JPH0433654U - - Google Patents
Info
- Publication number
- JPH0433654U JPH0433654U JP7347490U JP7347490U JPH0433654U JP H0433654 U JPH0433654 U JP H0433654U JP 7347490 U JP7347490 U JP 7347490U JP 7347490 U JP7347490 U JP 7347490U JP H0433654 U JPH0433654 U JP H0433654U
- Authority
- JP
- Japan
- Prior art keywords
- abatement device
- exhaust gas
- pump
- gas abatement
- connection diagram
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図はこの考案の一実施例であるポンプ排気
除害装置の配管接続図、第２図はこの考案の他の
実施例であるポンプ排気除害装置の配管接続図、
第３図は従来のポンプ排気除害装置の配管接続図
である。
１……第１ドライエツチング装置、２……反応
室、４……ターボ分子ポンプ、６……ドライポン
プ、８……第２ドライエツチング装置、９……第
３ドライエツチング装置、１２……排ガス除害装
置、１４……ドライポンプ、１６……除害器、３
，５，７，１０，１１，１３，１５，１７……バ
ルブ、１９……ガス及び反応生成物の流れ方向を
示す。なお、図中、同一符号は同一、または相当
部分を示す。
Fig. 1 is a piping connection diagram of a pump exhaust abatement device which is an embodiment of this invention, and Fig. 2 is a piping connection diagram of a pump exhaust abatement device which is another embodiment of this invention.
FIG. 3 is a piping connection diagram of a conventional pump exhaust abatement device. DESCRIPTION OF SYMBOLS 1...First dry etching device, 2...Reaction chamber, 4...Turbo molecular pump, 6...Dry pump, 8...Second dry etching device, 9...Third dry etching device, 12...Exhaust gas Harm removal device, 14...Dry pump, 16...Harm remover, 3
, 5, 7, 10, 11, 13, 15, 17... Valve, 19... Indicates the flow direction of gas and reaction products. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (1)
ポンプを設けたことを特徴とする排ガス除害装置
。 An exhaust gas abatement device characterized by having a vacuum dry pump installed before or after an exhaust gas abatement device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990073474U JP2574816Y2 (en) | 1990-07-09 | 1990-07-09 | Exhaust gas abatement system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990073474U JP2574816Y2 (en) | 1990-07-09 | 1990-07-09 | Exhaust gas abatement system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0433654U true JPH0433654U (en) | 1992-03-19 |
| JP2574816Y2 JP2574816Y2 (en) | 1998-06-18 |
Family
ID=31612320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990073474U Expired - Lifetime JP2574816Y2 (en) | 1990-07-09 | 1990-07-09 | Exhaust gas abatement system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2574816Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088308A (en) * | 2007-10-01 | 2009-04-23 | Hitachi Kokusai Electric Inc | Substrate processing equipment |
| JP2023532775A (en) * | 2020-07-09 | 2023-07-31 | ファイファー バキユーム | Vacuum lines and methods of controlling vacuum lines |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677381A (en) * | 1979-11-30 | 1981-06-25 | Anelva Corp | Exhaust system of dry etching unit |
| JPS60159178A (en) * | 1984-01-27 | 1985-08-20 | Nec Corp | Dry etching device |
| JPS63137736A (en) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | Etching exhaust gas damage removing device |
| JPH01188684A (en) * | 1988-01-20 | 1989-07-27 | Seiko Epson Corp | Vacuum exhaust equipment for chemical dry etching |
-
1990
- 1990-07-09 JP JP1990073474U patent/JP2574816Y2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677381A (en) * | 1979-11-30 | 1981-06-25 | Anelva Corp | Exhaust system of dry etching unit |
| JPS60159178A (en) * | 1984-01-27 | 1985-08-20 | Nec Corp | Dry etching device |
| JPS63137736A (en) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | Etching exhaust gas damage removing device |
| JPH01188684A (en) * | 1988-01-20 | 1989-07-27 | Seiko Epson Corp | Vacuum exhaust equipment for chemical dry etching |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088308A (en) * | 2007-10-01 | 2009-04-23 | Hitachi Kokusai Electric Inc | Substrate processing equipment |
| JP2023532775A (en) * | 2020-07-09 | 2023-07-31 | ファイファー バキユーム | Vacuum lines and methods of controlling vacuum lines |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2574816Y2 (en) | 1998-06-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R323111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |