JPH04336540A - Manufacture of photosensitive body for electronic photograph - Google Patents
Manufacture of photosensitive body for electronic photographInfo
- Publication number
- JPH04336540A JPH04336540A JP10935291A JP10935291A JPH04336540A JP H04336540 A JPH04336540 A JP H04336540A JP 10935291 A JP10935291 A JP 10935291A JP 10935291 A JP10935291 A JP 10935291A JP H04336540 A JPH04336540 A JP H04336540A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- film thickness
- charge transport
- layer
- transport layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は電子写真感光体の製造方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrophotographic photoreceptor.
【0002】0002
【従来の技術】近年、電子写真感光体において、有機系
の光導電性材料が進んで開発され、従来より用いられて
きた無機系の光導電性材料よりも多く使用されるように
なった。有機系材料を用いた感光体は感度、耐久性及び
環境に対する安定性等に若干の問題は有るが、毒性、コ
スト、材料設計の自由度等の点において無機材料に比べ
多くの利点がある。BACKGROUND OF THE INVENTION In recent years, organic photoconductive materials have been developed in electrophotographic photoreceptors and are now being used more frequently than inorganic photoconductive materials that have been used in the past. Although photoreceptors using organic materials have some problems in sensitivity, durability, stability against the environment, etc., they have many advantages over inorganic materials in terms of toxicity, cost, freedom of material design, etc.
【0003】一般に有機電子写真感光体は、単層型と機
能分離(積層)型に分類される。積層型の層構成は2層
又は3層から成り、2層構成の場合は導電性基体の上に
電荷発生層、その上に電荷輸送層という構成になってお
り、3層の場合は導電性基体の上に下引き層、その上に
順次電荷発生層及び電荷輸送層という構成になっている
。これらの感光層は各層を構成するための有機系光導電
性材料を結着剤樹脂と共に有機溶剤に溶解又は分散させ
て感光体塗液として調整し、この感光体塗液を導電性基
体の上に順次塗布、乾燥させることにより製造される。
塗布方法としては、スプレー法、バーコート法、ロール
コート法、ブレード法、リング法、浸漬法等が挙げられ
る。特に浸漬塗布方法は、上記の感光体塗液を満たした
塗布槽に導電性基体を浸漬した後に、一定速度又は逐次
変化する速度で引き上げることにより、感光層を形成す
る方法で、比較的簡単で、生産性及びコストの点でも優
れているため、感光体を製造する場合に多く利用されて
いる。Organic electrophotographic photoreceptors are generally classified into single-layer type and functionally separated (laminated) type. The laminated type layer structure consists of two or three layers. In the case of a two-layer structure, there is a charge generation layer on top of a conductive substrate, and on top of that a charge transport layer, and in the case of three layers, there is a charge generation layer on top of a conductive substrate. The structure includes an undercoat layer on the substrate, and a charge generation layer and a charge transport layer on the undercoat layer in this order. These photosensitive layers are prepared by dissolving or dispersing organic photoconductive materials for forming each layer in an organic solvent together with a binder resin, and then preparing a photoconductor coating liquid by applying this photoconductor coating liquid onto a conductive substrate. It is manufactured by sequentially coating and drying. Examples of the coating method include a spray method, a bar coating method, a roll coating method, a blade method, a ring method, and a dipping method. In particular, the dip coating method is a relatively simple method in which a conductive substrate is immersed in a coating tank filled with the above-mentioned photoreceptor coating liquid and then pulled up at a constant speed or at a rate that changes sequentially to form a photosensitive layer. Since it is excellent in terms of productivity and cost, it is often used in manufacturing photoreceptors.
【0004】しかし、この浸漬塗布方法は塗布槽より基
体を引き上げることにより塗膜を形成するため、垂直方
向にたれが生じやすい。その結果、基体上に形成される
感光層に塗布むらやすじが発生したり、上下方向に膜厚
むらが大きくなり画像に濃淡むら等の悪影響を及ぼすと
いう欠点があった。又、塗布液には塗膜形成のため比較
的蒸発しやすい有機溶剤を使用しているため、塗布槽内
の塗液から溶剤が蒸発しやすく、その結果塗液の粘度や
濃度が変化するため、基体への塗布量を一定化し均一な
塗膜を得ることが難しい。即ち感光層の膜厚が徐々に変
化するので、一定な特性を有する感光体を提供すること
が困難となる。However, since this dip coating method forms a coating film by lifting the substrate from a coating tank, sag tends to occur in the vertical direction. As a result, there are disadvantages in that coating unevenness and streaks occur in the photosensitive layer formed on the substrate, and film thickness unevenness increases in the vertical direction, which adversely affects images such as uneven density. In addition, since the coating liquid uses an organic solvent that evaporates relatively easily to form a coating film, the solvent easily evaporates from the coating liquid in the coating tank, resulting in changes in the viscosity and concentration of the coating liquid. It is difficult to maintain a constant coating amount on the substrate and obtain a uniform coating film. That is, since the thickness of the photosensitive layer gradually changes, it becomes difficult to provide a photoreceptor with constant characteristics.
【0005】このため、膜厚の変動を管理してその変動
が許容範囲を越えた場合には、塗布量の調整を行い、特
性の安定化が図られている。[0005] For this reason, variations in film thickness are managed, and if the variations exceed a permissible range, the amount of coating is adjusted to stabilize the characteristics.
【0006】従来、この膜厚の管理(測定)するために
、段差計、表面粗さ計、うず電流式膜厚計などの接触式
、あるいは、塗布重量を測定する方法、あるいは放射線
を用いるガンマ線測定法、あるいは、光顕、電顕などで
試料断面を観察する写真法等がある。Conventionally, in order to manage (measure) this film thickness, contact methods such as a level difference meter, surface roughness meter, and eddy current type film thickness meter, a method of measuring coating weight, or a gamma ray method using radiation, have been used. There are measurement methods and photographic methods in which the cross section of the sample is observed using a light microscope, an electron microscope, etc.
【0007】又、特開昭 59−7957には、電荷発
生層の膜厚を色差計により測定し管理する方法が挙げら
れている。[0007] Furthermore, JP-A-59-7957 discloses a method of measuring and controlling the thickness of the charge generation layer using a color difference meter.
【0008】[0008]
【発明が解決しようとする課題】しかし、接触式及び写
真法は膜厚の測定に試料の加工が必要で時間がかかり簡
便でなく、又感光体自身に傷をつけてしまうため、測定
後製品として使用できなくなる欠点がある。塗布重量測
定法は、感光体膜が非常に薄いため(電荷輸送層では、
10μm 〜 100μm;下引き層では、 0.1〜
5μm 程度)その重量の極微量の重量変化をとらえる
には測定精度に問題がある。ガンマ線測定方法は、放射
性同位元素の使用許可が必要で、特別な資格や施設、安
全性に問題がある。[Problems to be Solved by the Invention] However, the contact method and the photographic method require processing of the sample to measure the film thickness, which takes time and is not easy to use.Also, the photoreceptor itself is damaged, so it is difficult to produce a product after measurement. There is a drawback that it cannot be used as The coating weight measurement method is difficult to use because the photoreceptor film is very thin (in the charge transport layer,
10 μm to 100 μm; 0.1 to 100 μm for undercoat layer
(about 5 μm) There is a problem with measurement accuracy in capturing such minute changes in weight. Gamma ray measurement methods require permission to use radioactive isotopes, and there are issues with special qualifications, facilities, and safety.
【0009】色差計による方法は電荷発生層等の比較的
色の濃い膜の膜厚測定には大変有用であるが、電荷輸送
層や下引き層等の無色透明又は比較的うすい色の膜厚の
測定には、その変化を測定するには精度に問題があり、
不充分である。The method using a color difference meter is very useful for measuring the film thickness of relatively dark-colored films such as a charge generation layer, but it is very useful for measuring the film thickness of a colorless transparent or relatively light-colored film such as a charge transport layer or an undercoat layer. There are problems with accuracy in measuring changes in
It is insufficient.
【0010】0010
【課題を解決するための手段】上述の欠点を解決する為
に、本発明者等の鋭意研究の結果、有機電子写真感光体
において下引き層又は電荷輸送層の透明膜の塗布に際し
、その膜厚の変動を抑えて均一化を図るために、光干渉
法にて逐次膜厚を測定し、測定結果をフィードバックし
て塗布速度を適正な速度に自動制御することによって、
無色透明又は非常に薄い色の下引き層及び電荷輸送層の
塗布量を調整することが可能で、適正な膜厚の感光体を
製造でき且つ、塗膜ムラ(スジ、ピンホール等)をなく
すことが出来ることを見出し、この知見に基づいて本発
明を成すに至った。[Means for Solving the Problems] In order to solve the above-mentioned drawbacks, as a result of intensive research by the present inventors, when coating a transparent film for an undercoat layer or a charge transport layer in an organic electrophotographic photoreceptor, the film In order to suppress variations in thickness and achieve uniformity, we measure the film thickness sequentially using optical interferometry and feed back the measurement results to automatically control the coating speed to the appropriate speed.
It is possible to adjust the coating amount of the colorless transparent or very light colored subbing layer and charge transport layer, allowing the production of photoreceptors with appropriate film thickness and eliminating coating film unevenness (streaks, pinholes, etc.) The present invention has been completed based on this finding.
【0011】[0011]
【作用】本発明で用いる光干渉法により膜厚測定の原理
は以下の通りである。[Operation] The principle of film thickness measurement using the optical interference method used in the present invention is as follows.
【0012】膜厚d、屈折率Nの透明膜の試料3に光が
入射1した場合、試料膜内で光が多重反射を起す(図1
(A))。反射光2として測定される光は試料膜内を2
回、3回と往復して反射してきた光の合成されたもので
ある。更に、光は波であるため、合成には各光線の位相
を考慮した和を取らなければならない(干渉効果)。す
なわち、隣り合う位相差が2πの整数倍であれば強め合
い、πの奇数倍であれば、打ち消し合い、光の干渉が生
じる。When light 1 is incident on a transparent film sample 3 with a film thickness d and a refractive index N, the light causes multiple reflections within the sample film (Fig. 1
(A)). The light measured as reflected light 2 passes through the sample film 2.
It is a composite of light that has been reflected back and forth three times. Furthermore, since light is a wave, it is necessary to take the phase of each ray into consideration when combining them (interference effect). That is, if the adjacent phase differences are an integer multiple of 2π, they will strengthen each other, and if they are an odd multiple of π, they will cancel each other out, causing optical interference.
【0013】図1(B)のように透明薄膜に光が入射し
た場合の反射率は以下の式(1)で示される。The reflectance when light is incident on a transparent thin film as shown in FIG. 1(B) is expressed by the following equation (1).
【0014】
反射率R=[R1 2 +R2 2 −2R1 R
2 cos(X)]/ [1+R1 2 +R2 2
−2R1 R2 cos(X)]
(1)[X=4πN1 d/λ ただし、N2 >
N1 ,λ:波長,d:厚さ,R1 :表面での反射率
,R2 :基板での反射率,N1 :薄膜の屈折率,N
2 :基板の屈折率,R1 =(1−N1 )/(1+
N1 ),R2 =(N1 −N2 )/(N1 +N
2 )]
光の干渉により、強め合う(又は弱め合う)波長で反射
率は極大値(又は極小値)を取るため、反射率Rを波長
λで微分して、(d/dλ)R(λ)=0となるλを求
めると、
(1/λn )−(1/λn+1 )=1/2N1
d (2)(n:n番目の極大値
(極小値)をもつ波長)となる。
この式(2)により、強め合う(又は弱め合う)波長及
び薄膜の屈折率がわかれば、透明薄膜の厚みを計算する
ことができる。薄膜の反射率、波長は分光光度計で測定
することができる。薄膜の屈折率は未知のものにおいて
は、膜厚が既知のサンプルを用いて実際に光干渉法によ
り式(2)から求めることができる。Reflectance R=[R1 2 +R2 2 −2R1 R
2 cos(X)]/[1+R1 2 +R2 2
-2R1 R2 cos(X)]
(1) [X=4πN1 d/λ where N2 >
N1, λ: wavelength, d: thickness, R1: reflectance on the surface, R2: reflectance on the substrate, N1: refractive index of the thin film, N
2: Refractive index of substrate, R1 = (1-N1)/(1+
N1 ), R2 = (N1 - N2 )/(N1 + N
2)] Due to light interference, the reflectance takes a maximum value (or minimum value) at wavelengths that are constructive (or destructive). Therefore, by differentiating the reflectance R with respect to the wavelength λ, we obtain (d/dλ)R(λ )=0, (1/λn)−(1/λn+1)=1/2N1
d (2) (n: wavelength having the n-th maximum value (minimum value)). Using this equation (2), if the constructive (or destructive) wavelength and the refractive index of the thin film are known, the thickness of the transparent thin film can be calculated. The reflectance and wavelength of the thin film can be measured with a spectrophotometer. If the refractive index of a thin film is unknown, it can be actually determined from equation (2) by optical interferometry using a sample with a known film thickness.
【0015】一般に浸漬塗布の場合、塗布膜厚(湿潤膜
厚)と塗液物性値と塗布速度の関係は式(3)で表され
る。Generally, in the case of dip coating, the relationship between the coating film thickness (wet film thickness), the physical properties of the coating liquid, and the coating speed is expressed by equation (3).
【0016】
h=K(ηv/ρgsinα)n
(3)[h:塗布膜厚(湿潤膜厚),v:塗布速度,
ρ:塗液比重,η:塗液粘度,α:接触角,K:定数(
0.9〜1.9),n=定数(0.5〜0.7)]
式(3)から塗布膜厚は、塗布速度及び塗液の比重・粘
度で制御できることがわかる。塗液の比重・粘度の調整
は塗液を溶剤で希釈又は蒸発させて行うが、希釈及び蒸
発による調整はたいへん難しく、又主に希釈は塗布槽に
付随する撹拌槽で行なわれるため生産時に即に膜厚の変
動に対応がとれない。塗布速度による調整は昇降機のモ
ーターの回転数をかえて昇降速度(塗布速度)を変更す
るだけでよい。例えば膜厚を厚くするためには塗布速度
を速くし、逆に薄くするためには塗布速度を遅くすれば
よい。このため生産設備は簡単でかつ、即座に膜厚の変
動に対して調整が可能である。h=K(ηv/ρgsinα)n
(3) [h: coating film thickness (wet film thickness), v: coating speed,
ρ: specific gravity of coating liquid, η: viscosity of coating liquid, α: contact angle, K: constant (
0.9 to 1.9), n=constant (0.5 to 0.7)] From equation (3), it can be seen that the coating film thickness can be controlled by the coating speed and the specific gravity and viscosity of the coating liquid. The specific gravity and viscosity of the coating liquid are adjusted by diluting the coating liquid with a solvent or by evaporating it, but adjustment by dilution and evaporation is very difficult, and dilution is mainly done in a stirring tank attached to the coating tank, so it is difficult to adjust the specific gravity and viscosity of the coating liquid immediately during production. It is difficult to respond to changes in film thickness. Adjustment by coating speed can be made by simply changing the rotation speed of the elevator motor to change the lifting speed (coating speed). For example, to increase the film thickness, the coating speed may be increased, and to make the film thinner, the coating speed may be decreased. Therefore, the production equipment is simple and can be immediately adjusted to changes in film thickness.
【0017】以下、本発明について詳しく説明すると、
本発明で用いる電子写真感光体の導電性基体としては、
アルミニウム、銅、ニッケル、ステンレス、真ちゅう等
の金属の円筒状基体又は薄膜シート、またはアルミニウ
ム錫金、酸化インジウム等をポリエステルフィルムある
いは紙、金属フィルムの円筒状基体などに蒸着したもの
が挙げられる。次いで、感光体層の接着性改良、塗布性
改良、基体上の欠陥の被覆及び基体から電荷発生層への
電荷注入性改良などのために下引き層が設けられること
が有る。下引き層の材料としては、ポリアミド、共重合
ナイロン、カゼイン、ポリビニルアルコール、セルロー
ス、ゼラチン等の樹脂が知られている。これらを各種有
機溶剤に溶解し、膜厚が 0.1〜5μ程度になるよう
に導電性基体上に塗布される。[0017] The present invention will be explained in detail below.
The conductive substrate of the electrophotographic photoreceptor used in the present invention includes:
Examples include cylindrical substrates or thin film sheets of metals such as aluminum, copper, nickel, stainless steel, and brass, and cylindrical substrates of polyester films, paper, and metal films on which aluminum, tin, gold, and indium oxide are deposited. Next, an undercoat layer may be provided to improve the adhesion of the photoreceptor layer, to improve the coating properties, to cover defects on the substrate, to improve charge injection from the substrate to the charge generation layer, and the like. Known materials for the undercoat layer include resins such as polyamide, copolymerized nylon, casein, polyvinyl alcohol, cellulose, and gelatin. These are dissolved in various organic solvents and coated onto a conductive substrate to a film thickness of approximately 0.1 to 5 μm.
【0018】本発明の電荷発生層は、光照射により電荷
を発生する電荷発生材料を主成分とし、必要に応じて公
知の結合剤、可塑剤、増感剤を含有する。The charge generating layer of the present invention mainly contains a charge generating material that generates charges upon irradiation with light, and contains a known binder, plasticizer, and sensitizer as necessary.
【0019】電荷発生材料としては、ペリレンン系顔料
、多環キノン系顔料、フタロシアニン顔料、金属フタロ
シアニン系顔料、スクアリリウム色素、アズレニニム色
素、チアピリリウム色素、及びカルバソール骨格、スチ
リルスチルベン骨格、トリフェニルアミン骨格、ジベン
ゾチオフェン骨格、オキサジアゾール骨格、フルオレノ
ン骨格、ビススチルベン骨格、ジスチリルオキサジアゾ
ール骨格又はジスチリルカルバゾール骨格を有するアゾ
顔料などが挙げられる。Examples of charge-generating materials include perylene pigments, polycyclic quinone pigments, phthalocyanine pigments, metal phthalocyanine pigments, squarylium dyes, azuleninium dyes, thiapyrylium dyes, and carbazole skeletons, styrylstilbene skeletons, triphenylamine skeletons, and dibenzoyl stilbene skeletons. Examples include azo pigments having a thiophene skeleton, an oxadiazole skeleton, a fluorenone skeleton, a bisstilbene skeleton, a distyryl oxadiazole skeleton, or a distyryl carbazole skeleton.
【0020】本発明の電荷輸送層は、電荷発生材料が発
生した電荷を受け入れこれを輸送する能力を有する電荷
輸送材料、シリコーン系レベリング剤及び結着剤を必須
成分とし、必要に応じて公知の可塑剤、増感剤などを含
有する。The charge transport layer of the present invention contains as essential components a charge transport material having the ability to accept and transport charges generated by the charge generation material, a silicone leveling agent, and a binder, and if necessary, known known materials may be used. Contains plasticizers, sensitizers, etc.
【0021】電荷輸送材料としては、ポリ−N−ビニル
カルバゾール及びその誘導体、ポリ−γ−カルバゾリル
エチルグルタメート及びその誘導体、ピレン−ホルムア
ルデヒド縮合物及びその誘導体、ポリビニルピレン、ポ
リビニルフェナントレン、オキサゾール誘導体、オキソ
ジアゾール誘導体、イミダゾール誘導体、9−(p−ジ
エチルアミノスチリル)アントラセン、 1,1−ビス
(4−ジベンジルアミノフェニル)プロパン、スチリル
アントラセン、スチリルピラゾリン、フェニルヒドラゾ
ン類、ヒドラゾン誘導体等の電子供与性物質、或いはフ
ルオレノン誘導体、ジベンゾチオフェン誘導体、インデ
ノチオフェン誘導体、フェナンスレンキノン誘導体、イ
ンデノピリジン誘導体、チオキサントン誘導体、ベンゾ
[c]シンノリン誘導体、フェナジンオキサイド誘導体
、テトラシアノエチレン、テトラシアノキノジメタン、
プロマニル、クロラニル、ベンゾキノン等の電子受容性
物質などが挙げられる。As the charge transport material, poly-N-vinylcarbazole and its derivatives, poly-γ-carbazolylethyl glutamate and its derivatives, pyrene-formaldehyde condensate and its derivatives, polyvinylpyrene, polyvinylphenanthrene, oxazole derivatives, Electron donors such as oxodiazole derivatives, imidazole derivatives, 9-(p-diethylaminostyryl)anthracene, 1,1-bis(4-dibenzylaminophenyl)propane, styrylanthracene, styrylpyrazoline, phenylhydrazones, hydrazone derivatives, etc. or fluorenone derivatives, dibenzothiophene derivatives, indenothiophene derivatives, phenanthrenequinone derivatives, indenopyridine derivatives, thioxanthone derivatives, benzo[c]cinnoline derivatives, phenazine oxide derivatives, tetracyanoethylene, tetracyanoquinodimethane ,
Examples include electron-accepting substances such as promanil, chloranil, and benzoquinone.
【0022】電荷輸送層を構成する結着剤としては、電
荷輸送材料と相容性を有するものであれば良く、例えば
ポリカーボネート、ポリビニルブチラール、ポリアミド
、ポリエステル、ポリケトン、エポキシ樹脂、ポリウレ
タン、ポリビニルケトン、ポリスチレン、ポリアクリル
アミド、フェノール樹脂、フェノキシ樹脂等が挙げられ
る。The binder constituting the charge transport layer may be any binder as long as it is compatible with the charge transport material, such as polycarbonate, polyvinyl butyral, polyamide, polyester, polyketone, epoxy resin, polyurethane, polyvinyl ketone, Examples include polystyrene, polyacrylamide, phenol resin, phenoxy resin, and the like.
【0023】本発明の電子写真感光体の製造方法は公知
の浸漬塗工方法を適用し得る。その一例を以下に述べる
。A known dip coating method can be applied to the method of manufacturing the electrophotographic photoreceptor of the present invention. An example is described below.
【0024】例えば、アゾ系顔料などの電荷発生材料が
、必要に応じて、結合剤、可塑剤、増感剤と共に適当な
溶剤、例えば、シクロヘキサノン、ベンゼン、クロロホ
ルム、ジクロロエタン、エチルエーテル、アセトン、エ
タノール、クロロベンゼン、メチルエチルケトン等に分
散した塗工液に導電性基体を公知の方法で浸漬し、引き
上げ、乾燥して導電性基体上に電荷発生層を形成する。For example, a charge generating material such as an azo pigment is mixed with a binder, a plasticizer, a sensitizer, and a suitable solvent such as cyclohexanone, benzene, chloroform, dichloroethane, ethyl ether, acetone, ethanol, if necessary. A conductive substrate is immersed in a coating liquid dispersed in , chlorobenzene, methyl ethyl ketone, etc. by a known method, pulled up, and dried to form a charge generation layer on the conductive substrate.
