both sides, and a conductive thin film on the inner surface and the through hole. forming a photoresist film with a negative circuit pattern on the upper surface of the conductive thin film of the conductive thin film-covered film provided with the conductive thin film; a step of forming an organic film in an aqueous solution bath; a step of peeling off the photoresist film and etching the conductive thin film located under the photoresist film using the organic film as an etching mask; and removing the organic film. process and
The main point is to include.

【0006】[0006]

【作用】まず、両面に導電薄膜が被着されかつスルーホ
ールが形成された導電薄膜張りフィルムのスルーホール
の内周面、及び導電薄膜の上面にめっき等の方法で両面
導電薄膜を形成し、つづいて、このスルーホール部分を
除いて、導電薄膜張りフィルムの両面に液状のフォトレ
ジストによるネガ回路パターンのフォトレジスト膜を形
成する。このフォトレジスト膜は液状のフォトレジスト
によって形成されているため微細なパターンとすること
ができる。次に、有機系水溶液浴を行なう。すると、前
記ネガ回路パターンのフォトレジスト膜が存在していな
い部分、すなわちスルーホールの内周面と、その開口部
の周縁を含んだ回路パターンに相当する両面導電薄膜の
上面に有機皮膜が形成される。この有機皮膜はフォトレ
ジスト膜が存在していない部分に形成されるので、同様
に微細なパターンとすることができる。続いて、ネガ回
路パターンのフォトレジスト膜を剥離するとともに、有
機皮膜をエッチングマスクとして用い、フォトレジスト
膜の下に位置する両面導電薄膜及び導電薄膜をエッチン
グする。そしてこの有機皮膜を除去すれば、両面導電薄
膜及び導電薄膜がポジ回路パターンで表われ、フレキシ
ブルプリント両面配線基板が完成する。
[Operation] First, a double-sided conductive thin film is formed by plating or other method on the inner circumferential surface of the through-hole of a conductive thin-film-covered film in which a conductive thin film is adhered to both sides and a through-hole is formed, and on the upper surface of the conductive thin film. Subsequently, a negative circuit pattern photoresist film is formed using liquid photoresist on both sides of the conductive thin film, except for the through-hole portion. Since this photoresist film is formed from liquid photoresist, it can be formed into a fine pattern. Next, an organic aqueous solution bath is performed. Then, an organic film is formed on the portion of the negative circuit pattern where the photoresist film is not present, that is, on the upper surface of the double-sided conductive thin film corresponding to the circuit pattern including the inner peripheral surface of the through hole and the periphery of its opening. Ru. Since this organic film is formed in areas where there is no photoresist film, it can be formed into a fine pattern as well. Subsequently, the photoresist film of the negative circuit pattern is peeled off, and the double-sided conductive thin film and the conductive thin film located under the photoresist film are etched using the organic film as an etching mask. When this organic film is removed, the double-sided conductive thin film and the conductive thin film appear in a positive circuit pattern, completing a flexible printed double-sided wiring board.

【0007】[0007]

【実施例】図1〜図4は、この発明の一実施例を説明す
る製造工程を説明するもので、各図中、図5及び図6と
同一部分には同一符号を付し、その説明は省略する。ま
ず、樹脂フィルム1の両面に銅等の導電薄膜2が被着さ
れてなる導電薄膜張りフィルム3にスルーホール4を形
成した後、電解めっき、あるいは無電解めっきにより両
面の導電薄膜2の上面及びスルーホール4の内周面に銅
等よりなる両面導電薄膜5を形成する。続いて導電薄膜
張りフィルム3の両面にスピンナー、あるいはロールコ
ーター等を用いて液状のフォトレジストを例えば5μm
程度の膜厚となるように塗布する。次いで所定パターン
のマスクを導電薄膜張りフィルム3の両面に重ねて露光
を行ない、現像処理し、図1のごとく逆パターン(ネガ
回路パターン)のフォトレジスト膜8を形成する。この
とき、フォトレジストがポジ型である場合にはネガ回路
パターンのマスクを使用し、また、フォトレジストがネ
ガ型である場合には、ポジ回路パターンのマスクを使用
する。
[Embodiment] FIGS. 1 to 4 illustrate the manufacturing process of an embodiment of the present invention. In each figure, the same parts as in FIGS. is omitted. First, a through hole 4 is formed in a conductive thin film 3 formed by coating a conductive thin film 2 of copper or the like on both sides of a resin film 1, and then electrolytic plating or electroless plating is applied to the upper surface of the conductive thin film 2 on both sides. A double-sided conductive thin film 5 made of copper or the like is formed on the inner peripheral surface of the through hole 4. Next, a liquid photoresist is applied to both sides of the conductive thin film 3 to a thickness of, for example, 5 μm using a spinner or a roll coater.
Apply the film to a certain thickness. Next, a mask with a predetermined pattern is placed on both sides of the conductive thin film 3, exposed to light, and developed to form a photoresist film 8 with a reverse pattern (negative circuit pattern) as shown in FIG. At this time, if the photoresist is a positive type, a mask with a negative circuit pattern is used, and if the photoresist is a negative type, a mask with a positive circuit pattern is used.

【0008】次に、アルキルイミダゾール系水溶液等の
有機系水溶液に浸漬する。アルキルイミダゾールは次の
ような構造式を有する。
Next, it is immersed in an organic aqueous solution such as an alkylimidazole aqueous solution. Alkylimidazole has the following structural formula.

【化学構造式】[Chemical structural formula]

アルキルイミダゾールは上記のような構造を持つ有機化
合物であるが、常温では水にほとんど溶けず、ある酸の
雰囲気でイオン化すると水に溶けるようになる。イオン
化したアルキルイミダゾールは銅等と強い化学反応性を
示し、銅等と錯体を形成し、銅等の表面に単分子の膜(
有機皮膜)を形成する。このようにしてできた単分子膜
上に長鎖のアルキル基によるファンデルワールスの結合
力によって、アルキルイミダゾールが次々に集合し、膜
が成長し、イミダゾール同志の水素結合力によってしっ
かりとした膜に成長する。
Alkylimidazole is an organic compound with the above structure, but it is almost insoluble in water at room temperature, but becomes soluble in water when ionized in an acidic atmosphere. Ionized alkylimidazole exhibits strong chemical reactivity with copper, etc., forms a complex with copper, etc., and forms a monomolecular film (
organic film). On the monomolecular film formed in this way, the alkylimidazoles aggregate one after another due to the van der Waals bonding force of the long-chain alkyl groups, and the film grows, and the hydrogen bonding force between the imidazoles forms a firm film. grow up.

【0009】このような性質を有する有機系水溶液内に
、導電薄膜張りフィルム3を浸漬すると、スルーホール
4の内周面、及びその開口部の周縁、さらにネガ回路パ
ターンのフォトレジスト膜8以外の露出した内面導電薄
膜5の上面に、図2に示すように有機皮膜9がポジ回路
パターンとして形成される。次に、このポジ回路パター
ンの有機皮膜9をエッチングマスクとして用い、アルカ
リ性エッチング液でフォトレジスト膜8を剥離するとと
もに、さらにフォトレジスト膜8の下に位置する内面導
電薄膜5及び導電薄膜2をエッチングする。すると、導
電薄膜張りフィルム3の両面には図3に示すような有機
皮膜9によるポジ回路パターンが残る。次に、この有機
皮膜9を塩酸等によって除去すれば、図4に示すように
内面導電薄膜5と導電薄膜2とからなるポジ回路パター
ンの両面導通配線のみが残り、フレキシブルプリント両
面配線基板が完成する。
When the conductive thin film 3 is immersed in an organic aqueous solution having such properties, the inner peripheral surface of the through hole 4 and the periphery of its opening, as well as the area other than the photoresist film 8 of the negative circuit pattern, are removed. On the upper surface of the exposed inner conductive thin film 5, an organic film 9 is formed as a positive circuit pattern, as shown in FIG. Next, using this positive circuit pattern organic film 9 as an etching mask, the photoresist film 8 is peeled off with an alkaline etching solution, and the inner conductive thin film 5 and the conductive thin film 2 located under the photoresist film 8 are further etched. do. Then, a positive circuit pattern formed by the organic film 9 remains on both sides of the conductive thin film 3 as shown in FIG. Next, by removing this organic film 9 with hydrochloric acid or the like, only the double-sided conductive wiring of the positive circuit pattern consisting of the inner conductive thin film 5 and the conductive thin film 2 remains as shown in FIG. 4, and the flexible printed double-sided wiring board is completed. do.

【0010】このように、上述したフレキシブルプリン
ト両面配線基板の製造方法によれば、膜厚の厚いドライ
フィルムフォトレジストを用いずに、液状のフォトレジ
ストを用いた膜厚の薄い微細なネガ回路パターンのフォ
トレジスト膜8を形成した後、有機系水溶液による微細
なポジ回路パターンの有機皮膜9とを形成し、有機皮膜
をエッチングマスクとして利用し、エッチングを行なっ
ているため、極めて微細な回路パターンを形成すること
ができる。
As described above, according to the method for manufacturing a flexible printed double-sided wiring board described above, a fine negative circuit pattern with a thin film thickness is produced using a liquid photoresist without using a thick dry film photoresist. After forming the photoresist film 8, an organic film 9 with a fine positive circuit pattern is formed using an organic aqueous solution, and etching is performed using the organic film as an etching mask. can be formed.

