JPH0433654U - - Google Patents

Info

Publication number
JPH0433654U
JPH0433654U JP7347490U JP7347490U JPH0433654U JP H0433654 U JPH0433654 U JP H0433654U JP 7347490 U JP7347490 U JP 7347490U JP 7347490 U JP7347490 U JP 7347490U JP H0433654 U JPH0433654 U JP H0433654U
Authority
JP
Japan
Prior art keywords
abatement device
exhaust gas
pump
gas abatement
connection diagram
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7347490U
Other languages
English (en)
Other versions
JP2574816Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990073474U priority Critical patent/JP2574816Y2/ja
Publication of JPH0433654U publication Critical patent/JPH0433654U/ja
Application granted granted Critical
Publication of JP2574816Y2 publication Critical patent/JP2574816Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図はこの考案の一実施例であるポンプ排気
除害装置の配管接続図、第２図はこの考案の他の
実施例であるポンプ排気除害装置の配管接続図、
第３図は従来のポンプ排気除害装置の配管接続図
である。 １……第１ドライエツチング装置、２……反応
室、４……ターボ分子ポンプ、６……ドライポン
プ、８……第２ドライエツチング装置、９……第
３ドライエツチング装置、１２……排ガス除害装
置、１４……ドライポンプ、１６……除害器、３
，５，７，１０，１１，１３，１５，１７……バ
ルブ、１９……ガス及び反応生成物の流れ方向を
示す。なお、図中、同一符号は同一、または相当
部分を示す。

Claims (1)

    【実用新案登録請求の範囲】
  1. 排ガス除害器の前段もしくは後段に真空ドライ
    ポンプを設けたことを特徴とする排ガス除害装置
    。
JP1990073474U 1990-07-09 1990-07-09 排ガス除害装置 Expired - Lifetime JP2574816Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990073474U JP2574816Y2 (ja) 1990-07-09 1990-07-09 排ガス除害装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990073474U JP2574816Y2 (ja) 1990-07-09 1990-07-09 排ガス除害装置

Publications (2)

Publication Number Publication Date
JPH0433654U true JPH0433654U (ja) 1992-03-19
JP2574816Y2 JP2574816Y2 (ja) 1998-06-18

Family

ID=31612320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990073474U Expired - Lifetime JP2574816Y2 (ja) 1990-07-09 1990-07-09 排ガス除害装置

Country Status (1)

Country Link
JP (1) JP2574816Y2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009088308A (ja) * 2007-10-01 2009-04-23 Hitachi Kokusai Electric Inc 基板処理装置
JP2023532775A (ja) * 2020-07-09 2023-07-31 ファイファー バキユーム 真空ラインおよび真空ラインの制御方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5677381A (en) * 1979-11-30 1981-06-25 Anelva Corp Exhaust system of dry etching unit
JPS60159178A (ja) * 1984-01-27 1985-08-20 Nec Corp ドライエツチング装置
JPS63137736A (ja) * 1986-11-28 1988-06-09 Asahi Glass Co Ltd エッチング排ガス除害方法
JPH01188684A (ja) * 1988-01-20 1989-07-27 Seiko Epson Corp ケミカルドライエッチング用真空排気装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5677381A (en) * 1979-11-30 1981-06-25 Anelva Corp Exhaust system of dry etching unit
JPS60159178A (ja) * 1984-01-27 1985-08-20 Nec Corp ドライエツチング装置
JPS63137736A (ja) * 1986-11-28 1988-06-09 Asahi Glass Co Ltd エッチング排ガス除害方法
JPH01188684A (ja) * 1988-01-20 1989-07-27 Seiko Epson Corp ケミカルドライエッチング用真空排気装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009088308A (ja) * 2007-10-01 2009-04-23 Hitachi Kokusai Electric Inc 基板処理装置
JP2023532775A (ja) * 2020-07-09 2023-07-31 ファイファー バキユーム 真空ラインおよび真空ラインの制御方法

Also Published As

Publication number Publication date
JP2574816Y2 (ja) 1998-06-18

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