【0025】次いで、例えば、ビドラゾン系化合物など
の電荷輸送材料、シリコーン系レベリング剤及び結着剤
が、必要に応じて可塑剤、増感剤と共に適当な溶剤、例
えば、ジクロロエタン、ベンゼン、クロロホルム、シク
ロヘキサノン、エチルエーテル、アセトン、エタノール
、クロロベンゼン、メチルエチルケトン等に溶解した塗
工液に電荷発生層が塗布された導電性基体を公知の方法
で浸漬し、引き上げ、乾燥して電荷輸送層を形成する。Next, a charge transport material such as a vidrazone compound, a silicone leveling agent and a binder are mixed with a suitable solvent such as dichloroethane, benzene, chloroform, cyclohexanone together with a plasticizer and a sensitizer as necessary. A conductive substrate coated with a charge generation layer is immersed in a coating solution dissolved in ethyl ether, acetone, ethanol, chlorobenzene, methyl ethyl ketone, etc. by a known method, pulled up, and dried to form a charge transport layer.
【0026】上述の電荷輸送層の形成において、塗布量
の調節を図2を用いて説明する。昇降機14に取り付け
られたアーム17よりに懸吊されている導電性基体13
を昇降装置15の駆動により下降させ、塗布槽11の中
の塗布液12に浸漬する。次いで昇降装置15の駆動に
より塗布液12から導電性基体13を引き上げると同時
に塗布された電荷輸送層に特定な波長の光を照射し分光
光度計受光部21でその反射光を受光する。受光された
反射光のデータは分光光度計演算部22で解析され、直
ちに演算処理装置(パソコン)20に送付される。この
データに基づきパソコンによって昇降装置の回転調整部
16を制御し、昇降装置(モーター)15の回転を調整
して適切な引き上げ速度(塗布速度)とすることによっ
て塗布膜の膜厚を調節する。The adjustment of the coating amount in forming the charge transport layer described above will be explained with reference to FIG. Conductive substrate 13 suspended from arm 17 attached to elevator 14
is lowered by driving the lifting device 15 and immersed in the coating liquid 12 in the coating tank 11. Next, the conductive substrate 13 is pulled up from the coating liquid 12 by driving the lifting device 15, and at the same time, the coated charge transport layer is irradiated with light of a specific wavelength, and the spectrophotometer light receiving section 21 receives the reflected light. The data of the received reflected light is analyzed by the spectrophotometer calculation section 22 and immediately sent to the calculation processing device (personal computer) 20. Based on this data, the rotation adjustment unit 16 of the lifting device is controlled by a personal computer, and the rotation of the lifting device (motor) 15 is adjusted to an appropriate pulling speed (coating speed), thereby adjusting the thickness of the coating film.
【0027】使用される光源としては可視光、紫外・赤
外光等があるが、試料の膜厚及び吸収に応じて適当な光
源を用いる。The light source used includes visible light, ultraviolet light, infrared light, etc., and an appropriate light source is used depending on the film thickness and absorption of the sample.
【0028】上述のように感光体の膜厚を光干渉法によ
り測定し、そのデータに基づいて感光体の塗布速度を自
動調節する本発明の電子写真感光体を製造する方法は、
感光体表面を傷付けることなく膜厚を測定でき且つ膜厚
の測定が簡便であるので、直ちに塗布量の調節が可能で
常に適正な膜厚の感光体を提供でき、更に感光体全面に
わたって膜厚の測定が出来るので、塗膜むら(スジ、ピ
ンポールなど)の検出が容易である。更に、色差計では
測定不可能な無色透明又は非常にうすい色の膜の膜厚を
測定することが出来るので、適正な膜厚の下引き層又は
電荷輸送層の形成が容易である。As described above, the method for manufacturing an electrophotographic photoreceptor of the present invention includes measuring the film thickness of the photoreceptor by optical interference method, and automatically adjusting the coating speed of the photoreceptor based on the data.
Since the film thickness can be measured without damaging the surface of the photoreceptor and it is easy to measure the film thickness, it is possible to immediately adjust the coating amount and always provide a photoreceptor with an appropriate film thickness. This makes it easy to detect paint film irregularities (streaks, pinholes, etc.). Furthermore, since it is possible to measure the thickness of a colorless transparent or very pale-colored film that cannot be measured with a color difference meter, it is easy to form an undercoat layer or a charge transport layer with an appropriate thickness.
【0029】[0029]
【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれら実施例に限定されるものではない
。[Examples] The present invention will be specifically explained below with reference to Examples, but the present invention is not limited to these Examples.
【0030】実施例1
共重合ナイロン樹脂(CM4000:東レ(株)製)6
重量部をメタノール94重量部に溶解し、下引き層用塗
液を作成した。Example 1 Copolymerized nylon resin (CM4000: manufactured by Toray Industries, Inc.) 6
Parts by weight were dissolved in 94 parts by weight of methanol to prepare a coating liquid for an undercoat layer.
【0031】この下引き層用塗液を 100本のアルミ
ニウムの円筒状支持体(導電性基体)表面に順次浸漬塗
布にて塗布し、その膜厚を図2の塗布装置を用いて逐次
測定し下引き層の膜厚が 1.5μm ± 0.3μm
を越える場合にはその膜厚に応じて引き上げ速度(塗
布速度)をパソコンにて自動制御した。塗布速度は1本
目が10mm/秒で100本目は 7.1mm/秒であ
った。塗布された塗膜を 110℃で10分間乾燥し下
引き層とした。連続 100本の下引き層の塗布を行な
った結果、下引き層の膜厚は1本目と 100本目でほ
とんど差異が認められなかった。結果を表1に示す。[0031] This undercoat layer coating liquid was applied sequentially to the surface of 100 aluminum cylindrical supports (conductive substrates) by dip coating, and the film thickness was successively measured using the coating apparatus shown in Fig. 2. The thickness of the undercoat layer is 1.5μm ± 0.3μm
When the film thickness was exceeded, the pulling speed (coating speed) was automatically controlled by a computer according to the film thickness. The coating speed was 10 mm/sec for the first coat and 7.1 mm/sec for the 100th coat. The applied coating film was dried at 110°C for 10 minutes to form an undercoat layer. As a result of continuously applying 100 undercoat layers, there was almost no difference in the thickness of the undercoat layer between the 1st and 100th layers. The results are shown in Table 1.