【0011】[0011]

【発明の効果】以上説明したように、この発明によれば
、フレキシブルプリント両面配線基板製造方法として、
両面を貫通するスルーホールを有し、内面及び該スルー
ホールに導電薄膜が備えられた導電薄膜張りフィルムの
該導電薄膜の上面にネガ回路パターンのフォトレジスト
膜を形成する工程と、前記導電薄膜における前記スルー
ホールを含む前記フォトレジスト膜が存在していない部
分に有機系水溶液浴により有機皮膜を形成する工程と、
前記フォトレジスト膜を剥離するとともに前記有機皮膜
をエッチングマスクとして前記フォトレジスト膜の下に
位置する前記導電薄膜をエッチングする工程と、前記有
機皮膜を除去する工程とを含む製造方法を採用している
ため、液状のフォトレジストを使用することができ、フ
ォトレジスト膜を薄く形成でき、極めて微細な回路パタ
ーンを形成することができる。
[Effects of the Invention] As explained above, according to the present invention, as a flexible printed double-sided wiring board manufacturing method,
forming a photoresist film with a negative circuit pattern on the upper surface of the conductive thin film of a conductive thin film-covered film having through holes penetrating both sides and provided with a conductive thin film on the inner surface and the through holes; forming an organic film in a portion where the photoresist film is not present, including the through hole, using an organic aqueous solution bath;
A manufacturing method is adopted that includes the steps of peeling off the photoresist film and etching the conductive thin film located under the photoresist film using the organic film as an etching mask, and removing the organic film. Therefore, a liquid photoresist can be used, a thin photoresist film can be formed, and an extremely fine circuit pattern can be formed.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】〜[Figure 1] ~

【図4】この発明の一実施例におけるフレキシブルプリ
ント両面配線基板の製造方法を説明する製造工程図。
FIG. 4 is a manufacturing process diagram illustrating a method for manufacturing a flexible printed double-sided wiring board according to an embodiment of the present invention.

【図5】、[Figure 5]

【図6】従来のフレキシブルプリント両面配線基板の製
造方法を説明する製造工程図。
FIG. 6 is a manufacturing process diagram illustrating a conventional method for manufacturing a flexible printed double-sided wiring board.

【符号の説明】[Explanation of symbols]

1  樹脂フィルム 2  導電薄膜 3  導電薄膜張りフィルム 4  スルーホール 5  両面導電薄膜 8  フォトレジスト膜 9  有機皮膜 1 Resin film 2 Conductive thin film 3 Conductive thin film 4 Through hole 5 Double-sided conductive thin film 8 Photoresist film 9 Organic film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  両面を貫通するスルーホールを有し、
内面及び該スルーホールに導電薄膜が備えられた導電薄
膜張りフィルムの該導電薄膜の上面にネガ回路パターン
のフォトレジスト膜を形成する工程と、前記導電薄膜に
おける前記スルーホールを含む前記フォトレジスト膜が
存在していない部分に有機系水溶液浴により有機皮膜を
形成する工程と、前記フォトレジスト膜を剥離するとと
もに前記有機皮膜をエッチングマスクとして前記フォト
レジスト膜の下に位置する前記導電薄膜をエッチングす
る工程と、前記有機皮膜を除去する工程と、を含むこと
を特徴とするフレキシブルプリント両面配線基板の製造
方法。
[Claim 1] Having a through hole penetrating both sides,
forming a photoresist film with a negative circuit pattern on the upper surface of the conductive thin film of a conductive thin film-covered film having a conductive thin film on the inner surface and the through holes; A step of forming an organic film in a non-existing part using an organic aqueous solution bath, and a step of peeling off the photoresist film and etching the conductive thin film located under the photoresist film using the organic film as an etching mask. A method for manufacturing a flexible printed double-sided wiring board, comprising the steps of: and removing the organic film.
JP13329491A 1991-05-10 1991-05-10 Manufacture of flexible double-sided wiring board Pending JPH04335593A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13329491A JPH04335593A (en) 1991-05-10 1991-05-10 Manufacture of flexible double-sided wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13329491A JPH04335593A (en) 1991-05-10 1991-05-10 Manufacture of flexible double-sided wiring board

Publications (1)

Publication Number Publication Date
JPH04335593A true JPH04335593A (en) 1992-11-24

Family

ID=15101295

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13329491A Pending JPH04335593A (en) 1991-05-10 1991-05-10 Manufacture of flexible double-sided wiring board

Country Status (1)

Country Link
JP (1) JPH04335593A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014027128A (en) * 2012-07-27 2014-02-06 Seiko Epson Corp Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014027128A (en) * 2012-07-27 2014-02-06 Seiko Epson Corp Pattern formation method

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