【0032】膜厚測定には、分光光度計(MCPD−1
100、大塚電子(株)製)を使用した。あらかじめ膜
厚が既知のサンプルにて、屈折率を求めておき、下引き
層を浸漬塗布する毎にその塗膜の反射スペクトルを測定
し、そのスペクトルの隣り合う山と山(谷と谷)の波長
を算出し、先に求めた屈折率と式(2)とを用いて膜厚
を計算した。For film thickness measurement, a spectrophotometer (MCPD-1
100, manufactured by Otsuka Electronics Co., Ltd.) was used. The refractive index is determined in advance using a sample whose film thickness is known, and each time the undercoat layer is dip-coated, the reflection spectrum of the coating film is measured, and the adjacent peaks (valleys) of the spectrum are measured. The wavelength was calculated, and the film thickness was calculated using the previously determined refractive index and equation (2).
【0033】次いで下引き層の上に順次、電荷発生層、
電荷輸送層を形成した。電荷発生層を形成する塗液とし
てε型銅フタロシアニン(リオフォトンEPPC、東洋
インキ(株)製)2重量部、ブチラール樹脂(エスレッ
クBL−1、積水化学(株)製)1重量部、テトラヒド
ロフラン 100重量部を調合し、ボールミルにて8時
間分散したものを作成した。この塗液を浸漬塗布方法に
て乾燥膜厚が 0.4μm となるように塗布し、80
℃30分間乾燥して電荷発生層とした。Next, a charge generation layer is sequentially formed on the undercoat layer.
A charge transport layer was formed. As a coating liquid for forming the charge generation layer, 2 parts by weight of ε-type copper phthalocyanine (Liophoton EPPC, manufactured by Toyo Ink Co., Ltd.), 1 part by weight of butyral resin (S-LEC BL-1, manufactured by Sekisui Chemical Co., Ltd.), and 100 parts by weight of tetrahydrofuran. The mixture was prepared by dispersing it in a ball mill for 8 hours. This coating liquid was applied by dip coating method so that the dry film thickness was 0.4 μm.
C. for 30 minutes to obtain a charge generation layer.
【0034】次に電荷輸送層を形成する塗液として、ブ
タジエン系電荷輸送材(1,1−ビス(p−ジエチルア
ミノフェニル)− 4,4−ジフェニル− 1,3−ブ
タジエン、高砂香料(株)製)1重量部、ポリカーボネ
ート樹脂(パンライトL−1225、帝人化成(株)製
)1重量部、シリコ−ン系レベリング剤(KF−96
、信越化学工業(株)製)0.0001重量部をジクロ
ロメタン10重量部に溶解し、電荷輸送層を形成する塗
液を調整した。この塗液を電荷発生層の上に乾燥膜厚が
17μm となるように浸漬塗布方法にて塗布し、80
℃1時間の乾燥により電荷輸送層を形成しLBP用電子
写真感光体を作成した。Next, as a coating liquid for forming a charge transport layer, a butadiene charge transport material (1,1-bis(p-diethylaminophenyl)-4,4-diphenyl-1,3-butadiene, manufactured by Takasago Fragrance Co., Ltd.) was used. 1 part by weight of polycarbonate resin (Panlite L-1225, manufactured by Teijin Kasei Ltd.), 1 part by weight of silicone leveling agent (KF-96)
, manufactured by Shin-Etsu Chemical Co., Ltd., was dissolved in 10 parts by weight of dichloromethane to prepare a coating liquid for forming a charge transport layer. This coating liquid was applied onto the charge generation layer by dip coating method so that the dry film thickness was 17 μm.
A charge transport layer was formed by drying at °C for 1 hour to prepare an electrophotographic photoreceptor for LBP.
【0035】上記感光体のうち1本目と 100本目を
所定のレーザープリンターに搭載し電気特性を測定した
。下引き層の膜厚、帯電性(Vo )、残留電位(Vr
)及び感度(VL )を表1に示す。The first and 100th photoreceptors were mounted on a predetermined laser printer and their electrical characteristics were measured. Undercoat layer thickness, chargeability (Vo), residual potential (Vr
) and sensitivity (VL) are shown in Table 1.
【0036】[0036]
【表1】[Table 1]
【0037】比較例1
下引き層の形成を、実施例1の図2の塗布装置を用いる
方法で塗布速度を自動制御して形成するかわりに、塗布
速度10.0mm/秒で下引き層の乾燥膜厚が 1.5
μm になるように連続 100本の浸漬塗布を行ない
1本目、50本目及び 100本目を抜き取り、段差計
(タリサーフ5、テーラー&ボブソン社製)にて下引き
層の膜厚を測定する以外は、実施例1と同様の方法にて
電子写真感光体を作成した。Comparative Example 1 Instead of forming an undercoat layer by automatically controlling the coating speed using the coating apparatus shown in FIG. 2 of Example 1, the undercoat layer was formed at a coating speed of 10.0 mm/sec. Dry film thickness is 1.5
100 continuous dip coatings were carried out so that the coating thickness was 100 μm, the 1st, 50th and 100th coats were removed, and the film thickness of the undercoat layer was measured using a level difference meter (Talysurf 5, manufactured by Taylor & Bobson). An electrophotographic photoreceptor was produced in the same manner as in Example 1.
【0038】下引き層の膜厚、帯電性(Vo )、残留
電位(Vr)及び感度(VL )を表2に示す。Table 2 shows the thickness, chargeability (Vo), residual potential (Vr) and sensitivity (VL) of the undercoat layer.
【0039】[0039]
【表2】[Table 2]
【0040】実施例3
電荷発生層を形成する塗液として、ジブロムアンスアン
スロン1重量部、ブチラール樹脂(エスレックBM−2
、積水化学(株)製)1重量部、シクロヘキサノン12
0重量部を調合し、ボールミルにて12時間分散したも
のを作成した。この塗液を 100本の円筒状のアルミ
ニウム導電性基体の表面に浸漬塗布方法にて、乾燥膜厚
が 0.5μm となるように塗布し、80℃30分間
乾燥して電荷発生層とした。Example 3 As a coating liquid for forming a charge generation layer, 1 part by weight of dibrom anthron, butyral resin (S-LEC BM-2
, manufactured by Sekisui Chemical Co., Ltd.) 1 part by weight, cyclohexanone 12
0 parts by weight was prepared and dispersed in a ball mill for 12 hours. This coating solution was coated on the surface of 100 cylindrical aluminum conductive substrates by dip coating so that the dry film thickness was 0.5 μm, and dried at 80° C. for 30 minutes to form a charge generation layer.
【0041】次にヒドラゾン系電荷輸送材(ABPH、
日本化薬(株)製)1重量部、ポリカーボネート樹脂(
パンライトL−1250、帝人化成(株)製)1重量部
、シリコ−ン系レベリング剤(KF−96 、信越化学
工業(株)製)0.00013 重量部をジクロロエタ
ン8重量部に加えて45℃で加熱溶解し、完全に溶解し
た後に自然冷却し、電荷輸送層を形成する塗液として調
整した。この塗液を電荷発生層上に浸漬塗布法にて、そ
の膜厚を図2の塗布装置を用いて逐次測定し、電荷輸送
層の膜厚が20μm ±0.5μm を越える場合には
その膜厚に合せて引き上げ速度(塗布速度)をパソコン
にて自動制御した。塗布速度は1本目が 7.0mm/
秒で、100本目が 6.4mm/秒であった。塗布さ
れた塗膜を70℃で1時間乾燥し、電荷輸送層を形成し
、電子写真感光体を作成した。電荷輸送層の膜厚及び得
られた感光体の電気特性が1本目と 100本目でほと
んど差異が認められず、良好な電子写真感光体を得るこ
とができた。帯電性(Vo )、残留電位(Vr )、
低照度側感度(VL ex=1)及び高照度側感度(V
L ex=5)を表3に示す。Next, hydrazone-based charge transport material (ABPH,
1 part by weight of polycarbonate resin (manufactured by Nippon Kayaku Co., Ltd.)
Add 1 part by weight of Panlite L-1250 (manufactured by Teijin Kasei Ltd.) and 0.00013 parts by weight of a silicone leveling agent (KF-96, manufactured by Shin-Etsu Chemical Co., Ltd.) to 8 parts by weight of dichloroethane, and add 45 parts by weight to 8 parts by weight of dichloroethane. The mixture was heated and dissolved at ℃, and after being completely dissolved, it was naturally cooled to prepare a coating liquid for forming a charge transport layer. This coating liquid was applied onto the charge generation layer by dip coating, and the film thickness was successively measured using the coating device shown in Fig. 2. If the film thickness of the charge transport layer exceeded 20 μm ±0.5 μm, the film thickness The pulling speed (coating speed) was automatically controlled by a computer according to the thickness. The coating speed is 7.0mm/1.
The 100th one was 6.4 mm/sec. The applied coating film was dried at 70° C. for 1 hour to form a charge transport layer, and an electrophotographic photoreceptor was prepared. There was almost no difference in the thickness of the charge transport layer and the electrical properties of the resulting photoreceptor between the 1st and 100th photoreceptor, and a good electrophotographic photoreceptor could be obtained. Chargeability (Vo), residual potential (Vr),
Low-light sensitivity (VL ex=1) and high-light sensitivity (V
L ex = 5) is shown in Table 3.
【0042】膜厚測定は分光光度計(MCPD−110
0、大塚電子(株)製)を使用した。屈折率も実施例1
と同様に膜厚が既知の本実施例の処方の電荷輸送層から
あらかじめ求めておき、膜厚を実施例1と同様に先に求
めた屈折率と式(2)を用いて計算した。The film thickness was measured using a spectrophotometer (MCPD-110).
0, manufactured by Otsuka Electronics Co., Ltd.) was used. The refractive index is also Example 1
Similarly to Example 1, the film thickness was determined in advance from the charge transport layer of the prescription of this example, whose thickness was known, and the film thickness was calculated using the previously determined refractive index and equation (2) in the same manner as in Example 1.
【0043】[0043]
【表3】[Table 3]
【0044】比較例2
電荷輸送層の形成を、実施例2の図2の塗布装置を用い
る方法で塗布速度を自動制御して形成するかわりに、塗
布速度 7.0mm/秒で電荷輸送層の乾燥膜厚が20
μm となるように連続 100本の浸漬塗布を行ない
、1本目、50本目及び 100本目を抜き取り、段差
計(タリサーフ5、テーラー&ボブソン社製)にて電荷
輸送層の膜厚を測定する以外は、実施例2と同様の方法
にて電子写真感光体を作成した。電荷輸送層の膜厚、帯
電性(Vo )、残留電位(Vr )、低照度側感度(
VL ex=1)及び高照度側感度(VL ex=5)
を表4に示す。Comparative Example 2 Instead of forming a charge transport layer by automatically controlling the coating speed using the coating apparatus shown in FIG. 2 of Example 2, the charge transport layer was formed at a coating speed of 7.0 mm/sec. Dry film thickness is 20
The film thickness of the charge transport layer was measured using a level difference meter (Talysurf 5, manufactured by Taylor & Bobson). An electrophotographic photoreceptor was prepared in the same manner as in Example 2. Charge transport layer thickness, chargeability (Vo), residual potential (Vr), low illuminance sensitivity (
VL ex=1) and high-light side sensitivity (VL ex=5)
are shown in Table 4.
【0045】[0045]
【表4】[Table 4]
【0046】表1及び3から明らかなとおり本発明の方
法で作成された電子写真感光体の膜厚、帯電性、残留電
位及び感度は1本目と 100本目とでもほとんど差異
が認められず、均一且つ良好な電子写真感光体を得るこ
とが出来た。As is clear from Tables 1 and 3, the film thickness, chargeability, residual potential, and sensitivity of the electrophotographic photoreceptor produced by the method of the present invention are uniform with almost no difference observed between the first and 100th photoreceptors. In addition, a good electrophotographic photoreceptor could be obtained.
【0047】これに対し、表2及び4に示される通り、
本発明の方法を用いない電子写真感光体は均一な特性を
有するものではなかった。On the other hand, as shown in Tables 2 and 4,
Electrophotographic photoreceptors not using the method of the present invention did not have uniform characteristics.
【0048】[0048]
【発明の効果】本発明の方法によれば膜厚の測定が簡便
で直ちに塗布量の調整をすることが出来るので、常に適
正な膜厚及び電気特性を有する電子写真感光体を得るこ
とが出来る。[Effects of the Invention] According to the method of the present invention, the film thickness can be easily measured and the coating amount can be adjusted immediately, making it possible to obtain an electrophotographic photoreceptor that always has appropriate film thickness and electrical properties. .
【図1】塗膜の光の反射を示す図である。FIG. 1 is a diagram showing the reflection of light on a coating film.
【図2】本発明の光干渉法で塗膜の膜厚を測定し塗布速
度の制御して塗膜を形成する塗布装置の概略図である。FIG. 2 is a schematic diagram of a coating apparatus that measures the thickness of a coating film using the optical interference method of the present invention and forms a coating film by controlling the coating speed.
1 入射光 2 反射光 3 塗膜 11 塗布槽 12 塗液 15 昇降機モーター 20 演算処理装置(パソコン) 21 分光光度計受光部 1 Incident light 2 Reflected light 3 Coating film 11 Coating tank 12 Coating liquid 15 Elevator motor 20 Arithmetic processing unit (PC) 21 Spectrophotometer light receiving part
Claims (1)
輸送層を塗布形成する電子写真感光体、又は下引層、電
荷発生層、電荷輸送層を順次塗布形成する電子写真感光
体を製造する方法において、光干渉法により下引き層又
は電荷輸送層の膜厚を逐次測定する工程、その測定結果
を演算処理装置にフィードバックする工程、及び演算処
理装置より昇降速度を制御して塗布量を調節する工程と
を備えたことを特徴とする電子写真感光体の製造方法。Claim 1: Manufacture an electrophotographic photoreceptor in which a charge generation layer and a charge transport layer are coated on the surface of a conductive substrate, or an electrophotographic photoreceptor in which a subbing layer, a charge generation layer, and a charge transport layer are sequentially coated. The method includes a step of sequentially measuring the film thickness of the undercoat layer or charge transport layer by optical interference method, a step of feeding back the measurement results to a processing device, and a step of controlling the lifting speed from the processing device to adjust the coating amount. A method for manufacturing an electrophotographic photoreceptor, comprising the steps of:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10935291A JPH04336540A (en) | 1991-05-14 | 1991-05-14 | Manufacture of photosensitive body for electronic photograph |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10935291A JPH04336540A (en) | 1991-05-14 | 1991-05-14 | Manufacture of photosensitive body for electronic photograph |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04336540A true JPH04336540A (en) | 1992-11-24 |
Family
ID=14508050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10935291A Pending JPH04336540A (en) | 1991-05-14 | 1991-05-14 | Manufacture of photosensitive body for electronic photograph |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04336540A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08155378A (en) * | 1994-12-07 | 1996-06-18 | Res Dev Corp Of Japan | Method of forming fine particle film |
| US5866917A (en) * | 1995-08-09 | 1999-02-02 | Fuji Xerox Co., Ltd. | Method and apparatus for evaluating the layers |
| US6717677B2 (en) | 1999-04-09 | 2004-04-06 | Sharp Kabushiki Kaisha | Film defect inspection method for a film formed on a substrate |
| US7078143B2 (en) | 2002-09-13 | 2006-07-18 | Sharp Kabushiki Kaisha | Electrophotographic photoreceptor and method for producing the same |
| JP2019166469A (en) * | 2018-03-23 | 2019-10-03 | 株式会社栗本鐵工所 | Powder coating method to cast iron pipe inner surface and its device |
-
1991
- 1991-05-14 JP JP10935291A patent/JPH04336540A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08155378A (en) * | 1994-12-07 | 1996-06-18 | Res Dev Corp Of Japan | Method of forming fine particle film |
| US5866917A (en) * | 1995-08-09 | 1999-02-02 | Fuji Xerox Co., Ltd. | Method and apparatus for evaluating the layers |
| US6717677B2 (en) | 1999-04-09 | 2004-04-06 | Sharp Kabushiki Kaisha | Film defect inspection method for a film formed on a substrate |
| US7078143B2 (en) | 2002-09-13 | 2006-07-18 | Sharp Kabushiki Kaisha | Electrophotographic photoreceptor and method for producing the same |
| JP2019166469A (en) * | 2018-03-23 | 2019-10-03 | 株式会社栗本鐵工所 | Powder coating method to cast iron pipe inner surface and its device |
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